CN104166269A - Display substrate, manufacturing method of display substrate and display device - Google Patents

Display substrate, manufacturing method of display substrate and display device Download PDF

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Publication number
CN104166269A
CN104166269A CN201410363864.XA CN201410363864A CN104166269A CN 104166269 A CN104166269 A CN 104166269A CN 201410363864 A CN201410363864 A CN 201410363864A CN 104166269 A CN104166269 A CN 104166269A
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overlayer
matrix
black matrix
colour
base plate
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CN201410363864.XA
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Chinese (zh)
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汪栋
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BOE Technology Group Co Ltd
Beijing BOE Display Technology Co Ltd
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BOE Technology Group Co Ltd
Beijing BOE Display Technology Co Ltd
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Priority to CN201410363864.XA priority Critical patent/CN104166269A/en
Publication of CN104166269A publication Critical patent/CN104166269A/en
Pending legal-status Critical Current

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Abstract

The invention discloses a display substrate, a manufacturing method of the display substrate and a display device. The display substrate comprises an underlayer substrate, black matrixes and color matrix patterns, wherein the black matrixes and the color matrix patterns are arranged on the underlayer substrate, first covering layers are formed between the black matrixes and the color matrix patterns, and second covering layers are formed on the black matrixes and the color matrix patterns. According to the technical scheme, the first covering layers are formed between the black matrixes and the color matrix patterns, so that the phenomena that overlapping gaps exist between the black matrixes and the color matrix patterns and bubbles exist in the color matrix patterns are avoided; the first covering layers are formed between the black matrixes and the color matrix patterns, as a result, the black matrixes do not need to be connected with the color matrix patterns in an overlapping mode, the problem that the larger the slope angle of the black matrixes is, the larger the angle difference of the overlapping joint areas between the black matrixes and the color matrix patterns is avoided, the flatness of the surfaces of the second covering layers is improved, and the flatness of the surface of the display substrate is improved.

Description

Display base plate and manufacture method thereof and display device
Technical field
The present invention relates to display technique field, particularly a kind of display base plate and manufacture method thereof and display device.
Background technology
Liquid crystal indicator is current the most frequently used flat-panel monitor, and wherein thin-film transistor LCD device (Thin Film Transistor Liquid Crystal Display is called for short TFT-LCD) is the main product in liquid crystal indicator.Display panels is the vitals in liquid crystal indicator.Display panels is by box technique is formed array basal plate and a color membrane substrates to box, and is filled with liquid crystal layer between array base palte and color membrane substrates.Fig. 1 is the structural representation of color membrane substrates in prior art, as shown in Figure 1, this color membrane substrates comprises underlay substrate 11, black matrix 12, colour matrix figure 13 and overlayer 14, black matrix 12 and colour matrix figure 13 are formed on underlay substrate 11, black matrix 12 between colour matrix figure 13 and black matrix 12 be positioned under colour matrix figure 13, overlayer 14 is positioned on colour matrix figure 13.Further, be also formed with dorsum electrode layer 15 at the back side of underlay substrate 11.Wherein, colour matrix figure 13 can be red Matrix Pattern, green Matrix Pattern or blue Matrix Pattern.
Along with the raising of product resolution, the pixel of color membrane substrates (Pixel) size is more and more less, causes the live width of black matrix and colour matrix figure also more and more thinner.In order to realize the wide black matrix of fine rule and colour matrix figure, rely on merely the reduction of mask plate opening size to realize.Conventionally in exposure technology, can realize by reduce exposure spacing (Gap) as far as possible, wherein, exposure spacing can be the distance between the lower surface of mask plate and the upper surface of photoresist.Taking black matrix as example, the target live width of supposing black matrix is a, and the black matrix of a < 10 μ m all belongs to the wide black matrix of fine rule.Fig. 2 is the schematic diagram of the angle of gradient of black matrix, as shown in Figure 2, in the time of a < 10 μ m, the process conditions of basic need exposure spacing≤150 μ m could realize, and the angle of gradient θ of the black matrix now forming is greater than 70 ° conventionally, the angle of gradient of black matrix is larger.Along with the further refinement of black matrix live width size, exposure spacing needs further to reduce, and the angle of gradient of the black matrix of formation can continue to improve, until the angle of gradient rises to 90 °.
