CN103681201B - Sputtering ring and manufacture method thereof - Google Patents
Sputtering ring and manufacture method thereof Download PDFInfo
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- CN103681201B CN103681201B CN201210316426.9A CN201210316426A CN103681201B CN 103681201 B CN103681201 B CN 103681201B CN 201210316426 A CN201210316426 A CN 201210316426A CN 103681201 B CN103681201 B CN 103681201B
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Abstract
A kind of sputtering ring and manufacture method thereof, the first end that described manufacture method is included in sputtering ring forms groove, on the second end, forms Embedded Division, the shape of groove is identical with the shape of Embedded Division and the width of groove is not more than Embedded Division, groove have be suitable for stop Embedded Division from the out of gear mesh barrier of groove.Compared with existing method sputtering ring blank first end and the second end are fixed together by welding procedure, after in the present invention, sputtering ring blank first end and the second end are fixed together, the junction of first end and the second end can not form solder, therefore, can not impact turnery processing and processing patterns, and the hot conditions avoided in welding procedure can affect the grainiess of first end and the second end.
Description
Technical field
The present invention relates to semiconductor sputtering field, particularly relate to a kind of sputtering ring and the manufacture method thereof that can retrain sputtering particle movement locus.
Background technology
Sputtering is a kind of film deposition technique conventional in modern semiconductor chips production process, and its operation principle is: utilize charged particle bombardment target, makes target atom overflow from surface and be deposited on substrate.Fig. 1 is existing a kind of schematic diagram utilizing target deposit film on wafer, as shown in Figure 1, direction due to charged particle bombardment target is uncertain, cause to depart from target material surface from all directions from the target atom of target 1 surface effusion, linearly arrive wafer 2 surface afterwards, and then make the uniformity of film on wafer 2 poor.In order to improve the deposition uniformity of film; in sputter procedure, usually can a sputtering ring 3 be set between target 1 and wafer 2; sputtering ring 3 can retrain the movement locus of target atom; namely make from target 1 surface sputtering being focused onto above wafer 2 towards the target atom of moving from all directions out, and sputtered atom can be deposited on wafer 2 uniformly.Moreover, inner surface and the outer surface of sputtering ring 3 are also formed with decorative pattern, to adsorb a large amount of particles produced in sputter procedure, thus play the effect of purification.
Existing sputtering ring 3 usually manufactures by the following method and forms: provide sputtering ring blank, described sputtering ring blank is a strip metal plate; Bending sputtering ring blank, and by welding procedure by two of sputtering ring blank welding edges together, makes sputtering ring blank form a closed ring; The inner surface of sputtering ring blank and outer surface are carried out to turning, form decorative pattern at the inner surface of sputtering ring blank and outer surface.Because two ends of sputtering ring blank utilize welding procedure to be fixed together, therefore, can solder be there is in the weld of sputtering ring, and the hardness of solder usually can be very large, so that very large impact can be caused on the turnery processing carried out after welding procedure and processing patterns, as cannot turning solder, shorten life-span etc. of lathe tool; In addition, the high temperature in welding procedure can affect the grainiess of weld in sputtering ring, thus have impact on the performance of sputtering ring.
Summary of the invention
The object of this invention is to provide a kind of manufacture method of sputtering ring, to eliminate the harmful effect that in existing sputtering ring manufacture method, welding procedure causes turnery processing and processing patterns, and avoid the hot conditions in welding procedure can affect the grainiess of sputtering ring.
Another object of the present invention is to provide a kind of sputtering ring utilizing above-mentioned manufacture method manufacture.
Particularly, the manufacture method of sputtering ring provided by the present invention comprises:
There is provided sputtering ring blank, described sputtering ring blank has first end and the second end;
Described first end is formed one or more spaced groove, described the second end is formed one or more spaced Embedded Division, the shape of described groove is identical with the shape of described Embedded Division and width that is described groove is not more than described Embedded Division, and described groove has and is suitable for stoping described Embedded Division from the out of gear mesh barrier of described groove;
Described Embedded Division is pressed in described groove, realizes the interference fit of described Embedded Division and groove, and described first end and the second end are fixed together formation sputtering ring;
Turnery processing is carried out to the inner surface of described sputtering ring, then, forms decorative pattern at the inner surface of described sputtering ring.
Alternatively, described groove has the first side wall and the second sidewall that are oppositely arranged, along the depression direction of described groove, the distance between the described the first side wall of part and described second sidewall of part is had at least to change according to the mode increased gradually, or, having at least the distance between the described the first side wall of part and described second sidewall of part first to remain on, the first width is constant is then changed to the second width and to remain on the second width constant, and described second width is greater than the first width.
Alternatively, along the depression direction of described groove, the distance between described the first side wall and the second sidewall changes according to the mode increased gradually;
Or along the depression direction of described groove, the mode that the distance between described the first side wall and the second sidewall reduces after increasing gradually according to elder generation gradually changes;
Or, along the depression direction of described groove, the distance between described the first side wall and the second sidewall according to first increase gradually then remain unchanged after the mode that reduces gradually change;
Or along the depression direction of described groove, the mode that the distance between described the first side wall and the second sidewall increases after reducing gradually according to elder generation gradually changes;
Or along the depression direction of described groove, the distance between described the first side wall and the second sidewall changes according to the mode increased gradually after first remaining unchanged;
Or along the depression direction of described groove, the mode that the distance between described the first side wall and the second sidewall reduces after then increasing gradually according to first remaining unchanged gradually changes;
Or along the depression direction of described groove, the distance between described the first side wall and described second sidewall first remains on that the first width is constant then increases to the second width and to remain on the second width constant gradually, and described second width is greater than the first width;
Or along the depression direction of described groove, the distance between described the first side wall and described second sidewall first remains on that the first width is constant then to suddenly change to the second width and to remain on the second width constant, and described second width is greater than the first width.
