CN103955121A - Developing solution for color filter - Google Patents
Developing solution for color filter Download PDFInfo
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- CN103955121A CN103955121A CN201410186959.9A CN201410186959A CN103955121A CN 103955121 A CN103955121 A CN 103955121A CN 201410186959 A CN201410186959 A CN 201410186959A CN 103955121 A CN103955121 A CN 103955121A
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- developer solution
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- aliphatic group
- polyether compound
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Abstract
The invention discloses a developing solution for a color filter. The developing solution comprises the components including strong base, a nonionic surfactant, a perfluorinated hydrocarbon polyether compound, a complexing agent and purified water, wherein the structural general formula of the perfluorinated hydrocarbon polyether compound is as shown in the specification, R1 represents a hydrogen atom or C1-C18 aliphatic hydrocarbon groups or aryl hydrocarbon groups, R2 represents hydrogen or C1-C4 fatty hydrocarbyl, Rf represents C1-C12 fluorinated fatty hydrocarbon groups or fluorinated aryl hydrocarbon groups, and n represents a natural number from 1 to 50. By means of the manner, the developing solution for the color filter has a good development effect on a graph part, the developed graph is integral and is free of residue, the size is accurate, the edge of the graph is clear and trim, and the developing solution has a good function on a non-graph part and generates no distortion.
Description
Technical field
The present invention relates to a kind of developer solution, particularly relate to a kind of developer solution for colored filter.
Background technology
Along with the fast development of display technique, flat-panel monitor makes it to compare and have very significantly advantage with traditional video image display with its diverse displaying principle and manufacturing technology.Flat-panel monitor has the features such as complete complanation, light, thin, power saving, meets the inexorable trend of future image display development.LCD device be with fastest developing speed in numerous flat-panel display devices, technology is the most ripe, application surface the most extensively, industrialization still at a kind of display device of fast development, along with the development of semiconductor technology, people successfully combine semiconductor technology and LCD technology, and liquid crystal display is widely used.
Colored filter is that colour liquid crystal display device (LCD) becomes colored key part and component from GTG, backlight module by LCD inside provides light source, the drive IC of arranging in pairs or groups again and liquid crystal control form GTG and show, light source is formed to colored display frame through the photoresistance color layer of colored filter.The structure of colored filter comprises glass substrate, black matrix", color layer, diaphragm and ITO conducting film; this photoelectric subassembly is the light shield layer-black-matrix layer of making antireflection on transparent glass substrate; the color filter layers of making successively again the Red Green Blue with light transmission, being finally covered with transparent ITO conducting film by sputtering technology becomes colored filter.
The conventional process of colored filter mainly contains decoration method (Dyeing Method), Pigments method (Pigment Dispersed Method), electrodeposition process (Electro Deposition Method), print process (Printing Method), and wherein Pigments method progressively develops into mainstream technology.The color layer of Pigments method forms similar semi-conductive lithographic process, first pigment-dispersing type chromatic photoresist is coated on the glass substrate that forms black matrix", peeled off (Stripping), hard roasting (Post-bake) and repeat this flow process the trichromatic diagram shape (Pattern) that forms R, G, B for three times through soft roasting (Pre-bake), exposure aligning (Aligned), development (Developed), photoresistance.
In colored filter, the acquisition of fine pattern, generally realizes by photoetching technique.Photoetching technique comprises the technique such as exposure, development of photoresist.Because photoresist solubility property in developer solution before and after exposure has difference, after therefore exposing, the exposure region of photoresist depends on the different of solubility property from unexposed area, is divided into solvable district and insoluble district.Solvable district is dissolved in photoresist developing liquid, and insoluble district stays.Be that photoresist can, according to the figure of exposure, optionally be dissolved in photoresist developing liquid, thereby form the figure needing.And in order to obtain good pattern, need to carry out high-precision development to photoresist, therefore the developability of photoresist developing liquid is proposed to higher requirement.
