CN103659548A - Polishing head - Google Patents
Polishing head Download PDFInfo
- Publication number
- CN103659548A CN103659548A CN201310657018.4A CN201310657018A CN103659548A CN 103659548 A CN103659548 A CN 103659548A CN 201310657018 A CN201310657018 A CN 201310657018A CN 103659548 A CN103659548 A CN 103659548A
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- China
- Prior art keywords
- assembly
- retaining ring
- rubbing head
- graduation mark
- thread
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/06—Work supports, e.g. adjustable steadies
Abstract
The invention discloses a polishing head which comprises a base assembly and a retaining ring assembly. The periphery of the base assembly is provided with a scale set, the retaining ring assembly arranged on the base assembly in a threaded matched mode, and the periphery of the retaining ring assembly is provided with indicating lines matched with the scale set. The polishing head has the advantages of avoiding piece falling, being good in polishing effect and the like.
Description
Technical field
The present invention relates to a kind of rubbing head.
Background technology
When utilizing rubbing head to carry out polishing to polished silicon wafer, be easy to sheet phenomenon (being that polished silicon wafer comes off from rubbing head), this can have a strong impact on the repeatability of polishing efficiency and polishing.
Summary of the invention
The present invention is intended at least solve one of technical problem existing in prior art.For this reason, one object of the present invention is to propose a kind of rubbing head.
To achieve these goals, according to embodiments of the invention, propose a kind of rubbing head, described rubbing head comprises: base assembly, and the side face of described base assembly is provided with graduation mark group; With retaining ring assembly, described retaining ring assembly threaded engagement is on described base assembly, and the side face of described retaining ring assembly is provided with the index line closing with described graduation mark assembly.
According to the rubbing head of the embodiment of the present invention, pass through described retaining ring assembly threaded engagement on described base assembly, thereby can regulate continuously the lower surface of described base assembly and the distance l of the lower surface of described retaining ring assembly on above-below direction, can regulate continuously the value of d-l, not only can avoid thus polished silicon wafer to depart from from described rubbing head, and can to described polished silicon wafer, carry out polishing better.In addition, by described graduation mark group being set on the side face of described base assembly and the index line closing with described graduation mark assembly being set on the side face of described retaining ring assembly, thereby can read easily, accurately, rapidly the value of d-l, to realize accurately location.Therefore, according to the rubbing head of the embodiment of the present invention, there is the advantages such as the sheet of avoiding, polishing effect be good.
In addition, according to the rubbing head of the embodiment of the present invention, can also there is following additional technical characterictic:
According to one embodiment of present invention, described base assembly comprises: Connection Block; With thread dial assembly, described thread dial assembly comprises graduation mark portion and threaded portion, described threaded portion is connected and is positioned at described graduation mark subordinate side with described graduation mark portion, described graduation mark group is located on the side face of described graduation mark portion, the side face of described threaded portion is provided with external screw thread, wherein said retaining ring assembly is provided with internal thread, and described retaining ring assembly is contained on described threaded portion by described internal thread and described external thread sleeve.Can make thus the structure of described rubbing head more reasonable.
According to one embodiment of present invention, described base assembly also comprises elastic component, and the upper end of described elastic component is connected with described Connection Block and lower end is connected with described thread dial assembly.By described elastic component is set, thereby can change continuously polish pressure, to obtain the relation of polish pressure and polishing precision.
According to one embodiment of present invention, the upper end of described elastic component is connected with described Connection Block by the first securing member, the lower end of described elastic component is connected with described thread dial assembly by the second securing member, and the upper surface of wherein said thread dial assembly is provided with the dodge groove relative with described the first securing member.Can make thus the structure of described rubbing head more reasonable, and can prevent that described the first securing member and described thread dial assembly from producing interference.
According to one embodiment of present invention, described thread dial assembly comprises: thread dial, and described thread dial comprises described graduation mark portion and described threaded portion; And buffering ring, described buffering ring is fixed on the upper surface of described thread dial, and the lower end of wherein said elastic component is fixed on the upper surface of described buffering ring by described the second securing member, and described the first securing member is positioned at the inner side of described buffering ring.Can reduce thus difficulty of processing and the manufacturing cost of described rubbing head.
