CN103502891B - 致动投射曝光设备中的元件的装置 - Google Patents

致动投射曝光设备中的元件的装置 Download PDF

Info

Publication number
CN103502891B
CN103502891B CN201280022137.6A CN201280022137A CN103502891B CN 103502891 B CN103502891 B CN 103502891B CN 201280022137 A CN201280022137 A CN 201280022137A CN 103502891 B CN103502891 B CN 103502891B
Authority
CN
China
Prior art keywords
actuator
force
frequency
actuator part
projection exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201280022137.6A
Other languages
English (en)
Chinese (zh)
Other versions
CN103502891A (zh
Inventor
M.豪夫
U.舍恩霍夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of CN103502891A publication Critical patent/CN103502891A/zh
Application granted granted Critical
Publication of CN103502891B publication Critical patent/CN103502891B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70766—Reaction force control means, e.g. countermass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
CN201280022137.6A 2011-05-06 2012-04-12 致动投射曝光设备中的元件的装置 Active CN103502891B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201161483153P 2011-05-06 2011-05-06
US61/483,153 2011-05-06
DE102011075393.1 2011-05-06
DE102011075393A DE102011075393B4 (de) 2011-05-06 2011-05-06 Anordnung zur Aktuierung eines Elementes in einer Projektionsbelichtungsanlage
PCT/EP2012/056628 WO2012152520A1 (en) 2011-05-06 2012-04-12 Arrangement for actuating an element in a projection exposure apparatus

Publications (2)

Publication Number Publication Date
CN103502891A CN103502891A (zh) 2014-01-08
CN103502891B true CN103502891B (zh) 2016-11-02

Family

ID=47019435

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201280022137.6A Active CN103502891B (zh) 2011-05-06 2012-04-12 致动投射曝光设备中的元件的装置

Country Status (5)

Country Link
US (1) US9081292B2 (https=)
JP (1) JP6121401B2 (https=)
CN (1) CN103502891B (https=)
DE (1) DE102011075393B4 (https=)
WO (1) WO2012152520A1 (https=)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015515758A (ja) 2012-04-26 2015-05-28 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置及びデバイス製造方法
DE102013201081A1 (de) * 2013-01-24 2014-03-13 Carl Zeiss Smt Gmbh Vorrichtung zur Lagerung eines optischen Bauelements
JP6168957B2 (ja) * 2013-09-30 2017-07-26 キヤノン株式会社 光学装置、投影光学系、露光装置および物品の製造方法
ES2779898T3 (es) * 2013-12-02 2020-08-20 Sony Corp Dispositivo de comunicaciones, equipo de infraestructura y procedimientos para recibir información de control de enlace descendente
NL2014487A (en) * 2014-04-17 2015-11-02 Asml Netherlands Bv Lithographic Apparatus and Device Manufacturing Method.
JP6371576B2 (ja) 2014-05-02 2018-08-08 キヤノン株式会社 光学装置、投影光学系、露光装置、および物品の製造方法
JP6754699B2 (ja) * 2014-05-14 2020-09-16 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学素子上のアクチュエータ及びセンサ点の最適配置
DE102015201870A1 (de) 2015-02-03 2016-08-04 Carl Zeiss Smt Gmbh Anordnung zur Positionsmanipulation eines Elementes, insbesondere in einem optischen System
DE102016202408A1 (de) * 2016-02-17 2017-01-26 Carl Zeiss Smt Gmbh Anordnung zur Positionsmanipulation eines Elementes in einem optischen System
ES2603655B1 (es) * 2016-04-21 2017-09-25 Consorci Per A La Construcció, Equipament I Explotació Del Laboratori De Llum De Sincrotró Dispositivo y método de aplicación de fuerza en un objeto
DE102016216917A1 (de) * 2016-09-07 2018-03-08 Carl Zeiss Smt Gmbh Optisches System, insbesondere Lithographieanlage, sowie Verfahren
DE102016225900A1 (de) * 2016-12-21 2018-06-21 Carl Zeiss Smt Gmbh Tauchspulenaktuator
NL2020264A (en) * 2017-02-02 2018-08-07 Asml Netherlands Bv Lithographic apparatus, lithographic projection apparatus and device manufacturing method
DE102017216458A1 (de) * 2017-09-18 2019-03-21 Carl Zeiss Smt Gmbh Verfahren zur Herstellung eines Spiegels als optischer Komponente für ein optisches System einer Projektionsbelichtungsanlage für die Projektionslithographie
DE102018200528A1 (de) * 2018-01-15 2018-12-13 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Halbleiterlithographie mit Sensorschutz
DE102020208013B3 (de) 2020-06-29 2021-09-02 Carl Zeiss Smt Gmbh Kompensation von kriecheffekten in einer abbildungseinrichtung
DE102023205570A1 (de) * 2023-06-14 2024-06-27 Carl Zeiss Smt Gmbh Optisches system und projektionsbelichtungsanlage
DE102023208718A1 (de) * 2023-09-08 2025-03-13 Carl Zeiss Smt Gmbh Vibrationskorrektureinheit, Verfahren zum Betreiben einer Vibrationskorrektureinheit, Sensor und Lithographieanlage mit einem Sensor

