CN104238273A - Safety protection device for workpiece table - Google Patents
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- CN104238273A CN104238273A CN201310245119.0A CN201310245119A CN104238273A CN 104238273 A CN104238273 A CN 104238273A CN 201310245119 A CN201310245119 A CN 201310245119A CN 104238273 A CN104238273 A CN 104238273A
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- 229920000049 Carbon (fiber) Polymers 0.000 description 1
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- KHYBPSFKEHXSLX-UHFFFAOYSA-N iminotitanium Chemical compound [Ti]=N KHYBPSFKEHXSLX-UHFFFAOYSA-N 0.000 description 1
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Abstract
The invention relates to a safety protection device for a workpiece table. The safety protection device comprises silicon slice tables and coarse movement tables which are arranged above a working plane, and further comprises movement limiting mechanisms arranged around the working plane and an anti-collision buffering mechanism fixed on the coarse movement tables, wherein the movement limiting mechanisms comprise X-direction limiting mechanisms and Y-direction limiting mechanisms; the X-direction limiting mechanisms and the Y-direction limiting mechanisms respectively comprise limiting edge strips, supporting guide mechanisms and buffers; the limiting edge strips are fixedly supported on the supporting guide mechanisms and move along the X direction or the Y direction; the buffers are fixed on the limiting edge strips; the anti-collision buffering mechanism comprises collision borders and elastic structural members; two ends of the elastic structural members are respectively connected to the collision borders and the coarse movement tables. According to the safety protection device for the workpiece table, the movement limiting mechanisms are used for limiting a movement range of the workpiece table, so that the phenomenon that the workpiece table moves out of the working platform under a condition that the control is failed is prevented; meanwhile, the anti-collision buffering mechanisms are used for reducing impact on devices and components in the workpiece table when small workpiece tables as well as the workpiece tables and the collision borders are collided.
Description
Technical field
The present invention relates to semiconductor lithography apparatus field, particularly relate to a kind of work stage safety device.
Background technology
In semiconductor lithography equipment, the precision workpiece such as silicon wafer stage and mask platform stage movement system is extremely important critical component, its typical version is as follows: work stage is made up of thick, micropositioner usually, and the two realizes the precise motion location of work stage in six degree of freedom direction, space jointly.Along with improving constantly of VLSI (very large scale integrated circuit) device integration, to the productive rate index request of litho machine also in continuous lifting, this just has higher requirement to the movement velocity of work stage, acceleration and precision.
Planar motor is high owing to having force density, the features such as high speed, high reliability, and be easy to be integrated in controlled device, there is fast response time, control the advantages such as highly sensitive, physical construction is simple, be applied at present in advanced semiconductor lithographic equipment.
Planar motor is adopted to realize the precision workpiece stage movement system of Long travel coarse motion, compared with conventional workpiece platform, without X, Y-direction coarse motion guide rail, six-freedom micro displacement mechanism and silicon chip hold bed and are arranged on above planar motor, the completely freely constraint of mechanical guide rail and mechanical position limitation when work stage does step-scan campaign in workplace, when measuring system break down or control software design to make mistakes etc. cause the motion control of coarse motion planar motor to be lost efficacy time, work stage is with regard to the working face that even moves out of that very easily collides with peripheral unit, cause the damage of expensive components device in work stage.
At present, there is a kind of work stage collision avoidance system, as illustrated in figs. ia and ib, this collision avoidance system is formed primarily of collision bumper CB, this collision bumper CB is provided with a collision framework CF and connecting portion CC, between two base station W2T, W3T, or in base station W2T, W3T one and around when colliding between the frame MF around workplace, absorb by the collision bumper CB adopting Nitinol to make the large energy that collision produces.But program Problems existing is: as two base station W2T, W3T is when off-centered position collides, the impact that collision produces can not be evenly distributed on the collision side of collision framework CF, and the cushion stroke departing from centric(al) impact will be greater than the cushion stroke of centric(al) impact, in addition, this collision bumper CB is a structural member, its cushion stroke is the deflection of this structural member, even if adopt the mechanical structured member that Nitinol makes, the cushion stroke that its malformation produces is still very limited, this can cause being delivered to base station W2T after collision bumper CB, the impulsive force of W3T is excessive, cause base station W2T, the damage of the upper precise part of W3T.
