CN104178813A - Kyropoulos-process sapphire single-crystal growth furnace thermal-insulation side screen - Google Patents
Kyropoulos-process sapphire single-crystal growth furnace thermal-insulation side screen Download PDFInfo
- Publication number
- CN104178813A CN104178813A CN201410465267.8A CN201410465267A CN104178813A CN 104178813 A CN104178813 A CN 104178813A CN 201410465267 A CN201410465267 A CN 201410465267A CN 104178813 A CN104178813 A CN 104178813A
- Authority
- CN
- China
- Prior art keywords
- side screen
- insulation side
- kyropoulos
- tungsten
- crystal growth
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
The invention relates to a Kyropoulos-process sapphire single-crystal growth furnace, particularly a Kyropoulos-process sapphire single-crystal growth furnace thermal-insulation side screen. The thermal-insulation side screen is arranged between a heater and a stainless steel housing, and comprises an inner-layer tungsten screen and an outer-layer zirconium dioxide fiber thermal-insulation brick layer. Due to the design of the thermal-insulation side screen, the system has the advantages of lighter weight, better thermal-insulation effect and smaller axial and radial temperature gradient in the crystal, reduces the thermal stress and dislocation density in the crystal, and achieves the effects of reducing the power consumption and improving the crystal quality.
Description
Technical field
The present invention relates to kyropoulos sapphire single crystal growth furnace, relate in particular to a kind of kyropoulos sapphire single crystal growth furnace insulation side screen.
background technology:
Kyropoulos method is by Kyropouls in nineteen twenty-six invention, and its growing principle and technical characterstic are: crystal raw material is put into resistant to elevated temperatures crucible heat fused, adjust temperature field in furnace, make the state of melt top in a little higher than fusing point; Make seed crystal on seed rod contact melting liquid level, after its surface is slightly molten, reduce surface temperature to fusing point, lift and rotate seed rod, make melt top in supercooled state and crystallization on seed crystal, in the process constantly lifting, grow cylinder crystal.
The principle of kyropoulos and Czochralski grown crystal is similar, but the sapphire crystal quality that kyropoulos grows is higher, from technique, Czochralski grown process comprises seeding, shouldering, isometrical and receive the stages such as shoulder, and the above-mentioned stage all needs constantly to have lifted; Crystal growth and the annealing process of kyropoulos are all carried out in crucible, and crystal is not carried draw-out crucible, and sapphire crystal similarly is to grow from melt; In kyropoulos growth technique, seed crystal lifting rotation in seeding, shouldering process, just carries out trace lifting according to practical situation and stop the rotation at isodiametric growth stage seed crystal; In fact the growth of kyropoulos crystal and annealing process are all carried out in crucible, and crystal is not carried draw-out crucible, and therefore temperature is easily controlled, and crystal quality is higher.
It is as substrate material that sapphire one of is mainly applied, and preparing the sapphire main method of substrate material is kyropoulos.
The fusing point of sapphire crystal is about 2050 ℃, and kyropoulos is one of growth method of at present main flow, and a key factor that affect kyropoulos growing sapphire monocrystalline quality is exactly the distribution of the interior thermal field of body of heater.So under 2050 ℃ of such hot conditionss, the selection of insulation side screen material and the design of structure are particularly important.
Constituting of the main still molybdenum multilayer of insulation side screen screen, tungsten metallic multilayer screen and two kinds of multilayer screens of tungsten metal of at present conventional kyropoulos growing large-size sapphire single-crystal.The main layer that leans on of this class insulation side screen reaches heat insulation effect with the vacuum effect of interlayer, but tungsten and molybdenum material itself is as metallic substance, its heat insulation effect is poor, thermal field skewness, and under high temperature, molybdenum shield can volatilize a lot of impurity, these factors will cause that crystal growth energy consumption is large, lattice defect is too much, and high cost.
Summary of the invention
The technical problem to be solved in the present invention is, provides a kind of and can improve crystal yield rate, reduces the kyropoulos sapphire single crystal growth furnace insulation side screen of single crystal average power consumption.
The technical scheme that the present invention solves described problem employing is:
A kind of kyropoulos sapphire single crystal growth furnace insulation side screen, is arranged between well heater and outer steel shell, and insulation side screen internal layer is tungsten screen, and skin is Zirconium oxide fibre insulating brick-layer.
