CN104007620A - Novel high-speed digital-scanning direct-writing photoetching device - Google Patents
Novel high-speed digital-scanning direct-writing photoetching device Download PDFInfo
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- CN104007620A CN104007620A CN201410190903.0A CN201410190903A CN104007620A CN 104007620 A CN104007620 A CN 104007620A CN 201410190903 A CN201410190903 A CN 201410190903A CN 104007620 A CN104007620 A CN 104007620A
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Abstract
The invention discloses a novel high-speed digital-scanning direct-writing photoetching device. The novel high-speed digital-scanning direct-writing photoetching device comprises a light source, an optical illumination system, a programmable pattern generator, a projection optical system and a high-speed precision moving platform. An exposure light beam is emitted by the light source, goes into the optical illumination system and is aligned to form a parallel uniform area light source, the area light source is projected on the programmable pattern generator, simultaneously, graphic information of the programmable pattern generator is transmitted into the projection optical system with the light, the exposed light goes through the projection optical system and then projection imaging is realized on a base of the high-speed precision moving platform. The novel high-speed digital-scanning direct-writing photoetching device avoids a mask plate or film plate processing process, can improve refreshing frequency of the programmable pattern generator by dozens of times, can improve a product processing rate and can improve a product processing yield. The novel high-speed digital-scanning direct-writing photoetching device realizes simple manufacture and reduces a product production cost.
Description
Technical field
The present invention relates to the applied technical field of lithography of semiconductor machining (comprising that circuit board fabrication PCB, flat-panel monitor FPD, LED, printing CTS and CTcP (CTP), photomask etc. use the manufacture field of semiconducter process), be specifically related to a kind of high-speed figure scanning direct-write light scribing device.
Background technology
Lithographic equipment is by optical system, specifically defined structure graph " quarter " to be scribbled on the substrate of photoactive substance (also can be described as substrate), is used for producing the equipment of circuit pattern, is the equipment of most critical in equipping in the processing such as semiconductor and PCB.Substrate can comprise the substrate such as silicon chip or mask plate, flat-panel screens (such as liquid crystal display) mask plate, printed circuit board (PCB) (PCB), light emitting diode (LED) substrate, biochip, microelectromechanical systems (MEMS), photoelectron circuit chip or photomask board that is used for producing the semiconductor devices.It should be appreciated by those skilled in the art, these only illustrate, and do not comprise all, are also applied in other types substrate well known by persons skilled in the art.
Photoetching technique is optical design processing, Precision Machinery Design processing, and the hard-core technology technology that the field height such as electronics and computer control system are integrated is mainly controlled with area by Europe, the United States, Deng developed country at present.
Direct-write light scribing device is a kind of mask-free photolithography technology of composite type, it is one of technology most crucial in contemporary semiconducter process, be mainly used at present high-end HDI and high yield encapsulation wiring board, PSS substrate, MEMS manufacture and Electronic Packaging and large scale integrated circuit photomask board processing and other fields, process unit and technological process are efficiently provided more economically.
What in the past, mask-free photolithography equipment adopted is the technology that acousto-optic modulator (AOM) and acoustooptic deflector (AOD) are modulated as figure.This technology is to utilize acoustooptic effect to carry out the device of optical modulation, and it has two features: one, and the space distribution of writing information is not fixed, but is moving lentamente with the velocity of sound; Its two, writing information only distributes along the one-dimensional space (being parallel to sound direction of wave travel), the therefore suitable Optical Parallel processing that is used for carrying out one dimension image (or information) of acousto-optic spatial modulator.
At present, up-to-date mask-free photolithography technology is to utilize spatial light modulator (SLM) technology in the world, this technology can be controlled thousands of extremely millions of location of pixels with computer simultaneously, produces the two-dimensional array information of required processing, has the advantage that process velocity is fast, production capacity is high.
The present invention is different from the pattern generator of other SLM utilizations, the pictcure generator using in SLM technology at present adopts M*N dot structure (M > 1 more, N > 1), owing to driving two row or above elementary area simultaneously, the greatly refreshing frequency of limited images generator, there is bottleneck in the production capacity making.The present invention uses a kind of new pattern generator, can promote frequency by decades of times, greatly promotes production capacity.
Summary of the invention
Technical matters to be solved by this invention is: a kind of novel high speed digital scanning direct-write light scribing device that can improve photoetching efficiency is provided.
For addressing the above problem, the technical solution used in the present invention is: a kind of novel high speed digital scanning direct-write light scribing device, include light source, optical lighting system, programmable graphics generator, projection optical system, high speed and precision mobile platform, exposure light sends from light source, after optical lighting system, be projected to programmable pattern generator, graphical information default on generator able to programme is along with exposure light enters projection optical system, finally be projected in the substrate of high speed and precision mobile platform, described light source, described optical lighting system and described pattern generator are coaxial.
