CN104148349A - Washing technology for substrate glass with TCO layer etched by laser - Google Patents
Washing technology for substrate glass with TCO layer etched by laser Download PDFInfo
- Publication number
- CN104148349A CN104148349A CN201310345840.7A CN201310345840A CN104148349A CN 104148349 A CN104148349 A CN 104148349A CN 201310345840 A CN201310345840 A CN 201310345840A CN 104148349 A CN104148349 A CN 104148349A
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- Prior art keywords
- cleaning
- base plate
- plate glass
- chamber
- spray
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
- B08B11/04—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto specially adapted for plate glass, e.g. prior to manufacture of windshields
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
- B08B3/022—Cleaning travelling work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/041—Cleaning travelling work
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
Abstract
The invention discloses a washing technology for substrate glass with a TCO layer etched by a laser, and belongs to the second washing technology for a solar cell production line. The washing technology is a method for washing the TCO substrate glass scribed by the laser P1 for the first time. Particles, chippings and other impurities left on the surface or in line grooves of the TCO substrate glass scribed by the laser P1 are removed mainly through prewashing, cleaning agent spraying, secondary spraying, rinsing, air knife drying and other technologies, the film coating quality of the subsequent technology of the production line can be effectively improved, and the washing technology plays a vital role in improving the efficiency of a cell.
Description
Technical field
The invention belongs to thin-film solar cells manufacturing technology field, relate to the cleaning in thin-film solar cells production process, specifically on base plate glass, plating is penetrated TCO rete and TCO rete is carried out to the cleaning of laser ablation TCO base plate glass afterwards for the first time.
Background technology
On existing amorphous silicon thin-film solar cell production line, TCO rete being carried out to laser ablation TCO base plate glass cleaning machine afterwards is for the first time all the cleaning machine of continuing to use TFT production line, and cleaning is also to continue to use the cleaning of TFT production line.Thin-film solar cells in process of production, at least needing to carry out four times cleans, be respectively: cleaning to the TCO base plate glass after edging chamfering, TCO rete is carried out to the cleaning of the transparent TCO base plate glass after the 4th the clear limit of P4 laser ablation and the cleaning to the back-panel glass after edging chamfering for the first time before the cleaning after laser ablation, lamination, traditional method is to utilize the cleaning on TFT production line to use a cleaning machine to complete four cleanings.And after different operation, glass surface can residual different impurity and residue in thin-film solar cells production process, the technique of its cleaning and method are inevitable different.Obviously the basic like this demand that can not meet cleannes, can not shoot the arrow at the target according to the difference of impurity and residue.Utilize cleaning machine on TFT production line to carry out TCO base plate glass after laser ablation for the first time to TCO rete and clean not only cleannes and do not reach requirement, and easily damage TCO rete, also can affect follow-up coating process, affect the generating efficiency of whole battery.In addition, the cleaning machine technique more complicated on TFT production line, long flow path, cost is high, and investment is large, also makes the manufacturing cost of amorphous silicon thin-film solar cell greatly increase.
Summary of the invention
The present invention can not meet the technical problem of TCO rete being carried out to the cleaning demand of the TCO base plate glass after laser ablation for the first time in order to solve traditional cleaning, design a kind of for tco layer being carried out to the cleaning of the base plate glass after laser ablation, utilize this cleaning can remove for the first time the residual impurity such as particulate, chip in laser ablation metacoxal plate glass surface and etching groove, can effectively improve the coating quality of production line subsequent technique, the efficiency that improves battery is played to vital effect.
