CN103825089B - Near field focus planar array antenna - Google Patents
Near field focus planar array antenna Download PDFInfo
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- CN103825089B CN103825089B CN201410073747.XA CN201410073747A CN103825089B CN 103825089 B CN103825089 B CN 103825089B CN 201410073747 A CN201410073747 A CN 201410073747A CN 103825089 B CN103825089 B CN 103825089B
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Abstract
The invention discloses that a kind of efficiency is higher and small volume, lower-cost near field focus planar array antenna。This array antenna includes the first metal copper clad layers, first medium layer, the second metal copper clad layers, second dielectric layer, the 3rd metal copper clad layers, the 3rd dielectric layer, the 4th metal copper clad layers, the 4th dielectric layer and the fifth metal copper clad layers that are cascading from top to bottom, and first medium layer is provided with metallization radiating aperture；Second dielectric layer is provided with metallization phase shift hole；3rd dielectric layer is provided with metallization transitional pore；4th dielectric layer is provided with substrate integration wave-guide and presents network。Near field focus planar array antenna of the present invention adopts metallization phase shift hole to realize phase compensation, and compensation range is big, simple in construction, excellent performance, the efficiency of antenna is higher, and can be greatly reduced the volume of antenna, reduce cost, additionally can complete the adjustment of different focal position。It is adapted at microwave and millimeter wave antenna technical field popularization and application。
Description
Technical field
The present invention relates to microwave and millimeter wave antenna technical field, be specifically related to a kind of near field focus planar array antenna。
Background technology
Point focusing antenna relies on its electromagnetic wave focusing effect, is widely used in the occasions such as microwave and millimeter wave imaging, wireless power transfer, wireless radiofrequency identification, microwave medical treatment。
Traditional focusing anteena can be divided into two big classes according to profile: on-plane surface focusing anteena and plane focusing anteena。Wherein, on-plane surface focusing anteena includes parabola antenna and dielectric lens antenna；Flat focus antenna is mainly patch array antenna。
Traditional on-plane surface focusing anteena, such as parabola antenna, dielectric lens antenna etc., although can realize good focus characteristics, but due to antenna structure on-plane surface, it is necessary to accurate machining, and bulky, with high costs, it is difficult to miniaturization, is unfavorable for integrated with planar circuit。Traditional flat focus antenna, by the length of fed microstrip between adjustment driving source to antenna element, to realize the feed to paster antenna out of phase。Although flat focus antenna can reduce processing cost, overcome integrated difficulty, but it there is also some problems。
It has been proposed, for example, that a kind of Section of Microstrip Antenna Array with focus characteristics。This antenna structure comprises one layer of dielectric layer and two layers of metal copper clad layers, and lower metal copper clad layers constitutes the ground of microstrip antenna, and upper strata metal copper clad layers constitutes microstrip line power divider network, phase-shift network and paster radiating element。The focus characteristics of said structure provides phase contrast to realize by the phase-shift network in the metal copper clad layers of upper strata for paster radiating element, and this phase-shift network is realized by the microstrip line of Length discrepancy, on paster radiating element, given reference phase difference is produced, thus realizing electromagnetic wave focus characteristics after electromagnetic wave is by the microstrip line of different length。In this structure, phase change is realized by Length discrepancy microstrip line, and when phase contrast requires bigger, in phase-shift network, microstrip line can be very long, causes that this array entire area increases, is unfavorable for miniaturization, too increases cost；Microstrip line and discontinuous corner thereof have radiation, while reducing feed efficiency, also affect focusing effect。
