CN104204003B - Resin combination and contain said composition and there is the optical thin film of inverse wave length dispersibility - Google Patents
Resin combination and contain said composition and there is the optical thin film of inverse wave length dispersibility Download PDFInfo
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- CN104204003B CN104204003B CN201380002706.5A CN201380002706A CN104204003B CN 104204003 B CN104204003 B CN 104204003B CN 201380002706 A CN201380002706 A CN 201380002706A CN 104204003 B CN104204003 B CN 104204003B
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- Prior art keywords
- thin film
- optical thin
- unit
- resin combination
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- 239000010409 thin film Substances 0.000 title claims abstract description 115
- 229920005989 resin Polymers 0.000 title claims abstract description 63
- 239000011347 resin Substances 0.000 title claims abstract description 63
- 230000003287 optical effect Effects 0.000 title claims abstract description 61
- 239000000203 mixture Substances 0.000 title description 6
- 239000000178 monomer Substances 0.000 claims abstract description 42
- 229920001577 copolymer Polymers 0.000 claims abstract description 31
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical group C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims abstract description 18
- 150000008064 anhydrides Chemical class 0.000 claims abstract description 13
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 claims abstract description 11
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims abstract description 9
- 229920002554 vinyl polymer Polymers 0.000 claims abstract description 9
- 230000009477 glass transition Effects 0.000 claims description 30
- UHOVQNZJYSORNB-UHFFFAOYSA-N monobenzene Natural products C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 23
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 claims description 13
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical group COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 claims description 12
- IGGDKDTUCAWDAN-UHFFFAOYSA-N 1-vinylnaphthalene Chemical compound C1=CC=C2C(C=C)=CC=CC2=C1 IGGDKDTUCAWDAN-UHFFFAOYSA-N 0.000 claims description 9
- -1 vinyl fluorene compound Chemical class 0.000 claims description 9
- 150000003440 styrenes Chemical class 0.000 claims description 6
- UVHXEHGUEKARKZ-UHFFFAOYSA-N 1-ethenylanthracene Chemical compound C1=CC=C2C=C3C(C=C)=CC=CC3=CC2=C1 UVHXEHGUEKARKZ-UHFFFAOYSA-N 0.000 claims description 2
- BTOVVHWKPVSLBI-UHFFFAOYSA-N 2-methylprop-1-enylbenzene Chemical compound CC(C)=CC1=CC=CC=C1 BTOVVHWKPVSLBI-UHFFFAOYSA-N 0.000 claims description 2
- XLLXMBCBJGATSP-UHFFFAOYSA-N 2-phenylethenol Chemical class OC=CC1=CC=CC=C1 XLLXMBCBJGATSP-UHFFFAOYSA-N 0.000 claims description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims description 2
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 claims description 2
- MPMBRWOOISTHJV-UHFFFAOYSA-N but-1-enylbenzene Chemical compound CCC=CC1=CC=CC=C1 MPMBRWOOISTHJV-UHFFFAOYSA-N 0.000 claims description 2
- 150000002148 esters Chemical class 0.000 claims description 2
- KETWBQOXTBGBBN-UHFFFAOYSA-N hex-1-enylbenzene Chemical compound CCCCC=CC1=CC=CC=C1 KETWBQOXTBGBBN-UHFFFAOYSA-N 0.000 claims description 2
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 claims description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 claims 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 claims 1
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 claims 1
- QIWKUEJZZCOPFV-UHFFFAOYSA-N phenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1 QIWKUEJZZCOPFV-UHFFFAOYSA-N 0.000 claims 1
- 239000010408 film Substances 0.000 description 31
- 238000000034 method Methods 0.000 description 16
- 238000007334 copolymerization reaction Methods 0.000 description 10
- 238000002360 preparation method Methods 0.000 description 10
- 239000000126 substance Substances 0.000 description 10
- 230000015572 biosynthetic process Effects 0.000 description 9
- 230000008569 process Effects 0.000 description 6
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 5
- 150000001336 alkenes Chemical class 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- 239000001257 hydrogen Substances 0.000 description 5
- UJOBWOGCFQCDNV-UHFFFAOYSA-N 9H-carbazole Chemical group C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 4
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 4
- 239000005977 Ethylene Substances 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000010287 polarization Effects 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical group C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000001125 extrusion Methods 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 2
- 150000002220 fluorenes Chemical group 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229920001519 homopolymer Polymers 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- 229930185605 Bisphenol Natural products 0.000 description 1
- KLDXJTOLSGUMSJ-JGWLITMVSA-N Isosorbide Chemical compound O[C@@H]1CO[C@@H]2[C@@H](O)CO[C@@H]21 KLDXJTOLSGUMSJ-JGWLITMVSA-N 0.000 description 1
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N alpha-methacrylic acid Natural products CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 238000010009 beating Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- SYWDWCWQXBUCOP-UHFFFAOYSA-N benzene;ethene Chemical group C=C.C1=CC=CC=C1 SYWDWCWQXBUCOP-UHFFFAOYSA-N 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- IAQRGUVFOMOMEM-UHFFFAOYSA-N but-2-ene Chemical group CC=CC IAQRGUVFOMOMEM-UHFFFAOYSA-N 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 229920000891 common polymer Polymers 0.000 description 1
- 125000000000 cycloalkoxy group Chemical group 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000001934 delay Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 230000008595 infiltration Effects 0.000 description 1
- 238000001764 infiltration Methods 0.000 description 1
- 229960002479 isosorbide Drugs 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000010309 melting process Methods 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000009738 saturating Methods 0.000 description 1
- DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 238000004017 vitrification Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/06—Hydrocarbons
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/08—Anhydrides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/04—Anhydrides, e.g. cyclic anhydrides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
- C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
- C08L33/10—Homopolymers or copolymers of methacrylic acid esters