Another work stage collision avoidance system, an embodiment of this collision avoidance system as shown in Figure 2 a, comprise crashproof frame 102, two dampers 104 and the guide piece be made up of guide pole 108 and linear bearing 106, the program seems the problem solving eccentric impact and can cause the impulsive force skewness acted on both sides damper 104, but in esse problem is, when bias is impacted excessive, the impact stroke of two dampers 104 is also inconsistent, large near the side impact stroke of impacting, little away from the side impact stroke of impacting, this can cause guide pole 108 to reverse certain angle around Rz axle, and make between the slide unit of linear bearing 106 and guide rail, to produce a comparatively high pulling torque, thus reduce serviceable life and the reliability of collision avoidance system, another embodiment of this collision avoidance system as shown in Figure 2 b, the difference of itself and previous embodiment is: utilize two pretension springs 112 to form parallelogram linkage and replace linear bearing guiding mechanism, the power departing from centric(al) impact is transmitted between two dampers 104, program Problems existing is, address only the anti-collision problem on planar direction (X to), and when two base station WT ' collide along other direction (Y-direction) high-speed motion, good security protection effect can not be played, in addition, the program also fails to solve the vertical supporting and location problem of crashproof frame 102 when work stage normally works very well.
Summary of the invention
The invention provides a kind of work stage safety device, the parts damages caused to avoid each work stage high-speed motion to collide, meanwhile, when effectively solving generation eccentric impact, collision impact skewness on work stage collision avoidance system causes the problem of holding the larger corner of bed generation.
For solving the problems of the technologies described above, the invention provides a kind of work stage safety device, comprise and be arranged at silicon wafer stage above working face and coarse motion platform, also comprise the sports limiting mechanism being located at described working face surrounding and the crashproof buffer gear be fixed on described coarse motion platform, wherein
Described sports limiting mechanism comprises X to position-limit mechanism and Y-direction position-limit mechanism, described X comprises spacing edge strip, support guide mechanism and impact damper respectively to position-limit mechanism and Y-direction position-limit mechanism, described spacing edge strip is fixed in described support guide mechanism, and along X to or Y-direction move, described impact damper is fixed on described spacing edge strip;
Described crashproof buffer gear comprises collision frame and elastic component, and the two ends of described elastic component are hinged to described collision frame and described coarse motion platform respectively.
Preferably, the flexible strip that described support guide mechanism comprises at least two line slideways and is fixed on the slide block of described line slideway, described spacing edge strip is fixed on the slide block of described line slideway by described flexible strip.
Preferably, the vertical of described flexible strip is high rigidity, and level is to being low rigidity.
Preferably, the vertical height of described spacing edge strip is corresponding with the vertical height of described silicon wafer stage center of gravity.
Preferably, described impact damper is the one in hydraulic type impact damper, spring damper or air buffer.
Preferably, described collision frame all stretches out described silicon chip edge of table in X, Y-direction, and the distance between the inner side of described collision frame and the outside of corresponding coarse motion platform is more than or equal to the maximum crash cushion stroke of silicon wafer stage.
Preferably, described crashproof buffer gear is fixed on described coarse motion platform by upper and lower two installing plates.
Preferably, some eccentric adjustments are also provided with between described two installing plates and coarse motion platform.
Preferably, described collision frame and described spacing edge strip all adopt carbon fibre material to make.
Preferably, one deck resilient material is pasted with outside described collision frame.
Preferably, described resilient material is polyurethane or rubber.
Preferably, the xsect of described elastic component is rectangle, and its depth-width ratio is greater than 1.
Preferably, described elastic component adopts marmem to make.
Preferably, described elastic component is 16, and 16 elastic components are distributed in the surrounding of described silicon wafer stage, and in 4 elastic components of the every side of described silicon wafer stage, 2 is prestretched component, and all the other 2 is non-prestretched component.
Compared with prior art, the present invention has the following advantages:
1. retrain work stage to move in working face, the spacing edge strip of employing X, Y-direction adds the mode of pool of buffer device, and compared to employing integral type Ti-Ni alloy framed structure, its manufacturing cost is lower, allow larger cushion stroke simultaneously, produce less impulsive force;
The spacing edge strip of 2.X, Y-direction is connected in support guide mechanism by flexible strip, achieve the decoupling zero of Rz axis, between the spacing edge strip of X, Y-direction, mechanical connects, and realizes full decoupled, and spacing framework is an integrated frame structural member in prior art, without decoupling device;
3. crashproof buffer gear adopts elastic component to carry out supporting and location collision frame, plays good crashproof buffer action, overcomes in prior art simultaneously and collides the vertical problem being difficult to effectively to support of frame.
Accompanying drawing explanation
Fig. 1 a and 1b is the structural representation of existing a kind of work stage collision avoidance system;
Fig. 2 a and 2b is the structural representation of existing another kind of work stage collision avoidance system;
Fig. 3 is the structural representation of the work stage safety device of the embodiment of the invention;
Fig. 4 is the structural representation of sports limiting mechanism in the work stage safety device of the embodiment of the invention;
Fig. 5 is the structural representation of crashproof buffer gear in the work stage safety device of the embodiment of the invention;
Fig. 6 a and Fig. 6 b is the structural representation of the work stage safety device elastic member of the embodiment of the invention;
Fig. 7 is the mounting means schematic diagram of crashproof buffer gear in the work stage safety device of the embodiment of the invention;
Fig. 8 a to 8c is the analogous diagram of impact curve when getting case1 data of the work stage safety device of the embodiment of the invention and work stage center of gravity X, Y, Z-direction accelerating curve;
Fig. 9 a to 9c is the analogous diagram of impact curve when getting case2 data of the work stage safety device of the embodiment of the invention and work stage center of gravity X, Y, Z-direction accelerating curve;
Figure 10 a to 10c is the analogous diagram of impact curve when getting case3 data of the work stage safety device of the embodiment of the invention and work stage center of gravity X, Y, Z-direction accelerating curve.
In Fig. 3-7: 10-working face, 20-silicon wafer stage, 30-coarse motion platform, 40-X install version, 64-eccentric adjustment to position-limit mechanism, the spacing edge strip of 41-, 42-line slideway, 43-flexible strip, 44-impact damper, 50-Y to position-limit mechanism, the crashproof buffer gear of 60-, 61-collision frame, 62-elastic component, 63-.
Embodiment
For enabling above-mentioned purpose of the present invention, feature and advantage become apparent more, are described in detail the specific embodiment of the present invention below in conjunction with accompanying drawing.It should be noted that, accompanying drawing of the present invention all adopts the form of simplification and all uses non-ratio accurately, only in order to object that is convenient, the aid illustration embodiment of the present invention lucidly.
Work stage safety device provided by the invention, as shown in Fig. 3 to Fig. 7, comprise and be arranged at silicon wafer stage 20 above working face 10 and coarse motion platform 30, also comprise the sports limiting mechanism being located at described working face 10 surrounding and the crashproof buffer gear 60 be fixed on described coarse motion platform 30, wherein
Particularly, described sports limiting mechanism is fixed on the balance mass unit of described working face 10, comprise X to position-limit mechanism 40 and Y-direction position-limit mechanism 50, described X comprises spacing edge strip 41, support guide mechanism and at least two impact dampers 44 respectively to position-limit mechanism 40 and Y-direction position-limit mechanism 50, preferably, described impact damper 44 is the one in hydraulic type impact damper, spring damper or air buffer; Described spacing edge strip 41 is fixed in described support guide mechanism, and along X to or Y-direction move, described impact damper 44 is fixed on described spacing edge strip 41, and particularly, described X is divided into two groups to position-limit mechanism 40, and along X to just to layout, same, Y-direction position-limit mechanism 50 is also two groups, along Y-direction just to layout, described sports limiting mechanism is for limiting the range of movement of work stage, and when preventing from controlling to lose efficacy, work stage is moved out working face 10;
Described crashproof buffer gear 60 comprises collision frame 61 and elastic component 62, the two ends of described elastic component 62 are hinged to described collision frame 61 and described coarse motion platform 30 respectively, and described elastic component 62 makes it remain on correct position in order to the weight supporting collision frame 61.The present invention adopts crashproof buffer gear 60 to reduce between work stage, when colliding between work stage and collision frame 61 to the impact of work stage interior arrangement and parts.
Preferably, please emphasis with reference to figure 3 and Fig. 4, described support guide mechanism comprises at least two line slideways 42 and is fixed on the flexible strip 43 on the slide block of described line slideway 42, described spacing edge strip 41 is fixed on the slide block of described line slideway 42 by described flexible strip 43, described spacing edge strip 41 is vertical to be supported by flexible strip 43, motion guide along impact direction adopts line slideway 42, preferably, the vertical of described flexible strip 43 is high rigidity, level is to being low rigidity, described flexible strip 43 can realize the decoupling zero of the Rz axis between line slideway 42 and spacing edge strip 41, described X, between the spacing edge strip 41 of Y-direction, mechanical connects, realize full decoupled.
Preferably, the vertical height of described spacing edge strip 41 is corresponding with the vertical height of described silicon wafer stage 20 center of gravity, that is, described spacing edge strip 41 is arranged on the position of vertical height close to silicon wafer stage 20 center of gravity Z-direction height, so both can avoid stopping optical path, the tilting moment that work stage collision produces can be reduced again, impact damper 44 described in spacing edge strip 41 motion compresses when making collision impact as far as possible, and then absorb the energy impacting and produce.
Preferably, please refer to Fig. 3 and Fig. 5, described collision frame 61 is at X, Y-direction all stretches out the edge of described silicon wafer stage 20, and the distance between the inner side of described collision frame 61 and the outside of corresponding coarse motion platform 30 is more than or equal to the maximum crash cushion stroke of silicon wafer stage 20, that is, described collision frame 61 is at X, Y-axis all stretches out the edge that silicon wafer stage 20 measures catoptron (not shown), at X inside collision frame 61, Y-axis all maintains certain gap with described coarse motion platform 30, this gap be more than or equal to respective shaft to maximum crash cushion stroke, namely, when guaranteeing to produce maximum crash, described collision frame 61 does not collide with described work stage.
Preferably, please emphasis with reference to figure 7, described crashproof buffer gear 60 is fixed on described coarse motion platform 30 by upper and lower two installing plates 63, preferably, some eccentric adjustments 64 are also provided with, in order to regulate the initial relative position between described coarse motion platform 30 and described work stage between described two installing plates 63 and coarse motion platform 30.
Preferably, please emphasis with reference to figure 3 to Fig. 5, described collision frame 61 all adopts carbon fibre material to make with described spacing edge strip 41, certainly, also can select and have high strength, other material of low-density characteristic makes, preferably, be pasted with one deck resilient material (not shown) outside described collision frame 61, described resilient material is polyurethane or rubber, plays crashproof cushioning effect further.
Preferably, please emphasis with reference to figure 6a and Fig. 6 b, the xsect of described elastic component 62 is rectangle, and its depth-width ratio is greater than 1, that is, the length, width and height of described elastic component 62 are respectively L, b, h, h/b>1, to ensure that described elastic component 62 has certain vertical stiffness, plays and supports the unsettled effect being arranged in peripheral collision frame 61, certainly, by regulating the ratio of its height (h) wide (b) to optimize the vertical stiffness of prestretching force and elastic component 62; Preferably, described elastic component 62 adopts the marmem with super-elasticity and high damping effect to make.
Preferably, please emphasis with reference to figure 5, described elastic component 62 is 16, 16 elastic components are distributed in the surrounding of described silicon wafer stage 20, be respectively 1a ~ 1d, 2a ~ 2d, 3a ~ 3d and 4a ~ 4d, in 4 elastic components 62 of the every side of described silicon wafer stage 20, 2 is prestretched component, all the other 2 is non-prestretched component, particularly, the arrangement of 16 elastic components 62 as shown in Figure 5, 1a in figure, 1c, 2a, 2c, 3a, 3c, 4a, 4c is prestretched component, 1b, 1d, 2b, 2d, 3b, 3d, 4b, 4d is non-prestretched component, 1a ∥ 1b ∥ 3a ∥ 3b and be arranged in same level, 1c ∥ 1d ∥ 3c ∥ 3d and be arranged in same level, 2a ∥ 2b ∥ 4a ∥ 4b and be arranged in same level, 2c ∥ 2d ∥ 4c ∥ 4d and being arranged in same level.Wherein 1a, 1b, 2c, 2d, 3a, 3b, 4c, 4d are similar to formation parallelogram sturcutre, and 1c, 1d, 2a, 2b, 3c, 3d, 4a, 4b are similar to formation parallelogram sturcutre.Prestretched component only just can be out of shape when impulsive force is greater than pre-tensioning, according to the prestretched amount analyzing the maximum crash impulsive force that obtains of collision operating mode and adjust prestretched component, and