CN202762284U - Low-temperature plasma reaction tube for harmful gas purification - Google Patents

Low-temperature plasma reaction tube for harmful gas purification Download PDF

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Publication number
CN202762284U
CN202762284U CN 201220460220 CN201220460220U CN202762284U CN 202762284 U CN202762284 U CN 202762284U CN 201220460220 CN201220460220 CN 201220460220 CN 201220460220 U CN201220460220 U CN 201220460220U CN 202762284 U CN202762284 U CN 202762284U
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CN
China
Prior art keywords
low
earthenware
temperature plasma
harmful gas
casing
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Expired - Fee Related
Application number
CN 201220460220
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Chinese (zh)
Inventor
陈磊
陈宜华
吴将有
汪光辉
任甲泽
李刚
瞰啸林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Engineering Investigation & Design Institute Of Sinosteel Maanshan Co Ltd
Huawei National Engineering Research Center of High Efficient Cyclic and Utilization of Metallic Mineral Resources Co Ltd
Sinosteel Maanshan General Institute of Mining Research Co Ltd
Original Assignee
Engineering Investigation & Design Institute Of Sinosteel Maanshan Co Ltd
Huawei National Engineering Research Center of High Efficient Cyclic and Utilization of Metallic Mineral Resources Co Ltd
Sinosteel Maanshan General Institute of Mining Research Co Ltd
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Application filed by Engineering Investigation & Design Institute Of Sinosteel Maanshan Co Ltd, Huawei National Engineering Research Center of High Efficient Cyclic and Utilization of Metallic Mineral Resources Co Ltd, Sinosteel Maanshan General Institute of Mining Research Co Ltd filed Critical Engineering Investigation & Design Institute Of Sinosteel Maanshan Co Ltd
Priority to CN 201220460220 priority Critical patent/CN202762284U/en
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Publication of CN202762284U publication Critical patent/CN202762284U/en
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Abstract

The utility model discloses a low-temperature plasma reaction tube for harmful gas purification. The reaction tube comprises a casing (2), an air inlet (1), an air outlet (4) and a packing area (8), wherein the air inlet (1) is arranged at one end of the casing (2); the air outlet (4) is arranged at the other end of the casing (2); the packing area (8) is arranged in the middle of the casing (2); the casing (2) is in a two-layer sleeved pipe structure, the outer layer is a polymethyl methacrylate (PMMA) tube, and the inner layer is a ceramic layer; the packing of the packing area (8) inside the ceramic tube is ceramic Raschig rings after coating treatment by a photocatalyst, and a copper wire gauze (9) is coated on the outer surface of the ceramic tube; and a corona wire (6) penetrates through the center of the ceramic tube, and an earthing pole (3) is connected with the copper wire gauze (9). The reaction tube has the advantages of being high in purification efficiency, low in energy consumption, high in adaptability, free of secondary pollution, convenient to use and maintain and suitable for management of low-concentration harmful gas in production places of industrial enterprises.

