CN103777235A - Microseismic-monitoring-sensor arrangement method for stratified excavation of deeply-buried hard-rock tunnel - Google Patents
Microseismic-monitoring-sensor arrangement method for stratified excavation of deeply-buried hard-rock tunnel Download PDFInfo
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Abstract
The invention discloses a microseismic-monitoring-sensor arrangement method for stratified excavation of a deeply-buried hard-rock tunnel. When a second layer to the last layer of the tunnel are excavated, a first group/second group of microseismic sensors are installed in rock mass of a tunnel inner wall at the front/back of a tunnel face; a line obtained through downward movement of a center line of a currently-excavated-layer bottom plate for 1 meter is used as a rotating center line and the first group of microseismics sensors and the second group of microseismic sensors are distributed in the rock mass of the tunnel inner wall, the rotating center line being a central axis; and with the advancement of the tunnel face, the first group of microseismic sensors and the second groups of microseismic sensors are redistributed until tunnel excavation is completed. In the method, through use of space supplied by excavated layers of a tunnel, microseismic sensors are arranged at the front and back of excavated tunnel faces and a tunnel face of higher risks and adjacent areas of the tunnel face are included in the two groups of microseismic sensor arrayed at the front and back of the tunnel face all the time so that acquisition of micro-fracture signals is facilitated, microseism positioning precision is ensured and a basis is laid for accurate prediction and forecast of a disaster.
Description
Technical field
The present invention relates to tunnel On Microseismic Monitoring Technique, more specifically relate to the buried hard rock tunnel microseismic monitoring sensor of a kind of stage excavation method for arranging, be applicable to water conservancy and hydropower, the tunneling of traffic hierarchical.
Background technology
Tunnel during because of full face tunneling cross dimensions compared with constructing or the more high reason of risk greatly, often adopt stage excavation.Stage excavation refers to tunnel to be divided into from top to bottom multilayer, in layer progressively excavates.In the buried hard rock tunnel digging process of stage excavation, will near face, produce strong stress adjustment, while adopting drilling and blasting method excavation, can be subjected to violent blast disturbance, cause face and near easy generation rock burst thereof, cave in or fall the disastrous accidents such as piece, threaten workmen's safety, affect construction speed.
On Microseismic Monitoring Technique has carried out widespread use at present in the engineering safety monitorings such as mine, subterranean laboratory, side slope, the tunnels such as Africa, Australia, the U.S., Canada, China, has obtained a series of achievements in research.On Microseismic Monitoring Technique is to utilize the microseismic sensors that spatially different azimuth is laid, catch rock mass and produce the seismic event information that micro rupture process is sent, it is analyzed, is processed the information such as time, position, earthquake magnitude size and energy release that rear definite microseismic event occurs, infer based on this rock mass internal stress state, destruction situation, and then rock stability is assessed to early warning.
The method for arranging of microseismic monitoring sensor has material impact to the monitoring capability of microseismic activity, thus the effect of impact to rock stability assessment early warning.So far, have no the relevant report for stage excavation tunnel microseismic monitoring sensor method for arranging.Reasonably microseismic sensors arrangement not only can monitor more microseismic signals more broadly, and can make location algorithm determine fast and accurately source location and origin time, is conducive to the early warning assessment to tunnel risk.Due to the space structure feature in tunnel, microseismic monitoring sensor is generally arranged in face rear (China Patent Publication No. CN202300529U, open day 2011.10.10, utility model title " microseismic monitoring sensor arrangement in buried long tunnel TBM tunneling process ".Document " Chinese Journal of Rock Mechanics and Engineering ", the 2nd phase in 2011, Chen Ping Rui, " deep-lying tunnel TBM driving microseism Real-Time Monitoring and signature analysis ".Document " institute of Changjiang Academy of sciences report ", the 9th phase in 2012, takes off and grasps brightness, " the Deep-buried Long And Big tunnel group rock burst time space distribution based on On Microseismic Monitoring Technique is analyzed ".Document " Journal of Rock Mechanics and Geotechnical Engineering ", the 3rd phase in 2011, Tang chun an, " Preliminary engineering application of microseismic monitoring technique to rockburst prediction in tunneling of Jinping II project "), cause in microseismic sensors array is difficult to face and near rock mass thereof to be enclosed in, thereby affect to a certain extent microquake sources positioning precision, further affect Tunnel Stability monitoring and prediction effect.Therefore be necessary, for stage excavation tunnel feature, to study suitable sensor arrangement method, sensor array is included face and near rock mass thereof all the time as far as possible, improve microquake sources positioning precision, for the accurate early warning assessment of disaster lays the foundation.
