CN104238273B - A kind of work stage safety device - Google Patents
A kind of work stage safety device Download PDFInfo
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- CN104238273B CN104238273B CN201310245119.0A CN201310245119A CN104238273B CN 104238273 B CN104238273 B CN 104238273B CN 201310245119 A CN201310245119 A CN 201310245119A CN 104238273 B CN104238273 B CN 104238273B
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Abstract
The present invention relates to a kind of work stage safety device, including the silicon wafer stage being arranged at above working face and coarse motion platform, also include the sports limiting mechanism being located at working face surrounding and the crashproof buffer gear being fixed on coarse motion platform, wherein, sports limiting mechanism includes that X is to position-limit mechanism and Y-direction position-limit mechanism, X includes spacing edge strip, support guide mechanism and buffer respectively to position-limit mechanism and Y-direction position-limit mechanism, spacing edge strip is fixed in support guide mechanism, and along X to or Y-direction move, buffer is fixed on spacing edge strip；Crashproof buffer gear includes colliding frame and elastic component, and the two ends of elastic component are respectively connecting to collide frame and coarse motion platform.The present invention utilizes sports limiting mechanism to limit the range of movement of work stage, when preventing from controlling to lose efficacy, work stage moves out working face, use crashproof buffer gear to reduce between work stage simultaneously, when colliding between work stage and collision frame to work stage interior arrangement and the impact of parts.
Description
Technical field
The present invention relates to semiconductor lithography apparatus field, particularly relate to a kind of work stage safety device.
Background technology
In semiconductor lithography equipment, the precision workpiece stage movement system such as silicon wafer stage and mask platform is extremely important key
Parts, its typical version is as follows: work stage is generally made up of thick, micropositioner, and the two realizes work stage jointly in space
The precise motion location in six degree of freedom direction.Along with improving constantly of super large-scale integration device integration, to litho machine
Productivity index request also constantly promoting, movement velocity, acceleration and the precision of work stage is just proposed higher by this
Requirement.
Planar motor is high owing to having force density, at high speed, the feature such as high reliability, and be prone to be integrated into by
In control object, there is fast response time, control the advantages such as highly sensitive, frame for movement is simple, be applied to high-end at present
In semiconductor lithography equipment.
Planar motor is used to realize the precision workpiece stage movement system of Long travel coarse motion, compared with conventional workpiece platform, nothing
X, Y-direction coarse motion guide rail, six-freedom micro displacement mechanism and silicon chip hold bed and be arranged on above planar motor, and work stage is at work surface
Completely freely mechanical guide rail and the constraint of mechanical position limitation when inside doing step-scan campaign, when measure system malfunctions or
When control software faults etc. causes coarse motion planar motor motor control to lose efficacy, work stage the most easily collides very with peripheral unit
To moving out working face, cause the damage of expensive components device in work stage.
At present, having a kind of work stage anticollision device, collision-prevention device, as illustrated in figs. ia and ib, this anticollision device, collision-prevention device is mainly by collision bumper
CB constitute, this collision bumper CB be provided with one collision a framework CF and connecting portion CC, when two base station W2T, W3T it
Between, or when colliding between and frame MF around work surface in base station W2T, W3T, by using NiTi
The collision bumper CB that alloy makes absorbs the big energy that collision produces.But the program there is the problem that when two substrates
Platform W2T, W3T are when off-centered position collides, and the impact that collision produces can not be evenly distributed on collision framework CF's
Collide side, and the cushion stroke of off-center impact will be more than the cushion stroke of centric(al) impact, additionally, this collision bumper CB
Being a structural member, its cushion stroke is the deflection of this structural member, even if using the mechanical structured member that Nitinol makes, and its knot
The cushion stroke that structure deformation produces is the most limited, and this can cause being delivered to base station W2T, W3T after collision bumper CB
Impulsive force excessive, cause the damage of the upper precise part of base station W2T, W3T.
