CN104269448A - Front electrode grid line for photovoltaic cell - Google Patents

Front electrode grid line for photovoltaic cell Download PDF

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Publication number
CN104269448A
CN104269448A CN201410563662.XA CN201410563662A CN104269448A CN 104269448 A CN104269448 A CN 104269448A CN 201410563662 A CN201410563662 A CN 201410563662A CN 104269448 A CN104269448 A CN 104269448A
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Prior art keywords
slurry
grid line
electrode grid
front electrode
parts
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CN201410563662.XA
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CN104269448B (en
Inventor
周欣山
汪山
傅坚
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Suzhou Jingyin New Material Technology Co.,Ltd.
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Suzhou Jingyin New Materials Co Ltd
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Priority to CN201410563662.XA priority Critical patent/CN104269448B/en
Priority claimed from CN201210190153.8A external-priority patent/CN102709394B/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0224Electrodes
    • H01L31/022408Electrodes for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/022425Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/042PV modules or arrays of single PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

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  • Engineering & Computer Science (AREA)
  • Photovoltaic Devices (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Sustainable Energy (AREA)

Abstract

The invention discloses a front electrode grid line for a photovoltaic cell. The front electrode grid line is composed of a first slurry layer and a second slurry layer located on the upper surface of the first slurry layer; the first slurry layer and the second slurry layer are contained in a container connected with a lower spraying nozzle and a container connected with an upper spraying nozzle respectively, and are tightly attached to the lower spraying nozzle and the upper spraying nozzle respectively in parallel, and the upper spraying nozzle is located on the upper lateral face of the lower spraying nozzle; an organic carrier in first slurry is made in the mode that terpilenol, butyl carbitol, ethyecellulose and the balance are heated and stirred according to the weight part proportion of 55:30:10:5; an organic carrier in second slurry is made in the mode that terpilenol, butyl carbitol, ethyecellulose and the balance are heated to 60 DEG C according to the weight part proportion of 53:28:14:5; the width of the front electrode grid line for the cell ranges form 75 micrometers to 100 micrometers; the height of the front electrode grid line for the cell ranges form 40 micrometers to 70 micrometers. The front electrode grid line meets the requirements for electrode shapes and the electric conduction capacity, silicon wafer crashing caused by pressure applied to a silicon wafer in the machining process is avoided, and the formed front electrode metal grid line is in good contact with the silicon wafer.

