CN103498158A - 一种抛光浆料 - Google Patents
一种抛光浆料 Download PDFInfo
- Publication number
- CN103498158A CN103498158A CN201310434402.8A CN201310434402A CN103498158A CN 103498158 A CN103498158 A CN 103498158A CN 201310434402 A CN201310434402 A CN 201310434402A CN 103498158 A CN103498158 A CN 103498158A
- Authority
- CN
- China
- Prior art keywords
- polishing
- kilogram
- metal
- aluminum oxide
- glycerol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005498 polishing Methods 0.000 title claims abstract description 27
- 239000002002 slurry Substances 0.000 title claims abstract description 17
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 claims abstract description 18
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims abstract description 12
- 239000000843 powder Substances 0.000 claims abstract description 8
- FZMJEGJVKFTGMU-UHFFFAOYSA-N triethoxy(octadecyl)silane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OCC)(OCC)OCC FZMJEGJVKFTGMU-UHFFFAOYSA-N 0.000 claims abstract description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 7
- 235000021355 Stearic acid Nutrition 0.000 claims abstract description 6
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims abstract description 6
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 claims abstract description 6
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000008117 stearic acid Substances 0.000 claims abstract description 6
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 7
- 239000002245 particle Substances 0.000 claims description 5
- 239000013543 active substance Substances 0.000 claims description 4
- DAJSVUQLFFJUSX-UHFFFAOYSA-M sodium;dodecane-1-sulfonate Chemical group [Na+].CCCCCCCCCCCCS([O-])(=O)=O DAJSVUQLFFJUSX-UHFFFAOYSA-M 0.000 claims description 4
- RNMDNPCBIKJCQP-UHFFFAOYSA-N 5-nonyl-7-oxabicyclo[4.1.0]hepta-1,3,5-trien-2-ol Chemical compound C(CCCCCCCC)C1=C2C(=C(C=C1)O)O2 RNMDNPCBIKJCQP-UHFFFAOYSA-N 0.000 claims description 3
- -1 polyoxyethylene nonylphenol Polymers 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 abstract description 9
- 239000002184 metal Substances 0.000 abstract description 9
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 abstract description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 1
- 239000004615 ingredient Substances 0.000 abstract 1
- 230000001590 oxidative effect Effects 0.000 abstract 1
- 230000001681 protective effect Effects 0.000 abstract 1
- 239000004094 surface-active agent Substances 0.000 abstract 1
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000002481 rotproofing Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
Description
Claims (3)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201310434402.8A CN103498158B (zh) | 2013-09-23 | 2013-09-23 | 一种抛光浆料 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201310434402.8A CN103498158B (zh) | 2013-09-23 | 2013-09-23 | 一种抛光浆料 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN103498158A true CN103498158A (zh) | 2014-01-08 |
CN103498158B CN103498158B (zh) | 2016-01-20 |
Family
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Family Applications (1)
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CN201310434402.8A Active CN103498158B (zh) | 2013-09-23 | 2013-09-23 | 一种抛光浆料 |
Country Status (1)
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CN (1) | CN103498158B (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104131298A (zh) * | 2014-07-01 | 2014-11-05 | 蚌埠天光传感器有限公司 | 一种用于不锈钢材料的抛光液及其制备方法 |
CN104264172A (zh) * | 2014-09-29 | 2015-01-07 | 无锡阳工机械制造有限公司 | 一种黑色金属除锈用喷砂浆 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000265160A (ja) * | 1999-03-12 | 2000-09-26 | Sumitomo Osaka Cement Co Ltd | 高速鏡面研磨用研磨材 |
CN1440449A (zh) * | 2000-07-05 | 2003-09-03 | 卡伯特微电子公司 | 用于cmp的含硅烷的抛光组合物 |
US20050081998A1 (en) * | 1997-02-24 | 2005-04-21 | Hampden-Smith Mark J. | Chemical-mechanical planarization slurries and powders and methods for using same |
CN101033374A (zh) * | 2007-04-13 | 2007-09-12 | 中国地质大学(武汉) | 一种高纯度纳米金刚石抛光液及其制备方法 |
CN101591508A (zh) * | 2008-05-30 | 2009-12-02 | 安集微电子(上海)有限公司 | 一种用于金属化学机械抛光的抛光浆料及其用途 |
-
2013
- 2013-09-23 CN CN201310434402.8A patent/CN103498158B/zh active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050081998A1 (en) * | 1997-02-24 | 2005-04-21 | Hampden-Smith Mark J. | Chemical-mechanical planarization slurries and powders and methods for using same |
JP2000265160A (ja) * | 1999-03-12 | 2000-09-26 | Sumitomo Osaka Cement Co Ltd | 高速鏡面研磨用研磨材 |
CN1440449A (zh) * | 2000-07-05 | 2003-09-03 | 卡伯特微电子公司 | 用于cmp的含硅烷的抛光组合物 |
CN101033374A (zh) * | 2007-04-13 | 2007-09-12 | 中国地质大学(武汉) | 一种高纯度纳米金刚石抛光液及其制备方法 |
CN101591508A (zh) * | 2008-05-30 | 2009-12-02 | 安集微电子(上海)有限公司 | 一种用于金属化学机械抛光的抛光浆料及其用途 |
Non-Patent Citations (1)
Title |
---|
邹微波等: "化学机械抛光过程抛光液作用的研究进展", 《金刚石与磨料磨具工程》, vol. 32, no. 1, 29 February 2012 (2012-02-29) * |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104131298A (zh) * | 2014-07-01 | 2014-11-05 | 蚌埠天光传感器有限公司 | 一种用于不锈钢材料的抛光液及其制备方法 |
CN104264172A (zh) * | 2014-09-29 | 2015-01-07 | 无锡阳工机械制造有限公司 | 一种黑色金属除锈用喷砂浆 |
Also Published As
Publication number | Publication date |
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CN103498158B (zh) | 2016-01-20 |
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Effective date of registration: 20161227 Address after: The 21 group, Dongxing city Fangchenggang city 538101 the Guangxi Zhuang Autonomous Region jiangpingzhen million tail village 22 groups and 23 groups of Interchange Patentee after: DONGXING HONGSHENG INDUSTRIAL CO., LTD. Address before: 214000 Jiangsu city in Wuxi Province Economic Development Zone Huishan Spring Road No. 588 Patentee before: Wuxi Yanggong Machinery Manufacturing Co., Ltd. |
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CB03 | Change of inventor or designer information | ||
CB03 | Change of inventor or designer information |
Inventor after: Huang Xianhu Inventor before: Yang Longxing |
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Effective date of registration: 20170822 Address after: 212000, Jiangsu province Xuzhou Suining County town peace village front house group Patentee after: JIANGSU HAIDEMAN NEW MATERIAL CO., LTD. Address before: The 21 group, Dongxing city Fangchenggang city 538101 the Guangxi Zhuang Autonomous Region jiangpingzhen million tail village 22 groups and 23 groups of Interchange Patentee before: DONGXING HONGSHENG INDUSTRIAL CO., LTD. |
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Effective date of registration: 20191021 Address after: 221300 No. 88 Liaohe West Road, Pizhou Economic Development Zone, Xuzhou City, Jiangsu Province Patentee after: SU Normal University Semiconductor Materials and Equipment Research Institute (Pizhou) Co., Ltd. Address before: 212000 Heping Village, Sha Chi Town, Suining County, Xuzhou, Jiangsu Patentee before: JIANGSU HAIDEMAN NEW MATERIAL CO., LTD. |
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Effective date of registration: 20211222 Address after: 221300 506, block B, electronic industrial park, Pizhou Economic Development Zone, Xuzhou City, Jiangsu Province Patentee after: Xuzhou Bochuang Construction Development Group Co.,Ltd. Address before: No.88 Liaohe West Road, Pizhou Economic Development Zone, Xuzhou City, Jiangsu Province Patentee before: SU Normal University Semiconductor Materials and Equipment Research Institute (Pizhou) Co.,Ltd. |