CN101493600A - Colourful filtering substrate and method for manufacturing same - Google Patents
Colourful filtering substrate and method for manufacturing same Download PDFInfo
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- CN101493600A CN101493600A CNA2009101111424A CN200910111142A CN101493600A CN 101493600 A CN101493600 A CN 101493600A CN A2009101111424 A CNA2009101111424 A CN A2009101111424A CN 200910111142 A CN200910111142 A CN 200910111142A CN 101493600 A CN101493600 A CN 101493600A
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Abstract
The invention provides a method for preparing a colorful filter substrate, comprising the steps as follows: a substrate is provided; surface hydrophilicity treatment is carried out, hydrophobic reaction is carried out; and the hydrophobic material is removed and the colorful filter pattern is formed. The method has low preparation cost and can prepare the colorful filter substrate which has excellent light penetration rate. The invention also provides a method for preparing a liquid crystal display panel, comprising the steps as follows: a substrate is provided; the hydrophilicity treatment of the surface is carried out; hydrophobic reaction is carried out; the hydrophobic material is removed; the colorful filter substrate is formed; an active component array substrate is provided and subtends to the colorful filter substrate; subsequently, a liquid crystal layer is formed between the active component array substrate and the colorful filter substrate. The invention adopts the preparation method for preparing the colorful filter substrate, has low preparation cost and can prepare the liquid crystal panel with good display quality.
Description
Technical field
The invention belongs to field of photoelectric technology, relate to a kind of colored optical filtering substrates (Color Filter Substrate, CFSubstrate) and display panels (Liquid Crystal Display Panel, LCD Panel) manufacture method, and particularly relevant for a kind of manufacture method of utilizing the colored optical filtering substrates and the display panels of glass baseplate surface modification technology.
Background technology
Development along with photoelectric technology and manufacture of semiconductor, flat-panel screens becomes the main flow of various displays gradually, wherein, high image quality, space utilization efficient are good to have, (Liquid Crystal Display, development LCD) is the most skillful for the LCD of low consumpting power, advantageous characteristic such as radiationless.
LCD normally reaches the effect that colorize shows by colored optical filtering substrates.Generally speaking, colored optical filtering substrates normally by glass substrate, black matrix (Black Matrix, BM), chromatic filter layer (Color Filter Layer), common electrode layer (Common Electrode Layer).
When using micro-photographing process to make colored optical filtering substrates, clean (Cleaning), coating photoresistance (Color FilterSpraying), exposure (Exposures), the processing procedures such as (Developing) that develops via substrate, and then on substrate, form black matrix and chromatic filter layer.
Figure 1A to Fig. 1 G is the manufacturing process diagrammatic cross-section of known colored optical filtering substrates.At first, please refer to Figure 1A, glass substrate 110 is provided.Then, please refer to Figure 1B, on glass substrate 110, form light shield layer 120.Come again, please refer to Fig. 1 C, coating photoresist layer 130 on light shield layer 120.Continue it, please refer to Fig. 1 D, utilize 140 pairs of photoresist layers 130 of a light shield to expose.Coming, please refer to Fig. 1 E, photoresist layer 130 is developed, forming patterning photoresist layer 130a, and is that etch mask carries out etching to light shield layer 120 with this patterning photoresist layer 130a, to obtain black matrix 120a.Continue it, please refer to Fig. 1 F, remove patterning photoresist layer 130a.The employed material of above-mentioned light shield layer 120 mainly can be divided into the chromium metal (Chromium, Cr) or black resin.
Afterwards, please refer to Fig. 1 G, on the glass substrate 110 that shown in Fig. 1 F, has black matrix 120a, continue to make color filter patterns 150R, 150G, 150B, and finish the manufacturing of colored optical filtering substrates 100. Color filter patterns 150R, 150G, 150B can adopt micro-photographing process (Photolithography) to make.Yet this kind method is loaded down with trivial details because of processing procedure, material expensive (especially the cost of light shield is higher), and the availability of chromatic photoresist is low, so can improve manufacturing cost.