Described light source be wavelength at 436nm and following ultraviolet source thereof, be laser, LED, LD or mercury lamp.
Incident light source is collimated into parallel uniform area source by described optical lighting system.
Described programmable graphics generator is reflection, diffraction or transmission device.
Described programmable graphics generator is single column of pixels array, comprises altogether N pixel, and N is not less than 1, and graphic element is N*1 structure.
Each pixel of described generator able to programme is made up of movable part and fixed part two parts.
Described generator able to programme is in the time of off working state, and described movable part and described fixed part are in sustained height; When described generator able to programme is in running order, described movable part and described fixed part are in different height.
Described projection optical system comprises the projection lens being made up of lens or lens combination, and correspondence is located at described programmable graphics generator one side.
The mode of exposure is high-velocity scanning, and the single pass band width that can expose is the exposure band of L, sets single Pixel Dimensions a, projection optical system multiplying power M, and the strip width of exposing L is: L=N*a*M.
The invention has the beneficial effects as follows: can save the manufacturing procedure of mask plate or film version, and the refreshing frequency that lifting that can decades of times can editing graph generator, thereby improve the processing speed of product, improve the yield of product processing.Manufacture craft is simple, has reduced production cost.
Brief description of the drawings
Fig. 1 is structural representation of the present invention.
Fig. 2 is programmable graphics generator off working state schematic diagram (side view).
Fig. 3 is programmable graphics generator working state schematic representation (side view).
Fig. 4 is for directly writing exposure fundamental diagram.
Fig. 5 is another kind of embodiment of the present invention.
In figure: 1, light source, 2, optical lighting system, 3, programmable graphics generator, 4, projection optical system, 5, high speed and precision mobile platform, 21, horizontal direction, 22, vertical direction, 6, substrate, 31, movable part, 32, fixed part, 11, incident light, 12, reflected light, 13 ,+1 order diffraction light, 14 ,-1 order diffraction light, 7.1, first scans band, 7.2, next band, 7.3, band.
Embodiment
Below by specific embodiment, a kind of novel high speed digital scanning direct-write light scribing device of the present invention is described in further detail.
The object of this invention is to provide a kind of high-speed figure scanning direct-write light scribing device, it has overcome the low shortcoming of the original working (machining) efficiency of write-through photoetching technique, integrate the advantage without mask, for the industrial applications of write-through photoetching technique in semiconductor machining (comprising the manufacture field of the use semiconducter process such as PCB, FPD, LED, optical mask plate) provides a kind of method.Its specific implementation method and principle are as described below:
As shown in Figure 1, novel high speed digital scanning direct-write light scribing device, includes light source 1, one for providing the optical lighting system 2 of illumination beam, 5 five subsystem compositions of 4, one high speed and precision mobile platforms of 3, one projection optical systems of a programmable graphics generator.Wherein light source 1, optical lighting system 2 and pattern generator 3 are coaxial, projection optical system 4 can comprise lens or lens combination and and the projection lens of composition, correspondence is located at programmable pattern generator 3 one sides.Light source 1 be wavelength at 436nm and following ultraviolet source thereof, can be laser, LED, LD or mercury lamp.High speed and precision mobile platform 5 can be along horizontal direction 21 and vertical direction 22 high-speed motions in surface level direction.
Reality is directly write in exposure process, and on the one hand, programmable graphics generator 3 receives the data that data sources such as controlling computer or server transmits, and produces in real time the figure that needs exposure.On the other hand, exposure light sends from light source 1, enter optical lighting system 2, produce even straight area source and be projected to pattern generator 3, and now the graphical information on programmable graphics generator 3 follows exposure light to enter projection optical system 4, exposure light through the last projection imaging of projecting light path in the contained substrate 6 of high speed and precision mobile platform 5.This process, high speed and precision mobile platform 5 vertically 22 does uniform speed scanning motion, and this is the most basic scanning photoetching device principle of work of directly writing.
Programmable graphics generator 3 is single column of pixels array, comprises altogether N pixel (N >=1), and graphic element is N*1 structure.Wherein each pixel is made up of movable part 31 and fixed part 32 two parts respectively, and single Pixel Dimensions is a.Fig. 2 demonstration, when pictcure generator is in off working state, movable part 31 and fixed part 32 are in sustained height, and in the time of incident light 11 vertical incidence, light source will all reflect the incident light, and reflected light 12 returns along former direction.In Fig. 3, show, in the time that pictcure generator is in running order, movable part 31 segment distance that will decline along bottom, now in the time of incident light 11 vertical incidence, will produce diffraction phenomena, part light source forms reflected light 12 and returns along former direction, also will produce in addition+1 order diffraction light 13 and-1 order diffraction light 14.Novel high speed digital scanning direct-write light scribing device uses+1 order diffraction light 13 or-1 order diffraction light 14 to produce photoengraving pattern, substitutes the effect of traditional mask.
