CN103692764B - 具有标记的印版前体以及由该前体制备印版的方法 - Google Patents

具有标记的印版前体以及由该前体制备印版的方法 Download PDF

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Publication number
CN103692764B
CN103692764B CN201310459332.1A CN201310459332A CN103692764B CN 103692764 B CN103692764 B CN 103692764B CN 201310459332 A CN201310459332 A CN 201310459332A CN 103692764 B CN103692764 B CN 103692764B
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CN
China
Prior art keywords
mark
layer
support member
photopolymerizable
printing plate
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CN201310459332.1A
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English (en)
Chinese (zh)
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CN103692764A (zh
Inventor
R·布洛姆奎斯特
V·朗古
A·朗古
R·萨布拉马尼安
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DuPont Electronics Inc
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EI Du Pont de Nemours and Co
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0012—Processes making use of the tackiness of the photolithographic materials, e.g. for mounting; Packaging for photolithographic material; Packages obtained by processing photolithographic materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41F—PRINTING MACHINES OR PRESSES
    • B41F11/00—Rotary presses or machines having forme cylinders carrying a plurality of printing surfaces, or for performing letterpress, lithographic, or intaglio processes selectively or in combination
    • B41F11/02—Rotary presses or machines having forme cylinders carrying a plurality of printing surfaces, or for performing letterpress, lithographic, or intaglio processes selectively or in combination for securities

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Printing Methods (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Printing Plates And Materials Therefor (AREA)
CN201310459332.1A 2012-09-27 2013-09-25 具有标记的印版前体以及由该前体制备印版的方法 Active CN103692764B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201261706175P 2012-09-27 2012-09-27
US61/706,175 2012-09-27

Publications (2)

Publication Number Publication Date
CN103692764A CN103692764A (zh) 2014-04-02
CN103692764B true CN103692764B (zh) 2018-01-26

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN201310459332.1A Active CN103692764B (zh) 2012-09-27 2013-09-25 具有标记的印版前体以及由该前体制备印版的方法

Country Status (4)

Country Link
US (1) US9477152B2 (enExample)
EP (1) EP2722713B1 (enExample)
JP (1) JP2014069575A (enExample)
CN (1) CN103692764B (enExample)

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US20150217558A1 (en) * 2014-01-31 2015-08-06 Richard R. Bielak Apparatus for forming an image on a flexographic media
WO2016099503A1 (en) * 2014-12-18 2016-06-23 Hewlett-Packard Indigo B.V. Ultraviolet-sensitive finishing mark
CN108025581B (zh) * 2015-09-25 2019-11-12 富士胶片株式会社 柔版印刷版
US10457082B2 (en) * 2017-05-09 2019-10-29 Macdermid Graphics Solutions, Llc Flexographic printing plate with improved storage stability
JP2020536770A (ja) * 2017-10-09 2020-12-17 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニーＥ．Ｉ．Ｄｕ Ｐｏｎｔ Ｄｅ Ｎｅｍｏｕｒｓ Ａｎｄ Ｃｏｍｐａｎｙ 追跡用二次元コードを有する印刷版原版及び印刷版、並びにその使用システム
ES2957695T3 (es) 2017-12-08 2024-01-24 Flint Group Germany Gmbh Procedimiento para identificar un precursor de relieve que permite producir una estructura en relieve
JP7267395B2 (ja) * 2018-04-06 2023-05-01 エスコ－グラフィックス イメージング ゲゼルシャフト ミット ベシュレンクテル ハフツング フレキソプレートにワークフロー情報を持続的にマーキングする方法、及びワークフロー情報をマーキングしたプレート
US11724533B2 (en) 2018-04-06 2023-08-15 Esko-Graphics Imaging Gmbh System and process for persistent marking of flexo plates and plates marked therewith
FR3085304B1 (fr) 2018-08-31 2021-01-08 D Uniflexo Forme imprimante photosensible pour un procede d’impression flexographique comprenant des informations visibles et non imprimables, procede de preparation d’une telle forme imprimante
WO2020156692A1 (en) * 2019-02-01 2020-08-06 Esko-Graphics Imaging Gmbh System and process for persistent marking of flexo plates and plates marked therewith
CN109932872B (zh) * 2019-02-14 2021-02-26 长江存储科技有限责任公司 一种标记的处理方法、套刻精度的量测方法以及标记
WO2021069489A1 (en) 2019-10-07 2021-04-15 Esko-Graphics Imaging Gmbh System and process for persistent marking of flexo plates and plates marked therewith
NL2026610B1 (en) * 2020-10-02 2022-06-03 Xeikon Prepress Nv Method and system to determine an exposure time and/or intensity to be used for obtaining a desired feature of a relief structure

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EP1345195A2 (de) * 2002-03-14 2003-09-17 Tesa AG Etikett zur Verdeckung von Informationen
EP1873588A2 (en) * 2006-06-30 2008-01-02 E.I.Du pont de nemours and company Imaging element having a photoluminescent tag, apparatus containing said imaging element and method to form a recording element using it
CN102246097A (zh) * 2008-12-10 2011-11-16 苹果公司 用于标记产品壳体的技术

Also Published As

Publication number Publication date
JP2014069575A (ja) 2014-04-21
EP2722713A2 (en) 2014-04-23
US9477152B2 (en) 2016-10-25
EP2722713B1 (en) 2020-04-15
CN103692764A (zh) 2014-04-02
US20140087306A1 (en) 2014-03-27
EP2722713A3 (en) 2015-04-29

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Effective date of registration: 20221123

Address after: Delaware

Patentee after: DuPont Electronics

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Patentee before: E.I. Nemours DuPont