CN103744139B - Color film layer manufacturing method thereof - Google Patents
Color film layer manufacturing method thereof Download PDFInfo
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- CN103744139B CN103744139B CN201310741499.7A CN201310741499A CN103744139B CN 103744139 B CN103744139 B CN 103744139B CN 201310741499 A CN201310741499 A CN 201310741499A CN 103744139 B CN103744139 B CN 103744139B
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Abstract
The present invention relates to Display Technique field, disclose a kind of color film layer manufacturing method thereof, including step: the region of corresponding sub-pix is formed and includes black matrix groove and the figure of colorized optical filtering film trap on the passivation layer of array base palte；In described N kind colorized optical filtering film trap, form N kind colored filter by the colored filter arrangement mode preset, and in black matrix groove, form the colored filter including at least two color, to form color film layer.The present invention forms black matrix by the way of using ink-jet on color film layer, and the TFT of such bottom emitting OLED will not be irradiated by light, and will not produce the situation that photoelectric effect causes leakage current to increase, thus improve display effect.
Description
Technical field
The present invention relates to Display Technique field, particularly to a kind of color film layer manufacturing method thereof.
Background technology
The color film layer of the OLED pixel structure that traditional bottom is launched is as depicted in figs. 1 and 2, generally include the colored filter of three kinds of colors of red, green, blue, also include that via 1 is for making top anode connect thin film transistor (TFT) 3(TFT), if anode is transparency electrode in bottom, it is also possible to need not via 1.As in figure 2 it is shown, owing to being bottom emitting, the light of outgoing can be irradiated on TFT3, TFT3 produces photoelectric effect under light illumination, can cause the situation that leakage current increases, thus affect display effect.
Summary of the invention
(1) to solve the technical problem that
The technical problem to be solved in the present invention is: for the OLED of bottom emitting, how to avoid TFT to be irradiated by light.
(2) technical scheme
For solving above-mentioned technical problem, the invention provides a kind of color film layer manufacturing method thereof, including step:
Formed over the passivation layer and include black matrix groove and the figure of colorized optical filtering film trap；
In described N kind colorized optical filtering film trap, form N kind colored filter by the colored filter arrangement mode preset, and in black matrix groove, form the colored filter including at least two color, to form color film layer.
Wherein, N times that the degree of depth is colored filter groove depth of described black matrix groove, the described colored filter arrangement mode preset of pressing forms colored filter in described colorized optical filtering film trap, and formation includes the colored filter of at least two color in black matrix groove, specifically include with the step of the color film layer of formation:
The color material of i-th kind of color is sprayed in the way of ink-jet in the colorized optical filtering film trap of described black matrix groove and predetermined i-th kind of color, i=1,2 ..., N, described N kind color material stratification black matrix in described black matrix groove.
Wherein, the degree of depth of described black matrix groove is equal with colored filter groove depth, the described colored filter arrangement mode preset of pressing forms colored filter in described colorized optical filtering film trap, and formation includes the colored filter of at least two color in black matrix groove, specifically include with the step of the color film layer of formation:
The color material of i-th kind of color is sprayed in the way of ink-jet in the colorized optical filtering film trap of described black matrix groove and predetermined i-th kind of color, i=1,2, ..., N, and control the color material of each color to the 1/N that straying quatity is the straying quatity to corresponding colorized optical filtering film trap of described black matrix groove, described N kind color material stratification black matrix in described black matrix groove.
Wherein, the degree of depth of described black matrix groove is equal with colored filter groove depth, the described colored filter arrangement mode preset of pressing forms colored filter in described colorized optical filtering film trap, and formation includes the colored filter of at least two color in black matrix groove, specifically include with the step of the color film layer of formation:
The color material of i-th kind of color is sprayed in the way of ink-jet in the colorized optical filtering film trap of predetermined i-th kind color, i=1,2, ..., N, and sprayed into while spraying into corresponding colored filter in described black matrix groove by the color material of predetermined n kind color, and control to spray into 1/n, the 2≤n ＜ N that straying quatity is the straying quatity spraying into corresponding colorized optical filtering film trap of described black matrix groove.
Wherein, described color material is color resin.
Wherein, while on the passivation layer of array base palte, the region of corresponding sub-pix forms the figure including black matrix groove and colorized optical filtering film trap, the drain region being additionally included in thin film transistor (TFT) on corresponding described array base palte on described passivation layer forms the figure of via.