Therefore,, promptly there are the many technology that need not use light shield to develop to be developed, make chromatic filter layer as adopting inkjet printing (Ink-jet Printing) processing procedure about the manufacturing of chromatic filter layer.Fig. 2 A to Fig. 2 J is the manufacturing process diagrammatic cross-section that known employing inkjet printing processing procedure is made colored optical filtering substrates.At first, please refer to Fig. 2 A, the glass substrate 110 that disposes black matrix 120a is provided, wherein, black matrix 120a defines a plurality of first time of picture element zone 110a, a plurality of regional 110b of the picture element second time and a plurality of picture element for the third time zone 110c.Come, please refer to Fig. 2 B, picture element zone 110a applies first dyestuff 210 in the first time.Then, please utilize a heating processing H to heat first dyestuff 210 and desolvate (not illustrating), so that 210 sclerosis of first dyestuff form the first color lump 210a simultaneously with reference to Fig. 2 C and Fig. 2 D to remove.Come, please refer to Fig. 2 E, picture element zone 110b applies second dyestuff 220 in the second time.Then, please utilize a heating processing H to heat second dyestuff 220 and desolvate, so that 220 sclerosis of second dyestuff form the second color lump 220a simultaneously with reference to Fig. 2 F and Fig. 2 G to remove.Then, please refer to Fig. 2 H, 110c applies the 3rd dyestuff 230 in the zone of picture element for the third time.Continue it, please utilize a heating processing H to heat the 3rd dyestuff 230 and desolvate, so that 230 sclerosis of the 3rd dyestuff form the 3rd color lump 230a simultaneously with reference to Fig. 2 I and Fig. 2 J to remove.So far, just finish the manufacturing of colored optical filtering substrates 100a.
Though the method for utilizing the inkjet printing processing procedure to form the above-mentioned first color lump 210a, the second color lump 220a, the 3rd color lump 230a can promote the utilization rate of material, and simplify manufacturing process,, in the process of spray printing, but be easy to generate the problem of dyestuff overflow.
The solution practice commonly used is to increase the height of black matrix 120a, makes the height of deceiving matrix exceed the liquid level of above-mentioned first dyestuff 210, second dyestuff 220 and the 3rd dyestuff 230.Yet, so, when this colored optical filtering substrates 100a group is found into display panels (not illustrating), the first color lump 210a of surface irregularity, the second color lump 220a, the 3rd color lump 230a can cause the liquid crystal arrangement confusion, and can have groove G between black matrix 120a and the first color lump 210a, the second color lump 220a, the 3rd color lump 230a.Because liquid crystal can't be inserted among this groove G, and can form liquid crystal bubbles.Thus, the display quality of display panels can descend.So, quite need a better solution to occur, with the manufacturing cost of reduction colored optical filtering substrates 100,100a, and solve above-mentioned because of the bad problem of the display quality that liquid crystal bubbles caused.
Summary of the invention
Purpose of the present invention provides a kind of manufacture method of colored optical filtering substrates, has low cost of manufacture and can produce the colored optical filtering substrates with good light penetrance.
The objective of the invention is also to provide a kind of manufacture method of display panels, it adopts the manufacture method of above-mentioned colored optical filtering substrates, and has low cost of manufacture and can produce the liquid crystal panel with good display quality.
The present invention proposes a kind of manufacture method of colored optical filtering substrates.At first, provide a substrate, it has a surface.Then, use acid solution that hydrophilic treatment is carried out on the surface.Come, provide hydrophobic material to through on the surface after the hydrophilic treatment, form hydrophobic region with hydrophobic material through the surface of hydrophobic reactant, the surface that contacts with hydrophobic material does not then form hydrophilic region.Then, remove hydrophobic material.Afterwards, provide color inks, the hydrophilic and hydrophobic matter of corresponding color inks is to form color filter patterns in hydrophobic region or hydrophilic region.
The present invention also proposes a kind of manufacture method of display panels.At first, provide a substrate, it has a surface.Then, use acid solution that hydrophilic treatment is carried out on the surface.Come, provide hydrophobic material to through on the surface after the hydrophilic treatment, form hydrophobic region with hydrophobic material through the surface of hydrophobic reactant, the surface that contacts with hydrophobic material does not then form hydrophilic region.Then, remove hydrophobic material.Continue it, color inks is provided, the hydrophilic and hydrophobic matter of corresponding color inks is to form color filter patterns, to obtain colored optical filtering substrates in hydrophobic region or hydrophilic region.Then, provide active assembly array base plate, subtend is in colored optical filtering substrates.Afterwards, between active assembly array base plate and colored optical filtering substrates, form a liquid crystal layer.
In one embodiment of this invention, above-mentioned acid solution is to be selected from hydrofluorite (HCl), nitric acid (HNO
3), sulfuric acid (H
2SO
4) or glacial acetic acid (CH
3COOH) a kind of or its combination in.
In one embodiment of this invention, above-mentioned using before acid solution carries out hydrophilic treatment to the surface, more comprise and use the alkali lye treatment surface.
