CN103853055B - The real-time control method of reaction chamber baking and device - Google Patents
The real-time control method of reaction chamber baking and device Download PDFInfo
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- CN103853055B CN103853055B CN201210495300.2A CN201210495300A CN103853055B CN 103853055 B CN103853055 B CN 103853055B CN 201210495300 A CN201210495300 A CN 201210495300A CN 103853055 B CN103853055 B CN 103853055B
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Abstract
The present invention proposes the real-time control method of a kind of reaction chamber baking, for obtaining the vacuum environment of reaction chamber;Comprise the following steps: the initial pressure of detection reaction chamber;Start baking to heat;Obtain the pressure of reaction chamber in real time, thus obtain the pressure trend of reaction chamber;Pressure trend according to reaction chamber judges the pressure state residing for reaction chamber;Baking is terminated when pressure state reaches predetermined state.The real-time control method of the reaction chamber baking of the embodiment of the present invention has the advantage that the Bake Out time is short, efficiency is high, and ensure that the advantage that reaction chamber meets technological requirement.The invention allows for the real-time control apparatus of a kind of reaction chamber baking.
Description
Technical field
The present invention relates to microelectronics technology, the real-time control method toasted particularly to a kind of reaction chamber and dress
Put.
Background technology
Reaction chamber baking process needs the highest vacuum condition, and generally vacuum requirement reaches 10-8Torr amount
Level.Owing to being adsorbed with the impurity such as water inside process cavity, the simple vacuum environment being extremely difficult to by vacuum pumping require.Now, one
As toast out at the impurity within process cavity by absorption by the way of filament heating, then take away through molecular pump or condenser pump,
Thus obtain the vacuum environment that reaction chamber baking process needs.This method is referred to as Bake Out.
Existing chamber baking technology is heating power and the heat time heating time rule of thumb setting heat filament, Bake Out
After completing, whether the local vacuum (Base Pressure) of test and Pressure Rise Rate (Rate Of Rise) meet process requirements, if not
Meet and require to continue Bake Out until meeting and requiring.In order to avoid Bake Out is insufficient, repeat asking of BakeOut
Topic, typically can set the longer time abundant to ensure Bake Out.
The shortcoming of prior art: the problem that there is repetition Bake Out in baking process, and Bake Out time ratio
Longer, inefficiency.
Summary of the invention
The purpose of the present invention is intended at least solve one of described technological deficiency or provide at a kind of useful business to select.
To this end, it is an object of the present invention to propose the real-time control method of a kind of reaction chamber baking, this controlling party
Method has the advantage that the Bake Out time is short, efficiency is high.
Further object is that the real-time control apparatus that the baking of a kind of reaction chamber is provided.
To achieve these goals, the embodiment of first aspect present invention proposes the real-time control of a kind of reaction chamber baking
Method processed, for obtaining the vacuum environment of described reaction chamber;Comprise the following steps: the initial pressure of detection reaction chamber;Open
Beginning baking is heated;Obtain the pressure of described reaction chamber in real time, thus obtain the pressure trend of described reaction chamber;According to
The pressure trend of described reaction chamber judges the pressure state residing for described reaction chamber;When described pressure state reaches pre-
Determine during state, to terminate baking.
The real-time control method of reaction chamber baking according to embodiments of the present invention, it is possible to disposably complete Bake Out,
Avoid repeatedly Bake Out, thus reduce the Bake Out time, improve the efficiency of Bake Out.It addition, the method according to
Pressure trend in reaction chamber automatically controls the time of Bake Out, has the advantage that precision is high, thus ensures reaction
Technological requirement is met in chamber.
It addition, the real-time control method of reaction chamber according to the above embodiment of the present invention baking can also have the most attached
The technical characteristic added:
In an embodiment of the present invention, described predetermined state is the state that described reaction chamber obtains vacuum environment.
In an embodiment of the present invention, described predetermined state is that the pressure of described reaction chamber experienced by after downward trend one
The state that straight holding is constant.
In an embodiment of the present invention, described pressure state includes that the first pressure state is to the 4th pressure state.