Another work stage anticollision device, collision-prevention device, an embodiment of this anticollision device, collision-prevention device as shown in Figure 2 a, including anti-collision side
Frame 102, two antivibrators 104 and the guider being made up of guide post 108 and linear bearing 106, the program seems and solves
Eccentric impact can cause the problem acting on the impulsive force skewness on both sides antivibrator 104, but in esse problem is,
When bias impact is excessive, the impact stroke of two antivibrators 104 is not consistent, big near the side impact stroke of impact, away from
The side impact stroke of impact is little, and this can cause guide post 108 to reverse certain angle around Rz axle, and makes linear bearing 106
Produce a high torque between slide unit and guide rail, thus reduce service life and the reliability of anticollision device, collision-prevention device；This anticollision device, collision-prevention device
As shown in Figure 2 b, it is another embodiment with the difference of previous embodiment: utilize two pretension springs
112 composition parallelogram linkages replace linear bearing guiding mechanism, transmit off-center impact between two antivibrators 104
Power, the program there is problems of, and address only the anti-collision problem on planar direction (X to), and when two substrates
Platform WT ' time (Y-direction) high-speed motion collides in another direction, can not play good security protection effect, additionally, the party
Case also fails to the vertical support orientation problem solving crashproof frame 102 very well when work stage normally works.
Summary of the invention
The present invention provides a kind of work stage safety device, causes to avoid each work stage high-speed motion to collide
Parts damages, meanwhile, when effectively solving to occur eccentric impact, collision impact skewness on work stage anticollision device, collision-prevention device causes
Hold the problem that bed produces bigger corner.
For solving above-mentioned technical problem, the present invention provides a kind of work stage safety device, puts down including being arranged at work
Silicon wafer stage above face and coarse motion platform, also include the sports limiting mechanism being located at described working face surrounding and be fixed on described
Crashproof buffer gear on coarse motion platform, wherein,
Described sports limiting mechanism include X to position-limit mechanism and Y-direction position-limit mechanism, described X is spacing to position-limit mechanism and Y-direction
Mechanism includes that spacing edge strip, support guide mechanism and buffer, described spacing edge strip are fixed on described support guide machine respectively
On structure, and along X to or Y-direction move, described buffer is fixed on described spacing edge strip；
Described crashproof buffer gear includes colliding frame and elastic component, the two ends of described elastic component be respectively articulated with to
Described collision frame and described coarse motion platform.
It is preferred that described support guide mechanism includes at least two line slideway and is fixed on the cunning of described line slideway
Flexible strip on block, described spacing edge strip is fixed on the slide block of described line slideway by described flexible strip.
It is preferred that described flexible strip is vertical for high rigidity, level is to for low rigidity.
It is preferred that the vertical height of described spacing edge strip is corresponding with the vertical height of described silicon wafer stage center of gravity.
It is preferred that described buffer is the one in hydraulic type buffer, spring buffer or air buffer.
It is preferred that described collision frame all stretches out described silicon chip edge of table, and the inner side of described collision frame in X, Y-direction
With the maximum crash cushion stroke that the distance between the outside of corresponding coarse motion platform is more than or equal to silicon wafer stage.
It is preferred that described crashproof buffer gear is fixed on described coarse motion platform by upper and lower two installing plates.
It is preferred that be additionally provided with some eccentric adjustments between said two installing plate and coarse motion platform.
It is preferred that described collision frame all uses carbon fibre material to make with described spacing edge strip.
It is preferred that be pasted with one layer of elastomeric material outside described collision frame.
It is preferred that described elastomeric material is polyurethane or rubber.
It is preferred that the cross section of described elastic component is rectangle, and its depth-width ratio is more than 1.
It is preferred that described elastic component uses marmem to make.
It is preferred that described elastic component is 16,16 elastic components are distributed in the surrounding of described silicon wafer stage, described silicon chip
In 4 elastic components of the every side of platform, 2 is prestretched component, and remaining 2 is non-prestretched component.