Description

Photovoltaic cell front electrode grid line
Technical field
The present invention relates to a kind of photovoltaic cell front electrode grid line, belong to solar cell preparing technical field.
Background technology
Solar cell is the semiconductor device with " photovoltaic effect ", and the PN junction of this device is produced voltage by after illumination, and namely luminous energy produces the process of electric energy, so, according to above-mentioned principle, it is crucial that must there be connected loop that electric energy is formed electric current, could use.Therefore electrode extracted current is prepared on the surface of solar cell, just extremely important.At present, the scheme of industrialization makes electrode at the two-face printing slurry of solar cell respectively, and wherein a kind of is aluminium for rear surface of solar cell or aluminium/silver electrode; Another kind is the silver electrode for solar cell sensitive surface (front), and compared to the performance of solar cell, the requirement of its front electrode is very high, because it directly can affect the conversion efficiency (key performance) of solar cell.In general, front electrode grid line must possess following condition: have low contact resistance and volume resistance, and the depth-width ratio of electrode wants large, reduces the impact absorbed sunlight.The main method preparing front electrode grid line is at present silk-screen printing technique.Silk-screen printing technique is applied to the manufacture of solar-energy photo-voltaic cell as mature process a kind of morning, but, silk-screen printing technique is adopted to also have a defect, be difficult to exactly obtain the very large gate electrode line of depth-width ratio, in general, the depth-width ratio of the gate electrode line that silk-screen printing technique makes is less than 0.3, and this is all because the restriction of the factor such as viscosity, squeegee pressure, screen thickness of slurry.Meanwhile, current silk screen printing mainly adopts one-step print technology, and thus adopted slurry also will meet the requirement to electrode shape and conductive capability while should meeting the requirement of electrode pair contact interface.Thus current slurry can only seek balance between the two.
Summary of the invention
The invention provides a kind of photovoltaic cell front electrode grid line, this front electrode grid line is prepared the front electrode of solar battery of depth-width ratio and is solved positioning precision problem; Secondly, the requirement to electrode shape and conductive capability can be met, the pressure be applied on silicon chip in the course of processing can be avoided to cause die crack.
For achieving the above object, the technical solution used in the present invention is: a kind of photovoltaic cell front electrode grid line, and described front electrode grid line is made up of the first pulp layer, the second pulp layer of being positioned at this first pulp layer upper surface;
First slurry, the second slurry are respectively charged into the container be connected with lower nozzle, top nozzle, and described lower nozzle and top nozzle are parallel closely to be arranged and top nozzle is positioned at lower nozzle upper side, and lower nozzle and top nozzle gait of march are 125mm/s; Battery front side electrode grid line bake out temperature 140 ~ 160 DEG C, drying time 14 ~ 16 minutes;
Described first slurry is made up of the component of following weight ratio:
Organic carrier 23 parts,
70 parts, silver powder,
5 parts, glass dust,
Ohmic contact additive 2 parts,
In described first slurry, organic carrier is heated to 60 DEG C by terpinol, butyl carbitol, ethyl cellulose, surplus according to 55:30:10:5 weight ratio, stirs and is mixed to form at least 2 hours;
Described second slurry is made up of the component of following weight ratio:
Organic carrier 10 parts,
85 parts, silver powder,
1 part, glass dust,
Metal adhesive 4 parts,
In described second slurry, organic carrier is heated to 60 DEG C by terpinol, butyl carbitol, ethyl cellulose, surplus according to 53:28:14:5 weight ratio, stirs and is mixed to form at least 2 hours;
The particle diameter of described silver powder is 0.01 ~ 10 μm, and described glass dust is boron-silicon-lead, and described in this, glass dust softening point should be 350 ~ 550 DEG C, and meanwhile, its particle diameter is 0.05 ~ 2 μm; Described battery front side electrode grid line width is 75 ~ 100 μm, is highly 40 ~ 70 μm.
The technical scheme improved further in technique scheme is as follows:
1, in such scheme, described first slurry grinds after 30 minutes and obtains after stirring on three-roll grinder; Grind on three-roll grinder after 30 minutes after the configuration stirring of described second slurry and obtain.
2, in such scheme, the particle diameter of described silver powder is 0.05 ~ 2 μm.
