CN103594326A - Double-ionization ion source - Google Patents

Double-ionization ion source Download PDF

Info

Publication number
CN103594326A
CN103594326A CN201310617392.1A CN201310617392A CN103594326A CN 103594326 A CN103594326 A CN 103594326A CN 201310617392 A CN201310617392 A CN 201310617392A CN 103594326 A CN103594326 A CN 103594326A
Authority
CN
China
Prior art keywords
ion source
ionization
double
electrode
filament
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201310617392.1A
Other languages
Chinese (zh)
Inventor
唐紫超
史磊
李刚
王兴龙
吴小虎
张世宇
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dalian Institute of Chemical Physics of CAS
Original Assignee
Dalian Institute of Chemical Physics of CAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dalian Institute of Chemical Physics of CAS filed Critical Dalian Institute of Chemical Physics of CAS
Priority to CN201310617392.1A priority Critical patent/CN103594326A/en
Publication of CN103594326A publication Critical patent/CN103594326A/en
Pending legal-status Critical Current

Links

Images

Abstract

The invention provides a double-ionization ion source which is composed of electron bombardment ionization (an EI source) and vacuum ultraviolet lamp ionization (a PI source). According to the structure, the double-ionization ion source comprises a sample feeding tube, a repelling electrode, an ionization chamber, a filament, an ultraviolet lamp, a lead-out electrode, a focusing electrode, an emitting electrode, a repelling board and a grounding grid board. According to the double-ionization ion source, the applicability is broadened when polymorphic samples are analyzed by a single ion source, quality selection of fragment ions is improved, and the ion composition and a sample structure can be effectively analyzed.

Description

A kind of ion source of double ioinization
Technical field
The invention belongs to ion source field, be specifically related to a kind of ion source of double ioinization.
Background technology
Mass-spectrometric technique is a kind of analytical method of measuring ion charge-mass ratio, and its principle is that each component in sample is ionized in ion source, generates the positively charged ion of different charge-mass ratios, through the effect of accelerating field, forms ion beam, enters mass analyzer.In mass analyzer, recycling Electric and magnetic fields makes to occur contrary velocity dispersion, they are focused on respectively and obtains mass spectrogram, thereby determine its quality.
Testing sample could be arrived by Mass Spectrometer Method after will being ionized by ion source in ionization chamber, ionization mode is in the past generally single hard ionization or soft ionization, and soft ionization can obtain the molecular ion peak of sample, better analysis spectrogram, but ionizing energy is lower, inapplicable for the sample of difficulty ionization; The ionizing energy of hard ionization is larger, but easily produces fragment ion, and the parsing of spectrogram is brought to certain difficulty.
Summary of the invention
The defect existing in order to overcome prior art, the ion source that the object of this invention is to provide a kind of double ioinization, adopt EI or two kinds of ionization modes of PI, widened applicability when polymorphic sample is analyzed in single ionic source, improved the quality of fragment ion simultaneously and selected, can effectively analyze ion and form and sample structure.
The invention provides a kind of ion source of double ioinization, this ion source is by sample cell, repeller electrode, ionization chamber, filament, uviol lamp, extraction pole, focusing electrode, goes out emitter-base bandgap grading, ground connection screen, repeller plate and forms;
This ion source is to take sample cell as starting point, is followed successively by repeller electrode, ionization chamber, filament, uviol lamp, extraction pole, focusing electrode, goes out emitter-base bandgap grading, ground connection screen and repeller plate; Wherein, filament is positioned at a side of ionization chamber, and uviol lamp is positioned at the top of ionization chamber.
The ion source of double ioinization provided by the invention, this ion source is comprised of electron impact ionization (EI source) and vacuum UV lamp ionization (PI source) two kinds of ionization modes.
The ion source of double ioinization provided by the invention, described repeller electrode voltage is 0~30V; Described extraction pole voltage is 0~15V; Described focusing electrode voltage is-110~0V; It is described that to go out emitter voltage be-41~0V; Described filament ionization energy is-70eV; Described vacuum UV lamp ionization energy is 8~15eV.
The invention has the beneficial effects as follows: ionization mode of the present invention is that electron impact ionization or ultraviolet light photo are from two kinds, widened applicability when polymorphic sample is analyzed in single ionic source, improved the quality of fragment ion simultaneously and selected, can effectively analyze ion and form and sample structure.The ion that ionization produces, is converged via extraction pole and focusing electrode in repulsion process to analyzer repulsion by repeller electrode, finally converges in ionogenic outlet.By regulating the voltage of repeller electrode, extraction pole, focusing electrode can regulate the energy of outgoing ion and direction to distribute.
Accompanying drawing explanation
Fig. 1 is the ionogenic structure chart of a kind of double ioinization of the present invention, and wherein, 1 is sample cell; 2 is repeller electrode; 3 is ionization chamber; 4 is filament; 5 is uviol lamp; 6 is extraction pole; 7 is focusing electrode; 8 for going out emitter-base bandgap grading; 9 is ground connection screen; 10 is repeller plate.
Embodiment
Below in conjunction with Fig. 1, the present invention is further illustrated.
As shown in Figure 1, the ion source of a kind of double ioinization of the present invention, take sample cell as starting point, is followed successively by repeller electrode, ionization chamber, filament, uviol lamp, extraction pole, focusing electrode, goes out emitter-base bandgap grading, ground connection screen and repeller plate.Wherein, filament is positioned at a side of ionization chamber, and uviol lamp is positioned at the top of ionization chamber.
The present invention adopts electron impact ionization or ultraviolet light photo from two kinds, has widened applicability when polymorphic sample is analyzed in single ionic source, has improved the quality of fragment ion simultaneously and has selected, and can effectively analyze ion and form and sample structure.The ion that ionization produces, is converged via extraction pole and focusing electrode in repulsion process to analyzer repulsion by repeller electrode, finally converges in ionogenic outlet.By regulating the voltage of repeller electrode, extraction pole, focusing electrode can regulate the energy of outgoing ion and direction to distribute.