- C08L33/12—Homopolymers or copolymers of methyl methacrylate
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D133/04—Homopolymers or copolymers of esters
- C09D133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C09D133/10—Homopolymers or copolymers of methacrylic acid esters
- C09D133/12—Homopolymers or copolymers of methyl methacrylate
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3083—Birefringent or phase retarding elements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/85—Arrangements for extracting light from the devices
- H10K50/856—Arrangements for extracting light from the devices comprising reflective means
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/86—Arrangements for improving contrast, e.g. preventing reflection of ambient light
- H10K50/865—Arrangements for improving contrast, e.g. preventing reflection of ambient light comprising light absorbing layers, e.g. light-blocking layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/868—Arrangements for polarized light emission
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/875—Arrangements for extracting light from the devices
- H10K59/878—Arrangements for extracting light from the devices comprising reflective means
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/85—Arrangements for extracting light from the devices
- H10K50/852—Arrangements for extracting light from the devices comprising a resonant cavity structure, e.g. Bragg reflector pair
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/8793—Arrangements for polarized light emission
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Optics & Photonics (AREA)
- Polymers & Plastics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Toxicology (AREA)
- Polarising Elements (AREA)
- Electroluminescent Light Sources (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
Abstract
The present invention relates to a kind of resin combination comprising copolymer, described copolymer contains: the unit from the polycyclic aromatic monomer containing vinyl of (A) 100 weight portion；(B) unit from styrene monomer of 100 to 600 weight portions；(C) unit from anhydride monomers of 100 to 600 weight portions；(D) unit from (methyl) acrylate monomer of 150 to 1000 weight portions, and relate to containing described resin combination the optical thin film with inverse wave length dispersibility.
Description
Technical field
The present invention relates to a kind of resin combination and contain said composition and there is the optics of inverse wave length dispersibility
Thin film, and more particularly, to a kind of resin combination and optically thin containing this resin combination
Film, described resin combination has the optical thin film of wavelength dispersibility for manufacturing, in described optical thin film
In face, length of delay reduces along with the reduction of wavelength of light.
Background technology
Owing to having outstanding contrast, relatively low caloric value, frivolous outward appearance etc., the most business-like
Organic Light Emitting Diode (OLED) panel is the most prominent.The definition of panel screen can be by increasing
The difference of contrast between darkness part and the light of giant-screen, makes darkness part have bigger black
Spend and make light have bigger brightness and determine.
Typically for use liquid crystal liquid crystal display (LCD), due to contrast can by liquid crystal it
Between insert two polarizing plates with polarization element arranged substantially perpendicular to each other and control, hold at luminous component
Continue and open under bright state, limit the realization of complete blank screen.But, owing to oled panel self is permissible
Close to realize the darkness part in screen, compared with general LCD, it is believed that it is closer to black
Panel.But, this is just can to realize in the case of the light being introduced from outside into panel is effectively stopped.
That is, extraneous light can become the linearly polarized photon of single direction orientation by the outer peripheral portion of polarizing plate,
Then, this linearly polarized photon can change into circularly polarized light by 1/4 wavelength plate.By this change of light
Change, when extraneous light is incorporated into oled panel, light can be stoped to launch from panel thus real
Existing black panel.Therefore, currently used oled panel is necessarily required to 1/4 wavelength plate to regulate screen
Visual characteristic.
When linearly polarized photon is by 1/4 wavelength plate, if ideally realize circularly polarized light and depend primarily on
1/4 wavelength plate.For this purpose, in the reference wave strong point of visible region 550nm, by 1/4 wavelength
In the face of plate, length of delay sets and is about 140nm.But, in order at visible region 400nm to 750nm
Whole wavelength in perfectly round polarization is provided, in needing face at 400 nm wavelength, length of delay is about
100nm, is about 180nm under the wavelength of 750nm.
But, owing to association area is usually used in the Common Polymers of 1/4 wavelength plate, such as Merlon or polycyclic
Alkene etc. have wavelength dispersibility, wherein become big along with the reduction birefringence of wavelength of light, i.e. positive wave
Long dispersibility, it is unsuitable in 1/4 wavelength plate using.
Accordingly, as a kind of method controlling whole visible regions wavelength, it is known that heap at an angle
Folded two or more have the method for the different birefringent film postponing wavelength dependency.But, this method
Require to attach the step of multiple phase retardation films, and the step etc. of the attaching angle of adjustment phase retardation film, thus
Result in the defect of productivity.Additionally, due to the gross thickness of phase retardation film increases, it is seen that the transmitance fall of light
Low cause blackening.
Single thin film is used or not the control of above-mentioned accumulation in broadband in recent years it has been proposed that a kind of
The method of wavelength.That is, use by have the anisotropic unit of positive refracting power and have negative index respectively to
The method of the Copolycarbonate that the unit of the opposite sex is formed.But, owing to Copolycarbonate contains
Derived from the unit of bisphenol fluorene, due to the decomposition in melting process, it has such as high melting temperature or right
The limitation that gelation is sensitive.Additionally, the shortcoming of Copolycarbonate also resides in glass transition temperature
(Tg) higher, the drawing process of film needs high temperature, it is therefore desirable to different from association area device therefor is special
Process equipment.