And for example, also it is proposed and a kind of utilizes the phase shifter to control antenna phase thus realizing having the focusing anteena of focal length variable characteristic。This structure is made up of dipole antenna, power distributing network and phase shifter；24 dipole antenna aligned transfer become three circles, and each circle comprises 8 dipole antennas。8 dipole antennas on same circle are by one one point eight power distributing network feeds, and three power distributing networks are respectively to three circles totally 24 dipole antenna feeds；The above three power distributing network phase shifters different from two respectively connect, and are finally connected to signal source by one point of four power distributing network。Dipole antenna on difference circle can be carried out phase controlling by the phase shifter by this focusing anteena, focuses on variable with focal length thus realizing electromagnetic wave。This structure have employed four power distributing networks and two phase shifters so that whole system structure is complicated, cost is high, unacceptable when frequency applications and large scale application。
Above two typically focuses on array antenna, although process and design relatively easy, it is achieved that planarization design, but is difficult to take into account the demands such as miniaturization, high efficiency, low cost。
Summary of the invention
The technical problem to be solved is to provide that a kind of efficiency is higher and small volume, lower-cost near field focus planar array antenna。
This invention address that above-mentioned technical problem be the technical scheme is that this near field focus planar array antenna, including the first metal copper clad layers being cascading from top to bottom, first medium layer, the second metal copper clad layers, second dielectric layer, the 3rd metal copper clad layers, the 3rd dielectric layer, the 4th metal copper clad layers, the 4th dielectric layer and fifth metal copper clad layers, described first medium layer is provided with the identical metallization radiating aperture of multiple diameter and described metallization radiating aperture runs through the first metal copper clad layers, first medium layer；Being provided with the metallization phase shift hole of multiple different-diameter in described second dielectric layer, the plurality of metallization phase shift hole and multiple metallization radiating aperture one_to_one corresponding and coaxial, the second metal copper clad layers, second dielectric layer are run through in described metallization phase shift hole；Being provided with the metallization transitional pore that multiple diameter is identical on described 3rd dielectric layer, the plurality of metallization transitional pore and multiple metallization phase shift hole one_to_one corresponding and coaxial, described metallization transitional pore runs through the 3rd metal copper clad layers, the 3rd dielectric layer；Described 4th dielectric layer is provided with substrate integration wave-guide and presents network。
It is further, described substrate integration wave-guide is also presented network and is made up of multilevel subnetwork network, every one-level sub-network includes multiple "T"-shaped head, two outfans of the "T"-shaped head of upper level sub-network are connected with the input of the two of next stage sub-network "T"-shaped heads respectively, periodic arrangement goes down to collectively constitute substrate integration wave-guide and presents network, described "T"-shaped head is made up of three substrate integrated waveguide single units, 4th dielectric layer arranges two row's plated-through holes and described plated-through hole runs through the 4th metal copper clad layers, 4th dielectric layer and fifth metal copper clad layers form described substrate integrated waveguide single unit, the join domain of described three substrate integrated waveguide singles unit is provided with metallization mating hole, described 4th metal copper clad layers is additionally provided with feed groove, described feed groove is positioned at metallization transitional pore。
Further, the FR4 material that described first medium layer, second dielectric layer adopt dielectric constant to be 4.5 is made, and the RF35 material that described 3rd dielectric layer, the 4th dielectric layer adopt dielectric constant to be 3.5 is made。
Further, the thickness of described first medium layer is 1.6mm, and the thickness of second dielectric layer is 6.4mm, and the thickness of the 3rd dielectric layer is 1.52mm, and the thickness of the 4th dielectric layer is 0.508mm。