3, in such scheme, described lower nozzle lowest part is from solar cell 0.1mm ~ 5mm.
Because technique scheme is used, the present invention compared with prior art has following advantages and effect:
1, the first slurry that the present invention adopts special formulation and technique mainly meets the requirement to contact interface, the requirement adopting the second slurry of special formulation and technique to be superimposed upon the first pulp layer upper surface to be mainly used to meet electrode shape and conductive capability; Secondly, first slurry (A), the second slurry (B) are respectively charged into the container be connected with lower nozzle, top nozzle, described lower nozzle and top nozzle are parallel closely to be arranged and lower nozzle is positioned at top nozzle upper side, once spray two kinds of slurries, described lower nozzle spray pressure is 0.5MPa, described top nozzle spray pressure is 0.65MPa, thus solves the positioning precision between the first pulp layer and the second pulp layer.
2, the present invention adopts specific component formula and the first pulp layer thereof and the second pulp layer matched combined, and work the inorganic carrier grilling thoroughly anti-reflection layer and cementation when organic carrier and sintering, micro silver powder is as electric conductor.The metal oxide composition of specific inorganic carrier and organic carrier combination low-melting glass micro mist and a sintering aids role, improve the ability of grilling thoroughly of anti-reflection layer and the adhesion of electrode pair cell substrate, inorganic carrier also plays a part very crucial to the reduction of contact resistance.
3, the present invention adopts the spray nozzle device of two shower nozzles, once sprays two kinds of slurries, continuous spray front electrode grid line on silicon chip, and the first slurry of lower nozzle spraying, in order to strengthen the ohmic contact of front electrode grid line and silicon chip, reduces contact resistance; Second slurry of lower nozzle spraying, in order to strengthen the conductance of front electrode grid line, reduces the volume resistance of gate electrode line.First slurry and the second slurry form the front electrode metal grid lines of unification after drying sintering.The front electrode metal grid lines of final formation not only has good contacting with silicon chip, and electrode metal grid line itself also has good electric conductivity, and the depth-width ratio of obtainable metal grid lines is greater than 0.3.
Accompanying drawing explanation
Accompanying drawing 1 is that in the technique of front electrode grid line of the present invention, shower nozzle fixes schematic diagram;
Accompanying drawing 2 is schematic diagram when silicon chip of the present invention is fixed;
Accompanying drawing 3 is the structural representation of battery front side of the present invention.
In above accompanying drawing: 1, the first pulp layer; 2, the second pulp layer; 3, top nozzle; 4, lower nozzle; 5, battery.
Embodiment
Below in conjunction with embodiment, the invention will be further described:
Embodiment 1-5: a kind of photovoltaic cell front electrode grid line, as illustrated in the accompanying drawings from 1 to 3, described battery front side electrode grid line is made up of the first pulp layer 1, the second pulp layer 2 of being positioned at this first pulp layer 1 upper surface;
First slurry (A), the second slurry (B) are respectively charged into the container be connected with lower nozzle 4, top nozzle 3, and described lower nozzle 4 and top nozzle tight 3 walk abreast and to arrange and top nozzle 3 is positioned at lower nozzle 4 upper side with pasting; Described lower nozzle 4 spray pressure is 0.5MPa, and described top nozzle 3 spray pressure is 0.65MPa, and lower nozzle 4 and top nozzle 3 gait of march are 125mm/s; Battery 5 front electrode grid line bake out temperature 140 ~ 160 DEG C, drying time 14 ~ 16 minutes;
Described first slurry (A) is made up of the component of following weight ratio:
Organic carrier 23 parts,
70 parts, silver powder,
5 parts, glass dust,
Ohmic contact additive 2 parts,
In described first slurry (A), organic carrier is heated to 60 DEG C by terpinol, butyl carbitol, ethyl cellulose, surplus according to 55:30:10:5 weight ratio, stirs and is mixed to form at least 2 hours;
Described second slurry (B) is made up of the component of following weight ratio:
Organic carrier 10 parts,
85 parts, silver powder,
1 part, glass dust,
Metal Phase binding agent 4 parts,
In described second slurry (B), organic carrier is heated to 60 DEG C by terpinol, butyl carbitol, ethyl cellulose, surplus according to 53:28:14:5 weight ratio, stirs and is mixed to form at least 2 hours;
Described silver powder particle diameter embodiment 1 is 2 μm, and embodiment 2 is 6 μm, and embodiment 3 is 9 μm, and embodiment 4 is 0.05 μm, and embodiment 5 is 2 μm;
