Background technology
Light emitting diode has been widely used in the middle of various uses as emerging light source.Light emitting diode is usual
Packaging body including pedestal, the chip being installed on pedestal and covering chip.Chip is grown on the N on substrate by substrate and successively
Type semiconductor layer, luminescent layer and p type semiconductor layer composition.Chip can also respectively on its n type semiconductor layer and p type semiconductor layer
P electrode and N electrode are formed, is electrically connected with pedestal.Currently, it is that its substrate is directly manufactured using conductive material to have segment chip
, industry is normally referred to as vertical conducting cake core.The substrate of this kind of chip can make directly as the electrode of n type semiconductor layer
With, thus this kind of chip only can form P electrode at the top of its p type semiconductor layer.During work, electric current enters chip from P electrode
It is interior, and exported to pedestal via substrate.
However, the P electrode of this kind of vertical conducting cake core often only covers the mesozone at the top of p type semiconductor layer
Domain, also tends to concentrate on the middle part of chip when causing electric current to be transmitted in chip, the electric current of chip two side areas is then less.By
This, there is the few situation in middle many both sides, the light for causing chip central region to be excited by electric current in distribution of the electric current in chip
Line will be more than the light that chip two side areas are excited by electric current, chip is equably lighted.This kind of situation is in large area
Chip in the middle of become apparent, badly influence the normal of chip and use.
The content of the invention
Therefore, it is necessary to provide a kind of luminescence chip combination with uniform light output.
A kind of luminescence chip combination, including the first semiconductor that electrically-conductive backing plate is electrically connected and stacked gradually with electrically-conductive backing plate
Layer, luminescent layer, the second semiconductor layer and electrode, substrate include multiple electric current obstacles, in the density and size of these electric current obstacles
At least one from the position of counter electrode towards substrate periphery reduce.
Because the density or size of electric current obstacle reduce from the position of counter electrode towards the periphery of substrate, therefore from electricity
The electric current that pole enters in chip can spread under the stop of electric current obstacle to chip perimeter, so as to be evenly distributed in chip.Point
The uniform electric current of cloth and then excite luminescent layer to send uniform light, chip is obtained preferable light-out effect.
With reference to the accompanying drawings, the invention will be further described in conjunction with specific embodiments.
Brief description of the drawings
Fig. 1 shows the luminescence chip combination of first embodiment of the invention.
Fig. 2 shows the luminescence chip combination of second embodiment of the invention.
Fig. 3 shows the luminescence chip combination of third embodiment of the invention.
Fig. 4 shows the luminescence chip combination of fourth embodiment of the invention.
Main element symbol description
Luminescence chip is combined |
10 |
Substrate |
20 |
Conducting portion |
22 |
Electric current obstacle |
24 |
First conductive layer |
26 |
Second conductive layer |
28 |
Insulating barrier |
29 |
Chip |
30 |
Substrate |
32 |
Groove |
320 |
First semiconductor layer |
34 |
Luminescent layer |
36 |
Second semiconductor layer |
38 |
Electrode |
39 |
Wire |
40 |
Following specific embodiment will further illustrate the present invention with reference to above-mentioned accompanying drawing.
Specific embodiment
Fig. 1 is referred to, the luminescence chip combination 10 of first embodiment of the invention is shown.Luminescence chip combination 10 includes one
Substrate 20 and the chip 30 being fixed on substrate 20.
Chip 30 includes that substrate 32, the first semiconductor layer 34 being sequentially formed on substrate 32, luminescent layer 36, the second half lead
Body layer 38 and electrode 39.In the present embodiment, substrate 32 is made up of conductive material, such as silicon, carborundum or metal material.
When substrate 32 is manufactured using silicon or carborundum, the first semiconductor layer 34, the semiconductor layer 38 of luminescent layer 36 and second can directly give birth to
It is longer than on substrate 32.Now the first semiconductor layer 34 is n type semiconductor layer, and the second semiconductor layer 38 is p type semiconductor layer.Work as base
When plate 32 is manufactured using metal material, the second semiconductor layer 38, the semiconductor layer 34 of luminescent layer 36 and first are first to be grown in successively
In one temporary substrate (not shown), metal substrate 32 is then formed on the first semiconductor layer 34 again, finally move temporary substrate
Remove.Now the first semiconductor layer 34 is p type semiconductor layer, and the second semiconductor layer 38 is n type semiconductor layer.First semiconductor layer
34th, the semiconductor layer 38 of luminescent layer 36 and second can be using luminescent materials such as gallium nitride, InGaN and aluminum indium gallium nitrides
It is made.Area of the area of electrode 39 less than the second semiconductor layer 38.Electrode 39 only covers the top surface of the second semiconductor layer 38
Central region and make the top surface of the second semiconductor layer 38 opposite sides expose outside.
Chip 30 is fixed on the top surface of substrate 20 by way of viscose glue or eutectic bonding.Substrate 20 by such as epoxy resin,
The insulating materials such as silica gel or ceramics is made, and it has been internally formed multiple conducting portions 22.Each conducting portion 22 is by metal material system
Into.When substrate 20 is manufactured by epoxy resin or silica gel, these conducting portions 22 can be positioned beforehand through positioning instrument, then substrate
20 are formed on conducting portion 22 by injecting the modes such as shaping.When substrate 20 is by ceramics manufacture, these conducting portions 22 can be with pottery
Porcelain thin slice is together molded by LTCC Technology.These conducting portions 22 are respectively positioned on the underface of chip 30, and each lead
Logical portion 22 extends to the bottom surface of substrate 20 from the top surface of substrate 20.In the present embodiment, the size all same of each conducting portion 22, and lead
The distribution density in logical portion 22 is from the position of 30 electrode of correspondence chip 39 towards being gradually reduced at the peripheral position of substrate 20.Every two is adjacent
Conducting portion 22 between form an electric current obstacle 24.Due to the size of conducting portion 22 is identical and arranging density from centre to both sides by
It is decrescence small, thus the arranging density of the electric current obstacle 24 defined by conducting portion 22 keeps constant, but size is (i.e. right from centre
Answer at the position of 30 electrode of chip 39) it is gradually reduced to both sides (i.e. at the peripheral position of counterpart substrate 20).
Substrate 20 forms the first conductive layer 26 and the second conductive layer 28 respectively in its top surface and bottom surface.First conductive layer 26 with
Chip 30 separates, and is connected with the electrode 39 at the top of chip 30 by a wire 40.Second conductive layer 28 connects all conducting portions
22 bottom surface.Thus, the electrode 39 of chip 30 is electrically connected with the first conductive layer 26, the conductive layer 28 of substrate 32 and second of chip 30
Electrical connection.Electric current can be input into chip 30 (with the first semiconductor layer 34 for N-type is partly led via the first conductive layer 26 from electrode 39
As a example by body layer), then exported from the second conductive layer 28 by conducting portion 22 again.In transmitting procedure, due to electric current obstacle 24
Size is gradually reduced from centre to both sides, thus the electric current for entering chip 30 from electrode 39 will be by the obstruction of electric current obstacle 24
Disperse to both sides from the middle part of chip 30, so as to flow evenly through chip 30.Therefore, in the case where equally distributed electric current is excited, chip
30 can send uniform light, so as to obtain preferable light-out effect.
It is to be appreciated that as shown in Fig. 2 the size of the electric current obstacle 24 of aforesaid substrate 20 can also keep identical, but arrangement
Density is gradually reduced from middle (corresponding at the position of 30 electrode of chip 39) to both sides (i.e. at the peripheral position of counterpart substrate 20), together
Sample can play a part of equalizing current.Certainly, the size of electric current obstacle 24 and arrangement density can also change simultaneously, i.e., from right
Answer and be gradually reduced towards the periphery of the first semiconductor layer of chip 34 at the position of 30 electrode of chip 39, to play stronger equalizing current
Effect.
It is also understood that, the substrate 32 of chip 30 itself can also form corresponding electric current obstacle to expand electric current
Dissipate.As shown in figure 3, the lower surface of substrate 32 forms multiple grooves 320 as electric current obstacle by modes such as etchings.These grooves
320 size is identical, but distribution density from the position of counter electrode 39 towards gradually subtracting at the position on the periphery of counterpart substrate 32
It is small.This kind of arrangement mode of groove 320 can play a part of to hinder electric current, electric current is disperseed to both sides from the middle of chip 30, from
And chip 30 is sent uniform light.Certainly, also can be by controlling etching condition (such as etching period, the concentration of etching solution
Deng) make the size of groove 320 from the position of counter electrode 39 towards being gradually reduced at the position on the periphery of counterpart substrate 32, and
Arranging density keep it is constant, or size and arranging density from the position of counter electrode 39 towards the periphery of counterpart substrate 32
Position at be gradually reduced.The substrate 20 for carrying chip 30 in such cases can be manufactured directly using conductive metal material,
But insulation must be kept by 29 and first conductive layer of insulating barrier 26, occurred with the situation for preventing short circuit.
It is also understood that ground, the substrate 32 of the chip 30 itself of Fig. 3 can be combined with the substrate 20 of the carrying chip 30 of Fig. 1 to be made
With so as to be collectively forming dual electric current obstacle 24 as shown in Figure 4, to play stronger current spreading effect.