Further, the diameter of described metallization radiating aperture and metallization transitional pore is 18mm, and distance arrays center is followed successively by 18mm, 18.8mm, 20mm from as far as nearly metallization phase shift bore dia。
Further, the width of described substrate integrated waveguide single unit is 10mm。
Further, the diameter of described plated-through hole is 0.5mm, and the hole heart is from for 0.95mm。
Further, the length of described feed groove is 11.9mm, and width is 0.3mm, and the distance of skew substrate integrated waveguide single unit centrage is 0.1mm。
Beneficial effects of the present invention: near field focus planar array antenna of the present invention adopts metallization phase shift hole to realize phase compensation, compensation range is big, simple in construction, excellent performance, the efficiency of antenna is higher, and this metallization phase shift hole is positioned at below metallization radiating aperture, array lateral dimension will not be increased while realizing phase change, be conducive to the miniaturization of antenna, the volume of antenna can be greatly reduced, reduce cost, adopt substrate integration wave-guide and present network feeder, when high-frequency work, its advantage with the feed high and radiationless interference of efficiency, simultaneously, it is somebody's turn to do and presents network and be positioned at immediately below metallization radiating aperture, advantageously in circuit miniaturization, additionally, the focusing anteena of conventional microstrip line feed, its phase compensation comes from feeding network, once machine, cannot change, thus it is variable to be difficult to focal length, and near field focus planar array antenna of the present invention, its phase controlling structure adopts metallization phase shift pore structure, have only to the metallization phase shift hole by changing differing heights, namely the second dielectric layer with differing heights is replaced, just can complete the adjustment of different focal position, and array overall structure and layout are without variation in replacement process, save time cost, furthermore, this near field focus planar array antenna bandwidth of operation is wider, when large-scale application, performance will not worsen。
Accompanying drawing explanation
Fig. 1 is the three dimensional structure schematic diagram of near field focus planar array antenna of the present invention；
Fig. 2 is the structural representation of the first metal copper clad layers of near field focus planar array antenna of the present invention；
Fig. 3 is the structural representation of the second metal copper clad layers of near field focus planar array antenna of the present invention；
Fig. 4 is the structural representation of the 3rd metal copper clad layers of near field focus planar array antenna of the present invention；
Fig. 5 is the structural representation of the 4th metal copper clad layers of near field focus planar array antenna of the present invention；
Fig. 6 is the fundamental diagram of near field focus planar array antenna of the present invention；
Description of symbols in figure: first metal copper clad layers the 1, second metal copper clad layers the 2, the 3rd metal copper clad layers the 3, the 4th metal copper clad layers 4, feed groove 41, fifth metal copper clad layers 5, first medium layer 6, metallization radiating aperture 61, second dielectric layer 7, metallization phase shift hole the 71, the 3rd dielectric layer 8, metallization transitional pore the 81, the 4th dielectric layer 9, plated-through hole 91, metallization mating hole 92。
Detailed description of the invention
Below in conjunction with accompanying drawing, the specific embodiment of the present invention is further described。
If Fig. 1 is to shown in 5, this near field focus planar array antenna, including the first metal copper clad layers 1 being cascading from top to bottom, first medium layer the 6, second metal copper clad layers 2, second dielectric layer the 7, the 3rd metal copper clad layers the 3, the 3rd dielectric layer the 8, the 4th metal copper clad layers the 4, the 4th dielectric layer 9 and fifth metal copper clad layers 5, described first medium layer 6 is provided with the identical metallization radiating aperture 61 of multiple diameter and described metallization radiating aperture 61 runs through the first metal copper clad layers 1, first medium layer 6；Being provided with the metallization phase shift hole 71 of multiple different-diameter in described second dielectric layer 7, the plurality of metallization phase shift hole 71 and multiple metallization radiating aperture 61 one_to_one corresponding and coaxial, the second metal copper clad layers 2, second dielectric layer 7 are run through in described metallization phase shift hole 71；Being provided with the metallization transitional pore 81 that multiple diameter is identical on described 3rd dielectric layer 8, the plurality of metallization transitional pore 81 and multiple metallization phase shift hole 71 one_to_one corresponding and coaxial, described metallization transitional pore 81 runs through the 3rd metal copper clad layers the 3, the 3rd dielectric layer 8；Described 4th dielectric layer 9 is provided with substrate integration wave-guide and presents network。