CN103645607B - coating system - Google Patents
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- CN103645607B CN103645607B CN201310705474.1A CN201310705474A CN103645607B CN 103645607 B CN103645607 B CN 103645607B CN 201310705474 A CN201310705474 A CN 201310705474A CN 103645607 B CN103645607 B CN 103645607B
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Abstract
The present invention provides a kind of coating system, this coating system includes multiple-way valve, thinner container, drainpipe and at least two-way photoresist pipeline, wherein, this at least each road photoresist pipeline in two-way photoresist pipeline includes cross valve, filters buffer unit, the first triple valve and photoresist container；First end of this cross valve is connected with one end of this filtration buffer unit, and the second end is connected with this discharge pipe line, and the 3rd end is connected with this thinner container, and the 4th end is connected with this multiple-way valve；The other end of this filtration buffer unit is connected with the first end of this first triple valve；Second end of this first triple valve is connected with this thinner container, and the 3rd end is connected with this photoresist container.The present invention can greatly reduce owing to photoresist switching causes the time of equipment downtime, improves the production efficiency of equipment.
Description
Technical field
The present invention relates to display field, particularly relate to a kind of coating system.
Background technology
TFT-LCD(Thin Film Transistor-Liquid Crystal Display, thin film transistor (TFT)
Liquid crystal indicator) manufacture it is generally required to through 4-6 mask (Mask), the painting of photoresist
Cloth is every one mask (Mask) requisite step of processing procedure.
Typically before TFT-LCD equipment is installed, the photoresist producing line use has been examined
Finishing, every photoresist producing line use has also determined that, directly makes after installation during equipment debugging
With set photoresist, after having debugged, directly carry out volume production.Special without what
Situation, each produces the PR(photo resist that line uses, photoresist) glue will not change.But, by
In the appearance of various new technologies, and the test of improved-type PR glue so that produce line difference PR glue
Switch more and more frequent.
Seeing Fig. 1, Fig. 1 is a kind of coating system of the prior art, and this system includes standby
Photoresist container 11 ', but it does not has for the switching of photoresist and any does not has help.Another changing
During outer a kind of photoresist, need to use retarder thinner soak and clean all of photoresist pipeline,
Specifically, this coating system is shut down, the dilution tunnel 5 ' that dismounting thinner container 6 ' picks out, ginseng
See Fig. 2, the pipeline 5 ' of dismounting is put in Plastic Drum 12 ', and by capstan 13 ' to diluent
Container 6 ' pressurizes, thus by interior for the diluent injected plastic bucket 12 ' in thinner container 6 ', works as plastics
When bucket 12 ' interior diluents reach 20L, stop injecting, and the pressure in thinner container 6 ' is become
For dilution tunnel 5 ' again being accessed in triple valve 3 ' after normal pressure, then, see Fig. 3, at current light
In photoresist container 10 ', by joint interior for insertion photoresist bucket 10c ' from the photoresist middle taking-up of bucket 10c ',
Putting in Plastic Drum 12 ', proceed by liquid filling operation, the interior diluent of Plastic Drum 12 ' is successively
Through triple valve 10b ', membrane pump 10a ', cross valve 9 ', filter 8 ', buffer container 7 ', filter
Device 4 ', triple valve 3 ', be then passed through vavuum pump 2 ' and arrive glue spreader nozzle (Coater Nozzle) 1 '
Rear outflow, this liquid padding can be carried out about 10 times, additionally, different resins type
Photoresist needs to change filter 8 ' and filter 4 ', then need not with resinous type change, above-mentioned
After having operated, joint is taken out and accesses from Plastic Drum 12 ' in new PR glue bucket, again fills
Fill out operation, new PR glue is full of pipeline, thus, supplant the diluent in pipeline, just may be used
To carry out virgin rubber test or production, after virgin rubber test or having produced, need to switch back into originally
PR glue, the most also need to adopt with the aforedescribed process, can only carry out when equipment downtime equally.
The process of above-mentioned coating system replacing photoresist needs the time of 10-12H, and is required for
Carrying out under coating system stopped status, take the equipment production time, the equipment that reduces produces effect
Rate.
