CN104298081B - A kind of exposure machine - Google Patents
A kind of exposure machine Download PDFInfo
- Publication number
- CN104298081B CN104298081B CN201410635850.9A CN201410635850A CN104298081B CN 104298081 B CN104298081 B CN 104298081B CN 201410635850 A CN201410635850 A CN 201410635850A CN 104298081 B CN104298081 B CN 104298081B
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- platform
- reflection
- lifting rod
- exposure
- reflecting
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- 239000000758 substrate Substances 0.000 claims description 31
- 238000001514 detection method Methods 0.000 claims description 15
- 230000000694 effects Effects 0.000 abstract description 12
- 238000000034 method Methods 0.000 abstract description 4
- 238000005286 illumination Methods 0.000 abstract 2
- 239000011521 glass Substances 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 5
- 230000007246 mechanism Effects 0.000 description 5
- 230000007547 defect Effects 0.000 description 4
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000003028 elevating effect Effects 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000000284 resting effect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
The present invention relates to the technical field that display device makes, disclose a kind of exposure machine.This exposure machine comprises at least one exposing unit, and each exposing unit includes: multiple spaced support platforms, and is provided with lifting arm between adjacent two support platforms, has gap between each support platform that each lifting arm is adjacent；Wherein, each support platform is provided with the reflection platform for the light in reflected illumination to described gap towards the side of its adjacent lifting arm, and the reflecting surface of described reflection platform is lower than the supporting surface of described lifting arm.In technique scheme, by the reflection platform reflected illumination that arranges to the light in gap so that be irradiated to support platform, the reflection light of light between lifting arm and gap is similar, thus improve the exposure machine effect to base plate exposure.
Description
Technical Field
The invention relates to the technical field of display device manufacturing, in particular to an exposure machine.
Background
With the development of times, the larger the substrate glass in the thin film transistor manufacturing industry is, the larger the substrate glass is, the breakage of the substrate glass is easily caused due to the overlarge substrate when the glass substrate enters the exposure machine in the manufacturing process, so that the LiftPin which previously receives the substrate glass is changed into the lifting rod in a high-generation line (G6 or more), the gap between the platform (Chuck) for placing the glass substrate by the exposure machine and the lifting rod is correspondingly increased, the exposure amount of the gap is different from that of other places during exposure, the defect of the lifting rod is formed, and the yield of products is finally influenced.
In order to improve the defects, a set of unit components (including a shielding component, a linear motor, a new manufacturing guide rail and the like) is added in the glass substrate exposure machine in the prior art, the shielding component is moved between the substrate glass and the lifting rod by the linear motor before exposure, and the effect of the defects of the lifting rod is reduced by adopting the same material as the base platform. It is true that this method may improve the lift bar defect, but it is not time-consuming to add the component inside the already crowded exposure machine, and if it is desired to achieve the requirement of the patent inside the exposure machine, the precision of the linear motor will be very high, the cost of the equipment will be greatly increased, and in the large generation line (≧ G6), the substrate glass platform (Chuck) in the exposure machine is composed of multiple blocks, the influence on the whole flatness is large after the shielding component is installed on the guide rail added on the opposite side of the two adjacent platforms, if there is a small difference in height between the adjacent platforms, the influence in the exposure machine with such high precision requirement is also large.
Disclosure of Invention
The invention provides an exposure machine which is used for improving the effect of substrate exposure. The invention provides an exposure machine, which comprises at least one exposure unit, wherein each exposure unit comprises: the lifting device comprises a plurality of supporting platforms which are arranged at intervals, lifting rods are arranged between every two adjacent supporting platforms, and a gap is reserved between each lifting rod and each adjacent supporting platform; and one side of each supporting platform, which faces to the adjacent lifting rod, is provided with a reflecting platform used for reflecting light rays irradiated into the gap, and the reflecting surface of the reflecting platform is lower than the supporting surface of the lifting rod.
In the technical scheme, the light rays irradiated into the gap are reflected by the arranged reflection platform, so that the reflection light rays irradiated into the light rays among the supporting platform, the lifting rod and the gap are similar, and the exposure effect of the exposure machine on the substrate is improved.