Further it is proposed that prepared by a kind of Copolycarbonate used containing fluorenes ring and isosorbide composition
The method of phase retardation film.But, owing to Copolycarbonate has low heat stability, be not suitable for using
In such as processes such as melt-processed.
Therefore, it is badly in need of a kind of optical thin film for preparation with inverse wave length dispersibility of research and development, is prone to simultaneously
The resin combination of preparation.
Summary of the invention
Technical problem
It is an aspect of the invention to provide a kind of resin combination and the optics containing this resin combination
Thin film, described resin combination has inverse wave length dispersibility and high visible light transmissivity and heat for preparation
The optical thin film of stability, the most easily prepared.
Technical scheme
According to one aspect of the present invention, it is provided that a kind of resin combination containing copolymer, described copolymerization
Thing comprises: the unit from the polycyclic aromatic monomer containing vinyl of (A) 100 weight portion；(B) 100 arrive
The unit from styrene monomer of 600 weight portions；(C) 100 to 600 weight portions from anhydride monomers
Unit；(D) unit from (methyl) acrylate monomer of 150 to 1000 weight portions.
According to another aspect of the present invention, it is provided that one containing described resin combination and arrives at 380nm
There is in the wavelength region of 770nm the optical thin film of inverse wave length dispersibility.
According to another aspect of the present invention, it is provided that a kind of organic light emitting display, it has order heap
Folded reflecting plate, oled panel, optical thin film and polarizing plate.
Beneficial effect
Can easily prepare according to the resin combination of exemplary embodiment of the invention, and containing being somebody's turn to do
The optical thin film of resin combination has inverse wave length dispersibility and high visible light transmissivity and heat stability,
Therefore 1/4 wavelength plate it is applicable to.
Below, the illustrative embodiments of the present invention will be described.But, although with multiple different form
Illustrate the present invention, should not be construed to limit the invention to embodiments set forth herein.
These embodiments provided are intended merely to make the present invention understand and completely, make those skilled in the art comprehensive
Understand the scope of the present invention.
In order to solve the problems referred to above, the present inventor is through the result repeatedly studied, it is found that logical
Cross the specific monomer preparation tree that copolymerization has in negative intrinsic birefringent monomer and the most intrinsic birefringent monomer
When oil/fat composition and preparation contain the optical thin film of this resin combination, it is possible to obtain postpone in there is face
The wavelength dispersibility that value reduces along with the minimizing of wavelength of light, the i.e. optical thin film of inverse wave length dispersibility,
Thus complete the present invention.
Can comprise according to the resin combination of exemplary embodiment of the invention: copolymer, described copolymerization
Thing contains the unit from the polycyclic aromatic monomer containing vinyl of (A) 100 weight portion；(B) 100 arrive
The unit from styrene monomer of 600 weight portions；(C) 100 to 600 weight portions from anhydride monomers
Unit；(D) unit from (methyl) acrylate monomer of 150 to 1000 weight portions.
In this case, unit (A) and unit (B) come from and have negative intrinsic birefringent monomer, unit (C)
Come from unit (D) and there is the most intrinsic birefringent monomer.In this case, negative intrinsic birefringence refers to
On the direction be perpendicular to draw direction, demonstrate that delay, the most intrinsic birefringence are during the stretching of monomer homopolymer
Refer to demonstrate delay in the stretching direction during the stretching of monomer homopolymer.
Comprise from there is the unit of negative intrinsic birefringent monomer and from tool simultaneously for above-mentioned use
The copolymer having the unit of the most intrinsic birefringent monomer prepares the situation of optical thin film, has negative intrinsic double
The birefringence that goes out shown by the unit of refraction and there is the birefringence gone out shown by the most intrinsic birefringent unit
Can cancel each other out after it stretches, thus produce wavelength dispersibility.According to the research of the present inventor, permissible
Confirm: when there is the content of negative intrinsic birefringent unit and there is the content of the most intrinsic birefringent unit
When meeting a numerical range, the optical thin film with inverse wave length dispersibility can be prepared.
Meanwhile, the described polycyclic aromatic monomer containing vinyl can be two-ring of vinyl substituted or three-
Cyclic aromatic series monomer, e.g., can be selected from vinyl naphthalene, VCz, vinyl fluorene compound and
At least one in vinyl anthracene etc..Owing to the polycyclic aromatic monomer containing vinyl has multiring structure,
Copolymer containing polycyclic aromatic monomer and the glass transition temperature of the resin combination containing described copolymer
Degree is improved, and therefore can prepare the optical thin film with high-fire resistance.Therefore, described for using
Optical thin film prepares the situation of polarizing plate, and described polarizing plate is needing the process of high temperature, such as polarizing
The lamination process of sheet etc. are favourable.
Especially, in the present invention, unit (A) may come from the ethylene that following [chemical formula 1] represents
Base naphthalene or the N-VCz that [chemical formula 2] represents below.
