CN108181757B - Color filter and manufacturing method thereof - Google Patents
Color filter and manufacturing method thereof Download PDFInfo
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- CN108181757B CN108181757B CN201711462206.6A CN201711462206A CN108181757B CN 108181757 B CN108181757 B CN 108181757B CN 201711462206 A CN201711462206 A CN 201711462206A CN 108181757 B CN108181757 B CN 108181757B
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- color
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 17
- 239000011159 matrix material Substances 0.000 claims abstract description 62
- 239000000758 substrate Substances 0.000 claims abstract description 39
- 238000000034 method Methods 0.000 claims description 14
- 229920002120 photoresistant polymer Polymers 0.000 claims description 11
- 239000004973 liquid crystal related substance Substances 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 239000003086 colorant Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000002952 polymeric resin Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Optical Filters (AREA)
- Liquid Crystal (AREA)
Abstract
The invention provides a color filter and a manufacturing method thereof. The color filter includes: a transparent substrate; a black matrix layer disposed on the transparent substrate and including a plurality of black matrices spaced apart from each other; a color resist layer disposed between the plurality of black matrices on the black matrix layer; and a transparent element disposed between the black matrix layer and the color resist layer on the transparent substrate to completely cover the black matrix layer, wherein the transparent element includes a first portion located under the color resist layer and between adjacent black matrices and a second portion extending from the first portion to be located on the black matrices, and an upper surface of the first portion of the transparent element is higher than an upper surface of the second portion of the transparent element.
Description
Technical Field
The present invention relates to the field of liquid crystal display, and more particularly, to a color filter and a method of manufacturing the same.
Background
Liquid crystal display panels are important components in liquid crystal displays. The color filter plays an important role in the display performance of the liquid crystal display panel. In a cell forming (celling) process in a conventional liquid crystal display panel process, as shown in fig. 1, a black matrix layer (BM)20, a color photoresist layer 30, a transparent conductive layer (ITO)40, and a gap sub-layer (PS)50 are sequentially formed on a glass substrate 10. When the array substrate is attached to the Color Filter (CF) substrate, the metal foreign matter falling on the black matrix layer in the color filter manufacturing process may cause a short circuit phenomenon in the circuit on the array substrate, and the short circuit phenomenon may cause the whole panel (panel) to be scrapped due to the short circuit.
Disclosure of Invention
In order to solve the above problems in the prior art, the present invention provides a color filter and a method for manufacturing the same.
An exemplary embodiment of the present invention provides a color filter including: a transparent substrate; a black matrix layer disposed on the transparent substrate and including a plurality of black matrices spaced apart from each other; a color resist layer disposed between the plurality of black matrices on the black matrix layer; and a transparent element disposed between the black matrix layer and the color resist layer on the transparent substrate to completely cover the black matrix layer, wherein the transparent element includes a first portion located under the color resist layer and between adjacent black matrices and a second portion extending from the first portion to be located on the black matrices, and an upper surface of the first portion of the transparent element is higher than an upper surface of the second portion of the transparent element.
In an embodiment, the transparent member further includes a third portion extending from the outermost second portion and covering an outer side surface of the black matrix layer.
In an embodiment, the sum of the heights of the color resist layer and the first portion of the transparent element is 2 to 3 times the height of the black matrix layer.
In an embodiment, the color resist layer is disposed only on the first portion of the transparent element.
In one embodiment, the upper surfaces of the color photoresist layers are at the same level.
In an embodiment, the color filter further includes: a transparent conductive layer disposed on the transparent element and the color resist layer to cover the transparent element and the color resist layer; and a gap sub-layer disposed on a portion of the transparent conductive layer overlapping the black matrix.
An exemplary embodiment of the present invention provides a method of manufacturing a color filter, the method including: preparing a transparent substrate; disposing a black matrix layer including a plurality of black matrices spaced apart from each other on a transparent substrate; disposing a transparent member on the transparent substrate to completely cover the black matrix layer, wherein the transparent member includes a first portion under the color resist layer and between adjacent black matrices and a second portion extending from the first portion to be on the black matrices; and arranging a color photoresist layer on the first part of the transparent element and among the black matrixes, wherein the upper surface of the first part of the transparent element is higher than that of the second part of the transparent element.
In an embodiment, the transparent member further includes a third portion extending from the outermost second portion and covering an outer side surface of the black matrix layer.
In an embodiment, the sum of the heights of the color resist layer and the first portion of the transparent element is 2 to 3 times the height of the black matrix layer.
In an embodiment, the method further comprises: arranging a transparent conductive layer on the transparent element and the color photoresist layer; and disposing a gap sub-layer on a portion of the transparent conductive layer overlapping the black matrix.
Drawings
Fig. 1 shows a cross-sectional view of a color filter in the related art.
Fig. 2 illustrates a cross-sectional view of a color filter according to an exemplary embodiment of the present invention.
Fig. 3A to 3D are cross-sectional views illustrating a method of manufacturing a color filter according to an exemplary embodiment of the present invention.
Detailed Description
Reference will now be made in detail to the embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like reference numerals refer to the like elements throughout. The embodiments are described below in order to explain the present invention by referring to the figures.
Fig. 2 illustrates a cross-sectional view of a color filter according to an exemplary embodiment of the present invention.
Referring to fig. 2, the color filter 100 includes a substrate 11, a black matrix layer 21, a transparent element 61, a color photoresist layer 31, a transparent conductive layer 41, and a gap sub-layer 51.
According to an exemplary embodiment of the present invention, the substrate 11 may be a transparent substrate, for example, a glass substrate. According to another exemplary embodiment of the present invention, the substrate 11 may be a flexible substrate. According to an exemplary embodiment of the present invention, the black matrix layer 21 may be made of a material having light-shielding and conductive functions to absorb and block light incident thereon. In an embodiment, the black matrix layer 21 may include a photosensitive polymer resin having light-shielding and conductive functions and an additive thereof. The black matrix layer 21 is disposed on the substrate 11, and includes a plurality of black matrices disposed spaced apart from each other. According to an exemplary embodiment of the present invention, the black matrices may be spaced apart from each other at the same interval. The top surfaces of the black matrices may be disposed at the same level.
The color filter according to the exemplary embodiment of the present invention further includes a transparent member 61 disposed between the black matrix layer 21 and the color filter layer 31 on the substrate 11 to completely cover the black matrix layer 21. The transparent member 61 has a concave-convex shape. As shown in fig. 2, the transparent member 61 may include a first portion 611 located under the color filter layer 31 and between adjacent black matrices, a second portion 612 extending from the first portion to be located on the black matrices, and a third portion 613 extending from the outermost second portion 612 and covering the outer side surface of the black matrix layer. Here, although it is illustrated that the transparent member 61 includes three portions 611, 612, and 613, the third portion 613 may be omitted according to an exemplary embodiment of the present invention, in which case the transparent member 61 includes only the first portion 611 positioned between the adjacent black matrices under the color resist layer 31 and the second portion 612 extending from the first portion 611 to cover the black matrices. According to the color filter of the exemplary embodiment of the present invention, the transparent member 61 may protect the black matrix from metallic foreign substances generated on the black matrix layer by dropping in the color filter manufacturing process. The transparent member 61 may be made of a transparent material to transmit light from the light source. The transparent element may comprise or be made of a photoresist material.
The color resist layer 31 is formed on the first portion 611 of the transparent member 61 and includes, for example, a color filter for displaying one of three primary colors of red, green, and blue. The color filter is not limited to displaying three primary colors of red, green and blue, and may also display other colors such as cyan, magenta, yellow and white-based colors. The color resist layer 31 may not overlap with the black matrix or partially overlap with the black matrix. According to an exemplary embodiment of the present invention, since the transparent member 61 is disposed between the color resist layer 31 and the black matrix layer 21, the distance of the upper surface of the color resist layer 31 from the upper surface of the substrate 11 is increased. According to a preferred exemplary embodiment of the present invention, the upper surface of the color photoresist layer 31 may be spaced from the upper surface of the substrate 11 by a distance 2 to 3 times that of the black matrix layer 21. The upper surfaces of the color resist layers 31 are at the same level to improve the liquid crystal performance.
