CN103869602A - Mask plate, and method of mask plate used for realizing exposure joint - Google Patents
Mask plate, and method of mask plate used for realizing exposure joint Download PDFInfo
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- CN103869602A CN103869602A CN201210545317.4A CN201210545317A CN103869602A CN 103869602 A CN103869602 A CN 103869602A CN 201210545317 A CN201210545317 A CN 201210545317A CN 103869602 A CN103869602 A CN 103869602A
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- mask plate
- graph
- substrate
- exposure
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Abstract
The invention discloses a mask plate, and a method of the mask plate used for realizing exposure joint. According to the mask plate, a part of the mask plate used for exposure joint is provided with patterns; the patterns are used for that: when exposure joint is realized via combination with the patterns on the mask plate, patterns with specific positional relation are formed on a substrate, wherein the patterns with specific positional relation can be used for adjustment and calibration of the position of the mask plate. The mask plate, and the method of the mask plate used for realizing exposure joint are capable of ensuring precision of exposure joint, and so that occurrence of exposure joint failure is avoided.
Description
Technical field
The present invention relates to display technique field, be specifically related to a kind of mask plate and realize the method that exposure engages.
Background technology
At present, in the time that base board to explosure is engaged, cross poor and exposure disunity while engaging owing to engaging precision, exposure often occurs and engage badly, this is bad cannot measure, compensate, revise adjustment.And, bad for above-mentioned exposure joint, not yet there is at present effective solution.
Summary of the invention
In view of this, fundamental purpose of the present invention is to provide a kind of mask plate and realizes the method that exposure engages, to avoid exposure to engage bad generation as far as possible.
For achieving the above object, technical scheme of the present invention is achieved in that
A kind of mask plate, this mask plate is provided with figure for the position engaging of exposing, this figure is used for: expose after joint in conjunction with the described figure on described mask plate, form the figure that can carry out to described mask plate locational adjustment with certain positional relationship on substrate.
Described mask plate comprises the first mask plate, the second mask plate; Be provided with the first figure at described the first mask plate for the position engaging of exposing, be provided with second graph at described the second mask plate for the position engaging of exposing, described the first figure and second graph form the figure that can carry out to described mask plate locational adjustment with certain positional relationship after described base board to explosure being engaged by described the first mask plate and the second mask plate on described substrate.
Described the first figure is arranged at one end of described the first mask plate, and described second graph is arranged at one end or opposite end identical with described the first mask plate on described the second mask plate.
After described base board to explosure being engaged containing the first figure and by described mask plate, on described substrate, can or there is the second graph misplacing with the first graphics overlay forming on described substrate in the described graphics package on described mask plate.
Described the first figure is arranged at one end of described mask plate, and described second graph is arranged at the opposite end of described mask plate.
The quantity of described the first figure and/or second graph be one, two or more.
Described figure is hole, or comprises hole.
Realize based on described mask plate the method that exposure engages, the method comprises:
After described figure described in described combination on mask plate exposes and engages, on substrate, form the figure with certain positional relationship and comprise at least one in following mode:
Mode one, apply described mask plate to described base board to explosure, on described substrate, form the first figure in described figure; In the time that this mask plate of subsequent applications engages described base board to explosure, on described substrate, form with described the first graphics overlay or have the second graph misplacing; Or,
Apply described mask plate to described base board to explosure, on described substrate, form the first figure in described figure; In the time that this mask plate of subsequent applications engages described base board to explosure, on described substrate, form with described the first graphics overlay or have the second graph misplacing, be also formed for realizing the first figure that exposure engages next time;
Mode two, apply a mask plate in described mask plate to described base board to explosure, on described substrate, form the first figure in described figure, when another piece mask plate in mask plate described in subsequent applications engages described base board to explosure, on described substrate, form with described the first graphics overlay or have the second graph misplacing; Or,
Apply a mask plate in described mask plate to described base board to explosure, on described substrate, form the first figure in described figure, when another piece mask plate in mask plate described in subsequent applications engages described base board to explosure, on described substrate, form with described the first graphics overlay or have the second graph misplacing, being also formed for realizing the first figure that exposure engages next time.
When certain positional relationship between described the first figure and second graph is overlapping, described method of carrying out locational adjustment is: when after completing exposure and engaging, the first figure of forming on substrate and second graph could not overlap, according to the size differing between the first figure and second graph, the mask plate engaging for exposing is carried out to locational adjustment, the first figure and the second graph that complete after exposure engages by this mask plate are overlaped;
When certain positional relationship between described the first figure and second graph misplaces for existing, described method of carrying out locational adjustment is: do not have described dislocation between the first figure of forming and second graph on substrate after completing exposure and engaging time, to for expose engage mask plate carry out locational adjustment, make by this mask plate complete exposure engage after the first figure and second graph between there is described dislocation.
The method that mask plate of the present invention and realization exposure thereof engage, because be provided with figure for the position engaging of exposing on mask plate, and is exposing in conjunction with the described figure on this mask plate after joint, and on substrate, formation has the figure of certain positional relationship; Thereby can, according to the figure forming, carry out locational adjustment to described mask plate on described substrate, make the present invention can effectively guarantee the precision that exposure engages, thereby avoided exposure to engage bad generation.
Accompanying drawing explanation
Fig. 1 to Fig. 3 is the principle schematic that the realization exposure of the embodiment of the present invention one engages;
The realization that Fig. 4 is the embodiment of the present invention two with Fig. 5 principle schematic engaging of exposing;
The realization that Fig. 6 is the embodiment of the present invention three with Fig. 7 principle schematic engaging of exposing;
Fig. 8 is the general flow chart that the realization exposure of the embodiment of the present invention engages;
Description of reference numerals:
1, mask plate (mask); 2, left end; 3, figure (pattetn); 4, right-hand member; 5, figure; 6, hole; 7, figure; 8, hole; 9, figure; 10, figure; 11, hole; 12, hook-shaped figure.
Embodiment
The invention provides a kind of mask plate, as shown in Figure 1, on the left end 2 of mask plate 1, be provided with figure 3, on the right-hand member 4 of mask plate 1, be provided with figure 5, figure 5 comprises hole 6.Be one end and the opposite end that figure 3,5 is arranged at respectively mask plate 1.
As shown in Figure 3, by mask plate 1, after current position A completes exposure, position corresponding with the right-hand member 4 of mask plate 1 in substrate (not shown) can form figure 5.If need to expose joint, mask plate 1 can be moved to the needs region engaging of exposing in mode as shown in Figure 2, and finally move to position B as shown in Figure 3.In this case, the position of right-hand member 4 and the left end 2 of current mask plate 1 while exposure by mask plate 1 are overlapping before.At this moment,, by mask plate 1 joint that exposes, this exposure joint can cause position corresponding with the left end 2 of mask plate 1 on described substrate to form figure 3.The position of right-hand member 4 and the left end 2 of current mask plate 1 when exposing by mask plate 1 are before overlapping, and the figure 3,5 therefore forming on described substrate should be also overlapping, and the final figure 7 that comprises hole 6 that forms.Figure 5 can be called to the first figure, figure 3 is called to second graph.Certainly,, when position B exposes joint by mask plate 1, can also be formed for realizing the figure 5 that once exposure engages in the position on the corresponding substrate of the right-hand member of mask plate 14.Like this, if need to carry out multiexposure, multiple exposure joint, the so current figure 5 forming on described substrate while joint that exposes just can guarantee the smooth linking that once exposure engages.
Conventionally the object that, figure 3 is designed to " protruding " font is to improve the identifiability of figure 3.If can identify smoothly figure 3, also figure 3 can be designed to the rectangle the same with figure 5, just do not comprise hole 6.In fact, in figure 3 real overlapping with figure 5 and contribute to carry out high-precision exposure joint be in figure 3 with figure 5 identical described rectangle.
The object in design hole 6 is to improve the identifiability of the figure (as figure 7) after overlapping, if can identify smoothly the figure after overlapping, hole 6 also can be set.
As seen from the above description, in the time carrying out the design of figure 3,5 at first, can guarantee that the figure 3,5 completing after exposure engages by mask plate 1 can overlap, like this, also need to expose while engaging follow-up, only need to guarantee that the figure 3,5 completing after exposure engages by mask plate 1 can overlap; Even if the figure 3,5 completing after exposure engages by mask plate 1 could not overlap, also can carry out locational adjustment to mask plate 1 according to the size of dislocation between figure 3,5, finally make the figure 3,5 completing after exposure engages by mask plate 1 to overlap.
Visible, owing to there being concrete figure for comparison, therefore, when expose joint by mask plate 1, can effectively guarantee the precision that exposure engages, thereby avoid exposure to engage bad generation.And, even if need to carry out locational adjustment to mask plate 1, also can carry out adjustment based on concrete figure, this evidence-based adjustment mode can effectively guarantee the precision that exposure engages, and can also significantly improve work efficiency.
It should be noted that, the reason that figure is set respectively on the left end 2 of mask plate 1 and right-hand member 4 is conventionally to engage by a mask board to explosure at present.In fact, also can only in one end of a mask plate (can be described as the first mask plate), figure be set, also in upper one end or the opposite end identical with described the first mask plate of another piece mask plate (can be described as the second mask plate), figure is set, and the described figure arranging on these two mask plates can overlap, the described figure based on arranging on these two mask plates expose engage specific operation process identical with aforesaid respective process principle.
What on mask plate 1, arrange can be diversified for the figure engaging that exposes, such as the figure that can be set to as shown in Figure 4.In Fig. 4, on the left end 2 of mask plate 1, be arranged to the figure 7 of concrete device shape (as grid), figure 7 comprises hole 8, also on the right-hand member 4 of mask plate 1, figure 9 is set, the shape of figure 9 is the same with figure 7, does not just comprise hole 8, can in the time carrying out gate pattern formation, form on substrate so the required figure for exposing and engaging simultaneously, can reduce processing step, reduce costs.
It should be noted that, on the figure 7 representing with the form of grid, hook-shaped figure 12 can be set, for improving the identifiability of figure 7.
After the setting based on shown in Fig. 4 exposes and engages, can on described substrate, form as shown in Figure 5 by figure 7,9 the formed figure 10 that overlaps, figure 10 comprises hole 8.
Setting based on shown in Fig. 4 expose engage and the follow-up specific operation process of adjustment mask plate position likely occurring identical with aforesaid respective process principle.
In the time of concrete application, figure as shown in Figure 6 can also be set on mask plate 1.In Fig. 6, be arranged to the figure 7 of concrete device shape (as grid) on the left end 2 of mask plate 1, figure 7 comprises hole 8, also on the right-hand member 4 of mask plate 1, hole 11 is set.On the figure 7 representing with the form of grid, hook-shaped figure 12 can be set, for improving the identifiability of figure 7.
It should be noted that, in the time carrying out the design in figure 7, hole 11 at first, without guaranteeing that the hole 11 completing after exposure engages by mask plate 1 can overlap with the hole 8 on figure 7, but make as shown in Figure 7 to complete between the hole 8,11 after exposure engages and have certain dislocation by mask plate 1.Like this, also need to expose while engaging follow-up, only need to guarantee to complete between the hole 8,11 after exposure engages and have described dislocation by mask plate 1; Even complete between the hole 8,11 after exposure engages and do not there is described dislocation by mask plate 1, also can carry out locational adjustment to mask plate 1, finally make to complete between the hole 8,11 after exposure engages and have described dislocation by mask plate 1.In addition, at left end 2, the right-hand member 4 of the mask plate 1 set described figure in one end of taking up an official post, can be one, two or more.
The figure arranging on the left end 2 of mask plate 1 and right-hand member 4, can overlap after joint expose, can be also can not overlap but have certain dislocation.No matter be overlapping or dislocation, as long as can form the figure with certain positional relationship after the joint that exposes on described substrate, can be for comparison to ensure concrete figure.Like this, when expose joint by mask plate 1, just can effectively guarantee the precision that exposure engages, thereby avoid exposure to engage bad generation.And, even if need to carry out locational adjustment to mask plate 1, also can carry out adjustment based on concrete figure, this evidence-based adjustment mode can effectively guarantee the precision that exposure engages, and can also significantly improve work efficiency.