Alternatively, the difference of the width of described Embedded Division and the width of described groove is 0.04mm ~ 0.16mm.
Alternatively, the difference of the height of described Embedded Division and the degree of depth of described groove is ± 0.04mm ~ ± 0.16mm.
Alternatively, linear cutting equipment is utilized to form described groove and Embedded Division.
Alternatively, hammer is utilized to be pressed in described groove by described Embedded Division.
Alternatively, also comprise and turnery processing is carried out to the outer surface of described sputtering ring, then form the step of decorative pattern at the outer surface of described sputtering ring.
Alternatively, before forming decorative pattern after turnery processing is carried out to the inner surface of described sputtering ring and at the inner surface of described sputtering ring, and before forming decorative pattern after turnery processing is carried out to the outer surface of described sputtering ring and at the outer surface of described sputtering ring, also comprise the step of the inner surface of described sputtering ring and outer surface being carried out to polishing.
Alternatively, described polishing makes the inner surface of described sputtering ring and the fineness of outer surface be 0.2Ra ~ 0.3Ra.
Alternatively, the knurled wheel utilizing model to be 80TPI forms described decorative pattern at the inner surface of described sputtering ring and outer surface.
Alternatively, the amount of pressure drop forming described knurled wheel during described decorative pattern is 0.7mm ~ 1.5mm.Alternatively, the material of described sputtering ring is tantalum, copper or titanium.
Particularly, sputtering ring provided by the present invention has the first end and the second end that are fixed together, described first end is provided with one or more spaced groove, described the second end is provided with one or more spaced Embedded Division, the shape of described groove is identical with the shape of described Embedded Division, and described groove and Embedded Division are assembled together with interference fit, described groove has and is suitable for stoping described Embedded Division from the out of gear mesh barrier of described groove, and the inner surface of described sputtering ring is formed with decorative pattern.
Alternatively, described groove has the first side wall and the second sidewall that are oppositely arranged, along the depression direction of described groove, the distance between the described the first side wall of part and described second sidewall of part is had at least to change according to the mode increased gradually, or, having at least the distance between the described the first side wall of part and described second sidewall of part first to remain on, the first width is constant is then changed to the second width and to remain on the second width constant, and described second width is greater than the first width.
Alternatively, along the depression direction of described groove, the distance between described the first side wall and the second sidewall changes according to the mode increased gradually;
Or along the depression direction of described groove, the mode that the distance between described the first side wall and the second sidewall reduces after increasing gradually according to elder generation gradually changes;
Or, along the depression direction of described groove, the distance between described the first side wall and the second sidewall according to first increase gradually then remain unchanged after the mode that reduces gradually change;
Or along the depression direction of described groove, the mode that the distance between described the first side wall and the second sidewall increases after reducing gradually according to elder generation gradually changes;
Or along the depression direction of described groove, the distance between described the first side wall and the second sidewall changes according to the mode increased gradually after first remaining unchanged;
Or along the depression direction of described groove, the mode that the distance between described the first side wall and the second sidewall reduces after then increasing gradually according to first remaining unchanged gradually changes;
Or along the depression direction of described groove, the distance between described the first side wall and described second sidewall first remains on that the first width is constant then increases to the second width and to remain on the second width constant gradually, and described second width is greater than the first width;
Or along the depression direction of described groove, the distance between described the first side wall and described second sidewall first remains on that the first width is constant then to suddenly change to the second width and to remain on the second width constant, and described second width is greater than the first width.
Alternatively, the outer surface of described sputtering ring is formed with decorative pattern.
Alternatively, the material of described sputtering ring is tantalum, copper or titanium.
Compared with prior art, the present invention has the following advantages:
Compared with existing method sputtering ring blank first end and the second end are fixed together by welding procedure, after sputtering ring blank first end and the second end are fixed together by the present invention by the way, the junction of first end and the second end can not form solder, therefore, can not impact turnery processing and processing patterns, and the hot conditions avoided in welding procedure can affect the grainiess of first end and the second end.Further, because groove has barrier, after groove and Embedded Division are assembled together with interference fit, under the barrier effect of barrier, Embedded Division can be prevented to be separated from from groove, make first end more firm with being fixedly connected with of the second end.
Accompanying drawing explanation
Fig. 1 is existing a kind of schematic diagram utilizing target deposit film on wafer;
Fig. 2 is the structural representation of sputtering ring blank in embodiments of the invention one;
Fig. 3 is the structural representation of sputtering ring blank in embodiments of the invention two;
Fig. 4 is the structural representation of sputtering ring blank in embodiments of the invention three;
Fig. 5 is the structural representation of sputtering ring blank in embodiments of the invention four;
Fig. 6 is the structural representation of sputtering ring blank in embodiments of the invention five;
Fig. 7 is the structural representation of sputtering ring blank in embodiments of the invention six;
Fig. 8 is the structural representation of sputtering ring blank in embodiments of the invention seven;
Fig. 9 is the structural representation of sputtering ring blank in embodiments of the invention eight.
Embodiment
Below in conjunction with accompanying drawing, by specific embodiment, carry out clear, complete description to technical scheme of the present invention, obviously, described embodiment is only a part for embodiment of the present invention, instead of they are whole.According to these embodiments, those of ordinary skill in the art's obtainable other execution modes all under without the need to the prerequisite of creative work, all belong to protection scope of the present invention.
The manufacture method of sputtering ring provided by the present invention comprises:
Step S1: provide sputtering ring blank, it has first end and the second end.
