CN103383478A - Manufacture method of ridge type Y-branch optical waveguide structure - Google Patents
Manufacture method of ridge type Y-branch optical waveguide structure Download PDFInfo
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- CN103383478A CN103383478A CN 201210131596 CN201210131596A CN103383478A CN 103383478 A CN103383478 A CN 103383478A CN 201210131596 CN201210131596 CN 201210131596 CN 201210131596 A CN201210131596 A CN 201210131596A CN 103383478 A CN103383478 A CN 103383478A
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Abstract
The invention relates to a manufacture method of a ridge type Y-branch optical waveguide structure. The method comprises the steps that a base plate is provided, the base plate comprises a T-shaped ridge part and a flat part connected with the ridge part, and the flat part comprises a load plane; a light guiding layer covering the ridge part and the load plane is formed on the base plate; a light resistant layer is formed on the surface of the light guiding layer; a Y-shaped etching barrier layer is formed on the light guiding layer by carrying out exposure and development on the light resistant layer, the Y-shaped etching barrier layer comprises a barrier layer forfication structure, and the orthographic projection of the barrier layer forfication structure is located on the load plane; a Y-branch optical waveguide corresponding to the Y-shaped etching barrier layer is formed by etching the light guiding layer, and the Y-branch optical waveguide comprises an optical waveguide forfication structure located on the load plane; finally the Y-branch optical waveguide is formed in the base plate.
Description
Technical field
The present invention relates to the method for making of optical waveguide, especially relate to a kind of method for making of ridge y branch optical waveguide structure.
Background technology
In the optical communication networking, y branch optical waveguide structure (1 * 2 balanced-ridge type) is used to one road light signal is divided into two road light signals or two road light signals are merged into one road light signal.With a plurality of such y branch optical waveguide textural associations, can make 1 * 4 ... the branch waveguide structure of 1 * N structure.
At present, the conventional method of making this Y branching type optical waveguide structure is: first utilize wet etching to make a Y shape substrate, then form y branch optical waveguide on this Y shape substrate, this y branch optical waveguide diffuses in this Y shape substrate again.But, when wet etching is made this Y shape substrate, etching solution can be regional because being subjected to can't to enter this bifurcated acute angle under the affecting of surface tension in the bifurcated acute angle of Y shape photoresist layer zone (acute angle is less than 1 degree), so that produce the bifurcated sidewall of the incomplete Y shape substrate of etching, finally cause propagating when this Y branching type optical waveguide structure is applied in communication, easily produce great unexpected propagation loss.
Summary of the invention
In view of above-mentioned condition, be necessary to provide a kind of method for making of new ridge y branch optical waveguide structure.
A kind of preparation method of ridge y branch optical waveguide, it comprises: a ridge substrate is provided, plates the optical waveguide layer material at the whole face of substrate, and then evenly be coated with one deck photoresistance at the optical waveguide layer material surface; The employing light shield defines the pattern of y branch optical waveguide, to this photoresist layer etching;
High temperature diffusion, optical waveguide layer material can diffuse into y branch optical waveguide inside.
The present invention in Y branch's acute angle zone making ridge structure, does not namely keep the planar structure in acute angle zone, has reduced the loss of signal in acute angle zone, and the optical waveguide structure of making is smooth.This optical waveguide applications is at the optical communication network, and scattering loss is low, has guiding property preferably.
Description of drawings
Fig. 1-7th, the processing procedure schematic diagram of a kind of ridge y branch optical waveguide structure of the embodiment of the present invention.
The main element symbol description
| Ridge y branch |
100 | The 3rd flat part | 34 |
| The |
10 | |
40 |
| |
12 | |
50 |
| |
14 | |
60 |
| The tabular base plate | 20 | The Y shape |
62 |
| The first flat part | 22 | The restraining |
64 |
| The second flat part | 24 | |
70 |
| The etching shade | 30 | Y branch |
80 |
| The bar shaped part | 32 | The optical |
82 |
Following embodiment further illustrates the present invention in connection with above-mentioned accompanying drawing.
Embodiment
Please refer to the drawing 1-7, the method for making of a kind of ridge y branch optical waveguide structure 100 of embodiment of the present invention, it comprises step S1-S6.