then adjusts suitable initial pre-tensioning; When silicon wafer stage 20 collides at X axis, the prestretched components such as 1a, 1c, 3a, 3c hocket the change of extending and shortening, but are in extended state all the time, provide stable damping force, consume a large amount of vibrational energies that work stage produces because of collision; The non-prestretched component such as 1b, 1d, 3b, 3d alternately extends and flexing, except providing certain damping force, can also provide good large deformation recovery capability for crashproof buffer gear 60.Now, along Y-direction arrange elastic component 62:2a, 2b, 2c, 2d, 4a, 4b, 4c, 4d under most operating mode, because collision impact is less than the initial pre-tensioning of all elastic components 62 arranged along impact direction, all can not deform, can ensure that shock load is uniformly distributed between the prestretched components such as 1a, 1c, 3a, 3c; When there is extreme operating condition, namely collision impact is greater than the initial pre-tensioning of all elastic components 62 arranged along impact direction when causing crashproof buffer gear 60 to produce large deformation, to there is flexing in elastic component 2a, 2b, 2c, 2d, 4a, 4b, 4c, 4d, coordinate the non-prestretched components such as 1b, 1d, 3b, 3d jointly to provide good large deformation recovery capability to crashproof buffer gear 60.Overcome the problem that prior art only can provide high velocity impact to protect in a direction, and during impact momentum excessive generation large deformation, crash device is difficult to the problem resetted.
It should be noted that, the working mechanism of silicon wafer stage 20 when Y-direction collides and X, to similar, repeat no more herein.
Work stage safety device designed by the present invention, collision frame 61 is carbon fiber with spacing edge strip 41 material, and its quality is about 1.3kg, and elastic component 62 adopts NiTi alloy, and its density gets 6.5g/cm^3, and springform measures 60GPa.
The vertical distortion under gravity of collision frame 62, by finite element analysis software, for the sectional dimension that elastic component 62 is different, respectively to having prestress (Stress stiffening effect) and carrying out simulation analysis without prestress two kinds of operating modes, can obtain following data:
1. without prestress operating mode
2. there is prestress operating mode
Under having prestress situation, axial stress has larger impact to lateral stiffness, adopts prestressed modal analysis method, by comparing without model frequency under the model frequency in prestress situation and prestress, determine the equivalent cross-section under prestress, and then carry out deformation analysis under Action of Gravity Field.
Wherein, k is experience factor, and calculating its value is 0.92, gets certain safety coefficient, and getting its value is 0.85.F
2for pre-stressed mode frequency, f
1for without pre-stressed mode frequency, I
1Zfor the equivalent cross-section product of inertia, I
2Zfor the original product of inertia, beam lateral stiffness is proportional to the product of inertia.Without under prestress effect, its model frequency is about 4.5Hz.
Can be obtained by above analysis, after the cross-sectional area of elastic component 62 is reduced to certain value, lateral stiffness is main relevant with its axial prestress, and it is little with its sectional dimension relation, therefore, in conjunction with space structure constraint and collision frame 61 vertical allowable transformation amount under gravity, the design constraint such as design size, prestretched amount of elastic component 62 can be obtained by finite element method.
Assuming that work stage level to the speed of 1m/s for colliding, stage quality is 50kg, and acceleration transducer (not shown) is placed in work stage centre of gravity place.Collision frame 61 adopts carbon fibre material, is touched object and adopts rigid element modeling.The collision avoidance system formed for the elastic component by three kinds of different sizes carries out collision simulation analysis, and the data obtained are as following table:
Wherein for the crash force curve of Case1 and work stage center of gravity X, Y, Z-direction accelerating curve as shown in Fig. 8 a to Fig. 8 c;
Wherein for the crash force curve of Case2 and work stage center of gravity X, Y, Z-direction accelerating curve as shown in Fig. 9 a to Fig. 9 c;
Wherein for the crash force curve of Case3 and work stage center of gravity X, Y, Z-direction accelerating curve as shown in Figure 10 a to Figure 10 c.
From Fig. 8 to Figure 10, because the peak acceleration allowed in work stage collision process is design input, the bulk constraint provided in conjunction with Workpiece platform structure layout and collision frame 61 vertical deflection binding target under gravity, by the method for finite element analysis, the design size of elastic component 62, prestretched amount can be obtained, crusherbull zone stroke, and then optimize work stage collision avoidance system space structure layout.
