Background technology
Light-emitting diode, as emerging light source, has been widely used in the middle of various uses.Light-emitting diode generally includes pedestal, be installed on the chip on pedestal and cover the packaging body of chip.Chip by substrate and the n type semiconductor layer, luminescent layer and the p type semiconductor layer that grow in successively on substrate form.Chip also can form respectively P electrode and N electrode on its n type semiconductor layer and p type semiconductor layer, to be electrically connected with pedestal.Current, having segment chip is directly to adopt electric conducting material to manufacture its substrate, and industry is referred to as vertical conducting cake core conventionally.The substrate of this kind of chip can directly use as the electrode of n type semiconductor layer, thereby this kind of chip only can form P electrode at the top of its p type semiconductor layer.When work, electric current enters in chip from P electrode, and exports pedestal to via substrate.
But the P electrode of this kind of vertical conducting cake core only covers the zone line at the top of p type semiconductor layer often, while causing electric current to transmit, also trend towards concentrating on the middle part of chip in chip, the electric current of chip two side areas is less.Thus, the few situation in many both sides in the middle of the distribution of electric current in chip occurs, the light that causes chip central region to be subject to light that electric current excites excited by electric current more than chip two side areas, makes the chip cannot be luminous equably.This kind of situation is more obvious in the middle of large-area chip, badly influences the normal use of chip.
Summary of the invention
Therefore, be necessary to provide a kind of luminescence chip combination with uniform light output.
A kind of luminescence chip combination, the first semiconductor layer, luminescent layer, the second semiconductor layer and the electrode that comprise electrically-conductive backing plate, be electrically connected and stack gradually with electrically-conductive backing plate, substrate comprises multiple electric current obstacles, and at least one position from counter electrode in density and the size of these electric current obstacles reduces towards the periphery of substrate.
Because density or the size of electric current obstacle reduce towards the periphery of substrate from the position of counter electrode, therefore the meeting under the stopping of electric current obstacle of the electric current in electrode enters chip is spread to chip periphery, thereby is evenly distributed in chip.The electric current being evenly distributed and then stimulated luminescence layer send uniform light, make chip obtain the desirable light effect that goes out.
With reference to the accompanying drawings, the invention will be further described in conjunction with specific embodiments.
Brief description of the drawings
Fig. 1 illustrates the luminescence chip combination of first embodiment of the invention.
Fig. 2 illustrates the luminescence chip combination of second embodiment of the invention.
Fig. 3 illustrates the luminescence chip combination of third embodiment of the invention.
Fig. 4 illustrates the luminescence chip combination of fourth embodiment of the invention.
Main element symbol description
Luminescence chip combination |
10 |
Substrate |
20 |
Conducting portion |
22 |
Electric current obstacle |
24 |
The first conductive layer |
26 |
The second conductive layer |
28 |
Insulating barrier |
29 |
Chip |
30 |
Substrate |
32 |
Groove |
320 |
The first semiconductor layer |
34 |
Luminescent layer |
36 |
The second semiconductor layer |
38 |
Electrode |
39 |
Wire |
40 |
Following embodiment further illustrates the present invention in connection with above-mentioned accompanying drawing.
Embodiment
Refer to Fig. 1, show the luminescence chip combination 10 of first embodiment of the invention.Luminescence chip combination 10 comprises a substrate 20 and is fixed on the chip 30 on substrate 20.
Chip 30 comprises substrate 32, is formed at the first semiconductor layer 34, luminescent layer 36, the second semiconductor layer 38 and the electrode 39 on substrate 32 successively.In the present embodiment, substrate 32 is to be made up of the material that conducting electricity, such as silicon, carborundum or metal material.In the time that substrate 32 adopts silicon or carborundum to manufacture, the first semiconductor layer 34, luminescent layer 36 and the second semiconductor layer 38 can be directly grown on substrate 32.Now the first semiconductor layer 34 is n type semiconductor layer, and the second semiconductor layer 38 is p type semiconductor layer.In the time that substrate 32 adopts metal material to manufacture, the second semiconductor layer 38, luminescent layer 36 and the first semiconductor layer 34 are to be first grown in successively in a temporary substrate (not shown), and then form metal substrate 32 on the first semiconductor layer 34, finally temporary substrate is removed.Now the first semiconductor layer 34 is p type semiconductor layer, and the second semiconductor layer 38 is n type semiconductor layer.The first semiconductor layer 34, luminescent layer 36 and the second semiconductor layer 38 all can adopt luminescent materials such as gallium nitride, InGaN and aluminum indium nitride gallium and make.The area of electrode 39 is less than the area of the second semiconductor layer 38.Electrode 39 only cover the central region of the second semiconductor layer 38 end faces and the relative exposed at both sides that makes the second semiconductor layer 38 end faces outside.
The mode that chip 30 engages by viscose glue or eutectic is fixed on substrate 20 end faces.Substrate 20 is made up of the insulating material such as such as epoxy resin, silica gel or pottery, and its inside is formed with multiple conducting portions 22.Each conducting portion 22 is made by metal material.In the time that substrate 20 is manufactured by epoxy resin or silica gel, these conducting portions 22 can be located by orientation tool in advance, and then substrate 20 is formed on conducting portion 22 by injecting the modes such as moulding.In the time that substrate 20 is manufactured by pottery, these conducting portions 22 can be with ceramic sheet by together moulding of LTCC Technology.These conducting portions 22 be all positioned at chip 30 under, and each conducting portion 22 all extends to substrate 20 bottom surfaces from substrate 20 end faces.In the present embodiment, the size of each conducting portion 22 is all identical, and the distribution density of conducting portion 22 reduces towards substrate 20 peripheral positions gradually from corresponding chip 30 electrode 39 positions.Between every two adjacent conducting portions 22, form an electric current obstacle 24.Because the measure-alike and arranging density of conducting portion 22 reduces to both sides gradually from centre, thereby the arranging density of the electric current obstacle 24 being defined by conducting portion 22 remains unchanged, but size is from middle (being corresponding chip 30 electrode 39 positions), to both sides, (being counterpart substrate 20 peripheral positions) reduces gradually.
Substrate 20 forms respectively the first conductive layer 26 and the second conductive layer 28 at its end face and bottom surface.The first conductive layer 26 separates with chip 30, and is connected with the electrode 39 at chip 30 tops by a wire 40.The second conductive layer 28 connects the bottom surface of all conducting portions 22.Thus, the electrode 39 of chip 30 is electrically connected with the first conductive layer 26, and the substrate 32 of chip 30 is electrically connected with the second conductive layer 28.Electric current can be inputted into chip 30 interior (taking the first semiconductor layer 34 as n type semiconductor layer is as example) from electrode 39 via the first conductive layer 26, and then exports from the second conductive layer 28 by conducting portion 22.In transmitting procedure, because the size of electric current obstacle 24 reduces gradually from centre to both sides, thereby the electric current that enters chip 30 from electrode 39 will be subject to the obstruction of electric current obstacle 24 and disperse to both sides from chip 30 middle parts, thereby flows through equably chip 30.Therefore, under equally distributed electric current excites, chip 30 can send uniform light, thereby obtains the desirable light effect that goes out.
Understandably, as shown in Figure 2, it is identical that the size of the electric current obstacle 24 of aforesaid substrate 20 also can keep, but the density of arranging is from middle (being corresponding chip 30 electrode 39 positions), to both sides, (being counterpart substrate 20 peripheral positions) reduces gradually, can play equally the effect of equalizing current.Certainly, the size of electric current obstacle 24 and the density of arranging also can change simultaneously, all reduce gradually towards chip the first semiconductor layer 34 peripheries from corresponding chip 30 electrode 39 positions, to play the effect of stronger equalizing current.
It is also understood that ground, the substrate 32 of chip 30 self also can form corresponding electric current obstacle electric current is spread.As shown in Figure 3, substrate 32 lower surfaces form multiple grooves 320 as electric current obstacle by modes such as etchings.These grooves 320 measure-alike, but distribution density reduces towards the position of counterpart substrate 32 peripheries gradually from the position of counter electrode 39.This kind of arrangement mode of groove 320 can play the effect that hinders electric current, electric current disperseed to both sides in the middle of chip 30, thereby make chip 30 send uniform light.Certainly, also can the size of groove 320 be reduced gradually towards the position of counterpart substrate 32 peripheries from the position of counter electrode 39 by controlling etching condition (as concentration of etching period, etching solution etc.), and arranging density remains unchanged, or size and arranging density all reduce towards the position of counterpart substrate 32 peripheries gradually from the position of counter electrode 39.The substrate 20 of carries chips 30 just can directly adopt the metal material manufacture of conduction in such cases, but must keep insulation by insulating barrier 29 and the first conductive layer 26, occurs with the situation that prevents short circuit.
It is also understood that ground, the substrate 32 of the chip 30 of Fig. 3 self can be combined with the substrate of the carries chips of Fig. 1 30 20, thus the common dual electric current obstacle 24 forming as shown in Figure 4, to play stronger current spread effect.