In prior art, the angle of gradient of black matrix produces following technical matters compared with conference:
1) Fig. 3 is the schematic diagram that produces overlapping space between black matrix and colour matrix figure, Fig. 4 is the schematic diagram that colour matrix figure produces bubble, as shown in Figure 3 and Figure 4, carry out the making of colour matrix figure 13 on the black matrix 12 completing time, between black matrix 12 and colour matrix figure 13, easily produce overlapping space 16, and in colour matrix figure, form bubble (Bubble) 17.
2) as shown in Figure 1, the angle of gradient of black matrix is larger, and the angle section of the overlap of black matrix and colour matrix figure is poor larger, thereby causes the flatness on color membrane substrates surface poor.
Summary of the invention
The invention provides a kind of display base plate and manufacture method thereof and display device, between black matrix and colour matrix figure, produce overlapping space and produce bubble at colour matrix figure for avoiding, and improve the flatness on display base plate surface.
For achieving the above object, the invention provides a kind of display base plate, comprise underlay substrate and the black matrix and the colour matrix figure that are formed at described underlay substrate top, between described black matrix and described colour matrix figure, be formed with the first overlayer, the top of described black matrix and described colour matrix figure is formed with the second overlayer.
Alternatively, described the first overlayer is flatness layer, and described the second overlayer is flatness layer.
Alternatively, described black matrix is positioned on described underlay substrate, and described the first overlayer is positioned on described black matrix, and described colour matrix figure is positioned on described the first overlayer, and described the second overlayer is positioned on described colour matrix figure; Or
Described colour matrix figure is positioned on described underlay substrate, and described the first overlayer is positioned on described colour matrix figure, and described black matrix is positioned on described the first overlayer, and described the second overlayer is positioned on described black matrix.
Alternatively, if described the first overlayer is positioned on described black matrix, described the first tectal thickness is 1.0 μ m to 2.0 μ m, and the thickness of described black matrix is 0.9 μ m to 2.0 μ m;
If described the first overlayer is positioned on described colour matrix figure, described the first tectal thickness is 1.0 μ m to 3.0 μ m, and the thickness of described colour matrix figure is 1.0 μ m to 3.0 μ m.
Alternatively, also comprise common electrode layer, described common electrode layer is formed on described the second overlayer.
Alternatively, also comprise both alignment layers, described both alignment layers is formed at described the second tectal top.
For achieving the above object, the invention provides a kind of display device, comprise the above-mentioned display base plate and the counter substrate that are oppositely arranged.
For achieving the above object, the invention provides a kind of manufacture method of display base plate, comprising:
On underlay substrate, form black matrix, colour matrix figure and the first overlayer, described the first overlayer is between described black matrix and described colour matrix figure;
Above described black matrix and described colour matrix figure, form the second overlayer.
Alternatively, described black matrix, colour matrix figure and the first overlayer of forming on underlay substrate comprises:
On underlay substrate, form described black matrix;
On described black matrix, form described the first overlayer;
On described the first overlayer, form colour matrix figure;
Describedly above described black matrix and described colour matrix figure, form the second overlayer and comprise:
On described colour matrix figure, form described the second overlayer.
Alternatively, describedly on described black matrix, form described the first overlayer and comprise:
On described black matrix, form described the first overlayer by whole coating processes.
The present invention has following beneficial effect:
In the technical scheme of display base plate provided by the invention and manufacture method thereof and display device, between black matrix and colour matrix figure, be formed with the first overlayer, thereby avoided producing between black matrix and colour matrix figure overlapping space and produce bubble in colour matrix figure; Between black matrix and colour matrix figure, be formed with the first overlayer, make black matrix without overlapping with colour matrix figure, the poor larger problem of angle section of the overlap of the angle of gradient of having avoided black matrix larger and the black matrix that causes and colour matrix figure, improve the flatness of the second cover surface, thereby improved the flatness on display base plate surface.