Referring to fig. 2, a transparent conductive layer 41 may be disposed on the transparent member 61 and the color resist layer 31 to cover the transparent member 61 and the color resist layer 31. Referring to fig. 2, a transparent conductive layer 41 may be disposed on the transparent element 61 and the color resist layer 31 in conformity with the transparent element 61, according to an exemplary embodiment of the present invention. In other words, the transparent conductive layer 41 may be provided on the transparent member 61 and the color resist layer 31 at a constant thickness.
As shown in fig. 2, a gap sub-layer 51 may be disposed on a portion of the transparent conductive layer 41 that overlaps the black matrix.
In contrast to the color filter according to the related art as shown in fig. 1, in the color filter according to the exemplary embodiment of the present invention, further including the transparent member disposed between the black matrix layer and the color resist layer 31, the second portion 612 of the transparent member 61 is disposed on the black matrix, so that it is possible to prevent foreign metal objects dropped during the manufacturing process of the color filter from entering the black matrix, and thus to prevent a short circuit phenomenon from occurring. According to an exemplary embodiment of the present invention, the upper surfaces of the respective second portions 612 of the transparent element 61 may be substantially flush with each other.
According to an exemplary embodiment of the present invention, the first portion 611 of the transparent member 61 may not overlap with the black matrix or partially cover the black matrix portion. The upper surface of the first portion 611 is higher than the upper surface of the second portion 612 to form a groove. The groove can provide a high-low step difference, so that a space is provided for a metal foreign matter which may fall on the black matrix layer in the color filter manufacturing process, and a short circuit phenomenon caused by the metal foreign matter on a circuit on the array substrate is avoided. In an embodiment, the sum of the heights of the first portion 611 of the transparent element 61 and the color resist layer 31 is 2 to 3 times the height of the black matrix layer 21. The upper surfaces of the first portions 611 of the transparent member 61 may be substantially flush with each other.
A method of manufacturing a color filter according to an exemplary embodiment of the present invention will be described below with reference to fig. 2 and 3A to 3D. Fig. 3A to 3D are cross-sectional views illustrating a method of manufacturing a color filter according to an exemplary embodiment of the present invention.
According to an exemplary embodiment of the present invention, first, the substrate 11 is prepared. The substrate 11 may be a transparent substrate, for example, a glass substrate.
Next, referring to fig. 3A, a black matrix layer 21 including a plurality of black matrices spaced apart from each other is disposed on the substrate 11. In an embodiment, the black matrix layer 21 may be formed on the substrate 11 through a photolithography process.
Then, referring to fig. 3B, a transparent member 61 is provided on the substrate 11 and the black matrix layer 21. The transparent member 61 is provided on the substrate 11 so as to completely cover the black matrix layer 21. As shown in fig. 2, the transparent member 61 may include a first portion 611 located between adjacent black matrices, a second portion 612 extending from the first portion to be located on the black matrices, and a third portion 613 extending from the outermost second portion 612 and covering the outer side surface of the black matrix layer 21. Here, although the transparent member 61 is shown to include three portions 611, 612, and 613, the third portion 613 may also be omitted according to an exemplary embodiment of the present invention. The upper surface of the first portion 611 is higher than the upper surface of the second portion 612 to form a groove.
The transparent member 61 may be formed by a photolithography process or an inkjet process. The transparent member 61 having the groove may be formed by an exposure and development process among the manufacturing processes of the transparent member 61. In an embodiment, the groove may be formed by a step difference in thickness of the film layer formed due to a difference in the aperture ratio of the mask.
Next, referring to fig. 3C, a color resist layer 31 is formed on the first portion 611 of the transparent member 61.
Then, referring to fig. 3D, a transparent conductive layer 41 is disposed on the transparent member 61 and the color resist layer 31, conformally with the transparent member 61.
Referring back to fig. 2, a gap sub-layer 51 is disposed on a portion of the transparent conductive layer 41 overlapping the black matrix.
