CN104190665B - 一种中大尺寸蓝宝石晶圆图案化制程黄光涂布前清洗装置及方法 - Google Patents
一种中大尺寸蓝宝石晶圆图案化制程黄光涂布前清洗装置及方法 Download PDFInfo
- Publication number
- CN104190665B CN104190665B CN201410391553.4A CN201410391553A CN104190665B CN 104190665 B CN104190665 B CN 104190665B CN 201410391553 A CN201410391553 A CN 201410391553A CN 104190665 B CN104190665 B CN 104190665B
- Authority
- CN
- China
- Prior art keywords
- sapphire wafer
- vacuum adsorption
- sized
- patterning process
- cleaning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 229910052594 sapphire Inorganic materials 0.000 title claims abstract description 62
- 239000010980 sapphire Substances 0.000 title claims abstract description 62
- 238000004140 cleaning Methods 0.000 title claims abstract description 43
- 238000000034 method Methods 0.000 title claims abstract description 43
- 238000000059 patterning Methods 0.000 title claims abstract description 19
- 239000011248 coating agent Substances 0.000 title abstract description 16
- 238000000576 coating method Methods 0.000 title abstract description 16
- 238000001179 sorption measurement Methods 0.000 claims abstract description 27
- 239000007921 spray Substances 0.000 claims abstract description 27
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 16
- 239000008367 deionised water Substances 0.000 claims description 15
- 229910021641 deionized water Inorganic materials 0.000 claims description 15
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 abstract description 7
- 238000012864 cross contamination Methods 0.000 abstract description 6
- 238000010521 absorption reaction Methods 0.000 abstract 2
- 239000003344 environmental pollutant Substances 0.000 description 8
- 239000012530 fluid Substances 0.000 description 8
- 231100000719 pollutant Toxicity 0.000 description 8
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000013078 crystal Substances 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 210000005056 cell body Anatomy 0.000 description 2
- 239000000356 contaminant Substances 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000006260 foam Substances 0.000 description 2
- 239000004531 microgranule Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000005201 scrubbing Methods 0.000 description 2
- 229910052793 cadmium Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- XEMZLVDIUVCKGL-UHFFFAOYSA-N hydrogen peroxide;sulfuric acid Chemical compound OO.OS(O)(=O)=O XEMZLVDIUVCKGL-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000003643 water by type Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
- B08B3/022—Cleaning travelling work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/20—Cleaning of moving articles, e.g. of moving webs or of objects on a conveyor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
- B08B3/123—Cleaning travelling work, e.g. webs, articles on a conveyor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02052—Wet cleaning only
Landscapes
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
Description
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201410391553.4A CN104190665B (zh) | 2014-08-11 | 2014-08-11 | 一种中大尺寸蓝宝石晶圆图案化制程黄光涂布前清洗装置及方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201410391553.4A CN104190665B (zh) | 2014-08-11 | 2014-08-11 | 一种中大尺寸蓝宝石晶圆图案化制程黄光涂布前清洗装置及方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN104190665A CN104190665A (zh) | 2014-12-10 |
CN104190665B true CN104190665B (zh) | 2017-02-15 |
Family
ID=52076112
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201410391553.4A Active CN104190665B (zh) | 2014-08-11 | 2014-08-11 | 一种中大尺寸蓝宝石晶圆图案化制程黄光涂布前清洗装置及方法 |
Country Status (1)
Country | Link |
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CN (1) | CN104190665B (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105478391A (zh) * | 2015-12-31 | 2016-04-13 | 上海新阳半导体材料股份有限公司 | 晶圆清洁设备 |
CN113118100B (zh) * | 2019-12-31 | 2022-09-06 | 清华大学 | 一种晶圆清洗装置及清洗方法 |
CN114054234A (zh) * | 2021-11-04 | 2022-02-18 | 至微半导体(上海)有限公司 | 一种用于spm清洗工艺的多功能喷头机构 |
CN116190264B (zh) * | 2022-12-29 | 2024-05-31 | 天通银厦新材料有限公司 | 一种蓝宝石衬底基片背刷装置 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1399312A (zh) * | 2001-07-25 | 2003-02-26 | 旺宏电子股份有限公司 | 晶片清洗装置 |
CN1428821A (zh) * | 2001-12-26 | 2003-07-09 | 矽统科技股份有限公司 | 晶圆清洗装置及其刷洗总成 |
CN101590474A (zh) * | 2008-05-30 | 2009-12-02 | 中芯国际集成电路制造(上海)有限公司 | 清洗系统上的喷射装置 |
CN101651085A (zh) * | 2008-08-14 | 2010-02-17 | 中芯国际集成电路制造(北京)有限公司 | 晶片清洗装置及清洗方法 |
CN101789371A (zh) * | 2009-01-23 | 2010-07-28 | 中芯国际集成电路制造(上海)有限公司 | 半导体元器件的清洗方法 |
CN102039288A (zh) * | 2009-10-13 | 2011-05-04 | 中芯国际集成电路制造(上海)有限公司 | 晶圆的清洗方法 |
CN204093787U (zh) * | 2014-08-11 | 2015-01-14 | 厦门润晶光电有限公司 | 一种中大尺寸蓝宝石晶圆图案化制程黄光涂布前清洗装置 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3140556B2 (ja) * | 1992-04-23 | 2001-03-05 | 沖電気工業株式会社 | 半導体ウエハの洗浄方法 |
-
2014
- 2014-08-11 CN CN201410391553.4A patent/CN104190665B/zh active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1399312A (zh) * | 2001-07-25 | 2003-02-26 | 旺宏电子股份有限公司 | 晶片清洗装置 |
CN1428821A (zh) * | 2001-12-26 | 2003-07-09 | 矽统科技股份有限公司 | 晶圆清洗装置及其刷洗总成 |
CN101590474A (zh) * | 2008-05-30 | 2009-12-02 | 中芯国际集成电路制造(上海)有限公司 | 清洗系统上的喷射装置 |
CN101651085A (zh) * | 2008-08-14 | 2010-02-17 | 中芯国际集成电路制造(北京)有限公司 | 晶片清洗装置及清洗方法 |
CN101789371A (zh) * | 2009-01-23 | 2010-07-28 | 中芯国际集成电路制造(上海)有限公司 | 半导体元器件的清洗方法 |
CN102039288A (zh) * | 2009-10-13 | 2011-05-04 | 中芯国际集成电路制造(上海)有限公司 | 晶圆的清洗方法 |
CN204093787U (zh) * | 2014-08-11 | 2015-01-14 | 厦门润晶光电有限公司 | 一种中大尺寸蓝宝石晶圆图案化制程黄光涂布前清洗装置 |
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Publication number | Publication date |
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CN104190665A (zh) | 2014-12-10 |
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