The material of sputtering ring blank is metal.As shown in Fig. 2 to Fig. 9, in one embodiment, sputtering ring blank 100 is one piece of rectangular metal plate, and it has first end 110 and the second end 120.Certainly, sputtering ring blank 100 also can be suitable in other shape manufacturing processing.
Step S2: form one or more spaced groove on the first end, the second end is formed one or more spaced Embedded Division, and the shape of groove is identical with the shape of Embedded Division.
On first end 110, the quantity of groove 111 is equal with the quantity of Embedded Division 121 on the second end 120.Groove 111 has barrier, and after Embedded Division 121 is assembled together with groove 111, and when drawing first end 110, the second end 120 respectively along two contrary directions, barrier can prevent Embedded Division 121 to be separated from from groove 111.In the present invention, the size by arranging groove 111 has described barrier to make groove 111.
Groove 111 has the first side wall 112, second sidewall 113 be oppositely arranged, and Embedded Division 121 has the first side wall 122, second sidewall 123 be oppositely arranged, using the width W of the distance between the first side wall 112 and the second sidewall 113 as groove 111
1, using the width W of the distance between the first side wall 122 and the second sidewall 123 as Embedded Division 121
2, the width W of groove 111
1be not more than the width W of Embedded Division 121
2.Direction shown in arrow A, the distance between the first side wall 112 and the second sidewall 113 and the width W of groove 111 in the depression direction and figure of groove 111
1not remain unchanged always.Correspondingly, because the shape of groove 111 is identical with the shape of Embedded Division 121, protrude out direction shown in arrow B in direction and figure, the distance between the first side wall 122 and the second sidewall 123 and the width W of Embedded Division 121 along Embedded Division 121
2also not remain unchanged always.Along direction shown in arrow A, distance between the first side wall 112 and the second sidewall 113 can have multiple variation pattern, correspondingly, along direction shown in arrow B, the variation pattern of the distance between the first side wall 122 with the second sidewall 123 is identical with the distance variation pattern between the first side wall 112 and the second sidewall 113.
In embodiments of the invention one, as shown in Figure 2, first end 110 forms multiple (for three in Fig. 2) spaced groove 111, the second end 120 is formed multiple (for three in Fig. 2) spaced Embedded Division 121.Along direction shown in arrow A, the distance between the first side wall 112 and the second sidewall 113 changes according to the mode increased gradually; Correspondingly, along direction shown in arrow B, the distance between the first side wall 122 and the second sidewall 123 changes according to the mode increased gradually.This groove 111 shown in Fig. 2 is called dovetail groove, Embedded Division 121 is called dovetail.In embodiment one, whole the first side wall 112 and whole second sidewall 113 are described barrier.
In embodiments of the invention two, as shown in Figure 3, first end 110 forms multiple (for three in Fig. 3) spaced groove 111, the second end 120 is formed multiple (for three in Fig. 3) spaced Embedded Division 121.Along direction shown in arrow A, the mode that distance between the first side wall 112 and the second sidewall 113 reduces after increasing gradually according to elder generation gradually changes, in other words, described in part the first side wall 112 and part second sidewall 113(, part the first side wall 112 and part second sidewall 113 are in being oppositely arranged) between distance increase gradually, the distance between part the first side wall 112 and part second sidewall 113 reduces gradually; Correspondingly, along direction shown in arrow B, the mode that distance between the first side wall 122 and the second sidewall 123 reduces after increasing gradually according to elder generation gradually changes, in other words, described in part the first side wall 122 and part second sidewall 123(, part the first side wall 122 and part second sidewall 123 are in being oppositely arranged) between distance increase gradually, the distance between part the first side wall 122 and part second sidewall 123 reduces gradually.In embodiment two, the distance between the first side wall 112 and the second sidewall 113 is described barrier according to the sidewall sections that the mode that increases gradually changes.
In embodiments of the invention three, as shown in Figure 4, first end 110 forms multiple (for three in Fig. 4) spaced groove 111, the second end 120 is formed multiple (for three in Fig. 4) spaced Embedded Division 121.Along direction shown in arrow A, distance between the first side wall 112 and the second sidewall 113 according to first increase gradually then remain unchanged after the mode that reduces gradually change, in other words, described in part the first side wall 112 and part second sidewall 113(, part the first side wall 112 and part second sidewall 113 are in being oppositely arranged) between distance increase gradually, distance between part the first side wall 112 and part second sidewall 113 remains unchanged, and the distance between part the first side wall 112 and part second sidewall 113 reduces gradually; Correspondingly, along direction shown in arrow B, distance between the first side wall 122 and the second sidewall 123 according to first increase gradually then remain unchanged after the mode that reduces gradually change, in other words, described in part the first side wall 122 and part second sidewall 123(, part the first side wall 122 and part second sidewall 123 are in being oppositely arranged) between distance increase gradually, distance between part the first side wall 122 and part second sidewall 123 remains unchanged, and the distance between part the first side wall 122 and part second sidewall 123 reduces gradually.In embodiment three, the distance between the first side wall 112 and the second sidewall 113 is described barrier according to the sidewall sections that the mode that increases gradually changes.
In embodiments of the invention four, as shown in Figure 5, first end 110 forms multiple (for three in Fig. 5) spaced groove 111, the second end 120 is formed multiple (for three in Fig. 5) spaced Embedded Division 121.Along direction shown in arrow A, the mode that distance between the first side wall 112 and the second sidewall 113 increases after reducing gradually according to elder generation gradually changes, in other words, described in part the first side wall 112 and part second sidewall 113(, part the first side wall 112 and part second sidewall 113 are in being oppositely arranged) between distance reduce gradually, the distance between part the first side wall 112 and part second sidewall 113 increases gradually; Correspondingly, along direction shown in arrow B, the mode that distance between the first side wall 122 and the second sidewall 123 increases after reducing gradually according to elder generation gradually changes, in other words, described in part the first side wall 122 and part second sidewall 123(, part the first side wall 122 and part second sidewall 123 are in being oppositely arranged) between distance reduce gradually, the distance between part the first side wall 122 and part second sidewall 123 increases gradually.In embodiment four, the distance between the first side wall 112 and the second sidewall 113 is described barrier according to the sidewall sections that the mode that increases gradually changes.
In embodiments of the invention five, as shown in Figure 6, first end 110 forms multiple (for three in Fig. 6) spaced groove 111, the second end 120 is formed multiple (for three in Fig. 6) spaced Embedded Division 121.Along direction shown in arrow A, distance between the first side wall 112 and the second sidewall 113 changes according to the mode increased gradually after first remaining unchanged, in other words, described in part the first side wall 112 and part second sidewall 113(, part the first side wall 112 and part second sidewall 113 are in being oppositely arranged) between distance remain unchanged, the distance between part the first side wall 112 and part second sidewall 113 increases gradually; Correspondingly, along direction shown in arrow B, distance between the first side wall 122 and the second sidewall 123 changes according to the mode increased gradually after first remaining unchanged, in other words, described in part the first side wall 122 and part second sidewall 123(, part the first side wall 122 and part second sidewall 123 are in being oppositely arranged) between distance remain unchanged, the distance between part the first side wall 122 and part second sidewall 123 increases gradually.In embodiment five, the distance between the first side wall 112 and the second sidewall 113 is described barrier according to the sidewall sections that the mode that increases gradually changes.
In embodiments of the invention six, as shown in Figure 7, first end 110 forms multiple (for three in Fig. 7) spaced groove 111, the second end 120 is formed multiple (for three in Fig. 7) spaced Embedded Division 121.Along direction shown in arrow A, the mode reduced gradually after distance between the first side wall 112 and the second sidewall 113 then increases gradually according to first remaining unchanged changes, in other words, described in part the first side wall 112 and part second sidewall 113(, part the first side wall 112 and part second sidewall 113 are in being oppositely arranged) between distance remain unchanged, distance between part the first side wall 112 and part second sidewall 113 increases gradually, and the distance between part the first side wall 112 and part second sidewall 113 reduces gradually; Correspondingly, along direction shown in arrow B, the mode reduced gradually after distance between the first side wall 122 and the second sidewall 123 then increases gradually according to first remaining unchanged changes, in other words, described in part the first side wall 122 and part second sidewall 123(, part the first side wall 122 and part second sidewall 123 are in being oppositely arranged) between distance remain unchanged, distance between part the first side wall 122 and part second sidewall 123 increases gradually, and the distance between part the first side wall 122 and part second sidewall 123 reduces gradually.In embodiment six, the distance between the first side wall 112 and the second sidewall 113 is described barrier according to the sidewall sections that the mode that increases gradually changes.
In embodiments of the invention seven, as shown in Figure 8, first end 110 forms multiple (for three in Fig. 8) spaced groove 111, the second end 120 is formed multiple (for three in Fig. 8) spaced Embedded Division 121.Along direction shown in arrow A, distance between the first side wall 112 and the second sidewall 113 first remains on that the first width is constant then increases to the second width and to remain on the second width constant gradually, in other words, described in part the first side wall 112 and part second sidewall 113(, part the first side wall 112 and part second sidewall 113 are in being oppositely arranged) between distance remain on the first width, distance between part the first side wall 112 and part second sidewall 113 increases gradually, distance between part the first side wall 112 and part second sidewall 113 remains on the second width, described second width is greater than the first width, correspondingly, along direction shown in arrow B, distance between the first side wall 122 and the second sidewall 123 first remains on that the first width is constant then increases to the second width and to remain on the second width constant gradually, in other words, described in part the first side wall 122 and part second sidewall 123(, part the first side wall 122 and part second sidewall 123 are in being oppositely arranged) between distance remain on the first width, distance between part the first side wall 122 and part second sidewall 123 increases gradually, distance between part the first side wall 122 and part second sidewall 123 remains on the second width.In embodiment seven, the distance between the first side wall 112 and the second sidewall 113 is described barrier according to the sidewall sections that the mode that increases gradually changes.
In embodiments of the invention eight, as shown in Figure 9, first end 110 forms multiple (for three in Fig. 9) spaced groove 111, the second end 120 is formed multiple (for three in Fig. 9) spaced Embedded Division 121.Along direction shown in arrow A, distance between the first side wall 112 and the second sidewall 113 first remains on that the first width is constant then to suddenly change to the second width and to remain on the second width constant, in other words, described in part the first side wall 112 and part second sidewall 113(, part the first side wall 112 and part second sidewall 113 are in being oppositely arranged) between distance remain on the first width, then, distance cataclysm to the second width between part the first side wall 112 and part second sidewall 113 also remains on the second width, and described second width is greater than the first width; Correspondingly, along direction shown in arrow B, distance between the first side wall 122 and the second sidewall 123 is constant then suddenlys change to the second width and to remain on the second width constant, in other words, described in part the first side wall 122 and part second sidewall 123(, part the first side wall 122 and part second sidewall 123 are in being oppositely arranged) between distance remain on the first width, then, distance cataclysm to the second width between part the first side wall 122 and part second sidewall 123, and remain on the second width.In embodiment eight, the distance between the first side wall 112 and the second sidewall 113 is described barrier by the part of the first width cataclysm to the second width.
Certainly, in embodiment seven and embodiment eight, distance between the first side wall 112 and the second sidewall 113 also can by alternate manner by the first change width to the second width, such as, the distance between the first side wall 112 and the second sidewall 113 first remains on that the first width is constant then to be reduced then to suddenly change to the second width and to remain on the second width constant gradually.