Summary of the invention
(1) to solve the technical problem that
The technical problem to be solved in the present invention is: how to reduce due to setting that photoresist replacing causes
The standby time shut down.
(2) technical scheme
For solving above-mentioned technical problem, the invention provides a kind of coating system, including multiple-way valve,
Thinner container, drainpipe and at least two-way photoresist pipeline, wherein, described at least two-way
Each road photoresist pipeline in photoresist pipeline include cross valve, filter buffer unit, first
Triple valve and photoresist container；
First end of described cross valve is connected with one end of described filtration buffer unit, the second end
Being connected with described discharge pipe line, the 3rd end is connected with described thinner container, the 4th end with
Described multiple-way valve is connected；
The other end of described filtration buffer unit is connected with the first end of described first triple valve；
Second end of described first triple valve is connected with described thinner container, and the 3rd end is with described
Photoresist container is connected.
Further, described filtration buffer unit includes the first filter, the buffering being sequentially connected with
Container and the second filter.
Further, described photoresist container include membrane pump, the second triple valve, joint and
Photoresist bucket；
One end of described membrane pump connects the first end of described second triple valve；
Second end of described second triple valve is connected with described joint, and described second triple valve passes through
Described joint realizes the connection with described photoresist bucket.
Further, described joint includes adapter body and runs through the first of described adapter body
Pipeline and second pipe, when described joint inserts described photoresist bucket, manage by described first
Road supercharging in described photoresist bucket, in order to the photoresist in described photoresist bucket is from described second
Pipeline flows out.
Further, described photoresist bucket include staving, for contain photoresist soft bag and
Photoetching sebific duct, described soft bag and described photoetching sebific duct are arranged in described staving, described photoetching
Within one end of sebific duct is positioned at described soft bag, the other end is positioned at outside described soft bag, connects when described
When head inserts described photoresist bucket, the other end of described photoetching sebific duct seals with described second pipe
Engage, in order to the photoresist in described soft bag flows out from described second pipe.
Further, also include for realizing described joint and connecing that described thinner container is connected
Mouthful, one end of described interface is connected with described thinner container, and the other end is by connecing with described
Head sealing engagement realizes being tightly connected of described joint and described thinner container.
Further, described interface include interface agent, be arranged in described interface agent dilute
Release agent pipe and be arranged on the first valve on described diluent pipe, one end of described diluent pipe
It is connected with described thinner container, when described joint inserts described interface, described diluent pipe
The other end and described second pipe sealing engagement, in order to the diluent in described thinner container
Described second pipe is flowed into by described diluent pipe.
Further, the other end of described diluent pipe is also by the second valve and described drainpipe
It is connected.
(3) beneficial effect
The coating system that the present invention provides includes that multi-path light photoresist pipeline, different photoresist pipelines are used
In the supply of the different photoresist of realization, when a wherein road photoresist pipeline job, can be to it
He is carried out by road photoresist pipeline, and when this coating system switches between different photoresists,
Need not all of pipeline is carried out, thus greatly reduce owing to photoresist switching causes
The time of equipment downtime, improve the production efficiency of equipment.
Accompanying drawing explanation
Fig. 1 is the structure chart of a kind of coating system of the prior art；
Fig. 2 is the schematic diagram that in the coating system shown in Fig. 1, thinner container accesses diluent；
Fig. 3 is the schematic diagram of the coating system detergent line shown in Fig. 1；
Fig. 4 is the structure chart of a kind of coating system that embodiment of the present invention provides；
Fig. 5 is the schematic diagram of a kind of joint that embodiment of the present invention provides；
Fig. 6 is the schematic diagram of a kind of photoresist bucket that embodiment of the present invention provides；
Fig. 7 is the schematic diagram that the joint shown in Fig. 5 accesses the photoresist bucket shown in Fig. 6；
Fig. 8 is the schematic diagram of a kind of interface that embodiment of the present invention provides.
Detailed description of the invention
Below in conjunction with the accompanying drawings and embodiment, the detailed description of the invention of the present invention is made the most in detail
Describe.Following example are used for illustrating the present invention, but are not limited to the scope of the present invention.
Embodiment of the present invention provides a kind of coating system, including multiple-way valve, thinner container,
Drainpipe and at least two-way photoresist pipeline, wherein, in described at least two-way photoresist pipeline
Each road photoresist pipeline include cross valve, filter buffer unit, the first triple valve and light
Photoresist container；
First end of described cross valve is connected with one end of described filtration buffer unit, the second end
Being connected with described discharge pipe line, the 3rd end is connected with described thinner container, the 4th end with
Described multiple-way valve is connected；
The other end of described filtration buffer unit is connected with the first end of described first triple valve；
Second end of described first triple valve is connected with described thinner container, and the 3rd end is with described
Photoresist container is connected.
Wherein, this multiple-way valve can be determined according to the way of this photoresist pipeline, such as,
If this coating system includes two-way photoresist pipeline, then this multiple-way valve can be triple valve, if should
Coating system includes three road photoresist pipelines, then this multiple-way valve can be cross valve.This filtration is delayed
Flushing device includes the first filter, buffer container and the second filter being sequentially connected with.
Wherein, described photoresist container includes membrane pump, the second triple valve, joint and photoetching
Glue bucket；
One end of described membrane pump connects the first end of described second triple valve；
Second end of described second triple valve is connected with described joint, and described second triple valve passes through
Described joint realizes the connection with described photoresist bucket.
See the structure chart that Fig. 4, Fig. 4 are a kind of coating systems that embodiment of the present invention provides,
This coating system includes glue spreader nozzle 1, vavuum pump 2, multiple-way valve 3, thinner container 10,
Drainpipe 11, first via photoresist pipeline and the second road photoresist pipeline, wherein, this multiple-way valve
First end of 3 is connected with glue spreader nozzle 1 by vavuum pump 2, the second end and first via photoresist
Pipeline connects, and the 3rd end and the second road photoresist pipeline connect.
Wherein, this first via photoresist pipeline include cross valve 41, filter buffer unit, first
Triple valve 81 and photoresist container 91, wherein, the filtration buffering of this first via photoresist pipeline
Device includes the first filter 51, buffer container the 61, second filter 71 being sequentially connected with, four
First end 411 of logical valve 41 is by the filtration buffer unit of this first via photoresist pipeline and threeway
First end of valve 81 is connected, and the second end 412 is connected with described drainpipe 11 tunnel, and the 3rd
End 413 is connected with described thinner container 10, and the 4th end 414 is connected with described multiple-way valve 3
Connect；One end of second filter 71 is connected with buffer container 61, the other end and triple valve 81
First end is connected；Second end of triple valve 81 is connected with described thinner container 10, the 3rd end
It is connected with described photoresist container 91.Photoresist container 91 includes membrane pump 91a, the second threeway
Valve 91b, photoresist bucket 91c, wherein, one end of membrane pump 91a and the first triple valve 81
3rd end is connected, and first end of the other end and the second triple valve 91b is connected, the second triple valve 91b
The second end be connected with photoresist bucket 91c by joint, it is preferable that this photoresist container 91
Can also include standby photoresist bucket, this standby photoresist bucket can pass through joint and second
3rd end of triple valve 91b is connected.
This second road photoresist pipeline is identical with first via photoresist pipeline, cross valve 42, filtration
Buffer unit, the first triple valve 82 and photoresist container 92, wherein, this second road photoresist
Pipeline filter the first filter 52 that buffer unit includes being sequentially connected with, buffer container 62, the
Tow filtrator 72, the filtration by this second road photoresist pipeline of the first end 421 of cross valve 42
Buffer unit is connected with the first end of triple valve 82, the second end 422 and described drainpipe 11
Road is connected, and the 3rd end 423 is connected with described thinner container 10, the 4th end 424 and institute
State multiple-way valve 3 to be connected；One end of second filter 72 is connected with buffer container 62, another
End is connected with the first end of triple valve 82；Second end of triple valve 82 and described thinner container
10 are connected, and the 3rd end is connected with described photoresist container 92.Photoresist container 92 includes barrier film
Pump 92a, the second triple valve 92b, photoresist bucket 92c, wherein, one end of membrane pump 92a with
3rd end of the first triple valve 82 is connected, and first end of the other end and the second triple valve 92b is connected,
Second end of the second triple valve 92b is connected with photoresist bucket 92c by joint, it is preferable that
This photoresist container 92 can also include standby photoresist bucket, and this standby photoresist bucket is permissible
It is connected by the 3rd end of joint and the second triple valve 92b.