Described glass dust is boron-silicon-lead.
Described battery front side electrode grid line width dimensions is as shown in table 1:
Table 1
Above-mentioned first slurry (A) is ground after 30 minutes and is obtained after stirring on three-roll grinder; Grind on three-roll grinder after 30 minutes after the configuration stirring of described second slurry (B) and obtain.
Above-mentioned lower nozzle 4 lowest part is from solar cell 0.1mm ~ 5mm, and embodiment 1 is 0.1mm, and embodiment 2 is 1 mm, and embodiment 3 is 2mm, and embodiment 4 is 3.5mm, and embodiment 5 is 5mm.
Above-mentioned glass dust softening point should be 350 ~ 550 DEG C, and meanwhile, its particle diameter is described silver powder particle diameter embodiment 1 is 0.05 μm, and embodiment 2 is 0.02 μm, and embodiment 3 is 1 μm, and embodiment 4 is 1.5 μm, and embodiment 5 is 2 μm.
Above-described embodiment is further described below.
Shower nozzle is placed in the top of silicon chip battery, the lowest part of its lower nozzle is from silicon chip 0.1mm ~ 5mm.First slurry A is loaded the container be connected with lower nozzle, circuit gas circuit A controls spray time and the spray pressure of lower nozzle.Slurry B is loaded the container be connected with top nozzle, circuit gas circuit B controls spray time and the spray pressure of top nozzle.By the control respectively of circuit gas circuit A and B, uniformly spray on silicon chip, fixed the first slurry A and the second slurry B by silicon chip, shower nozzle rectilinear movement or shower nozzle are fixed, and silicon wafer linear moves (as Figure of description 2).Final first slurry A and the second slurry B forms straight gate electrode line on silicon chip.
Above-mentioned obtained gate electrode line is dried in drying oven, bake out temperature 120 DEG C or 140 DEG C or 160 DEG C or 180 DEG C, drying time 10 minutes to 30 minutes.By silicon slice rotating 90 degree, use another one shower nozzle spraying bus electrode grid line or silk screen printing bus electrode grid line, repeat above-mentioned stoving process, put into sintering furnace sintering and form front electrode of solar battery grid line (as Figure of description 3).
Use solar cell test device (NCT-M) to test series resistance (Rs:m Ω cm2), adopt width and the height of the magnifying glass test electrode grid line of 100 times.
The debugging of Nozzle Parameter
First slurry A and the second slurry B are respectively charged into the container be connected with lower nozzle, top nozzle, regulate the position of shower nozzle.Utilize circuit gas circuit A to regulate lower nozzle spray pressure to 0.5MPa, spray time 1 second, shower nozzle translational speed is 125mm/ second, separately spraying slurry A on the monocrystalline silicon piece of 125mm, and silicon chip sprays out the gate electrode line of slurry A.The gate electrode line width utilizing the microscope of 100 times to test this slurry is 40 ~ 80 μm, utilizes the wet-film thickness of step instrument testing size A to be 8 ~ 10 μm.Utilize circuit gas circuit B to regulate top nozzle spray pressure to 0.65MPa, spray time 1 second, shower nozzle translational speed is 125mm/ second, and spraying slurry B on the monocrystalline silicon piece of 125mm, silicon chip sprays out the gate electrode line of slurry B separately.The gate electrode line width utilizing the microscope of 100 times to test this slurry is 40 ~ 80 μm, utilizes the wet-film thickness of step instrument testing size to be 40 ~ 60 μm.
The making of gate electrode line
The pressure of lower nozzle is adjusted to 0.5MPa by regulating circuit gas circuit A, spray time 1 second; The pressure of top nozzle is adjusted to 0.65MPa by regulating circuit gas circuit B, spray time 1 second; Setting shower nozzle translational speed is 125mm/ second, and fixing silicon chip, it is 40 ~ 80 μm that silicon chip sprays out width, is highly the gate electrode line wet film of 45 ~ 65 μm.Silicon chip is moved 2mm along the direction perpendicular to grid line, repeats above-mentioned spraying process, until the gate electrode line on whole silicon chip all sprays complete.The silicon chip having sprayed gate electrode line is put in drying oven and dries, bake out temperature 150 DEG C, drying time 15 minutes.By silicon slice rotating 90 degree, use another one shower nozzle spraying bus electrode grid line, repeat above-mentioned stoving process, put into sintering furnace sintering and form front electrode of solar battery grid line.
Above-described embodiment, only for technical conceive of the present invention and feature are described, its object is to person skilled in the art can be understood content of the present invention and implement according to this, can not limit the scope of the invention with this.All equivalences done according to Spirit Essence of the present invention change or modify, and all should be encompassed within protection scope of the present invention.