Brief description of the drawings
Fig. 1 is the structural representation of color membrane substrates in prior art;
Fig. 2 is the schematic diagram of the angle of gradient of black matrix;
Fig. 3 is the schematic diagram that produces overlapping space between black matrix and colour matrix figure;
Fig. 4 is the schematic diagram that colour matrix figure produces bubble;
The structural representation of a kind of display base plate that Fig. 5 provides for the embodiment of the present invention one;
Fig. 6 be in Fig. 5 A-A to cut-open view;
The structural representation of a kind of display base plate that Fig. 7 provides for the embodiment of the present invention two;
The process flow diagram of the manufacture method of a kind of display base plate that Fig. 8 provides for the embodiment of the present invention five;
Fig. 9 a is the schematic diagram that forms black matrix;
Fig. 9 b is for forming the first tectal schematic diagram;
Fig. 9 c is the schematic diagram that forms colour matrix figure;
Fig. 9 d is for forming the second tectal schematic diagram;
The process flow diagram of the manufacture method of a kind of display base plate that Figure 10 provides for the embodiment of the present invention six;
Figure 11 is the schematic diagram that forms common electrode layer.
Embodiment
For making those skilled in the art understand better technical scheme of the present invention, below in conjunction with accompanying drawing, display base plate provided by the invention and manufacture method thereof and display device are described in detail.
The structural representation of a kind of display base plate that Fig. 5 provides for the embodiment of the present invention one, Fig. 6 be in Fig. 5 A-A to cut-open view, as shown in Figure 5 and Figure 6, this display base plate comprises underlay substrate 21 and is formed at black matrix 22 and the colour matrix figure of underlay substrate 21 tops, between black matrix 22 and colour matrix figure, be formed with the first overlayer 23, the top of black matrix 22 and colour matrix figure is formed with the second overlayer 24.
In the present embodiment, black matrix 22 is arranged in a crossed manner in length and breadth.Colour matrix figure is between black matrix 22 arranged in a crossed manner in length and breadth.Wherein, colour matrix figure can be red Matrix Pattern R, green Matrix Pattern G or blue Matrix Pattern B, and red Matrix Pattern R, green Matrix Pattern G and blue Matrix Pattern B are arranged in order.
In the present embodiment, preferably, the first overlayer 23 is flatness layer, and the second overlayer 24 is flatness layer.
In the present embodiment, black matrix 22 is positioned on underlay substrate 21, and the first overlayer 23 is positioned on black matrix 22, and colour matrix figure is positioned on the first overlayer 23, and the second overlayer 24 is positioned on colour matrix figure.
Because the first overlayer 23 is covered on black matrix 22, therefore the thickness of the first overlayer 23 can arrange according to the thickness of black matrix 22.For reaching the object of the materials'use amount that reduces the first overlayer 23, what conventionally the thickness of the first overlayer 23 is arranged is the smaller the better.Preferably, the thickness of the first overlayer 23 is 1.0 μ m to 2.0 μ m, and the thickness of black matrix is 0.9 μ m to 2.0 μ m.In the present embodiment, the thickness of the first overlayer 23 is greater than the thickness of black matrix 22.In actual applications, the thickness of the first overlayer 23 can also be less than or equal to the thickness of black matrix 22, and this kind of situation specifically do not draw.
In the present embodiment, this display base plate can be color membrane substrates.When this color membrane substrates is applied to a senior super dimension switch technology (ADvanced Super Dimension Switch, be called for short: ADS) in display device time, further, this display base plate can also comprise dorsum electrode layer 25, and this dorsum electrode layer 25 is formed at the back side of underlay substrate 21.
Further, this display base plate can also comprise both alignment layers 26, and both alignment layers 26 is formed on the second overlayer 24.
Further, in both alignment layers 26, can also form chock insulator matter, this chock insulator matter is positioned at the top of black matrix.In figure, chock insulator matter does not specifically draw.
In the technical scheme of the display base plate that the present embodiment provides, between black matrix and colour matrix figure, be formed with the first overlayer, thereby avoided producing between black matrix and colour matrix figure overlapping space and produce bubble in colour matrix figure; Between black matrix and colour matrix figure, be formed with the first overlayer, make black matrix without overlapping with colour matrix figure, the poor larger problem of angle section of the overlap of the angle of gradient of having avoided black matrix larger and the black matrix that causes and colour matrix figure, improve the flatness of the second cover surface, thereby improved the flatness on display base plate surface.In the present embodiment, both alignment layers is formed on the second overlayer, and the flatness on the second tectal surface is higher, thereby has improved the coating diffusivity of the both alignment layers being formed on the second overlayer.