Description

The reaction of low temperature plasma pipe that is used for cleaning harmful gas
Technical field
The utility model relates to a kind of purifier of pernicious gas, and specifically it relates to a kind of device of plasma purification pernicious gas, is applicable to low concentration level (≤1000mg/m 3) VOCs, H 2The processing of the pernicious gases such as S.
Background technology
The pernicious gas that produces in the production process of the industries such as petrochemical industry, sewage disposal, garbage disposal, printing and weaving not only pollutes workshop condition, also can cause great injury to post staff healthy.This class pernicious gas mainly comprises the materials such as hydro carbons, alcohols, ketone, aldehydes, ethers, acids, amine and sulfide, except hydrogen sulfide and ammonia, mostly be greatly volatile organic matter (VOCs), wherein, the polycyclic aromatic hydrocarbons such as benzene class and benzopyrenes are strong carcinogens.
The country such as American-European, Japanese, Chinese has formulated such strict gas discharging standard, rational treatment measures have been taked for the high concentration abatement of noxious gases of concentrating discharging, mostly adopt absorption method, firing method or bioanalysis to administer, but the pernicious gas to general Workshop Production post, the characteristics such as concentration is low because it has, the tolerance fluctuation is larger, take said method to administer, have the problems such as cost is high, treatment effeciency is unstable.This pollutant if take direct venting practice, can cause again outdoor environment to affect problem.Therefore, at present, to the improvement of indoor low concentration environmental odors, be still one of hot issue of Air Pollution Control research.
Compare with the multiple purification techniques of studying at present, these two kinds of methods of low temperature plasma method and photocatalytic oxidation all have strong adaptability, and energy consumption is low, clean-up effect is remarkable, the characteristics of non-secondary pollution, in the improvement field of low concentration gas, application prospect is extensive.
Summary of the invention
The purpose of this utility model is exactly the problems referred to above that exist for prior art, and a kind of high efficiency, low energy consumption, non-secondary pollution is provided and can purifies multi-component reaction of low temperature plasma pipe for cleaning harmful gas.
For achieving the above object, the reaction of low temperature plasma pipe that the utility model is used for cleaning harmful gas by the following technical solutions:
The utility model is used for the reaction of low temperature plasma pipe of cleaning harmful gas, comprise housing, air inlet, gas outlet, filler, air inlet is positioned at an end of housing, the gas outlet is positioned at the other end of housing, filler is positioned at the middle part of housing, it is characterized in that: described housing is inside and outside two-layer sleeve structure, and skin is lucite tube, internal layer is earthenware, and lucite tube plays the external support effect; The filler in the inner stuffing district of earthenware makes filling surface adhere to one deck photochemical catalyst for the ceramic raschig rings through the photochemical catalyst coating film treatment, and such as Nano titanium dioxide etc., uniform filling is arranged; The earthenware outer surface is enclosed with copper mesh; Corona wire passes the center of earthenware, and earthing pole connects copper mesh.
For just pernicious gas is evenly by reaction tube, installation is used for the porous plate that air-flow distributes in earthenware.
Under normal pressure, the main discharge mode that produces low temperature plasma is corona discharge and dielectric barrier discharge.Compare with corona discharge, dielectric barrier discharge is more even, stable, and capacity usage ratio is higher, uses more extensive aspect the Purge gas pollutant.
The operation principle that the utility model is used for the reaction of low temperature plasma pipe of cleaning harmful gas is: the corona wire that is connected with high-voltage ac power is as the discharge electrode of gas discharge, in earthenware, carry out dielectric barrier discharge, low temperature plasma by the electrion acquisition, contain O, OH isoreactivity particle that the excitation of a large amount of high energy electrons and high energy electron produces, the pernicious gas pollutant can be oxidized to CO 2, CO, H 2Other harmless object such as O or low poisonous substance.
When photochemical catalyst cooperating with low-temperature plasma treatment pernicious gas is arranged, because the existence of high energy electron and active particle can make catalyst play catalytic effect under lower temperature even normal temperature, greatly reduce catalyst activation temperature.In plasma reactor, introduce catalyst, also can change the discharge condition of plasma, improve oxidation, purification efficient.
In actual use, the low temp plasma purifier of packing into after the parallel connection of one group of reaction of low temperature plasma pipe can be consisted of multitube parallel formula low temp plasma purifier.
The utility model has the following advantages after being used for the reaction of low temperature plasma pipe employing technique scheme of cleaning harmful gas:
(1) effectively combines two kinds of methods of plasma and photocatalysis: when dielectric barrier discharge produces plasma purification pernicious gas pollutant one's share of expenses for a joint undertaking, dielectric space is covered with fine electric pulse and corona light, and this corona light provides light source for photochemical catalytic oxidation.And photocatalytic process oxidized part pollutant has not only changed the discharge condition of low temperature plasma simultaneously, has improved the purification efficiency of pernicious gas.
(2) this reaction tube energy consumption is low, dielectric barrier discharge applied voltage higher (power supply is high-voltage ac power, and response voltage is between 16kV-23kV), but the electric current of dielectric barrier discharge only shows as a large amount of micro discharges that exist in the discharge space, be the conducted state of current filament, discharge power is low.
(3) this reaction tube purifying contaminated thing is thorough, non-secondary pollution.
(4) this reaction tube strong adaptability can purify the pernicious gas that contains various ingredients.
Description of drawings
Fig. 1 is the reaction of low temperature plasma tubular construction schematic diagram that the utility model is used for cleaning harmful gas.
Reference numeral is: the 1-air inlet; The 2-housing; The 3-earthing pole; The 4-gas outlet; The 5-flange; 6
Corona wire; The 7-porous plate; The 8-packing area; 9 copper mesh.
The specific embodiment
For further describing the utility model, below in conjunction with accompanying drawing the reaction of low temperature plasma pipe that the utility model is used for cleaning harmful gas is described in more detail.
The reaction of low temperature plasma tubular construction schematic diagram that is used for cleaning harmful gas by the utility model shown in Figure 1 is found out, it comprises housing 2, air inlet 1, gas outlet 4, packing area 8, air inlet 1 is positioned at an end of housing 2, gas outlet 4 is positioned at the other end of housing 2, packing area 8 is positioned at the middle part of housing 2, described housing 2 is inside and outside two-layer sleeve structure, and skin is lucite tube, and internal layer is earthenware; The filler in the inner stuffing district 8 of earthenware is the ceramic raschig rings through the photochemical catalyst coating film treatment, and the earthenware outer surface is enclosed with copper mesh 9; Corona wire 6 passes the center of earthenware, and earthing pole 3 connects copper mesh 9.In earthenware, install and be used for the porous plate 7 that air-flow distributes.For ease of installing, be provided with flange 5 in the outlet side of housing 2, gas outlet 4 is positioned at the centre of flange 5.