The technical solution used in the present invention is: a kind of for tco layer being carried out to the cleaning of the base plate glass after laser ablation, key is: this technique is by the pre-spray wash chamber setting gradually on TCO base plate glass transfer roller, cleaning agent spray wash chamber, again sprays wash chamber, rinsing chamber and dry chamber realization, and described processing step comprises:
A, pre-spray clean: will spray in advance wash chamber and be controlled under normal temperature state, using deionized water as cleaning fluid, the one group of nozzle assembly arranging respectively at TCO base plate glass transfer roller upper and lower 90-110mm place is sprayed in advance as cleaning means, wherein, every group of nozzle assembly comprises 18-25 fan nozzle, and the flow of each nozzle under 0.12-0.16Mpa pressure is 1-1.1 L/Min;
B, cleaning agent spray clean: cleaning agent is sprayed to wash chamber and be controlled at 45 DEG C ± 2 DEG C temperature, the spray alkalescent cleaning agent using the one group of nozzle assembly arranging respectively at transfer roller upper and lower 90-110mm place as cleaning means, wherein, every group of nozzle assembly comprises 30-35 fan nozzle, and the flow of each nozzle under 0.12-0.16Mpa pressure is 1-1.1 L/Min;
C, spray cleaning again: will again spray wash chamber and be controlled under normal temperature state, the one group of nozzle assembly arranging respectively using deionized water as cleaning agent, by 90-110mm place above transfer roller sprays cleaning again as cleaning means, wherein, every group of nozzle assembly comprises 18-25 fan nozzle, and the flow of each nozzle under 2-3.5Mpa pressure is 1.18-2.37 L/Min;
D, rinsing: in rinsing chamber, upper and lower TCO base plate glass surface is rinsed;
E, oven dry: drying in chamber, by upper and lower TCO base plate glass skin drying, complete whole cleaning process.
After the described wash chamber of spray again, before rinsing chamber, be also provided with auxiliary spray wash chamber, on this basis, after described step C, be also provided with following operation before step D:
C1, auxiliary spray clean: will assist spray cleaning control under normal temperature state, using deionized water as cleaning agent, the one group of nozzle assembly arranging respectively at transfer roller upper and lower 90-110mm place is sprayed to cleaning as cleaning means, wherein, every group of nozzle assembly comprises 18-25 fan nozzle, and the flow of each nozzle under 0.3-0.4Mpa pressure is 1-1.15 L/Min.
The quantity of described rinsing chamber is 2, be set in turn in again spray wash chamber after, dry before chamber, rinsing chamber is controlled under normal temperature, using deionized water as purificant, the one group of nozzle assembly arranging respectively through the TCO base plate glass transfer roller upper and lower 90-110mm place again spraying after operation is carried out to rinsing as cleaning means, wherein, every group of nozzle assembly comprise 15-20,1/4 person's pulse on the wrist footpath, spray angle is the fan nozzle of 90 °, the flow of each nozzle under 0.12-0.16Mpa pressure is 1-1.15 L/Min.
The quantity of described oven dry chamber is 2, and after being set in turn in rinsing chamber, on this basis, described baking operation step comprises:
E1, one-level air knife purge dries: in the first oven dry chamber, carry out, the one-level air knife that utilizes transfer roller upper and lower 0-8mm place to arrange is respectively dried, wherein, the angle of one-level air knife and TCO base plate glass direct of travel is 60 °-80 °, the air temperature blowing out is 25 ~ 50 DEG C, and air quantity is 200 ~ 700m
3/ h;
E2, secondary air knife purge dries: in the second oven dry chamber, carry out, the secondary air knife that utilizes transfer roller upper and lower 0-8mm place to arrange is respectively dried, wherein, the angle of secondary air knife and TCO base plate glass direct of travel is 60 °-80 °, the air temperature blowing out is 25 ~ 80 DEG C, and air quantity is 200 ~ 700m
3/ h.
The invention has the beneficial effects as follows: 1, removed the impurity such as particulate, chip in TCO glass surface and the cutting after laser scribing for the first time; 2, clean front every square metre of glass substrate clearance rate >=95% that granule number is greater than 2000; Before cleaning, granule number is less than 2000, every square metre of granule number <100 after cleaning, and particle size >25 micron, be equal to the requirement of 10000 grade clean rooms; 3, under spotlight, detect by an unaided eye, glass surface is without particle and cut; 4, organic matter: ensure contact angle≤15 degree of glass after cleaning; 4, former cleaning processing equipment overall length 16000mm, adopts new cleaning processing equipment overall length 4260mm, has reduced cost of investment.
Brief description of the drawings
The structural representation of each chamber in the present invention.
In accompanying drawing, the 1st, spray in advance wash chamber, the 2nd, spray cleaning agent and round brush are scrubbed matching purge chamber, the 3rd, again spray wash chamber, the 4th, rinsing chamber, the 5th, dry chamber, 4-1 is the first rinsing chamber, 4-2 is the second rinsing chamber, 5-1 is the first oven dry chamber, 5-2 is the second oven dry chamber, the 6th, secondary air knife, 6-1 is secondary air blast, 6-2 is heater, 6-3 is secondary air filter, the 7th, one-level air knife, 6-1 is one-level air blast, 6-2 is main air filter, the 8th, auxiliary spray wash chamber, the 9th, transfer roller, arrow represents glass direction of transfer.
