CN201033280Y - Device using double plasma to process industrial waste gas - Google Patents
Device using double plasma to process industrial waste gas Download PDFInfo
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- CN201033280Y CN201033280Y CNU2006200430250U CN200620043025U CN201033280Y CN 201033280 Y CN201033280 Y CN 201033280Y CN U2006200430250 U CNU2006200430250 U CN U2006200430250U CN 200620043025 U CN200620043025 U CN 200620043025U CN 201033280 Y CN201033280 Y CN 201033280Y
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Abstract
The utility model relates to a double-plasma treating device of industrial emissions, which belongs to the technical field of emission disposal, and comprises an outer layer medium, a middle layer medium, an inner layer medium, an outer electrode, an inner electrode, and a high voltage supply and a strutting piece; wherein, the outer layer medium, the middle layer medium and the inner layer medium are made of different quartz tubes with the same diameter; thereby, an atmospheric pressure gas discharge area is formed between the outer layer medium and the middle layer medium; a low pressure gas ultraviolet radiation area is formed between the intermediate medium layer and the inner medium layer; an inner electrode is arranged in the inner layer medium, and the outer electrode is wound outside the outer layer medium. The strutting piece is supported between the outer layer medium and the middle layer medium. Compared with the atmospheric pressure gas medium barrier discharge system, the double-plasma reaction system of the utility model can achieve a voltage drop of 3000 V of the external applied voltage and an increase in energy utilization ratio by 30 percent. The utility model has the advantages of compact structure, high energy efficiency, fine effective treatment, and is therefore applicable to the decontamination processing of a plurality of industrial emissions.
Description
Technical field
The utility model belongs to technical field of waste gas treatment, is specifically related to a kind of device of plasma industrial waste gas treatment.
Background technology
In the industrial waste gas processing method, lower temperature plasma technology is compared with other pollution control technology, has characteristics such as handling process is short, floor space is little, vapour lock is little, applied widely.The principle that lower temperature plasma technology is handled pollutant is: under the effect of extra electric field, the energy electronics is taken in the gas discharge generation in a large number, and (the electronics average energy is 1～10eV), ionization takes place, dissociates or excites in the odorant in the waste gas under the bombardment of high energy electron, and at O
2Participate in a series of complexity take place down in reaction physics, chemical reaction, finally make the pollutant decomposition in the waste gas reach the purification purpose.
Plasma is the 4th attitude that is called as material after solid-state, liquid, gaseous state, it be gas in discharge process, produce comprise a kind of quasi-neutrality gas that shows collective behavior that a large amount of positive and negative charged particles, electronics and neutral particle and free radical are formed.If the temperature difference of the temperature of electronics and heavy particle is few in this individual system, is high-temperature plasma then, or is called the equilibrium state plasma.If the temperature of electronics is far longer than the temperature of heavy particle, whole system presents a kind of normal temperature state, and the plasma that produce this moment is a low temperature plasma, also is non-equilibrium plasma, and the plasma that general gas discharge produces belongs to this type.Mode according to gas discharge, the generation of plasma mainly contains glow discharge (Glowdischarge), corona discharge (Corona discharge), dielectric barrier discharge (Dielectric barrier discharge is called for short DBD), radio frequency discharge (Radio frequency discharge) and microwave discharge (Microwave discharge) etc.Wherein dielectric barrier discharge has the advantages that electron density is high and can move under normal pressure, thereby makes it have prospects for commercial application, is specially adapted to the improvement of industrial waste gas.See the early stage patent of applicant: dielectric barrier discharge produces the plasma industrial waste gas treatment method and apparatus (patent No.: ZL97242751.1).
Although it is obvious that dielectric barrier discharge plasma is handled industrial waste gas (comprising foul gas) effect, technology is succinct, advantage is remarkable, but in order to reach the treatment effect of expection, therefore often need higher applied voltage (generally being greater than 9000V), to the having relatively high expectations of electric equipment, equipment investment is big, energy consumption is also higher, thereby its popularization and use are restricted.
Summary of the invention
The purpose of this utility model is to propose the device that a kind of equipment requirement is low, energy consumes little plasma industrial waste gas treatment.
The device of the plasma industrial waste gas treatment that the utility model proposes, it is the improvement of existing dielectric barrier discharge plasma being handled the industrial waste gas method, change three layers of quartz medium layer into by original double-deck quartz medium, three floor quartz medium are cut apart formed two region of discharges: atmosphere gas region of discharge and low pressure gaseous discharge district, the low pressure gaseous discharge nip produces the ultraviolet good fortune and penetrates; Industrial waste gas enters system by the atmosphere gas region of discharge, through the low-pressure gas ultraviolet radiation zone, realizes the efficient effect of removing pollutant, Purge gas.Like this, make reactor under the situation that is equipped with a power supply, realize two kinds of process gas discharges, promptly under normal pressure, the process gas discharge, realize that also low pressure gaseous discharge produces the ultra-violet radiation process.Because this system has increased plasma ultra-violet radiation process under the low pressure than simple dielectric barrier discharge plasma technique, so be referred to as the method that " double plasma " handles industrial waste gas.
Low pressure gaseous discharge ultra-violet radiation principle is: fill low-pressure gas and be generally rare gas and halogenic molecule in the airtight toroidal cavity of ultraviolet radiation zone, in the dielectric barrier discharge process these gas molecules be excited, ionization, and through series reaction formation quasi-molecule, the quasi-molecule instability produces ultra-violet radiation in its decomposition or de excitation process.Main course of reaction is as follows:
1. ionization and exciting
At first be that the low-pressure gas molecule is excited and ionization under the effect of high energy electron:
R+e→R
*+e
R+e→R
++2e
X
2+e→X+X
-
R represents that (as Ar, Kr), X represents halogen particle (as C1, Br or I) to the rare gas particle.
2. the generation of quasi-molecule
Electropositive noble gas ion and electronegative halide ion rare gas particle compound or excitation state passes to halogenic molecule to energy and forms the RgX of excitation state
*The quasi-molecule compound:
R
++X
-→RX
*+e
R
*+X
2→RX
*+X
3. radiation
Quasi-molecule of Xing Chenging or quasi-molecule compound instability are understood rapidly and are decomposed like this, and discharge excitation energy with the form of photon:
RX
*→R+X+hυ
Suitably the pressure and the composition of control low-pressure gas can obtain our needed ultra-violet radiation type low-pressure gas.The photon energy that ultraviolet radiation zone produces generally is controlled between 4～8eV, and contaminant molecule issues biochemical bond fission in the effect of these photons, and causes a series of oxidation reactions, thereby reaches the purpose of waste gas purification.In the double plasma reactor, owing to have gas discharge and ultra-violet radiation synergy decomposing pollutant, thereby improved the clearance of pollutant.
The utility model corresponding to the apparatus structure of the treating industrial waste gas through dual plasma of said method as shown in Figure 1.This device is that the double plasma reactor is made up of outer media 1, intermediate layer medium 2, internal layer medium 3, external electrode 4, interior electrode 5, high voltage source and support member 8; Wherein, outer media 1, intermediate layer medium 2 and internal layer medium 3 adopt the different quartz ampoule of diameter respectively, make 2 in outer media 1 and intermediate layer medium form the atmosphere gas region of discharge, form the low-pressure gas ultraviolet radiation zone between middle dielectric layer 2 and the internal layer medium 3; Interior electrode 5 places internal layer medium 3, and external electrode 4 is wound in outer media 1 outside; Support member 8 is supported between outer media 1 and the intermediate layer medium 2.Pending industrial waste gas enters reaction system by the atmosphere gas region of discharge.The direction of arrow among Fig. 1 and Fig. 3 is represented air inlet and outgassing direction respectively.
This double plasma reaction system is compared with simple dielectric barrier discharge plasma, and capacity usage ratio improves 30%, and applied voltage reduces (as long as generally 600-7000) about 3000V, and the pipeline gas flow velocity is generally 2-4m/s.Under the identical situation of input energy, the removal efficient of odorant improves more than 30%.
Treating industrial waste gas through dual plasma, the pollutant treatment effect is good, and the efficiency height can be widely used in containing the waste gas pollution control and treatment of materials such as triphen (benzene,toluene,xylene), hydrogen sulfide, carbon disulfide, and its promotion and application have a extensive future.
Description of drawings
Fig. 1 is a double plasma structure of reactor diagram of the present utility model.
Fig. 2 is the cross-sectional diagram of Fig. 1 reactor.
Fig. 3 is the vertical profile diagram of Fig. 1 reactor.
Fig. 4 is the supporting piece structure diagram.
Fig. 5 is the industrial flow diagram.