Claims (2)

1. reaction of low temperature plasma pipe that is used for cleaning harmful gas, comprise housing (2), air inlet (1), gas outlet (4), packing area (8), air inlet (1) is positioned at an end of housing (2), gas outlet (4) is positioned at the other end of housing (2), packing area (8) is positioned at the middle part of housing (2), it is characterized in that: described housing (2) is inside and outside two-layer sleeve structure, and skin is lucite tube, and internal layer is earthenware; The filler in the inner stuffing district (8) of earthenware is the ceramic raschig rings through the photochemical catalyst coating film treatment, and the earthenware outer surface is enclosed with copper mesh (9); Corona wire (6) passes the center of earthenware, and earthing pole (3) connects copper mesh (9).
2. the reaction of low temperature plasma pipe for cleaning harmful gas as claimed in claim 1 is characterized in that: the porous plate (7) that is used for the air-flow distribution is installed in earthenware.
CN 201220460220 2012-09-11 2012-09-11 Low-temperature plasma reaction tube for harmful gas purification Expired - Fee Related CN202762284U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN 201220460220 CN202762284U (en) 2012-09-11 2012-09-11 Low-temperature plasma reaction tube for harmful gas purification

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Application Number Priority Date Filing Date Title
CN 201220460220 CN202762284U (en) 2012-09-11 2012-09-11 Low-temperature plasma reaction tube for harmful gas purification

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CN202762284U true CN202762284U (en) 2013-03-06

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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104492249A (en) * 2014-12-29 2015-04-08 中国科学院广州能源研究所 Plasma dry-type flue gas desulfurization method
CN105642108A (en) * 2016-01-06 2016-06-08 中国科学院力学研究所 Method and system for recycling and treating CO in metallurgical industry
CN106268209A (en) * 2016-08-29 2017-01-04 四川环翔科技有限责任公司 Low temperature plasma synchronizes catalysis gas cleaning plant
CN106975329A (en) * 2017-04-13 2017-07-25 上海大学 Vacuum plasma stacked tubular air purifier
CN109718644A (en) * 2019-01-14 2019-05-07 江苏河海新能源股份有限公司 A kind of plasma desulfuration apparatus and method
CN110578149A (en) * 2018-06-10 2019-12-17 江苏君睿智能制造有限公司 Pickling unit before rolling of cold-rolled strip steel
CN111715066A (en) * 2020-05-19 2020-09-29 中国石油天然气股份有限公司 Device and method for degrading toluene through gas discharge photocatalysis in oil field pump room

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104492249A (en) * 2014-12-29 2015-04-08 中国科学院广州能源研究所 Plasma dry-type flue gas desulfurization method
CN104492249B (en) * 2014-12-29 2016-04-20 中国科学院广州能源研究所 A kind of plasma dry fume desulphurization method
CN105642108A (en) * 2016-01-06 2016-06-08 中国科学院力学研究所 Method and system for recycling and treating CO in metallurgical industry
CN106268209A (en) * 2016-08-29 2017-01-04 四川环翔科技有限责任公司 Low temperature plasma synchronizes catalysis gas cleaning plant
CN106975329A (en) * 2017-04-13 2017-07-25 上海大学 Vacuum plasma stacked tubular air purifier
CN106975329B (en) * 2017-04-13 2019-11-15 上海大学 Vacuum plasma stacked tubular air purification device
CN110578149A (en) * 2018-06-10 2019-12-17 江苏君睿智能制造有限公司 Pickling unit before rolling of cold-rolled strip steel
CN109718644A (en) * 2019-01-14 2019-05-07 江苏河海新能源股份有限公司 A kind of plasma desulfuration apparatus and method
CN111715066A (en) * 2020-05-19 2020-09-29 中国石油天然气股份有限公司 Device and method for degrading toluene through gas discharge photocatalysis in oil field pump room

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C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20130306

Termination date: 20160911