Claims (4)

1. a photovoltaic cell front electrode grid line, is characterized in that: described front electrode grid line is made up of the first pulp layer, the second pulp layer of being positioned at this first pulp layer upper surface;
First slurry, the second slurry are respectively charged into the container be connected with lower nozzle, top nozzle, and described lower nozzle and top nozzle are parallel closely to be arranged and top nozzle is positioned at lower nozzle upper side, and lower nozzle and top nozzle gait of march are 125mm/s; Battery front side electrode grid line bake out temperature 140 ~ 160 DEG C, drying time 14 ~ 16 minutes;
Described first slurry is made up of the component of following weight ratio:
Organic carrier 23 parts,
70 parts, silver powder,
5 parts, glass dust,
Ohmic contact additive 2 parts,
In described first slurry, organic carrier is heated to 60 DEG C by terpinol, butyl carbitol, ethyl cellulose, surplus according to 55:30:10:5 weight ratio, stirs and is mixed to form at least 2 hours;
Described second slurry is made up of the component of following weight ratio:
Organic carrier 10 parts,
85 parts, silver powder,
1 part, glass dust,
Metal adhesive 4 parts,
In described second slurry, organic carrier is heated to 60 DEG C by terpinol, butyl carbitol, ethyl cellulose, surplus according to 53:28:14:5 weight ratio, stirs and is mixed to form at least 2 hours;
The particle diameter of described silver powder is 0.01 ~ 10 μm, and described glass dust is boron-silicon-lead, and described in this, glass dust softening point should be 350 ~ 550 DEG C, and meanwhile, its particle diameter is 0.05 ~ 2 μm; Described battery front side electrode grid line width is 75 ~ 100 μm, is highly 40 ~ 70 μm.
2. front electrode grid line according to claim 1, is characterized in that: described first slurry grinds after 30 minutes and obtains after stirring on three-roll grinder; Grind on three-roll grinder after 30 minutes after the configuration stirring of described second slurry and obtain.
3. front electrode grid line according to claim 1, is characterized in that: the particle diameter of described silver powder is 0.05 ~ 2 μm.
4. front electrode grid line according to claim 1, is characterized in that: described lower nozzle lowest part is from solar cell 0.1mm ~ 5mm.
CN201410563662.XA 2012-06-11 2012-06-11 Front electrode grid line for photovoltaic cell Active CN104269448B (en)

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Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201410563662.XA CN104269448B (en) 2012-06-11 2012-06-11 Front electrode grid line for photovoltaic cell
CN201210190153.8A CN102709394B (en) 2012-06-11 2012-06-11 Process for preparing cathode grid line of solar cell

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CN104269448B CN104269448B (en) 2017-02-01

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050221613A1 (en) * 2004-04-06 2005-10-06 Sharp Kabushiki Kaisha Electrode formation method, electrode and solar battery
CN101728438A (en) * 2008-10-17 2010-06-09 大洲电子材料株式会社 Conductive paste composition, preparation of electrode using same and solar cell comprising same
US20100154875A1 (en) * 2008-12-22 2010-06-24 E. I. Du Pont De Nemours And Compnay & North Carolina State University Compositions and processes for forming photovoltaic devices
CN102097183A (en) * 2011-02-24 2011-06-15 汪山 Process for preparing conductive slurry for crystalline silicon solar cell front electrode
CN102152676A (en) * 2010-11-29 2011-08-17 奥特斯维能源(太仓)有限公司 Saving type ink jet printing process for solar cell grid lines

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050221613A1 (en) * 2004-04-06 2005-10-06 Sharp Kabushiki Kaisha Electrode formation method, electrode and solar battery
CN101728438A (en) * 2008-10-17 2010-06-09 大洲电子材料株式会社 Conductive paste composition, preparation of electrode using same and solar cell comprising same
US20100154875A1 (en) * 2008-12-22 2010-06-24 E. I. Du Pont De Nemours And Compnay & North Carolina State University Compositions and processes for forming photovoltaic devices
CN102152676A (en) * 2010-11-29 2011-08-17 奥特斯维能源(太仓)有限公司 Saving type ink jet printing process for solar cell grid lines
CN102097183A (en) * 2011-02-24 2011-06-15 汪山 Process for preparing conductive slurry for crystalline silicon solar cell front electrode

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Address after: 215000 100 Zhenbei Road, Tongan town, high tech Zone, Suzhou City, Jiangsu Province

Patentee after: Suzhou Jingyin New Material Technology Co.,Ltd.

Address before: 215153 north side of the 2nd floor, building 2, No. 189, Kunlunshan Road, high tech Zone, Suzhou City, Jiangsu Province

Patentee before: SUZHOU ISILVER MATERIALS Co.,Ltd.

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