Under normal circumstances, photoresist is hydrophobicity, solvable district due to photoresist after exposure is surrounded by insoluble district, developer solution is difficult to fully touch solvable district, especially both marginal portions, cause the solubility photoresist dissolving of pattern edge insufficient, it is poor that pattern edge part is developed, and the developability of developer solution is reduced.In prior art, in order to improve the dissolubility of developer solution to the solvable district of photoresist, to improve the developability of developer solution, conventionally in developer solution, add surfactant, add surfactant and can improve the wetting state of developer solution to photoresist, make the solvable district of photoresist after exposing there is good dissolubility.But after interpolation surfactant, the dissolubility in the insoluble district of developer solution to photoresist is also corresponding improve usually, thereby cause the surface in the soluble district of photoresist and edge to be also easily dissolved by the developing, cause litho pattern distortion, thereby affect effective raising of developing liquid developing.
Summary of the invention
The technical matters that the present invention mainly solves is to provide a kind of developer solution for colored filter, has good development effect.
For solving the problems of the technologies described above, the technical scheme that the present invention adopts is: a kind of developer solution for colored filter is provided, the component of described developer solution includes highly basic, non-ionic surfactant, perfluoro hydrocarbyl polyether compound, complexing agent and pure water, and the general structure of described perfluoro hydrocarbyl polyether compound is:
, wherein R
1represent aliphatic group or the aryl radical of hydrogen atom or C1-C18, R
2represent the aliphatic group of hydrogen or C1-C4, R
fthe fluoro aliphatic group or the fluoro aromatic hydrocarbon base that represent C1-C12, n represents the natural number of 1-50.
In a preferred embodiment of the present invention, described R
1represent aliphatic group or the aryl radical of hydrogen atom or C1-C15, described R
2represent hydrogen or methyl, described R
fthe fluoro aliphatic group or the fluoro aromatic hydrocarbon base that represent C1-C9, described n represents the natural number of 5-40.
In a preferred embodiment of the present invention, described n is expressed as the natural number of 10-30.
In a preferred embodiment of the present invention, the component of described developer solution is: by percentage to the quality, and highly basic 1-6%, non-ionic surfactant 0.2-10%, perfluoro hydrocarbyl polyether compound 0.1-3%, complexing agent 0.05-1%, pure water surplus.
In a preferred embodiment of the present invention, the component of described developer solution is: by percentage to the quality, and highly basic 3-6%, non-ionic surfactant 2-8%, perfluoro hydrocarbyl polyether compound 0.3-1.6%, complexing agent 0.1-0.5%, pure water surplus.
In a preferred embodiment of the present invention, described highly basic is one or more in alkali metal hydroxide, alkaline earth metal hydroxide, alkali carbonate, alkali silicate, alkali metal phosphate, quaternary ammonium base.
In a preferred embodiment of the present invention, described non-ionic surfactant is one or more in polyether surfactant, EPE polyol EPE.
In a preferred embodiment of the present invention, described complexing agent be in organic phosphonate, aminocarboxylic acids, carboxyl carboxylic acids, polyacrylic one or more.
In a preferred embodiment of the present invention, described pure electrical conductivity of water is 2-20 μ S/cm.
The invention has the beneficial effects as follows: the developer solution for colored filter of the present invention; described developer solution has good development effect to visuals; figure after development is complete and without residue; size is accurate; pattern edge is clear neat; non-visuals is had to good protective effect, do not produce distortion.
Embodiment
To the technical scheme in the embodiment of the present invention be clearly and completely described below, obviously, described embodiment is only a part of embodiment of the present invention, instead of whole embodiment.Based on the embodiment in the present invention, those of ordinary skill in the art, not making all other embodiment that obtain under creative work prerequisite, belong to the scope of protection of the invention.
Embodiment mono-:
A kind of developer solution for colored filter is provided, and the component of described developer solution is: by percentage to the quality, and NaOH 4.14%, NP-10 2.26%, Zonyl FSN 100 0.85%, ethylene diamine tetra methylene phosphonic acid sodium 0.25%, RO water 92.5.In toilet, successively NaOH, NP-10, FSN 100, EDTMPS are joined in RO water, mix 0.1 micron of filter membrane pressure filtration of rear use, obtain developer solution 1.