As shown in Figure 4, novel high speed digital scanning direct-write light scribing device is directly writing in exposure process, on the one hand, programmable graphics generator 3 receives the data that data sources such as controlling computer or server transmits, and produces in real time the figure that needs exposure, on the other hand, exposure light sends from light source 1, through optical lighting system 2, produce uniform area source and be projected to pattern generator 3, in real time the graphical information projection imaging on pattern generator 3 in the contained substrate 6 of high speed and precision mobile platform 5.Wherein device scan direction is vertical direction 22.When first scanning band 7.1 completes exposure, the high speed and precision platform 5 along continuous straight runs 21 displacement L next band 7.2 that exposes, wherein L is single sweep operation strip width, set single Pixel Dimensions a, projection optical system multiplying power M, pictcure generator has N*1 pixel, width exposure band L:
L＝N*a*M
Wherein M > 1 or M < 1 allow.Suppose that it is A that exposure scans the reference position of exposing in the time of band 7.3, through scanning position B after t after a while, the distance between desired location A and position B is s, and exposure sweep velocity is v:
v＝s/t
As shown in Figure 5, this is another kind of usage example of the present invention, include light source 1, one for providing the optical lighting system 2 of illumination beam, a programmable graphics generator 3, five subsystem compositions such as 4, one high speed and precision mobile platforms of a projection optical system, 5 grade, wherein pattern generator 3 is penetrating apparatus.When programmable graphics generator 3 is during in off working state, light beam cannot pass through; In the time that programmable graphics generator 3 is in running order, the light velocity can be crossed generator 3 by figure able to programme and enter projection optical system 4.Finally the graphic projection of needs exposure is imaged on high speed and precision mobile platform 5.Also can according to demand, make a certain region of programmable graphics generator 3 in running order by specific coding or programming, and other region be in off working state, produces different digital mask patterns.
The above embodiments are principle and effect thereof of illustrative the invention only, and the embodiment of part utilization, but not for limiting the present invention; It should be pointed out that for the person of ordinary skill of the art, without departing from the concept of the premise of the invention, can also make some distortion and improvement, these all belong to protection scope of the present invention.
Claims (9)
1. a novel high speed digital scanning direct-write light scribing device, include light source, optical lighting system, programmable graphics generator, projection optical system, high speed and precision mobile platform, exposure light sends from light source, after optical lighting system, be projected to programmable pattern generator, graphical information default on generator able to programme is along with exposure light enters projection optical system, finally be projected in the substrate of high speed and precision mobile platform, it is characterized in that: described light source, described optical lighting system and described pattern generator are coaxial.
2. a kind of novel high speed digital scanning direct-write light scribing device according to claim 1, is characterized in that: described light source be wavelength at 436nm and following ultraviolet source thereof, be laser, LED, LD or mercury lamp.
3. a kind of novel high speed digital scanning direct-write light scribing device according to claim 1, is characterized in that: incident light source is collimated into parallel uniform area source by described optical lighting system.
4. want the novel high speed digital scanning direct-write light scribing device as described in 1 as right, it is characterized in that: described programmable graphics generator is reflection, diffraction or transmission device.
5. want the novel high speed digital scanning direct-write light scribing device as described in 4 as right, it is characterized in that: described programmable graphics generator is single column of pixels array, comprise altogether N pixel, N is not less than 1, and graphic element is N*1 structure.
6. want the novel high speed digital scanning direct-write light scribing device as described in 5 as right, it is characterized in that: each pixel of described generator able to programme is made up of movable part and fixed part two parts.
7. want the novel high speed digital scanning direct-write light scribing device as described in 6 as right, it is characterized in that: described generator able to programme is in the time of off working state, and described movable part and described fixed part are in sustained height; When described generator able to programme is in running order, described movable part and described fixed part are in different height.
8. want the novel high speed digital scanning direct-write light scribing device as described in 1 as right, it is characterized in that: described projection optical system comprises the projection lens being made up of lens or lens combination, correspondence is located at described programmable graphics generator one side.