Step S1: a substrate 10 is provided, sees also Fig. 2, this substrate 10 comprises T-shaped spine 12 and the par 16 that is connected with this spine 12, and this par 16 comprises load plane 14.
Wherein, the step of making substrate 10 is: as shown in Figure 1, provide a tabular base plate 20, the material of this tabular base plate 20 is lithium niobate or niobic acid barium.This tabular base plate 20 comprises the first flat part 22 and the second flat part 24 that is connected with this first flat part 22, adopt the method for exposure imaging to form etching shade 30 thereon on tabular base plate 20, wherein, the material of this etching shade 30 is chromium or silicon dioxide, this etching shade 30 comprises bar shaped part 32 and the 3rd flat part 34 that is connected with this shaped part 32, these the first flat part 22, the three flat parts 34 of this shaped part 32 cover parts cover this second flat part 24 fully.
This tabular base plate 20 of etching, wherein the zone of not etched shade 30 coverings will be etched, and this first flat part 22 of part can be etched herein, and the complete etching shade 30 that removes of etching obtains this substrate 10.Wherein etching etching solution used is by HF and HNO
3Mol ratio formed by 1:2, can reach the fastest etch-rate like this, wherein etching period is 3 hours.
Step S2: form on substrate 10 and cover spine 12 and this load plane 14 surface formation optical waveguide layers 40.See also Fig. 3, the thickness of optical waveguide layer 40 is between 0.6～0.8um; Wherein the material of this optical waveguide layer 40 is titanium, nickel, zinc, gallium or admiro.Preferably, select titanium as optical waveguide layer 40.In present embodiment, the method that forms this optical waveguide layer 40 on the surface of substrate 10 is electron beam evaporation deposition method or radio-frequency sputtering coating method.
Step S3: form one deck photoresist layer 50 on this optical waveguide layer 40 surfaces; See also Fig. 3.
Step S4: this photoresist layer 50 is exposed and develops to form Y shape etch stop layer 62 on this optical waveguide layer 40.See also Fig. 4-5, adopting light shield 60(present embodiment is light tight light shield) above-mentioned photoresist layer 50 is exposed, form Y shape etch stop layer 62 after developing on this photoresist layer 50.Wherein, this Y shape etch stop layer 62 comprises restraining barrier bifurcation structure 64, and the orthogonal projection of this restraining barrier bifurcation structure 64 is positioned on this load plane 14.
Step S5: this optical waveguide layer 40 of etching is to form the y branch optical waveguide 80 corresponding with this Y shape etch stop layer 62, and this y branch optical waveguide 80 comprises the optical waveguide bifurcation structure 82 that is positioned on this load plane 14.See also Fig. 5, wherein the Y shape optical waveguide layer below Y shape etch stop layer 62 can be not etched.After etching is complete, remove Y shape etch stop layer 62, obtain middle product 70 as shown in Figure 6.Wherein, etching etching solution used is HNO
3Etching optical waveguide layer 40 only herein, etching substrates 10.In general, be that to need the degree of depth of etching substrates be 3-4um V-arrangement acute angle zone in the part of Y branch light splitting, large with the thickness 0.6-0.8um diversity factor of optical waveguide layer.This shows that optical waveguide layer is than the easier etching in ridge acute angle district.Moreover optical waveguide layer is metallic bond, and the ridged substrate is covalent bond, and from the bond energy size, the metal bond energy is less than covalent bond energy, so optical waveguide layer is to be easier to the etched complete bifurcation structure that forms.
Step S6: this Y shape optical waveguide layer 80 is formed in this substrate.See also Fig. 6-7, to adopt the High temperature diffusion method that y branch optical waveguide 80 is formed in this substrate 10 in present embodiment: body 70 is put into the diffusion that high temperature furnace carries out the optical waveguide layer material, y branch optical waveguide 80 can diffuse in ridge substrate 10, form optical waveguide in order to the index distribution that changes crystal, thereby obtain ridge y branch optical waveguide structure 100 as shown in Figure 7.Wherein, the temperature of high temperature furnace is 1020 ℃, and the time is 4～8 hours.In other embodiments, can adopt proton exchange that y branch optical waveguide 80 is formed in substrate 10.
In sum, the method for making of ridge y branch optical waveguide structure 100 of the present invention need not be made the Y shape substrate, namely keeps the planar structure (being par 16) of substrate 10, has eliminated the unexpected propagation loss that produces because making the Y shape substrate.This optical waveguide structure 100 is applied in the optical communication network, and scattering loss is low, has guiding property preferably.
In addition, those skilled in the art also can do other variation in spirit of the present invention, and certainly, the variation that these are done according to spirit of the present invention all should be included in the present invention's scope required for protection.
Claims (8)
1. the method for making of a ridge y branch optical waveguide structure, it comprises:
One substrate is provided, and this substrate comprises T-shaped spine and the par that is connected with this spine, and this par comprises load plane;
Form the optical waveguide layer that covers this spine and this load plane on this substrate;
Form photoresist layer on this optical waveguide layer surface;
This photoresist layer is exposed and develops to form the Y shape etch stop layer on this optical waveguide layer, and this Y shape etch stop layer comprises the restraining barrier bifurcation structure, and the orthogonal projection of this restraining barrier bifurcation structure is positioned on this load plane;
This optical waveguide layer of etching is to form the y branch optical waveguide y branch optical waveguide corresponding with this Y shape etch stop layer, and this y branch optical waveguide comprises the optical waveguide bifurcation structure that is positioned on this load plane; And
This y branch optical waveguide is formed in this substrate.
2. the method for making of ridge y branch optical waveguide structure as claimed in claim 1, it is characterized in that: the method that forms this optical waveguide layer on the surface of this substrate is electron beam evaporation deposition method or radio-frequency sputtering coating method.
3. the method for making of ridge y branch optical waveguide structure as claimed in claim 1, it is characterized in that: this substrate is lithium niobate or niobic acid barium substrate.
4. the method for making of ridge y branch optical waveguide structure as claimed in claim 1, it is characterized in that: the thickness of this optical waveguide layer is between 0.6～0.8um.
5. the method for making of ridge y branch optical waveguide structure as claimed in claim 1, it is characterized in that: the material of this optical waveguide layer is titanium, nickel, zinc, gallium or admiro.
6. the method for making of ridge y branch optical waveguide structure as claimed in claim 1, wherein: provide the step of this substrate to comprise:
Form the etching shade on the tabular base plate, this tabular base plate comprises the first flat part and the second flat part that is connected with this first flat part, this etching shade comprises bar shaped part and the 3rd flat part that is connected with this shaped part, this first flat part of this shaped part cover part, the 3rd flat part covers this second flat part fully; And
Thereby this tabular base plate of etching obtains this substrate so that this spine of this first flat part formation T shape and this second flat part form this par.
7. the method for making of ridge y branch optical waveguide structure as claimed in claim 1 is characterized in that: this tabular base plate of etching etching solution used is by HF and HNO
3Form.
8. the method for making of ridge y branch optical waveguide structure as claimed in claim 1, it is characterized in that: the material of this etching shade is chromium or silicon dioxide.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201210131596 CN103383478A (en) | 2012-05-02 | 2012-05-02 | Manufacture method of ridge type Y-branch optical waveguide structure |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201210131596 CN103383478A (en) | 2012-05-02 | 2012-05-02 | Manufacture method of ridge type Y-branch optical waveguide structure |
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| Publication Number | Publication Date |
|---|---|
| CN103383478A true CN103383478A (en) | 2013-11-06 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN 201210131596 Pending CN103383478A (en) | 2012-05-02 | 2012-05-02 | Manufacture method of ridge type Y-branch optical waveguide structure |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103869415A (en) * | 2012-12-17 | 2014-06-18 | 鸿富锦精密工业（深圳）有限公司 | Manufacturing method for ridge optical waveguide |
| CN104678494A (en) * | 2013-11-28 | 2015-06-03 | 日本碍子株式会社 | Optical waveguide devices |
-
2012
- 2012-05-02 CN CN 201210131596 patent/CN103383478A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103869415A (en) * | 2012-12-17 | 2014-06-18 | 鸿富锦精密工业（深圳）有限公司 | Manufacturing method for ridge optical waveguide |
| CN104678494A (en) * | 2013-11-28 | 2015-06-03 | 日本碍子株式会社 | Optical waveguide devices |
| CN104678494B (en) * | 2013-11-28 | 2019-05-21 | 日本碍子株式会社 | Fiber waveguide device |
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Application publication date: 20131106 |