Adopt the present invention of technique scheme, compared with prior art, the beneficial effect reaching is:
System has better heat insulation effect, has reduced the watt consumption of single crystal, and the axial and radial symmetry gradient in crystal reduces, and has reduced thermal stresses and the dislocation desity in crystal simultaneously.
As preferably, the present invention further technical scheme is:
Described tungsten screen is the double-deck tungsten cylinder being rolled into by the parallel tungsten sheet of bilayer.
The thickness of described tungsten sheet is 0.5-2.5mm, and the distance between two-layer tungsten sheet is 1-5mm.
Described Zirconium oxide fibre insulating brick-layer is the cylindrical shell by the brick one-tenth of double-deck Zirconium oxide fibre.
The thickness of described mono-layer oxidized zirconium fiber brick is 20-40mm.
Accompanying drawing explanation
Fig. 1 is the structural representation of the embodiment of the present invention;
Fig. 2 is tungsten screen side-view in Fig. 1;
Fig. 3 is tungsten screen vertical view in Fig. 2;
Fig. 4 is Zirconium oxide fibre insulating brick-layer side-view in Fig. 1;
Fig. 5 is Zirconium oxide fibre insulating brick-layer vertical view in Fig. 1;
In figure: crucible 1, well heater 2, tungsten screen 3, Zirconium oxide fibre insulating brick-layer 4, outer steel shell 5, outer tungsten cylinder 31, internal layer tungsten cylinder 32, D2 tantalum nail 33, outer oxide zirconium fiber brick 41, internal layer Zirconium oxide fibre brick 42.
Embodiment
Below by accompanying drawing illustrated embodiment in detail the present invention is described in detail, the cited case is only for technical scheme of the present invention is more clearly described, and not limits the scope of the invention.
Referring to Fig. 1, kyropoulos sapphire single crystal growth furnace insulation side screen, is arranged between well heater 2 and outer steel shell 5, and insulation side screen internal layer is tungsten screen 3, and skin is Zirconium oxide fibre insulating brick-layer 4.
Referring to Fig. 2, Fig. 3, the tungsten screen 3 double-deck tungsten cylinders that formed by outer tungsten cylinder 31, internal layer tungsten cylinder 32, this bilayer tungsten cylinder is rolled into by the parallel tungsten sheet of bilayer, every layer of tungsten sheet couples together by monolithic tungsten sheet, monolithic tungsten sheet junction intersects for 40mm, forming rectangle, is highly 900mm, and the thickness of tungsten sheet is 1.5mm; Tungsten cylinder is used 33 riveted joints of D2 tantalum nail fixing, in the middle of two-layer tungsten cylinder, with 16 tungsten filament buckles, fixes, and between two buckles, is spaced apart 22.5 °, between two-layer tungsten cylinder (tungsten sheet), is spaced apart 5mm.
Referring to Fig. 4, Fig. 5, Zirconium oxide fibre insulating brick-layer 4 is the double-deck Zirconium oxide fibre brick cylindrical shells that are built into by outer oxide zirconium fiber brick 41, internal layer Zirconium oxide fibre brick 42, the thickness that mono-layer oxidized zirconium fiber turns is 30mm, and double-deck Zirconium oxide fibre brick cylindrical shell height is 860mm.
Insulation side screen structure described in the present embodiment is particularly useful for kyropoulos growing high-temp oxide crystal.
Claims (5)
1. a kyropoulos sapphire single crystal growth furnace insulation side screen, is arranged between well heater and stainless steel outer steel shell, it is characterized in that, insulation side screen internal layer is tungsten screen, and skin is Zirconium oxide fibre insulating brick-layer.
2. according to the kyropoulos sapphire single crystal growth furnace insulation side screen described in claim 1, it is characterized in that, described tungsten screen is the double-deck tungsten cylinder being rolled into by the parallel tungsten sheet of bilayer.
3. according to the kyropoulos sapphire single crystal growth furnace insulation side screen described in claim 2, it is characterized in that, the thickness of described tungsten sheet is 0.5-2.5mm, and the distance between two-layer tungsten sheet is 1-5mm.
4. according to the kyropoulos sapphire single crystal growth furnace insulation side screen described in claim 1, it is characterized in that, described Zirconium oxide fibre insulating brick-layer is the cylindrical shell by the brick one-tenth of double-deck Zirconium oxide fibre.
5. according to the kyropoulos sapphire single crystal growth furnace insulation side screen described in claim 4, it is characterized in that, the thickness of described mono-layer oxidized zirconium fiber brick is 20-40mm.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201410465267.8A CN104178813A (en) | 2014-09-15 | 2014-09-15 | Kyropoulos-process sapphire single-crystal growth furnace thermal-insulation side screen |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201410465267.8A CN104178813A (en) | 2014-09-15 | 2014-09-15 | Kyropoulos-process sapphire single-crystal growth furnace thermal-insulation side screen |
Publications (1)
Publication Number | Publication Date |
---|---|
CN104178813A true CN104178813A (en) | 2014-12-03 |
Family
ID=51960146
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201410465267.8A Pending CN104178813A (en) | 2014-09-15 | 2014-09-15 | Kyropoulos-process sapphire single-crystal growth furnace thermal-insulation side screen |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN104178813A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105603510A (en) * | 2016-02-03 | 2016-05-25 | 江苏浩瀚蓝宝石科技有限公司 | Single crystal growth furnace |
CN107460548A (en) * | 2016-06-02 | 2017-12-12 | 济南瑰宝新材料有限公司 | A kind of composite metal coated insulation construction of Zirconium oxide fibre product |
CN109280964A (en) * | 2018-10-16 | 2019-01-29 | 山东天岳先进材料科技有限公司 | A kind of thermal field structure growing single-crystal silicon carbide |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN201411509Y (en) * | 2009-06-26 | 2010-02-24 | 哈尔滨工大奥瑞德光电技术有限公司 | Single crystal furnace body for growth of big sapphire with size over 300 mm |
CN201962419U (en) * | 2011-02-24 | 2011-09-07 | 浙江昀丰新能源科技有限公司 | Sapphire single-crystal furnace |
CN201962424U (en) * | 2011-01-21 | 2011-09-07 | 浙江昀丰新能源科技有限公司 | Sapphire single crystal furnace |
CN202214452U (en) * | 2011-09-08 | 2012-05-09 | 刘小梅 | Split nested type cylindrical heat shield used for sapphire single crystal furnace |
CN102586875A (en) * | 2012-03-26 | 2012-07-18 | 苏州先端稀有金属有限公司 | Tungsten plate cylinder for sapphire crystal growth thermal field |
CN103215635A (en) * | 2013-04-27 | 2013-07-24 | 哈尔滨奥瑞德光电技术股份有限公司 | Heat insulation structure of sapphire single crystal furnace |
CN203462168U (en) * | 2013-05-20 | 2014-03-05 | 无锡鼎晶光电科技有限公司 | Energy-saving type kyropoulos-method sapphire crystal growth furnace thermal field structure |
CN103774226A (en) * | 2014-01-26 | 2014-05-07 | 哈尔滨奥瑞德光电技术股份有限公司 | Heat preservation structure of large-sized sapphire mono-crystal furnace |
CN203741458U (en) * | 2014-01-26 | 2014-07-30 | 哈尔滨奥瑞德光电技术股份有限公司 | Square thermal field structure of sapphire single crystal furnace |
CN204138819U (en) * | 2014-09-15 | 2015-02-04 | 同方国芯电子股份有限公司 | Kyropoulos sapphire single crystal growth furnace insulation side screen |
-
2014
- 2014-09-15 CN CN201410465267.8A patent/CN104178813A/en active Pending
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN201411509Y (en) * | 2009-06-26 | 2010-02-24 | 哈尔滨工大奥瑞德光电技术有限公司 | Single crystal furnace body for growth of big sapphire with size over 300 mm |
CN201962424U (en) * | 2011-01-21 | 2011-09-07 | 浙江昀丰新能源科技有限公司 | Sapphire single crystal furnace |
CN201962419U (en) * | 2011-02-24 | 2011-09-07 | 浙江昀丰新能源科技有限公司 | Sapphire single-crystal furnace |
CN202214452U (en) * | 2011-09-08 | 2012-05-09 | 刘小梅 | Split nested type cylindrical heat shield used for sapphire single crystal furnace |
CN102586875A (en) * | 2012-03-26 | 2012-07-18 | 苏州先端稀有金属有限公司 | Tungsten plate cylinder for sapphire crystal growth thermal field |
CN103215635A (en) * | 2013-04-27 | 2013-07-24 | 哈尔滨奥瑞德光电技术股份有限公司 | Heat insulation structure of sapphire single crystal furnace |
CN203462168U (en) * | 2013-05-20 | 2014-03-05 | 无锡鼎晶光电科技有限公司 | Energy-saving type kyropoulos-method sapphire crystal growth furnace thermal field structure |
CN103774226A (en) * | 2014-01-26 | 2014-05-07 | 哈尔滨奥瑞德光电技术股份有限公司 | Heat preservation structure of large-sized sapphire mono-crystal furnace |
CN203741458U (en) * | 2014-01-26 | 2014-07-30 | 哈尔滨奥瑞德光电技术股份有限公司 | Square thermal field structure of sapphire single crystal furnace |
CN204138819U (en) * | 2014-09-15 | 2015-02-04 | 同方国芯电子股份有限公司 | Kyropoulos sapphire single crystal growth furnace insulation side screen |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105603510A (en) * | 2016-02-03 | 2016-05-25 | 江苏浩瀚蓝宝石科技有限公司 | Single crystal growth furnace |
CN107460548A (en) * | 2016-06-02 | 2017-12-12 | 济南瑰宝新材料有限公司 | A kind of composite metal coated insulation construction of Zirconium oxide fibre product |
CN109280964A (en) * | 2018-10-16 | 2019-01-29 | 山东天岳先进材料科技有限公司 | A kind of thermal field structure growing single-crystal silicon carbide |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN107541776A (en) | A kind of growth apparatus and method of large scale gallium oxide single crystal | |
CN201942778U (en) | Multi-temperature zone sapphire single crystal growth furnace | |
CN104357899B (en) | Large scale Yb YAG laser crystal kyropoulos preparation method | |
CN204138819U (en) | Kyropoulos sapphire single crystal growth furnace insulation side screen | |
CN110983429A (en) | Single crystal furnace and monocrystalline silicon preparation method | |
CN103556223B (en) | A kind of method of growing large-size and square sapphire single-crystal | |
CN101323978A (en) | Large size sapphire crystal preparing technology and growing apparatus thereof | |
CN101580961A (en) | Method for growing crystal by reducing atmosphere Kyropoulos method | |
CN107130295B (en) | A kind of device and method for eliminating silicon plug crack | |
CN102628184A (en) | Method for growing gem crystals by way of vacuum induction heating and device realizing method | |
CN104178813A (en) | Kyropoulos-process sapphire single-crystal growth furnace thermal-insulation side screen | |
CN203373445U (en) | Gradient-adjusted-axial-temperature heat insulation structure applied to Kyropoulos-method sapphire monocrystal growth | |
CN106868584B (en) | A kind of monocrystalline furnace resistor heater and the method for preparing silicon single crystal using the resistance heater | |
CN102703970A (en) | Kyropous method growth of titanium doped sapphire crystals | |
CN103205803B (en) | The zirconium white insulation construction applied in sapphire single-crystal furnace | |
KR101196445B1 (en) | Apparatus for Growing Sapphire Crystal and Method for Growing Sapphire Crystal Using the Same | |
CN103469304B (en) | Branched shaping sapphire crystallization device and long crystal method thereof | |
US20130340671A1 (en) | Silica glass crucible, method for manufacturing same, and method for manufacturing silicon single crystal | |
CN113774484B (en) | Gallium oxide crystal growth method and combined crucible for growing gallium oxide crystal | |
CN114108083A (en) | Spliced crucible and gallium oxide crystal growth method | |
CN114737253A (en) | Single crystal furnace thermal field structure and method for growing large-size sapphire single crystal plate | |
CN104073878A (en) | Sapphire crystal growing furnace side screen and preparation method thereof | |
CN204385325U (en) | A kind of visual crucible cover for sapphire growth furnace | |
CN103266346B (en) | The growth apparatus of a kind of crystal Pulling YVO4 crystal and growing method based on this growth apparatus | |
CN102995114B (en) | Crucible cover of big-size sapphire single crystal growth furnace |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
WD01 | Invention patent application deemed withdrawn after publication | ||
WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20141203 |