In an embodiment of the present invention, the pressure of chamber described in described first pressure state becomes propradation, and described
The pressure of chamber described in two pressure states is steady statue, and the pressure of chamber described in described three-pressure state becomes to decline shape
State, described in described 4th pressure state, the pressure of chamber is steady statue, and described predetermined state is described 4th pressure state.
In an embodiment of the present invention, the force value of described 4th pressure state is less than the pressure of described second pressure state
Value.
The embodiment of second aspect present invention proposes the real-time control apparatus of a kind of reaction chamber baking, is used for obtaining institute
State the vacuum environment of reaction chamber, including: detection module, the pressure in detection reaction chamber in real time;Computing module, is used for
Calculate the difference of adjacent twice pressure, thus obtain the pressure trend of described reaction chamber;Judge module, for according to described
Pressure trend judges the pressure state residing for described reaction chamber;And control module, for reaching when described pressure state
Baking is terminated during to predetermined state.
The real-time control apparatus of reaction chamber baking according to embodiments of the present invention, it is possible to disposably complete Bake Out,
Avoid repeatedly Bake Out, thus reduce the Bake Out time, improve the efficiency of Bake Out.It addition, the method according to
Pressure trend in reaction chamber automatically controls the time of Bake Out, has the advantage that precision is high, thus ensures reaction
Technological requirement is met in chamber.
It addition, the real-time control apparatus of reaction chamber according to the above embodiment of the present invention baking can also have the most attached
The technical characteristic added:
In an embodiment of the present invention, described predetermined state is the state that described reaction chamber obtains vacuum environment.
In an embodiment of the present invention, described predetermined state is that the pressure of described reaction chamber experienced by after downward trend one
The state that straight holding is constant.
In an embodiment of the present invention, described pressure state includes that the first pressure state is to the 4th pressure state.
In an embodiment of the present invention, the pressure of chamber described in described first pressure state becomes propradation, and described
The pressure of chamber described in two pressure states is steady statue, and the pressure of chamber described in described three-pressure state becomes to decline shape
State, described in described 4th pressure state, the pressure of chamber is steady statue, and described predetermined state is described 4th pressure state.
In an embodiment of the present invention, the force value of described 4th pressure state is less than the pressure of described second pressure state
Value.
Aspect and advantage that the present invention adds will part be given in the following description, and part will become from the following description
Obtain substantially, or recognized by the practice of the present invention.
Accompanying drawing explanation
Of the present invention and/or additional aspect and advantage will become from the following description of the accompanying drawings of embodiments
Substantially with easy to understand, wherein:
Fig. 1 is the schematic diagram of the real-time control method of reaction chamber baking according to an embodiment of the invention;
Fig. 2 is the flow chart of the real-time control method of reaction chamber baking according to an embodiment of the invention;And
Fig. 3 is the schematic diagram of the real-time control apparatus of reaction chamber baking according to an embodiment of the invention.
Detailed description of the invention
Embodiments of the invention are described below in detail, and the example of described embodiment is shown in the drawings, the most from start to finish
Same or similar label represents same or similar element or has the element of same or like function.Below with reference to attached
The embodiment that figure describes is exemplary, is only used for explaining the present invention, and is not construed as limiting the claims.
In describing the invention, it is to be understood that term " longitudinally ", " laterally ", " on ", D score, "front", "rear",
The orientation of the instruction such as "left", "right", " vertically ", " level ", " top ", " end " " interior ", " outward " or position relationship are for based on accompanying drawing institute
The orientation shown or position relationship, be for only for ease of and describe the present invention and simplify description rather than instruction or the dress of hint indication
Put or element must have specific orientation, with specific azimuth configuration and operation, therefore it is not intended that limit to the present invention
System.
In describing the invention, it should be noted that unless otherwise prescribed and limit, term " is installed ", " being connected ",
" connect " and should be interpreted broadly, for example, it may be mechanically connected or electrical connection, it is also possible to be the connection of two element internals, can
Being to be joined directly together, it is also possible to be indirectly connected to by intermediary, for the ordinary skill in the art, can basis
Concrete condition understands the concrete meaning of described term.