According to one embodiment of present invention, described base assembly also comprises connector, and described connector is connected with described Connection Block by spherical hinge.Can make thus the structure of described rubbing head more reasonable.
According to one embodiment of present invention, described rubbing head also comprises: elastic washer, and described elastic washer is located on the lower surface of described graduation mark portion; With the 3rd securing member, described the 3rd securing member passes along the vertical direction described retaining ring assembly and coordinates with described elastic washer.Can fix the position of described retaining ring assembly thus, thereby can make the value of d-l can not change in polishing process.
According to one embodiment of present invention, described retaining ring assembly comprises: locating ring, and described locating ring threaded engagement is on described base assembly, and described index line is located on the outer surface of described locating ring; And retaining ring, described retaining ring is removably fixed on the lower surface of described locating ring.By described retaining ring is removably fixed on the lower surface of described locating ring, thereby only need to change described retaining ring, and without changing together with described locating ring.
According to one embodiment of present invention, the lower surface of described retaining ring is provided with and unloads film trap, described in unload film trap along the radially extension of described retaining ring.Can more easily, easily carry out unloading piece thus.
According to one embodiment of present invention, described index line is a plurality of, and a plurality of described index lines are circumferentially located on the side face of described retaining ring assembly at interval along described retaining ring assembly.Operating personnel can read the value of d-l from all angles thus, thereby can make described rubbing head more easy to use.
Additional aspect of the present invention and advantage in the following description part provide, and part will become obviously from the following description, or recognize by practice of the present invention.
Accompanying drawing explanation
Above-mentioned and/or additional aspect of the present invention and advantage accompanying drawing below combination obviously and is easily understood becoming the description of embodiment, wherein:
Fig. 1 is according to the structural representation of the rubbing head of the embodiment of the present invention;
Fig. 2 is according to the structural representation of the rubbing head of the embodiment of the present invention;
Fig. 3 is the cutaway view along B-B direction of Fig. 2;
Fig. 4 is according to the structural representation of the connector of the rubbing head of the embodiment of the present invention;
Fig. 5 is according to the structural representation of the Connection Block of the rubbing head of the embodiment of the present invention;
Fig. 6 is according to the structural representation of the elastic component of the rubbing head of the embodiment of the present invention;
Fig. 7 is according to the structural representation of the buffering ring of the rubbing head of the embodiment of the present invention;
Fig. 8 is according to the structural representation of the thread dial of the rubbing head of the embodiment of the present invention;
Fig. 9 is according to the structural representation of the locating ring of the rubbing head of the embodiment of the present invention;
Figure 10 is according to the structural representation of the retaining ring of the rubbing head of the embodiment of the present invention.
The specific embodiment
Describe embodiments of the invention below in detail, the example of described embodiment is shown in the drawings, and wherein same or similar label represents same or similar element or has the element of identical or similar functions from start to finish.Below by the embodiment being described with reference to the drawings, be exemplary, only for explaining the present invention, and can not be interpreted as limitation of the present invention.
In description of the invention, it will be appreciated that, term " " center ", " longitudinally ", " laterally ", " on ", D score, " front ", " afterwards ", " left side ", " right side ", " vertically ", " level ", " top ", " end ", " interior ", orientation or the position relationship of indications such as " outward " are based on orientation shown in the drawings or position relationship, only the present invention for convenience of description and simplified characterization, rather than device or the element of indication or hint indication must have specific orientation, with specific orientation structure and operation, therefore can not be interpreted as limitation of the present invention.In addition, term " first ", " second " be only for describing object, and can not be interpreted as indication or hint relative importance or the implicit quantity that indicates indicated technical characterictic.Thus, one or more these features can be expressed or impliedly be comprised to the feature that is limited with " first ", " second ".In description of the invention, except as otherwise noted, the implication of " a plurality of " is two or more.
In description of the invention, it should be noted that, unless otherwise clearly defined and limited, term " installation ", " being connected ", " connection " should be interpreted broadly, and for example, can be to be fixedly connected with, and can be also to removably connect, or connect integratedly; Can be mechanical connection, can be to be also electrically connected to; Can be to be directly connected, also can indirectly be connected by intermediary, can be the connection of two element internals.For the ordinary skill in the art, can concrete condition understand above-mentioned term concrete meaning in the present invention.
Below with reference to Fig. 1-Figure 10, describe according to the rubbing head 10 of the embodiment of the present invention.As shown in Fig. 1-Figure 10, according to the rubbing head 10 of the embodiment of the present invention, comprise base assembly and retaining ring assembly.
The side face of described base assembly is provided with graduation mark group 10311.Described retaining ring assembly threaded engagement is on described base assembly, and the side face of described retaining ring assembly is provided with the index line 1071 coordinating with graduation mark group 10311.
As depicted in figs. 1 and 2, the thickness of polished silicon wafer 20 is d, and the distance of the lower surface of the lower surface of described base assembly and described retaining ring assembly on above-below direction is l.After in depth studying, inventor finds: the value of d-l has a great impact the polishing process of polished silicon wafer 20.Particularly, reduce the value of d-l, can prevent better that polished silicon wafer 20 from coming off from rubbing head 10, can prevent better sheet, increase the value of d-l, can prevent that described retaining ring assembly from contacting with polishing pad.Because the thickness d of different polished silicon wafer 20 is different, therefore can cause partially polished of polishing at 20 o'clock, the value of d-l is not in scope preferably.Wherein, above-below direction is as shown in the arrow A in Fig. 1 and Fig. 3.
Because described retaining ring assembly threaded engagement is on described base assembly, therefore can be by rotating described retaining ring assembly to the relatively described base assembly of described retaining ring assembly be moved up and down.That is to say, can be by the described retaining ring assembly of rotation, regulating continuously the lower surface of described base assembly and the distance of the lower surface of described retaining ring assembly on above-below direction is l, and then can regulate continuously the value of d-l.
According to the rubbing head 10 of the embodiment of the present invention, pass through described retaining ring assembly threaded engagement on described base assembly, thereby can regulate continuously the lower surface of described base assembly and the distance l of the lower surface of described retaining ring assembly on above-below direction, can regulate continuously the value of d-l, not only can avoid thus polished silicon wafer 20 to depart from from rubbing head 10, and can to polished silicon wafer 20, carry out polishing better.In addition, by graduation mark group 10311 being set on the side face of described base assembly and the index line 1071 coordinating with graduation mark group 10311 being set on the side face of described retaining ring assembly, thereby can read easily, accurately, rapidly the value of d-l, to realize accurately location.Therefore, according to the rubbing head 10 of the embodiment of the present invention, there is the advantages such as the sheet of avoiding, polishing effect be good.
As shown in Figure 1-Figure 3, in some embodiments of the invention, described base assembly can comprise Connection Block 101 and thread dial assembly.Described thread dial assembly can comprise graduation mark portion 1031 and threaded portion 1032.Threaded portion 1032 can be connected with graduation mark portion 1031, and threaded portion 1032 can be positioned at graduation mark portion 1031 belows, and graduation mark group 10311 can be located on the side face of graduation mark portion 1031, on the side face of threaded portion 1032, can be provided with external screw thread.Wherein, on described retaining ring assembly, can be provided with internal thread, described retaining ring assembly can be contained on threaded portion 1032 by described internal thread and described external thread sleeve.Can make thus the structure of rubbing head 10 more reasonable.
Particularly, graduation mark group 10311 comprises N scale, and this N scale is circumferentially located on the side face of graduation mark portion 1031 equally spacedly along graduation mark portion 1031.The pitch of described internal thread and described externally threaded pitch are L.Now, scale of the every variation of described retaining ring assembly (being that index line 1071 moves to the graduation mark adjacent with this graduation mark from a graduation mark), the variable quantity of corresponding l value is L/N.
As shown in Fig. 1, Fig. 3, Fig. 4 and Fig. 5, described base assembly can also comprise connector 105, and connector 105 can be connected with Connection Block 101 by spherical hinge.Can make thus the structure of rubbing head 10 more reasonable.
Particularly, connector 105 can be connected with motion control device, to realize translation, the rotation of rubbing head 10 in the loading of rubbing head 10 and polishing process.For example, on connector 105, can be provided with external screw thread, connector 105 can be connected with motion control device by external screw thread.Plane on external screw thread is for the position of fixed connector 105 on motion control device.