Step S3: Embedded Division is pressed in groove.
As previously mentioned, due to the width W of groove 111
1be not more than the width W of Embedded Division 121
2if will Embedded Division 121 be embedded in groove 111, Embedded Division 121 on the second end 120 need be aimed at the groove 111 on first end 110, then utilize the method for knocking to be pressed in groove 111 gradually by Embedded Division 121, until Embedded Division 121 can fill completely whole groove 111 completely.Owing to being assembled together with interference fit between Embedded Division 121 and groove 111, therefore, Embedded Division 121 can be fixed together with groove 111, thus the first end 110 of sputtering ring blank 100 can be fixed together with the second end 120 and form sputtering ring.
Further, because groove 111 has described barrier, after groove 111 and Embedded Division 121 are assembled together, under the barrier effect of described barrier, Embedded Division 121 can be prevented to be separated from from groove 111, to make first end 110 more firm with being fixedly connected with of the second end 120.
In order to make Embedded Division 121 can more easily be pressed in groove 111, to realize the interference fit of Embedded Division 121 and groove 111, the initial press-in end of Embedded Division 121 is formed with chamfering.
Step S4: carry out turnery processing to the inner surface of sputtering ring and outer surface, then, forms decorative pattern at the inner surface of sputtering ring and outer surface.
When carrying out turnery processing to the inner surface of sputtering ring, the fixture on adjustment lathe, makes the diameter of fixture and the external diameter of sputtering ring match, and to be fixed on fixture and to control the circularity of sputtering ring to make sputtering ring; When carrying out turnery processing to the outer surface of sputtering ring, the fixture on adjustment lathe, makes the diameter of fixture and the internal diameter of sputtering ring match, and to be fixed on fixture and to control the circularity of sputtering ring to make sputtering ring.
After turnery processing is carried out to the inner surface of sputtering ring and outer surface, form decorative pattern at the inner surface of sputtering ring and outer surface.It will be understood by those skilled in the art that described decorative pattern is generally formed by multiple shape repeated arrangement, described shape can assume diamond in shape, rectangle, circular etc.The density of decorative pattern and the degree of depth can affect the catharsis of sputtering ring, when decorative pattern is too fine and closely woven, and the degree of depth more shallow time, the particle that the gap of decorative pattern will be sputtered in process after using several times fills up, if continue to use, the suction-operated of sputtering ring will weaken, and causes the particle adsorbed to drop to and is formed on the wafer of film, affect the deposition quality of film.Therefore, density and the degree of depth of decorative pattern on sputtering ring inner surface and outer surface need be rationally set.The method forming decorative pattern at sputtering ring inner surface and outer surface has multiple, as sandblasting, rolling, wire drawing, annular knurl etc.
As previously mentioned, the width W of Embedded Division 121
2be not less than the width W of groove 111
1, inventor finds, when the width W of Embedded Division 121 through research and test
2with the width W of groove 111
1difference when being 0.04mm ~ 0.16mm, Embedded Division 121 and more firm being fixed together of groove 111 can be made, thus can make between first end 110 with the second end 120 be fixedly connected with more reliable so that the carrying out of turnery processing and processing patterns.Therefore, in the embodiment of above-mentioned all sputtering ring manufacture methods, the width W of Embedded Division 121 can be made
2with the width W of groove 111
1difference be 0.04mm ~ 0.16mm.
In addition, inventor also finds, when the height H of Embedded Division 121
2with the depth H of groove 111
1difference be ± 0.04mm ~ ± 0.16mm time, while Embedded Division 121 is fixedly connected with groove 111, part 114 in first end 110 except groove 111 also can be fixed together with part 124 except Embedded Division 121 in the second end 120, thus make between first end 110 with the second end 120 be fixedly connected with more reliable.Therefore, in the embodiment of above-mentioned all sputtering ring manufacture methods, the height H of Embedded Division 121 can be made
2with the depth H of groove 111
1difference be ± 0.04mm ~ ± 0.16mm.
In the embodiment of above-mentioned all sputtering ring manufacture methods, linear cutting equipment can be utilized to form groove 111 and Embedded Division 121.Described linear cutting equipment can be the electric spark CNC wire-cut machine (model is DK7732A) that the low-speed wire cutting Wire EDM equipment (model is DK7625P) that provides of Suzhou Sanguang Science & Technology Co., Ltd. or Taizhou City Xing Yue numerical control mechanical & electronic equipment corporation, Ltd provide.
In the embodiment of above-mentioned all sputtering ring manufacture methods, for saving manufacturing cost, hammer can be utilized to be pressed in groove 111 by Embedded Division 121.Certainly, other mode being suitable for carrying out elastic conjunction also can be utilized in other embodiments to be pressed in groove 111 by Embedded Division 121.
In the embodiment of above-mentioned all sputtering ring manufacture methods, after turnery processing is carried out to the inner surface of sputtering ring and outer surface, and before the inner surface and outer surface formation decorative pattern of sputtering ring, polishing can be carried out, to reduce the roughness of sputtering ring inner surface and outer surface to the inner surface of sputtering ring and outer surface.As a specific embodiment, described polishing makes the fineness of sputtering ring inner surface and outer surface be 0.2Ra ~ 0.3Ra, such as 0.26Ra; Then, utilize model for 80TPI(toothperinch) knurled wheel (in unit 25.4mm length range formed 80 decorative patterns), and make the amount of pressure drop of knurled wheel be 0.7mm ~ 1.5mm, form decorative pattern at the inner surface of sputtering ring and outer surface.In other embodiments, only decorative pattern can be formed at the inner surface of sputtering ring.
In the embodiment of above-mentioned all sputtering ring manufacture methods, the material of described sputtering ring can be tantalum, copper or titanium.
Compared with existing method sputtering ring blank 100 first end 110 and the second end 120 are fixed together by welding procedure, after by the way sputtering ring blank 100 first end 110 and the second end 120 being fixed together, first end 110 can not form solder with the junction of the second end 120, therefore, can not impact turnery processing and processing patterns, and the hot conditions avoided in welding procedure can affect the grainiess of first end and the second end.Further, because groove 111 has barrier, after groove 111 and Embedded Division 121 are assembled together, under the barrier effect of described barrier, Embedded Division 121 can be prevented to be separated from from groove 111, to make first end 110 more firm with being fixedly connected with of the second end 120.
On the basis of above-mentioned sputtering ring manufacture method, as shown in Fig. 2 to Fig. 9, present invention also offers a kind of sputtering ring, it has the first end 110 and the second end 120 that are fixed together.First end 110 is provided with one or more spaced groove 111, the second end 120 is provided with one or more spaced Embedded Division 121, the shape of described groove 111 is identical with the shape of described Embedded Division 121, and described groove 111 is assembled together with interference fit with Embedded Division 121, therefore, the fixing of first end 110 and the second end 120 can be realized by groove 111 and Embedded Division 121 fixing.Groove 111 has barrier, and Embedded Division 121 can be prevented to be separated from from groove 111.Groove 111 has the first side wall 112 and the second sidewall 113 that are oppositely arranged, along the depression direction of described groove 111, the mode having at least the distance between the described the first side wall of part 112 and described second sidewall 113 of part to increase gradually changes, Embedded Division 121 has the first side wall 122, second sidewall 123 be oppositely arranged, protrude out direction along Embedded Division 121, the mode having at least the distance between the described the first side wall of part 122 and described second sidewall 123 of part to increase gradually changes.Or, along the depression direction of described groove 111, having at least the distance between part the first side wall 112 and part second sidewall 113 first to remain on, the first width is constant is then changed to the second width and to remain on the second width constant, and described second width is greater than the first width.Protrude out direction along Embedded Division 121, having at least the distance between part the first side wall 122 and part second sidewall 123 first to remain on, the first width is constant is then changed to the second width and to remain on the second width constant, and described second width is greater than the first width.The inner surface of described sputtering ring is formed with decorative pattern.In other embodiments, the outer surface of described sputtering ring is also formed with decorative pattern.
In embodiments of the invention one, as shown in Figure 2, first end 110 forms multiple (for three in Fig. 2) spaced groove 111, the second end 120 is formed multiple (for three in Fig. 2) spaced Embedded Division 121.Along direction shown in arrow A, the distance between the first side wall 112 and the second sidewall 113 changes according to the mode increased gradually; Correspondingly, along direction shown in arrow B, the distance between Embedded Division 121 the first side wall 122 and the second sidewall 123 changes according to the mode increased gradually.This groove 111 shown in Fig. 2 is called dovetail groove, Embedded Division 121 is called dovetail.
In embodiments of the invention two, as shown in Figure 3, first end 110 forms multiple (for three in Fig. 3) spaced groove 111, the second end 120 is formed multiple (for three in Fig. 3) spaced Embedded Division 121.Along direction shown in arrow A, the mode that the distance between the first side wall 112 and the second sidewall 113 reduces after increasing gradually according to elder generation gradually changes; Correspondingly, along direction shown in arrow B, the mode that the distance between Embedded Division 121 the first side wall 122 and the second sidewall 123 reduces after increasing gradually according to elder generation gradually changes.
In embodiments of the invention three, as shown in Figure 4, first end 110 forms multiple (for three in Fig. 4) spaced groove 111, the second end 120 is formed multiple (for three in Fig. 4) spaced Embedded Division 121.Along direction shown in arrow A, the distance between the first side wall 112 and the second sidewall 113 according to first increase gradually then remain unchanged after the mode that reduces gradually change; Correspondingly, along direction shown in arrow B, the distance between Embedded Division 121 the first side wall 122 and the second sidewall 123 according to first increase gradually then remain unchanged after the mode that reduces gradually change.
In embodiments of the invention four, as shown in Figure 5, first end 110 forms multiple (for three in Fig. 5) spaced groove 111, the second end 120 is formed multiple (for three in Fig. 5) spaced Embedded Division 121.Along direction shown in arrow A, the mode that the distance between the first side wall 112 and the second sidewall 113 increases after reducing gradually according to elder generation gradually changes; Correspondingly, along direction shown in arrow B, the mode that the distance between Embedded Division 121 the first side wall 122 and the second sidewall 123 increases after reducing gradually according to elder generation gradually changes.
In embodiments of the invention five, as shown in Figure 6, first end 110 forms multiple (for three in Fig. 6) spaced groove 111, the second end 120 is formed multiple (for three in Fig. 6) spaced Embedded Division 121.Along direction shown in arrow A, the distance between the first side wall 112 and the second sidewall 113 changes according to the mode increased gradually after first remaining unchanged; Correspondingly, along direction shown in arrow B, the distance between Embedded Division 121 the first side wall 122 and the second sidewall 123 changes according to the mode increased gradually after first remaining unchanged.
In embodiments of the invention six, as shown in Figure 7, first end 110 forms multiple (for three in Fig. 7) spaced groove 111, the second end 120 is formed multiple (for three in Fig. 7) spaced Embedded Division 121.Along direction shown in arrow A, the mode reduced gradually after the distance between the first side wall 112 and the second sidewall 113 then increases gradually according to first remaining unchanged changes; Correspondingly, along direction shown in arrow B, the mode reduced gradually after the distance between Embedded Division 121 the first side wall 122 and the second sidewall 123 then increases gradually according to first remaining unchanged changes.
