CN103594326A - Double-ionization ion source - Google Patents
Double-ionization ion source Download PDFInfo
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- CN103594326A CN103594326A CN201310617392.1A CN201310617392A CN103594326A CN 103594326 A CN103594326 A CN 103594326A CN 201310617392 A CN201310617392 A CN 201310617392A CN 103594326 A CN103594326 A CN 103594326A
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Abstract
The invention provides a double-ionization ion source which is composed of electron bombardment ionization (an EI source) and vacuum ultraviolet lamp ionization (a PI source). According to the structure, the double-ionization ion source comprises a sample feeding tube, a repelling electrode, an ionization chamber, a filament, an ultraviolet lamp, a lead-out electrode, a focusing electrode, an emitting electrode, a repelling board and a grounding grid board. According to the double-ionization ion source, the applicability is broadened when polymorphic samples are analyzed by a single ion source, quality selection of fragment ions is improved, and the ion composition and a sample structure can be effectively analyzed.
Description
Technical field
The invention belongs to ion source field, be specifically related to a kind of ion source of double ioinization.
Background technology
Mass-spectrometric technique is a kind of analytical method of measuring ion charge-mass ratio, and its principle is that each component in sample is ionized in ion source, generates the positively charged ion of different charge-mass ratios, through the effect of accelerating field, forms ion beam, enters mass analyzer.In mass analyzer, recycling Electric and magnetic fields makes to occur contrary velocity dispersion, they are focused on respectively and obtains mass spectrogram, thereby determine its quality.
Testing sample could be arrived by Mass Spectrometer Method after will being ionized by ion source in ionization chamber, ionization mode is in the past generally single hard ionization or soft ionization, and soft ionization can obtain the molecular ion peak of sample, better analysis spectrogram, but ionizing energy is lower, inapplicable for the sample of difficulty ionization; The ionizing energy of hard ionization is larger, but easily produces fragment ion, and the parsing of spectrogram is brought to certain difficulty.
Summary of the invention
The defect existing in order to overcome prior art, the ion source that the object of this invention is to provide a kind of double ioinization, adopt EI or two kinds of ionization modes of PI, widened applicability when polymorphic sample is analyzed in single ionic source, improved the quality of fragment ion simultaneously and selected, can effectively analyze ion and form and sample structure.
The invention provides a kind of ion source of double ioinization, this ion source is by sample cell, repeller electrode, ionization chamber, filament, uviol lamp, extraction pole, focusing electrode, goes out emitter-base bandgap grading, ground connection screen, repeller plate and forms;
This ion source is to take sample cell as starting point, is followed successively by repeller electrode, ionization chamber, filament, uviol lamp, extraction pole, focusing electrode, goes out emitter-base bandgap grading, ground connection screen and repeller plate; Wherein, filament is positioned at a side of ionization chamber, and uviol lamp is positioned at the top of ionization chamber.
The ion source of double ioinization provided by the invention, this ion source is comprised of electron impact ionization (EI source) and vacuum UV lamp ionization (PI source) two kinds of ionization modes.
The ion source of double ioinization provided by the invention, described repeller electrode voltage is 0~30V; Described extraction pole voltage is 0~15V; Described focusing electrode voltage is-110~0V; It is described that to go out emitter voltage be-41~0V; Described filament ionization energy is-70eV; Described vacuum UV lamp ionization energy is 8~15eV.
The invention has the beneficial effects as follows: ionization mode of the present invention is that electron impact ionization or ultraviolet light photo are from two kinds, widened applicability when polymorphic sample is analyzed in single ionic source, improved the quality of fragment ion simultaneously and selected, can effectively analyze ion and form and sample structure.The ion that ionization produces, is converged via extraction pole and focusing electrode in repulsion process to analyzer repulsion by repeller electrode, finally converges in ionogenic outlet.By regulating the voltage of repeller electrode, extraction pole, focusing electrode can regulate the energy of outgoing ion and direction to distribute.
Accompanying drawing explanation
Fig. 1 is the ionogenic structure chart of a kind of double ioinization of the present invention, and wherein, 1 is sample cell; 2 is repeller electrode; 3 is ionization chamber; 4 is filament; 5 is uviol lamp; 6 is extraction pole; 7 is focusing electrode; 8 for going out emitter-base bandgap grading; 9 is ground connection screen; 10 is repeller plate.
Embodiment
Below in conjunction with Fig. 1, the present invention is further illustrated.
As shown in Figure 1, the ion source of a kind of double ioinization of the present invention, take sample cell as starting point, is followed successively by repeller electrode, ionization chamber, filament, uviol lamp, extraction pole, focusing electrode, goes out emitter-base bandgap grading, ground connection screen and repeller plate.Wherein, filament is positioned at a side of ionization chamber, and uviol lamp is positioned at the top of ionization chamber.
The present invention adopts electron impact ionization or ultraviolet light photo from two kinds, has widened applicability when polymorphic sample is analyzed in single ionic source, has improved the quality of fragment ion simultaneously and has selected, and can effectively analyze ion and form and sample structure.The ion that ionization produces, is converged via extraction pole and focusing electrode in repulsion process to analyzer repulsion by repeller electrode, finally converges in ionogenic outlet.By regulating the voltage of repeller electrode, extraction pole, focusing electrode can regulate the energy of outgoing ion and direction to distribute.