Summary of the invention
The object of the invention is in view of the foregoing defects the prior art has, the buried hard rock tunnel microseismic monitoring sensor of a kind of stage excavation method for arranging is provided, solving microseismic monitoring sensor array in tunnel excavation process is difficult to face and near rock mass thereof to be enclosed in interior problem, tunnel excavation face and near more effectively micro rupture source signal thereof can be caught by microseismic sensors, improve microquake sources positioning precision, for the Accurate Prediction forecast of buried hard rock tunnel disaster lays the foundation.
The present invention is achieved through the following technical solutions:
The buried hard rock tunnel microseismic monitoring sensor of a kind of stage excavation method for arranging, comprises the steps: in the time that the tunnel second layer to last one deck excavates,
Step 1, the maximum monitoring range of microseismic sensors in monitored rock mass in tunnel is L, arrange first group of microseismic sensors, be respectively the first unidirectional microseismic sensors, the second unidirectional microseismic sensors, the 3rd unidirectional microseismic sensors and the first three-dimensional microseismic sensors, first group of microseismic sensors is all installed in tunnel inner wall rock mass by boring flush type, to boring in slip casting, make microseismic sensors and rock mass fixed coupling, length of embedment must exceed country rock relaxation depth, drilling depth is greater than microseismic sensors depth of placement, the straight line that current excavation layer base plate center line offsets downward 1m place take tunnel is rotation centerline, in the face of tunnel excavation face, it directly over rotation centerline, is 0 ° of direction, clockwise direction is that angle increases progressively direction, first group of microseismic sensors axle centered by rotation centerline is distributed in tunnel inner wall rock mass, the first three-dimensional microseismic sensors is arranged in 270 ° of directions of tunnel cross-section at L/4 place, face rear, the first unidirectional microseismic sensors is arranged in 330 ° of directions of tunnel cross-section at L/4+2m place, face rear, the second unidirectional microseismic sensors is arranged in 30 ° of directions of tunnel cross-section at L/4+4m place, face rear, the 3rd unidirectional microseismic sensors is arranged in 90 ° of directions of tunnel cross-section at L/4+6m place, face rear,
Step 2, arrange second group of microseismic sensors, be respectively the 4th unidirectional microseismic sensors, the 5th unidirectional microseismic sensors, the 6th unidirectional microseismic sensors and the second three-dimensional microseismic sensors, second group of microseismic sensors is all installed in tunnel inner wall rock mass by boring flush type, to boring in slip casting, make microseismic sensors and rock mass fixed coupling, length of embedment must exceed country rock relaxation depth, drilling depth is greater than microseismic sensors depth of placement, the straight line that current excavation layer base plate center line offsets downward 1m place take tunnel is rotation centerline, in the face of tunnel excavation face, it directly over rotation centerline, is 0 ° of direction, clockwise direction is that angle increases progressively direction, second group of microseismic sensors axle centered by rotation centerline is distributed in tunnel inner wall rock mass, the 4th unidirectional microseismic sensors is arranged in 270 ° of directions of tunnel cross-section at current layer front of tunnel heading 3L/4 place, the 5th unidirectional microseismic sensors is arranged in 330 ° of directions of tunnel cross-section at front of tunnel heading 3L/4+2m place, the second three-dimensional microseismic sensors is arranged in 30 ° of directions of tunnel cross-section at front of tunnel heading 3L/4+4m place, the 6th unidirectional microseismic sensors is arranged in 90 ° of directions of tunnel cross-section at front of tunnel heading 3L/4+6m place,
When step 3, current excavation layer face are advanced into apart from the first tunnel cross-section 3L/4 place, three-dimensional microseismic sensors place, first group of microseismic sensors rearranged according to step 1, second group of microseismic sensors rearranged according to step 2; Until tunnel excavation completes.