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1442755A (zh) * 2001-12-21 2003-09-17 Asml荷兰有限公司 光刻装置及器件制造方法
CN101441420A (zh) * 2007-10-02 2009-05-27 Asml荷兰有限公司 光刻设备以及器件制造方法
CN101446771A (zh) * 2007-10-23 2009-06-03 Asml荷兰有限公司 具有主动阻尼组件的光刻设备

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW316874B (https=) * 1995-05-30 1997-10-01 Philips Electronics Nv
US20030019791A1 (en) * 2001-06-18 2003-01-30 Petronetics, Llc. Method to upgrade hydrocarbon mixtures
JP4574206B2 (ja) * 2003-04-25 2010-11-04 キヤノン株式会社 駆動装置、それを用いた露光装置、デバイスの製造方法
JPWO2005085671A1 (ja) * 2004-03-08 2008-01-24 株式会社ニコン 防振装置、露光装置、及び防振方法
US7126674B2 (en) * 2004-06-14 2006-10-24 Asml Netherlands B.V. Positioning device and device manufacturing method
JP2007103657A (ja) * 2005-10-04 2007-04-19 Canon Inc 光学素子保持装置、露光装置およびデバイス製造方法
JP2007316132A (ja) * 2006-05-23 2007-12-06 Canon Inc 反射装置
NL1036568A1 (nl) * 2008-03-18 2009-09-21 Asml Netherlands Bv Actuator system, lithographic apparatus, and device manufacturing method.
NL2003424A (en) * 2008-10-07 2010-04-08 Asml Netherlands Bv Projection assembly and lithographic apparartus.
EP2295829B1 (de) * 2009-09-11 2016-07-13 Integrated Dynamics Engineering Verbessertes aktives Schwingungsisolationssystem
DE102012202553A1 (de) * 2012-02-20 2013-08-22 Carl Zeiss Smt Gmbh Lithographievorrichtung mit dämpfungsvorrichtung

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1442755A (zh) * 2001-12-21 2003-09-17 Asml荷兰有限公司 光刻装置及器件制造方法
CN101441420A (zh) * 2007-10-02 2009-05-27 Asml荷兰有限公司 光刻设备以及器件制造方法
CN101446771A (zh) * 2007-10-23 2009-06-03 Asml荷兰有限公司 具有主动阻尼组件的光刻设备

Also Published As

Publication number Publication date
US9081292B2 (en) 2015-07-14
WO2012152520A1 (en) 2012-11-15
JP2014519186A (ja) 2014-08-07
DE102011075393A1 (de) 2012-11-08
DE102011075393B4 (de) 2013-08-14
JP6121401B2 (ja) 2017-04-26
US20140016109A1 (en) 2014-01-16
CN103502891A (zh) 2014-01-08

Similar Documents

Publication Publication Date Title
CN103502891B (zh) 致动投射曝光设备中的元件的装置
US10185221B2 (en) Arrangement for actuating an element in a microlithographic projection exposure apparatus
US6788386B2 (en) Lithographic apparatus and device manufacturing method
JP3947501B2 (ja) リソグラフィ用機器およびデバイスの製造方法
US9304404B2 (en) Arrangement for actuating an element in a microlithographic projection exposure apparatus
CN101452222B (zh) 光刻设备、投影组件、组合装置以及主动阻尼方法
US11029612B2 (en) Bearing device, magnetic gravity compensator, vibration isolation system, lithographic apparatus, and method to control a gravity compensator having a negative stiffness
US20120241268A1 (en) Arrangement for the vibration isolation of a pay load
US10108097B2 (en) Arrangement for manipulating the position of an element
JP2006024919A (ja) 位置決め装置及びデバイス製造方法
US20260093188A1 (en) Assembly in a microlithographic projection exposure apparatus
WO2016034348A1 (en) A vibration isolation system to support a structure, a lithographic apparatus and device manufacturing method

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant