CN103760696A - Photo-resistor drying device - Google Patents
Photo-resistor drying device Download PDFInfo
- Publication number
- CN103760696A CN103760696A CN201410028504.4A CN201410028504A CN103760696A CN 103760696 A CN103760696 A CN 103760696A CN 201410028504 A CN201410028504 A CN 201410028504A CN 103760696 A CN103760696 A CN 103760696A
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- Prior art keywords
- photoresistance
- cavity
- drying device
- sieve plate
- sieve
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Classifications
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B5/00—Drying solid materials or objects by processes not involving the application of heat
- F26B5/04—Drying solid materials or objects by processes not involving the application of heat by evaporation or sublimation of moisture under reduced pressure, e.g. in a vacuum
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B5/00—Drying solid materials or objects by processes not involving the application of heat
- F26B5/12—Drying solid materials or objects by processes not involving the application of heat by suction
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
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- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Molecular Biology (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Drying Of Solid Materials (AREA)
Abstract
The embodiment of the invention discloses a photo-resistor drying device which is used for extracting solvents from a photo-resistor. The photo-resistor drying device comprises a cavity, a sieve plate and a gas suction unit, wherein a plurality of sieve holes are formed in the sieve plate. The cavity comprises a top wall with a gas suction hole, a bottom wall opposite to the top wall, and a side wall for connecting the top wall with the bottom wall. A glass substrate coated with the photo-resistor is located in the cavity. The sieve plate is contained in the cavity and located between the photo-resistor and the top wall. The gas suction unit is located outside the cavity and connected with the gas suction hole so that the gas can be sucked out of the cavity through the gas suction hole.
Description
Technical field
The present invention relates to dry technology, relate in particular to a kind of photoresistance drying device that extracts photoresistance internal solvent.
Background technology
Colored filter (Color Filer, CF) be one of critical elements in liquid crystal display panel of thin film transistor (TFT-LCD), make colored filter be included on glass substrate, carry out light blockage coating, exposure, development, photoresistance is peeled off and the step such as plated film.In order to be conveniently coated on glass substrate, in photoresistance, added a large amount of solvent (solvent), yet, these solvents non-active ingredients, after light blockage coating completes, need to use Minton dryer (Vacuum Dry, VCD) by the removal of solvents in photoresistance, not affect the follow-up actions such as exposure imaging.
Minton dryer is removed the solvent in photoresistance, is specially the glass substrate that is coated with photoresistance is placed on the loading plate in a seal chamber, and the air that then utilizes aspiration pump to extract in cavity is clean so that the solvent in photoresistance is extracted.At present, Minton dryer has and bleeds and below cavity, offer single aspirating hole and bleed two types offering a plurality of aspirating holes above cavity.Above cavity, offer the pumping airflow that a plurality of aspirating holes bleed larger, easily cause photoresistance upper surface first dry, and solvent in photoresistance cannot be extracted out easily, cause near photoresistance position, hole to have larger difference with the photoresistance in other regions, generation look uneven phenomenon.Obstruct due to loading plate, below cavity, offering the bleed position that single aspirating hole bleeds is the edge at photoresistance, the pumping airflow at edge that is photoresistance is very large, solvent herein is more easily extracted, and photoresistance central area from bleed off passage away from, more difficult being extracted of solvent herein, if will drain the solvent of photoresistance central area, need to spend more bleeding the time, pumping efficiency is not high.
Therefore, be necessary to provide the photoresistance that can address the above problem drying device.
Summary of the invention
In order to solve the problems of the technologies described above, the embodiment of the present invention provides a kind of photoresistance drying device, for extracting the solvent of photoresistance.This photoresistance drying device comprises cavity, offers the sieve plate of a plurality of sieve apertures and the unit of bleeding.This cavity comprises and offers the roof of an aspirating hole, the diapire relative with this roof and the sidewall that connects this roof and this diapire, and the glass substrate that is coated with this photoresistance is positioned at this cavity.This sieve plate is housed in this cavity and between this photoresistance and this roof.This unit of bleeding is positioned at outside this cavity and is connected to bleed from this cavity by this aspirating hole with this aspirating hole.
Wherein, this sieve plate be arranged on this sidewall and with this sidewall close contact.
Wherein, this sieve plate, this roof and this sidewall surround the first vented cavity jointly, and this sieve plate, this diapire and this sidewall surround the second vented cavity jointly, and this first vented cavity is communicated with by the plurality of sieve aperture with this second vented cavity.