The present invention includes highly basic, non-ionic surfactant, perfluoro hydrocarbyl polyether compound, complexing agent and pure water for the developer solution of colored filter.
The present invention's highly basic used can be inorganic base, and as ammoniacal liquor, alkali metal hydroxide, alkaline earth metal hydroxide, alkali carbonate, alkali silicate, alkali metal phosphate etc., concrete example is including, but not limited to NH
3h
2o, LiOH, NaOH, KOH, Ba(OH)
2, Na
2siO
3, K
2siO
3, Na
2cO
3, K
2cO
3, Na
3pO
4, K
3pO
4deng.Also can be organic base as quaternary ammonium base, concrete example is including, but not limited to Tetramethylammonium hydroxide, tetraethyl ammonium hydroxide etc.Preferred highly basic kind is alkali metal hydroxide and quaternary ammonium base, comprises LiOH, NaOH, KOH, Tetramethylammonium hydroxide, tetraethyl ammonium hydroxide etc.Highly basic shared ratio in developer solution is 1.0-6.0wt%, and preferred ratio is 3.0-6.0wt%.
The present invention's non-ionic surfactant used is polyether-type or EPE polyol EPE, including, but not limited to alcohol ether compound, phenol ether compound, ester ether compound, fatty acid ester compound, polyvalent alcohol compound.Preferred surfactant is AEO, fatty alcohol polyoxypropylene ether, aliphatic alcohol polyethenoxy-polyoxypropylene block compound, APES, alkyl phenol polyethenoxy ether, alkylphenol-polyethenoxy-polyoxypropylene block compound.Surfactant shared ratio in developer solution is 0.2-10.0wt%, and preferred ratio is 2.0-8.0wt%.
The present invention's non-ion fluorin carbon surface active agent used is perfluoro hydrocarbyl polyether compound, Ke Yiyong
general formula represents, wherein R
1represent aliphatic group or the aryl radical of hydrogen atom or C1-C18, be preferably aliphatic group or the aryl radical of hydrogen atom or C1-C15, R
2the aliphatic group that represents hydrogen or C1-C4, is preferably hydrogen or methyl, R
frepresent fluoro aliphatic group or the fluoro aromatic hydrocarbon base of C1-C12, be preferably fluoro aliphatic group or the fluoro aromatic hydrocarbon base of C1-C9, n represents the natural number of 1-50, is preferably the natural number of 5-40, more preferably the natural number of 10-30.Non-ion fluorin carbon surface active agent shared ratio in developer solution is 0.1-3wt%, and preferred ratio is 0.3-1.6wt%.
The present invention's complexing agent used can be organic phosphine acids, aminocarboxylic acids, carboxyl carboxylic acids, polyacrylic etc., preferably has machine phosphonic acid class, and complexing agent shared ratio in developer solution is 0.05-1.0wt%, and preferred ratio is 0.1-0.5wt%.
The present invention's pure water used is the pure water of producing through reverse-permeation process, and conductivity is at 2-20 μ S/cm, and preferred conductivity is 5-15 μ S/cm.
Embodiment bis-:
Change the NaOH in embodiment mono-into KOH, all the other components are constant, operate identically with embodiment mono-, obtain developer solution 2.
Embodiment tri-:
Change the NaOH in embodiment mono-into Tetramethylammonium hydroxide, all the other components are constant, operate identically with embodiment mono-, obtain developer solution 3.
Embodiment tetra-:
Change the NP-10 in embodiment mono-into NP-12, all the other components are constant, operate identically with embodiment mono-, obtain developer solution 4.
Embodiment five:
Change the NP-10 in embodiment mono-into OP-10, all the other components are constant, operate identically with embodiment mono-, obtain developer solution 5.