Detailed description of the invention
A kind of for tco layer being carried out to the cleaning of the base plate glass after laser ablation, this technique is by the pre-spray wash chamber 1 setting gradually on TCO base plate glass transfer roller 9, cleaning agent spray wash chamber 2, again sprays wash chamber 3, rinsing chamber 4 and dry chamber 5 and realize, and described processing step comprises:
A, pre-spray clean: will spray in advance wash chamber 1 and be controlled under normal temperature state, using deionized water as cleaning fluid, the one group of nozzle assembly arranging respectively at TCO base plate glass transfer roller upper and lower 90-110mm place is sprayed in advance as cleaning means, wherein, every group of nozzle assembly comprises 18-25 fan nozzle, and the flow of each nozzle under 0.12-0.16Mpa pressure is 1-1.1 L/Min;
B, cleaning agent spray clean: cleaning agent is sprayed to wash chamber 2 and be controlled at 45 DEG C ± 2 DEG C temperature, the spray alkalescent cleaning agent using the one group of nozzle assembly arranging respectively at transfer roller upper and lower 90-110mm place as cleaning means, wherein, every group of nozzle assembly comprises 30-35 fan nozzle, and the flow of each nozzle under 0.12-0.16Mpa pressure is 1-1.1 L/Min;
C, spray cleaning again: will again spray wash chamber 3 and be controlled under normal temperature state, the one group of nozzle assembly arranging respectively using deionized water as cleaning agent, by 90-110mm place above transfer roller sprays cleaning again as cleaning means, wherein, every group of nozzle assembly comprises 18-25 fan nozzle, and the flow of each nozzle under 2-3.5Mpa pressure is 1.18-2.37 L/Min;
D, rinsing: in rinsing chamber 4, upper and lower TCO base plate glass surface is rinsed;
E, oven dry: drying in chamber 5, by upper and lower TCO base plate glass skin drying, complete whole cleaning process.
Residual for fear of cleaning agent, after the described wash chamber of spray again 3, before rinsing chamber 4, be also provided with auxiliary spray wash chamber, on this basis, after described step C, before step D, be also provided with following operation: C1, auxiliary spray cleans: will assist spray to clean 8 and be controlled under normal temperature state, using deionized water as cleaning agent, will be on transfer roller, one group of nozzle assembly that 90-110mm place, below arranges respectively sprays cleaning as cleaning means, wherein, every group of nozzle assembly comprises 18-25 fan nozzle, the flow of each nozzle under 0.3-0.4Mpa pressure is 1-1.15 L/Min.
In order to strengthen wash effect to make the cleaning of base plate glass meet cleannes demand, the quantity of described rinsing chamber 4 is 2, after being set in turn in and again spraying wash chamber 3, before drying chamber 5, rinsing chamber 4 is controlled at normal temperatures, using deionized water as purificant, by through again spraying on the TCO base plate glass transfer roller after operation, one group of nozzle assembly that 90-110mm place, below arranges respectively carries out rinsing as cleaning means, wherein, every group of nozzle assembly comprises 15-20 fan nozzle, the flow of each nozzle under 0.12-0.16Mpa pressure is 1-1.15 L/Min.
In order to strengthen drying effect, the quantity of described oven dry chamber 5 is 2, and after being set in turn in rinsing chamber 4, on this basis, described baking operation step comprises:
E1, one-level air knife purge dries: in the first oven dry chamber 5-1, carry out, the one-level air knife 7 that utilizes transfer roller upper and lower 0-8mm place to arrange is respectively dried, wherein, one-level air knife 7 is 60 °-80 ° with the angle of TCO base plate glass direct of travel, the air temperature blowing out is 25 ~ 50 DEG C, and air quantity is 200 ~ 700m
3/ h;
E2, secondary air knife purge dries: in the second oven dry chamber 5-2, carry out, the secondary air knife 6 that utilizes transfer roller upper and lower 0-8mm place to arrange is respectively dried, wherein, secondary air knife 6 is 60 °-80 ° with the angle of TCO base plate glass direct of travel, the air temperature blowing out is 25 ~ 80 DEG C, and air quantity is 200 ~ 700m
3/ h.
For the fingerprint on TCO base plate glass surface, cutting wet goods residue are removed, described alkalescent cleaning agent is that concentration is 2% ~ 5% NaOH or KOH or TMAH cleaning agent.
In order to meet the cleaning pressure demand in this technical process, described nozzle is that material is that SUS303, bore are that 1/8 cun, spray angle are the fan nozzle of 90 °.
The main air filter 7-2 that the air feed system structure of described one-level air knife 7 comprises one-level air blast 7-1 and is connected with one-level air blast wind-force output, the output of main air filter 7-2 is connected with the wind-force input of one-level air knife 7.
The air feed system structure of described secondary air knife 6 comprises secondary air blast 6-1, the heater 6-2 being connected with secondary air blast wind-force output and the secondary air filter 6-3 being connected with heater output, and the output of secondary air filter 6-3 is connected with the wind-force input of secondary air knife 6.
It is that material is the cylinder structure of SUS304 that described one-level air knife 7 and secondary air knife 6 are.
In the specific implementation, referring to the structural representation of the purging system based on this cleaning shown in accompanying drawing 1.Transmitting on TCO base plate glass transfer roller 9, set gradually pre-spray wash chamber 1, cleaning agent spray wash chamber 2, again spray wash chamber 3, assist spray 8,2 rinsing chambers of wash chamber and 2 oven dry chambers according to production line order, TCO base plate glass is passed through to above-mentioned each chamber successively, utilize this cover cleaning can remove for the first time the residual impurity such as particulate, chip in laser ablation metacoxal plate glass surface and etching groove, can effectively improve the coating quality of production line subsequent technique.
In pre-spray wash chamber 1, the one group of nozzle assembly arranging respectively at TCO base plate glass transfer roller 9 upper and lower 90-110mm places.In cleaning process, this chamber temp is controlled to normal temperature, spray in advance by deionized water, wherein, nozzle is that material is that SUS303, bore are that 1/8 cun, spray angle are the fan nozzle of 90 °, every group of nozzle assembly comprises 21 fan nozzles, and the flow of each nozzle under 0.15Mpa pressure is 1.06 L/Min.
In cleaning agent spray wash chamber 2, the one group of nozzle assembly arranging respectively at transfer roller 9 upper and lower 90-110mm places, temperature in this chamber is controlled at 45 DEG C ± 2 DEG C, spray with alkalescent cleaning agent, and the round brush that is 300 ~ 600 at the rotating speed arranging respectively apart from transfer roller upper and lower 0-8mm place is scrubbed, wherein, every group of nozzle assembly comprises 32 fan nozzles, and the flow of each nozzle under 0.15Mpa pressure is 1.06L/Min;
Again spraying in wash chamber 3, one group of nozzle assembly that 90-110mm place arranges respectively above transfer roller, to again spray wash chamber 3 is controlled under normal temperature state, spray with deionized water, wherein, nozzle assembly comprises 21 fan nozzles, and it is that 1.81 L/Min or the flow of employing under 3.5Mpa pressure are the nozzle of 2.37 L/Min that nozzle uses the flow under 2 Mpa pressure;
In auxiliary spray wash chamber 8, to assist spray to clean 8 is controlled under normal temperature state, using deionized water as cleaning agent, the one group of nozzle assembly arranging respectively at transfer roller upper and lower 90-110mm place is sprayed to cleaning as cleaning means, wherein, every group of nozzle assembly comprises 18-25 fan nozzle, each nozzle select flow under 0.3Mpa pressure be 1 L/Min's or flow under 0.4Mpa pressure be the bore of 1.15 L/Min be 1/8 cun, spray angle is the fan nozzle that 90 ° and material are SUS303.
The quantity of described rinsing chamber 4 is 2, after being set in turn in auxiliary spray wash chamber 8, before drying chamber 5, rinsing chamber 4 is controlled at normal temperatures, using deionized water as purificant, by through again spraying on the TCO base plate glass transfer roller after operation, one group of nozzle assembly that 90-110mm place, below arranges respectively carries out rinsing as cleaning means, wherein, every group of nozzle assembly comprises that 15-20 bore is the fan nozzle of 1/4 cun, the flow of each nozzle under 0.12-0.16Mpa pressure is 1-1.15 L/Min, when concrete use, can be by the transfer roller in the first rinsing chamber 4-1, the nozzle quantity of below is set to 21, flow under 0.3 Mpa pressure is that the flow under 1L/Min or 0.4 Mpa pressure is 1.15L/Min, nozzle quantity above transfer roller in the second rinsing chamber 4-2 is set to 17, flow under 0.15 Mpa pressure is 1.06L/Min.