In embodiments of the invention seven, as shown in Figure 8, first end 110 forms multiple (for three in Fig. 8) spaced groove 111, the second end 120 is formed multiple (for three in Fig. 8) spaced Embedded Division 121.Along direction shown in arrow A, distance between the first side wall 112 and the second sidewall 113 first remains on that the first width is constant then increases to the second width and to remain on the second width constant gradually, in other words, described in part the first side wall 112 and part second sidewall 113(, part the first side wall 112 and part second sidewall 113 are in being oppositely arranged) between distance remain on the first width, distance between part the first side wall 112 and part second sidewall 113 increases gradually, distance between part the first side wall 112 and part second sidewall 113 remains on the second width, described second width is greater than the first width, correspondingly, along direction shown in arrow B, distance between the first side wall 122 and the second sidewall 123 first remains on that the first width is constant then increases to the second width and to remain on the second width constant gradually, in other words, described in part the first side wall 122 and part second sidewall 123(, part the first side wall 122 and part second sidewall 123 are in being oppositely arranged) between distance remain on the first width, distance between part the first side wall 122 and part second sidewall 123 increases gradually, distance between part the first side wall 122 and part second sidewall 123 remains on the second width.
In embodiments of the invention eight, as shown in Figure 9, first end 110 forms multiple (for three in Fig. 9) spaced groove 111, the second end 120 is formed multiple (for three in Fig. 9) spaced Embedded Division 121.Along direction shown in arrow A, distance between the first side wall 112 and the second sidewall 113 first remains on that the first width is constant then to suddenly change to the second width and to remain on the second width constant, in other words, described in part the first side wall 112 and part second sidewall 113(, part the first side wall 112 and part second sidewall 113 are in being oppositely arranged) between distance remain on the first width, then, distance cataclysm to the second width between part the first side wall 112 and part second sidewall 113 also remains on the second width, and described second width is greater than the first width; Correspondingly, along direction shown in arrow B, distance between the first side wall 122 and the second sidewall 123 is constant then suddenlys change to the second width and to remain on the second width constant, in other words, described in part the first side wall 122 and part second sidewall 123(, part the first side wall 122 and part second sidewall 123 are in being oppositely arranged) between distance remain on the first width, then, distance cataclysm to the second width between part the first side wall 122 and part second sidewall 123, and remain on the second width.
In one embodiment, the material of described sputtering ring is tantalum, copper or titanium.
Above by the explanation of embodiment, professional and technical personnel in the field should be able to be made to understand the present invention better, and can reproduce and use the present invention.Those skilled in the art can be apparent to above-described embodiment do various changes and modifications when not departing from the spirit and scope of the invention according to principle described herein.Therefore, the present invention should not be understood to be limited to above-described embodiment shown in this article, and its protection range should be defined by appending claims.
Claims (16)
1. a manufacture method for sputtering ring, is characterized in that, comprising:
There is provided sputtering ring blank, described sputtering ring blank has first end and the second end;
Described first end is formed one or more spaced groove, described the second end is formed one or more spaced Embedded Division, the shape of described groove is identical with the shape of described Embedded Division and width that is described groove is not more than described Embedded Division, described groove has and is suitable for stoping described Embedded Division from the out of gear mesh barrier of described groove, described barrier comprises the first side wall and the second sidewall that are oppositely arranged, along the depression direction of described groove, the distance between the described the first side wall of part and described second sidewall of part is had at least to change according to the mode increased gradually, or, having at least the distance between the described the first side wall of part and described second sidewall of part first to remain on, the first width is constant is then changed to the second width and to remain on the second width constant, described second width is greater than the first width,
Described Embedded Division is pressed in described groove, realizes the interference fit of described Embedded Division and groove, and described first end and the second end are fixed together formation sputtering ring;
Turnery processing is carried out to the inner surface of described sputtering ring, then, forms decorative pattern at the inner surface of described sputtering ring.
2. method according to claim 1, is characterized in that,
Along the depression direction of described groove, the distance between described the first side wall and the second sidewall changes according to the mode increased gradually;
Or along the depression direction of described groove, the mode that the distance between described the first side wall and the second sidewall reduces after increasing gradually according to elder generation gradually changes;
Or, along the depression direction of described groove, the distance between described the first side wall and the second sidewall according to first increase gradually then remain unchanged after the mode that reduces gradually change;
Or along the depression direction of described groove, the mode that the distance between described the first side wall and the second sidewall increases after reducing gradually according to elder generation gradually changes;
Or along the depression direction of described groove, the distance between described the first side wall and the second sidewall changes according to the mode increased gradually after first remaining unchanged;
Or along the depression direction of described groove, the mode that the distance between described the first side wall and the second sidewall reduces after then increasing gradually according to first remaining unchanged gradually changes;
Or along the depression direction of described groove, the distance between described the first side wall and described second sidewall first remains on that the first width is constant then increases to the second width and to remain on the second width constant gradually, and described second width is greater than the first width;
Or along the depression direction of described groove, the distance between described the first side wall and described second sidewall first remains on that the first width is constant then to suddenly change to the second width and to remain on the second width constant, and described second width is greater than the first width.
3. method according to claim 1 and 2, is characterized in that, the difference of the width of described Embedded Division and the width of described groove is 0.04mm ~ 0.16mm.
4. method according to claim 1 and 2, is characterized in that, the difference of the height of described Embedded Division and the degree of depth of described groove is ± 0.04mm ~ ± 0.16mm.
5. method according to claim 1 and 2, is characterized in that, utilizes linear cutting equipment to form described groove and Embedded Division.
6. method according to claim 1 and 2, is characterized in that, utilizes hammer to be pressed in described groove by described Embedded Division.
7. method according to claim 1 and 2, is characterized in that, also comprises and carries out turnery processing to the outer surface of described sputtering ring, then forms the step of decorative pattern at the outer surface of described sputtering ring.
8. method according to claim 7, it is characterized in that, before forming decorative pattern after turnery processing is carried out to the inner surface of described sputtering ring and at the inner surface of described sputtering ring, and before forming decorative pattern after turnery processing is carried out to the outer surface of described sputtering ring and at the outer surface of described sputtering ring, also comprise the step of the inner surface of described sputtering ring and outer surface being carried out to polishing.
9. method according to claim 8, is characterized in that, described polishing makes the inner surface of described sputtering ring and the fineness of outer surface be 0.2Ra ~ 0.3Ra.
10. method according to claim 9, is characterized in that, the knurled wheel utilizing model to be 80TPI forms described decorative pattern at the inner surface of described sputtering ring and outer surface.
11. methods according to claim 10, is characterized in that, the amount of pressure drop forming described knurled wheel during described decorative pattern is 0.7mm ~ 1.5mm.
12. methods according to claim 1 and 2, is characterized in that, the material of described sputtering ring is tantalum, copper or titanium.
13. 1 kinds of sputtering rings, it is characterized in that, there is the first end and the second end that are fixed together, described first end is provided with one or more spaced groove, described the second end is provided with one or more spaced Embedded Division, the shape of described groove is identical with the shape of described Embedded Division, and described groove and Embedded Division are assembled together with interference fit, described groove has and is suitable for stoping described Embedded Division from the out of gear mesh barrier of described groove, described barrier comprises the first side wall and the second sidewall that are oppositely arranged, along the depression direction of described groove, the distance between the described the first side wall of part and described second sidewall of part is had at least to change according to the mode increased gradually, or, having at least the distance between the described the first side wall of part and described second sidewall of part first to remain on, the first width is constant is then changed to the second width and to remain on the second width constant, described second width is greater than the first width, the inner surface of described sputtering ring is formed with decorative pattern.
14. sputtering rings according to claim 13, is characterized in that,
Along the depression direction of described groove, the distance between described the first side wall and the second sidewall changes according to the mode increased gradually;
Or along the depression direction of described groove, the mode that the distance between described the first side wall and the second sidewall reduces after increasing gradually according to elder generation gradually changes;
Or, along the depression direction of described groove, the distance between described the first side wall and the second sidewall according to first increase gradually then remain unchanged after the mode that reduces gradually change;
Or along the depression direction of described groove, the mode that the distance between described the first side wall and the second sidewall increases after reducing gradually according to elder generation gradually changes;
Or along the depression direction of described groove, the distance between described the first side wall and the second sidewall changes according to the mode increased gradually after first remaining unchanged;
Or along the depression direction of described groove, the mode that the distance between described the first side wall and the second sidewall reduces after then increasing gradually according to first remaining unchanged gradually changes;
Or along the depression direction of described groove, the distance between described the first side wall and described second sidewall first remains on that the first width is constant then increases to the second width and to remain on the second width constant gradually, and described second width is greater than the first width;
Or along the depression direction of described groove, the distance between described the first side wall and described second sidewall first remains on that the first width is constant then to suddenly change to the second width and to remain on the second width constant, and described second width is greater than the first width.
15. sputtering rings according to claim 13 or 14, it is characterized in that, the outer surface of described sputtering ring is formed with decorative pattern.
16. sputtering rings according to claim 13 or 14, it is characterized in that, the material of described sputtering ring is tantalum, copper or titanium.
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| CN105695942B (en) * | 2014-11-28 | 2020-07-17 | 宁波江丰电子材料股份有限公司 | Ring piece structure and manufacturing method thereof |
| US11183373B2 (en) | 2017-10-11 | 2021-11-23 | Honeywell International Inc. | Multi-patterned sputter traps and methods of making |
| CN108942110B (en) * | 2018-08-21 | 2019-11-05 | 宁波江丰电子材料股份有限公司 | The processing technology for the ring shoulder annular knurl being used cooperatively with target |
| CN112475788A (en) * | 2020-10-27 | 2021-03-12 | 有研亿金新材料有限公司 | Method for manufacturing copper focusing ring |
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| CN1181115A (en) * | 1995-02-17 | 1998-05-06 | 材料研究有限公司 | Mechanically joined sputtering target and adapter therefor |
| CN1487858A (en) * | 2000-12-29 | 2004-04-07 | ��ķ�о�����˾ | Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof |
| US6992261B2 (en) * | 2003-07-15 | 2006-01-31 | Cabot Corporation | Sputtering target assemblies using resistance welding |
| CN102418075A (en) * | 2011-12-07 | 2012-04-18 | 宁波江丰电子材料有限公司 | Focus ring, focus ring combination and ionized metal plasma (IMP) sputtering equipment |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2005108646A2 (en) * | 2004-04-29 | 2005-11-17 | Academy Corporation | Rotary target locking ring assembly |
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| CN1181115A (en) * | 1995-02-17 | 1998-05-06 | 材料研究有限公司 | Mechanically joined sputtering target and adapter therefor |
| CN1487858A (en) * | 2000-12-29 | 2004-04-07 | ��ķ�о�����˾ | Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof |
| US6992261B2 (en) * | 2003-07-15 | 2006-01-31 | Cabot Corporation | Sputtering target assemblies using resistance welding |
| CN102418075A (en) * | 2011-12-07 | 2012-04-18 | 宁波江丰电子材料有限公司 | Focus ring, focus ring combination and ionized metal plasma (IMP) sputtering equipment |
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