CN104154876B - Sub-aperture stitching measurement apparatus and method for 45 degree of level crossing surface testings - Google Patents
Sub-aperture stitching measurement apparatus and method for 45 degree of level crossing surface testings Download PDFInfo
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- CN104154876B CN104154876B CN201410422479.8A CN201410422479A CN104154876B CN 104154876 B CN104154876 B CN 104154876B CN 201410422479 A CN201410422479 A CN 201410422479A CN 104154876 B CN104154876 B CN 104154876B
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Abstract
It is a kind of to be used for the sub-aperture stitching measurement apparatus of 45 degree of level crossing surface testings, including：Fizeau interferometer, the first standard mirror, the second standard mirror, 45 degree of level crossings, splicing displacement platform, two-dimension adjustment frame, tilted two-dimensional adjustment frames.The present invention adds speculum above tested 45 degree of level crossings, makes light backtracking, carries out sub-aperture stitching interferometer measurements to 45 degree of level crossings, sub- aperture plane graphic data is spliced using variable weight method, unified face shape is obtained.The present invention has：1, operation is simple, and 45 degree of level crossing minute surfaces are unlikely to deform, and measurement accuracy is high；2, sub-aperture diametric plane graphic data is spliced using variable weight data fusion, high precision；3, by changing the reflectivity of the first standard mirror and the second standard mirror, non-coated surface can be both measured, high reverse side can also be measured, there is higher interference contrast.
Description
Technical field
It is particularly a kind of to be used for 45 degree of level crossing surface testings the present invention relates to sub-aperture stitching interferometer metrology and measurement field
Apparatus and method.
Background technology
Sub-aperture stitching interferometer e measurement technology can be to be realized with a low cost the high-acruracy survey of optical elements of large caliber.Initially
Sub-aperture stitching interferometer e measurement technology describes wavefront using Zernike multinomials, can obtain polynomial based on Zernike
Unified face shape distribution.(1.【Stephen C.Jensen,Weng,W.Chow,and George
N.Lawrence.Subaperture testing approaches:a comparison[J].APPLIED OPTICS,
1984,23(5):740~745】With 2.【James E.Negro.Subaperture optical system testing[J]
.APPLIED OPTIC,1984,23(12):1921~1930).Stuhlinger proposes discrete phase method, and wavefront is used in son
The optical phase value of the substantial amounts of discrete point being distributed on aperture is described, and least square is passed through according to the phase of sub-aperture overlay region
Method determines the relative tilt in sub-aperture measurement process, and then splicing obtains unified face shape distribution.(3.【Tilman
W.Stuhlinger.Subaperture optical testing:experimental vertification[C].SPIE,
1986,656:118~127】).Otsubo proposes error-correction model thought, it is desirable to square of correlation in all sub-aperture overlay regions
With reach minimum simultaneously, be distributed with obtaining unified face shape.(4.【Masashi Otsubo,Katsuyuki Okada and
Jumpei Tsujiuchi.Measurement of Large Plane Surface Shape with
Interferometric Aperture Synthesis[C].SPIE,1992,1720:444~447】).Michael Bray
Sub-aperture stitching measuring system is set forth and is manufactured that the sub-aperture of practical heavy-calibre planar optical elements is spelled
Connect interferometer.(【Michael Bray.Stitching interferometer for large piano optics using
a standard interferometer[C].SPIE,1997,3134:39~50】).U.S.'s QED Developeies are automatic
Stitching interferometer instrument, can realize the aspherical detection of plane, sphere and appropriate irrelevance.
45 degree of level crossings are the important components of the high-precision optical elements such as photo-etching machine work-piece platform Fang Jing, in process
In need high precision test.Above sub-aperture stitching interferometer measurement scheme, can only be detected for single plane face shape, for
The detection of 45 degree of level crossings, conventional method：1. by 45 degree of placements of fizeau interferometer, but operating difficulties, experiment inconvenience；2. will
45 degree of level crossings, 45 degree of placements, level crossing is possible to deformation, influences surface figure accuracy.
The content of the invention
It is an object of the invention to overcome above-mentioned the deficiencies in the prior art, it is to provide a kind of for 45 degree of flat mirror shapes inspections
The sub-aperture stitching measurement apparatus and method of survey, can detect the unified face shape of 45 degree of planar optical elements, operation it is simple and
And level crossing is unlikely to deform, accuracy of detection is high.
The technical solution of the present invention is as follows：
A kind of to be used for the sub-aperture stitching measurement apparatus of 45 degree of level crossing surface testings, its feature is, including：Fei Suo is done
Interferometer, the first standard mirror being placed in the reference mirror adjustment frame of the fizeau interferometer, splicing displacement platform, be fixed on the splice bits
45 degree of level crossings on the two-dimension adjustment frame of two-dimension adjustment frame, clamping in moving stage, tilted two-dimensional adjustment frame, and clamping exist
The second standard mirror in the tilted two-dimensional adjustment frame；
The transmitting light of 45 degree of described level crossings and described fizeau interferometer is in 45 degree, and the second described standard mirror is located at
The top of 45 degree of level crossings and be in 45 degree with a reflected light of 45 degree of level crossings.
The light that fizeau interferometer is sent incides 45 degree of level crossings after passing through the first standard mirror, after 45 degree of level crossing reflections
The second standard mirror is incided, after being reflected by the second standard mirror, light is along backtracking.
The first described standard mirror and the optical axis alignment of fizeau interferometer.
The first standard mirror that nominal reflectivity is 1% is not plated with the first standard mirror measurement in a closed series that nominal reflectivity is 99%
45 degree of level crossings of film.
The first standard mirror that nominal reflectivity is 4% is high anti-with the first standard mirror measurement in a closed series that nominal reflectivity is 4%
Penetrate 45 degree of level crossings of rate.
A kind of method and step for utilizing the above-mentioned sub-aperture stitching device for being used for 45 degree of level crossings to measure is as follows：
1. the first standard mirror is adjusted, makes its optical axis alignment with fizeau interferometer；
2. regulation two-dimension adjustment frame and tilted two-dimensional adjustment frame, make interference fringe close to zero striped；
3. described fizeau interferometer is utilized, 45 degree of level crossings are carried out with a sub-aperture stitching interferometer and is measured, 45 are obtained
Spend a sub- aperture plane shape distribution M of level crossing1(x, y) and store；
4. mobile splicing displacement platform (5) moves to next sub-aperture of 45 degree of level crossings；
5. repeat step 2., 3. and 4., complete the measurement of whole sub-apertures；
6. the sub-aperture diametric plane shape of 45 degree of level crossings is distributed M using variable weight data fusion joining methodk(x, y) data are spelled
Connect, obtain the unified face shape distribution W (x, y) of 45 degree of level crossings.
Compared with prior art, its remarkable advantage is the present invention：
1st, add speculum in the optical path to measure 45 degree of level crossings, operation is simple, and 45 degree of level crossing minute surfaces are difficult
Deformation, measurement accuracy is high.
2nd, sub-aperture diametric plane graphic data is spliced using variable weight data fusion, splices high precision.
3rd, by changing the reflectivity of the first standard mirror and the second standard mirror, non-coated surface can be both measured, can also be surveyed
High reverse side is measured, there is higher interference contrast.
Brief description of the drawings
Fig. 1 is used for the structural representation of the sub-aperture stitching measurement apparatus of 45 degree of level crossing surface testings for the present invention.
Fig. 2 is the inventive method step 6. variable weight data fusion splicing principle schematic.
Embodiment
In order to be better understood from the purpose, technical scheme and advantage of the embodiment of the present invention, below in conjunction with the accompanying drawings and embodiment
The invention will be further described, but should not be limited the scope of the invention with this.
Embodiment 1
It is a kind of to be used for the sub-aperture stitching measurement apparatus of 45 degree of level crossing surface testings, as shown in figure 1, fizeau interferometer 1
The light sent is through the first standard mirror 2 that nominal reflectivity is 1%, after being reflected through nominal reflectivity for 4% 45 degree of level crossings
It is the 99% the second standard mirrors 3 to reach nominal reflectivity, after being reflected through nominal reflectivity for the 99% the second standard mirrors 3, Guang Yanyuan roads
Return；The clamping of first standard mirror 2 is on the reference mirror adjustment frame 1-1 of the fizeau interferometer of the horizontal positioned；45 degree of level crossings 4
The light that clamping is sent on the two-dimension adjustment frame 6 being fixed on splicing displacement platform 5 with fizeau interferometer 1 is in 45 degree；Second standard
The clamping of mirror 3 is positioned over above 45 degree of level crossings in tilted two-dimensional adjustment frame 7；Splicing displacement platform used is one-dimensional linear
Displacement platform；Two-dimension adjustment frame used is the adjustment frame with two regulation frees degree of pitching and beat, makes interference by regulation
Instrument emergent light changes with being tested the angle of 45 degree of level crossings；Used tilted two-dimensional adjustment frame is with pitching and beat two
The adjustment frame of the individual regulation free degree, makes the angle of interferometer emergent light and two standard mirrors change by its regulation；Measurement is dry
It is 80% to relate to contrast.
A kind of method for utilizing the above-mentioned sub-aperture stitching device for being used for 45 degree of level crossings to measure, step is as follows：
1. the first standard mirror 2 is adjusted, makes its optical axis alignment with fizeau interferometer 1；
2. regulation two-dimension adjustment frame 6 and tilted two-dimensional adjustment frame 7, make interference fringe close to zero striped；
3. described fizeau interferometer 1 is utilized, 45 degree of level crossings 4 are carried out with a sub-aperture stitching interferometer and is measured, is obtained
One sub- aperture plane shape distribution M of 45 degree of level crossings 41(x, y) and store；
4. mobile splicing displacement platform 5 moves to next sub-aperture；
5. repeat step 2., 3. and 4., complete the measurement of whole sub-apertures；
6. sub-aperture diametric plane shape distribution M (x, y) data of 45 degree of level crossings are spelled using variable weight data fusion joining method
Connect, obtain the unified face shape distribution W (x, y) of 45 degree of level crossings.
Through step 1.~the sub-aperture diametric plane graphic datas of planar optical elements is 5. obtained, according to direct splicing in stitching position
Splicing gap occurs, i.e., spliced face shape is discontinuous, it is impossible to the face shape of correct reflection planes optical element.Splicing gap is
Caused by many reasons.In stitching measure, by splicing displacement platform position error, interferometer standard mirror surface-shaped error, interference
The combined factors such as instrument test repeatability influence, when splicing two-by-two, and measurement result certainly exists difference twice at splicing gap, therefore
Direct splicing is bound to produce splicing gap.The presence in splicing gap illustrates that splicing result has larger splicing noise, and spells
Connecing noise will cause the face shape error of final complete splicing to increase, splicing surface figure accuracy reduction, it is impossible to detect to put down exactly
Face face shape, it is therefore necessary to eliminated to splicing gap.
Splicing gap can be eliminated using the splicing of variable weight data fusion, its general principle is as follows, W1And W2For adjacent two
Second son inside diameter measurement, W (x, y) is the phase at any point of measurement overlap area twice, its boundary From Left in the horizontal direction
Horizontal range is L1, it is L apart from the horizontal range of right margin2, then the phase value W ' (x, y) of the point is after splicing fusion:
W ' (x, y)=k1*W1(x,y)+k2*W2′(x,y)
Wherein W2' (x, y) be W2Phase distribution, k after (x, y) fitting1=L2/(L1+L2), k2=L1/(L1+L2).Weighted value
k1And k2Change with W (x, y) change in location, so referred to as variable weight data fusion is spliced.In overlay region left margin, k1
=1, k2=0, therefore can realize and seamlessly transit at original splicing gap, eliminate splicing gap.Right side stitching position gap
Eliminate similarly.
Embodiment 2
It is a kind of to be used for the sub-aperture stitching measurement apparatus of 45 degree of level crossing surface testings, as shown in figure 1, fizeau interferometer 1
The light sent reflects through the first standard mirror 2 that nominal reflectivity is 4% through nominal reflectivity for 98% 45 degree of level crossings,
Through nominal reflectivity for 4% the second standard mirror 3 reflection after, light is along backtracking.The clamping of first standard mirror 2 is put in the level
On the reference mirror adjustment frame 1-1 for the fizeau interferometer put；45 degree of clampings of level crossing 4 are in the two dimension being fixed on splicing displacement platform 5
The light sent in adjustment frame 6 with fizeau interferometer 1 is in 45 degree；The clamping of second standard mirror 3 is put in tilted two-dimensional adjustment frame 7
It is placed in above 45 degree of level crossings；Splice displacement platform and use one-dimensional linear displacement platform；Two-dimension adjustment frame used be with pitching and
The adjustment frame of two regulation frees degree of beat, the angle for making interferometer emergent light and tested 45 degree of level crossings by its regulation occurs
Change；Used tilted two-dimensional adjustment frame is the adjustment frame with two regulation frees degree of pitching and beat, is made by its regulation
The angle of interferometer emergent light and two standard mirrors changes；Measurement interference contrast is 99.98%.
A kind of method for utilizing the above-mentioned sub-aperture stitching device for being used for 45 degree of level crossings to measure, step is as follows：
1. the first standard mirror 2 is adjusted, makes its optical axis alignment with fizeau interferometer 1；
2. regulation two-dimension adjustment frame 6 and tilted two-dimensional adjustment frame 7, make interference fringe close to zero striped；
3. described fizeau interferometer 1 is utilized, 45 degree of level crossings 4 are carried out with a sub-aperture stitching interferometer and is measured, is obtained
One sub- aperture plane shape distribution M of 45 degree of level crossings 41(x, y) and store；
4. mobile splicing displacement platform 5 moves to next sub-aperture；
5. repeat step 2., 3. and 4., complete the measurement of whole sub-apertures；
6. the sub-aperture diametric plane shape of 45 degree of level crossings is distributed M using variable weight data fusion joining method described in embodiment 1
(x, y) data are spliced, and obtain the unified face shape distribution W (x, y) of 45 degree of level crossings.
Present invention operation is simple, and 45 degree of level crossing minute surfaces are unlikely to deform, and measurement accuracy is high；Sub-aperture diametric plane graphic data is using change
Weighted data anastomosing and splicing, improves splicing precision；The device can both measure non-coated surface, can also measure high reverse side, do
More than 80% can be reached by relating to contrast.
Claims (4)
1. a kind of be used for the sub-aperture stitching measurement apparatus of 45 degree of level crossing surface testings, it is characterised in that including：Fizeau interference
Instrument (1), the first standard mirror (2) being placed in the reference mirror adjustment frame (1-1) of the fizeau interferometer (1), splicing displacement platform
(5) the 45 degree of planes of the two-dimension adjustment frame (6) on the splicing displacement platform (5), clamping on the two-dimension adjustment frame (6), are fixed on
Mirror (4), tilted two-dimensional adjustment frame (7), and second standard mirror (3) of the clamping in the tilted two-dimensional adjustment frame (7)；
45 degree of described level crossings (4) are in 45 degree, the second described standard mirror with the transmitting light of described fizeau interferometer (1)
(3) positioned at the top of 45 degree level crossings (4) and with a reflected light of 45 degree of level crossings (4) in 45 degree；Nominally reflectivity is
1% the first standard mirror (2) and non-45 degree of level crossings of plated film of second standard mirror (3) measurement in a closed series that nominal reflectivity is 99%
(4)。
2. a kind of be used for the sub-aperture stitching measurement apparatus of 45 degree of level crossing surface testings, it is characterised in that including：Fizeau interference
Instrument (1), the first standard mirror (2) being placed in the reference mirror adjustment frame (1-1) of the fizeau interferometer (1), splicing displacement platform
(5) the 45 degree of planes of the two-dimension adjustment frame (6) on the splicing displacement platform (5), clamping on the two-dimension adjustment frame (6), are fixed on
Mirror (4), tilted two-dimensional adjustment frame (7), and second standard mirror (3) of the clamping in the tilted two-dimensional adjustment frame (7)；
45 degree of described level crossings (4) are in 45 degree, the second described standard mirror with the transmitting light of described fizeau interferometer (1)
(3) positioned at the top of 45 degree level crossings (4) and with a reflected light of 45 degree of level crossings (4) in 45 degree, nominal reflectivity is
4% the first standard mirror (2) and second 45 degree of level crossings of standard mirror (3) measurement in a closed series high reflectance that nominal reflectivity is 4%
(4)。
3. it is according to claim 1 or 2 it is a kind of be used for the sub-aperture stitching measurement apparatus of 45 degree of level crossing surface testings, its
It is characterised by, the first described standard mirror (2) and the optical axis alignment of fizeau interferometer (1).