Wherein, this aspirating hole is positioned at the center of this roof, and the center of this sieve plate is aimed at this aspirating hole, and the plurality of sieve aperture is by dredging solid matter cloth from the center away from this sieve plate.
Wherein, on the quantity of the plurality of sieve aperture and this sieve plate, somewhere meets relational expression to the distance at the center of this sieve plate:, wherein, the quantity that n is the plurality of sieve aperture, x is the distance that on this sieve plate, the center of this sieve plate is arrived in somewhere, the distribution density that h (x) is sieve aperture.
Wherein, this photoresistance drying device also comprises a loading plate, and this loading plate is installed on this diapire, and this glass substrate bearing that is coated with this photoresistance is on this loading plate, and this photoresistance is away from this loading plate.
Wherein, this photoresistance drying device also comprises a plurality of support bars, and one end of each support bar is installed on this diapire, and the other end is fixedly connected with this loading plate.
Wherein, this unit of bleeding comprises an aspiration pump, a valve and a ventilation duct, one end of this ventilation duct is connected with this aspiration pump, the other end is installed in this aspirating hole to be communicated with this cavity, and this valve is installed on this ventilation duct in order to control the area communicating of this ventilation duct and this aspiration pump.
Wherein, this cavity is right cylinder, and this sieve plate is right cylinder.
Wherein, this cavity is rectangular parallelepiped, and this sieve plate is rectangular parallelepiped.
The roof of photoresistance drying device provided by the present invention only offers an aspirating hole, pumping airflow compares that to offer a plurality of aspirating holes little, and the sieve plate that offers a plurality of sieve apertures has evenly and stabilization this air-flow, can avoid because pumping airflow is large or the unstable look uneven phenomenon that causes photoresistance of air-flow.In addition, owing to aspirating hole being set above this cavity, bleed, bleed position for be whole photoresistance, and be not limited to the edge at this photoresistance, therefore, pumping efficiency is higher.
Accompanying drawing explanation
In order to be illustrated more clearly in the embodiment of the present invention or technical scheme of the prior art, to the accompanying drawing of required use in embodiment or description of the Prior Art be briefly described below, apparently, accompanying drawing in the following describes is only some embodiments of the present invention, for those of ordinary skills, do not paying under the prerequisite of creative work, can also obtain according to these accompanying drawings other accompanying drawing.
Fig. 1 is the schematic perspective view of the photoresistance drying device that provides of first embodiment of the invention.
Fig. 2 is the cut-away section schematic diagram of the photoresistance drying device in Fig. 1.
Fig. 3 is the floor map of the sieve plate in the photoresistance drying device in Fig. 1.
Fig. 4 is the Figure of the quantitative relationship of the sieve aperture on sieve plate of the same area.
Fig. 5 is that second embodiment of the invention provides the schematic perspective view in photoresistance drying device.
Fig. 6 is the floor map of the sieve plate in the photoresistance drying device in Fig. 5.
Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is clearly and completely described, obviously, described embodiment is only the present invention's part embodiment, rather than whole embodiment.Embodiment based in the present invention, those of ordinary skills, not making the every other embodiment obtaining under creative work prerequisite, belong to the scope of protection of the invention.
Embodiment mono-
Refer to Fig. 1 and Fig. 2, the photoresistance drying device 100 that first embodiment of the invention provides comprises a cavity 10, a plurality of support bar 20, loading plate 30, sieve plate 40 and the unit 50 of bleeding.This photoresistance drying device 100 is coated on the solvent in the photoresistance 300 on glass substrate 200 while making colored filter for extracting, and this solvent is conducive to this photoresistance 300 and is coated on this glass substrate 200, but this solvent is not effective constituent.
This cavity 10 is rectangular structure and has a host cavity 102.This cavity 10 comprises a roof 12, diapire 14 and four sidewalls 16.This roof 12 and this diapire 14 lay respectively at the opposing two ends of this cavity 10, and this roof 12 is parallel with this diapire 14.These four sidewalls 16 are the first vertical connection each other, and vertical this roof 12 and this diapire 14 of connecting of these four sidewalls 16.This roof 12, this diapire 14 and this four sidewalls 16 surround this host cavity 102 jointly.The center of this roof 12 offers an aspirating hole 120.This aspirating hole 120 is communicated with this host cavity 102.In the present embodiment, this aspirating hole 120 is manhole.On other positions of this roof 12, this diapire 14 and this four sidewalls 16, be entity structure, do not offer aspirating hole.
The plurality of support bar 20 and this loading plate 30 are all positioned at this host cavity 102.This loading plate 30 is slab construction, and this loading plate 30 comprises a upper surface 32 and a lower surface 34.This upper surface 32 and this lower surface 34 lay respectively at the opposing both sides of this loading plate 30, and this upper surface 32 is parallel with this lower surface 34.This upper surface 32 is for bearing the glass substrate 200 that is coated with photoresistance 300.One end of each support bar 20 is installed on this diapire 14 and is vertical with this diapire 14, and the other end of each support bar 20 is fixedly connected on this lower surface 34 and is vertical with this lower surface 34.Now, this upper surface 32 and this lower surface 34 are all parallel with this diapire 14, and this photoresistance 300 is away from this upper surface 32.
See also Fig. 2 and Fig. 3, this sieve plate 40 is housed in this host cavity 102 and between this photoresistance 300 and this roof 12.The shape of this sieve plate 40 and size are mated completely with shape and the size in the cross section of this host cavity 102.That is, this sieve plate 40 is also rectangular structure, and the length of this sieve plate 40 and width are identical respectively with length and the width in the cross section of this host cavity 102.This sieve plate 40 by gummed, engage or the mode such as be threaded is arranged on these four sidewalls 16 and with the equal close contact of these four sidewalls 16, this sieve plate 40 center 42 is aimed at this aspirating hole 120.This sieve plate 40, this roof 12 and this four sidewalls 16 surround first vented cavity 101 jointly, and this sieve plate 40, this diapire 14 and this four sidewalls 16 surround second vented cavity 103 jointly.On this sieve plate 40, offer a plurality of sieve apertures 44, this first vented cavity 101 is communicated with by the plurality of sieve aperture 44 with this second vented cavity 103.In the present embodiment, the plurality of sieve aperture 44 is manhole.
On the quantity of the plurality of sieve aperture 44 and this sieve plate 40, somewhere meets relational expression to the distance at this sieve plate 40 center 42:.Wherein, n is the quantity of the plurality of sieve aperture 44, and x is that on this sieve plate 40, somewhere is to the distance at this sieve plate 40 center 42, and h (x) is the distribution density of sieve aperture 44.The derivation of this formula is as follows: first, the aperture of supposing this aspirating hole 120 is d, and the distance between this sieve plate 40 and this roof 12 is D, and d and D are constant, and the pressure P of these sieve plate 40 each positions, top is functions of x, is designated as P=f (x).Because the pressure P of each position is different, larger apart from the pressure P of these aspirating hole 120 closer locations, less compared with the pressure P of distant positions apart from this aspirating hole 120.There is certain funtcional relationship in the distribution density ρ of this sieve aperture 44 and pressure P, so the distribution density ρ of sieve aperture 44 also can be as the function apart from x, and note is ρ=h (x).Selected distance this sieve plate 40 center 42 for x place and width be the annular of d (x), its area is S=2 π xd (x), the distribution density of the sieve aperture 44 in this annular is ρ=[n/2 π xd (x)], after the ρ=h (x) before bringing into integration, can obtain formula.
By this formula, can be found out, the plurality of sieve aperture 44 is from being by dredging solid matter cloth away from this sieve plate 40 center 42.That is, the place far away apart from this aspirating hole 120 (also apart from this center 42) is larger than the distribution density of the local sieve aperture 44 nearer apart from this aspirating hole 120 (also apart from this center 42).Incorporated by reference to Fig. 4, if choosing a panel region A apart from the nearer place of this aspirating hole 120 (also apart from this center 42), apart from this aspirating hole 120 (also apart from this center 42) place far away, choosing a panel region B, and the identical (S of area of this region A and this region B
a=S
b), the quantity N of the sieve aperture 44 in the A of this region
abe less than the quantity N of the sieve aperture 44 in the B of this region
b, i.e. N
a<N
b.
This unit 50 of bleeding comprises an aspiration pump 52, valve 54 and a ventilation duct 56.One end of this ventilation duct 56 is connected with this aspiration pump 52, and the other end is installed in this aspirating hole 120 to be communicated with this host cavity 102.This valve 54 is installed on this ventilation duct 56 near these aspiration pump 52 places, and this valve 54 is in order to control the area communicating of this ventilation duct 56 and this aspiration pump 52.Particularly, when these valve 54 standard-sized sheets, this ventilation duct 56 communicates completely with this aspiration pump 52, and now, this aspiration pump 52 can be bled in this host cavity 102 by this ventilation duct 56 unblockedly.When these valve 54 full cut-offs, this ventilation duct 56 is not communicated with completely with this aspiration pump 52, and now, this aspiration pump 52 cannot be bled by this ventilation duct 56 in this host cavity 102.If this valve 54 has been opened half this ventilation duct 56 and covered half this ventilation duct 56, this ventilation duct 56 is still communicated with this aspiration pump 52, and now, bleeding of this aspiration pump 52 is smooth and easy while being not so good as standard-sized sheet.Thus, extent of evacuation (comprising rate of air sucked in required, the speed of exhaust etc.) not only can be controlled by controlling the exploitation power of aspiration pump 52 self in this unit 50 of bleeding, and can also control extent of evacuation by the opening degree of this valve 54.
During work, this valve 54 is opened this ventilation duct 56 is communicated with this aspiration pump 52 (comprise and all communicate and partly communicate), this aspiration pump 52 is bled in this host cavity 102 by this ventilation duct 56, gas in this second host cavity 103 enters in this first host cavity 101 through after the plurality of sieve aperture 44, then by this aspirating hole 120 and this ventilation duct 56, is drawn out of.The extraction of the gas in this second host cavity 103 can be discharged the solvent in photoresistance 300.Because this roof 12 only offers an aspirating hole 120, pumping airflow compares that to offer a plurality of aspirating holes little, and 40 pairs of these air-flows of this sieve plate also have evenly and stabilization, therefore can avoid because pumping airflow is large or the unstable look uneven phenomenon that causes photoresistance 300 of air-flow.In addition, owing to aspirating hole 120 being set above this cavity 10, bleed, bleed position for be whole photoresistance 300, and be not limited at the edge of this photoresistance 300, therefore, the pumping efficiency of this photoresistance drying device 100 is higher.
Embodiment bis-
Refer to Fig. 5 and Fig. 6, the difference of the photoresistance drying device 100 that the photoresistance drying device 500 that second embodiment of the invention provides and the first embodiment provide is: this cavity 50 is cylindrical structure, and this sieve plate 60 is also cylindrical structure.This cavity 50 comprises a sidewall 56, and this sieve plate 60 is positioned at this cavity 50 and is installed on this sidewall 56, and the diameter of this sieve plate 60 is identical with the internal diameter of this cavity 50.The principle of work of the principle of work of the photoresistance drying device 500 in the present embodiment and photoresistance drying device 100 in the first embodiment and the effect that can reach are identical, do not repeat them here.
In addition, photoresistance drying device 100 provided by the present invention and 500 is only not limited to for removing the solvent in the photoresistance while making colored filter, can also be when making other elements the solvent in photoresistance, the solvent when producing contact panel (touch panel) in photoresistance.
Above disclosed is only preferred embodiment of the present invention, certainly can not limit with this interest field of the present invention, and the equivalent variations of therefore doing according to the claims in the present invention, still belongs to the scope that the present invention is contained.
Claims (10)
1. a photoresistance drying device, for extracting the solvent of photoresistance (300), is characterized in that, this photoresistance drying device (100) comprising:
Cavity (10), this cavity (10) comprises the sidewall (16) that offers roof (12), the diapire (14) relative with this roof (12) of an aspirating hole (120) and connect this roof (12) and this diapire (14), and the glass substrate (200) that is coated with this photoresistance (300) is positioned at this cavity (10);
Offer the sieve plate (40) of a plurality of sieve apertures (44), this sieve plate (40) is housed in this cavity (10) and is positioned between this photoresistance (300) and this roof (12);
The unit (50) of bleeding, is positioned at this cavity (10) outer and be connected to bleed from this cavity (10) by this aspirating hole (120) with this aspirating hole (120).
2. photoresistance drying device as claimed in claim 1, is characterized in that, this sieve plate (40) be arranged on this sidewall (16) upper and with this sidewall (16) close contact.
3. photoresistance drying device as claimed in claim 2, it is characterized in that, this sieve plate (40), this roof (12) and this sidewall (16) surround the first vented cavity (101) jointly, this sieve plate (40), this diapire (14) and this sidewall (16) surround the second vented cavity (103) jointly, and this first vented cavity (101) is communicated with by the plurality of sieve aperture (44) with this second vented cavity (103).
4. photoresistance drying device as claimed in claim 2, it is characterized in that, this aspirating hole (120) is positioned at the center of this roof (12), the center (42) of this sieve plate (40) is aimed at this aspirating hole (120), and the plurality of sieve aperture (44) is by dredging solid matter cloth from the center (42) away from this sieve plate (40).
5. photoresistance drying device as claimed in claim 4, it is characterized in that, the upper somewhere of the quantity of the plurality of sieve aperture (44) and this sieve plate (40) meets relational expression to the distance at the center (42) of this sieve plate (40):, wherein, n is the quantity of the plurality of sieve aperture (44), x is the distance that the center (42) of this sieve plate (40) is arrived in the upper somewhere of this sieve plate (40), and h (x) is the distribution density of sieve aperture (44).
6. photoresistance drying device as claimed in claim 5, it is characterized in that, this photoresistance drying device (100) also comprises a loading plate (30), this loading plate (30) is installed on this diapire (14), it is upper that this glass substrate (200) that is coated with this photoresistance (300) is carried on this loading plate (30), and this photoresistance (300) is away from this loading plate (30).
7. photoresistance drying device as claimed in claim 6, it is characterized in that, this photoresistance drying device (100) also comprises a plurality of support bars (20), and it is upper that one end of each support bar (20) is installed in this diapire (14), and the other end is fixedly connected with this loading plate (30).
8. photoresistance drying device as claimed in claim 7, it is characterized in that, this unit of bleeding (50) comprises an aspiration pump (52), a valve (54) and a ventilation duct (56), one end of this ventilation duct (56) is connected with this aspiration pump (52), it is interior to be communicated with this cavity (10) that the other end is installed in this aspirating hole (120), and this valve (54) is installed in the upper area communicating with this aspiration pump (52) in order to control this ventilation duct (56) of this ventilation duct (56).
9. photoresistance drying device as claimed in claim 1, is characterized in that, this cavity (10) is right cylinder, and this sieve plate (40) is right cylinder.
10. photoresistance drying device as claimed in claim 1, is characterized in that, this cavity (10) is rectangular parallelepiped, and this sieve plate (40) is rectangular parallelepiped.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410028504.4A CN103760696A (en) | 2014-01-21 | 2014-01-21 | Photo-resistor drying device |
| PCT/CN2015/071071 WO2015109985A1 (en) | 2014-01-21 | 2015-01-20 | Photoresist drying apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410028504.4A CN103760696A (en) | 2014-01-21 | 2014-01-21 | Photo-resistor drying device |
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| Publication Number | Publication Date |
|---|---|
| CN103760696A true CN103760696A (en) | 2014-04-30 |
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ID=50527955
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410028504.4A Pending CN103760696A (en) | 2014-01-21 | 2014-01-21 | Photo-resistor drying device |
Country Status (2)
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|---|---|
| CN (1) | CN103760696A (en) |
| WO (1) | WO2015109985A1 (en) |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015109985A1 (en) * | 2014-01-21 | 2015-07-30 | 深圳市华星光电技术有限公司 | Photoresist drying apparatus |
| CN104859291A (en) * | 2015-04-13 | 2015-08-26 | 京东方科技集团股份有限公司 | Drying device and drying method thereof |
| CN107357139A (en) * | 2017-08-01 | 2017-11-17 | 深圳市华星光电技术有限公司 | The gas extraction system and its governor motion of developing apparatus |
| CN107413603A (en) * | 2017-07-20 | 2017-12-01 | 武汉华星光电技术有限公司 | Vacuum decompression drying equipment |
| WO2018113090A1 (en) * | 2016-12-19 | 2018-06-28 | 惠科股份有限公司 | Machine and method for baking substrate |
| CN108344254A (en) * | 2017-09-28 | 2018-07-31 | 广东聚华印刷显示技术有限公司 | Minton dryer |
| CN108759360A (en) * | 2018-06-20 | 2018-11-06 | 京东方科技集团股份有限公司 | Evaporate auxiliary device and drying equipment |
| CN105445973B (en) * | 2015-12-31 | 2019-04-30 | 京东方科技集团股份有限公司 | A kind of vacuum evacuation device and the operating method using the vacuum evacuation device |
| CN110328975A (en) * | 2019-07-01 | 2019-10-15 | 深圳市华星光电半导体显示技术有限公司 | Minton dryer |
| CN111928596A (en) * | 2020-08-20 | 2020-11-13 | 海盐汇联通用配件有限公司 | Fastener material receiving box with draining effect |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020148566A1 (en) * | 2001-04-17 | 2002-10-17 | Tokyo Electron Limited | Substrate processing unit |
| JP2005243914A (en) * | 2004-02-26 | 2005-09-08 | Tokyo Electron Ltd | Apparatus and method for drying under reduced pressure |
| CN1970826A (en) * | 2005-11-24 | 2007-05-30 | 群康科技(深圳)有限公司 | Vacuum deposition device and method therefor |
| KR20100059238A (en) * | 2008-11-26 | 2010-06-04 | 세메스 주식회사 | Apparatus for drying a photoresist layer on a substrate |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3696156B2 (en) * | 2000-12-26 | 2005-09-14 | 株式会社東芝 | Coating film heating apparatus and resist film processing method |
| CN1847980B (en) * | 2006-03-24 | 2010-12-01 | 友达光电股份有限公司 | Low voltage treating device |
| CN100578360C (en) * | 2006-10-26 | 2010-01-06 | 友达光电股份有限公司 | Coating drier with regulating air flow path function |
| JP2009275924A (en) * | 2008-05-12 | 2009-11-26 | Panasonic Corp | Vacuum drying method and vacuum drying device |
| CN102236271A (en) * | 2010-04-29 | 2011-11-09 | 北京京东方光电科技有限公司 | Equipment and method for drying photoresist |
| CN202067075U (en) * | 2011-06-09 | 2011-12-07 | 京东方科技集团股份有限公司 | Decompression drying equipment |
| CN103760696A (en) * | 2014-01-21 | 2014-04-30 | 深圳市华星光电技术有限公司 | Photo-resistor drying device |
-
2014
- 2014-01-21 CN CN201410028504.4A patent/CN103760696A/en active Pending
-
2015
- 2015-01-20 WO PCT/CN2015/071071 patent/WO2015109985A1/en active Application Filing
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020148566A1 (en) * | 2001-04-17 | 2002-10-17 | Tokyo Electron Limited | Substrate processing unit |
| JP2005243914A (en) * | 2004-02-26 | 2005-09-08 | Tokyo Electron Ltd | Apparatus and method for drying under reduced pressure |
| CN1970826A (en) * | 2005-11-24 | 2007-05-30 | 群康科技(深圳)有限公司 | Vacuum deposition device and method therefor |
| KR20100059238A (en) * | 2008-11-26 | 2010-06-04 | 세메스 주식회사 | Apparatus for drying a photoresist layer on a substrate |
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015109985A1 (en) * | 2014-01-21 | 2015-07-30 | 深圳市华星光电技术有限公司 | Photoresist drying apparatus |
| CN104859291A (en) * | 2015-04-13 | 2015-08-26 | 京东方科技集团股份有限公司 | Drying device and drying method thereof |
| CN104859291B (en) * | 2015-04-13 | 2017-12-29 | 京东方科技集团股份有限公司 | A kind of drying device and its drying means |
| US10549551B2 (en) | 2015-04-13 | 2020-02-04 | Boe Technology Group Co., Ltd. | Drying device and drying method using the same |
| CN105445973B (en) * | 2015-12-31 | 2019-04-30 | 京东方科技集团股份有限公司 | A kind of vacuum evacuation device and the operating method using the vacuum evacuation device |
| WO2018113090A1 (en) * | 2016-12-19 | 2018-06-28 | 惠科股份有限公司 | Machine and method for baking substrate |
| CN107413603A (en) * | 2017-07-20 | 2017-12-01 | 武汉华星光电技术有限公司 | Vacuum decompression drying equipment |
| CN107357139A (en) * | 2017-08-01 | 2017-11-17 | 深圳市华星光电技术有限公司 | The gas extraction system and its governor motion of developing apparatus |
| CN108344254A (en) * | 2017-09-28 | 2018-07-31 | 广东聚华印刷显示技术有限公司 | Minton dryer |
| CN108344254B (en) * | 2017-09-28 | 2020-10-23 | 广东聚华印刷显示技术有限公司 | Vacuum drying device |
| CN108759360A (en) * | 2018-06-20 | 2018-11-06 | 京东方科技集团股份有限公司 | Evaporate auxiliary device and drying equipment |
| CN110328975A (en) * | 2019-07-01 | 2019-10-15 | 深圳市华星光电半导体显示技术有限公司 | Minton dryer |
| CN111928596A (en) * | 2020-08-20 | 2020-11-13 | 海盐汇联通用配件有限公司 | Fastener material receiving box with draining effect |
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| Publication number | Publication date |
|---|---|
| WO2015109985A1 (en) | 2015-07-30 |
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