Claims (8)

1. an ion source for double ioinization, is characterized in that: this ion source is by sample cell, repeller electrode, ionization chamber, filament, uviol lamp, extraction pole, focusing electrode, goes out emitter-base bandgap grading, ground connection screen, repeller plate and forms;
This ion source is to take sample cell as starting point, is followed successively by repeller electrode, ionization chamber, filament, uviol lamp, extraction pole, focusing electrode, goes out emitter-base bandgap grading, ground connection screen and repeller plate; Wherein, filament is positioned at a side of ionization chamber, and uviol lamp is positioned at the top of ionization chamber.
2. according to the ion source of double ioinization described in claim 1, it is characterized in that: this ion source is comprised of electron impact ionization and two kinds of ionization modes of vacuum UV lamp ionization.
3. according to the ion source of double ioinization described in claim 1, it is characterized in that: described repeller electrode voltage is 0~30V.
4. according to the ion source of double ioinization described in claim 1, it is characterized in that: described extraction pole voltage is 0~15V.
5. according to the ion source of double ioinization described in claim 1, it is characterized in that: described focusing electrode voltage is-110~0V.
6. according to the ion source of double ioinization described in claim 1, it is characterized in that: described in to go out emitter voltage be-41~0V.
7. according to the ion source of double ioinization described in claim 1, it is characterized in that: described filament ionization energy is-70eV.
8. according to the ion source of double ioinization described in claim 2, it is characterized in that: described vacuum UV lamp ionization energy is 8~15eV.
CN201310617392.1A 2013-11-27 2013-11-27 Double-ionization ion source Pending CN103594326A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201310617392.1A CN103594326A (en) 2013-11-27 2013-11-27 Double-ionization ion source

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201310617392.1A CN103594326A (en) 2013-11-27 2013-11-27 Double-ionization ion source

Publications (1)

Publication Number Publication Date
CN103594326A true CN103594326A (en) 2014-02-19

Family

ID=50084420

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201310617392.1A Pending CN103594326A (en) 2013-11-27 2013-11-27 Double-ionization ion source

Country Status (1)

Country Link
CN (1) CN103594326A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104733280A (en) * 2015-04-13 2015-06-24 山东省科学院海洋仪器仪表研究所 Orthogonal ion source device
CN106601585A (en) * 2016-12-29 2017-04-26 聚光科技(杭州)股份有限公司 Ion source and maintenance method thereof
CN107946167A (en) * 2017-11-28 2018-04-20 厦门大学 A kind of metal complex mass spectrometer
CN108305824A (en) * 2017-01-12 2018-07-20 Fei公司 Ionization by collision ion source
CN109449074A (en) * 2018-12-18 2019-03-08 中国科学院合肥物质科学研究院 A kind of Ion Extraction device for mass spectrograph ionization source
CN110854009A (en) * 2019-11-13 2020-02-28 上海裕达实业有限公司 Mass spectrum device of wide-range mass measurement ion source and mass spectrum method thereof
CN112185801A (en) * 2019-07-05 2021-01-05 上海大学 Novel photoelectric composite ion source

