CN103906579B - 一种预塌陷电容式微加工换能器单元及其制造方法 - Google Patents

一种预塌陷电容式微加工换能器单元及其制造方法 Download PDF

Info

Publication number
CN103906579B
CN103906579B CN201280052980.9A CN201280052980A CN103906579B CN 103906579 B CN103906579 B CN 103906579B CN 201280052980 A CN201280052980 A CN 201280052980A CN 103906579 B CN103906579 B CN 103906579B
Authority
CN
China
Prior art keywords
membrane
unit
substrate
film
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201280052980.9A
Other languages
English (en)
Chinese (zh)
Other versions
CN103906579A (zh
Inventor
P·迪克森
R·德克尔
V·A·亨内肯
A·莱文斯泰因
B·马赛利斯
J·D·弗雷泽
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Koninklijke Philips NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninklijke Philips NV filed Critical Koninklijke Philips NV
Publication of CN103906579A publication Critical patent/CN103906579A/zh
Application granted granted Critical
Publication of CN103906579B publication Critical patent/CN103906579B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • GPHYSICS
    • G10MUSICAL INSTRUMENTS; ACOUSTICS
    • G10KSOUND-PRODUCING DEVICES; METHODS OR DEVICES FOR PROTECTING AGAINST, OR FOR DAMPING, NOISE OR OTHER ACOUSTIC WAVES IN GENERAL; ACOUSTICS NOT OTHERWISE PROVIDED FOR
    • G10K11/00Methods or devices for transmitting, conducting or directing sound in general; Methods or devices for protecting against, or for damping, noise or other acoustic waves in general
    • G10K11/18Methods or devices for transmitting, conducting or directing sound
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B06GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
    • B06BMETHODS OR APPARATUS FOR GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS OF INFRASONIC, SONIC, OR ULTRASONIC FREQUENCY, e.g. FOR PERFORMING MECHANICAL WORK IN GENERAL
    • B06B1/00Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency
    • B06B1/02Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy
    • B06B1/0292Electrostatic transducers, e.g. electret-type
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04RLOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
    • H04R31/00Apparatus or processes specially adapted for the manufacture of transducers or diaphragms therefor
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49005Acoustic transducer

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Signal Processing (AREA)
  • Multimedia (AREA)
  • Pressure Sensors (AREA)
  • Transducers For Ultrasonic Waves (AREA)
  • Micromachines (AREA)
  • Measuring Fluid Pressure (AREA)
CN201280052980.9A 2011-10-28 2012-10-15 一种预塌陷电容式微加工换能器单元及其制造方法 Active CN103906579B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161552485P 2011-10-28 2011-10-28
US61/552,485 2011-10-28
PCT/IB2012/055605 WO2013061204A2 (en) 2011-10-28 2012-10-15 Pre-collapsed capacitive micro-machined transducer cell with plug

Publications (2)

Publication Number Publication Date
CN103906579A CN103906579A (zh) 2014-07-02
CN103906579B true CN103906579B (zh) 2016-08-24

Family

ID=47227991

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201280052980.9A Active CN103906579B (zh) 2011-10-28 2012-10-15 一种预塌陷电容式微加工换能器单元及其制造方法

Country Status (8)

Country Link
US (1) US9117438B2 (enExample)
EP (1) EP2747904B1 (enExample)
JP (1) JP5961697B2 (enExample)
CN (1) CN103906579B (enExample)
BR (1) BR112014009698A2 (enExample)
MX (1) MX343897B (enExample)
RU (1) RU2595800C2 (enExample)
WO (1) WO2013061204A2 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2771132B1 (en) * 2011-10-28 2018-08-29 Koninklijke Philips N.V. Pre-collapsed capacitive micro-machined transducer cell with stress layer
RU2607720C2 (ru) 2011-12-20 2017-01-10 Конинклейке Филипс Н.В. Устройство ультразвукового преобразователя и способ его изготовления
JP6553174B2 (ja) * 2014-09-11 2019-07-31 コーニンクレッカ フィリップス エヌ ヴェKoninklijke Philips N.V. 広帯域の体内通過超音波通信システム
WO2017001636A1 (en) * 2015-06-30 2017-01-05 Koninklijke Philips N.V. Ultrasound system and ultrasonic pulse transmission method
US10043903B2 (en) 2015-12-21 2018-08-07 Samsung Electronics Co., Ltd. Semiconductor devices with source/drain stress liner
WO2018100015A1 (en) * 2016-12-01 2018-06-07 Koninklijke Philips N.V. Cmut probe, system and method
RU2732839C1 (ru) * 2019-07-09 2020-09-23 Федеральное государственное бюджетное образовательное учреждение высшего образования "Пензенский государственный университет" (ФГБОУ ВО "ПГУ") Полупроводниковый преобразователь давления с повышенной точностью и чувствительностью
US11304005B2 (en) 2020-02-07 2022-04-12 xMEMS Labs, Inc. Crossover circuit
US11172300B2 (en) * 2020-02-07 2021-11-09 xMEMS Labs, Inc. Sound producing device

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009194934A (ja) * 2004-06-03 2009-08-27 Olympus Corp 静電容量型超音波振動子および積層型静電容量型超音波振動子の製造方法
EP2145696A1 (en) * 2008-07-15 2010-01-20 UAB Minatech Capacitive micromachined ultrasonic transducer and its fabrication method
CN101896288A (zh) * 2007-12-14 2010-11-24 皇家飞利浦电子股份有限公司 包括经成型衬底的可以塌陷模式工作的cmut
CN101969856A (zh) * 2007-09-17 2011-02-09 皇家飞利浦电子股份有限公司 预塌陷的电容微机械超声传感器的制造及其应用

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4885779B2 (ja) * 2007-03-29 2012-02-29 オリンパスメディカルシステムズ株式会社 静電容量型トランスデューサ装置及び体腔内超音波診断システム
CN101772383B (zh) * 2007-07-31 2011-11-02 皇家飞利浦电子股份有限公司 具有高k电介质的cmut
EP2326432A2 (en) * 2008-09-16 2011-06-01 Koninklijke Philips Electronics N.V. Capacitive micromachined ultrasound transducer
CN102333485B (zh) * 2009-02-27 2014-12-10 皇家飞利浦电子股份有限公司 具有机械塌陷保持的预塌陷cmut

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009194934A (ja) * 2004-06-03 2009-08-27 Olympus Corp 静電容量型超音波振動子および積層型静電容量型超音波振動子の製造方法
CN101969856A (zh) * 2007-09-17 2011-02-09 皇家飞利浦电子股份有限公司 预塌陷的电容微机械超声传感器的制造及其应用
CN101896288A (zh) * 2007-12-14 2010-11-24 皇家飞利浦电子股份有限公司 包括经成型衬底的可以塌陷模式工作的cmut
EP2145696A1 (en) * 2008-07-15 2010-01-20 UAB Minatech Capacitive micromachined ultrasonic transducer and its fabrication method

Also Published As

Publication number Publication date
JP5961697B2 (ja) 2016-08-02
MX2014004905A (es) 2014-05-28
US20140247698A1 (en) 2014-09-04
EP2747904A2 (en) 2014-07-02
WO2013061204A3 (en) 2013-09-12
WO2013061204A2 (en) 2013-05-02
BR112014009698A2 (pt) 2017-05-09
EP2747904B1 (en) 2020-04-08
CN103906579A (zh) 2014-07-02
US9117438B2 (en) 2015-08-25
RU2595800C2 (ru) 2016-08-27
MX343897B (es) 2016-11-28
JP2015504620A (ja) 2015-02-12
RU2014121503A (ru) 2015-12-10

Similar Documents

Publication Publication Date Title
CN103917304B (zh) 具有应力层的预塌陷电容式微加工换能器单元
CN103906579B (zh) 一种预塌陷电容式微加工换能器单元及其制造方法
JP4401958B2 (ja) マイクロ機械加工された超音波トランスデューサ及び製造方法
EP3233311B1 (en) Piezoelectric micromachined ultrasonic transducers with low stress sensitivity and methods of fabrication
US20180178251A1 (en) Piezoelectric micro-machined ultrasonic transducer (pmut) and method for manufacturing the pmut
CN102728535B (zh) 电气机械换能器及其制造方法
KR101787187B1 (ko) 마이크로폰용 시스템 및 방법
CN102728533B (zh) 机电变换器及其制作方法
IT201800004758A1 (it) Trasduttore acustico mems piezoelettrico e relativo procedimento di fabbricazione
JP2008259061A (ja) 静電型トランスデューサ
WO2019099013A1 (en) Piezoelectric micromachined ultrasonic transducer with a patterned membrane structure
US8824243B2 (en) Ultrasonic transducer unit and ultrasonic probe
JP2012119831A (ja) 超音波振動子ユニット、及び超音波プローブ
CN113896165B (zh) 压电微机械超声波换能器及其制作方法
JP2018110282A (ja) 静電容量型トランスデューサ、及びその製造方法
CN118341659A (zh) 压电微机械超声换能器、制作方法以及电气产品
JP2016096576A (ja) 電気機械変換装置及びその作製方法
JP2011182140A (ja) 超音波振動子ユニット及び超音波プローブ

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant