CN103454722A - Optical waveguide and method for manufacturing same - Google Patents
Optical waveguide and method for manufacturing same Download PDFInfo
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- CN103454722A CN103454722A CN2012101777738A CN201210177773A CN103454722A CN 103454722 A CN103454722 A CN 103454722A CN 2012101777738 A CN2012101777738 A CN 2012101777738A CN 201210177773 A CN201210177773 A CN 201210177773A CN 103454722 A CN103454722 A CN 103454722A
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- optical waveguide
- substrate
- layer
- reflecting surface
- obtuse angle
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Abstract
The invention relates to an optical waveguide. The optical waveguide comprises a substrate and a light guiding layer embedded on the substrate. The light guiding layer comprises a first side face, a second side face, a third side face, a fourth side face and a first reflecting face, wherein the first side face is parallel to the second side face, the third side face is parallel to the fourth side face, the third side face is connected with the first side face to form a first obtuse angle, the first reflecting face is placed between and connected with the second side face and the fourth side face, the first reflecting face is connected with the second side face to form a first acute angle alpha1, the first obtuse angle is theta1, and the difference between 180 degrees and the theta1 is larger than the alpha1. The invention further relates to a method for manufacturing the optical waveguide.
Description
Technical field
The present invention relates to the method for making of a kind of optical waveguide and a kind of optical waveguide.
Background technology
In the light signal transmission, the general optical waveguide that adopts is as optical transmission medium, and when the light signal of extremely high frequency transmits in the optical waveguide medium, easily the geometric shape design because of optical waveguide affects its transport properties.Especially when optical waveguide is done bending with the certain curvature radius, part light on the corner is because incident angle is less than critical angle, do not meet total reflection condition, this part light easily produces great unexpected propagation loss due to refraction, yet too small radius-of-curvature, its curvature changes can cause the scattering loss increase too soon, although curvature changes the loss that can reduce scattering slowly, but can increase the length of assembly, cost is increased.
Summary of the invention
In view of above-mentioned condition, be necessary to provide a kind of and can overcome the optical waveguide of the problems referred to above and a kind of method for making of optical waveguide.
A kind of optical waveguide, it comprises substrate and is embedded at this suprabasil optical waveguide layer, this optical waveguide layer comprises the first side, the second side, the 3rd side, the 4th side and the first reflecting surface, this first parallel sided is in this second side, the 3rd parallel sided is in the 4th side, the 3rd side is connected with this first side and forms one first obtuse angle, this first reflecting surface is between this second side and the 4th side and connect this second side and the 4th side, it is α 1 that this first reflecting surface is connected the first become acute angle with this second side, and this first obtuse angle is θ
1, α 1 and θ
1between meet α 1<(180 °-θ
1).
A kind of method for making of optical waveguide, it comprises:
One substrate is provided; Surface-coated one deck light guide bed of material in this substrate; Coating one deck photoresist layer on this light guide bed of material; The light shield of a light guide bed of material corresponding diagram shape as mentioned above is provided, adopts this light shield to this photoresist layer exposure, form an etch stop layer after development on this light guide bed of material; This light guide bed of material that etching is not hidden by this etch stop layer; Remove this etch stop layer, to obtain the optical waveguide layer corresponding with this light shield shape; And this optical waveguide layer is spread in this substrate.
Compare prior art, the method for making of optical waveguide provided by the invention and optical waveguide, in the arranged outside of optical waveguide layer reflecting surface, and angle meets α 1<(180 °-θ
1), make the light of propagating in optical waveguide layer be incident to the incident angle increase of reflecting surface, thereby be increased in the amount of light that total reflection occurs in optical waveguide layer, and then reduce light losing.This optical waveguide applications is at the optical communication network, and light loss is low, has guiding property preferably.
The accompanying drawing explanation
Fig. 1 is the schematic perspective view of a kind of optical waveguide of providing of first embodiment of the invention.
Fig. 2 is the floor map of the optical waveguide of Fig. 1.
Fig. 3 is the light path schematic diagram of the optical waveguide of Fig. 1.
Fig. 4 is the floor map of a kind of optical waveguide of providing of second embodiment of the invention.
Fig. 5 is the floor map of a kind of optical waveguide of providing of third embodiment of the invention.
Fig. 6-Figure 10 is the step schematic diagram of the method for making of the optical waveguide that provides of first embodiment of the invention.
The main element symbol description
| |
100，110，120 | |
310 |
| The |
11 | |
320 |
| The |
13 | The |
330 |
| The |
15 | Four |
340 |
| The |
17 | |
350 |
| The first reflecting |
12 | Optical waveguide layer | 40,401 |
| The |
19 | Dull and stereotyped | 50 |
| The |
21 | The proton |
501 |
| The second reflecting |
14 | The light guide bed of |
60 |
| |
30，302 | |
70 |
| The |
301 | |
80 |
| Flat- |
303 | |
82 |
Following embodiment further illustrates the present invention in connection with above-mentioned accompanying drawing.