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080142702A1 (en) * 2006-12-18 2008-06-19 Juergen Frosien Gas field ion source for multiple applications
EP2405463A1 (en) * 2010-07-06 2012-01-11 ETH Zurich Laser-ablation ion source with ion funnel
CN202172061U (en) * 2011-07-21 2012-03-21 厦门大学 Compound ion source
CN103268851A (en) * 2012-05-21 2013-08-28 核工业北京地质研究院 Thermal ionization time-of-flight mass spectrometer and thermal ionization time-of-fight mass spectrometric analysis method

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080142702A1 (en) * 2006-12-18 2008-06-19 Juergen Frosien Gas field ion source for multiple applications
EP2405463A1 (en) * 2010-07-06 2012-01-11 ETH Zurich Laser-ablation ion source with ion funnel
CN202172061U (en) * 2011-07-21 2012-03-21 厦门大学 Compound ion source
CN103268851A (en) * 2012-05-21 2013-08-28 核工业北京地质研究院 Thermal ionization time-of-flight mass spectrometer and thermal ionization time-of-fight mass spectrometric analysis method

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104733280A (en) * 2015-04-13 2015-06-24 山东省科学院海洋仪器仪表研究所 Orthogonal ion source device
CN106601585A (en) * 2016-12-29 2017-04-26 聚光科技(杭州)股份有限公司 Ion source and maintenance method thereof
CN106601585B (en) * 2016-12-29 2019-01-04 聚光科技(杭州)股份有限公司 Ion source and its maintaining method
CN108305824A (en) * 2017-01-12 2018-07-20 Fei公司 Ionization by collision ion source
CN108305824B (en) * 2017-01-12 2022-02-11 Fei公司 Impact ionization ion source
CN107946167A (en) * 2017-11-28 2018-04-20 厦门大学 A kind of metal complex mass spectrometer
CN107946167B (en) * 2017-11-28 2019-06-07 厦门大学 A kind of metal complex mass spectrometer
CN109449074A (en) * 2018-12-18 2019-03-08 中国科学院合肥物质科学研究院 A kind of Ion Extraction device for mass spectrograph ionization source
CN109449074B (en) * 2018-12-18 2024-02-06 中国科学院合肥物质科学研究院 Ion extraction device for ionization source of mass spectrometer
CN112185801A (en) * 2019-07-05 2021-01-05 上海大学 Novel photoelectric composite ion source
CN112185801B (en) * 2019-07-05 2022-04-01 上海大学 Novel photoelectric composite ion source
CN110854009A (en) * 2019-11-13 2020-02-28 上海裕达实业有限公司 Mass spectrum device of wide-range mass measurement ion source and mass spectrum method thereof

Similar Documents

Publication Publication Date Title
CN103594326A (en) Double-ionization ion source
US9679755B2 (en) Ionization apparatus
US7375318B2 (en) Mass spectrometer
CN105702556A (en) Ion source for soft electron ionization and related systems and methods
CN105632871B (en) A kind of mass spectrum chemical ionization source based on UV LED
CA2597252A1 (en) Ion sources for mass spectrometry
CN105632877A (en) Double-ion-source quadrupole mass spectrometer based on single-photon ionization and electron bombardment ionization
CN102290315A (en) Ion source suitable for flight time mass spectrometer
CN104392887A (en) Femtosecond laser post-ionization mass spectrum apparatus
CN104716010A (en) Vacuum ultraviolet photoionization and chemical ionization compound ionization source based on radio frequency electric field enhancement of quadrupole rod
CN103645240B (en) Use ion microprobe to analyze the system and method for nonmetalloid and metallic element simultaneously
CN105655226B (en) A kind of vacuum ultraviolet ionized and chemi-ionization composite ionization source
CN102263007A (en) Multipole-stem-based proton transfer ion source device
ATE549739T1 (en) MICROWAVE TUBE HAVING A DEVICE FOR EXTRACTING IONS GENERATED IN THE TUBE
CN109449074B (en) Ion extraction device for ionization source of mass spectrometer
CN104576290A (en) Pulse pressurized ion enrichment method
CN104934288A (en) High time resolution ion speed imager based on tetra-pole plate design
CN109887829A (en) A kind of ionization source device detected simultaneously based on VUV lamp negative ions
CN104716012B (en) Device used for reducing light window surface pollution
CN104377108A (en) In-situ pyrolytic ion source for detecting free radicals and reaction intermediates
CN203733758U (en) Automatic correction device for ion source electrical parameter quality discrimination
CN102324376A (en) Compensation irradiating type vacuum ultraviolet lamp ion source device
CN112185801A (en) Novel photoelectric composite ion source
CN104599933B (en) A kind of electron ionization sources
CN110176385B (en) High-efficiency ion source for magnetic mass spectrometer

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20140219