In addition, the described figure arranging on mask plate 1, is arranged on mask plate operative orientation.Known in conjunction with above description, the present invention, in the time realizing exposure joint, can carry out flow process as shown in Figure 8, and this flow process comprises the following steps:
Step 810: for the position engaging of exposing, figure is set on mask plate; Expose after joint in conjunction with the described figure arranging on this mask plate, on substrate, form the figure with certain positional relationship;
Step 820: according to the figure forming, described mask plate is carried out to locational adjustment on described substrate.
Particularly, after exposing and engage in conjunction with the described figure on described mask plate, on substrate, form the figure with certain positional relationship and comprise at least one in following mode:
Mode one, apply described mask plate to described base board to explosure, on described substrate, form the first figure in described figure; In the time that this mask plate of subsequent applications engages described base board to explosure, on described substrate, form with described the first graphics overlay or have the second graph misplacing; Or,
Apply described mask plate to described base board to explosure, on described substrate, form the first figure in described figure; In the time that this mask plate of subsequent applications engages described base board to explosure, on described substrate, form with described the first graphics overlay or have the second graph misplacing, be also formed for realizing the first figure that exposure engages next time;
Mode two, apply a mask plate in described mask plate to described base board to explosure, on described substrate, form the first figure in described figure, when another piece mask plate in mask plate described in subsequent applications engages described base board to explosure, on described substrate, form with described the first graphics overlay or have the second graph misplacing; Or,
Apply a mask plate in described mask plate to described base board to explosure, on described substrate, form the first figure in described figure, when another piece mask plate in mask plate described in subsequent applications engages described base board to explosure, on described substrate, form with described the first graphics overlay or have the second graph misplacing, being also formed for realizing the first figure that exposure engages next time.
When certain positional relationship between described the first figure and second graph is overlapping, described method of carrying out locational adjustment can be: when after completing exposure and engaging, the first figure of forming on substrate and second graph could not overlap, according to the size differing between the first figure and second graph, the mask plate engaging for exposing is carried out to locational adjustment, the first figure and the second graph that complete after exposure engages by this mask plate are overlaped;
When certain positional relationship between described the first figure and second graph misplaces for existing, described method of carrying out locational adjustment can be: do not have described dislocation between the first figure of forming and second graph on substrate after completing exposure and engaging time, to for expose engage mask plate carry out locational adjustment, make by this mask plate complete exposure engage after the first figure and second graph between there is described dislocation.
Known in sum, mask plate of the present invention and realize the method that exposure engages, all can effectively guarantee the precision that exposure engages, thereby avoid exposure to engage bad generation.
The above, be only preferred embodiment of the present invention, is not intended to limit protection scope of the present invention.
Claims (10)
1. a mask plate, it is characterized in that, this mask plate is provided with figure for the position engaging of exposing, this figure is used for: expose after joint in conjunction with the described figure on described mask plate, form the figure that can carry out to described mask plate locational adjustment with certain positional relationship on substrate.
2. mask plate according to claim 1, is characterized in that, described mask plate comprises the first mask plate, the second mask plate; Be provided with the first figure at described the first mask plate for the position engaging of exposing, be provided with second graph at described the second mask plate for the position engaging of exposing, described the first figure and second graph form the figure that can carry out to described mask plate locational adjustment with certain positional relationship after described base board to explosure being engaged by described the first mask plate and the second mask plate on described substrate.
3. mask plate according to claim 2, is characterized in that, described the first figure is arranged at one end of described the first mask plate, and described second graph is arranged at one end or opposite end identical with described the first mask plate on described the second mask plate.
4. mask plate according to claim 1, it is characterized in that, can or there is the second graph misplacing with the first graphics overlay forming on described substrate after described base board to explosure being engaged containing the first figure and by described mask plate in the described graphics package on described mask plate on described substrate.
5. mask plate according to claim 4, is characterized in that, described the first figure is arranged at one end of described mask plate, and described second graph is arranged at the opposite end of described mask plate.
6. according to the mask plate described in claim 2 to 5 any one, it is characterized in that, the quantity of described the first figure and/or second graph be one, two or more.
7. mask plate according to claim 1, is characterized in that, described figure is hole, or comprises hole.