Preferably, the reflecting surface of the reflecting platform partially overlaps with the vertical projection of the supporting surface of the lifting rod on the horizontal plane. The reflecting platform can completely shield the gap.
Preferably, notches for avoiding the reflecting platform are respectively arranged on two sides of the lifting rod. So that the reflecting surface of the reflecting platform can be closer to the supporting surface of the supporting platform.
Preferably, the cross section of the lifting rod is T-shaped. The arrangement of the lifting rod is convenient.
Preferably, the reflecting surface of the reflecting platform is spaced from the resting surface of the support platform by a distance less than the width of the gap between the lifting bar and the support platform. The influence of the clearance on the exposure is improved, and the exposure effect is improved.
Preferably, each supporting platform is provided with a storage groove for storing the reflecting platform, and a telescopic device connected with the reflecting platform is arranged in the storage groove. The safety and integrity of the reflection platform are improved, and the reflection platform is easy to transport.
Preferably, the telescopic device comprises a plurality of telescopic rods, one end of each telescopic rod is fixedly connected with the side wall of the storage groove, and the other end of each telescopic rod is fixedly connected with the reflection platform. Different telescopic devices are adopted to drive the reflecting platform.
Preferably, the telescopic device comprises at least one linear motor, and each linear motor is fixedly connected with the reflecting platform through a connecting rod. Different telescopic devices are adopted to drive the reflecting platform.
Preferably, the telescopic means comprise a plurality of actuating hydraulic cylinders or a plurality of actuating pneumatic cylinders. Different telescopic devices are adopted to drive the reflecting platform.
Preferably, the method further comprises the following steps: a detection device for detecting the substrate;
and the control device is in signal connection with the detection device and the telescopic device respectively, and controls the telescopic device to drive the reflection platform to extend out of the storage tank for a set distance when receiving a first signal that the detection device detects the substrate. The automation degree is improved.
Drawings
FIG. 1 is a top view of an exposure machine provided by an embodiment of the present invention;
fig. 2 is a side view of an exposure unit of an exposure machine according to an embodiment of the present invention;
fig. 3 is a side view of another exposure unit of the exposure machine according to the embodiment of the present invention;
fig. 4 is a reference diagram of a usage status of another exposure unit according to an embodiment of the present invention.
Reference numerals:
10-Exposure Unit 11-support platform 12-Lift rods
13-gap 14-reflecting platform 15-storage tank
16-telescoping device 17-detection device 18-control device
20-substrate
Detailed Description
In order to improve the exposure effect of the exposure machine on the substrate, the embodiment of the invention provides the exposure machine. In order to make the objects, technical solutions and advantages of the present invention more clear, the present invention is further described in detail below by way of non-limiting examples.
As shown in fig. 1 and 2, fig. 1 shows a top view of an exposure machine provided by an embodiment of the present invention, and fig. 2 shows a side view of an exposure unit.
The embodiment of the invention provides an exposure machine, which comprises at least one exposure unit 10, wherein each exposure unit 10 comprises: a plurality of support platforms 11 are arranged at intervals, lifting rods 12 are arranged between two adjacent support platforms 11, and a gap 13 is reserved between each lifting rod 12 and each adjacent support platform 11; wherein, one side of each supporting platform 11 facing to the adjacent lifting rod 12 is provided with a reflecting platform 14 for reflecting the light irradiated into the gap 13, and the reflecting surface of the reflecting platform 14 is lower than the supporting surface of the lifting rod 12.
In the above technical solution, the light irradiated into the gap 13 is reflected by the arranged reflection platform 14, so that the reflected light of the light irradiated between the support platform 11, the lifting rod 12 and the gap 13 is similar, and the exposure effect of the exposure machine on the substrate 20 is improved.
For the convenience of understanding of the embodiment of the present invention, the following detailed description will be made, as shown in fig. 1, the exposure machine includes a plurality of exposure units 10, each exposure unit 10 includes a plurality of support platforms 11, and in a specific structure shown in fig. 1, one exposure unit 10 includes two support platforms 11, a lifting rod 12 is disposed between the two support platforms 11, the other exposure unit 10 includes three support platforms 11, and a lifting rod 12 is disposed between two adjacent support platforms 11; as can be seen from fig. 1, the exposure unit 10 of the exposure machine may adopt the different configurations described above, and it should be understood that the above-described exposure unit 10 is merely illustrated as an exposure unit 10 using one movable two lift rods 12, and the exposure unit 10 may further have three, four, etc. different numbers of lift rods 12, whose configurations are similar to those shown in fig. 1 and will not be described in detail herein.
As shown in fig. 2, the exposure unit 10 provided by the embodiment of the present invention is described in detail by taking the exposure unit 10 using one lifting rod 12 as an example, wherein the exposure unit 10 includes two support platforms 11, a placing gap for placing the lifting rod 12 is formed between the two support platforms 11, and when the lifting rod 12 is disposed in the placing gap, gaps 13 are respectively formed between both sides of the lifting rod 12 and the corresponding support platforms 11; in order to avoid the adverse effect of the gap 13 on the exposure, specifically, the exposure unit 10 provided in this embodiment adopts the reflective platform 14 disposed on the supporting platform 11, and the reflective platform 14 is used to shield the gap 13 between the lifting rod 12 and the supporting platform 11, so that when the light is irradiated, the light irradiated on the supporting platform 11, the lifting rod 12 and the reflective platform 14 is reflected approximately, thereby improving the exposure effect. Specifically, the exposure machine is provided with an elevating mechanism for driving the lifting rod 12 to ascend and descend (the mechanism is a mechanism common in the exposure machine in the prior art and will not be described in detail here), when the exposure unit 10 is used, firstly, the lifting rod 12 is driven by the elevating mechanism to ascend and receive the substrate 20, after the substrate 20 is placed on the lifting rod 12, the lifting rod 12 descends, so that the substrate 20 is placed on the supporting platform 11, the exposure machine exposes the substrate 20, the reflection surface of the whole exposure unit 10 is composed of the upper surfaces of the supporting platform 11, the lifting rod 12 and the reflection platform 14, thereby reducing the difference of light after reflection as much as possible, and improving the effect of the substrate 20 during exposure.
With continued reference to fig. 2, in order to improve the reflection effect of the reflection platform 14, it is preferable that the reflection surface of the reflection platform 14 partially overlaps the vertical projection of the support surface of the lifting bar 12 on the horizontal plane. Therefore, the reflecting platform 14 can completely shield the gap 13 between the lifting rod 12 and the supporting platform 11, the influence of the gap 13 on the exposure of the substrate 20 during exposure is reduced, and the reliability of the whole device is improved. Meanwhile, the stacked arrangement reduces the installation precision of the whole mechanism and facilitates the production of the whole device.
In order to make the surfaces of the supporting platform 11, the lifting rod 12 and the reflecting platform 14 facing the base plate 20 on the same horizontal plane as much as possible, it is preferable that notches for avoiding the reflecting platform 14 are respectively provided on both sides of the lifting rod 12. Therefore, the reflecting surface of the reflecting platform 14 can be better close to the supporting surface of the supporting platform 11, the difference of the reflected light intensity caused by the height difference of the two surfaces is reduced, and the exposure effect is improved. Specifically, as shown in fig. 2, the notches are symmetrically arranged on the lifting rod 12, and the cross section of the lifting rod 12 is T-shaped. In order to further reduce the influence of the height difference between the reflecting surface of the reflecting platform 14 and the supporting surface of the supporting platform 11 on the reflected light when the above structure is adopted, it is preferable that the distance from the reflecting surface of the reflecting platform 14 to the placing surface of the supporting platform 11 is smaller than the width of the gap 13 between the lifting rod 12 and the supporting platform 11. The influence of the height difference between the two surfaces on the reflected light is effectively reduced.
In addition, with the exposure machine provided in the present embodiment, since there is a certain gap 13 between the reflection surface of the reflection platform 14 and the lifting rod 12 in the vertical height, when there is a difference in the height of the two support platforms 11 (i.e., when the two support platforms 11 incline the whole exposure unit 10 due to the unevenness of the placing surface), the reflection platform 14 can still block the gap 13 between the support platforms 11 and the lifting rod 12, and the practicability of the whole equipment is improved.
In addition to the above-described improvement of the structure of the lifting rod 12, the exposure machine provided in the present embodiment further improves the stability of the whole apparatus in use by adopting the structure shown in fig. 3 and 4, and reduces the occurrence of failure.
Specifically, fig. 3 and 4 are also referred to. Fig. 3 shows another structure of the exposure unit 10, and fig. 4 shows a reference diagram of a use state of the exposure unit 10.
As shown in fig. 3, each supporting platform 11 is provided with a storage groove 15 for storing the reflection platform 14, and a telescopic device 16 connected to the reflection platform 14 is arranged in the storage groove 15. Therefore, the reflection platform 14 can realize the telescopic function through the telescopic device 16, specifically, when the exposure device is used, the telescopic device 16 controls the reflection platform 14 to extend out of the storage groove 15, so that the reflection platform 14 shields the gap 13 between the lifting rod 12 and the supporting platform 11, and when the exposure device is not used, the reflection platform 14 is controlled to retract into the storage groove 15, so that the reflection platform 14 is prevented from being damaged, if the whole exposure device is in the transportation process, the reflection platform 14 is easy to damage, so that the reflection platform 14 is invalid, and the use of the whole exposure unit 10 is further influenced.
In a specific arrangement, the telescopic device 16 may be different telescopic devices 16, such as: the telescopic device 16 comprises a plurality of telescopic rods, one end of each telescopic rod is fixedly connected with the side wall of the storage groove 15, and the other end of each telescopic rod is fixedly connected with the reflection platform 14. The reflection platform 14 is connected with the supporting platform 11 through a plurality of telescopic rods, and the telescopic rods are arranged along the length direction of the supporting platform 11, so that the whole reflection platform 14 can be ensured not to be bent when extending out of or retracting into the storage groove 15. The control of the extension or retraction of the reflective platform 14 can be manually controlled by a telescopic rod. In addition, the telescopic device 16 may further include at least one linear motor, and each linear motor is fixedly connected to the reflective platform 14 through a connecting rod. The mechanical control of the reflective platform 14 is achieved by a linear motor, and thus the control of the motion of the reflective platform 14 is achieved by a mechanical drive. When mechanical control is adopted, the following structure can also be adopted: the telescopic means 16 comprise a plurality of actuating hydraulic cylinders or a plurality of actuating pneumatic cylinders. The control of the movement of the reflective platform 14 is achieved by driving cylinders and driving hydraulic cylinders.
It can be seen from the above description that the control of the movement of the reflective platform 14 can be realized by different structures, and it should be understood that the exposure unit 10 provided in this embodiment is not limited to the telescopic device 16 provided in the above specific embodiment, and any other driving structure capable of realizing the extension/retraction of the reflective platform 14 from the storage slot 15 can be applied to this embodiment.
In addition, in order to further provide a degree of automation of the entire apparatus, it is preferable that the exposure unit 10 further includes: a detection device 17 for detecting the substrate 20;
and the control device 18 is respectively in signal connection with the detection device 17 and the telescopic device 16, and controls the telescopic device 16 to drive the reflection platform 14 to extend out of the storage tank 15 for a set distance when receiving a first signal that the detection device 17 detects the substrate 20.
Specifically, the detection device 17 detects the placement of the substrate 20, and the detection device 17 may select different detection components such as a proximity switch or a sensor, for example, when the proximity switch is used, the detection component is specifically arranged as shown in fig. 3 or fig. 4 and is arranged on the outer side of one supporting platform 11 close to the supporting surface, and when the substrate 20 is placed on the supporting surface, the proximity switch can detect the substrate 20. When the whole exposure unit 10 is used, the control device 18, upon receiving a first signal that the detection device 17 detects the substrate 20, can control the reflection platform 14 to extend out of the storage tank 15 by a set distance, which can be determined according to actual conditions, and the set distance can ensure that the reflection surface of the reflection platform 14 can partially overlap with the vertical projection of the lifting rod 12 on the horizontal plane.
It will be apparent to those skilled in the art that various changes and modifications may be made in the present invention without departing from the spirit and scope of the invention. Thus, if such modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalents, the present invention is also intended to include such modifications and variations.