Near field focus planar array antenna of the present invention adopts metallization phase shift hole 71 to realize phase compensation, compensation range is big, simple in construction, excellent performance, the efficiency of antenna is higher, and this metallization phase shift hole 71 is positioned at below metallization radiating aperture 61, array lateral dimension will not be increased while realizing phase change, be conducive to the miniaturization of antenna, the volume of antenna can be greatly reduced, reduce cost, adopt substrate integration wave-guide and present real-time performance feed, when high-frequency work, its advantage with the feed high and radiationless interference of efficiency, simultaneously, this feeding network is positioned at immediately below metallization radiating aperture 61, advantageously in circuit miniaturization, additionally, the focusing anteena of conventional microstrip line feed, its phase compensation comes from feeding network, once machine, cannot change, thus it is variable to be difficult to focal length, and near field focus planar array antenna of the present invention, its phase controlling structure adopts metallization phase shift hole 71 structure, have only to the metallization phase shift hole 71 by changing differing heights, namely the second dielectric layer 7 with differing heights is replaced, just can complete the adjustment of different focal position, and array overall structure and layout are without variation in replacement process, save time cost, furthermore, this near field focus planar array antenna bandwidth of operation is wider, when large-scale application, performance will not worsen。
As shown in Figure 6, operating frequency is f to the operation principle of this near field focus planar array antenna, and operation wavelength is that the electromagnetic wave of λ is linearly propagated focal point F (0,0, R) place by XOY plane, and now focal length is R；If the thickness of second dielectric layer 7 is h, the number of metallization radiating aperture 61 is M × N；If the (i, j) and (s, t) the coordinate respectively (x of individual metallization radiating aperture 61i,yj, 0) and (xs,yt, 0), then relative to the absolute path length difference of zero (0,0,0) beWithThen from (i, j) with (s, t) individual metallization radiating aperture 61 to the relative path length difference of focus is: S=S (i, j)-S (s, t) metallization radiating aperture 61 all works in main mould, then its radius a meets: < a < λ/2.61 may determine that the radius span of metallization radiating aperture 61 accordingly in λ/3.41。
Assume S (i, j) > (s, t), if the (m, n) individual metallization phase shift hole 71 radius is that (m, n), corresponding phase constant is bSo electromagnetic wave is that (m, the propagation distance in metallization phase shift hole 71 n) is h to b at radius。Now, phase change amount is P (m, n)=β (m, n) × h。If to realize focus characteristics at focal length R place, then P (i, j)-P (s, t)=[S (i, j)-S (s, t)] × (2 π f/c), may thereby determine that (m, n) individual metallization phase shift hole 71 radius b (m, n)。
It is further, described substrate integration wave-guide is also presented network and is made up of multilevel subnetwork network, every one-level sub-network includes multiple "T"-shaped head, two outfans of the "T"-shaped head of upper level sub-network are connected with the input of the two of next stage sub-network "T"-shaped heads respectively, periodic arrangement goes down to collectively constitute substrate integration wave-guide and presents network, described "T"-shaped head is made up of three substrate integrated waveguide single units, 4th dielectric layer 9 arranges two row's plated-through holes 91 and described plated-through hole 91 runs through the 4th metal copper clad layers 4, 4th dielectric layer 9 and fifth metal copper clad layers 5 form described substrate integrated waveguide single unit, the join domain of described three substrate integrated waveguide singles unit is provided with metallization mating hole 92, described 4th metal copper clad layers 4 is additionally provided with feed groove 41, described feed groove 41 is positioned at metallization transitional pore 81。This structure and present network, compact conformation, it is possible to be integrally located at below metallization radiating aperture 61, additional circuit area will not be increased as tradition and presenting network, be conducive to array antenna miniaturization, reduce cost。