Owing to having taked technique scheme, the present invention has following technique effect:
1) utilize tunnel to excavate the space that layer provides in fully, all arrange microseismic sensors at excavation front of tunnel heading and rear, face higher risk and near zone thereof are contained in all the time and are arranged in before and after face in two groups of microseismic sensors arrays, be conducive to the collection to micro rupture signal, guarantee microseism positioning precision, for the Accurate Prediction forecast of disaster lays the foundation.
2) the mutual collaborative work of dissimilar microseismic sensors and being spatially staggeredly arranged, is conducive to microseismic sensors and receives signal, has avoided microseismic sensors affect at grade microquake sources and has located.
3) mounting arrangements of microseismic sensors also keeps certain distance scope with face all the time immediately following tunnel tunnel face is mobile backward forward, prevent the damage to microseismic sensors and circuit such as the explosion of face excavation, rock mass damage, ensured the safety of Microseismic monitoring system installation personnel.
Accompanying drawing explanation
When Fig. 1 is tunnel second layer excavation, microseismic monitoring sensor is arranged perspective view on longitudinal profile;
Face rear microseismic monitoring sensor method for arranging sectional view when Fig. 2 is tunnel second layer excavation;
Front of tunnel heading microseismic monitoring sensor method for arranging sectional view when Fig. 3 is tunnel second layer excavation;
Fig. 4 is the microseismic signals spatial distribution map monitoring when the second layer excavates in embodiment.
In figure: the unidirectional microseismic sensors of 101-first; The unidirectional microseismic sensors of 102-second; 103-the 3rd unidirectional microseismic sensors; 104-the 4th unidirectional microseismic sensors; 105-the 5th unidirectional microseismic sensors; 106-the 6th unidirectional microseismic sensors; 201-the first three-dimensional microseismic sensors; 202-the second three-dimensional microseismic sensors; 3-face; 4-tunnel; 5-microseismic signals.
Embodiment
Below in conjunction with accompanying drawing, the present invention is described in further detail.
To achieve these goals, the technical solution adopted in the present invention is: the buried hard rock tunnel microseismic monitoring sensor of a kind of stage excavation method for arranging, comprise the steps: in the time that the tunnel second layer to last one deck excavates,
1) if the maximum monitoring range of microseismic sensors in monitored tunnel 4 rock mass is L, arrange first group of totally four microseismic sensors, wherein three is unidirectional microseismic sensors, and one is three-dimensional microseismic sensors, dissimilar sensor collaborative work mutually, is conducive to microquake sources location.Microseismic sensors all by boring flush type be installed in tunnel inner wall rock mass, to boring in slip casting, make microseismic sensors and rock mass fixed coupling.Length of embedment must exceed country rock relaxation depth, is conducive to microseismic sensors and receives vibration signal.Drilling depth is greater than microseismic sensors depth of placement, prevents that in hole, falling slag muck stops up at foot of hole the space that microseismic sensors is installed.The straight line that current excavation layer base plate center line offsets downward 1m place take tunnel is rotation centerline, first group of microseismic sensors axle centered by rotation centerline is distributed in tunnel inner wall rock mass, the first three-dimensional microseismic sensors 201 is arranged in 270 ° of directions of tunnel cross-section at L/4 place, face rear (in the face of tunnel excavation face, it directly over rotation centerline, is 0 ° of direction, clockwise direction is that angle increases progressively direction, lower same), the first unidirectional microseismic sensors 101 is arranged in 330 ° of directions of tunnel cross-section at L/4+2m place, face rear, the second unidirectional microseismic sensors 102 is arranged in 30 ° of directions of tunnel cross-section at L/4+4m place, face rear, the 3rd unidirectional microseismic sensors 103 is arranged in 90 ° of directions of tunnel cross-section at L/4+6m place, face rear.The microseismic sensors 2m that staggers before and after the tunnel axial direction, avoids arranging that affect at grade microquake sources locates on the same group.