In sum, work stage safety device provided by the invention, comprise and be arranged at silicon wafer stage 20 above working face 10 and coarse motion platform 30, also comprise the sports limiting mechanism being located at described working face 10 surrounding and the crashproof buffer gear 60 be fixed on described coarse motion platform 30, wherein, described sports limiting mechanism comprises X to position-limit mechanism 40 and Y-direction position-limit mechanism 50, described X comprises spacing edge strip 41 respectively to position-limit mechanism 40 and Y-direction position-limit mechanism 50, support guide mechanism and at least two impact dampers 44, described spacing edge strip 41 is fixed in described support guide mechanism, and along X to or Y-direction move, described impact damper 44 is fixed on described spacing edge strip 41, described crashproof buffer gear 60 comprises collision frame 61 and elastic component 62, and the two ends of described elastic component 62 are connected to described collision frame 61 and described coarse motion platform 30 respectively.The present invention utilizes sports limiting mechanism to limit the range of movement of work stage, when preventing from controlling to lose efficacy, work stage is moved out working face 10, adopt crashproof buffer gear 60 to reduce between work stage simultaneously, when colliding between work stage and collision frame 61 to the impact of work stage interior arrangement and parts.
Obviously, those skilled in the art can carry out various change and modification to invention and not depart from the spirit and scope of the present invention.Like this, if these amendments of the present invention and modification belong within the scope of the claims in the present invention and equivalent technologies thereof, then the present invention is also intended to comprise these change and modification.
Claims (14)
1. a work stage safety device, comprises and is arranged at silicon wafer stage above working face and coarse motion platform, it is characterized in that, also comprise the sports limiting mechanism being located at described working face surrounding and the crashproof buffer gear be fixed on described coarse motion platform, wherein,
Described sports limiting mechanism comprises X to position-limit mechanism and Y-direction position-limit mechanism, described X comprises spacing edge strip, support guide mechanism and impact damper respectively to position-limit mechanism and Y-direction position-limit mechanism, described spacing edge strip is fixed in described support guide mechanism, and along X to or Y-direction move, described impact damper is fixed on described spacing edge strip;
Described crashproof buffer gear comprises collision frame and elastic component, and the two ends of described elastic component are hinged to described collision frame and described coarse motion platform respectively.
2. work stage safety device as claimed in claim 1, it is characterized in that, the flexible strip that described support guide mechanism comprises at least two line slideways and is fixed on the slide block of described line slideway, described spacing edge strip is fixed on the slide block of described line slideway by described flexible strip.
3. work stage safety device as claimed in claim 2, it is characterized in that, the vertical of described flexible strip is high rigidity, and level is to being low rigidity.
4. work stage safety device as claimed in claim 1, it is characterized in that, the vertical height of described spacing edge strip is corresponding with the vertical height of described silicon wafer stage center of gravity.
5. work stage safety device as claimed in claim 1, it is characterized in that, described impact damper is the one in hydraulic type impact damper, spring damper or air buffer.
6. work stage safety device as claimed in claim 1, it is characterized in that, described collision frame all stretches out described silicon chip edge of table in X, Y-direction, and the distance between the inner side of described collision frame and the outside of corresponding coarse motion platform is more than or equal to the maximum crash cushion stroke of silicon wafer stage.
7. work stage safety device as claimed in claim 1, it is characterized in that, described crashproof buffer gear is fixed on described coarse motion platform by upper and lower two installing plates.
8. work stage safety device as claimed in claim 7, is characterized in that, be also provided with some eccentric adjustments between described two installing plates and coarse motion platform.
9. work stage safety device as claimed in claim 1, it is characterized in that, described collision frame and described spacing edge strip all adopt carbon fibre material to make.
10. work stage safety device as claimed in claim 9, is characterized in that, be pasted with one deck resilient material outside described collision frame.
11. work stage safety devices as claimed in claim 10, it is characterized in that, described resilient material is polyurethane or rubber.
12. work stage safety devices as claimed in claim 1, is characterized in that, the xsect of described elastic component is rectangle, and its depth-width ratio is greater than 1.
13. work stage safety devices as claimed in claim 1, is characterized in that, described elastic component adopts marmem to make.
14. work stage safety devices according to any one of claim 1 to 13, it is characterized in that, described elastic component is 16,16 elastic components are distributed in the surrounding of described silicon wafer stage, in 4 elastic components of the every side of described silicon wafer stage, 2 is prestretched component, and all the other 2 is non-prestretched component.
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107561866A (en) * | 2016-06-30 | 2018-01-09 | 上海微电子装备（集团）股份有限公司 | Double workpiece platform device and immersed photoetching machine for immersed photoetching machine |
| WO2018050443A1 (en) * | 2016-09-13 | 2018-03-22 | Asml Netherlands B.V. | Positioning system and lithographic apparatus |
| CN108345181A (en) * | 2018-03-29 | 2018-07-31 | 清华大学 | A kind of double-platform exchange system for silicon chip platform with two level anti-collision protection structure |
| CN109856916A (en) * | 2017-11-30 | 2019-06-07 | 上海微电子装备（集团）股份有限公司 | Anticollision device, collision-prevention device, work stage and exposure device |
| CN110814785A (en) * | 2018-08-10 | 2020-02-21 | 上海微电子装备（集团）股份有限公司 | Limiting device and limiting system |
| CN114690582A (en) * | 2020-12-31 | 2022-07-01 | 上海微电子装备（集团）股份有限公司 | Anti-collision device and photoetching equipment |
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| CN107561866B (en) * | 2016-06-30 | 2019-08-23 | 上海微电子装备（集团）股份有限公司 | Double workpiece platform device and immersed photoetching machine for immersed photoetching machine |
| CN107561866A (en) * | 2016-06-30 | 2018-01-09 | 上海微电子装备（集团）股份有限公司 | Double workpiece platform device and immersed photoetching machine for immersed photoetching machine |
| CN109690407B (en) * | 2016-09-13 | 2021-08-13 | Asml荷兰有限公司 | Positioning systems and lithography equipment |
| KR102236187B1 (en) | 2016-09-13 | 2021-04-06 | 에이에스엠엘 네델란즈 비.브이. | Positioning system and lithographic apparatus |
| KR20190047037A (en) * | 2016-09-13 | 2019-05-07 | 에이에스엠엘 네델란즈 비.브이. | Positioning system and lithographic apparatus |
| CN109690407A (en) * | 2016-09-13 | 2019-04-26 | Asml荷兰有限公司 | Positioning systems and lithography equipment |
| JP2019532324A (en) * | 2016-09-13 | 2019-11-07 | エーエスエムエル ネザーランズ ビー．ブイ． | Positioning system and lithographic apparatus |
| WO2018050443A1 (en) * | 2016-09-13 | 2018-03-22 | Asml Netherlands B.V. | Positioning system and lithographic apparatus |
| US11003095B2 (en) | 2016-09-13 | 2021-05-11 | Asml Netherlands B.V. | Positioning system and lithographic apparatus |
| CN109856916A (en) * | 2017-11-30 | 2019-06-07 | 上海微电子装备（集团）股份有限公司 | Anticollision device, collision-prevention device, work stage and exposure device |
| CN108345181A (en) * | 2018-03-29 | 2018-07-31 | 清华大学 | A kind of double-platform exchange system for silicon chip platform with two level anti-collision protection structure |
| CN108345181B (en) * | 2018-03-29 | 2024-07-23 | 清华大学 | A silicon wafer stage dual-stage exchange system with a two-stage anti-collision protection structure |
| CN110814785B (en) * | 2018-08-10 | 2021-04-02 | 上海微电子装备（集团）股份有限公司 | Limiting device and limiting system |
| CN110814785A (en) * | 2018-08-10 | 2020-02-21 | 上海微电子装备（集团）股份有限公司 | Limiting device and limiting system |
| CN114690582A (en) * | 2020-12-31 | 2022-07-01 | 上海微电子装备（集团）股份有限公司 | Anti-collision device and photoetching equipment |
| CN114690583A (en) * | 2020-12-31 | 2022-07-01 | 上海微电子装备（集团）股份有限公司 | Bearing device and photoetching equipment |
| CN114690582B (en) * | 2020-12-31 | 2025-04-04 | 上海微电子装备（集团）股份有限公司 | Anti-collision device and lithography equipment |
| CN114690583B (en) * | 2020-12-31 | 2025-10-10 | 上海微电子装备（集团）股份有限公司 | Carrier and lithography equipment |
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