CN103441087B - method for manufacturing flexible substrate - Google Patents

method for manufacturing flexible substrate Download PDF

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Publication number
CN103441087B
CN103441087B CN201310244253.9A CN201310244253A CN103441087B CN 103441087 B CN103441087 B CN 103441087B CN 201310244253 A CN201310244253 A CN 201310244253A CN 103441087 B CN103441087 B CN 103441087B
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China
Prior art keywords
base plate
polymeric layer
cover body
flexible substrate
hole
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CN201310244253.9A
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CN103441087A (en
Inventor
张耿志
吕佳苹
李文晖
廖启钧
李定忠
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AU Optronics Corp
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AU Optronics Corp
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Priority to CN201610075960.3A priority Critical patent/CN105575857B/en
Publication of CN103441087A publication Critical patent/CN103441087A/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Perforating, Stamping-Out Or Severing By Means Other Than Cutting (AREA)
  • Laminated Bodies (AREA)
  • Electroluminescent Light Sources (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

A method for manufacturing a flexible substrate includes: providing a bottom plate with a polymer layer, wherein the bottom plate is provided with a through hole, and the polymer layer is positioned on the bottom plate and covers the through hole; providing a first cover body covering the polymer layer; and providing a gas, wherein the gas flows into the space between the polymer layer and the bottom plate from the through hole, so that the polymer layer is separated from the bottom plate.

Description

The method making flexible substrate
Technical field
This case about a kind of method making substrate and device thereof, a kind of method making flexible substrate and Device.
Background technology
The characteristic of flexible substrate deflection so that display is no longer limited to the design of plane, and can have diversification Exterior design.And flexible substrate is lightweight, thickness is thin, the most broken and impact-resistant characteristic, then it is applicable to mobile electricity In the portable products such as words, personal digital assistant (Personal Digital Assistant, PDA) or notebook computer.Remove Outside this, use flexible substrate to manufacture flexible display and also there is the advantage of manufacturing cost.Therefore replace with flexible base plate Glass substrate has become the new trend of current flat-panel screens technology development.
In the middle of the process making flexible substrate, it usually needs flexible substrate is configured on the base plate of a hard, Again flexible substrate is carried out all kinds of technique.Such as, flexible substrate carries out film-forming process, or at flexible substrate Upper manufacture thin film transistor (TFT).It is said that in general, this typically requires use one temporary sticker, flexible substrate is bonded in firmly To be processed on the base plate of matter, then by physical method or chemical method, flexible substrate is peeled off from base plate.
For use physical method by flexible substrate from the mode that base plate is peeled off for, if direct by flexible substrate Peel off from base plate, then easily cause the fracture of circuit on substrate because the angle peeled off is excessive.If by roller bearing through flexible Between formula substrate and base plate, by the way of roller bearing rolls between flexible substrate and base plate, flexible substrate is shelled from base plate From, then may be by the surface scratches of flexible substrate.
On the other hand, a kind of method flexible substrate peeled off from base plate by high temperature laser or irradiation.This It is that flexible substrate is attached on base plate by an adhesion coating, in the completed after continuous processing, by high temperature laser or photograph The mode of the bond (debonding) between light removal adhesion coating and base plate removes the viscosity of adhesion coating, so as to completing Flexible substrate from base plate depart from.This kind of method needs to use expensive laser or irradiation to remove bond equipment, and the longest And effect is limited.If the viscosity of adhesion coating is too strong, by flexible substrate during base plate takes off, it is also possible to infringement Precision element on flexible substrate.
For make chemically by flexible substrate from the mode that base plate is peeled off for, then need consider base material anti-corrosion Property, this can increase again the complexity in flexible base plate design, and further increase the production cost of flexible base plate.Separately On the one hand, the chemical agent used again may be to environment.
Therefore, how to design a kind of method making flexible substrate and device thereof, to solve in prior art, bendable Substrate is difficult to the problem peeled off from base plate, just becomes the problem that designer needs to solve.