Wherein, in above-mentioned photoresist container, the second end of the second triple valve and described joint
Connecting, described second triple valve realizes the connection with described photoresist bucket, ginseng by described joint
See that Fig. 5, described joint include adapter body 121 and run through the first pipeline of described adapter body
122 and second pipe 123, when described joint inserts described photoresist bucket, by described first
Pipeline 122 supercharging in described photoresist bucket, in order to the photoresist in described photoresist bucket is from institute
State second pipe 123 to flow out.
Wherein, seeing Fig. 6, described photoresist bucket includes staving 131, for containing photoresist
Soft bag 132 and photoetching sebific duct 133, described soft bag 132 and described photoetching sebific duct 133 are arranged
In described staving 131, within one end of described photoetching sebific duct is positioned at described soft bag, the other end
It is positioned at outside described soft bag, sees Fig. 7, when above-mentioned joint inserts described photoresist bucket, institute
State the other end and second pipe 123 sealing engagement in described joint of photoetching sebific duct 133, with
The photoresist that toilet is stated in soft bag flows out from described second pipe 123.
Additionally, this coating system also includes for realizing described joint with described diluent appearance 10 even
The interface connect, one end of described interface is connected with described thinner container, the other end by with
Described joint sealing engages and realizes being tightly connected of described joint and described thinner container.Wherein,
For first via photoresist pipeline, interface 91d is set, is used for realizing in first via photoresist pipeline
The connection of joint and thinner container, for the second road photoresist pipeline, interface 92d is set,
For realizing the connection of the joint in the second road photoresist pipeline and thinner container.
Seeing Fig. 8, described interface includes interface agent 141, is arranged on described interface agent 141
Interior diluent pipe 142 and the first valve 143 being arranged on described diluent pipe 142, institute
The one end stating diluent pipe 142 is connected with described thinner container 10, when described joint inserts institute
When stating interface, the other end of described diluent pipe 142 and described second pipe 123 sealing engagement,
So that the diluent in described thinner container flows into described second by described diluent pipe 142
Pipeline.Preferably, the other end of described diluent pipe is also by the second valve 144 and described row
Water pipe 10 is connected, such that it is able to by the removal of bubbles in pipeline, specifically, by the first valve 143
Closing, the second valve 144 is opened, and pressurizes thinner container 10, such that it is able to by pipeline
Diluent and bubble enter in drainpipe.Preferably, it is also possible to above-mentioned interface is arranged guarantor
Protecting cover, protects with docking port under the idle state of interface.
For the coating system shown in Fig. 4, before plan carries out new photoresist test or produces
One day or several hours, when this coating system uses the first via normal volume production of photoresist pipeline,
Use following steps that the second road photoresist pipeline is carried out:
Step S1: turn on the protection cap on the interface 92d of the second road photoresist pipeline, photoetching
Joint corresponding for glue bucket 92c is linked in interface 92d；
Step S2: use the diluent in thinner container that the second road photoresist pipeline is carried out clearly
Wash, specifically, the first valve in interface 92d opened, and thinner container 10 is pressurizeed,
Corresponding pipeline 15 valve opening, makes diluent through the second triple valve of the second road photoresist pipeline
92b arrives membrane pump 92a, and pressurizes membrane pump 92a, so that diluent is at diluent
Supply under pressure in container and 92a power double action, when diluent arrives pipeline 17,
Open the first triple valve 82, thus arrive the second filter 72, through caching container 62 and
One filter 52 arrives cross valve 42, controls the first end 421 and the second end 422 of cross valve 42
Opening, the diluent of flushing line is along pipeline 18 to drainpipe, and wherein, the process of cleaning can
To maintain 15 minutes, after cleaning, close the first valve in pipeline 15 and interface 92d,
Extract joint, and cover the protection cap of interface 92d.