Number in the figure: 1 is outer media, and 2 is the intermediate layer medium, and 3 is the internal layer medium, 4 is external electrode, and 5 is interior electrode, and 6 is the atmosphere gas region of discharge, 7 is the low-pressure gas ultraviolet radiation zone, and 8 is support member, and 9 is feet, 10 is hollow ring, 11 is power supply, and 12 is ultra-violet radiation, and 13 is flowmeter, 14 is two plasma reactors, and 15 is air-introduced machine.
The specific embodiment
Further describe the utility model below by embodiment and accompanying drawing.
Outer media 1 adopts the quartz ampoule of internal diameter 33mm, wall thickness 1.5mm, pipe range 200mm.Intermediate layer medium 2 adopts the quartz ampoule of internal diameter 20mm, pipe range 200mm, wall thickness 1.5mm; Internal layer medium 3 adopts the quartz ampoule of external diameter 10mm, pipe range 200mm, wall thickness 1.0mm.
(thickness δ=0.4mm), be wound in outer quartzy tube wall (6 circle) and form, the distance between circle and the circle is 4mm to the elongated stainless steel substrates of external electrode 4 employing length * wide=670mm * 4mm.(thickness δ=0.2mm) rolls and forms interior electrode 5 usefulness length * wide=200mm * 40mm stainless steel substrates, and liner is at the inner tubal wall of internal layer quartz ampoule 3.
As shown in Figure 2, the zone between the quartz ampoule in skin and intermediate layer is atmosphere gas region of discharge (I district), and this district is long 200mm, the open toroidal cavity of ring width 5mm, and pending industrial waste gas promptly passes through from this.The quartz ampoule two ends in internal layer and intermediate layer bond together respectively, form a long 200mm, fill low-pressure gas in the airtight toroidal cavity of ring width 5mm, cavity, and this toroidal cavity is the zone (II district) that produces the low-pressure gas ultra-violet radiation.
Support member 8 between the quartz ampoule in outer quartz ampoule and intermediate layer is a triangular ring, is enclosed within the outer tube wall of intermediate layer quartz ampoule, and material is a poly fourfluoroplastics.Supporting piece structure as shown in Figure 4.Hollow ring 10 internal diameter 23mm, external diameter 26mm, three leg 9 length * wide=3.5mm * 2mm, annulus and leg thickness are 3mm.
The high voltage source self-control, output voltage 1500～12000V.
The pressure of blanketing gas is the important parameter that influences the ultra-violet radiation performance, to the ultra-violet radiation Energy distribution, and output characteristics, the shape and the relative intensity of ultra-violet radiation spectrum have considerable influence.According to the composition difference in the waste gas, in airtight annular housing, fill the low-pressure gas of suitable pressure and component, it is given off the most effective ultraviolet light of specific wavelength of the decomposition of pollutant in the waste gas, and the electronics synergy that produces with dielectric barrier discharge, thereby reach best pollutants removal rate.
The utility model respectively as handling object, determines that the blanketing gas component and the pressure that are adopted are shown in Table 1 at carbon disulfide, hydrogen sulfide, three benzene gas (benzene,toluene,xylene), dimethyl disulfide, ammonia and five kinds of materials of styrene.
Pairing ultra-violet radiation type of the different odorants of table 1 and correlated condition
| Odorant | Institute's blanketing gas component in the interior dielectric-sleeve | Institute's blanketing gas pressure in the interior dielectric-sleeve | Ultraviolet radiation wave-lengths | The dielectric barrier discharge applied voltage |
| Carbon disulfide CS 2 | Krypton and iodine vapor | Krypton: 200～350torr iodine vapor: 2～3.5torr | Mainly: 183nm is a small amount of: 191,206, and 342nm | 6000～7500V |
| Hydrogen sulfide H 2S | Krypton and bromine vapor | Krypton: 1～10torr bromine vapor: 0.5～1torr | Mainly: 207nm is a small amount of: 222, and 228nm | 6000～7500V |
| Benzene,toluene,xylene | Argon and bromine vapor | Krypton: 1～5torr bromine vapor: 0.5～1torr | Mainly: 165,172,183nm | 6000～7500V |
| Ammonia NH 3 | Argon and chlorine | Argon: 200～300torr chlorine: 0.5～1torr | Mainly: 175nm is a small amount of: 195, and 245nm | 5000～6000V |
| Styrene C 6H 5CH＝CH 2 | Krypton and iodine | Krypton: 200～300torr iodine: 3～4torr | Mainly: 206,183,187nm is a small amount of: 253.7nm | 5000～6000V |
| Dimethyl disulfide CH 3SSCH 3 | Krypton and chlorine | Krypton: 200～300torr chlorine: 0.8～2torr | Mainly: 222nm is a small amount of: 240,200, and 325nm | 6000～7500V |
(annotate: 1torr=133.33Pa)
The carbon disulfide of selecting one of country's " odorant pollutant discharge standard " representative odorant in (GB14554-93) for use illustrates the treatment effect of double plasma technology as handling object.
The technical process of implementing as shown in Figure 5.
Flowmeter 13: spinner flowmeter, flow＜100m
3/ h is adjustable.
Double plasma reactor 14:10, the specifications parameter face that sees before is described, disposal ability 50m
3/ h.
Air-introduced machine 15:CZR type centrifugal induced draught fan, last Haixing County benefit blower fan factory, power 40W, air quantity 1.07m
3/ min.
The sampling of carbon disulfide and assay method adopt standard GB/T 14680-93 diethylamine spectrophotometry.
Under the effect of air-introduced machine, concentration is 105mg/m
3CS
2Foul gas quantitatively enters the double plasma reaction unit, behind the high energy electron and ultra-violet radiation effect through the generation of double plasma reactor, in the outlet 1m of reactor place's sampling analysis, for the accuracy that guarantees to sample, the fixed-site of each sampling, and sampling again behind reactor stable operation 30min.
For investigating the effect for the treatment of industrial waste gas through dual plasma, the utility model is in implementation process, adopt simple dielectric barrier discharge plasma device to oppose than test, simple dielectric barrier discharge plasma reactor is except that the quartz medium layer, and the member of reactor and specification are all identical with the double plasma reactor.In simple dielectric barrier discharge reactor, outer quartz medium is the quartz ampoule of internal diameter 33mm, wall thickness 1.5mm, pipe range 200mm; The internal layer quartz medium is the quartz ampoule of internal diameter 20mm, wall thickness 1.5mm, pipe range 200mm.
Treatment effect:
Gas flow rate is 3m/s in pipeline, CS
2Concentration 105mg/m
3, to fill under the condition of 350torr krypton and 3.5torr iodine vapor in the applied voltage 6000V, airtight toroidal cavity, the clearance of carbon disulfide is 73%, has improved 30% than simple dielectric barrier discharge plasma.
Except execute outside the voltage, under the constant situation of other condition, double plasma reactor and simple dielectric barrier discharge plasma reactor reach 70% CS respectively
2During clearance, the latter's applied voltage need reach 9000V, and the former only needs 6000V to get final product, and has reduced 3000V, and therefore, the double plasma reactor is higher than simple dielectric barrier discharge plasma efficiency.
Claims (4)
1. the device of a treating industrial waste gas through dual plasma is characterized in that being made up of outer media (1), intermediate layer medium (2), internal layer medium (3), external electrode (4), interior electrode (5), high voltage source and support member (8); Wherein, outer media (1), intermediate layer medium (2) and internal layer medium (3) adopt the different quartz ampoule of diameter respectively, make to form the atmosphere gas region of discharge between outer media (1) and intermediate layer medium (2), form the low-pressure gas ultraviolet radiation zone between middle dielectric layer (2) and the internal layer dielectric layer (3); Interior electrode (5) places internal layer medium (3), and external electrode (4) is wound in outer media (1) outside; Support member (8) is supported between outer media (1) and the intermediate layer medium (2).
2. device according to claim 1 is characterized in that outer media (1) is the quartz ampoule of internal diameter 33mm, wall thickness 1.5mm, pipe range 200mm; Intermediate layer medium (2) is the quartz ampoule of internal diameter 20mm, pipe range 200mm, wall thickness 1.5mm; Innermost layer medium 3 is the quartz ampoule of external diameter 10mm, pipe range 200mm, wall thickness 1.0mm.
3. device according to claim 2, it is characterized in that external electrode (4) is wound in outer quartzy tube wall by the elongated stainless steel substrates of length * wide * thick=670mm * 4mm * 0.4mm and forms, distance between circle and the circle is 4mm, interior electrode (5) rolls and forms with length * wide * thick=200mm * 40mm * 0.2mm stainless steel substrates, and liner is at internal layer quartz ampoule inner tubal wall.
4. device according to claim 2 is characterized in that support member (8) material between the quartz ampoule in outer and intermediate layer is a poly fourfluoroplastics, is shaped as the annular that has (3) feet.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2006200430250U CN201033280Y (en) | 2006-06-22 | 2006-06-22 | Device using double plasma to process industrial waste gas |
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|---|---|---|---|
| CNU2006200430250U CN201033280Y (en) | 2006-06-22 | 2006-06-22 | Device using double plasma to process industrial waste gas |
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| CN201033280Y true CN201033280Y (en) | 2008-03-12 |
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101462021B (en) * | 2008-11-28 | 2011-12-21 | 江苏大学 | Harmful gas conversion device with low temperature plasma induced by dielectric barrier discharge |
| CN103182245A (en) * | 2013-03-20 | 2013-07-03 | 江苏理工学院 | Device and method for photocatalytic degradation of waste gas by electrodeless excimer lamp |
| CN103331088A (en) * | 2013-06-17 | 2013-10-02 | 浙江瓦克科技有限公司 | Photoelectric composite catalytic gas conversion device |
| CN105080302A (en) * | 2015-08-17 | 2015-11-25 | 杭州科瑞特环境技术有限公司 | Device and method for ultraviolet light-plasma synergetic degradation of organic waste gas |
| CN109761304A (en) * | 2019-03-05 | 2019-05-17 | 成都科衡环保技术有限公司 | Module, reactor and its application occur for the microwave plasma for water process |
| CN110124482A (en) * | 2018-02-09 | 2019-08-16 | 中国石油化工股份有限公司 | The method of reaction of low temperature plasma device and decomposing hydrogen sulfide |
| US20200398245A1 (en) * | 2018-02-09 | 2020-12-24 | China Petroleum & Chemical Corporation | Low temperature plasma reaction device and hydrogen sulfide decomposition method |
-
2006
- 2006-06-22 CN CNU2006200430250U patent/CN201033280Y/en not_active Expired - Lifetime
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101462021B (en) * | 2008-11-28 | 2011-12-21 | 江苏大学 | Harmful gas conversion device with low temperature plasma induced by dielectric barrier discharge |
| CN103182245A (en) * | 2013-03-20 | 2013-07-03 | 江苏理工学院 | Device and method for photocatalytic degradation of waste gas by electrodeless excimer lamp |
| CN103182245B (en) * | 2013-03-20 | 2014-12-10 | 江苏理工学院 | Device and method for photocatalytic degradation of waste gas by electrodeless excimer lamp |
| CN103331088A (en) * | 2013-06-17 | 2013-10-02 | 浙江瓦克科技有限公司 | Photoelectric composite catalytic gas conversion device |
| CN103331088B (en) * | 2013-06-17 | 2015-09-30 | 浙江瓦克科技有限公司 | Electric light composite catalyzing gas conversion plant |
| CN105080302A (en) * | 2015-08-17 | 2015-11-25 | 杭州科瑞特环境技术有限公司 | Device and method for ultraviolet light-plasma synergetic degradation of organic waste gas |
| CN110124482A (en) * | 2018-02-09 | 2019-08-16 | 中国石油化工股份有限公司 | The method of reaction of low temperature plasma device and decomposing hydrogen sulfide |
| US20200398245A1 (en) * | 2018-02-09 | 2020-12-24 | China Petroleum & Chemical Corporation | Low temperature plasma reaction device and hydrogen sulfide decomposition method |
| US11691119B2 (en) * | 2018-02-09 | 2023-07-04 | China Petroleum & Chemical Corporation | Low temperature plasma reaction device and hydrogen sulfide decomposition method |
| CN109761304A (en) * | 2019-03-05 | 2019-05-17 | 成都科衡环保技术有限公司 | Module, reactor and its application occur for the microwave plasma for water process |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| EE01 | Entry into force of recordation of patent licensing contract |
Assignee: Shandong Pallet Environment Protection Engineering Co., Ltd. Assignor: Fudan University Contract record no.: 2011370000095 Denomination of utility model: Device using double plasma to process industrial waste gas Granted publication date: 20080312 License type: Exclusive License Record date: 20110415 |
|
| CX01 | Expiry of patent term |
Granted publication date: 20080312 |
|
| EXPY | Termination of patent right or utility model |