[chemical formula 1]
[chemical formula 2]
Meanwhile, described styrene monomer can be substituted or unsubstituted styrene, for example, it may be benzene
Ethylene；C1～10 ring-alkylated styrenes such as, α-methyl styrene, ethyl styrene, butylstyrene or 12
Ring-alkylated styrenes；Or dialkylstyrene is such as, dimethyl styrene, hydroxy styrenes etc..Styrene list
Body can have negative birefringence in the way of identical with unit (A), to help to promote and following anhydride list
The copolymerization of body, it is possible to strengthen the machinability of all resins.
Especially, in the resin combination according to the illustrative embodiments of the present invention, unit (B) can
With from unsubstituted styrene.Its reason is compared with other styrene monomers, unsubstituted styrene
It is easily obtained, the color of resin is not adversely affected, and be not result in the decline of thermostability.
Then, as anhydride monomers, can have the anhydride monomers of positive birefringence and not limit.More excellent
Choosing, it is possible to use there is the anhydride monomers of ring structure.Such as, described anhydride monomers can be selected from neighbour
At least one in phthalate anhydride and maleic anhydride.Using the anhydride as above with ring structure
In the case of monomer, anhydride monomers can have positive birefringence and all resins can have the resistance to of raising
Hot.
Especially, in the resin combination according to the illustrative embodiments of the present invention, unit (C) comes
From in maleic anhydride.Its reason is that maleic anhydride is easily obtained, and contains maleic acid at resin combination
In the case of acid anhydride, it is possible to achieve stable reaction.
As described (methyl) acrylate monomer, it is possible to use have (methyl) third of positive birefringence
Alkene acid ester monomer and do not limit.Such as, (methyl) acrylate monomer can be selected from C1～5Alkyl (first
Base) acrylate such as, (methyl) acrylic acid methyl ester., (methyl) ethyl acrylate or (methyl) propylene
Acid butyl ester；C5～10Cycloalkyl (methyl) acrylate such as, (methyl) cyclohexyl acrylate；Or aryl (first
Base) acrylate such as, in (methyl) phenyl acrylate, (methyl) acrylic acid phenoxy group ester etc. at least
A kind of.Owing to (methyl) acrylate monomer has positive birefringence, but demonstrate low birefringence,
They can not the birefringence of appreciable impact all resins, and its thermostability can be controlled, consequently facilitating add
Work.
Especially, in the resin combination according to the illustrative embodiments of the present invention, unit (D) can
To come from (methyl) acrylic acid methyl ester..Its reason is because (methyl) acrylic acid methyl ester. and has high resistance to
Hot and good color, and be prone to and other monomer reactions.
Meanwhile, use, in order to give, the optical thin film prepared according to the resin combination of embodiment of the present invention
Inverse wave length dispersibility, can suitably adjust the content of each unit in copolymer.
More specifically, in the resin combination of the illustrative embodiments of the present invention, based on 100 weights
The described copolymer of amount part, the content of the unit (A) coming from the polycyclic aromatic monomer with vinyl is
5 to 20 weight portions or 8 to 20 weight portions.When the content of unit (A) exceedes described numerical range,
Can be difficult to ensure that inverse wave length dispersibility, the copolyreaction between monomer is difficult to be smoothed out, and production cost can increase
Add.
Additionally, unit based on 100 weight portions (A), come from the containing of unit (B) of styrene monomer
Amount can be 100 to 600 weight portions or 100 to 375 weight portions.When the content of unit (B) is beyond institute
When stating numerical range, the copolyreaction with unit (C) can not occur smoothly, therefore causes the fall of thermostability
Low.
Further, unit based on 100 weight portions (A), come from the unit (C) of anhydride monomers
Content can be 100 to 600 weight portions or 100 to 375 weight portions.When the content of unit (C) exceeds
During described numerical range, it is difficult to guarantee inverse wave length dispersibility.
Further, unit based on 100 weight portions (A), the content of unit (D) can be 150
To 1000 weight portions or 150 to 625 weight portions.When the content of unit (D) meets this numerical range
Time, it is easy to control preferable retardance, and show the transparency of excellence.
Meanwhile, in the copolymer according to exemplary embodiment of the invention, there is the unit of negative birefringence
The ratio of total amount and the total amount of the unit with positive birefringence, i.e. there is the unit (A) of negative birefringence
Ratio with the total amount of unit (B) with the total amount of the unit (C) and unit (D) with positive birefringence
Can be about 1:3 to 2:3.When the content of the unit that copolymer is comprised meets this numerical range, permissible
Guarantee more excellent inverse wave length dispersibility.
[chemical formula 3] below each freedom can be comprised according to the copolymer of exemplary embodiment of the invention to arrive
The repetitive that [chemical formula 6] represents.
[chemical formula 3]
Wherein, A represents naphthalene, carbazole, fluorenes or anthracene, and preferably represents naphthalene or carbazole.
[chemical formula 4]
Here, R1、R2And R3Each represent hydrogen, C1～10Alkyl or hydroxyl, preferably hydrogen.
[chemical formula 5]
[chemical formula 6]
Here, R4It is hydrogen or methyl, R5It is hydrogen, C1～5Alkyl, C5～10Cycloalkyl, phenyl or
Phenoxy group, and preferably, R4For methyl and R5For hydrogen.
Meanwhile, the glass transition temperature of described copolymer can be 110 DEG C to 160 DEG C or 120 DEG C to 150
℃.When the glass transition temperature of copolymer meets described numerical range, this copolymer the resin formed
It is not easy to heat damage, and in the preparation process of optical thin film, is readily applied to such as melt-processed
In step.
Further, for thermostability, sufficient machinability and productivity, the weight average of described copolymer
Molecular weight can be 70,000 to 150,000.
If desired, also include except copolymer according to the resin combination of the illustrative embodiments of the present invention
Other compositions in addition, such as, as UV absorbent, antioxidant or filler etc. additive,
Solubilizing agent or stabilizer etc..
It is described below the optical thin film according to exemplary embodiment of the invention.
Pass through to use according to the exemplary enforcement of the present invention according to the optical thin film of exemplary embodiment of the invention
Prepared by the resin combination of mode, and this optical thin film can be at the wavelength of 380nm to 770nm
There is in region inverse wave length dispersibility.
More specifically, it is possible to use pass through relevant according to the resin combination of exemplary embodiment of the invention
The method for manufacturing thin film that field is commonly known, such as, solution casting method, melt extrusion method, pressure sintering or
Rolling processes etc. prepare the optical thin film according to exemplary embodiment of the invention.Especially, with regard to productivity
Speech, it is possible to use melt extrusion method prepares the optical thin film of exemplary embodiment of the invention.As long as no
Film performance can be had a negative impact, in some cases, can be to thin in the preparation process of thin film
Film adds additive such as modifier, it is possible to be additionally carried out uniaxially or biaxially drawing process.
In this case, draft temperature is in the vitrification close to thermoplastic resin composition's (film raw material)
In the range of transition temperature.Described draft temperature can be that (glass transition temperature-30 DEG C) is to (glass
Change transition temperature+100 DEG C), and it is preferably (glass transition temperature-20 DEG C) to (glass transition temperature
Spend+80 DEG C).When draft temperature is less than (glass transition temperature-30 DEG C), it is impossible to obtain enough drawing
Stretch ratio.On the other hand, when draft temperature is higher than (glass transition temperature+100 DEG C), it is possible to create
The flowing (stream) of resin combination, thus can not stably stretch.
As it has been described above, use foundation exemplary embodiment of the invention prepared by the resin combination of the present invention
Optical thin film can have inverse wave length dispersibility, more specifically, meet following formula (2) and (3).
Formula (2): Rin(450)/Rin(550)<1.0
Formula (3): Rin(650)/Rin(550)>1.0
Here, Rin(450), RinAnd R (550)in(650) wavelength 450nm, 550nm and 650nm are represented respectively
Under pellicular front in length of delay (Rin).In this case, length of delay R in facein(λ) fixed by following formula (1)
Justice.
Formula (1): Rin(λ)=(nx-ny)×d
Here, λ is to measure wavelength, nxIt is thin film refractive index in the face having on largest refractive index direction,
nyIt is that thin film is being perpendicular to nxRefractive index in face on direction, d is the thickness of thin film.
Meanwhile, prolong in the optical thin film of foundation exemplary embodiment of the invention face under 450nm wavelength
It is worth R latein(450) can be about 105nm to 130nm, 107nm to 120nm, or 110nm arrives
115nm.Further, the optical thin film of foundation exemplary embodiment of the invention is under 550nm wavelength
Face in length of delay Rin(550) can be about 130nm to 144nm or 135nm to 140nm.More enter
One step ground, the optical thin film of foundation exemplary embodiment of the invention postpones in the face under 650nm wavelength
Value Rin(650) can be about 140nm to 170nm, 150nm to 170nm or 160nm arrives
165nm。
Additionally, the R of described optical thin filmin(450)/Rin(550) value is about 0.7 to 0.95,0.75 to 0.9
Or 0.8 to 0.89.The R of optical thin filmin(650)/Rin(550) value is about 1.03 to 1.3,1.05 to 1.25
Or 1.07 to 1.2.
R when described optical thin filmin(450)、Rin(550)、Rin(650) when value meets described numerical range,
In whole wavelength of visible ray, linearly polarized photon can be converted into preferable circularly polarized light.
Meanwhile, the thickness according to the optical thin film of exemplary embodiment of the invention is that 20 μm are to 80 μm
Or 30 μm are to 60 μm.In this case, after the thickness of optical thin film refers to stretching, final acquisition is thin
The thickness of film.When the thickness of optical thin film is in described numerical range, it is possible to obtain beating of polarizing plate
Thin and preferable circular polarization.Additionally, the mist degree of the optical thin film according to exemplary embodiment of the invention
Value can be equal to or less than 0.5, preferably equal to or smaller than 0.3.
Additionally, it is saturating to have excellent visible ray according to the optical thin film of exemplary embodiment of the invention
Cross rate.Such as, according to the visible light transmissivity of the optical thin film of exemplary embodiment of the invention can be
90% or more than 90%.Therefore, the above-mentioned foundation exemplary embodiment of the invention with visible light permeability
Optical thin film due to the visual characteristic of its excellence can be favourable.
Owing to the optical thin film according to exemplary embodiment of the invention can form monolayer and have head sea
Long dispersibility, can obtain preferable optical characteristics while thinning realizing thin film.Additionally, containing
The image display stating optical thin film has advantage at such as miniaturization in terms of alleviating its weight.Enter one
Step ground, compared with the optical thin film by stacked multilayer preparation in correlation technique with inverse wave length dispersibility,
In the preparation of the optical thin film of the illustrative embodiments of the present invention, it is not necessary to each layer that regulation attaches
The operation of angle, thus improve productivity.
The above-mentioned optical thin film according to exemplary embodiment of the invention may be used for various uses, such as,
Can be used for phase retardation film and 1/4 wavelength plate etc..Especially, according to the optics of exemplary embodiment of the invention
Thin film may be used for 1/4 wavelength plate of Organic Light Emitting Diode (OLED).In this case, described light
Learn thin film can be placed between oled panel and polarizing plate.That is, according to the exemplary enforcement of the present invention
The organic light emitting display of mode has following structure: wherein reflecting plate, oled panel, foundation are originally
The optical thin film of invention illustrative embodiments and polarizing plate order stacking.
Detailed description of the invention
Below, the present invention will be described in detail by specific embodiment.
In embodiments of the present invention, the appraisal procedure of physical property is as follows.
1. weight average molecular weight (Mw): use gel infiltration color by dissolving prepared resin in oxolane
Spectrometry (GPC) is measured.
2.Tg(glass transition temperature): use TA Instrument Co., the differential scanning calorimeter of Ltd.
(DSC) measure.
3. length of delay: under the glass transition temperature of thin film after oriented film, uses Axometrics.Inc.
AxoScan measure.
4. haze value (transparency): use Murakami color Research Laboratory.Co.ltd.'s
HAZEMETER HM-150 measures haze value.
Inventive embodiments 1
By the vinyl naphthalene of copolymerization 8 weight portion, the maleic anhydride of 22 weight portions, the benzene second of 20 weight portions
The methyl methacrylate of alkene and 50 weight portions prepares resin.The copolymer prepared has the weight of 120,000
Average molecular weight and the glass transition temperature of 136 DEG C.
Then, under conditions of 250 DEG C and 250rpm, this resin is used by T-die head film formation device
After preparing the non-stretched film that width is 1500nm, by this thin film along TD under glass transition temperature
Direction simple tension, and measure the length of delay of this thin film.In this case, the haze value of this thin film is
0.2。
Inventive embodiments 2
By the vinyl naphthalene of copolymer-1 0 weight portion, the maleic anhydride of 25 weight portions, the benzene of 20 weight portions
The methyl methacrylate of ethylene and 45 weight portions prepares resin.The copolymer prepared has 120,000
Weight average molecular weight and the glass transition temperature of 141 DEG C.
Then, under conditions of 280 DEG C and 250rpm, this resin is used by T-die head film formation device
After preparing the non-stretched film that width is 1500nm, by this thin film along TD under glass transition temperature
Direction simple tension, and measure the length of delay of this thin film.In this case, the haze value of thin film is 0.2.
Inventive embodiments 3
By the vinyl naphthalene of copolymer-1 0 weight portion, the maleic anhydride of 25 weight portions, the benzene of 30 weight portions
The methyl methacrylate of ethylene and 35 weight portions prepares resin.The copolymer prepared has 120,000
Weight average molecular weight and the glass transition temperature of 135 DEG C.
Then, under conditions of 250 DEG C and 250rpm, this resin is used by T-die head film formation device
After preparing the non-stretched film that width is 1500nm, by this thin film along TD under glass transition temperature
Direction simple tension, and measure the length of delay of this thin film.In this case, the haze value of thin film is 0.2.
Inventive embodiments 4
By the vinyl naphthalene of copolymerization 20 weight portion, the maleic anhydride of 30 weight portions, the benzene of 20 weight portions
The methyl methacrylate of ethylene and 30 weight portions prepares resin.The copolymer prepared has 130,000
Weight average molecular weight and the glass transition temperature of 146 DEG C.
Then, under conditions of 280 DEG C and 250rpm, this resin is used by T-die head film formation device
After preparing the non-stretched film that width is 1500nm, by this thin film along TD under glass transition temperature
Direction simple tension, and measure the length of delay of this thin film.In this case, the haze value of thin film is 0.2.
Inventive embodiments 5
By the vinyl naphthalene of copolymerization 5 weight portion, the maleic anhydride of 20 weight portions, the benzene second of 30 weight portions
The methyl methacrylate of alkene and 45 weight portions prepares resin.The copolymer prepared has the weight of 115,000
Average molecular weight and the glass transition temperature of 132 DEG C.
Then, under conditions of 280 DEG C and 250rpm, this resin is used by T-die head film formation device
After preparing the non-stretched film that width is 1500nm, by this thin film along TD under glass transition temperature
Direction simple tension, and measure the length of delay of this thin film.In this case, the haze value of thin film is 0.2.
Inventive embodiments 6
By the N-VCz of copolymerization 5 weight portion, the maleic anhydride of 22 weight portions, 23 weight portions
The methyl methacrylate of styrene and 50 weight portions prepares resin.The copolymer prepared has 130,000
Weight average molecular weight and the glass transition temperature of 143 DEG C.
Then, under conditions of 280 DEG C and 250rpm, this resin is used by T-die head film formation device
After preparing the non-stretched film that width is 1500nm, by this thin film along TD under glass transition temperature
Direction simple tension, and measure the length of delay of this thin film.In this case, the haze value of thin film is 0.2.
Comparative example 1
By the maleic anhydride of copolymerization 30 weight portion, the styrene of 40 weight portions and the methyl of 30 weight portions
Acrylic acid methyl ester. prepares resin.Prepare copolymer have 130,000 weight average molecular weight and the glass of 131 DEG C
Glass transition temperature.
Then, under conditions of 280 DEG C and 250rpm, this resin is used by T-die head film formation device
After preparing the non-stretched film that width is 1500nm, by this thin film along TD under glass transition temperature
Direction simple tension, and measure the length of delay of this thin film.In this case, the haze value of thin film is 0.2.
Comparative example 2
By the vinyl naphthalene of copolymer-1 0 weight portion, the maleic anhydride of 10 weight portions, the benzene second of 5 weight portions
The methyl methacrylate of alkene and 75 weight portions prepares resin.The copolymer prepared has the weight of 130,000
Average molecular weight and the glass transition temperature of 131 DEG C.
Then, under conditions of 280 DEG C and 250rpm, this resin is used by T-die head film formation device
After preparing the non-stretched film that width is 1500nm, by this thin film along TD under glass transition temperature
Direction simple tension, and measure the length of delay of this thin film.In this case, the haze value of thin film is 0.2.
Comparative example 3
By the vinyl naphthalene of copolymerization 3 weight portion, the maleic anhydride of 10 weight portions, the benzene second of 20 weight portions
The methyl methacrylate of alkene and 67 weight portions prepares resin.The copolymer prepared has the weight of 120,000
Average molecular weight and the glass transition temperature of 124 DEG C.
Then, under conditions of 280 DEG C and 250rpm, this resin is used by T-die head film formation device
After preparing the non-stretched film that width is 1500nm, by this thin film along TD under glass transition temperature
Direction simple tension, and measure the length of delay of this thin film.In this case, the haze value of thin film is 0.2.
Test example 1
The foundation embodiment 1 to 6 recorded under various wavelength and the optical thin film of comparative example 1 to 3 preparation
Face in length of delay result as shown in table 1.After with certain draw ratio thin film, thickness is 60 μm
Thin film face in length of delay when being 137nm under the wavelength of 550nm, draw using this extensibility as fixing
Stretch rate, measure the whole length of delays under different wave length.In the range of total Test, thin film is transparent,
Have 91% or be more than the visible light transmissivity of 91%.
[table 1]
Although the present invention being made that displaying and description in conjunction with detailed description of the invention, those skilled in the art should
This is understood, in the case of the spirit and scope of the present invention limited without departing substantially from claims, and can
To make modifications and variations.
Claims (17)
1. a resin combination, comprises copolymer, and described copolymer contains:
(A) unit from the polycyclic aromatic monomer containing vinyl of 100 weight portions；
(B) unit from styrene monomer of 100 to 600 weight portions；
(C) unit from anhydride monomers of 100 to 600 weight portions；With
(D) unit from (methyl) acrylate monomer of 150 to 1000 weight portions,
Wherein, described unit (A) and unit (B) have negative intrinsic birefringence；And
Described unit (C) and unit (D) have the most intrinsic birefringence.
2. resin combination as claimed in claim 1, wherein, in described copolymer, (unit (A)
Total amount with unit (B)): (unit (C) and the total amount of unit (D)) is 1:3 to 2:3.
3. resin combination as claimed in claim 1, wherein, described many cyclophanes containing vinyl
Race's monomer be in vinyl naphthalene, N-VCz, vinyl fluorene compound and vinyl anthracene extremely
Few one.
4. resin combination as claimed in claim 1, wherein, described styrene monomer be selected from α-
Methyl styrene, ethyl styrene, butylstyrene, hydroxy styrenes, dimethyl styrene and 12
At least one in ring-alkylated styrenes.
5. resin combination as claimed in claim 1, wherein, described anhydride monomers is selected from adjacent benzene
At least one in dicarboxylic acid anhydride and maleic anhydride.
6. resin combination as claimed in claim 1, wherein, described (methyl) acrylate list
Body is selected from methyl methacrylate, cyclohexyl methacrylate, phenyl methacrylate, acrylic acid fourth
At least one in ester, methacrylic acid phenoxy group ester and ethyl acrylate.
7. resin combination as claimed in claim 1, wherein, the glass transition of described copolymer
Temperature is 110 DEG C to 160 DEG C.
8. resin combination as claimed in claim 1, wherein, the weight average molecular weight of described copolymer
Be 70,000 to 150,000.
9. an optical thin film, containing the resin combination as according to any one of claim 1 to 8,
And there is in the wavelength region of 380nm to 770nm inverse wave length dispersibility.
10. optical thin film as claimed in claim 9, wherein, described optical thin film is 1/4 wavelength plate.
11. optical thin films as claimed in claim 9, wherein, described optical thin film is at 450nm ripple
In the face represented by formula below (1) under length, length of delay is 107nm to 130nm,
Formula (1) Rin(λ)=(nx-ny)×d
Wherein, nxIt is thin film refractive index, n in the face having on largest refractive index directionyIt is that thin film is hanging down
Straight in nxRefractive index in face on direction, d is the thickness of thin film.
12. optical thin films as claimed in claim 9, wherein, described optical thin film is at 550nm ripple
In face under Chang, length of delay is 130nm to 144nm,
Wherein, described interior length of delay is calculated by formula below (1):
Formula (1) Rin(λ)=(nx-ny)×d
Wherein, nxIt is thin film refractive index, n in the face having on largest refractive index directionyIt is that thin film is hanging down
Straight in nxRefractive index in face on direction, d is the thickness of thin film.