Step S3: by the new photoresist of filling in the second road photoresist pipeline, specifically, by joint
Insert new photoresist bucket, and by this joint to this new photoresist bucket supercharging, the pressure in bucket
With under the pressure of membrane pump 92a, new photoresist through first triple valve the 82, second filter 72,
Buffer container the 62, first filter 52, pipeline 18 flow in drainpipe 11.This process maintains
Within about 15 minutes, can drain completely the diluent in pipeline.
Step S4: use diluent flush to connect pipeline and the glue spreader nozzle 1 of vavuum pump 2,
Specifically, equipment downtime, and open pipeline 16, open the 3rd end 423 and the of cross valve 42
Four ends 424, diluent passes through pipeline 19, multiple-way valve 3, vavuum pump 2, from glue spreader nozzle 1
Middle discharge.This process only need to maintain 2-3 minute.
Step S5: carrying out new PR glue supply operation, similar to step S3, PR glue is through the
Two road photoresist pipelines are supplied, and the first end 421 and the 4th end 424 of cross valve 42 are opened
Open, make new photoresist directly arrive glue spreader nozzle 1, through photoresist filling in 2-3 minute.
Step S6: use the second road photoresist pipeline to carry out photoresist test or production.
Wherein, in above-mentioned steps, only S4 and step S5 need to be when equipment downtimes in steps
Operate, thus substantially reduce owing to photoresist switching causes the time of equipment downtime.
When new photoresist make to be finished switch to original photoresist again time, it is only necessary to use diluent
Flushing pipe 19, multiple-way valve 3, vavuum pump 2, then by the first photoresist light path glue supply i.e.
Can.This process can also save substantial amounts of photoresist and diluent while time-consuming, and
When frequently changing two kinds of photoresists, its advantage becomes apparent from.
When needing to use normal light photoresist and organic photoresist, first via photoetching sebific duct
Road may be used for the supply of normal light photoresist, and the second road photoresist pipeline may be used for organic photoetching
The supply of glue, between normal light photoresist and organic photoresist during switching, every road photoresist pipeline
Need not change filter, thus be greatly saved production cost.
Additionally, a series of actions of above-mentioned each step can be set to function action, pass through
In the upper function action clicking on correspondence of touch panel (Touch panel), equipment just can be automatic
The corresponding valve of unlatching, triple valve and cross valve etc., and perform corresponding order.Not only
Save time and easy to operate, and save manpower.
The coating system that embodiment of the present invention provides includes multi-path light photoresist pipeline, different photoetching
Sebific duct road is for realizing the supply of different photoresist, when a wherein road photoresist pipeline job,
Other road photoresist pipelines can be carried out, and this coating system is between different photoresists
During switching, it is not necessary to all of pipeline is carried out, thus greatly reduces due to photoresist
Switching causes the time of equipment downtime, improves the production efficiency of equipment.
Embodiment of above is merely to illustrate the present invention, and not limitation of the present invention, relevant
The those of ordinary skill of technical field, without departing from the spirit and scope of the present invention,
Can also make a variety of changes and modification, the technical scheme of the most all equivalents falls within the present invention
Category, the scope of patent protection of the present invention should be defined by the claims.
Claims (8)
1. a coating system, it is characterised in that include multiple-way valve, thinner container, draining
Pipe and at least two-way photoresist pipeline, wherein, every in described at least two-way photoresist pipeline
One road photoresist pipeline includes cross valve, filters buffer unit, the first triple valve and photoresist
Container；
First end of described cross valve is connected with one end of described filtration buffer unit, the second end
Being connected with described discharge pipe line, the 3rd end is connected with described thinner container, the 4th end with
Described multiple-way valve is connected；
The other end of described filtration buffer unit is connected with the first end of described first triple valve；
Second end of described first triple valve is connected with described thinner container, and the 3rd end is with described
Photoresist container is connected.
Coating system the most according to claim 1, it is characterised in that described filtration buffers
Device includes the first filter, buffer container and the second filter being sequentially connected with.