Compared with prior art, the invention have the advantages that
1. constraint work stage is moved in working face, uses X, the spacing edge strip of Y-direction to add the mode of pool of buffer device, phase
Than in using an integral type Ti-Ni alloy frame structure, its manufacturing cost is lower, allows bigger cushion stroke simultaneously, produces
Less impulsive force；
2.X, the spacing edge strip of Y-direction are connected in support guide mechanism by flexible strip, it is achieved that the decoupling that Rz is axial,
X, Y-direction spacing edge strip between mechanical connect, it is achieved full decoupled, and in prior art, spacing framework is an integrated frame
Structural member, without decoupling device；
The most crashproof buffer gear uses elastic component to support location collision frame, plays good crashproof cushioning effect,
Overcome the collision vertical problem being difficult to effectively support of frame in prior art simultaneously.
Accompanying drawing explanation
Fig. 1 a and 1b is the structural representation of existing a kind of work stage anticollision device, collision-prevention device；
Fig. 2 a and 2b is the structural representation of existing another kind of work stage anticollision device, collision-prevention device；
Fig. 3 is the structural representation of the work stage safety device of the embodiment of the invention；
Fig. 4 be the embodiment of the invention work stage safety device in the structural representation of sports limiting mechanism
Figure；
Fig. 5 be the embodiment of the invention work stage safety device in the structural representation of crashproof buffer gear
Figure；
Fig. 6 a and the structure of work stage safety device elastic member that Fig. 6 b is the embodiment of the invention
Schematic diagram；
Fig. 7 be the embodiment of the invention work stage safety device in the mounting means of crashproof buffer gear
Schematic diagram；
Fig. 8 a to 8c is collision when taking case1 data of the work stage safety device of the embodiment of the invention
Curve and work stage center of gravity X, Y, the analogous diagram of Z-direction accelerating curve；
Fig. 9 a to 9c is collision when taking case2 data of the work stage safety device of the embodiment of the invention
Curve and work stage center of gravity X, Y, the analogous diagram of Z-direction accelerating curve；
Figure 10 a to 10c is the work stage safety device of the embodiment of the invention touching when taking case3 data
Hit curve and work stage center of gravity X, Y, the analogous diagram of Z-direction accelerating curve.
In Fig. 3-7: 10-working face, 20-silicon wafer stage, 30-coarse motion platform, 40-X to position-limit mechanism, the spacing edge strip of 41-,
42-line slideway, 43-flexible strip, 44-buffer, 50-Y to position-limit mechanism, the crashproof buffer gear of 60-, 61-collision frame,
62-elastic component, 63-install version, 64-eccentric adjustment.
Detailed description of the invention
Understandable, below in conjunction with the accompanying drawings to the present invention for enabling the above-mentioned purpose of the present invention, feature and advantage to become apparent from
Detailed description of the invention be described in detail.It should be noted that, accompanying drawing of the present invention all uses the form of simplification and all uses non-essence
Accurate ratio, only in order to facilitate, to aid in illustrating lucidly the purpose of the embodiment of the present invention.
The work stage safety device that the present invention provides, as shown in Fig. 3 to Fig. 7, including being arranged on working face 10
The silicon wafer stage 20 of side and coarse motion platform 30, also include being located at the sports limiting mechanism of described working face 10 surrounding and being fixed on institute
State the crashproof buffer gear 60 on coarse motion platform 30, wherein,
Specifically, described sports limiting mechanism is fixed on the balance mass unit of described working face 10, including X to limit
Position mechanism 40 and Y-direction position-limit mechanism 50, described X includes spacing edge strip 41 respectively to position-limit mechanism 40 and Y-direction position-limit mechanism 50, props up
Support guiding mechanism and at least two buffer 44, it is preferred that described buffer 44 be hydraulic type buffer, spring buffer or
One in air buffer；Described spacing edge strip 41 is fixed in described support guide mechanism, and along X to or Y-direction move, institute
Stating buffer 44 to be fixed on described spacing edge strip 41, specifically, described X is divided into two groups to position-limit mechanism 40, and along X to the most right
Arranging, same, Y-direction position-limit mechanism 50 is also two groups, and along Y-direction just to layout, described sports limiting mechanism is used for limiting workpiece
The range of movement of platform, when preventing from controlling to lose efficacy, work stage moves out working face 10；
Described crashproof buffer gear 60 includes colliding frame 61 and elastic component 62, and the two ends of described elastic component 62 are divided
Not being hinged to described collision frame 61 and described coarse motion platform 30, described elastic component 62 makes in order to the weight supporting collision frame 61
It is kept in the correct position.The present invention uses crashproof buffer gear 60 to reduce between work stage, work stage and collision frame 61
Between when colliding to work stage interior arrangement and the impact of parts.
It is preferred that please emphasis with reference to Fig. 3 and Fig. 4, described support guide mechanism include at least two line slideway 42 and
Being fixed on the flexible strip 43 on the slide block of described line slideway 42, described spacing edge strip 41 is fixed by described flexible strip 43
On the slide block of described line slideway 42, described spacing edge strip 41 is vertical to be supported by flexible strip 43, along the fortune of impact direction
Action-oriented uses line slideway 42, it is preferred that described flexible strip 43 is vertical for high rigidity, level is to for low rigidity, described
The decoupling axial for Rz that flexible strip 43 is capable of between line slideway 42 and spacing edge strip 41, described X, the position-limited edge of Y-direction
Between bar 41, mechanical connects, it is achieved full decoupled.
It is preferred that the vertical height of described spacing edge strip 41 is corresponding, also with the vertical height of described silicon wafer stage 20 center of gravity
That is, described spacing edge strip 41 is arranged on vertical height close on the position of silicon wafer stage 20 center of gravity Z-direction height, the most both may be used
To avoid stopping optical path, the tilting moment that work stage collision produces can be reduced again so that spacing during collision impact as far as possible
Buffer 44 described in edge strip 41 motion compresses, and then absorb the energy that impact produces.
It is preferred that refer to Fig. 3 and Fig. 5, described collision frame 61 all stretches out the edge of described silicon wafer stage 20 in X, Y-direction,
And the distance between inner side and the outside of corresponding coarse motion platform 30 of described collision frame 61 is more than or equal to silicon wafer stage 20
Big crusherbull zone stroke, say, that described collision frame 61 all stretches out silicon wafer stage 20 in X, Y-axis and measures reflecting mirror (in figure
Not shown) edge, collision frame 61 inside all maintain certain gap with described coarse motion platform 30 in X, Y-axis, this gap
More than or equal to corresponding axial maximum crash cushion stroke, i.e. when guaranteeing to produce maximum crash, described collision frame 61 is with described
Work stage does not collides.
It is preferred that ask emphasis with reference to Fig. 7, described crashproof buffer gear 60 is fixed on described by upper and lower two installing plates 63
On coarse motion platform 30, it is preferred that be additionally provided with some eccentric adjustments 64 between said two installing plate 63 and coarse motion platform 30, in order to
Regulate the initial phase between described coarse motion platform 30 and described work stage to position.
It is preferred that carbon fiber please all be used with reference to Fig. 3 to Fig. 5, described collision frame 61 with described spacing edge strip 41 by emphasis
Material is made, and has high intensity it is of course also possible to select, and other material of low-density characteristic makes, it is preferred that described collision limit
Being pasted with one layer of elastomeric material (not shown) outside frame 61, described elastomeric material is polyurethane or rubber, further functions as
Crashproof cushioning effect.
It is preferred that ask emphasis with reference to Fig. 6 a and Fig. 6 b, the cross section of described elastic component 62 is rectangle, and its depth-width ratio is big
In 1, say, that the length, width and height of described elastic component 62 are respectively L, b, h, h/b > 1, to ensure that described elastic component 62 has
Certain vertical stiffness, plays the effect supporting the unsettled collision frame 61 being arranged in periphery, certainly, and can be high by regulating it
H the ratio of () wide (b) optimizes prestretching force and the vertical stiffness of elastic component 62；It is preferred that described elastic component 62 uses
The marmem with super-elasticity and high-damping effect is made.