Summary of the invention
In view of the above problems, the present invention is about a kind of method making flexible substrate and device thereof, so as to solving The problem that in prior art, flexible substrate is difficult to peel off from base plate.
For reaching above-mentioned purpose, the present invention provides a kind of method making flexible substrate, and its step includes: provides and has One base plate of one polymeric layer, wherein this base plate has pass through aperture, and this polymeric layer is positioned on this base plate and covers this and runs through Hole;One first cover body is provided to be covered on this polymeric layer;And a gas is provided, this gas flows in this from this through hole and gathers Between compound layer and this base plate, and then this polymeric layer is made to separate with this base plate.
For reaching above-mentioned purpose, the present invention provides a kind of method making flexible substrate, it is provided that the step bag of this gas Include: one second cover body is configured on this base plate, so that this base plate is between this polymeric layer and this second cover body, and make This through hole is positioned in the range of this second cover body covered;And this gas is sent between this second cover body and this base plate.
For reaching above-mentioned purpose, the present invention provides a kind of method making flexible substrate, further includes: provide this first cover Before body is covered on this polymeric layer, form a line layer on this polymeric layer.
For reaching above-mentioned purpose, the present invention provides a kind of method making flexible substrate, further includes: form this polymer After layer is on this base plate, this polymeric layer of through part, make this through hole run through this base plate and this polymeric layer.
For reaching above-mentioned purpose, the present invention provides a kind of method making flexible substrate, further includes: through part this gather After compound layer, it is provided that a laminating layer fits on this polymeric layer, and cover this through hole.
For reaching above-mentioned purpose, the present invention provides a kind of method making flexible substrate, in this polymeric layer of this formation Step on this base plate, partly this polymeric layer inserts this through hole.
For reaching above-mentioned purpose, the present invention provides a kind of method making flexible substrate, further includes: provide this gas it Before, it is provided that a microscope carrier is arranged under this base plate, and this microscope carrier has a thimble;This thimble is stretched into this through hole and withstands this and gather Compound layer, makes this polymeric layer separate with this bottom parts;And remove this thimble.
For reaching above-mentioned purpose, the present invention provides a kind of method making flexible substrate, further includes in forming this polymerization This through hole is closed before nitride layer.
For reaching above-mentioned purpose, the present invention provides a kind of device for making flexible substrate, comprising: a base plate, Having pass through aperture, this through hole has two the first relative ports and one second port, and this base plate has a conformable region, should Second port is positioned at this conformable region;One blowning installation, has a puff prot, and this puff prot is connected with this first port;And One first cover body, is configured on this conformable region, and this first cover body is around this second port.
For reaching above-mentioned purpose, the present invention provides a kind of device for making flexible substrate, further includes a microscope carrier and sets Being placed under this base plate, this microscope carrier has a thimble, and this thimble is to should through hole.
For reaching above-mentioned purpose, the present invention provides a kind of device for making flexible substrate, further includes one and may move Mechanism, is positioned at the side of this base plate, and this movable mechanism has a fixture.
The method making flexible substrate provided according to embodiments of the present invention and device thereof, be passed through gas by then passing through Body flows through between polymeric layer and base plate, to be separated with base plate by polymeric layer.Therefore polymeric layer can be avoided to separate with base plate Time, on polymeric layer, fracture or the polymer layer surface of circuit damage.Further, by adjusting the size of base plate through hole, number Mesh and the pressure of injection gas and flow, can regulate and control the disengaging time needed for polymeric layer and base plate.Therefore it is able to simpler Singlely polymeric layer is separated from base plate, and solve the problem that flexible substrate in prior art is difficult to peel off from base plate.
The above explanation about present invention and the explanation of following embodiment are in order to demonstrate and to explain the present invention Principle, and provide the patent claim of the present invention further to explain.
Accompanying drawing explanation
Figure 1A is the side view according to the device making flexible substrate disclosed by one embodiment of the invention;
Figure 1B is the side view according to the device making flexible substrate disclosed by another embodiment of the present invention;
Fig. 1 C is the side view according to the device making flexible substrate disclosed by another embodiment of the present invention;
Fig. 1 D is the side view according to the device making flexible substrate disclosed by another embodiment of the present invention;
Fig. 1 E is the side view according to the device making flexible substrate disclosed by one embodiment of the invention;
Fig. 2 is the flow chart according to the method making flexible substrate disclosed by one embodiment of the invention;
Fig. 3 A to Fig. 3 F is the structural side view of step S101 to S106 in difference corresponding diagram 2;
Fig. 3 G is the top view of Fig. 3 F;
Fig. 3 H is the structural side view of step S107 in corresponding diagram 2;
Fig. 3 I is the flexible substrate that completes of the flow process according to Fig. 2 and the structural side view of base plate thereof;
Fig. 4 is the flow chart according to the method making flexible substrate disclosed by another embodiment of the present invention;
Fig. 5 A to Fig. 5 D is the structural side view of step S201 to S204 in difference corresponding diagram 4;
Fig. 5 E is the top view of Fig. 5 D;
Fig. 5 F to Fig. 5 H is the structural side view of step S205 to S207 in difference corresponding diagram 4;
Fig. 5 I is the flexible substrate that completes of the flow process according to Fig. 4 and the structural side view of base plate thereof;
Fig. 6 A is the side view according to the device making flexible substrate disclosed by one embodiment of the invention;
Fig. 6 B is the side view according to the device making flexible substrate disclosed by another embodiment of the present invention;
Fig. 7 is the flow chart according to the method making flexible substrate disclosed by another embodiment of the present invention;
Fig. 8 A to Fig. 8 K is the structural side view of step S301 to S311 in difference corresponding diagram 7;
Fig. 8 L is the flexible substrate that completes of the flow process according to Fig. 7 and the structural side view of base plate thereof;
Fig. 9 A is the flow chart according to the method making flexible substrate disclosed by another embodiment of the present invention;
Fig. 9 B is the structural side view of step S402 in corresponding diagram 9A;
Fig. 9 C is the flexible substrate that completes of the flow process according to Fig. 9 A and the structural side view of base plate thereof.Wherein, attached Figure mark:
10,10a~10d makes the device of flexible substrate
11 base plates 111,111a through hole
1111,1111a the first port 1112,1112a the second port
112 conformable region 12 blowning installations
121 puff prot 13 first cover bodies
131 first perforate 14 air extractors
141 bleeding point 15 second cover bodies
151 second perforate 16 movable mechanisms
161 fixture 20 polymeric layers
30 line layer 40 laminating layers
50 device 51 base plates making flexible substrate
511 plate body 5,111 first openings
512 release layer 5,121 second openings
513 through hole 5,131 first ports
5132 second port 514 conformable regions
52 blowning installation 521 puff prots
53 first cover body 531 first perforates
54 air extractor 541 bleeding points
55 second cover body 551 second perforates
56 microscope carrier 561,561 ' first thimbles
562,562 ' second thimble 60 polymeric layer
70 line layer 80 laminating layers
Detailed description of the invention
Hereinafter describing detailed features and the advantage of the present invention the most in detail, its content be enough to make any ability Field technique personnel understand the technology contents of the present invention and implement according to this, and according to the content disclosed by this specification, apply for a patent Scope and accompanying drawing, purpose that any present invention of skilled person readily understands that is correlated with and advantage.Below example Further describe the viewpoint of the present invention, but non-to limit scope of the invention anyways.
In the following description, the first, second, third, etc. wording used be distinguish different elements in accompanying drawing, Composition, region.These wordings also are not used to limit element, composition, region.It is to say, without departing from the present invention spirit and In the range of, the first element of being described, the first composition, first area can also be the second element, the second composition, second area.
First, referring to Figure 1A, Figure 1A is according to the device making flexible substrate disclosed by one embodiment of the invention Side view.Make the device 10 of flexible substrate, including base plate 11, blowning installation 12 and the first cover body 13.
Base plate 11 has the pass through aperture 111 running through base plate 11.Through hole 111 have the first relative port 1111 and Second port 1112, lays respectively at the opposite sides of through hole 111.Base plate 11 has a conformable region 112.Second port 1112 In conformable region 112, and the first port 1111 is positioned at the base plate 11 side in contrast to conformable region 112.