According to the color filter of the exemplary embodiment of the present invention, by disposing the transparent member between the color filter layer and the black matrix layer such that a portion of the transparent member (i.e., the second portion 612) is disposed on the black matrix, the black matrix is protected from metallic foreign substances that may fall on the black matrix in the manufacturing process of the color filter. In addition, the upper surface of the first part of the transparent element is higher than the upper surface of the second part to form a groove, so that a space is provided for a metal foreign body generated on the black matrix layer by falling in the color filter manufacturing process, and the short circuit phenomenon of a circuit on the array substrate caused by the metal foreign body is improved.
Although a few exemplary embodiments of the present invention have been shown and described, it would be appreciated by those skilled in the art that changes may be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the claims and their equivalents.
Claims (9)
1. A color filter, comprising:
a transparent substrate;
a black matrix layer disposed on the transparent substrate and including a plurality of black matrices spaced apart from each other;
a color resist layer disposed between the plurality of black matrices on the black matrix layer;
a transparent element disposed between the black matrix layer and the color photoresist layer on the transparent substrate to completely cover the black matrix layer,
wherein the transparent element comprises a first part positioned below the color photoresist layer and positioned between the adjacent black matrixes and a second part extending from the first part to be positioned on the black matrixes, wherein the upper surface of the first part of the transparent element is higher than that of the second part of the transparent element, and the color photoresist layer is only arranged on the first part of the transparent element.
2. The color filter of claim 1, wherein the transparent element further comprises a third portion extending from the outermost second portion and covering an outer side surface of the black matrix layer.
3. The color filter of claim 1, wherein the sum of the heights of the color resist layer and the first portion of the transparent element is 2 to 3 times the height of the black matrix layer.
4. The color filter of claim 1, wherein the upper surfaces of the color resist layers are at the same level.
5. The color filter of claim 1, further comprising:
a transparent conductive layer disposed on the transparent element and the color resist layer to cover the transparent element and the color resist layer; and
and a gap sub-layer disposed on a portion of the transparent conductive layer overlapping the black matrix.
6. A method of manufacturing a color filter, the method comprising:
preparing a transparent substrate;
disposing a black matrix layer including a plurality of black matrices spaced apart from each other on a transparent substrate;
disposing a transparent member on the transparent substrate to completely cover the black matrix layer, wherein the transparent member includes a first portion under the color resist layer and between adjacent black matrices and a second portion extending from the first portion to be on the black matrices;
a color resist layer is disposed on the first portion of the transparent member and between the plurality of black matrices,
wherein an upper surface of the first portion of the transparent element is higher than an upper surface of the second portion of the transparent element.
7. The method of claim 6, wherein the transparent element further comprises a third portion extending from the outermost second portion and covering an outer side surface of the black matrix layer.
8. The method of claim 6, wherein the sum of the heights of the color resist layer and the first portion of the transparent element is 2 to 3 times the height of the black matrix layer.
9. The method of claim 6, wherein the method further comprises:
arranging a transparent conductive layer on the transparent element and the color photoresist layer; and
a gap sub-layer is provided on a portion of the transparent conductive layer overlapping the black matrix.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711462206.6A CN108181757B (en) | 2017-12-28 | 2017-12-28 | Color filter and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711462206.6A CN108181757B (en) | 2017-12-28 | 2017-12-28 | Color filter and manufacturing method thereof |
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| Publication Number | Publication Date |
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| CN108181757A CN108181757A (en) | 2018-06-19 |
| CN108181757B true CN108181757B (en) | 2020-09-18 |
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2017
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| CN1567033A (en) * | 2003-07-08 | 2005-01-19 | 友达光电股份有限公司 | Liquid crystal display panel capable of preventing short circuit and method for making same |
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| CN108181757A (en) | 2018-06-19 |
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Address after: 9-2 Tangming Avenue, Guangming New District, Shenzhen City, Guangdong Province Patentee after: TCL China Star Optoelectronics Technology Co.,Ltd. Address before: 9-2 Tangming Avenue, Guangming New District, Shenzhen City, Guangdong Province Patentee before: Shenzhen China Star Optoelectronics Technology Co.,Ltd. |
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