CN104014233B - The device of Excimer UV radiation degrade waste gas integrated with plasmon coupling - Google Patents
The device of Excimer UV radiation degrade waste gas integrated with plasmon coupling Download PDFInfo
- Publication number
- CN104014233B CN104014233B CN201410302998.0A CN201410302998A CN104014233B CN 104014233 B CN104014233 B CN 104014233B CN 201410302998 A CN201410302998 A CN 201410302998A CN 104014233 B CN104014233 B CN 104014233B
- Authority
- CN
- China
- Prior art keywords
- gas
- quartz ampoule
- district
- air inlet
- gas distributor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000002912 waste gas Substances 0.000 title claims abstract description 83
- 230000005855 radiation Effects 0.000 title claims abstract description 59
- 230000008878 coupling Effects 0.000 title claims abstract description 34
- 238000010168 coupling process Methods 0.000 title claims abstract description 34
- 238000005859 coupling reaction Methods 0.000 title claims abstract description 34
- 239000007789 gas Substances 0.000 claims abstract description 244
- 239000010453 quartz Substances 0.000 claims abstract description 158
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 158
- 239000003708 ampul Substances 0.000 claims abstract description 132
- 238000006243 chemical reaction Methods 0.000 claims abstract description 65
- 239000002184 metal Substances 0.000 claims description 17
- 239000000203 mixture Substances 0.000 claims description 10
- 229910052736 halogen Inorganic materials 0.000 claims description 8
- 239000000428 dust Substances 0.000 claims description 4
- 239000007787 solid Substances 0.000 claims description 4
- 238000005245 sintering Methods 0.000 claims 1
- 238000000034 method Methods 0.000 description 25
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 16
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 14
- 230000015556 catabolic process Effects 0.000 description 12
- 238000006731 degradation reaction Methods 0.000 description 11
- 230000000694 effects Effects 0.000 description 11
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 230000004888 barrier function Effects 0.000 description 8
- 239000002245 particle Substances 0.000 description 8
- 230000008569 process Effects 0.000 description 7
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- 230000000593 degrading effect Effects 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 6
- 238000004868 gas analysis Methods 0.000 description 6
- 238000001514 detection method Methods 0.000 description 5
- 238000005070 sampling Methods 0.000 description 5
- 210000002421 cell wall Anatomy 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- QGJOPFRUJISHPQ-UHFFFAOYSA-N Carbon disulfide Chemical compound S=C=S QGJOPFRUJISHPQ-UHFFFAOYSA-N 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- 239000003344 environmental pollutant Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000003595 mist Substances 0.000 description 3
- 231100000719 pollutant Toxicity 0.000 description 3
- 238000000746 purification Methods 0.000 description 3
- 230000000191 radiation effect Effects 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000000356 contaminant Substances 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 239000002440 industrial waste Substances 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 238000003672 processing method Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000012855 volatile organic compound Substances 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- 240000008254 Rosa chinensis Species 0.000 description 1
- 235000000664 Rosa chinensis Nutrition 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000006477 desulfuration reaction Methods 0.000 description 1
- 230000023556 desulfurization Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 230000009969 flowable effect Effects 0.000 description 1
- 239000003546 flue gas Substances 0.000 description 1
- 239000005431 greenhouse gas Substances 0.000 description 1
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001699 photocatalysis Effects 0.000 description 1
- -1 polytetrafluoroethylene Polymers 0.000 description 1
- 230000008092 positive effect Effects 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 241000894007 species Species 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
The invention discloses the device of a kind of Excimer UV radiation degrade waste gas integrated with plasmon coupling, reactor usedly comprise four layers of quartz medium layer, be respectively the first quartz ampoule, the second quartz ampoule, the 3rd quartz ampoule and the 4th quartz ampoule that set gradually from inside to outside, interior electrode is arranged in the first quartz ampoule, and external electrode is arranged on the 3rd quartz ampoule lateral surface; Space between first quartz ampoule and the second quartz ampoule is A district reaction zone; The upper/lower terminal port of the 3rd quartz ampoule sinters the lateral surface at the second quartz ampoule, thus forms airtight toroidal cavity between the second quartz ampoule and the 3rd quartz ampoule, and this airtight toroidal cavity is that gas fills B district; Space between 4th quartz ampoule and the 3rd quartz ampoule is C district reaction zone; There is the physics of series of complex, chemical reaction and being degraded in the gas through A district, the gas through C district issues third contact of a total solar or lunar eclipse solution at ultra-violet radiation under Excimer UV radiation and plasma acting in conjunction.
Description
The application is application number is 201210575476.9, and the applying date is on December 26th, 2012, and invention and created name is the divisional application of the application for a patent for invention of " method and apparatus of Excimer UV radiation degrade waste gas integrated with plasmon coupling ".
Technical field
The invention belongs to technical field of waste gas treatment, be specifically related to the device of a kind of Excimer UV radiation degrade waste gas integrated with plasmon coupling.
Background technology
Along with development in science and technology, the processing method of waste gas gets more and more, and the processing method of current waste gas has absorption process, absorption method, catalytic oxidation, photocatalytic method and plasma technique etc.Advocating under cleaner production, the situation that economizes on resources now, without the need to chemicals, having much attraction without the need to consuming the low and environment amenable lower temperature plasma technology of large water gaging and the energy, cost.
Plasma is the 4th state being called as material after solid-state, liquid, gaseous state, and it is a kind of quasi-neutrality gas showing collective behavior comprising a large amount of positive negative charged particles, electronics and neutral particle and free radical composition that gas produces in discharge process.If the temperature difference of the temperature of electronics and heavy particle is few in this individual system, is then high-temperature plasma, or is called Equilibrium plasma; If the temperature of electronics is far longer than the temperature of heavy particle, whole system presents a kind of normal temperature state, and the plasma now produced is low temperature plasma, also claims non-equilibrium plasma, and the plasma that general gas flow electric discharge produces belongs to this type.
The mode producing low temperature plasma has dielectric barrier discharge (Dielectricbarrierdischarge, hereinafter referred to as DBD), glow discharge, corona discharge, microwave discharge and radio frequency discharge etc.The plasma that existing bibliographical information dielectric barrier discharge produces at present can be used for degraded VOC (VOCs), greenhouse gases, HCFC and flue gas desulfurization and denitrification etc.; But these research major parts are basic research, and application study is relatively less.Current commercial application only finds two examples, and one is Fujistu company DBD process bioxin gas; Two is that DBD administers for the hydrogen sulfide of Shanghai Chinese rose chemical fibre Co., Ltd and the industrialization of carbon disulfide waste gas.
The main cause that the commercial application of DBD plasma degradation waste gas does not obtain effectively promoting is that capacity usage ratio is low, applied voltage is high (being generally greater than 9000V) and power source life is short.Therefore, a lot of scholar starts the research turning to DBD and other technical tie-up degradation of contaminant from independent DBD plasma degradation pollutant, comprising: DBD-catalysis, DBD-UV, DBD-O
3deng.But these combined degradation technology above-mentioned need additionally add some materials or equipment, make system become complicated, wanting closely combines both plays a role and there is certain difficulty in actual applications.
Such as Chinese patent literature CN201969473U(application number 201120053678.8) disclose a kind of UV plasma waste gas cleaning device, comprise main casing, the front and back ends of main casing is respectively equipped with primary air inlet, main gas outlet; The inside of described main casing is provided with air inlet section, UV clean-up stage, plasma for purification section, air outlet section from primary air inlet successively to main gas outlet; Several ballasts being provided with several quartz burners be arranged in array in UV clean-up stage and starting for described quartz burner; Plasma for purification section comprises at least one plasma waste gas purifying device.Visible this DBD-UV combined degradation technology, in order to by UV and plasma combined degradation waste gas, adds the equipment of UV clean-up stage, makes whole purification systems complicated.
Therefore, contaminant degradation efficiency is high, capacity usage ratio is high, equipment simple novel plasma degraded waste gas technology is very necessary to develop one.
Chinese patent literature CN100540121C(application number 200610028018.8) disclose a kind of method and apparatus for the treatment of industrial waste gas through dual plasma, the method changes three layers of quartz medium layer into by original double-deck quartz medium, makes three layers of quartz medium be separated to form two region of discharges and atmosphere gas region of discharge and low-pressure gas ultraviolet radiation zone; Industrial waste gas enters system by atmosphere gas region of discharge, through low-pressure gas ultraviolet radiation zone, realizes the effect removing pollutant, Purge gas.During the method degraded waste gas more independent than plasma, energy rate improves about 30%.But this patent medium ultraviolet light region is at inner side (electric-field strength), plasma is in outside, and electric energy, mainly for generation of ultra-violet radiation, weakens the effect of plasma degradation waste gas, and capacity usage ratio is difficult to reach optimization.Meanwhile, ultraviolet region is in inner side, and surface of the light tube temperature is high, and medium easily punctures and causes lamp tube service life to shorten.
Summary of the invention
Technical problem to be solved by this invention is to provide one and produces plasma and Excimer UV radiation with a power supply, the device of coupling integrated degraded waste gas simultaneously.
The technical scheme realizing the object of the invention is the device of a kind of Excimer UV radiation degrade waste gas integrated with plasmon coupling, comprises gas skirt, gas distributor, reactor and air-introduced machine; Gas skirt comprises the first gas skirt and the second gas skirt; Gas distributor comprises the first gas distributor and the second gas distributor; First gas skirt, the first gas distributor, reactor, the second gas distributor and the second gas skirt set gradually from bottom to top.
Waste gas generator gas outlet or the air accumulator of the air inlet of the first gas skirt and gas of waiting to degrade are connected, the first gas skirt gas outlet be connected with the air inlet of the first gas distributor; Reactor is arranged between the first gas distributor and the second gas distributor; Second gas skirt is fixed on above the second gas distributor, and the air inlet of the second gas skirt is connected with all gas outlets of the second gas distributor; The air inlet port of air-introduced machine is connected with the gas outlet of the second gas skirt.
Described reactor comprises four layers of quartz medium layer, interior electrode, external electrode and high voltage source; The first quartz ampoule that described four layers of quartz medium layer comprise coaxial line, that set gradually from inside to outside, the second quartz ampoule, the 3rd quartz ampoule and the 4th quartz ampoule; Interior electrode is arranged in the first quartz ampoule, and external electrode is arranged on the 3rd quartz ampoule lateral surface.
The transmitance of the ultraviolet light of the second quartz ampoule and the 3rd quartz ampoule reaches more than 85%; The transmitance < 40% of the ultraviolet light of the first quartz ampoule and the 4th quartz ampoule.The wall thickness of the first quartz ampoule is 1 ~ 2mm, and the wall thickness of the 4th quartz ampoule is 1 ~ 2mm.
The closed at both ends of the first quartz ampoule, is fixed on the second quartz ampoule by bracing frame inner.The main body of support frame as described above is a plectane.Bracing frame comprises installing hole and passage, and the main body that installing hole is arranged on bracing frame is central and coaxial with the main body of bracing frame; Passage is arranged on the periphery of installing hole.
The inwall tight fit of bracing frame and the second quartz ampoule; The installing hole tight fit of the first quartz ampoule and bracing frame, thus the first quartz ampoule is fixed on the second quartz ampoule 52 inside by bracing frame.
Space between first quartz ampoule and the second quartz ampoule is A district reaction zone; The upper/lower terminal port of the 3rd quartz ampoule sinters the lateral surface at the second quartz ampoule, thus form airtight toroidal cavity between the second quartz ampoule and the 3rd quartz ampoule, this airtight toroidal cavity is that gas fills B district, and gas is filled in B district and is filled with rare gas or rare gas-halogen mixture gas or mercury-halogen mixture gas; Space between 4th quartz ampoule and the 3rd quartz ampoule is C district reaction zone.
First gas distributor is provided with A district air inlet through hole and C district air inlet through hole, and the second gas distributor is provided with A district and goes out vent hole and C district goes out vent hole; The A district air inlet through hole of the first gas distributor goes out vent hole with A district reaction zone with the A district of the second gas distributor and is connected, and the C district air inlet through hole of the first gas distributor goes out vent hole with C district reaction zone with the C district of the second gas distributor and is connected.
Preferably, the first gas distributor also comprises air duct; Inlet end and the air hose of air duct) be connected, air hose is provided with valve; The gas outlet of air duct is connected with C district reaction zone.
As preferably, above the outlet of the C district air inlet through hole of the first gas distributor and above the gas outlet of air duct, be also provided with porous sieve plate.
Described porous sieve plate is annular, and the circumferencial direction of porous sieve plate arranges a circle passage, and the passage of porous sieve plate is arranged on below the C district reaction zone of reactor; The C district air inlet through hole of the first gas distributor is connected with the C district reaction zone of reactor by the passage of porous sieve plate; The gas outlet of air duct is connected with the C district reaction zone of reactor by the passage of porous sieve plate.
As preferably, below the air inlet of the first gas distributor, be also provided with cyclone separator; The gas outlet of the first gas skirt is connected with the air inlet of cyclone separator, and the air outlet of cyclone separator is connected with the air inlet of the first gas distributor.
The inwall of above-mentioned first quartz ampoule is close to sheet metal that one deck rolls as interior electrode, or the solid metal dust of the first quartz ampoule is as interior electrode.
The lateral surface of the 3rd quartz ampoule is wound around sheet metal as external electrode, or on the lateral surface of the 3rd quartz ampoule coated metal net as external electrode.
Described high voltage source is medium-frequency pulse square wave power, and discharge voltage is adjustable within the scope of 0kV ~ 15kV.
The present invention has positive effect: (1) Excimer UV of the present invention radiation device of degrading waste gas integrated with plasmon coupling comprises the four layers of quartz medium layer be coaxially set by introversion and extroversion, the two ends of the 3rd quartz medium layer are sintered to fix on the outer surface of the second quartz medium layer, thus form the toroidal cavity of sealing between the 3rd quartz medium layer and the second quartz medium layer, in toroidal cavity according to Exhaust gas species to be dealt with fill there is certain pressure rare gas, rare gas and halogen or mercuryvapour and halogen mist.Quartz socket tube as the 3rd quartz medium layer is wound around as the sheet metal of external electrode or parcel as the net metal of external electrode outward, and the first quartz medium layer inwall is close to layer of metal sheet or filled with metal powder as interior electrode.