Claims (6)
1. An exposure machine, comprising at least one exposure unit, each exposure unit comprising: the lifting device comprises a plurality of supporting platforms which are arranged at intervals, lifting rods are arranged between every two adjacent supporting platforms, and a gap is reserved between each lifting rod and each adjacent supporting platform; a reflection platform used for reflecting light rays irradiated into the gap is arranged on one side, facing the adjacent lifting rod, of each support platform, and the reflection surface of each reflection platform is lower than the support surface of the lifting rod; wherein,
the reflecting surface of the reflecting platform is partially overlapped with the vertical projection of the supporting surface of the lifting rod on the horizontal plane; notches for avoiding the reflecting platform are respectively arranged on two sides of the lifting rod; the cross section of the lifting rod is T-shaped; the distance between the reflecting surface of the reflecting platform and the placing surface of the supporting platform is less than the width of the gap between the lifting rod and the supporting platform.
2. Exposure machine according to claim 1, wherein a storage tank is provided on each support platform for storing the reflection platform, wherein a telescopic device is provided in the storage tank, which telescopic device is connected to the reflection platform.
3. The exposure apparatus according to claim 2, wherein the extension and retraction device comprises a plurality of extension and retraction rods, each of which has one end fixedly connected to a side wall of the storage tank and the other end fixedly connected to the reflective platform.
4. Exposure machine according to claim 2, wherein the telescopic means comprise at least one linear motor, each linear motor being fixedly connected to the reflection platform by means of a connecting rod.
5. Exposure machine according to claim 2, wherein the telescopic means comprise a plurality of driving cylinders or a plurality of driving cylinders.
6. The exposure machine according to claim 2, further comprising: a detection device for detecting the substrate;
and the control device is in signal connection with the detection device and the telescopic device respectively, and controls the telescopic device to drive the reflection platform to extend out of the storage tank for a set distance when receiving a first signal that the detection device detects the substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410635850.9A CN104298081B (en) | 2014-11-05 | 2014-11-05 | A kind of exposure machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410635850.9A CN104298081B (en) | 2014-11-05 | 2014-11-05 | A kind of exposure machine |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104298081A CN104298081A (en) | 2015-01-21 |
| CN104298081B true CN104298081B (en) | 2016-07-06 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410635850.9A Expired - Fee Related CN104298081B (en) | 2014-11-05 | 2014-11-05 | A kind of exposure machine |
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Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105045048B (en) * | 2015-09-16 | 2017-05-03 | 京东方科技集团股份有限公司 | Exposure base platform and exposure device |
| CN105319870A (en) * | 2015-11-20 | 2016-02-10 | 苏州赛森电子科技有限公司 | Induction device applicable to wafer photolithography process |
| CN106773553B (en) * | 2017-03-06 | 2018-11-30 | 重庆京东方光电科技有限公司 | Bogey and exposure sources |
| JP7016825B2 (en) * | 2018-05-30 | 2022-02-07 | キヤノン株式会社 | Method of manufacturing substrate holding device, exposure device and article |
| CN111061131B (en) * | 2019-12-16 | 2022-04-05 | Tcl华星光电技术有限公司 | Exposure machine |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100819369B1 (en) * | 2001-12-31 | 2008-04-04 | 엘지.필립스 엘시디 주식회사 | A chuck for exposure |
| KR101265081B1 (en) * | 2004-06-30 | 2013-05-16 | 엘지디스플레이 주식회사 | Chuck for exposing and method for fabricating of liquid crystal display device |
| JP4514657B2 (en) * | 2005-06-24 | 2010-07-28 | 株式会社Ｓｏｋｕｄｏ | Substrate processing equipment |
| CN202563243U (en) * | 2012-04-13 | 2012-11-28 | 合肥京东方光电科技有限公司 | Exposing machine of glass substrate |
| CN203117640U (en) * | 2013-03-19 | 2013-08-07 | 深圳市华星光电技术有限公司 | Glass substrate support mechanism for exposure machine |
| KR102171583B1 (en) * | 2013-04-01 | 2020-10-30 | 삼성디스플레이 주식회사 | Substrate holding apparatus and method |
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2014
- 2014-11-05 CN CN201410635850.9A patent/CN104298081B/en not_active Expired - Fee Related
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| CN104298081A (en) | 2015-01-21 |
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Granted publication date: 20160706 Termination date: 20211105 |