In order to strengthen drying effect, the quantity of described oven dry chamber 5 is 2, first dry chamber 5-1 and the second oven dry chamber 5-2, after two chambers are set in turn in rinsing chamber 4, in the first oven dry chamber 5-1, carry out, the one-level air knife 7 that utilizes transfer roller upper and lower 0-8mm place to arrange is respectively dried, wherein, one-level air knife 7 is 60 °-80 ° with the angle of TCO base plate glass direct of travel, with with the angle of the perpendicular direction of glass direct of travel: 15 ° ~ 20 °, the air temperature blowing out is 25 ~ 50 DEG C, and air quantity is 200 ~ 700m
3/ h, the air feed power source of one-level air knife is one-level air blast 7-1, the air that one-level air blast 7-1 blows out flows to one-level air knife 7 through main air filter 7-2; In the second oven dry chamber 5-2, the secondary air knife 6 that utilizes transfer roller upper and lower 0-8mm place to arrange is respectively dried, wherein, secondary air knife 6 is 60 °-80 ° with the angle of TCO base plate glass direct of travel, angle with the perpendicular direction of glass direct of travel: 15 ° ~ 20 °, the air temperature blowing out is 25 ~ 80 DEG C, and air quantity is 200 ~ 700m
3/ h.
Claims (10)
1. one kind for carrying out the cleaning of the base plate glass after laser ablation to tco layer, it is characterized in that: this technique is by the pre-spray wash chamber (1) setting gradually on TCO base plate glass transfer roller (9), cleaning agent spray wash chamber (2), again sprays wash chamber (3), rinsing chamber (4) and dry chamber (5) realization, and described processing step comprises:
A, pre-spray clean: will spray in advance wash chamber (1) and be controlled under normal temperature state, using deionized water as cleaning fluid, the one group of nozzle assembly arranging respectively at TCO base plate glass transfer roller upper and lower 90-110mm place is sprayed in advance as cleaning means, wherein, every group of nozzle assembly comprises 18-25 fan nozzle, and the flow of each nozzle under 0.12-0.16Mpa pressure is 1-1.1 L/Min;
B, cleaning agent spray clean: cleaning agent is sprayed to wash chamber (2) and be controlled at 45 DEG C ± 2 DEG C temperature, the spray alkalescent cleaning agent using the one group of nozzle assembly arranging respectively at transfer roller upper and lower 90-110mm place as cleaning means, wherein, every group of nozzle assembly comprises 30-35 fan nozzle, and the flow of each nozzle under 0.12-0.16Mpa pressure is 1-1.1 L/Min;
C, spray cleaning again: will again spray wash chamber (3) and be controlled under normal temperature state, the one group of nozzle assembly arranging respectively using deionized water as cleaning agent, by 90-110mm place above transfer roller sprays cleaning again as cleaning means, wherein, every group of nozzle assembly comprises 18-25 fan nozzle, and the flow of each nozzle under 2-3.5Mpa pressure is 1.18-2.37 L/Min;
D, rinsing: in rinsing chamber (4), upper and lower TCO base plate glass surface is rinsed;
E, oven dry: drying in chamber (5), by upper and lower TCO base plate glass skin drying, complete whole cleaning process.
2. according to claim 1 a kind of for tco layer being carried out to the cleaning of the base plate glass after laser ablation, it is characterized in that: the described wash chamber of spray again (3) afterwards, rinsing chamber (4) is also provided with auxiliary spray wash chamber before, on this basis, after described step C, before step D, be also provided with following operation:
C1, auxiliary spray clean: will assist spray to clean (8) and be controlled under normal temperature state, using deionized water as cleaning agent, the one group of nozzle assembly arranging respectively at transfer roller upper and lower 90-110mm place is sprayed to cleaning as cleaning means, wherein, every group of nozzle assembly comprises 18-25 fan nozzle, and the flow of each nozzle under 0.3-0.4Mpa pressure is 1-1.15 L/Min.
3. according to claim 1 a kind of for tco layer being carried out to the cleaning of the base plate glass after laser ablation, it is characterized in that: the quantity of described rinsing chamber (4) is 2, be set in turn in and again spray wash chamber (3) afterwards, dry chamber (5) before, rinsing chamber (4) is controlled at normal temperatures, using deionized water as purificant, by through again spraying on the TCO base plate glass transfer roller after operation, one group of nozzle assembly that 90-110mm place, below arranges respectively carries out rinsing as cleaning means, wherein, every group of nozzle assembly comprises 15-20, 1/4 person's pulse on the wrist footpath, spray angle is the fan nozzle of 90 °, the flow of each nozzle under 0.12-0.16Mpa pressure is 1-1.15 L/Min.
4. according to claim 1 a kind of for tco layer being carried out to the cleaning of the base plate glass after laser ablation, it is characterized in that: the quantity of described oven dry chamber (5) is 2, be set in turn in rinsing chamber (4) afterwards, on this basis, described baking operation step comprises:
E1, one-level air knife purge dries: in the first oven dry chamber (5-1), carry out, utilize the one-level air knife (7) that transfer roller upper and lower 0-8mm place arranges respectively to dry, wherein, one-level air knife (7) is 60 °-80 ° with the angle of TCO base plate glass direct of travel, the air temperature blowing out is 25 ~ 50 DEG C, and air quantity is 200 ~ 700m
3/ h;
E2, secondary air knife purge dries: in the second oven dry chamber (5-2), carry out, utilize the secondary air knife (6) that transfer roller upper and lower 0-8mm place arranges respectively to dry, wherein, secondary air knife (6) is 60 °-80 ° with the angle of TCO base plate glass direct of travel, the air temperature blowing out is 25 ~ 80 DEG C, and air quantity is 200 ~ 700m
3/ h.
5. according to claim 1 a kind of for tco layer being carried out to the cleaning of the base plate glass after laser ablation, it is characterized in that: described alkalescent cleaning agent is that concentration is 2% ~ 5% NaOH or KOH or TMAH cleaning agent.
6. a kind of for tco layer being carried out to the cleaning of the base plate glass after laser ablation according to described in claim 1 or 2, is characterized in that: described fan nozzle is that material is that SUS303, bore are that 1/8 cun, spray angle are the fan nozzle of 90 °.
7. according to claim 4 a kind of for tco layer being carried out to the cleaning of the base plate glass after laser ablation, it is characterized in that: the main air filter (7-2) that the air feed system structure of described one-level air knife (7) comprises one-level air blast (7-1) and is connected with one-level air blast wind-force output, the output of main air filter (7-2) is connected with the wind-force input of one-level air knife (7).
8. according to claim 4 a kind of for tco layer being carried out to the cleaning of the base plate glass after laser ablation, it is characterized in that: the air feed system structure of described secondary air knife (6) comprises secondary air blast (6-1), the heater (6-2) being connected with secondary air blast wind-force output and the secondary air filter (6-3) being connected with heater output, and the output of secondary air filter (6-3) is connected with the wind-force input of secondary air knife (6).
9. according to claim 4 a kind of for tco layer being carried out to the cleaning of the base plate glass after laser ablation, it is characterized in that: described one-level air knife (7) is that material is the cylinder structure of SUS304.
10. according to claim 4 a kind of for tco layer being carried out to the cleaning of the base plate glass after laser ablation, it is characterized in that: described secondary air knife (6) is that material is the cylinder structure of SUS304.
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|---|---|---|---|
| CN201310345840.7A CN104148349B (en) | 2013-08-09 | 2013-08-09 | A kind of cleaning for tco layer being carried out the base plate glass after laser ablation |
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|---|---|---|---|
| CN201310345840.7A CN104148349B (en) | 2013-08-09 | 2013-08-09 | A kind of cleaning for tco layer being carried out the base plate glass after laser ablation |
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| CN104148349B CN104148349B (en) | 2016-06-15 |
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| CN106334702A (en) * | 2016-10-24 | 2017-01-18 | 中山瑞科新能源有限公司 | Device capable of recycling TCO (transparent conductive oxide) glass automatically |
| CN106733854A (en) * | 2017-01-17 | 2017-05-31 | 武汉市新裕科技有限公司 | A kind of galvanized sheet cleaning device |
| CN106733854B (en) * | 2017-01-17 | 2020-01-10 | 武汉市新裕科技有限公司 | Galvanized sheet belt cleaning device |
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| CN104148349B (en) | 2016-06-15 |
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