Embodiment
Below with embodiment, also by reference to the accompanying drawings the method for making of optical waveguide provided by the invention and optical waveguide is described in further detail.
See also Fig. 1-2, a kind of optical waveguide 100 that first embodiment of the invention provides.This optical waveguide 100 is ridge optical waveguide, and it comprises substrate 30 and is embedded the optical waveguide layer 40 in this substrate 30.This substrate 30 comprises a flat-shaped substrate 303 and is positioned at the ridge structure 301 on this flat-shaped substrate 303, this optical waveguide layer 40 is embedded in this ridge structure 301, this optical waveguide layer 40 comprises the first side 11, the second side 13, the 3rd side 15, the 4th side 17 and the first reflecting surface 12, this first side 11 is with this opposing setting in the second side 13 and be parallel to each other, the 3rd side 15 is with the 4th opposing setting in side 17 and be parallel to each other, the 3rd side 15 is connected with this first side 11 and forms one first obtuse angle, this first reflecting surface 12 is between this second side 13 and the 4th side 17 and connect this second side 13 and the 4th side 17, it is α 1 that this first reflecting surface 12 is connected the first become acute angle with this second side 13, this first obtuse angle is θ
1, α 1 and θ
1between meet α 1<(180 °-θ
1).
Please refer to the drawing 3, suppose light L with the direction that is parallel to the first side 11 in the interior propagation of optical waveguide layer 40 and be incident to the first reflecting surface 12, the normal of this first reflecting surface 12 is H, this incident angle is β
1.If there is not the first reflecting surface 12 in optical waveguide layer 40, but the second side 13 directly is connected (shown in the ginseng dotted line) with the 4th side 17, and the normal that light L will be incident to 17, the four sides 17, the 4th side is h, and this incident angle is β
2.As shown in Figure 3, β
1=90-α 1, β
2=90-(180-θ
1), therefore, β 1-β 2=90-α 1-90+ (180-θ
1)=180-θ
1-α 1, and α 1<(180 °-θ 1) again, therefore β
1-β
20.Therefore, the first reflecting surface 12 is set the incident angle of light L is increased, thereby be increased in the amount of light of the interior generation total reflection of optical waveguide layer 40, and then reduce light losing.This optical waveguide 100 is applied in the optical communication network, and light loss is low, has guiding property preferably.
In addition, in order to reduce the loss of ridge sidewall to lightray propagation, in present embodiment, the shape of the shape of this ridge structure 301 and optical waveguide layer 40 is complementary.Refer to Fig. 7, this ridge structure 301 comprises 310, second side, first side 320, the 3rd side 330, four side 340 and joint face 350, wherein 310Yu Gai second side, this first side 320 opposing settings and being parallel to each other, the 3rd side 330 is with the opposing setting of this four side 340 and be parallel to each other, the 3rd side 330 formation one the 3rd obtuse angle θ that is connected with this first side 310
3, this joint face 350 is between this second side 320 and this four side 340 and connect this second side 320 and this four side 340, and this joint face 350 is connected formed the 3rd acute angle with this second side 320 be that α 3, the three obtuse angles are θ
3, α 3 and θ
3between meet α 3<(180 °-θ
3).And this α 3=α 1, θ
3=θ
1.
Refer to Fig. 4, Fig. 4 provides the structural representation of the optical waveguide 110 of second embodiment of the invention, the structure of the optical waveguide 100 of this optical waveguide 110 and the first embodiment is basic identical, its difference is plate in the substrate 302 with this optical waveguide 110, this optical waveguide layer 40 directly is embedded in this substrate 302, and this optical waveguide 110 is planar optical waveguide.
Refer to Fig. 5, the structural representation of the optical waveguide 120 that third embodiment of the invention provides, the structure of the optical waveguide 100 of this optical waveguide 120 and the first embodiment is basic identical, its difference is, the optical waveguide layer 401 of this optical waveguide 120 also comprises the 5th side 19, the 6th side 21 and the second reflecting surface 14, the 5th side 19 is with the 6th opposing setting in side 21 and be parallel to each other, the 3rd side 15 is between this first side 11 and the 5th side 19, the 5th side 19 is connected with the 3rd side 15 and forms one second obtuse angle in junction, this second reflecting surface 14 is between the 4th side 17 and the 6th side 21 and be connected the 4th side 17 and the 6th side 21, it is α 2 that this second reflecting surface 14 is connected formed the second acute angle with the 4th side 17, this second obtuse angle is θ
2, α 2 and θ
2between meet α 2<(180 °-θ
2).In the present embodiment, this α 1 equals this α 2, θ
1=θ
2, in other embodiments, this α 1 also can be not equal to this α 2.
The optical waveguide layer 40 of first embodiment of the invention optical waveguide 100 comprises that a reflecting surface 12, the three embodiment optical waveguide 120 optical waveguide layers 401 comprise two reflectings surface 12 and 14.Optical waveguide layer also can comprise plural reflecting surface in other embodiments, thereby reaches the wide-angle curved design of optical waveguide.And optical waveguide layer can be embedded in the substrate with ridge structure and form ridge optical waveguide, also can be embedded in the tabular substrate and form planar optical waveguide.
Please refer to the drawing 6-10, the present invention also provides a kind of method for making of optical waveguide 100, and it comprises the following steps:
Step S1: substrate 30 is provided.Refer to Fig. 7, this substrate 30 comprises a flat-shaped substrate 303 and is positioned at the ridge structure 301 on this flat-shaped substrate 303.
Make ridge structure 301 with wet etching in present embodiment.Please refer to the drawing 6-7, concrete steps are: a flat board 50 is provided, and the material of this flat board 50 is lithium niobate or niobic acid barium.Adopt yellow light lithography to define the ridge pattern on this flat board 50, at this ridge patterned surfaces, plate a thallium layer as proton exchange restraining barrier 501, refer to Fig. 6, this this flat board 50 of 501 cover parts, proton exchange restraining barrier.
The flat board 50 that surface is coated with to proton exchange restraining barrier 501 is put in benzoic acid solution or solution of adipic acid and carries out proton exchange.The part do not covered by this proton exchange restraining barrier 501 on this flat board 50 can be carried out proton exchange.Wherein the time of proton exchange is 6 hours.
Step S2: at surface-coated one deck light guide bed of material 60 of this substrate 30.In present embodiment, it is the coating light guide bed of material 60 on ridge structure 301;
Step S3: coating one deck photoresist layer 70 on this light guide bed of material 60.Refer to Fig. 8, wherein, the thickness of this light guide bed of material 60 is between 0.6～0.8um, and the material of this light guide bed of material 60 is titanium, nickel, zinc, gallium or admiro.Preferably, select titanium as the light guide bed of material 60.The method that forms this light guide bed of material 60 on ridge structure 301 surfaces is electron beam evaporation deposition method or radio-frequency sputtering coating method.
Step S4 a: light shield 80 with the corresponding figure of optical waveguide layer 40 is provided, and forms an etch stop layer 82 after utilizing 80 pairs of these photoresist layer 70 exposure imagings of this light shield on this light guide bed of material 60.Select light tight light shield 80 herein, in other embodiments, light shield also can the printing opacity light shield.Concrete condition is determined according to the character of photoresistance.
Step S5: this light guide bed of material 60 that etching is not hidden by this etch stop layer 82.This step etching etching solution used is HNO
3.
Step S6: remove this etch stop layer 82, just obtain the optical waveguide layer 40 corresponding with these light shield 80 shapes.Optical waveguide layer 40 is formed on the surface of this ridge structure 301.
Step S7: this optical waveguide layer 40 is spread in this ridge structure 301.Refer to Figure 10, present embodiment is to adopt the High temperature diffusion method that optical waveguide layer 40 is formed in this ridge structure 301.Specific practice is that substrate 30 and optical waveguide layer 40 are all put into to the diffusion that high temperature furnace carries out optical waveguide layer 40, and wherein, the temperature of high temperature furnace is 1020 ℃, and the time is 4～8 hours.Optical waveguide layer 40 can diffuse in ridge structure 301, in order to change the index distribution of crystal, thereby obtains optical waveguide 100 as shown in Figure 1.
The method for making of the production method of this optical waveguide 110 and this optical waveguide 100 is similar, its difference with need on dull and stereotyped 50, not make the ridge structure, only need one light shield, adopt yellow light lithography to form optical waveguide layer on substrate, at this, repeat no more.
The method for making of the production method of this optical waveguide 120 and this optical waveguide 100 is similar, and it is different that its difference is to form the ridge structure of this optical waveguide light shield shape required with the optical waveguide pattern, at this, repeats no more.
In addition, those skilled in the art also can do other variation in spirit of the present invention, and certainly, the variation that these are done according to spirit of the present invention, all should be included in the present invention's scope required for protection.
Claims (9)
1. an optical waveguide, it comprises substrate and is embedded at this suprabasil optical waveguide layer, this optical waveguide layer comprises the first side, the second side, the 3rd side, the 4th side and the first reflecting surface, this first side and this opposing setting in the second side and be parallel to each other, the 3rd side and the 4th opposing setting in side and be parallel to each other, the 3rd side is connected with this first side and forms one first obtuse angle, this first reflecting surface is between this second side and the 4th side and connect this second side and the 4th side, it is α 1 that this first reflecting surface is connected formed the first acute angle with this second side, this first obtuse angle is θ
1, α 1 and θ
1between meet α 1<(180 °-θ
1).
2. optical waveguide as claimed in claim 1, it is characterized in that: this optical waveguide layer also comprises the 5th side, the 6th side and the second reflecting surface, the 5th side and the 6th opposing setting in side and be parallel to each other, the 3rd side is between this first side and the 5th side, the 5th side is connected with the 3rd side and forms one second obtuse angle in junction, this second reflecting surface is between the 4th side and the 6th side and be connected the 4th side and the 6th side, it is α 2 that this second reflecting surface is connected the second become acute angle with the 4th side, this second obtuse angle is θ
2, α 2 and θ
2between meet α 2<(180 °-θ
2).
3. optical waveguide as claimed in claim 2, it is characterized in that: this α 1 equals this α 2.
4. optical waveguide as claimed in claim 2, it is characterized in that: this α 1 is not equal to this α 2.
5. the method for making of an optical waveguide as claimed in claim 1, it comprises the following steps:
One substrate is provided;
Surface-coated one deck light guide bed of material in this substrate;
Coating one deck photoresist layer on this light guide bed of material;
A light shield with the corresponding figure of optical waveguide layer as claimed in claim 1 is provided, and forms an etch stop layer after utilizing this light shield to this photoresist layer exposure imaging on this light guide bed of material;
This light guide bed of material that etching is not hidden by this etch stop layer;
Remove this etch stop layer, to obtain the optical waveguide layer corresponding with this light shield shape; And
This optical waveguide layer is spread in this substrate.
6. optical waveguide method for making as claimed in claim 5, it is characterized in that: this substrate comprises a flat-shaped substrate and is positioned at the ridge structure on this flat-shaped substrate, this ridge structure comprises first side, second side, the 3rd side, four side and joint face, the opposing setting in Yu Gai second side, this first side and being parallel to each other, the 3rd side and the opposing setting of this four side and be parallel to each other, the 3rd side is connected with this first side and forms one the 3rd obtuse angle, this joint face is between this second side and this four side and connect this second side and this four side, this joint face is connected the 3rd become acute angle with this second side be α 3, the 3rd obtuse angle is θ
3, α 3 and θ
3between meet α 3<(180 °-θ
3), and α 3=α 1, θ
3=θ
1.
7. optical waveguide method for making as claimed in claim 5, it is characterized in that: the material of this substrate is lithium niobate or niobic acid barium.
8. optical waveguide method for making as claimed in claim 5, it is characterized in that: the thickness of this optical waveguide layer is between 0.6～0.8um.
9. optical waveguide method for making as claimed in claim 5, it is characterized in that: the material of this optical waveguide layer is titanium, nickel, zinc, gallium or admiro.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012101777738A CN103454722A (en) | 2012-06-01 | 2012-06-01 | Optical waveguide and method for manufacturing same |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012101777738A CN103454722A (en) | 2012-06-01 | 2012-06-01 | Optical waveguide and method for manufacturing same |
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|---|---|
| CN103454722A true CN103454722A (en) | 2013-12-18 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2012101777738A Pending CN103454722A (en) | 2012-06-01 | 2012-06-01 | Optical waveguide and method for manufacturing same |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107688211A (en) * | 2016-08-04 | 2018-02-13 | 苏州旭创科技有限公司 | A kind of fiber waveguide device and preparation method thereof |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1331809A (en) * | 1998-12-23 | 2002-01-16 | 艾利森电话股份有限公司 | Device for reflecting light |
| EP1338904A1 (en) * | 2000-11-30 | 2003-08-27 | Matsushita Electric Industrial Co., Ltd. | Light waveguide and its manufacturing method |
| CN1727927A (en) * | 2004-07-29 | 2006-02-01 | 长兴化学工业股份有限公司 | Method for fabricating planar optical waveguide device |
| CN1808197A (en) * | 2004-12-10 | 2006-07-26 | 朗迅科技公司 | Waveguide turn for a waveguide circuit |
-
2012
- 2012-06-01 CN CN2012101777738A patent/CN103454722A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1331809A (en) * | 1998-12-23 | 2002-01-16 | 艾利森电话股份有限公司 | Device for reflecting light |
| EP1338904A1 (en) * | 2000-11-30 | 2003-08-27 | Matsushita Electric Industrial Co., Ltd. | Light waveguide and its manufacturing method |
| CN1727927A (en) * | 2004-07-29 | 2006-02-01 | 长兴化学工业股份有限公司 | Method for fabricating planar optical waveguide device |
| CN1808197A (en) * | 2004-12-10 | 2006-07-26 | 朗迅科技公司 | Waveguide turn for a waveguide circuit |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107688211A (en) * | 2016-08-04 | 2018-02-13 | 苏州旭创科技有限公司 | A kind of fiber waveguide device and preparation method thereof |
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Application publication date: 20131218 |
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