Below with reference to the accompanying drawings real-time control method and device that reaction chamber according to embodiments of the present invention toasts are described.
The real-time control method of the reaction chamber baking of the embodiment of the present invention, for obtaining the vacuum environment of reaction chamber,
Comprise the following steps: the initial pressure of detection reaction chamber;Start baking to heat;Obtain the pressure of reaction chamber in real time, thus
Obtain the pressure trend of reaction chamber;Pressure trend according to reaction chamber judges the pressure shape residing for reaction chamber
State;Baking is terminated when pressure state reaches predetermined state.In one embodiment of the invention, reaction chamber is but does not limits
In PVD(Physical Vapor Deposition, physical vapour deposition (PVD)), the reaction chamber of the various semiconductor equipments such as MOCVD
Room.In one embodiment of the invention, predetermined state is the state that reaction chamber obtains vacuum environment, or predetermined state is
The pressure of reaction chamber is always maintained at constant state after experienced by downward trend.
As a concrete example, as it is shown in figure 1, be the reality of the reaction chamber baking according to one embodiment of the invention
The schematic diagram of period control method.
Reaction chamber in the real-time control method (Bake Out process) of reaction chamber baking according to embodiments of the present invention
The change of pressure (P) (t) in time whole Bake Out flow process is divided into A, B, C and D four-stage, the most corresponding above-mentioned
Four pressure states.
The A stage, the i.e. first pressure state, the Bake Out incipient stage, rise due to reaction chamber temperature and toast out
The reaction chamber pressure ascending amount that causes of gas bleed the air pressure slippage caused more than vacuum pump, therefore in reaction chamber
Pressure general performance is that chamber pressure rises, and the i.e. first pressure state lower chambers pressure becomes propradation, as it is shown in figure 1, chamber
Interior pressure is risen to P1 by P0.
B-stage, i.e. under the second pressure state, specifically, along with the continuity of Bake Out time, chamber temp is the most steady
Fixed, the extraction amount toasting gas out and vacuum pump is suitable, basically reaches a balance, and chamber pressure is stable at P1, i.e.
The pressure of the second pressure state lower chambers is steady statue.
C-stage, i.e. under three-pressure state, the residual gas of chamber internal adsorption reduces further, and chamber pressure is with vacuum pump
Extraction gradually decrease, i.e. the pressure of three-pressure state lower chambers becomes decline state.As it is shown in figure 1, be gradually decreased to P2 by P1.
In the D stage, i.e. under the 4th pressure state, residual gas and the extraction of vacuum pump that Bake Out goes out reach flat again
Weighing apparatus, pressure stability is at P2, and the pressure of the i.e. the 4th pressure state lower chambers is steady statue.Now, Bake Out will be the biggest
The adsorbed gas of part toasts out, can stop flow process.Further in conjunction with Fig. 1, in this example, the pressure of the 4th pressure state
Force value is less than the force value of the second pressure state, i.e. P2 < P0.It is understood that in this example, predetermined state is the 4th pressure
Power state.
As in figure 2 it is shown, be the flow chart of the real-time control method of the reaction chamber baking according to one embodiment of the invention.
Specifically, shown in Fig. 1, the real-time control method of reaction chamber baking according to an embodiment of the invention, including following
Step:
Step S201, starts.I.e. Bake Out starts.
Step S202, obtains chamber initial pressure, is designated as P0.Specifically, after Bake Out starts, first obtain chamber
Initial pressure P0, wherein, initial pressure can be through but not limited to: software, piezometer etc. obtain.
Step S203, sets Bake Out power, starts to heat, and record initial time (being designated as t0).Specifically,
Bake Out flow process can be integrated on PMC and ctc software, it is achieved automatically controls, and sets Bake Out power, starts to enter chamber
Row is heated, and records initial time t0 now.
Step S204, it is judged that whether the A stage completes.Specifically, after Bake Out starts, i.e. during t0, flow process enters A rank
Section, if completed, then performs step S205;If be not fully complete, then repeated execution of steps S204, i.e. continues whether judge the A stage
Complete.