13. optical thin films as claimed in claim 9, wherein, described optical thin film is at 650nm ripple
In face under Chang, length of delay is 140nm to 170nm,
Wherein, described interior length of delay is calculated by formula below (1):
Formula (1) Rin(λ)=(nx-ny)×d
Wherein, nxIt is thin film refractive index, n in the face having on largest refractive index directionyIt is that thin film is hanging down
Straight in nxRefractive index in face on direction, d is the thickness of thin film.
14. optical thin films as claimed in claim 9, wherein, described optical thin film meets following formula
(2) and (3),
Formula (2) Rin(450)/Rin(550)<1.0
Formula (3) Rin(650)/Rin(550)>1.0
Wherein, Rin(450)、RinAnd R (550)in(650) be illustrated respectively in wavelength 450nm, 550nm and
Length of delay in the face of the thin film under 650nm,
Wherein, described interior length of delay is calculated by formula below (1):
Formula (1) Rin(λ)=(nx-ny)×d
Wherein, nxIt is thin film refractive index, n in the face having on largest refractive index directionyIt is that thin film is hanging down
Straight in nxRefractive index in face on direction, d is the thickness of thin film.
15. optical thin films as claimed in claim 14, wherein, the R of described optical thin filmin(450)/
Rin(550) value is 0.7 to 0.95.
16. optical thin films as claimed in claim 14, wherein, the R of described optical thin filmin(650)/
Rin(550) value is 1.03 to 1.3.
17. 1 kinds of organic light emitting displays, have a following structure: wherein reflecting plate, oled panel,
Optical thin film described in claim 9 and polarizing plate order stacking.
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2013-0033790 | 2013-03-28 | ||
| KR20130033790 | 2013-03-28 | ||
| KR20130112585A KR101494545B1 (en) | 2013-03-28 | 2013-09-23 | resin composition and optical film having anti-wavelength dispersibility comprising the same |
| KR10-2013-0112585 | 2013-09-23 | ||
| PCT/KR2013/008498 WO2014157791A1 (en) | 2013-03-28 | 2013-09-23 | Resin composition and optical film having reverse wavelength dispersibility comprising same |
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| CN104204003A CN104204003A (en) | 2014-12-10 |
| CN104204003B true CN104204003B (en) | 2016-08-17 |
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| JP (1) | JP5821159B2 (en) |
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| CN108485448B (en) * | 2017-02-21 | 2022-02-22 | 住友化学株式会社 | Resin composition, film and copolymer |
| CN111868583B (en) * | 2018-03-19 | 2022-05-31 | 日本瑞翁株式会社 | Retardation film and method for producing retardation film |
| KR102153086B1 (en) * | 2018-07-31 | 2020-09-07 | 주식회사 엘지화학 | Novel polymer and organic light emitting device comprising the same |
| CN110358010B (en) * | 2019-07-16 | 2021-11-23 | 儒芯微电子材料（上海）有限公司 | Alkali soluble polymer resin and preparation method and application thereof |
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| US20060122327A1 (en) * | 2004-10-13 | 2006-06-08 | Christopher Lester | Process for preparing enlarged latex particles |
| WO2009031544A1 (en) | 2007-09-04 | 2009-03-12 | Denki Kagaku Kogyo Kabushiki Kaisha | Thermoplastic copolymer resin and molded body thereof for optical use |
| CN101903175B (en) | 2007-12-20 | 2015-05-27 | Lg化学株式会社 | Multi-layered acrylic retardation film and fabrication method thereof |
| KR101105424B1 (en) * | 2008-04-30 | 2012-01-17 | 주식회사 엘지화학 | Resin compositions and optical films formed by using the same |
| JP4469416B2 (en) * | 2008-08-07 | 2010-05-26 | 積水化学工業株式会社 | Insulating sheet and laminated structure |
| KR101206721B1 (en) | 2009-01-06 | 2012-11-30 | 주식회사 엘지화학 | Retardation films and liquid crystal display comprising the sames |
| KR101231715B1 (en) | 2009-03-18 | 2013-02-08 | 주식회사 엘지화학 | Acryl-based copolymer, optical film and liquid crystal display comprising the same |
| JP5600905B2 (en) * | 2009-08-24 | 2014-10-08 | 東洋紡株式会社 | Adhesive film |
| JP5475367B2 (en) * | 2009-08-25 | 2014-04-16 | 株式会社日本触媒 | N-vinylcarbazole copolymer retardation film and method for producing N-vinylcarbazole copolymer retardation film |
| WO2012023834A2 (en) * | 2010-08-20 | 2012-02-23 | 주식회사 엘지화학 | Highly heat resistant and highly strong acrylic copolymer, a resin composition comprising the same and an optical film and an ips mode liquid crystal display device comprising the same |
| JP2012078778A (en) * | 2010-09-08 | 2012-04-19 | Nippon Shokubai Co Ltd | Resin composition, optical film and image display device |
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| JP5821159B2 (en) | 2015-11-24 |
| US9088009B2 (en) | 2015-07-21 |
| JP2015515535A (en) | 2015-05-28 |
| KR101494545B1 (en) | 2015-02-23 |
| US20150084007A1 (en) | 2015-03-26 |
| KR20140118675A (en) | 2014-10-08 |
| CN104204003A (en) | 2014-12-10 |
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