8. realize based on the mask plate described in claim 1 to 7 any one the method that exposure engages, it is characterized in that, the method comprises:
Step 1, expose and engage in conjunction with the described figure on described mask plate after, on substrate, form and there is the figure of certain positional relationship;
Step 2, according to this figure, described mask plate is carried out to locational adjustment.
9. method according to claim 8, is characterized in that, after the described figure described in described combination on mask plate exposes and engages, forms the figure with certain positional relationship and comprise at least one in following mode on substrate:
Mode one, apply described mask plate to described base board to explosure, on described substrate, form the first figure in described figure; In the time that this mask plate of subsequent applications engages described base board to explosure, on described substrate, form with described the first graphics overlay or have the second graph misplacing; Or,
Apply described mask plate to described base board to explosure, on described substrate, form the first figure in described figure; In the time that this mask plate of subsequent applications engages described base board to explosure, on described substrate, form with described the first graphics overlay or have the second graph misplacing, be also formed for realizing the first figure that exposure engages next time;
Mode two, apply a mask plate in described mask plate to described base board to explosure, on described substrate, form the first figure in described figure, when another piece mask plate in mask plate described in subsequent applications engages described base board to explosure, on described substrate, form with described the first graphics overlay or have the second graph misplacing; Or,
Apply a mask plate in described mask plate to described base board to explosure, on described substrate, form the first figure in described figure, when another piece mask plate in mask plate described in subsequent applications engages described base board to explosure, on described substrate, form with described the first graphics overlay or have the second graph misplacing, being also formed for realizing the first figure that exposure engages next time.
10. method according to claim 9, is characterized in that,
When certain positional relationship between described the first figure and second graph is overlapping, described method of carrying out locational adjustment is: when after completing exposure and engaging, the first figure of forming on substrate and second graph could not overlap, according to the size differing between the first figure and second graph, the mask plate engaging for exposing is carried out to locational adjustment, the first figure and the second graph that complete after exposure engages by this mask plate are overlaped;
When certain positional relationship between described the first figure and second graph misplaces for existing, described method of carrying out locational adjustment is: do not have described dislocation between the first figure of forming and second graph on substrate after completing exposure and engaging time, to for expose engage mask plate carry out locational adjustment, make by this mask plate complete exposure engage after the first figure and second graph between there is described dislocation.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210545317.4A CN103869602A (en) | 2012-12-14 | 2012-12-14 | Mask plate, and method of mask plate used for realizing exposure joint |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210545317.4A CN103869602A (en) | 2012-12-14 | 2012-12-14 | Mask plate, and method of mask plate used for realizing exposure joint |
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| CN103869602A true CN103869602A (en) | 2014-06-18 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201210545317.4A Pending CN103869602A (en) | 2012-12-14 | 2012-12-14 | Mask plate, and method of mask plate used for realizing exposure joint |
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Cited By (3)
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| CN104391431A (en) * | 2014-12-12 | 2015-03-04 | 合肥京东方光电科技有限公司 | Exposure development method and system and exposure control system |
| CN105045047A (en) * | 2015-09-07 | 2015-11-11 | 深圳市路维光电股份有限公司 | Circular-ring-piece-shaped chromium plate exposure fixture and exposure method |
| CN107589631A (en) * | 2017-10-16 | 2018-01-16 | 京东方科技集团股份有限公司 | Mask plate and its manufacture method, display panel, Trackpad |
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| CN102376566A (en) * | 2010-08-19 | 2012-03-14 | 三星电子株式会社 | Method of forming a pattern structure for a semiconductor device |
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| CN1490674A (en) * | 2002-10-15 | 2004-04-21 | 友达光电股份有限公司 | Hoods for graduated exposion plate method and determining method thereof |
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| CN104391431A (en) * | 2014-12-12 | 2015-03-04 | 合肥京东方光电科技有限公司 | Exposure development method and system and exposure control system |
| US9946170B2 (en) | 2014-12-12 | 2018-04-17 | Boe Technology Group Co., Ltd. | Method for exposure and development, system for controlling exposure and system for exposure and development |
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| CN107589631B (en) * | 2017-10-16 | 2020-12-01 | 京东方科技集团股份有限公司 | Mask plate and manufacturing method thereof, display panel and touch panel |
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Application publication date: 20140618 |