4. a kind of a kind of sub-aperture stitching measurement for being used for 45 degree of level crossing surface testings utilized described in claim 1 or 2 is filled
Put the method detected, it is characterised in that：This method comprises the following steps：
1. the first standard mirror (2) is adjusted, makes its optical axis alignment with fizeau interferometer (1)；
2. regulation two-dimension adjustment frame (6) and tilted two-dimensional adjustment frame (7), make interference fringe close to zero striped；
3. fizeau interferometer (1) is utilized, 45 degree of level crossings (4) are carried out with a sub-aperture stitching interferometer and is measured, 45 degree is obtained and puts down
One sub- aperture plane shape distribution M of face mirror (4)1(x, y) and store；
4. the mobile displacement platform (5) that splices is to next sub-aperture of 45 degree of level crossings (4)；
5. repeat step 2., 3. and 4., complete the measurement of whole sub-apertures；
6. the sub-aperture diametric plane shape of 45 degree of level crossings is distributed M using variable weight data fusion joining methodk(x, y), data splicing,
Obtain the unified face shape distribution W (x, y) of 45 degree of level crossings.
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| CN105807568B (en) * | 2014-12-30 | 2023-12-08 | 上海微电子装备（集团）股份有限公司 | Control method of integrated interferometer device |
| CN105318847A (en) * | 2015-11-12 | 2016-02-10 | 浙江大学 | Aspheric non-zero digit circular subaperture stitching method based on system modeling |
| CN106152970A (en) * | 2016-06-22 | 2016-11-23 | 长春博信光电子有限公司 | Large scale flat lens surface precision measuring method and system |
| CN110243306A (en) * | 2019-07-22 | 2019-09-17 | 中国工程物理研究院激光聚变研究中心 | Plane surface shape sub-aperture stitching interferometer measuring device and method based on robot |
| CN116839506B (en) * | 2023-09-01 | 2023-11-21 | 中国科学院长春光学精密机械与物理研究所 | Surface shape detection method and system for grazing incidence type spliced plane mirror |
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| US6956657B2 (en) * | 2001-12-18 | 2005-10-18 | Qed Technologies, Inc. | Method for self-calibrated sub-aperture stitching for surface figure measurement |
| CN101709955B (en) * | 2009-11-24 | 2011-02-23 | 中国科学院长春光学精密机械与物理研究所 | Device for detecting surface shape of optical aspheric surface by sub-aperture stitching interferometer |
| CN102788563B (en) * | 2012-08-31 | 2014-09-10 | 中国科学院光电技术研究所 | Device and method for adjusting tilt of measured mirror in matching measurement of flat sub-aperture |
| CN102865809B (en) * | 2012-09-05 | 2015-01-28 | 中国科学院光电技术研究所 | Sub-aperture splicing interferometer system and method for measuring surface shape of optical lens |
| CN102889978B (en) * | 2012-09-14 | 2015-04-22 | 中国科学院光电技术研究所 | Device and method for detecting large-aperture window |
| CN103217125A (en) * | 2013-03-26 | 2013-07-24 | 同济大学 | Sub-aperture stitching-based high-accuracy planar optical element face type detection method |
| CN204027527U (en) * | 2014-08-26 | 2014-12-17 | 中国科学院上海光学精密机械研究所 | A kind of surface shape detection apparatus of 45 degree of level crossings |
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