Because connector 105 is connected with Connection Block 101 by spherical hinge, so the attitude of rubbing head 10 can self adaptation regulate.Connection Block 101 can pass through securing member (for example screw or bolt) and be connected with motion control device, to can realize rubbing head 10 and motor synchronous rotary.
As shown in Fig. 1, Fig. 3 and Fig. 6, in one embodiment of the invention, described base assembly can also comprise elastic component 102, and the upper end of elastic component 102 can be connected with Connection Block 101, and the lower end of elastic component 102 can be connected with described thread dial assembly.After rubbing head 10 moves downward and contacts with polishing pad, can continue downward loading, there are elastic deformations in elastic component 102 now, thereby can realize the polishing under different normal pressures, and can accurately measure this force value by force cell.By elastic component 102 is set, thereby can change continuously polish pressure, to obtain the relation of polish pressure and polishing precision.
Particularly, the upper end of elastic component 102 can be passed through the first securing member (for example screw or bolt) and be connected with Connection Block 101, and the second securing member 1091(for example screw or bolt can be passed through in the lower end of elastic component 102) be connected with described thread dial assembly.Wherein, on the upper surface of described thread dial assembly, can be provided with the dodge groove relative with described the first securing member.Can make thus the structure of rubbing head 10 more reasonable, when downward loading rubbing head 10 until elastic component 102 occur after elastic deformations, a part for described the first securing member is dodged in groove described in can stretching into, to prevent that described the first securing member and described thread dial assembly from producing interference.
As shown in Figure 6, advantageously, elastic component 102 can comprise horizontal part 1021, rake 1023 and lower horizontal part 1022.Wherein, the upper end of rake 1023 is connected with the outer end of upper horizontal part 1021, and the lower end of rake 1023 is connected with the inner of lower horizontal part 1022.Upper horizontal part 1021 can removably be fixed on the lower surface of connector 105 by securing member, and lower horizontal part 1022 can for example, removably be fixed on the upper surface of described thread dial assembly by securing member (screw or bolt).
In a concrete example of the present invention, as shown in Fig. 1-Fig. 3, Fig. 7 and Fig. 8, described thread dial assembly can comprise thread dial 103 and buffering ring 104.Thread dial 103 can comprise graduation mark portion 1031 and threaded portion 1032.Buffering ring 104 can be fixed on the upper surface of thread dial 103.Wherein, the lower end of elastic component 102 (for example descending horizontal part 1022) can be by the second securing member 1091(for example screw or bolt) be fixed on the upper surface of buffering ring 104, described the first securing member can be positioned at the inner side of buffering ring 104.That is to say, described in buffering ring 104 can limit, dodge groove.Can reduce thus difficulty of processing and the manufacturing cost of rubbing head 10.
Particularly, buffering ring 104 can for example, be fixed on the upper surface of graduation mark portion 1031 by securing member (screw or bolt).As shown in Figure 8, graduation mark portion 1031 can be cylindrical, and threaded portion 1032 can be cylindrical, and the rotation of graduation mark portion 1031 can overlap with the rotation of threaded portion 1032, and the diameter of graduation mark portion 1031 can be greater than the diameter of threaded portion 1032.
As shown in figures 1 and 3, rubbing head 10 can also comprise elastic washer 106 and the 3rd securing member 1092.Elastic washer 106 can be located on the lower surface of graduation mark portion 1031.The 3rd securing member 1092 can pass described retaining ring assembly along the vertical direction, and the 3rd securing member 1092 can coordinate with elastic washer 106.After distance l at the lower surface that has regulated the lower surface of described base assembly (being the lower surface of threaded portion 1032) and described retaining ring assembly on above-below direction, can utilize the 3rd securing member 1092 through described retaining ring assembly, then tighten the 3rd securing member 1092 to make the 3rd securing member 1092 embed elastic washer 106, thereby can fix the position of described retaining ring assembly.That is to say, by elastic washer 106 being set on the lower surface in graduation mark portion 1031 and utilizing the 3rd securing member 1092 through described retaining ring assembly to coordinate with elastic washer 106, thereby can fix the position of described retaining ring assembly, can make thus the value of d-l can not change in polishing process.
As shown in Fig. 1, Fig. 3, Fig. 9 and Figure 10, in examples more of the present invention, described retaining ring assembly can comprise locating ring 107 and retaining ring 108.Locating ring 107 can threaded engagement on described base assembly, index line 1071 can be located on the outer surface of locating ring 107.Retaining ring 108 can removably be fixed on the lower surface of locating ring 107.
When utilizing rubbing head 10 polishing polished silicon wafer 20, retaining ring 108 can constantly contact, rub with polishing pad, thereby causes retaining ring 108 to be worn.That is to say, retaining ring 108 needs to change in use for some time.By retaining ring 108 being removably fixed on the lower surface of locating ring 107, thereby only need to change retaining ring 108, and without change (if locating ring 107 and retaining ring 108 are made of one to structure, needing to change locating ring 107 and retaining ring 108) together with locating ring 107 simultaneously.
As shown in Figure 8 and Figure 9, particularly, locating ring 107 can be provided with described internal thread, on the side face of threaded portion 1032, can be provided with described external screw thread, and locating ring 107 can be contained on threaded portion 1032 by described internal thread and described external thread sleeve.The distance of the lower surface of the lower surface of threaded portion 1032 and retaining ring 108 on above-below direction is l.
Advantageously, as shown in Figure 9, index line 1071 can be a plurality of, and a plurality of index lines 1071 can being circumferentially located on the side face of described retaining ring assembly along described retaining ring assembly at interval.Operating personnel can read the value of d-l from all angles thus, thereby can make rubbing head 10 more easy to use.
A plurality of index lines 1071 can being circumferentially located on the side face of locating ring 107 along locating ring 107 equally spacedly.Particularly, index line 1071 can be three.
The suction adsorption that polished silicon wafer 20 can be passed through water is on the lower surface of threaded portion 1032.As shown in figure 10, in an example of the present invention, on the lower surface of retaining ring 108, can be provided with and unload film trap 1081, unloading film trap 1081 can be along the radially extension of retaining ring 108.After polishing finishes, can be by unloading film trap 1081 to polished silicon wafer 20 baths, to can more easily, easily carry out unloading piece.
Locating ring 107 and retaining ring 108 can for example, removably be fixed together by securing member (screw or bolt).Advantageously, in retaining ring 108, can be provided with the shoulder hole that connects along the vertical direction retaining ring 108, on the lower surface of locating ring 107, can be provided with screwed hole, this securing member can threaded engagement in this shoulder hole and in this screwed hole.Can make thus whole securing member all be positioned at this shoulder hole and this screwed hole, thereby can prevent that this securing member from stretching out retaining ring 108 downwards, and contact with polishing pad when polishing.
In retaining ring 108, can also be provided with the through hole (screw thread is not set on the wall of this through hole) that connects along the vertical direction retaining ring 108, on locating ring 107, can be provided with the screwed hole that connects along the vertical direction locating ring 107, the 3rd securing member 1092 can through this through hole and can threaded engagement in this screwed hole.Can reduce the installation difficulty of the 3rd securing member 1092 thus.
In the description of this description, the description of reference term " embodiment ", " some embodiment ", " illustrative examples ", " example ", " concrete example " or " some examples " etc. means to be contained at least one embodiment of the present invention or example in conjunction with specific features, structure, material or the feature of this embodiment or example description.In this manual, the schematic statement of above-mentioned term is not necessarily referred to identical embodiment or example.And the specific features of description, structure, material or feature can be with suitable mode combinations in any one or more embodiment or example.
Although illustrated and described embodiments of the invention, those having ordinary skill in the art will appreciate that: in the situation that not departing from principle of the present invention and aim, can carry out multiple variation, modification, replacement and modification to these embodiment, scope of the present invention is limited by claim and equivalent thereof.
Claims (10)
1. a rubbing head, is characterized in that, comprising:
Base assembly, the side face of described base assembly is provided with graduation mark group; With
Retaining ring assembly, described retaining ring assembly threaded engagement is on described base assembly, and the side face of described retaining ring assembly is provided with the index line closing with described graduation mark assembly.