2) arrange second group of totally four microseismic sensors, wherein three is unidirectional microseismic sensors, and one is three-dimensional microseismic sensors, and dissimilar sensor collaborative work is mutually conducive to microquake sources location.Microseismic sensors is all installed in tunnel inner wall rock mass by boring flush type, to slip casting in hole, makes microseismic sensors and rock mass fixed coupling.Length of embedment must exceed country rock relaxation depth, is conducive to microseismic sensors and receives vibration signal.Drilling depth is greater than microseismic sensors depth of placement, prevents that in hole, falling slag muck stops up at foot of hole the space that microseismic sensors is installed.The straight line that current excavation layer base plate center line offsets downward 1m place take tunnel is rotation centerline, second group of microseismic sensors axle centered by rotation centerline is distributed in tunnel inner wall rock mass, the 4th unidirectional microseismic sensors 104 is arranged in 270 ° of directions of tunnel cross-section at current layer front of tunnel heading L3/4 place, the 5th unidirectional microseismic sensors 105 is arranged in 330 ° of directions of tunnel cross-section at front of tunnel heading 3L/4+2m place, the second three-dimensional microseismic sensors 202 is arranged in 30 ° of directions of tunnel cross-section at front of tunnel heading 3L/4+4m place, the 6th unidirectional microseismic sensors 106 is arranged in 90 ° of directions of tunnel cross-section at front of tunnel heading 3L/4+6m place.The microseismic sensors 2m that staggers before and after the tunnel axial direction, avoids arranging that affect at grade microquake sources locates on the same group.
3) when current excavation layer face 3 is advanced into apart from the first three-dimensional microseismic sensors 201 tunnels, place to section 3L/4 place, first group and second group of microseismic sensors are moved to forward respectively apart from current excavation layer face 3 rear L/4 and 3L/4 tunnel cross-section place, front, and mounting means remains unchanged; The mounting arrangements of microseismic sensors moves immediately following face all the time, and keeps certain distance with face, prevents the damage to microseismic sensors and circuit such as the explosion of face excavation, rock mass damage, has ensured the safety of Microseismic monitoring system installation personnel.
4) along with the propelling of face 3, constantly repeat above-mentioned steps 4) until tunnel 4 this layer of excavation complete.
So far, have no the relevant report for stage excavation tunnel microseismic monitoring sensor method for arranging, reasonably microseismic sensors arrangement not only can monitor more microseismic signals more broadly, and can make location algorithm determine fast and accurately source location and origin time, be conducive to the early warning assessment to tunnel risk.Due to the space structure feature in tunnel, microseismic monitoring sensor is generally arranged in face rear, cause in microseismic sensors array is difficult to face and near rock mass thereof to be enclosed in, thereby affect to a certain extent microquake sources positioning precision, further affect Tunnel Stability monitoring and prediction effect.
The present invention is directed to the problems referred to above, in conjunction with the feature of stage excavation Tunnel Engineering, the sensor dispersed arrangement form in suitable stage excavation tunnel has been proposed, 1) utilize tunnel to excavate the space that layer provides in fully, all arrange microseismic sensors at excavation front of tunnel heading and rear, face higher risk and near zone thereof are contained in all the time and are arranged in before and after face in two groups of microseismic sensors arrays, be conducive to the collection to micro rupture signal, guarantee microseism positioning precision, for the Accurate Prediction forecast of disaster lays the foundation, 2) the mutual collaborative work of dissimilar microseismic sensors and being spatially staggeredly arranged, be conducive to microseismic sensors and receive signal, avoid microseismic sensors to affect at grade microquake sources location.3) mounting arrangements of microseismic sensors also keeps certain distance scope with face all the time immediately following tunnel tunnel face is mobile backward forward, prevent the damage to microseismic sensors and circuit such as the explosion of face excavation, rock mass damage, ensured the safety of Microseismic monitoring system installation personnel.
Embodiment
Certain tunnel cross-section is rounded, adopts stage excavation mode, and tunnel surrounding relaxation depth, within the scope of 2m, carries out stability micro seismic monitoring to this tunnel, and microseismic sensors method for arranging is as follows, in the time that the tunnel second layer to last one deck excavates:
1) the maximum monitoring range of microseismic sensors in monitored tunnel 4 rock mass is 180m, arrange first group of microseismic sensors, wherein three is unidirectional microseismic sensors, model is South Africa 1G14 microseismic sensors, natural frequency is 14Hz, responding range is 7～2000Hz, be respectively the first unidirectional microseismic sensors 101, the second unidirectional microseismic sensors 102, the 3rd unidirectional microseismic sensors 103, another is the first three-dimensional microseismic sensors 201, model is South Africa 3G14 microseismic sensors, its natural frequency is 14Hz, responding range is 7～2000Hz, dissimilar sensor collaborative work mutually, be conducive to microquake sources location.First group of microseismic sensors is all installed in tunnel inner wall rock mass by boring flush type, to slip casting in boring, makes microseismic sensors and rock mass fixed coupling.Depth of placement is 3m, exceedes country rock relaxation depth, is conducive to microseismic sensors and receives vibration signal.Drilling depth is 3.2m, is greater than microseismic sensors depth of placement, prevents that in hole, falling slag muck stops up at foot of hole the space that microseismic sensors is installed.The straight line that current excavation layer base plate center line offsets downward 1m place take tunnel is rotation centerline, in the face of tunnel excavation face, it directly over rotation centerline, is 0 ° of direction, clockwise direction is that angle increases progressively direction, first group of microseismic sensors axle centered by rotation centerline is distributed in tunnel inner wall rock mass, the first three-dimensional microseismic sensors 201 is arranged in 270 ° of directions of tunnel cross-section at 45m place, face rear, the first unidirectional microseismic sensors 101 is arranged in 330 ° of directions of tunnel cross-section at 47m place, face rear, the second unidirectional microseismic sensors 102 is arranged in 30 ° of directions of tunnel cross-section at 49m place, face rear, the 3rd unidirectional microseismic sensors 103 is arranged in 90 ° of directions of tunnel cross-section at 51m place, face rear.The microseismic sensors 2m that staggers before and after the tunnel axial direction, avoids arranging that affect at grade microquake sources locates on the same group.
2) arrange second group of microseismic sensors, wherein three is unidirectional microseismic sensors, model is South Africa 1G14 microseismic sensors, natural frequency is 14Hz, responding range is 7～2000Hz, be respectively the 4th unidirectional microseismic sensors 104, the 5th unidirectional microseismic sensors 105, the 6th unidirectional microseismic sensors 106, another is the second three-dimensional microseismic sensors 202, model is South Africa 3G14 microseismic sensors, its natural frequency is 14Hz, responding range is 7～2000Hz, and dissimilar sensor collaborative work is mutually conducive to microquake sources location.Microseismic sensors all by boring flush type be installed in tunnel inner wall rock mass, to boring in slip casting, make microseismic sensors and rock mass fixed coupling.Depth of placement is 3m, exceedes country rock relaxation depth, is conducive to microseismic sensors and receives vibration signal.Drilling depth is 3.2m, is greater than microseismic sensors depth of placement, prevents that in hole, falling slag muck stops up at foot of hole the space that microseismic sensors is installed.The straight line that current excavation layer base plate center line offsets downward 1m place take tunnel is rotation centerline, in the face of tunnel excavation face, it directly over rotation centerline, is 0 ° of direction, clockwise direction is that angle increases progressively direction, first group of microseismic sensors axle centered by rotation centerline is distributed in tunnel inner wall rock mass, the 4th unidirectional microseismic sensors 104 is arranged in 270 ° of directions of tunnel cross-section at current layer front of tunnel heading 135m place, the 5th unidirectional microseismic sensors 105 is arranged in 330 ° of directions of tunnel cross-section at front of tunnel heading 137m place, the second three-dimensional microseismic sensors 202 is arranged in 30 ° of directions of tunnel cross-section at front of tunnel heading 139m place, the 6th unidirectional microseismic sensors 106 is arranged in 90 ° of directions of tunnel cross-section at front of tunnel heading 141m place.The microseismic sensors 2m that staggers before and after the tunnel axial direction, avoids arranging that affect at grade microquake sources locates on the same group.
3) when current excavation layer face 3 is advanced into apart from the first three-dimensional microseismic sensors 201 tunnel cross-section 135m place, place, face 3 rear, first group and second group of microseismic sensors are moved to respectively apart from current excavation layer face 3 rear 45m and 135m tunnel cross-section place, front, and mounting means remains unchanged; The mounting arrangements of microseismic sensors moves immediately following face all the time, and keeps certain distance with face, prevents the damage to microseismic sensors and circuit such as the explosion of face excavation, rock mass damage, has ensured the safety of Microseismic monitoring system installation personnel.Tunnel excavation is carried out to STABILITY MONITORING, collect a series of Monitoring Data.
4) along with the propelling of tunnel tunnel face 3, constantly repeating step 4) until tunnel 4 this layer of excavation complete.
Test result is carried out to analyzing and processing in time, 2 days-November 3 November in 2011 test result as shown in Figure 4.Fig. 4 is microseismic signals 5 spatial distribution maps that monitor when the second layer excavates 2 days-November 3 November in 2011, and spheroid is microseismic signals 5, and spheroid size represents the energy that micro rupture discharges, and spheroid is larger, and energy is larger.This period is arranged in two groups of front and back of face microseismic sensors and jointly monitors the microseismic signals 5 that face excavation produces.As shown in Figure 4, microseismic signals 5 is concentrated and is distributed near face 3, meets buried hard rock tunnel excavation Unloading Characteristic.Microseismic signals 5, in the face intensive appearance in 3 places, shows that face 3 exists higher rockburst risk simultaneously.There is medium rock burst at the concentrated face place of microseismic signals on November 4th, 2011, coincide with monitoring result, shows the accuracy of microseismic signals monitoring.In the present invention fully, utilize tunnel to excavate the space that layer provides, all the time be contained in and be arranged in before and after face in two groups of microseismic sensors arrays destroying the higher face 3 of risk and near zone thereof, be conducive to the collection to micro rupture signal 5, guarantee microquake sources positioning precision, caught preferably the microseismic signals 5 of high risk face 3 generation destruction omens.
During implementing technical scheme described above this stage excavation tunnel being carried out to STABILITY MONITORING, accumulation capture 56 faces and near hole section is medium and above grade rock burst in 52 rock burst omen microseismic signals, early warning accurately stage excavation tunnel tunnel face exist risk, after implementing the technical program, on-site layering tunnel excavation does not cause workmen's injures and deaths, has guaranteed construction safety.
Above example is only unrestricted in order to technical scheme of the present invention to be described, those of ordinary skill in the art is to be understood that, technical scheme of the present invention is modified or is replaced on an equal basis, and does not depart from the spirit and scope of technical solution of the present invention, all should be encompassed in claim scope of the present invention.
Claims (1)
1. the buried hard rock tunnel microseismic monitoring sensor of a stage excavation method for arranging, comprises the steps: in the time that the tunnel second layer to last one deck excavates,
Step 1, the maximum monitoring range of microseismic sensors in monitored tunnel (4) rock mass is L, arrange first group of microseismic sensors, be respectively the first unidirectional microseismic sensors (101), the second unidirectional microseismic sensors (102), the 3rd unidirectional microseismic sensors (103) and the first three-dimensional microseismic sensors (201), first group of microseismic sensors is all installed in tunnel inner wall rock mass by boring flush type, to boring in slip casting, make microseismic sensors and rock mass fixed coupling, length of embedment must exceed country rock relaxation depth, drilling depth is greater than microseismic sensors depth of placement, the straight line that current excavation layer base plate center line offsets downward 1m place take tunnel is rotation centerline, in the face of tunnel excavation face, it directly over rotation centerline, is 0 ° of direction, clockwise direction is that angle increases progressively direction, first group of microseismic sensors axle centered by rotation centerline is distributed in tunnel inner wall rock mass, the first three-dimensional microseismic sensors (201) is arranged in 270 ° of directions of tunnel cross-section at L/4 place, face rear, the first unidirectional microseismic sensors (101) is arranged in 330 ° of directions of tunnel cross-section at L/4+2m place, face rear, the second unidirectional microseismic sensors (102) is arranged in 30 ° of directions of tunnel cross-section at L/4+4m place, face rear, the 3rd unidirectional microseismic sensors (103) is arranged in 90 ° of directions of tunnel cross-section at L/4+6m place, face rear,
Step 2, arrange second group of microseismic sensors, be respectively the 4th unidirectional microseismic sensors (104), the 5th unidirectional microseismic sensors (105), the 6th unidirectional microseismic sensors (106) and the second three-dimensional microseismic sensors (202), second group of microseismic sensors is all installed in tunnel inner wall rock mass by boring flush type, to boring in slip casting, make microseismic sensors and rock mass fixed coupling, length of embedment must exceed country rock relaxation depth, drilling depth is greater than microseismic sensors depth of placement, the straight line that current excavation layer base plate center line offsets downward 1m place take tunnel is rotation centerline, in the face of tunnel excavation face, it directly over rotation centerline, is 0 ° of direction, clockwise direction is that angle increases progressively direction, second group of microseismic sensors axle centered by rotation centerline is distributed in tunnel inner wall rock mass, the 4th unidirectional microseismic sensors (104) is arranged in 270 ° of directions of tunnel cross-section at current layer front of tunnel heading 3L/4 place, the 5th unidirectional microseismic sensors (105) is arranged in 330 ° of directions of tunnel cross-section at front of tunnel heading 3L/4+2m place, the second three-dimensional microseismic sensors (202) is arranged in 30 ° of directions of tunnel cross-section at front of tunnel heading 3L/4+4m place, the 6th unidirectional microseismic sensors (106) is arranged in 90 ° of directions of tunnel cross-section at front of tunnel heading 3L/4+6m place,
When step 3, current excavation layer face (3) are advanced into apart from the first tunnel cross-section 3L/4 place, three-dimensional microseismic sensors (201) place, first group of microseismic sensors rearranged according to step 1, second group of microseismic sensors rearranged according to step 2; Until has excavated tunnel (4).
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| CN108490485A (en) * | 2018-06-20 | 2018-09-04 | 成都理工大学 | Double track tunnel Microseismic monitoring system and its positioning accuracy appraisal procedure |
| CN108490485B (en) * | 2018-06-20 | 2024-04-05 | 成都理工大学 | Double-track tunnel microseismic monitoring system and positioning accuracy assessment method thereof |
| CN109779635A (en) * | 2019-02-02 | 2019-05-21 | 韩少鹏 | A kind of tunnel Engineering safe excavation method |
| CN110376648A (en) * | 2019-07-24 | 2019-10-25 | 中国科学院武汉岩土力学研究所 | A kind of ultra-deep shaft spiral progressive rock burst microseism synergic monitoring method |
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