Wherein, N is 3, and described N kind colored filter includes: Red lightscreening plate, green color filter and blue color filter.
Wherein, described formation in black matrix groove includes that the colored filter of at least two color is specially formation in black matrix groove and includes blue and green colored filter.
(3) beneficial effect
The present invention forms black matrix by the way of using ink-jet on color film layer, and the TFT of such bottom emitting OLED will not be irradiated by light, and will not produce the situation that photoelectric effect causes leakage current to increase, thus improve display effect.
Accompanying drawing explanation
Fig. 1 is the color film layer structure schematic diagram of a kind of bottom emitting OLED of the prior art；
Fig. 2 is the schematic cross-section of the bottom emitting OLED in Fig. 1；
Fig. 3 a be the embodiment of the present invention a kind of color film layer manufacturing method thereof in formed over the passivation layer and include black matrix groove and the structural representation of colorized optical filtering film trap.
Fig. 3 b is the structural representation forming a kind of color resin on the basis of Fig. 3 a in black matrix groove and colorized optical filtering film trap；
Fig. 3 c is the structural representation forming another kind of color resin on the basis of Fig. 3 b in black matrix groove；
Fig. 3 d is a kind of color film layer plane schematic diagram that a kind of color film layer manufacturing method thereof of the embodiment of the present invention ultimately forms；
Fig. 3 e is the sectional view in Fig. 3 d along A-A；
Fig. 4 is the color film layer structure schematic diagram that the another kind of color film layer manufacturing method thereof of the embodiment of the present invention ultimately forms；
Fig. 5 is the color film layer structure schematic diagram that another color film layer manufacturing method thereof of the embodiment of the present invention ultimately forms.
Detailed description of the invention
Below in conjunction with the accompanying drawings and embodiment, the detailed description of the invention of the present invention is described in further detail.Following example are used for illustrating the present invention, but are not limited to the scope of the present invention.
The color film layer manufacturing method thereof of the present invention is mainly used in the OLED display panel of bottom emitting, including:
Step one, on the passivation layer 300 of array base palte, the region of corresponding sub-pix is formed and includes black matrix groove 310 and the figure of colorized optical filtering film trap 320.The most as shown in Figure 3 a, patterning processes (include photoresist apply, expose, develop, etch, the technique such as photoresist lift off) can be passed through and make black matrix groove 310 and colorized optical filtering film trap 320 over the passivation layer, in spraying into color resin (can also be other color material) after being used for.
Step 2, as shown in Fig. 3 b～3e, forms N kind colored filter in described N kind colorized optical filtering film trap 320 by the colored filter arrangement mode preset, and forms the colored filter including at least two color in black matrix groove 310, to form color film layer.In the present embodiment, as a example by N=3, i.e. color film layer includes three kinds of colors of red, green, blue.
As shown in Figure 3 a, the degree of depth of black matrix groove 310 can be N times of colored filter groove 320 degree of depth, i.e. 3 times.The color resin of i-th kind of color is sprayed in the way of ink-jet in the colorized optical filtering film trap of described black matrix groove and predetermined i-th kind of color, i=1,2 ..., N, described N kind color resin stratification black matrix in described black matrix groove.
As shown in Figure 3 b, red resin 340 is sprayed in the way of ink-jet in described black matrix groove 310 and red colorized optical filtering film trap 320, in red colorized optical filtering film trap 320, define Red lightscreening plate.As shown in Figure 3 c, again green resin 350 is sprayed in the way of ink-jet in described black matrix groove 310 and green colorized optical filtering film trap, owing to green resin 350 does not spray into the colorized optical filtering film trap of redness, now red colorized optical filtering film trap is still Red lightscreening plate, but black matrix groove 310 has sprayed into red resin 340 and green resin 350.The most again blue resins 360 is sprayed in the way of ink-jet in described black matrix groove 310 and blue colorized optical filtering film trap.As shown in fig. 3 d and 3e, black matrix groove now sprays into red tree 340 fat, green resin 350 and blue resins 360, has i.e. defined black matrix, and, each colorized optical filtering film trap also form corresponding colored filter.
May need to be that the anode on top connects TFT in the OLED of bottom emitting, therefore the most also on passivation layer 310, the drain region of the TFT of corresponding array base palte forms the via 330 connecting TFT for anode.It is transparency electrode and the structure in bottom for anode, is then not required to via 330.
The present invention forms black matrix by the way of using ink-jet on color film layer, and the TFT of such bottom emitting OLED will not be irradiated by light, and will not produce the situation that photoelectric effect causes leakage current to increase, thus improve display effect.
Due to black matrix groove N times that the degree of depth is colored filter groove depth, in black matrix, the color resin of each color is identical with the color resin consumption of corresponding formation colored filter, it is made without consumption control, fairly simple when spraying into control, but color resin consumption is more.
Alternatively, the degree of depth making black matrix groove in step one is equal with colored filter groove depth, and step 2 can also be:
The color resin of i-th kind of color is sprayed in the way of ink-jet in the colorized optical filtering film trap of described black matrix groove and predetermined i-th kind of color, i=1,2, ..., N, and control the color resin of each color to the 1/N that straying quatity is the straying quatity to corresponding colorized optical filtering film trap of described black matrix groove, described N kind color resin stratification black matrix in described black matrix groove.
As shown in Figure 4, now the degree of depth of black matrix groove is equal with colored filter groove depth, and the respective resin of RGB is the 1/3 of the resin demand forming colored filter accordingly, thus saves resin demand.
Alternatively, the degree of depth making black matrix groove in step one is equal with colored filter groove depth, and step 2 can also be:
The color resin of i-th kind of color is sprayed in the way of ink-jet in the colorized optical filtering film trap of predetermined i-th kind color, i=1,2, ..., N, and sprayed into while spraying into corresponding colored filter in described black matrix groove by the color resin of predetermined n kind color, and control to spray into 1/n, the 2≤n ＜ N that straying quatity is the straying quatity spraying into corresponding colorized optical filtering film trap of described black matrix groove.
As it is shown in figure 5, only green resin and blue resins can be sprayed in black matrix groove, green resin and blue resins can form black matrix.And green and the respective resin of blueness are the 1/2 of the resin demand forming colored filter accordingly, and it is provided without red resin formation black matrix, thus saves resin demand.
The color film layer manufacturing method thereof of the present invention may be equally applicable for the making of the color membrane substrates of display panels, uses the mode of ink-jet relatively to make color film optical filters with mask plate technique and black matrix cost is lower.
The color film layer manufacturing method thereof of the present invention can be used for the making of the color membrane substrates of liquid crystal indicator, and simply the making supporting body in step one is different, is not the passivation layer of array base palte, but individually glass substrate.
Embodiment of above is merely to illustrate the present invention; and not limitation of the present invention; those of ordinary skill about technical field; without departing from the spirit and scope of the present invention; can also make a variety of changes and modification; the technical scheme of the most all equivalents falls within scope of the invention, and the scope of patent protection of the present invention should be defined by the claims.
Claims (8)
1. a color film layer manufacturing method thereof, it is characterised in that include step:
On the passivation layer of array base palte the region of corresponding sub-pix formed include black matrix groove and
The figure of colorized optical filtering film trap；
In colorized optical filtering film trap described in N kind, N is formed as the colored filter arrangement mode preset
Plant colored filter, and in black matrix groove, form the colorized optical filtering including at least two color
Sheet, to form color film layer；
The height equal to described black matrix groove of the height of color material, institute in described black matrix groove
State colorized optical filtering film trap prize color material height equal to described colorized optical filtering film trap height equal.
2. color film layer manufacturing method thereof as claimed in claim 1, it is characterised in that described black
The degree of depth of matrix groove is N times of colored filter groove depth, described by the colorized optical filtering preset
Sheet arrangement mode forms colored filter in described colorized optical filtering film trap, and in black matrix groove
Form the colored filter including at least two color, specifically wrap with the step of the color film layer of formation
Include:
The color material of i-th kind of color is sprayed in the way of ink-jet described black matrix groove and makes a reservation for
I-th kind of color colorized optical filtering film trap in, i=1,2 ..., N, described N kind color material exists
Stratification black matrix in described black matrix groove.
3. color film layer manufacturing method thereof as claimed in claim 1, it is characterised in that described black
The degree of depth of matrix groove is equal with colored filter groove depth, described by the colored filter row preset
Row mode forms colored filter in described colorized optical filtering film trap, and is formed in black matrix groove
Including the colored filter of at least two color, specifically include with the step of the color film layer of formation:
The color material of i-th kind of color is sprayed in the way of ink-jet described black matrix groove and makes a reservation for
I-th kind of color colorized optical filtering film trap in, i=1,2 ..., N, and control each color colour
Material is the straying quatity to corresponding colorized optical filtering film trap to the straying quatity of described black matrix groove
1/N, described N kind color material stratification black matrix in described black matrix groove.
4. color film layer manufacturing method thereof as claimed in claim 1, it is characterised in that described black
The degree of depth of matrix groove is equal with colored filter groove depth, described by the colored filter row preset
Row mode forms colored filter in described colorized optical filtering film trap, and is formed in black matrix groove
Including the colored filter of at least two color, specifically include with the step of the color film layer of formation:
The color material of i-th kind of color is sprayed into predetermined i-th kind color in the way of ink-jet
In colorized optical filtering film trap, i=1,2 ..., N, and by the color material of predetermined n kind color in spray
Spray into while entering corresponding colored filter in described black matrix groove, and control sprays into described black
The straying quatity of matrix groove is 1/n, the 2≤n ＜ of the straying quatity spraying into corresponding colorized optical filtering film trap
N。
5. the color film layer manufacturing method thereof as according to any one of claim 2～4, its feature exists
In, described color material is color resin.
6. color film layer manufacturing method thereof as claimed in claim 1, it is characterised in that at array
On the passivation layer of substrate, the region of corresponding sub-pix is formed and includes black matrix groove and colored filter
While the figure of groove, it is additionally included on described passivation layer thin film on corresponding described array base palte brilliant
The drain region of body pipe forms the figure of via.
7. color film layer manufacturing method thereof as claimed in claim 1, it is characterised in that N is 3,
Described N kind colored filter includes: Red lightscreening plate, green color filter and blue color filter.
8. film layer manufacturing method thereof as claimed in claim 7 color, it is characterised in that described
Black matrix groove is formed and includes that the colored filter of at least two color is specially at black matrix groove
Middle formation includes blue and green colored filter.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201310741499.7A CN103744139B (en) | 2013-12-27 | 2013-12-27 | Color film layer manufacturing method thereof |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201310741499.7A CN103744139B (en) | 2013-12-27 | 2013-12-27 | Color film layer manufacturing method thereof |
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| CN103744139A CN103744139A (en) | 2014-04-23 |
| CN103744139B true CN103744139B (en) | 2016-10-26 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3710890A4 (en) * | 2017-11-15 | 2021-06-23 | BOE Technology Group Co., Ltd. | Black matrix layer having micro-grooves, display substrate, and display apparatus |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107275512A (en) | 2017-05-25 | 2017-10-20 | 厦门天马微电子有限公司 | A kind of organic EL display panel, its preparation method and display device |
| CN108364985A (en) * | 2018-02-08 | 2018-08-03 | 深圳市华星光电半导体显示技术有限公司 | A kind of OLED display panel |
| TWI669556B (en) * | 2018-06-29 | 2019-08-21 | 友達光電股份有限公司 | Display panel |
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| CN101029945A (en) * | 2007-04-11 | 2007-09-05 | 友达光电股份有限公司 | Color light filter and its production |
| CN101029946A (en) * | 2007-04-11 | 2007-09-05 | 友达光电股份有限公司 | Production of color light filter |
| CN202453608U (en) * | 2011-11-23 | 2012-09-26 | 京东方科技集团股份有限公司 | Colour film substrate and liquid crystal display |
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Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101029945A (en) * | 2007-04-11 | 2007-09-05 | 友达光电股份有限公司 | Color light filter and its production |
| CN101029946A (en) * | 2007-04-11 | 2007-09-05 | 友达光电股份有限公司 | Production of color light filter |
| CN202453608U (en) * | 2011-11-23 | 2012-09-26 | 京东方科技集团股份有限公司 | Colour film substrate and liquid crystal display |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3710890A4 (en) * | 2017-11-15 | 2021-06-23 | BOE Technology Group Co., Ltd. | Black matrix layer having micro-grooves, display substrate, and display apparatus |
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