2. rubbing head according to claim 1, is characterized in that, described base assembly comprises:
Connection Block; With
Thread dial assembly, described thread dial assembly comprises graduation mark portion and threaded portion, described threaded portion is connected and is positioned at described graduation mark subordinate side with described graduation mark portion, described graduation mark group is located on the side face of described graduation mark portion, the side face of described threaded portion is provided with external screw thread, wherein said retaining ring assembly is provided with internal thread, and described retaining ring assembly is contained on described threaded portion by described internal thread and described external thread sleeve.
3. rubbing head according to claim 2, is characterized in that, described base assembly also comprises elastic component, and the upper end of described elastic component is connected with described Connection Block and lower end is connected with described thread dial assembly.
4. rubbing head according to claim 3, it is characterized in that, the upper end of described elastic component is connected with described Connection Block by the first securing member, the lower end of described elastic component is connected with described thread dial assembly by the second securing member, and the upper surface of wherein said thread dial assembly is provided with the dodge groove relative with described the first securing member.
5. rubbing head according to claim 4, is characterized in that, described thread dial assembly comprises:
Thread dial, described thread dial comprises described graduation mark portion and described threaded portion; With
Buffering ring, described buffering ring is fixed on the upper surface of described thread dial, and the lower end of wherein said elastic component is fixed on the upper surface of described buffering ring by described the second securing member, and described the first securing member is positioned at the inner side of described buffering ring.
6. rubbing head according to claim 2, is characterized in that, described base assembly also comprises connector, and described connector is connected with described Connection Block by spherical hinge.
7. rubbing head according to claim 2, is characterized in that, also comprises:
Elastic washer, described elastic washer is located on the lower surface of described graduation mark portion; With
The 3rd securing member, described the 3rd securing member passes along the vertical direction described retaining ring assembly and coordinates with described elastic washer.
8. according to the rubbing head described in any one in claim 1-7, it is characterized in that, described retaining ring assembly comprises:
Locating ring, described locating ring threaded engagement is on described base assembly, and described index line is located on the outer surface of described locating ring; With
Retaining ring, described retaining ring is removably fixed on the lower surface of described locating ring.
9. rubbing head according to claim 8, is characterized in that, the lower surface of described retaining ring is provided with and unloads film trap, described in unload film trap along the radially extension of described retaining ring.
10. according to the rubbing head described in any one in claim 1-9, it is characterized in that, described index line is a plurality of, and a plurality of described index lines are circumferentially located on the side face of described retaining ring assembly at interval along described retaining ring assembly.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310657018.4A CN103659548B (en) | 2013-12-06 | 2013-12-06 | Rubbing head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310657018.4A CN103659548B (en) | 2013-12-06 | 2013-12-06 | Rubbing head |
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| Publication Number | Publication Date |
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| CN103659548A true CN103659548A (en) | 2014-03-26 |
| CN103659548B CN103659548B (en) | 2015-12-02 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310657018.4A Active CN103659548B (en) | 2013-12-06 | 2013-12-06 | Rubbing head |
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| CN (1) | CN103659548B (en) |
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| CN109571255A (en) * | 2018-12-11 | 2019-04-05 | 中国原子能科学研究院 | A kind of grinding device |
| CN110026889A (en) * | 2019-04-28 | 2019-07-19 | 上海新昇半导体科技有限公司 | Fixed connecting part, grinding head assembly and polissoir |
| CN112548846A (en) * | 2019-09-25 | 2021-03-26 | 夏泰鑫半导体(青岛)有限公司 | Retaining ring for chemical mechanical polishing |
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| CN109571255A (en) * | 2018-12-11 | 2019-04-05 | 中国原子能科学研究院 | A kind of grinding device |
| CN110026889A (en) * | 2019-04-28 | 2019-07-19 | 上海新昇半导体科技有限公司 | Fixed connecting part, grinding head assembly and polissoir |
| CN110026889B (en) * | 2019-04-28 | 2021-04-20 | 上海新昇半导体科技有限公司 | Fixed connecting part, grinding head assembly and polishing equipment |
| CN112548846A (en) * | 2019-09-25 | 2021-03-26 | 夏泰鑫半导体(青岛)有限公司 | Retaining ring for chemical mechanical polishing |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103659548B (en) | 2015-12-02 |
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