Step S205, records chamber pressure P1 and time t1.
Specifically, after judging that the A stage completes, the pressure value P 1 of software records now chamber and time t1 now.
Step S206, it is judged that whether B-stage completes.
Specifically, after the A stage completes, flow process enters B-stage, if completed, performs step S207;If be not fully complete,
Then repeated execution of steps S206, i.e. continues to judge whether B-stage completes.
Step S207, records time t2.Specifically, owing to the pressure in B-stage chamber is in steady statue, i.e. force value
For P1, thus when B-stage completes, force value or P1, record time t2 now.
Step S208, it is judged that whether C-stage completes.Specifically, after B-stage completes, flow process enters C-stage, it is judged that C rank
Whether section completes, if completed, then performs step S209;If be not fully complete, then repeated execution of steps S208, i.e. continues to judge C
Whether the stage completes.
Step S209, records chamber pressure P2 and time t3.
Specifically, after judging that C-stage completes, software records chamber pressure force value P2 now and time t3 now.
Step S210, completes Bake Out, stops heating.Specifically, after C-stage completes, flow process enters the D stage, this
Time, the pressure stability in chamber, at P2, stops heating, and Bake Out flow process terminates.
In above-mentioned steps, it is determined that whether A, B, C and D stage completes to realize in the following way, specifically, by very
Empty rule read the pressure of chamber in real time, change according to the pressure of chamber and judge which stage Bake Out is in.Specifically
Ground, reads in real time the pressure of chamber, judges the variation tendency of pressure according to the difference of the pressure of front and back twice, such as: after once
More than the front pressure once recorded, the pressure recorded shows that pressure rises, otherwise show that pressure declines, the equal table of force value front and back
Bright pressure is constant.Bake out starts, and current time is t0, then enter A stage, software supervision chamber pressure in t0 moment flow process
Change, if pressure is constantly in ascendant trend, then shows still in the A stage, if pressure is constant, keep constant, then shows
Bake out enters B-stage;Continue the change of monitoring chamber pressure, show still in B-stage if pressure keeps constant, if
Pressure trend is downward trend, then show that Bake out enters C-stage;Continue the change of monitoring chamber pressure, if pressure
Power keeps downward trend, then show, still in C-stage, to continue the change of monitoring chamber pressure, if the constant holding of pressure
Constant, then show that Bake out enters the D stage, at this point it is possible to think that the adsorbed gas of the overwhelming majority is dried by Bake out
Bake, it is determined that Bake out completes, i.e. it is believed that Bake out terminates, thus terminate baking.
In the examples described above, after obtaining chamber initial pressure P0, the power of Bake Out can be automatically set by software,
Start chamber is heated, and record initial time t0 now.
The real-time control method of reaction chamber baking according to embodiments of the present invention, it is possible to disposably complete Bake Out,
Avoid repeatedly Bake Out, thus reduce the Bake Out time, improve the efficiency of Bake Out.It addition, the method according to
Pressure trend in reaction chamber automatically controls the time of Bake Out, has the advantage that precision is high, thus ensures reaction
Technological requirement is met in chamber.
Fig. 3 is the schematic diagram of the real-time control apparatus of reaction chamber baking according to an embodiment of the invention.
As it is shown on figure 3, further embodiment of the present invention proposes the real-time control apparatus of a kind of reaction chamber baking
300, for obtaining the vacuum environment of reaction chamber, including: detection module 310, computing module 320, judge module 330 and control
Module 340.