In one of the present invention embodiment, above-mentioned alkali lye is to be selected from NaOH (NaOH) or potassium hydroxide (KOH) or its combination.
In one embodiment of this invention, the above-mentioned step that removes hydrophobic material comprises: organic solvent removal hydrophobic material is provided, the surface of washed with de-ionized water substrate is provided, and the surface of dry substrate.
In one embodiment of this invention, above-mentioned hydrophobic material is a kind of or its combination that is selected from long alkyl chain Si oxide, aromatic series Si oxide or the epoxy family Si oxide.
In one embodiment of this invention, above-mentioned long alkyl chain Si oxide comprises octyltri-ethoxysilane (octyl-triethoxy-silane) or octyl group trimethoxy silane (octyl-trimethoxy-silane).
In one embodiment of this invention, above-mentioned aromatic series Si oxide comprises (1-naphthyl) triethoxysilane ((1-naphthyl)-triethoxy silane) or triethoxy (2-phenethyl) silane (trimethoxy (2-phenylethyl) silane).
In one embodiment of this invention, above-mentioned epoxy family Si oxide comprises cyclohexene ethyl triethoxysilane (cyclohexenyl-ethyl-triethoxysilane) or cyclohexene ethyl trimethoxy silane (cyclohexyl-ethyl-trimethoxysilane).
In one embodiment of this invention, above-mentioned make hydrophobic material and the step that the surface produces hydrophobic reactant also comprise: the surface of energy to hydrophobic material and substrate is provided.
In one embodiment of this invention, the above-mentioned mode that energy is provided comprise to the surface of substrate heat, irradiating microwaves or irradiating ultraviolet light.
In one embodiment of this invention, above-mentionedly hydrophobic material is provided and provides the method for color inks to comprise ink-jet method.
In one embodiment of this invention, the manufacture method of above-mentioned colored optical filtering substrates more comprises color inks is toasted processing procedure, to form color filter patterns.
In one embodiment of this invention, the manufacture method of above-mentioned colored optical filtering substrates more is included in and forms black matrix on the substrate, separates color filter patterns.
In one embodiment of this invention, the above-mentioned method that forms black matrix on substrate comprises ink-jet method or micro-photographing process.
The present invention is because of using alkali lye, acid solution, hydrophobic material, and can directly form hydrophilic region and hydrophobic region at glass baseplate surface.So follow-up color inks can easily utilize hydrophilic and hydrophobic matter and be formed in hydrophobic region or the hydrophilic region.The manufacture method of this colored optical filtering substrates can directly form color filter patterns on substrate, help promoting the penetrance of light and then promote display quality.
Description of drawings
Figure 1A to Fig. 1 G is the manufacturing process diagrammatic cross-section of the colored optical filtering substrates of prior art.
Fig. 2 A to Fig. 2 J is that prior art adopts the inkjet printing processing procedure to make the manufacturing process diagrammatic cross-section of colored optical filtering substrates.
Fig. 3 A to Fig. 3 I is the manufacture method flow process diagrammatic cross-section of a kind of colored optical filtering substrates of preferred embodiment of the present invention.
Fig. 4 A～Fig. 4 C is for carrying out the microcosmic synoptic diagram of hydrophilic treatment to substrate surface.
Fig. 5 A～Fig. 5 B is for carrying out the microcosmic synoptic diagram of hydrophobic treatments to substrate surface.
Fig. 6 is the local enlarged diagram of Fig. 3 G zone A.
Fig. 7 A to Fig. 7 C is the manufacture method flow process diagrammatic cross-section of a kind of liquid crystal panel of preferred embodiment of the present invention.
Wherein, primary clustering symbol description:
100,100a, 300,410: colored optical filtering substrates
110: glass substrate
110a: picture element zone for the first time
110b: picture element zone for the second time
110c: picture element zone for the third time
120: light shield layer
120a: black matrix
130: photoresist layer
130a: patterning photoresist layer
140: light shield
150R, 150G, 150B: color filter patterns
210: the first dyestuffs
210a: first color lump
220: the second dyestuffs
220a: second color lump
230: the three dyestuffs
230a: the 3rd color lump
310: substrate
310a: the surface of substrate
The 310c:-Si-OH-base
The 310d:-Si-O-Si-bond
The 310e:-Si-O-base
320: alkali lye
The 320a:-OH base
330: acid solution
The 330a:-H base
340: hydrophobic material
340a: hydrophobic structure
350: organic solvent
360: deionized water
370R, 370G, 370B: color inks
380R, 380G, 380B: color filter patterns
390: black matrix
420: active assembly array base plate
430: liquid crystal layer
A: zone
G: groove
H: heating processing
R1: hydrophobic region
R2: hydrophilic region
T: baking processing procedure
θ: contact angle
State feature and advantage on the present invention and can become apparent for allowing, embodiment cited below particularly, and cooperate appended graphic being described in detail below.
Embodiment
The manufacture method of colored optical filtering substrates
Fig. 3 A to Fig. 3 I is the manufacture method flow process diagrammatic cross-section of a kind of colored optical filtering substrates of preferred embodiment of the present invention.Fig. 4 A～Fig. 4 C is for carrying out the microcosmic synoptic diagram of hydrophilic treatment to substrate surface.Fig. 5 A～Fig. 5 B is for carrying out the microcosmic synoptic diagram of hydrophobic treatments to substrate surface.When the manufacture method process flow diagram of the colored optical filtering substrates of reference Fig. 3 A～Fig. 3 J, can cooperate Fig. 4 A～Fig. 4 C and Fig. 5 A～Fig. 5 B in the lump to be expressly understood technical spirit of the present invention place.
At first, please refer to Fig. 3 A, a substrate 310 is provided, it has a surperficial 310a.This substrate 310 can be glass substrate or quartz base plate.It is generally acknowledged that the surface hydrophilicity of glass substrate is quite high, but in fact the surface of glass substrate still has partial drainage.Glass mainly is by silicon dioxide (SiO
2) form, the surface has-functional group of Si-O-Si-and-Si-OH.When the ratio of-Si-OH was high more, the surface hydrophilicity of glass substrate was also good more.Therefore, can by interrupt-mode of Si-O-Si-bond increases-the Si-OH base, or adds charged base (H in the mode of chemical reaction
+) etc. mode increase water wettability.
Then, please can shown in Fig. 3 B, use the surperficial 310a of alkali lye 320 treatment substrates 310 earlier simultaneously with reference to Fig. 3 B, Fig. 3 C and Fig. 4 A～Fig. 4 C, with the surperficial 310a of destruction substrate 310-Si-O-Si bond (being illustrated among Fig. 4 A).Alkali lye 320 can be to be selected from NaOH (NaOH) or potassium hydroxide (KOH) or its combination.Then, please refer to Fig. 3 C, the surperficial 310a that re-uses 330 pairs of substrates 310 of acid solution carries out hydrophilic treatment.Acid solution 330 can be to be selected from hydrofluorite (HCl), nitric acid (HNO
3), sulfuric acid (H
2SO
4) or glacial acetic acid (CH
3COOH) or its combination.Since used earlier alkali lye 320 destroyed substrate 310 surperficial 310a-the Si-O-Si-bond, so when follow-up use acid solution 330 is carried out hydrophilic treatment, can have in more-Si-O-functional group and the acid solution 330-H
+Formation-Si-OH base is with the water wettability on the surface that promotes substrate 310.Certainly, can earlier the surperficial 310a of substrate 310 not carried out the processing (can omit the step of Fig. 3 B) of alkali lye 320 yet.Directly use acid solution 330 also can carry out good hydrophilic treatment.
Please continue with reference to Fig. 4 A～Fig. 4 C, further specify and use alkali lye 320 and acid solution 330 to carry out the ins and outs of hydrophilic treatment.Shown in Fig. 4 A, usually, on the surperficial 310a of substrate 310 that with glass is material, have many-Si-OH-base 310c and-Si-O-Si-base 310d.When adding alkali lye 320, in the alkali lye 320-OH base 320a can interrupt substrate 310 surperficial 310a-Si-O-Si-bond 310d, and form shown in Fig. 4 B-Si-O-base 310e.Referring again to Fig. 4 B, add acid solution 330 this moment again, just in the acid solution 330-H base 330a can with the surperficial 310a of substrate 310-Si-O-base 310e reaction, and then form more water wettability-Si-OH-base 310c, its structure is at last shown in Fig. 4 C.
Continue it, please be simultaneously with reference to Fig. 3 D and Fig. 5 A～Fig. 5 B, provide a hydrophobic material 340 to through on the surperficial 310a after the hydrophilic treatment, with the surperficial 310a formation hydrophobic region R1 of hydrophobic material 340 through hydrophobic reactant, the surperficial 310a that contacts with hydrophobic material 340 does not then form hydrophilic region R2.In preferred embodiment, hydrophobic material 340 is to be selected from long alkyl chain Si oxide, aromatic series Si oxide or epoxy family Si oxide or its combination.Particularly, above-mentioned long alkyl chain Si oxide can comprise: octyltri-ethoxysilane (octyl-triethoxy-silane) or octyl group trimethoxy silane (octyl-trimethoxy-silane); Above-mentioned aromatic series Si oxide can comprise: (1-naphthyl) triethoxysilane ((1-naphthyl)-triethoxy silane) or triethoxy (2-phenethyl) silane (trimethoxy (2-phenylethyl) silane); Above-mentioned epoxy family Si oxide can comprise: cyclohexene ethyl triethoxysilane (cyclohexenyl-ethyl-triethoxysilane) or cyclohexene ethyl trimethoxy silane (cyclohexyl-ethyl-trimethoxysilane).
Please refer to Fig. 5 A～Fig. 5 B, further explain and use hydrophobic material 340 to carry out the ins and outs of hydrophobic treatments, this sentences hydrophobic material 340 and uses octyltri-ethoxysilane to describe as example.Shown in Fig. 5 A, hydrophobic material 340 can with the surperficial 310a of substrate 310-Si-OH base 310c reaction, and then form and shown in Fig. 5 B, have-O-Si-(CH)
nHydrophobic structure 340a.Owing to have the surperficial 310a possess hydrophilic property still then of the substrate 310 of Si-OH base 310c, so just can form hydrophobic region R1 and hydrophilic region R2 respectively.In addition, for fast reaction speed, in the process of hydrophobic material 340 and-Si-OH base 310c reaction, also can provide an energy to the surperficial 310a of substrate 310.This mode that energy is provided for example be heat, irradiating microwaves or irradiating ultraviolet light etc., but be not limited thereto.And the method that this hydrophobic material 340 is provided can be an ink-jet method, to form the hydrophobic region R1 (shown in Fig. 3 D) of matrixing.
Then, please remove hydrophobic material 340 simultaneously with reference to Fig. 3 E and Fig. 3 F.The step that removes hydrophobic material 340 for example is: provide an organic solvent 350 to remove hydrophobic material 340 earlier.Then, shown in Fig. 3 F, provide a deionized water 360, the surperficial 310a of cleaning base plate 310.Afterwards, the surperficial 310a of dry substrate 310 for example is the surperficial 310a that dries up substrate 310 with air blade device (not illustrating) again.Cause this, just finish invisible hydrophobic region R1 of eyes and hydrophilic region R2.
Come again, please refer to Fig. 3 G, color inks 370R, 370G, 370B are provided, and the hydrophilic and hydrophobic matter of corresponding color inks 370R, 370G, 370B is to form color filter patterns 380R, 380G, 380B (being illustrated among Fig. 3 H) in hydrophobic region R1 or hydrophilic region R2.Fig. 3 G has hydrophobicity with color inks 370R, 370G, 370B, is formed among the hydrophobic region R1 to describe for example.Certainly, but also possess hydrophilic property of color inks 370R, 370G, 370B is formed among the hydrophilic region R1 and (does not illustrate).In addition, providing the method for color inks 370R, 370G, 370B can be ink-jet method.
Fig. 6 is the local enlarged diagram of Fig. 3 G zone A.Please refer to Fig. 6, when having hydrophobic color inks 370G when splashing into hydrophobic region R1, color inks 370G can be rapidly in the surperficial 310a diffusion of substrate 310.In case when color inks 370G diffusion reaches hydrophilic region R2, having hydrophobic color inks 370G then can be because of different with the surface tension of hydrophilic region R2, cause the cohesion effect of color inks 370G and form a contact angle θ, so the ink overflow phenomena can not take place.The size of this contact angle θ and the thickness of color inks 370G can be subjected to every surface tension and gravity effect.The surface tension of color inks 370G also can change by interpolation, change concentration or the temperature of some adjuvants.For example can add solvent (as benzene, toluene, chlorotoluene etc.) in color inks 370G or interfacial agent (fatty acid, sodium thiosulfate etc.) reduces surface tension, the macromolecule that adds high molecular then can improve surface tension.
Then, please continue, also can toast processing procedure T, to form color filter patterns 380R, 380G, the 380B shown in Fig. 3 H color inks 370R, 370G, 370B with reference to 3H.
In addition, referring again to Fig. 3 I, can also on substrate 310, form black matrix 390, to separate color filter patterns 380R, 380G, 380B.The method that forms black matrix 390 on substrate 310 can be ink-jet method or micro-photographing process.Cause this, just finished the making of colored optical filtering substrates 300.And not have section poor because black matrix 390 and color filter patterns 380R, 380G, 380B can be made as, so, can solve the known liquid crystal bubbles problem that produced when liquid crystal panel is assembled of carrying out.
The manufacture method of above-mentioned colored optical filtering substrates 300 is to utilize alkali lye 320, acid solution 330 to carry out hydrophilic treatment for the surperficial 310a of substrate 310 comprehensively, utilizes hydrophobic material 340 to cause hydrophobic region R1 and hydrophilic region R2 afterwards again on substrate 310.Thus, can directly carry out upgrading in the surperficial 310a of substrate 310, help that follow-up color inks 370R, 370G, 370B utilize capillary principle and ink-jet on substrate 310.Particularly, utilize the colored optical filtering substrates 300 of said method made, can be directly on substrate 310, form color filter patterns 380R, 380G, 380B, help promoting the penetrance of light and promote display quality.
The manufacture method of liquid crystal panel
Fig. 7 A to Fig. 7 C is the manufacture method flow process diagrammatic cross-section of a kind of liquid crystal panel of preferred embodiment of the present invention.Please refer to Fig. 7 A, at first, make a colored optical filtering substrates 410, the manufacture method of this colored optical filtering substrates 410 is with above-mentioned Fig. 3 A～the described manufacturing process of Fig. 3 I is identical, the composition of assembly is also similar with the colored optical filtering substrates 300 shown in Fig. 3 I, is not given unnecessary details at this.In addition, also can on colored optical filtering substrates 410, form shared electrode layer (not illustrating).
Then, please refer to Fig. 7 B, an active assembly array base plate 420 is provided, its subtend is in colored optical filtering substrates 410.This active assembly array base plate 420 comprises multi-strip scanning line (not illustrating), many data lines (not illustrating) and a plurality of picture elements unit (not illustrating).
Afterwards, please refer to Fig. 7 C, between colored optical filtering substrates 410 and active assembly array base plate 420, form liquid crystal layer 430.The mode that forms liquid crystal layer 430 can be utilized to drip and inject completion method (One Drop Filling ODF) or vacuum impregnation, so far, finishes the making of liquid crystal panel 400.It should be noted that chromatic filter layer 380R, 380G, 380B are that the surperficial 310a that is formed directly into substrate 310 goes up (can with reference to Fig. 3 I), make liquid crystal panel 400 have superior display quality so can promote the light penetration rate.
In sum, the manufacture method of colored optical filtering substrates of the present invention and liquid crystal panel has the following advantages at least:
By alkali lye, acid solution and hydrophobic material, can directly on substrate, form hydrophilic region and hydrophobic region.So, follow-up color inks can easily utilize hydrophilic and hydrophobic matter and be formed in hydrophobic region or the hydrophilic region, makes the problems such as cost costliness, color inks overflow and liquid crystal bubbles that colored optical filtering substrates caused and can solve the known described micro-photographing process that utilizes.Particularly, the manufacture method of above-mentioned colored optical filtering substrates can directly form color filter patterns on substrate, the display quality that helps promoting the penetrance of light and then can promote liquid crystal panel.
Though the present invention discloses as above with embodiment; right its is not in order to limit the present invention; have in the technical field under any and know the knowledgeable usually; without departing from the spirit and scope of the invention; when doing a little change and retouching, so the present invention's protection domain attached claim person of defining after looking is as the criterion.
Claims (29)
1. the manufacture method of a colored optical filtering substrates, it is characterized in that: described manufacture method is:
One substrate is provided, and described substrate has a surface;
Use acid solution that hydrophilic treatment is carried out on this surface;
Provide hydrophobic material to through on this surface after this hydrophilic treatment, form hydrophobic region with this hydrophobic material through this surface of hydrophobic reactant, this surface that contacts with this hydrophobic material does not then form hydrophilic region;
Remove this hydrophobic material; And
Color inks is provided, to hydrophilic and hydrophobic matter that should color inks in this hydrophobic region or this hydrophilic region, to form color filter patterns.
2. the manufacture method of colored optical filtering substrates according to claim 1, it is characterized in that: described acid solution is to be selected from hydrofluorite HCl, nitric acid HNO
3, sulfuric acid H
2SO
4Or glacial acetic acid CH
3The combination of one or more among the COOH.
The manufacture method of 3 colored optical filtering substrates according to claim 1 is characterized in that: described before the use acid solution is carried out hydrophilic treatment to substrate surface, use alkali lye treatment substrate surface.
4. the manufacture method of colored optical filtering substrates according to claim 1, it is characterized in that: described alkali lye is to be selected from NaOH NaOH or potassium hydroxide KOH or its combination.