It is preferred that ask emphasis with reference to Fig. 5, described elastic component 62 is 16, and 16 elastic components are distributed in described silicon chip
The surrounding of platform 20, respectively 1a～1d, 2a～2d, 3a～3d and 4a～4d, 4 elastic components of the described every side of silicon wafer stage 20
In 62,2 is prestretched component, and remaining 2 is non-prestretched component, and specifically, the arrangement of 16 elastic components 62 is such as
Shown in Fig. 5, in figure, 1a, 1c, 2a, 2c, 3a, 3c, 4a, 4c are prestretched component, and 1b, 1d, 2b, 2d, 3b, 3d, 4b, 4d are the most pre-
Tensile member, 1a ∥ 1b ∥ 3a ∥ 3b and being arranged in same level, 1c ∥ 1d ∥ 3c ∥ 3d and be arranged in same level
On, 2a ∥ 2b ∥ 4a ∥ 4b and being arranged in same level, 2c ∥ 2d ∥ 4c ∥ 4d and be arranged in same level.Wherein
1a, 1b, 2c, 2d, 3a, 3b, 4c, 4d approximation constitutes a parallelogram sturcutre, and 1c, 1d, 2a, 2b, 3c, 3d, 4a, 4b approximate
Constitute a parallelogram sturcutre.Prestretched component only just can deform, according to analysis when impulsive force is more than pre-tensioning
The maximum crash impulsive force that collision operating mode obtains is to adjust the prestretched amount of prestretched component, and then adjusts the most initial pre-
Tensile force；When silicon wafer stage 20 collides at X axis, the prestretched component such as 1a, 1c, 3a, 3c alternately elongation and contracting
Short change, but it is in extended state all the time, it is provided that stable damping force, consume a large amount of vibrational energies that work stage produces because of collision
Amount；The non-prestretched component such as 1b, 1d, 3b, 3d alternately elongation and flexing, except providing certain damping force, moreover it is possible to be anti-
Hit the large deformation recovery capability that buffer gear 60 provides good.Now, along Y-direction arrange elastic component 62:2a, 2b, 2c, 2d,
4a, 4b, 4c, 4d are under most operating modes, owing to collision impact is less than the institute's elastic member 62 arranged along impact direction
Initial pre-tensioning, all will not deform, it is possible to ensure shock loading between the prestretched components such as 1a, 1c, 3a, 3c uniformly
Distribution；When there is extreme operating condition, i.e. collision impact is more than the initial pre-of the institute's elastic member 62 along impact direction layout
When tensile force causes crashproof buffer gear 60 to produce large deformation, generation is bent by elastic component 2a, 2b, 2c, 2d, 4a, 4b, 4c, 4d
Song, coordinates the non-prestretched components such as 1b, 1d, 3b, 3d jointly to provide good large deformation recovery capability to crashproof buffer gear 60.
Overcome prior art and be only capable of providing in a direction problem of high velocity impact protection, and impact momentum excessive generation large deformation
Time the crash device problem that is difficult to reset.
It should be noted that the working mechanism that silicon wafer stage 20 is when Y-direction collides with X to similar, here is omitted.
Work stage safety device designed by the present invention, collision frame 61 and spacing edge strip 41 material are carbon fiber,
Its quality is about 1.3kg, and elastic component 62 uses NiTi alloy, and its density takes 6.5g/cm^3, and springform measures 60GPa.
Collision frame 62 vertical deformation under gravity, by finite element analysis software, for elastic component 62 not
Same sectional dimension, respectively to having prestressing force (Stress stiffening effect) and carrying out simulation analysis without two kinds of operating modes of prestressing force, can obtain
To following data:
1. without prestressing force operating mode
2. there is prestressing force operating mode
In the case of having prestressing force, axial stress has large effect to lateral stiffness, uses prestressed modal analysis method,
By model frequency under the model frequency in the case of comparing without prestressing force and prestressing force, determine the representative section under prestressing force, enter
And carry out deformation analysis under action of gravity.
Wherein, k is empirical coefficient, and being calculated its value is 0.92, takes certain safety coefficient, and taking its value is 0.85.f2For
Pre-stressed mode frequency, f1For without pre-stressed mode frequency, I1ZFor the representative section product of inertia, I2ZFor the original product of inertia, beam is horizontal
Rigidity is proportional to the product of inertia.Under effect without prestressing force, its model frequency is about 4.5Hz.