Specifically, the detection module 310 pressure in detection reaction chamber in real time.Computing module 320 is used for calculating phase
The difference of adjacent twice pressure, thus obtain the pressure trend of reaction chamber.Judge module 330 is for the pressure according to reaction chamber
Power variation tendency judges the pressure state residing for reaction chamber.In one embodiment of the invention, pressure state includes first
Pressure state, the second pressure state, three-pressure state and the 4th pressure state, and the pressure one-tenth of the first pressure state middle chamber
Propradation, the pressure of the second pressure state middle chamber is steady statue, and the pressure of three-pressure state middle chamber becomes to decline shape
State, the pressure of the 4th pressure state middle chamber is steady statue.Wherein the force value of the 4th pressure state is less than the second pressure shape
The force value of state, such as: the force value of the 4th pressure state is P2, the force value of the second pressure state is P1, i.e. P2 < P1.Control
Molding block 340 for terminating baking when pressure state reaches predetermined state.In one embodiment of the invention, predetermined state
Obtain the state of vacuum environment for reaction chamber, or the pressure that predetermined state is reaction chamber experienced by after downward trend always
Keep constant state.It is understood that predetermined state is also the 4th above-mentioned pressure state.
As a specifically example, the work process of the real-time control apparatus 300 of above-mentioned reaction chamber baking is as follows:
After baking starts, i.e. Bake Out starts, and is first detected and record the initial pressure in chamber by detection module 310
Power, is designated as P0, then heats chamber, and along with the rising of temperature, the pressure in chamber changes the most therewith.Calculate mould
Block 320 obtains the variation tendency of cavity indoor pressure by the difference calculating adjacent twice pressure, it is judged that module 330 becomes according to this change
Gesture judges the pressure state residing for reaction chamber.Specifically, after Bake Out starts, the pressure in chamber is the first pressure shape
State, i.e. pressure are gradually increased, when pressure is raised to some value (being designated as P1) and keeps constant, and the now pressure state in chamber
Be the second pressure state, i.e. pressure keeps constant, when the force value in chamber starts to reduce from P1, and the pressure state in chamber
It is that three-pressure state, i.e. pressure are gradually reduced.When the pressure in chamber is re-lowered to some value (being designated as P2) and keeps
Time constant, now, to be that the 4th pressure state, i.e. pressure are maintained at P2 constant for the pressure state in chamber.Wherein, P2 < P1.Enter one
Step ground, control module 340 judges whether to terminate baking according to the pressure state in chamber, and when pressure state reaches predetermined state
Time terminate baking.Such as: when control module 330 judges when the pressure state in front chamber is four pressure state, it is believed that
The adsorbed gas of the overwhelming majority is toasted out by Bake Out, it is possible to determine that has now substantially met technique in chamber and has wanted
Asking, therefore, BakeOut terminates, and stops heating chamber, i.e. baking terminates.
The real-time control apparatus of reaction chamber baking according to embodiments of the present invention, it is possible to disposably complete Bake Out,
Avoid repeatedly Bake Out, thus reduce the Bake Out time, improve the efficiency of Bake Out.It addition, the method according to
Pressure trend in reaction chamber automatically controls the time of Bake Out, has the advantage that precision is high, thus ensures reaction
Technological requirement is met in chamber.
In the description of this specification, reference term " embodiment ", " some embodiments ", " example ", " specifically show
Example " or the description of " some examples " etc. means to combine this embodiment or example describes specific features, structure, material or spy
Point is contained at least one embodiment or the example of the present invention.In this manual, to the schematic representation of described term not
Necessarily refer to identical embodiment or example.And, the specific features of description, structure, material or feature can be any
One or more embodiments or example in combine in an appropriate manner.
Although an embodiment of the present invention has been shown and described, for the ordinary skill in the art, permissible
Understand and these embodiments can be carried out multiple change without departing from the principles and spirit of the present invention, revise, replace
And modification, the scope of the present invention is limited by claims and equivalent thereof.
Claims (12)
1. a real-time control method for reaction chamber baking, for obtaining the vacuum environment of described reaction chamber;Its feature exists
In, comprise the following steps:
The initial pressure of detection reaction chamber;
Start baking to heat;
Obtain the pressure of described reaction chamber in real time, thus obtain the pressure trend of described reaction chamber;
Pressure trend according to described reaction chamber judges the pressure state residing for described reaction chamber;
Baking is terminated when described pressure state reaches predetermined state.
2. the real-time control method of reaction chamber baking as claimed in claim 1, it is characterised in that described predetermined state is institute
State reaction chamber and obtain the state of vacuum environment.
3. the real-time control method of reaction chamber baking as claimed in claim 1, it is characterised in that described predetermined state is institute
State after the pressure of reaction chamber experienced by downward trend and be always maintained at constant state.
4. the real-time control method of reaction chamber baking as claimed in claim 1, it is characterised in that described pressure state includes
First pressure state, the second pressure state, three-pressure state and the 4th pressure state.
5. the real-time control method of reaction chamber baking as claimed in claim 4, it is characterised in that wherein, described first pressure
The pressure of chamber described in power state becomes propradation, and described in described second pressure state, the pressure of chamber is steady statue,
The pressure of chamber described in described three-pressure state becomes decline state, and described in described 4th pressure state, the pressure of chamber is
Steady statue, described predetermined state is described 4th pressure state.
6. the real-time control method of reaction chamber baking as claimed in claim 5, it is characterised in that wherein, described 4th pressure
The force value of power state is less than the force value of described second pressure state.
7. a real-time control apparatus for reaction chamber baking, for obtaining the vacuum environment of described reaction chamber;Its feature exists
In, including:
Detection module, the pressure in detection reaction chamber in real time;
Computing module, is used for calculating the difference of adjacent twice pressure, thus obtains the pressure trend of described reaction chamber;
Judge module, for judging the pressure state residing for described reaction chamber according to described pressure trend;And
Control module, for terminating baking when described pressure state reaches predetermined state.
8. the real-time control apparatus of reaction chamber baking as claimed in claim 7, it is characterised in that described predetermined state is institute
State reaction chamber and obtain the state of vacuum environment.
9. the real-time control apparatus of reaction chamber baking as claimed in claim 7, it is characterised in that described predetermined state is institute
State after the pressure of reaction chamber experienced by downward trend and be always maintained at constant state.
10. the real-time control apparatus of reaction chamber baking as claimed in claim 7, it is characterised in that described pressure state bag
Include the first pressure state, the second pressure state, three-pressure state and the 4th pressure state.
The real-time control apparatus of 11. reaction chamber as claimed in claim 10 bakings, it is characterised in that wherein, described first
The pressure of chamber described in pressure state becomes propradation, and described in described second pressure state, the pressure of chamber is for stablize shape
State, the pressure of chamber described in described three-pressure state becomes decline state, the pressure of chamber described in described 4th pressure state
Power is steady statue, and described predetermined state is described 4th pressure state.
The real-time control apparatus of 12. reaction chamber as claimed in claim 11 bakings, it is characterised in that wherein, the described 4th
The force value of pressure state is less than the force value of described second pressure state.
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DE69420474T2 (en) * | 1993-06-30 | 2000-05-18 | Applied Materials Inc | Process for rinsing and pumping out a vacuum chamber to ultra-high vacuum |
US6476367B2 (en) * | 2001-02-20 | 2002-11-05 | Chartered Semiconductor Manufacturing Ltd. | Auto-bake out system |
KR100379210B1 (en) * | 2002-04-19 | 2003-04-08 | 피.에스.케이.테크(주) | Method for Semiconductor Wafer Ashing |
CN100444346C (en) * | 2005-12-08 | 2008-12-17 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Method for controlling molecular pump for semiconductor etching device |
CN100521104C (en) * | 2006-09-19 | 2009-07-29 | 北京北方微电子基地设备工艺研究中心有限责任公司 | A control method for semiconductor etching device |
CN101408753A (en) * | 2007-10-11 | 2009-04-15 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Method and apparatus for controlling process terminal |
CN101748393B (en) * | 2009-12-16 | 2012-09-05 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Heating control method of production line equipment and device |
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Address after: 100176 Beijing economic and Technological Development Zone, Wenchang Road, No. 8, No. Patentee after: Beijing North China microelectronics equipment Co Ltd Address before: 100176 Beijing economic and Technological Development Zone, Wenchang Road, No. 8, No. Patentee before: Beifang Microelectronic Base Equipment Proces Research Center Co., Ltd., Beijing |
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