9. as right is wanted the novel high speed digital scanning direct-write light scribing device as described in 1, it is characterized in that: the mode of exposure is high-velocity scanning, the single pass band width that can expose is the exposure band of L, set single Pixel Dimensions a, projection optical system multiplying power M, the strip width of exposing L is: L=N*a*M.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410190903.0A CN104007620B (en) | 2014-02-18 | 2014-05-08 | A kind of novel high speed digital scanning direct-write light scribing device |
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
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| CN201420068700.X | 2014-02-18 | ||
| CN201420068700X | 2014-02-18 | ||
| CN201420068700 | 2014-02-18 | ||
| CN201410190903.0A CN104007620B (en) | 2014-02-18 | 2014-05-08 | A kind of novel high speed digital scanning direct-write light scribing device |
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| CN104007620A true CN104007620A (en) | 2014-08-27 |
| CN104007620B CN104007620B (en) | 2016-04-06 |
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| CN201420232691.3U Expired - Fee Related CN203825365U (en) | 2014-02-18 | 2014-05-08 | Novel high-speed digital scanning direct-writing lithographic device |
| CN201410190903.0A Active CN104007620B (en) | 2014-02-18 | 2014-05-08 | A kind of novel high speed digital scanning direct-write light scribing device |
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| CN201420232691.3U Expired - Fee Related CN203825365U (en) | 2014-02-18 | 2014-05-08 | Novel high-speed digital scanning direct-writing lithographic device |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106403903A (en) * | 2016-08-30 | 2017-02-15 | 浙江启昊科技有限公司 | Laser digital high-precision imaging device |
| CN111226171A (en) * | 2017-11-02 | 2020-06-02 | 捷普有限公司 | Digital mask system, pattern imaging apparatus and digital mask method |
| CN113589658A (en) * | 2021-07-30 | 2021-11-02 | 深圳市鹏基光电有限公司 | Exposure process based on LCD technology and UV photoetching machine |
| WO2022166319A1 (en) * | 2021-02-02 | 2022-08-11 | 北京梦之墨科技有限公司 | Light processing device |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN203825365U (en) * | 2014-02-18 | 2014-09-10 | 苏州微影光电科技有限公司 | Novel high-speed digital scanning direct-writing lithographic device |
| CN110187607A (en) * | 2019-05-08 | 2019-08-30 | 苏州源卓光电科技有限公司 | A kind of direct-write photoetching mechanism and its exposure method |
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| CN203825365U (en) * | 2014-02-18 | 2014-09-10 | 苏州微影光电科技有限公司 | Novel high-speed digital scanning direct-writing lithographic device |
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2014
- 2014-05-08 CN CN201420232691.3U patent/CN203825365U/en not_active Expired - Fee Related
- 2014-05-08 CN CN201410190903.0A patent/CN104007620B/en active Active
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| US5082755A (en) * | 1989-10-02 | 1992-01-21 | General Electric Company | Liquid crystal programmable photoresist exposure method for making a set of masks |
| US20040085436A1 (en) * | 2001-02-22 | 2004-05-06 | Norseld Pty Ltd | Image amplification for laser systems |
| US20060072091A1 (en) * | 2004-10-01 | 2006-04-06 | Seima Kato | Exposure apparatus |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106403903A (en) * | 2016-08-30 | 2017-02-15 | 浙江启昊科技有限公司 | Laser digital high-precision imaging device |
| CN111226171A (en) * | 2017-11-02 | 2020-06-02 | 捷普有限公司 | Digital mask system, pattern imaging apparatus and digital mask method |
| WO2022166319A1 (en) * | 2021-02-02 | 2022-08-11 | 北京梦之墨科技有限公司 | Light processing device |
| CN113589658A (en) * | 2021-07-30 | 2021-11-02 | 深圳市鹏基光电有限公司 | Exposure process based on LCD technology and UV photoetching machine |
Also Published As
| Publication number | Publication date |
|---|---|
| CN203825365U (en) | 2014-09-10 |
| CN104007620B (en) | 2016-04-06 |
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Effective date of registration: 20160526 Address after: 518000 Guangdong, Shenzhen, Xixiang Xingye Road, No. 3012 veterans building, west block, floor, building, No. two, No. Patentee after: CAIZ OPTRONICS CORP. Address before: 215636 Zhangjiagang City, Jiangsu Province, the new town of the sea dam road, Suzhou, micro shadow Photoelectric Technology Co., Ltd. Patentee before: Advaced Microlitho Instrument, Inc. |
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Effective date of registration: 20200201 Address after: No.85, Torch Road, high tech Zone, Suzhou, Jiangsu Patentee after: Suzhou lithography Laser Technology Co., Ltd. Address before: 518000, Shenzhen, Guangdong, Baoan District province Xixiang Industrial Road, No. 3012, West building, veterans building, two floor Patentee before: CAIZ OPTRONICS CORP. |