The structural representation of a kind of display base plate that Fig. 7 provides for the embodiment of the present invention two, as shown in Figure 7, this display base plate comprises underlay substrate 21 and is formed at black matrix 22 and the colour matrix figure of underlay substrate 21 tops, between black matrix 22 and colour matrix figure, be formed with the first overlayer 23, the top of black matrix 22 and colour matrix figure is formed with the second overlayer 24.
In the present embodiment, black matrix 22 is arranged in a crossed manner in length and breadth.Colour matrix figure is between black matrix 22 arranged in a crossed manner in length and breadth.Wherein, colour matrix figure can be red Matrix Pattern R, green Matrix Pattern G or blue Matrix Pattern B, and red Matrix Pattern R, green Matrix Pattern G and blue Matrix Pattern B are arranged in order.
In the present embodiment, preferably, the first overlayer 23 is flatness layer, and the second overlayer 24 is flatness layer.
In the present embodiment, black matrix 22 is positioned on underlay substrate 21, and the first overlayer 23 is positioned on black matrix 22, and colour matrix figure is positioned on the first overlayer 23, and the second overlayer 24 is positioned on colour matrix figure.
Because the first overlayer 23 is covered on black matrix 22, therefore the thickness of the first overlayer 23 can arrange according to the thickness of black matrix 22.For reaching the object of the materials'use amount that reduces the first overlayer 23, what conventionally the thickness of the first overlayer 23 is arranged is the smaller the better.Preferably, the thickness of the first overlayer 23 is 1.0 μ m to 2.0 μ m, and the thickness of black matrix is 0.9 μ m to 2.0 μ m.In the present embodiment, the thickness of the first overlayer 23 is greater than the thickness of black matrix 22.In actual applications, the thickness of the first overlayer 23 can also be less than or equal to the thickness of black matrix 22, and this kind of situation specifically do not draw.
In the present embodiment, this display base plate can be color membrane substrates.When this color membrane substrates is applied to twisted nematic, (twisted nematic is called for short: TN) in display device time, further, this display base plate can also comprise common electrode layer 27, and common electrode layer 27 is formed on the second overlayer 24.
Further, this display base plate can also comprise both alignment layers 26, and both alignment layers 26 is formed on common electrode layer 27.
Further, in both alignment layers 26, can also form chock insulator matter, this chock insulator matter is positioned at the top of black matrix.In figure, chock insulator matter does not specifically draw.
In the technical scheme of the display base plate that the present embodiment provides, between black matrix and colour matrix figure, be formed with the first overlayer, thereby avoided producing between black matrix and colour matrix figure overlapping space and produce bubble in colour matrix figure; Between black matrix and colour matrix figure, be formed with the first overlayer, make black matrix without overlapping with colour matrix figure, the poor larger problem of angle section of the overlap of the angle of gradient of having avoided black matrix larger and the black matrix that causes and colour matrix figure, thus the flatness on display base plate surface improved.In the present embodiment, common electrode layer is positioned on the second overlayer, and the flatness on the second tectal surface is higher, is positioned at the disconnected film of common electrode layer of overlap top and the phenomenon of bursting apart thereby reduced.In the present embodiment, both alignment layers is formed at the second tectal top, and the flatness on the second tectal surface is higher, thereby has improved the coating diffusivity of the both alignment layers being formed on the second overlayer.
In the above embodiment of the present invention one or embodiment bis-, alternatively, colour matrix figure also can be positioned on underlay substrate, and the first overlayer is positioned on colour matrix figure, and black matrix is positioned on the first overlayer, and the second overlayer is positioned on black matrix.Because the first overlayer is covered on colour matrix figure, therefore the first tectal thickness can arrange according to the thickness of colour matrix figure.For reaching the object that reduces the first tectal materials'use amount, what conventionally the first tectal thickness is arranged is the smaller the better.Preferably, the first tectal thickness is 1.0 μ m to 3.0 μ m, and the thickness of colour matrix figure is 1.0 μ m to 3.0 μ m.The first tectal thickness can be greater than, be less than or equal to the thickness of black matrix.In display base plate, the description of all the other structures can be referring to above-described embodiment one or embodiment bis-, and this kind of situation no longer specifically draws.
The embodiment of the present invention three provides a kind of display device, and this display device comprises the display base plate and the counter substrate that are oppositely arranged, the display base plate that display base plate can adopt above-described embodiment one or embodiment bis-to provide.
In the present embodiment, this display base plate can be color membrane substrates, and counter substrate can be array base palte.When this display device is ADS display device, the display base plate that this display base plate can adopt embodiment mono-to provide; When this display device is TN display device, the display base plate that this display base plate can adopt embodiment bis-to provide.
In the technical scheme of the display device that the present embodiment provides, between black matrix and colour matrix figure, be formed with the first overlayer, thereby avoided producing between black matrix and colour matrix figure overlapping space and produce bubble in colour matrix figure; Between black matrix and colour matrix figure, be formed with the first overlayer, make black matrix without overlapping with colour matrix figure, the poor larger problem of angle section of the overlap of the angle of gradient of having avoided black matrix larger and the black matrix that causes and colour matrix figure, thus the flatness on display base plate surface improved.
The embodiment of the present invention four provides a kind of manufacture method of display base plate, and the method comprises:
Step 101, on underlay substrate, form black matrix, colour matrix figure and the first overlayer, the first overlayer is between black matrix and colour matrix figure.
Step 102, above black matrix and colour matrix figure, form the second overlayer.
In the technical scheme of the manufacture method of the display device that the present embodiment provides, between black matrix and colour matrix figure, be formed with the first overlayer, thereby avoided producing between black matrix and colour matrix figure overlapping space and produce bubble in colour matrix figure; Between black matrix and colour matrix figure, be formed with the first overlayer, make black matrix without overlapping with colour matrix figure, the poor larger problem of angle section of the overlap of the angle of gradient of having avoided black matrix larger and the black matrix that causes and colour matrix figure, thus the flatness on display base plate surface improved.
The process flow diagram of the manufacture method of a kind of display base plate that Fig. 8 provides for the embodiment of the present invention five, as shown in Figure 8, the method comprises:
Step 201, on underlay substrate, form black matrix.
Fig. 9 a is the schematic diagram that forms black matrix, as shown in Fig. 9 a, forms black matrix material layer on underlay substrate 21, black matrix material layer is carried out to composition technique and form black matrix 22.Before forming black matrix material layer, can also clean underlay substrate 21; After forming black matrix material layer, can also carry out front baking to black matrix material layer; Baking after can also carrying out black matrix 22 after forming black matrix 22.
Step 202, on black matrix, form the first overlayer.
Fig. 9 b, for forming the first tectal schematic diagram, as shown in Fig. 9 b, forms the first overlayer 23 on black matrix 22 by whole coating processes.Before forming the first overlayer 23, can also clean the underlay substrate of completing steps 201 21; After forming the first overlayer 23, can also carry out rear baking to the first overlayer 23.
Step 203, on the first overlayer, form colour matrix figure.
Fig. 9 c is the schematic diagram that forms colour matrix figure, as shown in Fig. 9 c, forms colour matrix material layer on the first overlayer, colour matrix material layer is carried out to composition technique and form colour matrix figure.For example: in this step, can repeat above-mentioned steps so that form red Matrix Pattern R, green Matrix Pattern G and blue Matrix Pattern B.Before forming colour matrix material layer, can also clean the underlay substrate of completing steps 202 21; After forming colour matrix material layer, can also carry out front baking to colour matrix material layer; Baking after can also carrying out colour matrix figure after forming colour matrix figure.
Step 204, on colour matrix figure, form the second overlayer.
Fig. 9 d, for forming the second tectal schematic diagram, as shown in Fig. 9 d, forms the second overlayer 24 by whole coating processes on colour matrix figure.Before forming the second overlayer 24, can also clean the underlay substrate of completing steps 203 21; After forming the second overlayer 24, can also carry out rear baking to the second overlayer 24.
Further, the method can also comprise:
Step 205, on the second overlayer, form both alignment layers.
As shown in Figure 6, on the second overlayer 24, apply both alignment layers 26.
Alternatively, the method can also comprise:
Step 206, in both alignment layers, form chock insulator matter, this chock insulator matter is positioned at the top of black matrix.
Particularly, in both alignment layers, form chock insulator matter material layer, chock insulator matter material layer is carried out to composition technique and form chock insulator matter.Before forming chock insulator matter material layer, can also clean the underlay substrate of completing steps 205 21; After forming chock insulator matter material layer, can also carry out front baking to chock insulator matter material layer; Baking after can also carrying out chock insulator matter after forming chock insulator matter.Chock insulator matter does not specifically draw in the accompanying drawings.
It should be noted that: the each structure forming from step 201 to step 206 is all positioned at the front of underlay substrate 21.
Step 207, form dorsum electrode layer at the back side of underlay substrate.
As shown in Figure 6, form dorsum electrode layer 25 by magnetron sputtering technique at the back side of underlay substrate 21.
The manufacture method of the display base plate that the present embodiment provides can be used for manufacturing the display base plate that above-described embodiment one provides, and the specific descriptions of display base plate can, referring to embodiment mono-, be repeated no more herein.
In the technical scheme of the manufacture method of the display base plate that the present embodiment provides, between black matrix and colour matrix figure, be formed with the first overlayer, thereby avoided producing between black matrix and colour matrix figure overlapping space and produce bubble in colour matrix figure; Between black matrix and colour matrix figure, be formed with the first overlayer, make black matrix without overlapping with colour matrix figure, the poor larger problem of angle section of the overlap of the angle of gradient of having avoided black matrix larger and the black matrix that causes and colour matrix figure, improve the flatness of the second cover surface, thereby improved the flatness on display base plate surface.In the present embodiment, both alignment layers is formed on the second overlayer, and the flatness on the second tectal surface is higher, thereby has improved the coating diffusivity of the both alignment layers being formed on the second overlayer.
The process flow diagram of the manufacture method of a kind of display base plate that Figure 10 provides for the embodiment of the present invention six, as shown in figure 10, the method comprises:
Step 301, on underlay substrate, form black matrix.
Specifically can be referring to the description in Fig. 9 a and step 201.
Step 302, on black matrix, form the first overlayer.
Specifically can be referring to the description in Fig. 9 b and step 202.
Step 303, on the first overlayer, form colour matrix figure.
Specifically can be referring to the description in Fig. 9 c and step 203.
Step 304, on colour matrix figure, form the second overlayer.
Specifically can be referring to the description in Fig. 9 d and step 204.
Further, the method can also comprise:
Step 305, on the second overlayer, form common electrode layer.
Figure 11 is the schematic diagram that forms common electrode layer, as shown in figure 11, forms common electrode layer 27 by magnetron sputtering technique on the second overlayer 24.
Step 306, the both alignment layers that forms in common electrode layer.
As shown in Figure 7, in common electrode layer 27, apply both alignment layers 26.
Step 307, in both alignment layers, form chock insulator matter, this chock insulator matter is positioned at the top of black matrix.
Specifically can be referring to the description in step 206.
The manufacture method of the display base plate that the present embodiment provides can be used for manufacturing the display base plate that above-described embodiment two provides, and the specific descriptions of display base plate can, referring to embodiment bis-, be repeated no more herein.
In the technical scheme of the manufacture method of the display base plate that the present embodiment provides, between black matrix and colour matrix figure, be formed with the first overlayer, thereby avoided producing between black matrix and colour matrix figure overlapping space and produce bubble in colour matrix figure; Between black matrix and colour matrix figure, be formed with the first overlayer, make black matrix without overlapping with colour matrix figure, the poor larger problem of angle section of the overlap of the angle of gradient of having avoided black matrix larger and the black matrix that causes and colour matrix figure, thus the flatness on display base plate surface improved.In the present embodiment, common electrode layer is positioned on the second overlayer, and the flatness on the second tectal surface is higher, is positioned at the disconnected film of common electrode layer of overlap top and the phenomenon of bursting apart thereby reduced.In the present embodiment, both alignment layers is formed at the second tectal top, and the flatness on the second tectal surface is higher, thereby has improved the coating diffusivity of the both alignment layers being formed on the second overlayer.
Be understandable that, above embodiment is only used to principle of the present invention is described and the illustrative embodiments that adopts, but the present invention is not limited thereto.For those skilled in the art, without departing from the spirit and substance in the present invention, can make various modification and improvement, these modification and improvement are also considered as protection scope of the present invention.

Claims (10)

1. a display base plate, it is characterized in that, comprise underlay substrate and the black matrix and the colour matrix figure that are formed at described underlay substrate top, between described black matrix and described colour matrix figure, be formed with the first overlayer, the top of described black matrix and described colour matrix figure is formed with the second overlayer.
2. display base plate according to claim 1, is characterized in that, described the first overlayer is flatness layer, and described the second overlayer is flatness layer.
3. display base plate according to claim 1, it is characterized in that, described black matrix is positioned on described underlay substrate, described the first overlayer is positioned on described black matrix, described colour matrix figure is positioned on described the first overlayer, and described the second overlayer is positioned on described colour matrix figure; Or
Described colour matrix figure is positioned on described underlay substrate, and described the first overlayer is positioned on described colour matrix figure, and described black matrix is positioned on described the first overlayer, and described the second overlayer is positioned on described black matrix.
4. display base plate according to claim 3, is characterized in that, if described the first overlayer is positioned on described black matrix, described the first tectal thickness is 1.0 μ m to 2.0 μ m, and the thickness of described black matrix is 0.9 μ m to 2.0 μ m;
If described the first overlayer is positioned on described colour matrix figure, described the first tectal thickness is 1.0 μ m to 3.0 μ m, and the thickness of described colour matrix figure is 1.0 μ m to 3.0 μ m.
5. display base plate according to claim 1, is characterized in that, also comprises common electrode layer, and described common electrode layer is formed on described the second overlayer.
6. display base plate according to claim 1, is characterized in that, also comprises both alignment layers, and described both alignment layers is formed at described the second tectal top.
7. a display device, is characterized in that, comprises the display base plate and the counter substrate that are oppositely arranged, and described display base plate adopts the arbitrary described display base plate of the claims 1 to 6.
8. a manufacture method for display base plate, is characterized in that, comprising:
On underlay substrate, form black matrix, colour matrix figure and the first overlayer, described the first overlayer is between described black matrix and described colour matrix figure;
Above described black matrix and described colour matrix figure, form the second overlayer.
9. the manufacture method of display base plate according to claim 8, is characterized in that,
Described black matrix, colour matrix figure and the first overlayer of forming on underlay substrate comprises:
On underlay substrate, form described black matrix;
On described black matrix, form described the first overlayer;
On described the first overlayer, form colour matrix figure;
Describedly above described black matrix and described colour matrix figure, form the second overlayer and comprise:
On described colour matrix figure, form described the second overlayer.
10. the manufacture method of display base plate according to claim 9, is characterized in that, describedly on described black matrix, forms described the first overlayer and comprises:
On described black matrix, form described the first overlayer by whole coating processes.
CN201410363864.XA 2014-07-28 2014-07-28 Display substrate, manufacturing method of display substrate and display device Pending CN104166269A (en)

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CN107621723A (en) * 2017-10-18 2018-01-23 京东方科技集团股份有限公司 Preparation method, color membrane substrates, display panel and the display device of color membrane substrates
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CN112670431A (en) * 2020-12-25 2021-04-16 武汉华星光电半导体显示技术有限公司 OLED display panel and display device
CN112736210A (en) * 2020-12-29 2021-04-30 湖北长江新型显示产业创新中心有限公司 Display panel and display device
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CN112736210A (en) * 2020-12-29 2021-04-30 湖北长江新型显示产业创新中心有限公司 Display panel and display device
CN112736210B (en) * 2020-12-29 2022-11-08 湖北长江新型显示产业创新中心有限公司 Display panel and display device
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Application publication date: 20141126