After switching on power, under high voltage source excites, produce dielectric barrier discharge plasma and Excimer UV radiation between internal and external electrode, the waste gas flowing through (A district reaction zone) between the first quartz medium floor and the second quartz medium floor is degraded under the synergy of dielectric barrier discharge plasma and Excimer UV radiation; Reach best pollutants removal rate.
Meanwhile, between the 3rd quartz medium floor and the 4th quartz medium floor also there is Excimer UV radiation in (C district reaction zone), and the waste gas flowing through C district is degraded under Excimer UV radiation effects.
Therefore, in the device of Excimer UV radiation of the present invention exhaust gas decomposition integrated with plasmon coupling, Excimer UV radiation can be degraded separately waste gas; Also as photo-ionisation agent, with plasmon coupling, gas breakdown voltage can be reduced, improves capacity usage ratio.
(2) the reactor inlet end of the device of Excimer UV radiation of the present invention degrade waste gas integrated with plasmon coupling is provided with shunting gas distributor, can realize waste gas and enter reactor with the pattern shunted or do not shunt.
After C district air inlet is closed by piston, waste gas carries out ultra-violet radiation/plasma combined degradation regardless of the A district reaction zone flow to into reactor.After the piston of C district air inlet is opened, waste gas is divided into two-way by gas distributor and enters A district reaction zone and C district reaction zone, and the gas entering A district reaction zone is degraded under the synergy of ultra-violet radiation and plasma; The gas entering C district reaction zone is degraded under the effect of ultra-violet radiation.
(3) when waste gas to be dealt with compares difficult degradation, C district air inlet is closed by piston, air duct valve opening, pass into air to C district, waste gas enters A district by gas distributor and carries out ultra-violet radiation/plasma combined degradation, and air enters C district by gas distributor and porous sieve plate and dissociates under ultra-violet radiation.
C district passes into air can play two effects: one is the temperature reducing Excimer lamp surface, makes fluorescent tube continuous illumination; Two is that air is decomposed into active particle under action of ultraviolet light, comprises O, OH and O
3deng, react when the waste gas after processing with A district mixes in the second gas skirt, thus A district gas is degraded further.
(4) internal and external electrode of device of the present invention by three layers of medium separately, can change the effect of dielectric barrier discharge and the light efficiency of Excimer lamp, at utmost improve capacity usage ratio by change electrode material and electrode shape.
(5) waste gas that the present invention is pending, by cyclone separator+gas distributor two-stage mixing, realizes even air inlet, ensures that treatment effect is stablized.
(6) in the present invention, four layers of quartz medium layer of device realize coaxial by bracing frame, the first gas distributor and the second gas distributor, and material is polytetrafluoroethylene (PTFE) that is high temperature resistant, stable in properties.Bracing frame shape is Round Porous annular, both can ensure innermost layer quartz ampoule and outer quartz socket tube coaxially, gas uniform can be made again by A district reaction zone.
(7) apparatus structure of the present invention is simple, floor space is few, Excimer UV radiated wavelength range wide (λ=108-345nm), the uviol lamp life-span is long, capacity usage ratio is high, exhaust-gas treatment is effective, applied range, can be used for the improvement of multiple waste gas.
Accompanying drawing explanation
Fig. 1 is the device schematic diagram of Excimer UV radiation of the present invention degrade waste gas integrated with plasmon coupling;
Fig. 2 is the top view of the reactor in Fig. 1;
Fig. 3 is the schematic perspective view of the first gas distributor in Fig. 1;
Fig. 4 is the top view of the bracing frame in Fig. 1;
Fig. 5 is the top view of the porous sieve plate in Fig. 1;
Fig. 6 be device of the present invention only have A district lead to wait degrade gas time fundamental diagram;
Fig. 7 is device A district of the present invention and C district logical fundamental diagram when degraded gas simultaneously;
Fig. 8 is the fundamental diagram that device A district of the present invention leads to when degraded gas, C district blowing air;
Fig. 9 is exhaust gas decomposition process chart of the present invention;
Mark in above-mentioned accompanying drawing is as follows:
Gas skirt 1, the first gas skirt 11, second gas skirt 12;
Cyclone separator 2, air inlet 21;
First gas distributor 3, main body 31, blind hole 32, cylinder base station 33-1, circle ring column 33-2, cannelure 34, annular boss 35, A district's air inlet through hole 36, air duct 37, gas outlet 37-1, air hose 37-2, valve 37-3, C district's air inlet through hole 38, piston channel 39, piston 39-1;
Second gas distributor 4, main body 41, A district goes out vent hole 42, C district and goes out vent hole 43;
Reactor 5, the first quartz ampoule 51, second quartz ampoule the 52, three quartz ampoule the 53, four quartz ampoule 54, gas fill area 55, bracing frame 56, installing hole 56-1, passage 56-2;
Interior electrode 61, external electrode 62, high voltage source 63;
Porous sieve plate 7, passage 71.
Detailed description of the invention
(device of embodiment 1, Excimer UV radiation degrade waste gas integrated with plasmon coupling)
See Fig. 1, the Excimer UV radiation device of degrading waste gas integrated with plasmon coupling of the present embodiment comprises gas skirt 1, cyclone separator 2, gas distributor, reactor 5 and air-introduced machine.Gas skirt 1 comprises the first gas skirt 11 and the second gas skirt 12; Gas distributor comprises the first gas distributor 3 and the second gas distributor 4.First gas skirt 11, cyclone separator 2, first gas distributor 3, reactor 5, second gas distributor 4 and the second gas skirt 12 set gradually from bottom to top.
Waste gas generator gas outlet or the air accumulator of the air inlet of the first gas skirt 11 and gas of waiting to degrade are connected, the first gas skirt 11 gas outlet be connected with the air inlet 21 of cyclone separator 2.Cyclone separator 2 is arranged on the inside of the first gas skirt 11, and cyclone separator 2 to be fixed on the top erecting bed of the first gas skirt 11 by the mount pad above it thus to be supported by the first gas skirt 11 and be fixed on the first gas skirt 11.
First gas distributor 3 is fixed on by its underpart in the air outlet of cyclone separator 2, and the air inlet of the first gas distributor 3 lower end is connected with the air outlet of cyclone separator 2.
See Fig. 3, the first gas distributor 3 comprises main body 31, blind hole 32, cylinder base station 33-1, circle ring column 33-2, cannelure 34, annular boss 35, A district air inlet through hole 36, air duct 37, C district air inlet through hole 38, piston channel 39 and porous sieve plate 7.
Main body 31 is cylindrical, from the upper bottom surface of main body 31 to having blind hole 32; Blind hole 32 and main body 31 coaxial line.The central authorities of blind hole 32 are provided with and the cylinder base station 33-1 of blind hole 32 coaxial line and circle ring column 33-2; Described cylinder base station 33-1 is a cylinder; The bottom surface be connected with cylinder base station 33-1 of circle ring column 33-2 is annulus, is upwards extended by the axis of this annulus along cylinder base station and is obtained circle ring column 33-2.Cylinder base station 33-1 and circle ring column 33-2 is one-body molded, and cylinder base station 33-1 is identical with the external diameter of circle ring column 33-2.
Form cannelure 34 between the hole wall of blind hole 32 and the lateral surface of cylinder base station 33-1 and circle ring column 33-2, also namely the inner side cell wall of cannelure 34 is the lateral surface of cylinder base station 33-1 and circle ring column 33-2, and outside cell wall is the hole wall of blind hole 32.Annular boss 35 is arranged in cannelure 34 along the hole wall of blind hole 32, thus forms a step between annular boss 35 and cannelure 34.
A district air inlet through hole 36 to distribute main body 31 part be arranged on corresponding to circle ring column 33-2 with sieve-mesh, and A district air inlet through hole 36 runs through main body 31 downwards from the upper surface of cylinder base station 33-1, each axis of A district air inlet through hole 36 and the axis being parallel of main body 31.The gas outlet, upper end of A district air inlet through hole 36 is all positioned at the inside of circle ring column 33-2.
See Fig. 1 and Fig. 3, air duct 37 is arranged on the left side of main body 31 inside, and one section of passage that air duct 37 is arranged by radial direction and the one section of expanding channels axially arranged form.The outlet of the passage axially arranged is positioned at cannelure 34 and communicates with the external world, and this outlet is also the gas outlet 37-1 of air duct 37.
The inlet end of the passage of the radial direction setting of air duct 37 is the inlet end of air duct 37, and the inlet end of air duct 37 is connected with air hose 37-2, and air hose 37-2 is provided with valve 37-3.Air hose 37-2 is connected with air pump.
C district air inlet through hole 38 is arranged on the right side of main body 31, and the axis of C district air inlet through hole 38 and the axis being parallel of main body 31 also run through main body 31 completely; The air outlet of C district air inlet through hole 38 is positioned at cannelure 34.
Piston channel 39 is radially arranged in main body 31, and piston channel 39 is connected with C district air inlet through hole 38.Piston 39-1 is provided with in piston channel 39; When piston 39-1 moves arrival high order end from right to left, C district air inlet through hole 38 is blocked by piston 39-1; And when piston 39-1 moves right, C district air inlet through hole 38 recovers unimpeded.
Above the gas outlet 37-1 of air duct 37 He above C district air inlet through hole 38, porous sieve plate 7 is set.See Fig. 5, described porous sieve plate 7 is annular, and the circumferencial direction along porous sieve plate 7 arranges a circle passage 71.The external diameter of porous sieve plate 7 is identical with the diameter of the blind hole 32 of main body 31 or be slightly less than the diameter of blind hole 32 of main body 31; The central aperture of porous sieve plate 7 is identical with the external diameter of the cylinder base station 33-1 of main body 31 or slightly larger than the external diameter of cylinder base station 33-1.
See Fig. 1, porous sieve plate 7 is enclosed within outside the cylinder base station 33-1 of main body 31, and is fixedly installed on annular boss 35.The air flowed out from the gas outlet 37-1 of air duct 37 flows into C district after the passage 71 of porous sieve plate 7, dissociates under ultra-violet radiation effect.
The waste gas flowed out from the air outlet of C district air inlet through hole 38 enters C district after the passage 71 of porous sieve plate 7.Waste gas is mixed further when through porous sieve plate 7.
See Fig. 1, the second gas distributor 4 comprises main body 41, and blind hole, circle ring column, cannelure, A district goes out vent hole 42 and C district goes out vent hole 43.
Main body 41 is cylindrical, is upwards provided with blind hole from the bottom surface of main body 41, blind hole and main body 41 coaxial line.The blind hole diameter of the main body 41 of the second gas distributor 4 is identical with the diameter of the blind hole 32 of the main body 31 of the first gas distributor 3, also identical with the external diameter of the annular boss 35 of the first gas distributor 3.
The central authorities of the blind hole of main body 41 are provided with the circle ring column with blind hole coaxial line; The internal diameter of the circle ring column of the main body 41 of the second gas distributor 4 is identical with the internal diameter of the circle ring column 33-2 of the main body 31 of the first gas distributor 3.
Form cannelure between the hole wall of blind hole and the lateral surface of circle ring column, also namely the inner side cell wall of cannelure is the lateral surface of circle ring column, and outside cell wall is the hole wall of blind hole.
A district goes out vent hole 42 and to distribute main body 41 part be arranged on corresponding to circle ring column with sieve-mesh, and A district goes out vent hole 42 and upwards runs through main body 41 from the upper bottom surface place plane of circle ring column, and each A district goes out the axis of vent hole 42 and the axis being parallel of main body 41.The lower end air inlet that A district goes out vent hole 42 is all positioned at the inside of circle ring column.
C district goes out vent hole 43 and is positioned at main body 41 part corresponding to cannelure, and C district goes out vent hole about 43 and runs through main body 41.
Second gas skirt 12 is fixed on above the second gas distributor 4, and the air inlet of the second gas skirt 12 is connected with all gas outlets of the second gas distributor 4.The air inlet port of air-introduced machine (not shown in FIG.) is connected with the gas outlet of the second gas skirt 12.
Reactor 5 is arranged between the first gas distributor 3 and the second gas distributor 4, and reactor 5 is arranged on the top of the porous sieve plate 7 of the first gas distributor 3.
Reactor 5 comprises four layers of quartz medium layer, interior electrode 61, external electrode 62 and high voltage source 63.
See Fig. 2, that described four layers of quartz medium layer comprise coaxial line, that set gradually from inside to outside the first quartz ampoule 51, second quartz ampoule 52, the 3rd quartz ampoule 53 and the 4th quartz ampoule 54.The transmitance of the ultraviolet light (near 200nm) of the second quartz ampoule 52 and the 3rd quartz ampoule 53 reaches more than 85%; First quartz ampoule 51 and the 4th quartz ampoule 54 adopt domestic quartz ampoule, the transmitance < 40% of its ultraviolet light (near 200nm).The wall thickness of the first quartz ampoule 51 is 1 ~ 2mm, and the wall thickness of the 4th quartz ampoule 54 is 1 ~ 2mm.
The open at both ends of the second quartz ampoule 52, the external diameter of the second quartz ampoule 52 is identical with the internal diameter of the circle ring column 33-2 of the first gas distributor 3.The lower end of the second quartz ampoule 52 is sleeved in the circle ring column 33-2 of the first gas distributor 3, and the upper end of the second quartz ampoule 52 is sleeved in the circle ring column of the second gas distributor 4; Thus the second quartz ampoule 52 is fixed between the first gas distributor 3 and the second gas distributor 4.
The closed at both ends of the first quartz ampoule 51, is fixed on the second quartz ampoule 52 by bracing frame 56 inner.See Fig. 4, the main body of support frame as described above 56 is a plectane.Bracing frame 56 comprises installing hole 56-1 and passage 56-2, and the main body that installing hole 56-1 is arranged on bracing frame 56 is central and coaxial with the main body of bracing frame 56; Passage 56-2 is arranged on the periphery of installing hole 56-1.
The inwall tight fit of bracing frame 56 and the second quartz ampoule 52; The installing hole 56-1 tight fit of the first quartz ampoule 51 and bracing frame 56, thus the first quartz ampoule 51 is fixed on the second quartz ampoule 52 inside by bracing frame 56.
Space between first quartz ampoule 51 and the second quartz ampoule 52 is A district reaction zone, and described A district reaction zone is quasi-molecule ultra-violet radiation degrade district integrated with plasmon coupling.
Bracing frame 56 not only makes the first quartz ampoule 51 coaxial with the second quartz ampoule 52, and the passage 56-2 that it is arranged makes waste gas evenly by A district reaction zone.
3rd quartz ampoule 53 is sleeved on outside the second quartz ampoule 52, the upper/lower terminal port of the 3rd quartz ampoule 53 sinters the lateral surface at the second quartz ampoule 52, thus form airtight toroidal cavity between the second quartz ampoule 52 and the 3rd quartz ampoule 53, this airtight toroidal cavity is filled B district as gas.
Gas is filled in B district such as, according to treating that the kind of degraded waste gas fills different gas, Xe
2, Ar/F
2, Kr/Cl
2, Kr/Br
2, Kr/I
2, Hg/F
2or Hg/Cl
2deng, to produce the Excimer UV radiation of different wave length, to degrade waste gas with plasmon coupling.
The open at both ends of the 4th quartz ampoule 54, the external diameter of the 4th quartz ampoule 54 is identical with the diameter of the blind hole 32 of the first gas distributor 3.4th quartz ampoule 54 lower end be sleeved in the blind hole 32 of the first gas distributor 3, and be supported on annular boss 35; 4th quartz ampoule 54 upper end be sleeved in the blind hole of the second gas distributor 4; Thus the 4th quartz ampoule 54 is fixed between the first gas distributor 3 and the second gas distributor 4.
Space between 4th quartz ampoule 54 and the 3rd quartz ampoule 53 is C district reaction zone, and described C district reaction zone is quasi-molecule ultra-violet radiation degraded district.
Interior electrode 61 is arranged on the inside of the first quartz ampoule 51, and the inwall of the first quartz ampoule 51 is close to sheet metal that one deck rolls as interior electrode 61, or the solid metal dust of the first quartz ampoule 51 is as interior electrode 61; As interior electrode 61 in the present embodiment using the solid metal dust of the first quartz ampoule 51.
External electrode 62 is arranged on the lateral surface of the 3rd quartz ampoule 53.The lateral surface of the 3rd quartz ampoule 53 is wound around sheet metal as external electrode 62, or on the lateral surface of the 3rd quartz ampoule 53 coated metal net as external electrode 62.External electrode 62 and interior electrode 61 are coaxially set, make electric discharge evenly.
External electrode 62, interior electrode 61 are communicated with high voltage source 63.Described high voltage source 63 is medium-frequency pulse square wave power, and discharge voltage is adjustable within the scope of 0 ~ 15kV.Under high voltage source 63 excites, dielectric barrier discharge plasma and Excimer UV radiation is produced between internal and external electrode, flow through waste gas degraded under both effects of A district reaction zone, the waste gas or the air that flow through C district reaction zone dissociate under Excimer UV radiation effects.
In order to make apparatus structure simple in the present embodiment, cyclone separator 2 can be set yet yet, the air inlet of the first gas distributor 3 is directly connected with the gas outlet of the first gas skirt 11.But pending waste gas, by cyclone separator+gas distributor two-stage mixing, can realize even air inlet, ensures that treatment effect is more stable.
When the device of Excimer UV radiation degrade waste gas integrated with plasmon coupling uses, first filling B district to the gas between the second quartz ampoule 52 and the 3rd quartz ampoule 53 to vacuumize, being then filled with the rare gas (Xe selected according to treating degraded gas of certain pressure
2), rare gas-halogen (Ar/F
2, Kr/Cl
2, Kr/Br
2or Kr/I
2) or mercury-halogen (Hg/F
2or Hg/Cl
2) mist.
In addition, filling proportioning and the stagnation pressure of blanketing gas in B district by changing gas, the energy distribution of high voltage source 63 for activated plasma and excimer radiation can be changed, farthest improve exhaust gas decomposition effect and energy rate.
Open air-introduced machine, air-introduced machine will be treated in degraded waste gas suction reactor 5, wait degrade waste gas through cyclone separator 2 mix after through the first gas distributor 3 time, shunting enters A district reaction zone and the C district reaction zone of reactor 5, or only enter A district reaction zone, after reactor 5 reacts, gas again mixes in the second gas skirt 12, then extracts discharge out by air-introduced machine.
(method of embodiment 2, Excimer UV radiation degrade waste gas integrated with plasmon coupling)
The method of the Excimer UV radiation of the present embodiment degrade waste gas integrated with plasmon coupling uses the device described in embodiment 1.
See Fig. 9, the flow process of Excimer UV radiation degrade waste gas integrated with plasmon coupling is: waste gas generator or waste gas air accumulator waste gas out tentatively mix through cyclone separator 2, again after the first gas distributor 3 mixes further, enter under air-introduced machine effect in Excimer UV radiation and plasmon coupling integrated reactor 5 and purify.In the place of the outlet distance reactor 1m of reactor 5, arrange thief hatch, reacted gas detects its concentration by on-line gas analysis instrument, degrade up to standard after gas discharged by blast pipe.
See Fig. 6, the present embodiment degraded flowable state simulation styrene waste gases, initial concentration is 1265mg/m
3, the method for degraded waste gas specifically comprises the following steps:
1. fill B district to the gas between the second quartz ampoule 52 and the 3rd quartz ampoule 53 to vacuumize, then fill Kr200torr and I wherein
2seal after 6mg.
2. close the valve 37-3 of the air hose 37-2 be connected with air duct 37, and piston 39-1 ecto-entad is advanced to close C district air inlet through hole 38.
3. open high voltage source 63, regulate applied voltage 9.0kV.The mist that gas fills B district is excited generation Excimer UV light to A district and the radiation of C district; Excimer UV radiation wavelength is 206nm.Along with voltage raises further, in A district, gas discharge produces plasma, and described plasma is made up of high energy electron, active particle and negative ions etc.
4. open the air-introduced machine be connected with the second gas skirt 12, styrene waste gases flows out from waste gas generator gas outlet, after cyclone separator 2 mixes, enters the A district reaction zone in the second quartz ampoule 52 from the A district air inlet through hole 36 of the first gas distributor 3; The flow of styrene waste gases is 3.26m
3/ h.
, under Excimer UV radiation and plasma acting in conjunction, there is the physics of series of complex, chemical reaction and being degraded in the A district reaction zone of gas between the first quartz ampoule 51 and the second quartz ampoule 52.
The gas of A district reaction zone goes out after vent hole 42 flows out from the A district of the second gas distributor 4, by air-introduced machine is extracted after mixing the second gas skirt 12 in.After the thief hatch sampling above reactor 5, on-line gas analysis instrument detection display styrene gas removal efficiency when applied voltage 9.0kV reaches 84.4%, improve 20.6% than the clearance of traditional dielectric barrier discharge, energy rate improves 5.7g/ (kWh).
(method of embodiment 3, Excimer UV radiation degrade waste gas integrated with plasmon coupling)
What the present embodiment was degraded is the dynamic dimethylamine exhaust gas of analog stream, initial concentration 1800mg/m
3.
See Fig. 7, all the other are identical with embodiment 2 for the method for the Excimer UV radiation of the present embodiment and the integrated waste gas of degrading of plasmon coupling, and difference is:
Step 1. in, fill B district to the gas between the second quartz ampoule 52 and the 3rd quartz ampoule 53 and fill Kr200torr and Br
25torr.