Embodiment six:
Change the NP-10 in embodiment mono-into OP-13, all the other components are constant, operate identically with embodiment mono-, obtain developer solution 6.
Embodiment seven:
Change the Zonyl FSN 100 in embodiment mono-into Zonyl FSN 300, all the other components are constant, operate identically with embodiment mono-, obtain developer solution 7.
Embodiment eight:
Change the Zonyl FSN 100 in embodiment mono-into Zonyl FSO 100, all the other components are constant, operate identically with embodiment mono-, obtain developer solution 8.
Embodiment nine:
Change the ethylene diamine tetra methylene phosphonic acid sodium in embodiment mono-into diethylene triamine pentamethylene phosphonic sodium, all the other components are constant, operate identically with embodiment mono-, obtain developer solution 9.
Embodiment ten:
Change the ethylene diamine tetra methylene phosphonic acid sodium in embodiment mono-into tetrasodium ethylenediamine tetraacetate, all the other components are constant, operate identically with embodiment mono-, obtain developer solution 10.
Embodiment 11:
Zonyl FSN 100 in embodiment mono-is removed, and all the other components are constant, operate identically with embodiment mono-, obtain developer solution 11.
Embodiment 12:
Ethylene diamine tetra methylene phosphonic acid sodium in embodiment mono-is removed, and all the other components are constant, operate identically with embodiment mono-, obtain developer solution 12.
In above example one to 12, component NP-10, NP-12, OP-10, OP-13 are the polyether nonionic surfactant from Durham company.Zonyl FSN 100, Zonyl FSN 300, Zonyl FSO 100 are the fluorocarbon polyether non-ionic surfactant from E.I.Du Pont Company.
Embodiment 13:
In embodiment mono-to 12 for the evaluation of the developer solution of colored filter:
Negativity light blockage coating, on clean glass sheet, is passed through to mask exposure, exposure energy 200mJ/cm after drying
2, then be immersed in respectively developer solution in embodiment mono-to 12 30 seconds, 25 DEG C of development temperatures, then use pure water drip washing clean, after drying by light microscopy residue, image edge flatness, under evaluation result is shown in.
Negativity light blockage coating, on clean glass sheet, without mask, is carried out to blanket exposure, exposure energy 200mJ/cm after oven dry under uviol lamp
2, then be immersed in respectively developer solution in embodiment mono-to 12 30 seconds, and temperature is similarly 25 DEG C, then uses pure water drip washing clean, and after drying, with colorimetric method for determining alkali resistant membrane left rate, evaluation result sees the following form.
The foregoing is only embodiments of the invention; not thereby limit the scope of the claims of the present invention; every equivalent structure or conversion of equivalent flow process that utilizes description of the present invention to do; or be directly or indirectly used in other relevant technical field, be all in like manner included in scope of patent protection of the present invention.
Claims (9)
1. the developer solution for colored filter, it is characterized in that, the component of described developer solution includes highly basic, non-ionic surfactant, perfluoro hydrocarbyl polyether compound, complexing agent and pure water, and the general structure of described perfluoro hydrocarbyl polyether compound is:
, wherein R
1represent aliphatic group or the aryl radical of hydrogen atom or C1-C18, R
2represent the aliphatic group of hydrogen or C1-C4, R
fthe fluoro aliphatic group or the fluoro aromatic hydrocarbon base that represent C1-C12, n represents the natural number of 1-50.
2. developer solution according to claim 1, is characterized in that, described R
1represent aliphatic group or the aryl radical of hydrogen atom or C1-C15, described R
2represent hydrogen or methyl, described R
fthe fluoro aliphatic group or the fluoro aromatic hydrocarbon base that represent C1-C9, described n represents the natural number of 5-40.
3. developer solution according to claim 2, is characterized in that, described n is expressed as the natural number of 10-30.
4. developer solution according to claim 1, it is characterized in that, the component of described developer solution is: by percentage to the quality, and highly basic 1-6%, non-ionic surfactant 0.2-10%, perfluoro hydrocarbyl polyether compound 0.1-3%, complexing agent 0.05-1%, pure water surplus.
5. developer solution according to claim 4, it is characterized in that, the component of described developer solution is: by percentage to the quality, and highly basic 3-6%, non-ionic surfactant 2-8%, perfluoro hydrocarbyl polyether compound 0.3-1.6%, complexing agent 0.1-0.5%, pure water surplus.
6. developer solution according to claim 1, is characterized in that, described highly basic is one or more in alkali metal hydroxide, alkaline earth metal hydroxide, alkali carbonate, alkali silicate, alkali metal phosphate, quaternary ammonium base.
7. developer solution according to claim 1, is characterized in that, described non-ionic surfactant is one or more in polyether surfactant, EPE polyol EPE.
8. developer solution according to claim 1, is characterized in that, described complexing agent be in organic phosphonate, aminocarboxylic acids, carboxyl carboxylic acids, polyacrylic one or more.
9. developer solution according to claim 1, is characterized in that, described pure electrical conductivity of water is 2-20 μ S/cm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410186959.9A CN103955121A (en) | 2014-05-06 | 2014-05-06 | Developing solution for color filter |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410186959.9A CN103955121A (en) | 2014-05-06 | 2014-05-06 | Developing solution for color filter |
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| CN103955121A true CN103955121A (en) | 2014-07-30 |
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ID=51332407
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|---|---|---|---|
| CN201410186959.9A Pending CN103955121A (en) | 2014-05-06 | 2014-05-06 | Developing solution for color filter |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105093862A (en) * | 2015-09-25 | 2015-11-25 | 富士胶片电子材料（苏州）有限公司 | Surface active agent and developing solution used for color filter negative photoresist |
| CN110476127A (en) * | 2017-04-10 | 2019-11-19 | 荣昌化学制品株式会社 | EUV photonasty photoresist fine pattern formation developer composition |
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| CN101359189A (en) * | 2008-09-17 | 2009-02-04 | 电子科技大学 | Developing solution for positive photosensitive polyimide photoresist |
| CN101364055A (en) * | 2008-09-17 | 2009-02-11 | 电子科技大学 | Neutral developer solution for positive light-sensitive polyimides photo resist |
| CN101813896A (en) * | 2010-04-01 | 2010-08-25 | 江阴市江化微电子材料有限公司 | Developing solution of low-tension positive photoresist |
| CN102036821A (en) * | 2008-05-22 | 2011-04-27 | 伊斯曼柯达公司 | Method of imaging and developing positive-working imageable elements |
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2014
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Patent Citations (5)
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|---|---|---|---|---|
| CN1989459A (en) * | 2004-05-19 | 2007-06-27 | 爱克发-格法特公司 | Method of making a photopolymer printing plate |
| CN102036821A (en) * | 2008-05-22 | 2011-04-27 | 伊斯曼柯达公司 | Method of imaging and developing positive-working imageable elements |
| CN101359189A (en) * | 2008-09-17 | 2009-02-04 | 电子科技大学 | Developing solution for positive photosensitive polyimide photoresist |
| CN101364055A (en) * | 2008-09-17 | 2009-02-11 | 电子科技大学 | Neutral developer solution for positive light-sensitive polyimides photo resist |
| CN101813896A (en) * | 2010-04-01 | 2010-08-25 | 江阴市江化微电子材料有限公司 | Developing solution of low-tension positive photoresist |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105093862A (en) * | 2015-09-25 | 2015-11-25 | 富士胶片电子材料（苏州）有限公司 | Surface active agent and developing solution used for color filter negative photoresist |
| CN110476127A (en) * | 2017-04-10 | 2019-11-19 | 荣昌化学制品株式会社 | EUV photonasty photoresist fine pattern formation developer composition |
| CN110476127B (en) * | 2017-04-10 | 2022-11-01 | 荣昌化学制品株式会社 | Developer composition for forming photosensitive photoresist fine pattern for EUV |
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Application publication date: 20140730 |