Claims (8)
1. an ion source for double ioinization, is characterized in that: this ion source is by sample cell, repeller electrode, ionization chamber, filament, uviol lamp, extraction pole, focusing electrode, goes out emitter-base bandgap grading, ground connection screen, repeller plate and forms;
This ion source is to take sample cell as starting point, is followed successively by repeller electrode, ionization chamber, filament, uviol lamp, extraction pole, focusing electrode, goes out emitter-base bandgap grading, ground connection screen and repeller plate; Wherein, filament is positioned at a side of ionization chamber, and uviol lamp is positioned at the top of ionization chamber.
2. according to the ion source of double ioinization described in claim 1, it is characterized in that: this ion source is comprised of electron impact ionization and two kinds of ionization modes of vacuum UV lamp ionization.
3. according to the ion source of double ioinization described in claim 1, it is characterized in that: described repeller electrode voltage is 0~30V.
4. according to the ion source of double ioinization described in claim 1, it is characterized in that: described extraction pole voltage is 0~15V.
5. according to the ion source of double ioinization described in claim 1, it is characterized in that: described focusing electrode voltage is-110~0V.
6. according to the ion source of double ioinization described in claim 1, it is characterized in that: described in to go out emitter voltage be-41~0V.
7. according to the ion source of double ioinization described in claim 1, it is characterized in that: described filament ionization energy is-70eV.
8. according to the ion source of double ioinization described in claim 2, it is characterized in that: described vacuum UV lamp ionization energy is 8~15eV.
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CN201310617392.1A CN103594326A (en) | 2013-11-27 | 2013-11-27 | Double-ionization ion source |
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Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104733280A (en) * | 2015-04-13 | 2015-06-24 | 山东省科学院海洋仪器仪表研究所 | Orthogonal ion source device |
CN106601585A (en) * | 2016-12-29 | 2017-04-26 | 聚光科技(杭州)股份有限公司 | Ion source and maintenance method thereof |
CN107946167A (en) * | 2017-11-28 | 2018-04-20 | 厦门大学 | A kind of metal complex mass spectrometer |
CN108305824A (en) * | 2017-01-12 | 2018-07-20 | Fei公司 | Ionization by collision ion source |
CN109449074A (en) * | 2018-12-18 | 2019-03-08 | 中国科学院合肥物质科学研究院 | A kind of Ion Extraction device for mass spectrograph ionization source |
CN110854009A (en) * | 2019-11-13 | 2020-02-28 | 上海裕达实业有限公司 | Mass spectrum device of wide-range mass measurement ion source and mass spectrum method thereof |
CN112185801A (en) * | 2019-07-05 | 2021-01-05 | 上海大学 | Novel photoelectric composite ion source |
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EP2405463A1 (en) * | 2010-07-06 | 2012-01-11 | ETH Zurich | Laser-ablation ion source with ion funnel |
CN202172061U (en) * | 2011-07-21 | 2012-03-21 | 厦门大学 | Compound ion source |
CN103268851A (en) * | 2012-05-21 | 2013-08-28 | 核工业北京地质研究院 | Thermal ionization time-of-flight mass spectrometer and thermal ionization time-of-fight mass spectrometric analysis method |
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Patent Citations (4)
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US20080142702A1 (en) * | 2006-12-18 | 2008-06-19 | Juergen Frosien | Gas field ion source for multiple applications |
EP2405463A1 (en) * | 2010-07-06 | 2012-01-11 | ETH Zurich | Laser-ablation ion source with ion funnel |
CN202172061U (en) * | 2011-07-21 | 2012-03-21 | 厦门大学 | Compound ion source |
CN103268851A (en) * | 2012-05-21 | 2013-08-28 | 核工业北京地质研究院 | Thermal ionization time-of-flight mass spectrometer and thermal ionization time-of-fight mass spectrometric analysis method |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104733280A (en) * | 2015-04-13 | 2015-06-24 | 山东省科学院海洋仪器仪表研究所 | Orthogonal ion source device |
CN106601585A (en) * | 2016-12-29 | 2017-04-26 | 聚光科技(杭州)股份有限公司 | Ion source and maintenance method thereof |
CN106601585B (en) * | 2016-12-29 | 2019-01-04 | 聚光科技(杭州)股份有限公司 | Ion source and its maintaining method |
CN108305824A (en) * | 2017-01-12 | 2018-07-20 | Fei公司 | Ionization by collision ion source |
CN108305824B (en) * | 2017-01-12 | 2022-02-11 | Fei公司 | Impact ionization ion source |
CN107946167A (en) * | 2017-11-28 | 2018-04-20 | 厦门大学 | A kind of metal complex mass spectrometer |
CN107946167B (en) * | 2017-11-28 | 2019-06-07 | 厦门大学 | A kind of metal complex mass spectrometer |
CN109449074A (en) * | 2018-12-18 | 2019-03-08 | 中国科学院合肥物质科学研究院 | A kind of Ion Extraction device for mass spectrograph ionization source |
CN109449074B (en) * | 2018-12-18 | 2024-02-06 | 中国科学院合肥物质科学研究院 | Ion extraction device for ionization source of mass spectrometer |
CN112185801A (en) * | 2019-07-05 | 2021-01-05 | 上海大学 | Novel photoelectric composite ion source |
CN112185801B (en) * | 2019-07-05 | 2022-04-01 | 上海大学 | Novel photoelectric composite ion source |
CN110854009A (en) * | 2019-11-13 | 2020-02-28 | 上海裕达实业有限公司 | Mass spectrum device of wide-range mass measurement ion source and mass spectrum method thereof |
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Application publication date: 20140219 |