Step 2. in, close the valve 37-3 of air hose 37-2 be connected with air duct 37, and piston 39-1 is opened make air inlet through hole 38 in C district unimpeded.
Step 3. in, open high voltage source 63, regulate applied voltage 7.5kV; Excimer UV radiation wavelength is 207nm.
Step 4. in, the flow of dimethylamine exhaust gas is 41.1m
3/ h.A part for dimethylamine exhaust gas enters the A district reaction zone in the second quartz ampoule 52 from A district air inlet through hole 36; Another part of dimethylamine exhaust gas enters C district air inlet through hole 38, enters the C district reaction zone between the 4th quartz ampoule 54 and the 3rd quartz ampoule 53 after porous sieve plate 7.
The physics of series of complex, chemical reaction and being degraded is there is in the dimethylamine exhaust gas entering A district reaction zone under Excimer UV radiation and plasma acting in conjunction; The dimethylamine exhaust gas entering C district reaction zone issues third contact of a total solar or lunar eclipse solution at ultra-violet radiation.
From A district reaction zone effluent air with mix in the second gas skirt 12 from C district reaction zone effluent air after extracted out by air-introduced machine.After the thief hatch sampling above reactor 5, on-line gas analysis instrument detection display dimethylamine exhaust gas removal efficiency when applied voltage 7.5kV reaches 90.5%, and energy rate is 658.6g/ (kWh).
(method of embodiment 4, Excimer UV radiation degrade waste gas integrated with plasmon coupling)
What the present embodiment was degraded is analog stream dynamic N, N-dimethylformamide (DMF) waste gas, and initial concentration is 1200mg/m
3.
See Fig. 7, all the other are identical with embodiment 3 for the method for the Excimer UV radiation of the present embodiment and the integrated waste gas of degrading of plasmon coupling, and difference is:
Step 1. in, fill B district to the gas between the second quartz ampoule 52 and the 3rd quartz ampoule 53 and fill Kr200torr and Cl
25torr.
Step 3. in, open high voltage source 63, regulate applied voltage 7.5kV; Excimer UV radiation wavelength is 222nm.
Step 4. in, the flow of DMF waste gas is 35.1m
3/ h.Gas is divided into two-way and enters A district reaction zone and C district reaction zone is degraded respectively.
From A district reaction zone effluent air with mix in the second gas skirt 12 from C district reaction zone effluent air after extracted out by air-introduced machine.After the thief hatch sampling above reactor 5, on-line gas analysis instrument detection display DMF waste gas removal efficiency when applied voltage 6.0kV reaches 67.5%, and energy rate is 45.3g/ (kWh).
(method of embodiment 5, Excimer UV radiation degrade waste gas integrated with plasmon coupling)
What the present embodiment was degraded is the dynamic toluene waste gas of analog stream, and initial concentration is 1200mg/m
3.
See Fig. 7, all the other are identical with embodiment 3 for the method for the Excimer UV radiation of the present embodiment and the integrated waste gas of degrading of plasmon coupling, and difference is:
Step 1. in, fill B district to the gas between the second quartz ampoule 52 and the 3rd quartz ampoule 53 and fill Xe
2.
Step 3. in, open high voltage source 63, applied voltage 12.0kV; Excimer UV radiation wavelength is 172nm.
Step 4. in, the flow of toluene waste gas is 35.1m
3/ h.Gas is divided into two-way and enters A district reaction zone and C district reaction zone is degraded respectively.
From A district reaction zone effluent air with mix in the second gas skirt 12 from C district reaction zone effluent air after extracted out by air-introduced machine.After the thief hatch sampling above reactor 5, on-line gas analysis instrument detection display toluene waste gas removal efficiency when applied voltage 12.0kV reaches 69.5%, and energy rate is 29.3g/ (kWh).
(method of embodiment 6, Excimer UV radiation degrade waste gas integrated with plasmon coupling)
What the present embodiment was degraded is the dynamic styrene waste gases of analog stream, and initial concentration is 1265mg/m
3.
See Fig. 8, all the other are identical with embodiment 2 for the method for the Excimer UV radiation of the present embodiment and the integrated waste gas of degrading of plasmon coupling, and difference is:
Step 2. in, open the valve 37-3 of the air hose 37-2 be connected with air duct 37; And piston 39-1 ecto-entad is advanced to close C district air inlet through hole 38.
Step 4. in, pass into air to C district reaction zone; Styrene waste gases enters A district reaction zone from the A district air inlet through hole 36 of the first gas distributor 3.
The physics of series of complex, chemical reaction and being degraded is there is in the styrene waste gases entering A district reaction zone under Excimer UV radiation and plasma acting in conjunction.
Pass into air to C district reaction zone and can play two effects: one is the temperature on reduction the 3rd quartz ampoule 53 surface, makes the Excimer lamp fluorescent tube continuous illumination that the second quartz ampoule 52 and the 3rd quartz ampoule 53 form; Two is that air is decomposed into active particle under action of ultraviolet light, comprises O, OH and O
3deng; When mixing in the second gas skirt 12 from C district reaction zone effluent air with the waste gas after the reaction zone process of A district, the waste gas after active particle and the reaction zone process of A district reacts further, and A district reaction zone effluent air is degraded further.
After the thief hatch sampling above reactor 5, on-line gas analysis instrument detection display styrene gas removal efficiency when applied voltage 9.0kV reaches 90.4%, improve 25.6% than the clearance of traditional dielectric barrier discharge, energy rate improves 15.7g/ (kWh).
Claims (5)
1. a device for Excimer UV radiation degrade waste gas integrated with plasmon coupling, is characterized in that: comprise gas skirt (1), gas distributor, reactor (5) and air-introduced machine; Gas skirt (1) comprises the first gas skirt (11) and the second gas skirt (12); Gas distributor comprises the first gas distributor (3) and the second gas distributor (4); First gas skirt (11), the first gas distributor (3), reactor (5), the second gas distributor (4) and the second gas skirt (12) set gradually from bottom to top;
Waste gas generator gas outlet or the air accumulator of the air inlet of the first gas skirt (11) and gas of waiting to degrade are connected, and the gas outlet of the first gas skirt (11) is connected with the air inlet of the first gas distributor (3); Reactor (5) is arranged between the first gas distributor (3) and the second gas distributor (4); Second gas skirt (12) is fixed on the second gas distributor (4) top, and the air inlet of the second gas skirt (12) is connected with all gas outlets of the second gas distributor (4); The air inlet port of air-introduced machine is connected with the gas outlet of the second gas skirt (12);
Described reactor (5) comprises four layers of quartz medium layer, interior electrode (61), external electrode (62) and high voltage source (63); The first quartz ampoule (51) that described four layers of quartz medium layer comprise coaxial line, that set gradually from inside to outside, the second quartz ampoule (52), the 3rd quartz ampoule (53) and the 4th quartz ampoule (54); Interior electrode (61) is arranged in the first quartz ampoule (51), and external electrode (62) is arranged on the 3rd quartz ampoule (53) lateral surface;
Space between first quartz ampoule (51) and the second quartz ampoule (52) is A district reaction zone; The lateral surface of upper/lower terminal port sintering in the second quartz ampoule (52) of the 3rd quartz ampoule (53), thus form airtight toroidal cavity between the second quartz ampoule (52) and the 3rd quartz ampoule (53), this airtight toroidal cavity is that gas fills B district, and gas is filled in B district and is filled with rare gas or rare gas-halogen mixture gas or mercury-halogen mixture gas; Space between 4th quartz ampoule (54) and the 3rd quartz ampoule (53) is C district reaction zone;
First gas distributor (3) is provided with A district air inlet through hole (36) and C district air inlet through hole (38), and the second gas distributor (4) is provided with A district and goes out vent hole (42) and C district goes out vent hole (43); The A district air inlet through hole (36) of the first gas distributor (3) goes out vent hole (42) with A district reaction zone with the A district of the second gas distributor (4) and is connected, and the C district air inlet through hole (38) of the first gas distributor (3) goes out vent hole (43) with C district reaction zone with the C district of the second gas distributor (4) and is connected.
2. the device of Excimer UV radiation according to claim 1 degrade waste gas integrated with plasmon coupling, is characterized in that: the first gas distributor (3) also comprises air duct (37); The inlet end of air duct (37) is connected with air hose (37-2), and air hose (37-2) is provided with valve (37-3); The gas outlet of air duct (37) is connected with C district reaction zone.
3. the device of Excimer UV radiation according to claim 2 degrade waste gas integrated with plasmon coupling, is characterized in that: be also provided with porous sieve plate (7) above the outlet of the C district air inlet through hole (38) of the first gas distributor (3) and above the gas outlet of air duct (37);
Described porous sieve plate (7) is annular, and the circumferencial direction of porous sieve plate (7) arranges a circle passage (71), and the passage (71) of porous sieve plate (7) is arranged on below the C district reaction zone of reactor (5); The C district air inlet through hole (38) of the first gas distributor (3) is connected with the C district reaction zone of reactor (5) by the passage (71) of porous sieve plate (7); The gas outlet of air duct (37) is connected with the C district reaction zone of reactor (5) by the passage (71) of porous sieve plate (7).
4. the device of Excimer UV radiation according to claim 3 degrade waste gas integrated with plasmon coupling, is characterized in that: be also provided with cyclone separator (2) below the air inlet of the first gas distributor (3); The gas outlet of the first gas skirt (11) is connected with the air inlet of cyclone separator (2), and the air outlet of cyclone separator (2) is connected with the air inlet of the first gas distributor (3).
5. according to the device of the degrade waste gas integrated with plasmon coupling of the Excimer UV radiation one of Claims 1-4 Suo Shu, it is characterized in that: the inwall of the first quartz ampoule (51) is close to sheet metal that one deck rolls as interior electrode (61), or the solid metal dust of the first quartz ampoule (51) is as interior electrode (61);
The lateral surface of the 3rd quartz ampoule (53) is wound around sheet metal as external electrode (62), or on the lateral surface of the 3rd quartz ampoule (53) coated metal net as external electrode (62);
Described high voltage source (63) is medium-frequency pulse square wave power, and discharge voltage is adjustable within the scope of 0kV ~ 15kV.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210575476.9A CN103084048B (en) | 2012-12-26 | 2012-12-26 | Method and device for integrative degradation of waste gas through quasi-molecule ultraviolet radiation and plasma coupling |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210575476.9A Division CN103084048B (en) | 2012-12-26 | 2012-12-26 | Method and device for integrative degradation of waste gas through quasi-molecule ultraviolet radiation and plasma coupling |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104014233A CN104014233A (en) | 2014-09-03 |
| CN104014233B true CN104014233B (en) | 2015-12-02 |
Family
ID=48197486
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410302998.0A Active CN104014233B (en) | 2012-12-26 | 2012-12-26 | The device of Excimer UV radiation degrade waste gas integrated with plasmon coupling |
| CN201210575476.9A Active CN103084048B (en) | 2012-12-26 | 2012-12-26 | Method and device for integrative degradation of waste gas through quasi-molecule ultraviolet radiation and plasma coupling |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210575476.9A Active CN103084048B (en) | 2012-12-26 | 2012-12-26 | Method and device for integrative degradation of waste gas through quasi-molecule ultraviolet radiation and plasma coupling |
Country Status (1)
| Country | Link |
|---|---|
| CN (2) | CN104014233B (en) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103182245B (en) * | 2013-03-20 | 2014-12-10 | 江苏理工学院 | Device and method for waste gas photocatalytic degradation using electrodeless excimer lamp |
| CN105757363A (en) * | 2014-12-13 | 2016-07-13 | 天津威康医疗用品有限公司 | High-temperature resistant quartz container |
| CN104623714A (en) * | 2015-02-13 | 2015-05-20 | 常州大恒环保科技有限公司 | Air purifying device |
| CN105810552A (en) * | 2015-02-27 | 2016-07-27 | 常州大恒环保科技有限公司 | Short wave ultraviolet light generating method and device |
| CN105536455B (en) * | 2016-03-01 | 2017-09-15 | 常州大恒环保科技有限公司 | A kind of industrial waste gas controlling device |
| CN109731448B (en) * | 2019-02-26 | 2021-05-11 | 郑州常春藤环保科技有限公司 | Integrated VOCs treatment device combining excimer radiation |
| CN113154597A (en) * | 2021-04-14 | 2021-07-23 | 中国科学院电工研究所 | Plasma excitation ultraviolet light composite air sterilization device and method |
| CN113395812B (en) * | 2021-06-09 | 2023-09-26 | 江苏天楹环保能源成套设备有限公司 | Low-temperature plasma disinfection module, disinfection device and disinfection mask |
| CN115055140B (en) * | 2022-07-12 | 2023-05-09 | 南京工业大学 | Coaxial DBD powder cladding device of circulation integral type |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101618292A (en) * | 2008-11-10 | 2010-01-06 | 李元胜 | System for comprehensive utilization of three industrial wastes |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1147558A (en) * | 1997-07-31 | 1999-02-23 | Nitto Denko Corp | Air cleaning process |
| DE10136022B4 (en) * | 2001-07-24 | 2006-01-12 | Robert Bosch Gmbh | Method for avoiding or eliminating precipitates in the exhaust area of a vacuum system |
| CN100540121C (en) * | 2006-06-22 | 2009-09-16 | 复旦大学 | A kind of method and apparatus for the treatment of industrial waste gas through dual plasma |
| JP5593589B2 (en) * | 2008-03-25 | 2014-09-24 | パナソニック株式会社 | Plasma generator |
| CN201357069Y (en) * | 2009-01-04 | 2009-12-09 | 江苏技术师范学院 | Photocatalysis oxidation reactor |
| CN201969473U (en) * | 2011-03-03 | 2011-09-14 | 深圳市汇清科技有限公司 | UV (ultraviolet) plasma exhaust gas purifier |
-
2012
- 2012-12-26 CN CN201410302998.0A patent/CN104014233B/en active Active
- 2012-12-26 CN CN201210575476.9A patent/CN103084048B/en active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101618292A (en) * | 2008-11-10 | 2010-01-06 | 李元胜 | System for comprehensive utilization of three industrial wastes |
Non-Patent Citations (2)
| Title |
|---|
| "Destruction of benzene in an air stream by the outer combined plasma photolysis method";Zhao Lian Ye et al.;《Journal of Physics D: Applied Physics》;20071221;第41卷;第1083-1088页 * |
| "外置式联合等离子体光解技术去除苯乙烯气体";叶招莲等;《环境科学研究》;20090930;第22卷(第9期);第1-7页 * |
Also Published As
| Publication number | Publication date |
|---|---|
| CN104014233A (en) | 2014-09-03 |
| CN103084048A (en) | 2013-05-08 |