5. the manufacture method of colored optical filtering substrates according to claim 1, it is characterized in that: the described step that removes this hydrophobic material comprises:
Provide organic solvent removal this hydrophobic material;
Deionized water is provided, cleans described substrate surface;
The surface of dry this substrate.
6. the manufacture method of colored optical filtering substrates according to claim 1, it is characterized in that: described hydrophobic material is a kind of or its combination that is selected from long alkyl chain Si oxide, aromatic series Si oxide or the epoxy family Si oxide.
7. the manufacture method of colored optical filtering substrates according to claim 6, it is characterized in that: described long alkyl chain Si oxide comprises: octyltri-ethoxysilane octyl-triethoxy-silane or octyl group trimethoxy silane octyl-trimethoxy-silane.
8. the manufacture method of colored optical filtering substrates according to claim 6, it is characterized in that: described aromatic series Si oxide comprises: (1-naphthyl) triethoxysilane (1-naphthyl)-triethoxy silane or triethoxy (2-phenethyl) silane trimethoxy (2-phenylethyl) silane.
9. the manufacture method of colored optical filtering substrates according to claim 6 is characterized in that: described epoxy family Si oxide comprises: cyclohexene ethyl triethoxysilane cyclohexenyl-ethyl-triethoxysilane or cyclohexene ethyl trimethoxy silane cyclohexyl-ethyl-trimethoxysilane.
10. the manufacture method of colored optical filtering substrates according to claim 1 is characterized in that: the described step that makes this hydrophobic material and this surface produce hydrophobic reactant also comprises: the surface of an energy to this hydrophobic material and this substrate is provided.
11. the manufacture method of colored optical filtering substrates according to claim 10 is characterized in that: wherein provide the mode of this energy to comprise: heat on the surface to this substrate, irradiating microwaves or irradiating ultraviolet light.
12. the manufacture method of colored optical filtering substrates according to claim 1 is characterized in that: describedly this hydrophobic material is provided and provides the method for this color inks to comprise ink-jet method.
13. the manufacture method of colored optical filtering substrates according to claim 1 is characterized in that: more comprise this color inks is carried out a baking processing procedure, to form this color filter patterns.
14. the manufacture method of colored optical filtering substrates according to claim 1 is characterized in that: more be included in and form a black matrix on this substrate, separate this color filter patterns.
15. the manufacture method of colored optical filtering substrates according to claim 14 is characterized in that: the described method that forms black matrix on this substrate comprises: ink-jet method or micro-photographing process.
16. the manufacture method of a liquid crystal panel is characterized in that: described manufacture method is:
One substrate is provided, and described substrate has a surface;
Use acid solution that hydrophilic treatment is carried out on this surface;
Provide hydrophobic material to through on this surface after this hydrophilic treatment, form hydrophobic region with this hydrophobic material through this surface of hydrophobic reactant, this surface that contacts with this hydrophobic material does not then form hydrophilic region;
Remove this hydrophobic material;
Color inks is provided, to hydrophilic and hydrophobic matter that should color inks in this hydrophobic region or this hydrophilic region, to form color filter patterns, to obtain colored optical filtering substrates;
Active assembly array base plate is provided, and subtend is in this colored optical filtering substrates; And
Between this active assembly array base plate and this colored optical filtering substrates, form a liquid crystal layer.
17. the manufacture method of liquid crystal panel according to claim 16 is characterized in that: described acid solution is to be selected from hydrofluorite HCl, nitric acid HNO
3, sulfuric acid H
2SO
4Or glacial acetic acid CH
3A kind of or its combination among the COOH.
18. the manufacture method of liquid crystal panel according to claim 16 is characterized in that: described before this acid solution of use is carried out this hydrophilic treatment to this surface, more comprise and use alkali lye to handle this surface.
19. the manufacture method of liquid crystal panel according to claim 16 is characterized in that: described alkali lye is to be selected from NaOH NaOH or potassium hydroxide KOH or its combination.
20. the manufacture method of liquid crystal panel according to claim 16 is characterized in that: the described step that removes this hydrophobic material comprises:
Provide organic solvent removal this hydrophobic material;
Deionized water is provided, cleans this surface of this substrate;
The surface of dry this substrate.
21. the manufacture method of liquid crystal panel according to claim 16 is characterized in that: described hydrophobic material is to be selected from long alkyl chain Si oxide, aromatic series Si oxide or epoxy family Si oxide or its combination.
22. the manufacture method of liquid crystal panel according to claim 21 is characterized in that: described long alkyl chain Si oxide comprises: octyltri-ethoxysilane octyl-triethoxy-silane or octyl group trimethoxy silane octyl-trimethoxy-silane.
23. the manufacture method of liquid crystal panel according to claim 21 is characterized in that: described aromatic series Si oxide comprises: (1-naphthyl) triethoxysilane (1-naphthyl)-triethoxy silane or triethoxy (2-phenethyl) silane trimethoxy (2-phenylethyl) silane.
24. the manufacture method of liquid crystal panel according to claim 16 is characterized in that: described epoxy family Si oxide comprises: cyclohexene ethyl triethoxysilane cyclohexenyl-ethyl-triethoxysilane or cyclohexene ethyl trimethoxy silane cyclohexyl-ethyl-trimethoxysilane.
25. the manufacture method of liquid crystal panel according to claim 16 is characterized in that: the step that described hydrophobic material and this surface produce this hydrophobic reactant also comprises: the surface of an energy to this hydrophobic material and this substrate is provided.
26. the manufacture method of liquid crystal panel according to claim 16 is characterized in that: the described mode of this energy that provides comprises: heat on the surface to this substrate, irradiating microwaves or irradiating ultraviolet light.
27. the manufacture method of liquid crystal panel according to claim 16 is characterized in that: describedly this hydrophobic material is provided and provides the method for this color inks to comprise ink-jet method.
28. the manufacture method of liquid crystal panel according to claim 16 is characterized in that: more comprise this color inks is toasted processing procedure, to form this color filter patterns.
29. the manufacture method of liquid crystal panel according to claim 16 is characterized in that: more be included in and form a black matrix on this substrate, separate this color filter patterns.
30. the manufacture method of liquid crystal panel according to claim 29 is characterized in that: the method that wherein forms this black matrix on this substrate comprises: ink-jet method or micro-photographing process.
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| CN101493600B CN101493600B (en) | 2011-03-30 |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101990058A (en) * | 2009-07-30 | 2011-03-23 | 鸿富锦精密工业（深圳）有限公司 | Method of coating wafer-level camera module and wafer-level camera module |
| CN103235444A (en) * | 2013-04-28 | 2013-08-07 | 京东方科技集团股份有限公司 | Display device, color film substrate and manufacturing method of color film substrate |
| CN105700216A (en) * | 2016-05-07 | 2016-06-22 | 深圳爱易瑞科技有限公司 | Method for manufacturing liquid crystal display panel |
| CN105700215A (en) * | 2016-05-07 | 2016-06-22 | 深圳爱易瑞科技有限公司 | Display panel manufacturing method |
| US9884782B2 (en) | 2014-04-04 | 2018-02-06 | Corning Incorporated | Treatment of glass surfaces for improved adhesion |
| CN114106588A (en) * | 2020-08-25 | 2022-03-01 | 上海迪赢生物科技有限公司 | Functionalized surface treatment method for high-flux nucleic acid in-situ synthesis by 3D ink-jet method |
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2009
- 2009-03-03 CN CN2009101111424A patent/CN101493600B/en not_active Expired - Fee Related
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101990058A (en) * | 2009-07-30 | 2011-03-23 | 鸿富锦精密工业（深圳）有限公司 | Method of coating wafer-level camera module and wafer-level camera module |
| CN103235444A (en) * | 2013-04-28 | 2013-08-07 | 京东方科技集团股份有限公司 | Display device, color film substrate and manufacturing method of color film substrate |
| WO2014176904A1 (en) * | 2013-04-28 | 2014-11-06 | 京东方科技集团股份有限公司 | Display device, color film substrate and manufacturing method thereof |
| US9884782B2 (en) | 2014-04-04 | 2018-02-06 | Corning Incorporated | Treatment of glass surfaces for improved adhesion |
| CN105700216A (en) * | 2016-05-07 | 2016-06-22 | 深圳爱易瑞科技有限公司 | Method for manufacturing liquid crystal display panel |
| CN105700215A (en) * | 2016-05-07 | 2016-06-22 | 深圳爱易瑞科技有限公司 | Display panel manufacturing method |
| CN114106588A (en) * | 2020-08-25 | 2022-03-01 | 上海迪赢生物科技有限公司 | Functionalized surface treatment method for high-flux nucleic acid in-situ synthesis by 3D ink-jet method |
| CN114106588B (en) * | 2020-08-25 | 2023-01-03 | 上海迪赢生物科技有限公司 | Functionalized surface treatment method for high-flux nucleic acid in-situ synthesis by 3D ink-jet method |
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| CN101493600B (en) | 2011-03-30 |
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