Can be obtained by above analysis, after the cross-sectional area of elastic component 62 is reduced to certain value, lateral stiffness main and its
Axial prestress is relevant, and little with its sectional dimension relation, therefore, retrains in conjunction with space structure and collision frame 61 is at weight
Vertical permission deflection under power effect, can obtain the design size of elastic component 62, prestretching by finite element method
The design constraints such as the amount of stretching.
Assuming that work stage in level to the speed of 1m/s for colliding, stage quality is 50kg, acceleration sensing
Device (not shown) is placed in work stage position of centre of gravity.Collision frame 61 uses carbon fibre material, is touched object and uses rigidity list
Meta Model.Collision simulation analysis is carried out, the data obtained for the anticollision device, collision-prevention device being made up of three kinds of various sizes of elastic components
Such as following table:
Wherein for crash force curve and work stage center of gravity X, Y, Z-direction accelerating curve such as Fig. 8 a to Fig. 8 c of Case1
Shown in；
Wherein for crash force curve and work stage center of gravity X, Y, Z-direction accelerating curve such as Fig. 9 a to Fig. 9 c of Case2
Shown in；
Wherein crash force curve and work stage center of gravity X, Y, Z-direction accelerating curve such as Figure 10 a for Case3 are to figure
Shown in 10c.
From Fig. 8 to Figure 10, owing to the peak acceleration allowed in work stage collision process is design input, in conjunction with work
The bulk that part platform topology layout is given retrains and collision frame 61 vertical deflection binding target under gravity,
By the method for finite element analysis, i.e. can get the design size of elastic component 62, prestretched amount, crusherbull zone stroke, and then
Optimize work stage anticollision device, collision-prevention device space structure layout.
In sum, the work stage safety device that the present invention provides, including the silicon being arranged at above working face 10
Sheet platform 20 and coarse motion platform 30, also include being located at the sports limiting mechanism of described working face 10 surrounding and being fixed on described coarse motion
Crashproof buffer gear 60 on platform 30, wherein, described sports limiting mechanism include X to position-limit mechanism 40 and Y-direction position-limit mechanism 50,
To position-limit mechanism 40 and Y-direction position-limit mechanism 50, described X includes that spacing edge strip 41, support guide mechanism and at least two are slow respectively
Rushing device 44, described spacing edge strip 41 is fixed in described support guide mechanism, and along X to or Y-direction move, described buffer 44 is solid
On described spacing edge strip 41；Described crashproof buffer gear 60 includes colliding frame 61 and elastic component 62, described elasticity
The two ends of component 62 are respectively connecting to described collision frame 61 and described coarse motion platform 30.The present invention utilizes sports limiting mechanism to limit
The range of movement of work stage, when preventing from controlling to lose efficacy, work stage moves out working face 10, uses crashproof buffer gear 60 simultaneously
Reduce between work stage, when colliding between work stage and collision frame 61 to work stage interior arrangement and the impact of parts.
Obviously, those skilled in the art can carry out various change and the modification spirit without deviating from the present invention to invention
And scope.So, if the present invention these amendment and modification belong to the claims in the present invention and equivalent technologies thereof scope it
In, then the present invention is also intended to change and including modification include these.
Claims (14)
1. a work stage safety device, including the silicon wafer stage being arranged at above working face and coarse motion platform, its feature exists
In, also include the sports limiting mechanism being located at described working face surrounding and be fixed on the crashproof buffer on described coarse motion platform
Structure, wherein,
Described sports limiting mechanism include X to position-limit mechanism and Y-direction position-limit mechanism, described X is to position-limit mechanism and Y-direction position-limit mechanism
Include that spacing edge strip, support guide mechanism and buffer, described spacing edge strip are fixed in described support guide mechanism respectively,
And along X to or Y-direction move, described buffer is fixed on described spacing edge strip；
Described crashproof buffer gear includes colliding frame and elastic component, and the two ends of described elastic component are respectively articulated with to described
Collision frame and described coarse motion platform.
2. work stage safety device as claimed in claim 1, it is characterised in that described support guide mechanism includes at least
Two line slideways and be fixed on the flexible strip on the slide block of described line slideway, described spacing edge strip is by described flexibility
Reed is fixed on the slide block of described line slideway.
3. work stage safety device as claimed in claim 2, it is characterised in that described flexible strip vertical for Gao Gang
Property, level is to for low rigidity.
4. work stage safety device as claimed in claim 1, it is characterised in that the vertical height of described spacing edge strip with
The vertical height of described silicon wafer stage center of gravity is corresponding.
5. work stage safety device as claimed in claim 1, it is characterised in that described buffer is hydraulic type buffering
One in device, spring buffer or air buffer.
6. work stage safety device as claimed in claim 1, it is characterised in that described collision frame is all stretched in X, Y-direction
The distance gone out between described silicon chip edge of table, and the inner side of described collision frame with the outside of corresponding coarse motion platform is more than
Maximum crash cushion stroke in silicon wafer stage.
7. work stage safety device as claimed in claim 1, it is characterised in that described crashproof buffer gear is by up and down
Two installing plates are fixed on described coarse motion platform.
8. work stage safety device as claimed in claim 7, it is characterised in that said two installing plate and coarse motion platform it
Between be additionally provided with some eccentric adjustments.
9. work stage safety device as claimed in claim 1, it is characterised in that described collision frame and described position-limited edge
Bar all uses carbon fibre material to make.
10. work stage safety device as claimed in claim 9, it is characterised in that be pasted with outside described collision frame
One layer of elastomeric material.
11. work stage safety devices as claimed in claim 10, it is characterised in that described elastomeric material be polyurethane or
Rubber.
12. work stage safety devices as claimed in claim 1, it is characterised in that the cross section of described elastic component is
Rectangle, and its depth-width ratio is more than 1.
13. work stage safety devices as claimed in claim 1, it is characterised in that described elastic component uses shape note
Recall alloy to make.
The 14. work stage safety devices as according to any one of claim 1 to 13, it is characterised in that described elastic structure
Part is 16, and 16 elastic components are distributed in the surrounding of described silicon wafer stage, in 4 elastic components of the every side of described silicon wafer stage, and 2
For prestretched component, remaining 2 is non-prestretched component.
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| CN107561866B (en) * | 2016-06-30 | 2019-08-23 | 上海微电子装备（集团）股份有限公司 | Double workpiece platform device and immersed photoetching machine for immersed photoetching machine |
| WO2018050443A1 (en) * | 2016-09-13 | 2018-03-22 | Asml Netherlands B.V. | Positioning system and lithographic apparatus |
| CN109856916B (en) * | 2017-11-30 | 2021-01-29 | 上海微电子装备（集团）股份有限公司 | Collision preventing device, workpiece table and exposure device |
| CN108345181B (en) * | 2018-03-29 | 2024-07-23 | 清华大学 | Silicon wafer bench double-bench exchange system with secondary anti-collision protection structure |
| CN110814785B (en) * | 2018-08-10 | 2021-04-02 | 上海微电子装备（集团）股份有限公司 | Limiting device and limiting system |
| CN114690582A (en) * | 2020-12-31 | 2022-07-01 | 上海微电子装备（集团）股份有限公司 | Anti-collision device and photoetching equipment |
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| EP0218546A1 (en) * | 1985-08-30 | 1987-04-15 | Centre Suisse D'electronique Et De Microtechnique S.A. | Micropositioning device |
| CN1501168A (en) * | 2002-06-13 | 2004-06-02 | Asml | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| CN102109766A (en) * | 2009-12-25 | 2011-06-29 | 上海微电子装备有限公司 | Decoupling mechanism and exposure machine using same |
| CN102809902A (en) * | 2011-05-31 | 2012-12-05 | 上海微电子装备有限公司 | Balancing mass system of photoetching machine |
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| CN104238273A (en) | 2014-12-24 |
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Address after: 201203 Pudong New Area East Road, No. 1525, Shanghai Patentee after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 Pudong New Area East Road, No. 1525, Shanghai Patentee before: Shanghai Micro Electronics Equipment Co., Ltd. |