| CN103084048B (en) | 2014-10-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN104014233B (en) | The device of Excimer UV radiation degrade waste gas integrated with plasmon coupling | |
| CN107930364A (en) | A kind of cleaning system for microparticle and the mixture of volatile organic gases | |
| CN202762288U (en) | Multi-tube parallel type low-temperature plasma device for purifying harmful gas | |
| CN104857824A (en) | Waste gas processing method and device collaborating vacuum ultraviolet light catalysis and ozone catalytic oxidation | |
| CN101279715A (en) | Device for removing volatile organic matter and generating hydrogen with non-equilibrium plasma | |
| CN206121513U (en) | Organic waste gas treatment system | |
| CN104069722A (en) | Treatment device and method of trinity industrial source peculiar-smell waste gas | |
| CN108392951B (en) | Low-temperature plasma gas purification device | |
| CN202762284U (en) | Low-temperature plasma reaction tube for harmful gas purification | |
| CN105289297B (en) | A kind of plasma reaction device and method for administering organic exhaust gas | |
| CN203916426U (en) | A kind of Trinity industrial source peculiar smell emission-control equipment | |
| CN102616882A (en) | Advanced wastewater treatment system by aid of ozone and microwave ultraviolet light oxidation | |
| CN208599484U (en) | Module type UV- nano-TiO for low-concentration organic exhaust gas processing2Photocatalysis apparatus | |
| CN105923697A (en) | Multi-stage photocatalytic ozonidation reactor and preparation method of photocatalyst | |
| CN201033280Y (en) | Device using double plasma to process industrial waste gas | |
| CN100540121C (en) | A kind of method and apparatus for the treatment of industrial waste gas through dual plasma | |
| CN103127811B (en) | Stinking gas treatment method | |
| CN111939883A (en) | SF regeneration based on dielectric barrier discharge technology6System and method for sorbent | |
| CN101664626A (en) | Method for treating industrial organic waste gases | |
| CN110975560A (en) | VOCs waste gas purification treatment method and device | |
| CN103182245B (en) | Device and method for waste gas photocatalytic degradation using electrodeless excimer lamp | |
| Nie et al. | Non-thermal plasma-enhanced catalytic activation of Mn–Zr–La/Al2O3 catalyst for meta-xylene degradation: Synergetic effects and degradation mechanism | |
| CN207012785U (en) | A kind of micro-wave nonpolar photooxidation, plasma, photocatalysis combined exhaust gas governing system | |
| CN112316679B (en) | Low-temperature plasma VOCs purification device and method | |
| CN113163566A (en) | Device and method for modifying carbon material by plasma |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| CB02 | Change of applicant information |
Address after: 213015 Changzhou Province in the Clock Tower District, Jiangsu, Wu Road, No. 1801 Applicant after: Jiangsu University of Technology Address before: 213001 Changzhou Province in the Clock Tower District, Jiangsu, Wu Road, No. 1801 Applicant before: Jiangsu Teachers University of Technology |
|
| COR | Change of bibliographic data | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C41 | Transfer of patent application or patent right or utility model | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20151209 Address after: 213000 Changzhou Industrial Zone, Hutang Town, Wujin District, Jiangsu Patentee after: CHANGZHOU DAHENG ENVIRONMENTAL TECHNOLOGY CO., LTD. Address before: 213015 Changzhou Province in the Clock Tower District, Jiangsu, Wu Road, No. 1801 Patentee before: Jiangsu University of Technology |
|
| PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: Quasi-molecular ultraviolet radiation and plasma coupling integrated waste gas degrading device Effective date of registration: 20180322 Granted publication date: 20151202 Pledgee: Bank of China Limited by Share Ltd Changzhou Wujin branch Pledgor: CHANGZHOU DAHENG ENVIRONMENTAL TECHNOLOGY CO., LTD. Registration number: 2018320000032 |
|
| PE01 | Entry into force of the registration of the contract for pledge of patent right | ||
| PC01 | Cancellation of the registration of the contract for pledge of patent right |
Date of cancellation: 20190505 Granted publication date: 20151202 Pledgee: Bank of China Limited by Share Ltd Changzhou Wujin branch Pledgor: CHANGZHOU DAHENG ENVIRONMENTAL TECHNOLOGY CO., LTD. Registration number: 2018320000032 |
|
| PC01 | Cancellation of the registration of the contract for pledge of patent right | ||
| PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: Quasi-molecular ultraviolet radiation and plasma coupling integrated waste gas degrading device Effective date of registration: 20190506 Granted publication date: 20151202 Pledgee: Bank of China Limited by Share Ltd Changzhou Wujin branch Pledgor: CHANGZHOU DAHENG ENVIRONMENTAL TECHNOLOGY CO., LTD. Registration number: 2019320000216 |
|
| PE01 | Entry into force of the registration of the contract for pledge of patent right | ||
| PC01 | Cancellation of the registration of the contract for pledge of patent right |
Date of cancellation: 20200421 Granted publication date: 20151202 Pledgee: Bank of China Limited by Share Ltd Changzhou Wujin branch Pledgor: CHANGZHOU DAHENG ENVIRONMENTAL TECHNOLOGY Co.,Ltd. Registration number: 2019320000216 |
|
| PC01 | Cancellation of the registration of the contract for pledge of patent right | ||
| PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: Quasi-molecular ultraviolet radiation and plasma coupling integrated waste gas degrading device Effective date of registration: 20200422 Granted publication date: 20151202 Pledgee: Bank of China Limited by Share Ltd Changzhou Wujin branch Pledgor: CHANGZHOU DAHENG ENVIRONMENTAL TECHNOLOGY Co.,Ltd. Registration number: Y2020980001696 |
|
| PE01 | Entry into force of the registration of the contract for pledge of patent right | ||
| PC01 | Cancellation of the registration of the contract for pledge of patent right |
Date of cancellation: 20210629 Granted publication date: 20151202 Pledgee: Bank of China Limited by Share Ltd. Changzhou Wujin branch Pledgor: CHANGZHOU DAHENG ENVIRONMENTAL TECHNOLOGY Co.,Ltd. Registration number: Y2020980001696 |
|
| PC01 | Cancellation of the registration of the contract for pledge of patent right | ||
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20220217 Address after: 213000 floor 1, building 12, No. 8, Lanxiang Road, West Taihu science and Technology Industrial Park, Changzhou, Jiangsu Province Patentee after: Sairuiyi (Jiangsu) biological equipment Co.,Ltd. Address before: 213000 Hutang Zhengou South Industrial Concentration Zone, Wujin District, Changzhou City, Jiangsu Province Patentee before: CHANGZHOU DAHENG ENVIRONMENTAL TECHNOLOGY Co.,Ltd. |