Embodiment
In the present embodiment, the mid frequency of near field focus planar array antenna is 10GHz, the FR4 material that described first medium layer 6, second dielectric layer 7 adopt dielectric constant to be 4.5 is made, the thickness of first medium layer 6 is 1.6mm, the thickness of second dielectric layer 7 be the 3rd dielectric layer the 8, the 4th dielectric layer 9 described in 6.4mm adopt dielectric constant to be 3.5, loss angle tangent be 0.0018 RF35 material be made, the thickness of the 3rd dielectric layer 8 is 1.52mm, and the thickness of the 4th dielectric layer 9 is 0.508mm；The diameter of described metallization radiating aperture 61 and metallization transitional pore 81 is 18mm；Distance arrays centre distance is followed successively by 18mm, 18.8mm, 20mm from as far as nearly metallization phase shift hole 71 diameter, and the width of described substrate integrated waveguide single unit is 10mm, and the diameter of described plated-through hole 91 is 0.5mm, and the hole heart is from for 0.95mm；The length of feed groove 4141 is 11.9mm, and width is 0.3mm, and the distance of skew substrate integration wave-guide centrage is 0.1mm。
Design result shows, in the scope of 9.9～10.1GHz, during port a feed, reflection coefficient S11 is less than 10dB；150mm place directly over distance antenna aperture, forms maximum field strength, namely achieves electromagnetic focusing。
Claims (8)
1. near field focus planar array antenna, it is characterized in that: include the first metal copper clad layers (1) being cascading from top to bottom, first medium layer (6), second metal copper clad layers (2), second dielectric layer (7), 3rd metal copper clad layers (3), 3rd dielectric layer (8), 4th metal copper clad layers (4), 4th dielectric layer (9) and fifth metal copper clad layers (5), described first medium layer (6) is provided with the identical metallization radiating aperture (61) of multiple diameter and described metallization radiating aperture (61) runs through the first metal copper clad layers (1), first medium layer (6)；Described second dielectric layer (7) is provided with the metallization phase shift hole (71) of multiple different-diameter, the plurality of metallization phase shift hole (71) and multiple metallization radiating aperture (61) one_to_one corresponding and coaxial, described metallization phase shift hole (71) runs through the second metal copper clad layers (2), second dielectric layer (7)；Described 3rd dielectric layer (8) is provided with the metallization transitional pore (81) that multiple diameter is identical, the plurality of metallization transitional pore (81) and multiple metallization phase shift hole (71) one_to_one corresponding and coaxial, described metallization transitional pore (81) runs through the 3rd metal copper clad layers (3), the 3rd dielectric layer (8)；Described 4th dielectric layer (9) is provided with substrate integration wave-guide and presents network；
The radius of described metallization radiating aperture (61) is adopted to calculate with the following method and is obtained: assuming that operating frequency is f, operation wavelength is that the electromagnetic wave of λ is linearly propagated focal point F (0,0, R) place by XOY plane, and now focal length is R；If the thickness of second dielectric layer (7) is h, the number of metallization radiating aperture (61) is M × N；If the (i, j) and (s, t) the coordinate respectively (x of individual metallization radiating aperture (61)i,yj, 0) and (xs,yt, 0), then relative to the absolute path length difference of zero (0,0,0) be With Then from (i, j) with (s, t) individual metallization radiating aperture (61) to the relative path length difference of focus is: S=S (i, j)-S (s, t), metallization radiating aperture (61) all works in main mould, then its radius a meets: < a < λ/2.61, λ/3.41, may determine that the radius span of metallization radiating aperture (61) accordingly；
The radius of described metallization phase shift hole (71) is adopted to calculate with the following method and is obtained: assume S (i, j) > S (s, t), if (m, n) individual metallization phase shift hole (71) radius is b (m, n), corresponding phase constant is So electromagnetic wave is b (m at radius, n) the propagation distance in metallization phase shift hole (71) is h, phase change amount is p (m, n)=β (m, n) × h, if to realize focus characteristics at focal length R place, then P (i, j)-P (s, t)=[S (i, j)-S (s, t)] × (2 π f/c), may thereby determine that (m, n) individual metallization phase shift hole (71) radius b (m, n)。
2. near field focus planar array antenna as claimed in claim 1, it is characterized in that: described substrate integration wave-guide is also presented network and is made up of multilevel subnetwork network, every one-level sub-network includes multiple "T"-shaped head, two outfans of the "T"-shaped head of upper level sub-network are connected with the input of the two of next stage sub-network "T"-shaped heads respectively, periodic arrangement goes down to collectively constitute substrate integration wave-guide and presents network, described "T"-shaped head is made up of three substrate integrated waveguide single units, 4th dielectric layer (9) arranges two row's plated-through holes (91) and described plated-through hole (91) runs through the 4th metal copper clad layers (4), 4th dielectric layer (9) and fifth metal copper clad layers (5) form described substrate integrated waveguide single unit, the join domain of described three substrate integrated waveguide singles unit is provided with metallization mating hole (92), described 4th metal copper clad layers (4) is additionally provided with feed groove (41), described feed groove (41) is positioned at metallization transitional pore (81)。
3. near field focus planar array antenna as claimed in claim 2, it is characterized in that: the FR4 material that described first medium layer (6), second dielectric layer (7) adopt dielectric constant to be 4.5 is made, the RF35 material that described 3rd dielectric layer (8), the 4th dielectric layer (9) adopt dielectric constant to be 3.5 is made。
4. near field focus planar array antenna as claimed in claim 3, it is characterized in that: the thickness of described first medium layer (6) is 1.6mm, the thickness of second dielectric layer (7) is 6.4mm, the thickness of the 3rd dielectric layer (8) is 1.52mm, and the thickness of the 4th dielectric layer (9) is 0.508mm。
5. near field focus planar array antenna as claimed in claim 4, it is characterised in that: the diameter of described metallization radiating aperture (61) and metallization transitional pore (81) is 18mm；Distance arrays center is followed successively by 18mm, 18.8mm, 20mm from as far as nearly metallization phase shift hole (71) diameter。
6. near field focus planar array antenna as claimed in claim 5, it is characterised in that: the width of described substrate integrated waveguide single unit is 10mm。
7. near field focus planar array antenna as claimed in claim 6, it is characterised in that: the diameter of described plated-through hole (91) is 0.5mm, and the hole heart is from for 0.95mm。
8. near field focus planar array antenna as claimed in claim 7, it is characterised in that: the length of described feed groove (41) is 11.9mm, and width is 0.3mm, and the distance of skew substrate integrated waveguide single unit centrage is 0.1mm。
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| JP2020521941A (en) * | 2016-12-29 | 2020-07-27 | ラドシー テクノロジーズ リミテッド | Antenna array |
| CN108446504B (en) * | 2018-03-22 | 2021-09-07 | 电子科技大学 | Near-field array antenna directional pattern comprehensive method based on convex optimization |
| CN108539422B (en) * | 2018-04-23 | 2020-04-14 | 电子科技大学 | Three-dimensional meandering substrate integrated waveguide near-field focusing scanning leaky-wave slot array antenna |
| FI128609B (en) * | 2018-10-12 | 2020-08-31 | Orbis Systems Oy | Arrangement and method for testing a 4.5g or a 5g base station |
| CN109755762B (en) * | 2019-03-14 | 2023-12-01 | 南京信息工程大学 | Focusing method of near-field adaptive focusing antenna applied to RFID |
| WO2020198992A1 (en) * | 2019-03-29 | 2020-10-08 | 深圳市大疆创新科技有限公司 | Dummy antenna structure and millimetre wave antenna array |
| CN111244619A (en) * | 2019-12-13 | 2020-06-05 | 南京理工大学 | Patch array antenna based on air substrate integrated waveguide |
| CN113488767B (en) * | 2021-09-06 | 2022-01-18 | 华南理工大学 | Millimeter wave high-gain plane aperture antenna and antenna array |
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