Coating system the most according to claim 1, it is characterised in that described photoresist holds
Device includes membrane pump, the second triple valve, joint and photoresist bucket；
One end of described membrane pump connects the first end of described second triple valve；
Second end of described second triple valve is connected with described joint, and described second triple valve passes through
Described joint realizes the connection with described photoresist bucket.
Coating system the most according to claim 3, it is characterised in that described joint includes
Adapter body and run through the first pipeline and the second pipe of described adapter body, when described joint
When inserting described photoresist bucket, by the supercharging in described photoresist bucket of described first pipeline, with
The photoresist that toilet is stated in photoresist bucket flows out from described second pipe.
Coating system the most according to claim 4, it is characterised in that described photoresist bucket
Including staving, for containing soft bag and the photoetching sebific duct of photoresist, described soft bag and described
Photoetching sebific duct is arranged in described staving, within one end of described photoetching sebific duct is positioned at described soft bag,
The other end is positioned at outside described soft bag, when described joint inserts described photoresist bucket, and described light
The other end of photoresist pipe and described second pipe sealing engagement, in order to the photoresist in described soft bag
Flow out from described second pipe.
Coating system the most according to claim 4, it is characterised in that also include for reality
The interface that existing described joint is connected with described thinner container, one end of described interface is dilute with described
Releasing agent container to be connected, the other end realizes described joint and institute by engaging with described joint sealing
State being tightly connected of thinner container.
Coating system the most according to claim 6, it is characterised in that described interface includes
Interface agent, the diluent pipe being arranged in described interface agent and be arranged on described diluent
The first valve on pipe, one end of described diluent pipe is connected with described thinner container, works as institute
When stating the joint described interface of insertion, the other end of described diluent pipe seals with described second pipe
Engage, in order to the diluent in described thinner container flows into described the by described diluent pipe
Two pipelines.
Coating system the most according to claim 7, it is characterised in that described diluent pipe
The other end be connected with described drainpipe also by the second valve.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310705474.1A CN103645607B (en) | 2013-12-19 | 2013-12-19 | coating system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310705474.1A CN103645607B (en) | 2013-12-19 | 2013-12-19 | coating system |
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| CN103645607A CN103645607A (en) | 2014-03-19 |
| CN103645607B true CN103645607B (en) | 2016-09-07 |
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| CN201310705474.1A Active CN103645607B (en) | 2013-12-19 | 2013-12-19 | coating system |
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Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104281007A (en) * | 2014-08-06 | 2015-01-14 | 深圳市华星光电技术有限公司 | Photoresist feeder and coater |
| CN104295905B (en) * | 2014-09-29 | 2017-08-11 | 三一汽车制造有限公司 | A kind of pipe-line system and concrete distributing equipment |
| CN108057573B (en) * | 2016-11-07 | 2021-06-22 | 沈阳芯源微电子设备股份有限公司 | Photoresist moisturizing system and moisturizing method thereof |
| CN110947707A (en) * | 2018-09-27 | 2020-04-03 | 长鑫存储技术有限公司 | Photoresist supply pipeline cleaning system and method |
| CN109254500A (en) * | 2018-11-23 | 2019-01-22 | 上海华力微电子有限公司 | A kind of photoetching glue delivery system with multi-filtering ability |
| CN111897187B (en) * | 2020-06-22 | 2024-04-16 | 中国科学院微电子研究所 | Photoresist coating system and method for replacing photoresist |
| CN114377907B (en) * | 2021-03-24 | 2023-07-18 | 青岛惠芯微电子有限公司 | Gumming machine and gumming method thereof |
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| US6332924B1 (en) * | 1999-02-18 | 2001-12-25 | Taeyang Tech Co., Ltd. | Photoresist dispensing device |
| CN1508845A (en) * | 2002-12-18 | 2004-06-30 | 旺宏电子股份有限公司 | Photoresist supply system and method |
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| CN101130185A (en) * | 2006-08-22 | 2008-02-27 | 东京应化工业株式会社 | Pre-spraying device |
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| Publication number | Publication date |
|---|---|
| CN103645607A (en) | 2014-03-19 |
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