Blowning installation 12 has a puff prot 121, corresponding to the first port 1111.Specifically, blowning installation 12 can wrap A feeder containing the steel cylinder being such as filled with gas.By puff prot 121 being connected to the first port 1111, air blowing can be made Gas in device 12 sequentially by puff prot the 121, first port 1111 and the second port 1112 flow into the first cover body 13 with Between base plate 11.
First cover body 13 is configured at the conformable region 112 of base plate 11 in a detachable fashion, and the first cover body 13 is around Two-port netwerk 1112.It is to say, the first cover body 13 orthographic projection covers the second port of through hole 111 in the region of base plate 11 1112。
Then referring to Figure 1B, Figure 1B is according to the device making flexible substrate disclosed by another embodiment of the present invention Side view.Owing to the embodiment of Figure 1B and the embodiment of Figure 1A are similar, the most identical label represents the enforcement with Figure 1A The same or similar element of example, therefore explains just for difference.
In the embodiment of Figure 1B, make flexible substrate device 10a also comprise the first cover body 13, air extractor 14, Second cover body 15 and movable mechanism 16, the first cover body 13 has the first perforate 131, and air extractor 14 has bleeding point 141. Specifically, air extractor 14 such as can comprise an aspiration pump, opens by bleeding point 141 is connected to the first of the first cover body 13 Hole 131, outside the gas between the first cover body 13 and base plate 11 can being drawn out of the first cover body 13 via the first perforate 131, The side making base plate 11 have the second port 1112 produces negative pressure.
Second cover body 15 is configured at the base plate 11 side in contrast to the first cover body 13, and the second cover in a detachable fashion Body 15 is around the first port 1111.It is to say, the second cover body 15 orthographic projection covers through hole 111 in the region of base plate 11 First port 1111.Wherein, the second cover body 15 has the second perforate 151.Connect the puff prot 121 of blowning installation 12, can make to blow Gas in device of air 12 flows between the second cover body 15 and base plate 11, and the side making base plate 11 have the first port 1111 is just producing Pressure, and then make the opposite sides of base plate 11 produce pressure differential.
Movable mechanism 16 is arranged at the side of base plate 11.Specifically, to be arranged at base plate 11 close for movable mechanism 16 The side of the second port 1112, and movable mechanism 16 has a fixture 161.Movable mechanism 16 can make fixture 161 end of towards Plate 11 moves or makes fixture 161 away from base plate 11.Wherein, movable mechanism 16 such as can comprise a mechanical arm.
It is noted that air extractor the 14, second cover body 15 and movable mechanism 16 are not used to limit the present invention.Please join Read Fig. 1 C to Fig. 1 E, Fig. 1 C to Fig. 1 E to be respectively according to the device making flexible substrate disclosed by other embodiments of the invention Side view.In the embodiment of Fig. 1 C, the device 10b making flexible substrate can not comprise air extractor 14, and only leads to Crossing blowning installation 12 makes the both sides of base plate 11 produce pressure differential (as shown in Figure 1 C).In the embodiment of Fig. 1 D, make bendable The device 10c of substrate can not comprise the second cover body 15, and makes the puff prot 121 of blowning installation 12 be directly connected in the first port 1111 (as shown in figure ip).In the embodiment of Fig. 1 E, the device 10d making flexible substrate can not comprise movable mechanism 16 (as referring to figure 1e).
Then the device 10a making flexible substrate how using Figure 1B will be introduced to make flexible substrate.Please be same Time refering to Figure 1B, Fig. 2 and Fig. 3 A to Fig. 3 I.Fig. 2 is according to the making flexible substrate disclosed by one embodiment of the invention The flow chart of method, Fig. 3 A to Fig. 3 F is the structural side view of step S101 to S106 in difference corresponding diagram 2, and Fig. 3 G is Fig. 3 F's Top view, Fig. 3 H is the structural side view of step S107 in corresponding diagram 2, Fig. 3 I be the flow process according to Fig. 2 complete flexible Formula substrate and the structural side view of base plate thereof.
First, it is provided that a base plate 11, a polymeric layer 20 (S101) (as shown in Figure 3A) and is formed on base plate 11.The end Plate 11 is such as but not limited to a glass baseplate, and polymeric layer 20 is in order to make a flexible substrate.Wherein, polymeric layer 20 Material for example, Merlon (polycarbonate, PC), polyimides (polyimide, PI), polyether sulfone (polyether Sulfone, PES), polyacrylate (poly acrylate, PAR), PEN (polyethylene Naphthalate, PEN), polyethylene terephthalate (polyethylene terephthalate, PET), noncrystalline Type TPO (amorphous polyolefine, APO), cyclic olefine copolymer (MetallocenebasedCyclicOlefinCopolymer, mCOC), polymethyl methacrylate (Polymethacrylate, PMMA) or organic/inorganic composite material.In the present embodiment, the thickness of base plate 11 between 10~ 800 microns (micrometer, μm).In other embodiments of part, the thickness of base plate 11 is between 50~500 microns.In part In other embodiments, the thickness of base plate 11 is between 100~250 microns.Wherein, the flexibility of polymeric layer 20 scratching more than base plate 11 Property.
In the present embodiment and other embodiments of part, it is such as to utilize rotary coating (spin coating), slit Coating or scraper plate are smeared the mode of (blade coating) and are formed the polymer of one layer of liquid at base plate 11, then pass through natural wind Dry or heated baking mode makes polymer be solidified to form in the surface of base plate 11.In other embodiments of part, can be straight Connect and a polymer is attached at base plate 11.Specifically, in the way of laminating or coating, a release layer can be formed (not at base plate 11 Illustrate) after, then a polymer is attached at base plate 11 forms polymeric layer 20, and made polymeric layer 20 attach by release layer In base plate 11, make polymeric layer 20 have good release effect, and good release effect refers to when release layer and another base After material contact, it is difficult to stick with another base material and there is good separating effect.Wherein, the material of a release layer for example, silicon is high Molecule (for example, siloxane polymer), an organic polymer (for example, polyethylene, polyvinyl chloride, polymethyl methacrylate, Polyethylene terephthalate), a metal (for example, gold, silver, copper, chromium, alloy) or above-mentioned composite, and release Layer can be liquid or solid-state.In order to avoid the viscosity between base plate 11 and polymeric layer 20 is too strong, and cause follow-up Process separates the difficulty of base plate 11 and polymeric layer 20, after forming release layer, it be also possible to use ultraviolet light or laser comes Irradiate release layer, so as to reducing the viscosity of release layer.Furthermore, it is understood that the viscosity between release layer and base plate 11 is more than release layer And the viscosity between polymeric layer 20.Consequently, it is possible to polymeric layer 20 can be made to be attached at base plate 11 and be not result in base plate 11 It is difficult to separate with polymeric layer 20.Additionally, the size of polymeric layer 20 can affect polymeric layer 20 separates institute with base plate 11 The time needed.It is said that in general, the area of polymeric layer 20 is the biggest, need the time more grown to separate with base plate 11.
Then, forming the pass through aperture 111 (S102) running through base plate 11 on base plate 11, wherein, through hole 111 does not pass through Wear polymeric layer 20 (as shown in Figure 3 B).Through hole 111 has the first port 1111 and relatively relative to base plate 11 side The second port 1112 in polymeric layer 20 side.In the present embodiment and other embodiments of part, it is to pass through abnormity cutting The mode of (Abnormity Cutting) gets out through hole 111 on base plate 11, but forms the mode of through hole 111 not In order to limit the present invention.Wherein, the quantity of above-mentioned through hole 111 and position, all can make more according to actual demand in time implementing Change.Such as, pass through aperture can be offered respectively at the dual-side of base plate 11, or offer respectively always in four corners of base plate 11 Perforation.It is said that in general, the quantity of through hole 111 is the most, it is the shortest that polymeric layer 20 separates the required time with base plate 11.
Then, in the present embodiment and other embodiments of part, a line layer 30 can also be formed on polymeric layer 20 (S103) (as shown in Figure 3 C).Wherein, line layer 30 includes a transparent electrode arrays, using the circuit as flexible substrate, and Through hole 111 is positioned at outside transparent electrode arrays.Form the technique of line layer 30 such as but not limited to a thin film transistor (TFT) technique (Thin Film Transistors, TFT).It is not limited to it is noted that form line layer 30 on polymeric layer 20 The present invention.
Then, one first cover body 13 is configured at (S104) on polymeric layer 20.Wherein, the first cover body 13 has and runs through One first perforate 131 (as shown in Figure 3 D) of one cover body 13.Whereby, polymeric layer 20 is made to be clipped in the first cover body 13 and base plate 11 Between, and the second port 1112 be positioned at first cover body 13 institute around in the range of.It is to say, the first cover body 13 orthographic projection exists The region of base plate 11 covers the second port 1112 of through hole 111.By the first cover body 13 is configured on polymeric layer 20, And making to define between polymeric layer 20 and the first cover body 13 one first space S 1, the first space S 1 is connected with through hole 111 Logical.
In the present embodiment and other embodiments of part, also one second cover body 15 can be configured at (S105) on base plate 11. Wherein, the second cover body 15 has one second perforate 151 (as shown in FIGURE 3 E) running through the second cover body 15.Whereby, base plate 11 is made to be situated between Between polymeric layer 20 and the second cover body 15, and the first port 1111 be positioned at second cover body 15 institute around in the range of. It is to say, the second cover body 15 orthographic projection covers the first port 1111 of through hole 111 in the region of base plate 11.And base plate 11 And define a second space S2, second space S2 between the second cover body 15 to be connected with through hole 111 and the second perforate 151 Logical.
It is noted that in the present embodiment and other embodiments of part, be first the first cover body 13 to be configured at polymer Layer 20, then the second cover body 15 is configured at base plate 11.In other embodiments of part, it is also possible to first the second cover body 15 is configured at Base plate 11, then the first cover body 13 is configured at polymeric layer 20.First cover body 13 is configured at polymeric layer 20 and by second Cover body 15 is configured at the sequencing of base plate 11 and is not limited to the present invention.If additionally, the making of use Figure 1A, Fig. 1 D can Scratch the device of formula substrate to make flexible substrate, then can install the second cover body 15 to make flexible substrate.
Finally, a gas (S106) (as illustrated in Figure 3 F) is inputted from through hole 111.Wherein, gas and base plate 11, polymer Being difficult to react between layer 20, gas for example, air, nitrogen or argon gas, the kind of gas is not limited to this Bright.Specifically, by such as one blowning installation 12, second perforate 151 is blown into gas, makes gas flow along a path A. See also Fig. 3 G, polymeric layer 20 can be pushed down due to the first cover body 13 and make gas flow along such as X-direction, and will not In making gas concentrate at the second port 1112, cause gas pressure excessive and cause polymeric layer 20 broken hole.On the other hand, by It is configured at base plate 11 in the second cover body 15, and the second cover body 15 is around the first port 1111 of through hole 111, thus the second cover Body 15 can avoid gas, and before entering through hole 111, i.e. via the gap between the second cover body 15 and base plate 11, loss goes out second Outside cover body 15.
By blowning installation 12, second perforate 151 being blown into gas, after making gas flow along path A, gas can edge Path A and enter second space S2 via the second perforate 151, and flow into through hole 111 via the first port 1111, then via Second port 1112 and flow between polymeric layer 20 and base plate 11.Owing to blowning installation 12 is blown into gas to the second perforate 151 Body and make second space S2 produce malleation, make the opposite sides of polymeric layer 20 produce pressure differential, so make polymeric layer 20 with Base plate 11 is separated.Specifically, the pressure differential that gas makes polymeric layer 20 both sides produce is the biggest, polymeric layer 20 and base plate 11 Time needed for separation is the shortest.
In order to improve the separative efficiency of polymeric layer 20 with base plate 11, in the present embodiment and other embodiments of part, The first space S 1 also can be made to form the space of a tool negative pressure.Specifically, can be by such as one air extractor 14 from the first perforate 131 extract a gas out, make gas be pulled out along a path B from the first space S 1.Owing to the first cover body 13 is configured at polymerization In nitride layer 20, and the first cover body 13 is around the second port 1112 of through hole 111.Therefore, gas is mainly along path B warp It is pulled out from the first space S 1 by the first perforate 131, and makes polymeric layer 20 away from the side of base plate 11 (that is relative to poly- Compound layer 20 is near the side of base plate 11) produce negative pressure.The effect of a separation of polymeric nitride layer 20 and base plate 11 can be further added by whereby Power, and then improve the separative efficiency of polymeric layer 20 with base plate 11.
Additionally, due to the first cover body 13 can push down polymeric layer 20, thus enter polymeric layer at gas from through hole 111 Time between 20 and base plate 11, gas is evenly into polymeric layer 20 and base plate 11, rather than only concentrates via specific side Flow out between auto polymerization nitride layer 20 and base plate 11 to (such as direction X).If gas is only concentrated via specific direction Gap between auto polymerization nitride layer 20 and base plate 11 is flowed out, and this can make to only have between polymeric layer 20 and base plate 11 part point From, that is the polymeric layer 20 of part remains adhered on base plate 11, thus separating effect is the best.In the present embodiment, due to gas Body, evenly into the gap between polymeric layer 20 and base plate 11, therefore leaves polymeric layer 20 and base plate 11 when gas Between gap time, polymeric layer 20 can be kept completely separate by gas equably with base plate 11.On the other hand, due to the first cover body 13 Around the second port 1112 of through hole 111, therefore flow between polymeric layer 20 and base plate 11 when gas, cause polymeric layer 20 towards the first cover body 13 heave time, the first cover body 13 also can limit the height that polymeric layer 20 is heaved, to guarantee polymeric layer 20 Quality after separating with base plate 11.Furthermore, the distance between the first cover body 13 and polymeric layer 20 can be shortened by D1 (as illustrated in Figure 3 F) and reduce the height that polymeric layer 20 is heaved.
In the present embodiment and other embodiments of part, it is also possible to by movable mechanism 16 by polymeric layer 20 and the end Plate 11 separates.Specifically, first remove first cover body the 13, second cover body 15, then make fixture 161 move by movable mechanism 16 Move above base plate 11, make fixture 161 clamp the edge (S107) of the polymeric layer 20 having disengaged from base plate 11 surface (such as Fig. 3 H institute Show).Wherein, fixture 161 can be controlled by movable mechanism 16 move towards base plate 11 or make fixture 161 away from base plate 11 Speed, and then control fixture 161 make polymeric layer separate applied strength with base plate 11, to avoid polymeric layer 20 and the end Polymeric layer 20 is destroyed because the strength applied is excessive when plate 11 separates.The automatic of fixture 161 is made by movable mechanism 16 Equalization clamps the edge of the polymeric layer 20 having disengaged from base plate 11 surface, can improve polymeric layer 20 and base plate 11 again Separative efficiency, and then promote the efficiency manufacturing flexible substrate.
In the present embodiment, polymeric layer 20 is separated the required time less than 10 seconds with base plate 11, at section Example In, the time needed for separation is less than 5 seconds.Further, the pressure differential between the first cover body 13 and the second cover body 15 is 0.01 torr (torr) is between 1000 torr, and is passed through the speed of gas between 0.01 ml/min (mL/min) to 100 milli from blowning installation Between liter/min, and needed for the gas that is passed through less than 10 milliliters.For the substrate of 65, it is only necessary to use less than 10 milliliters Gas can make polymeric layer 20 separate with base plate 11 in 10 seconds.
Then, after polymeric layer 20 separates with base plate 11, then make fixture 161 away from base plate by movable mechanism 16 11, can complete flexible substrate prepares (as shown in fig. 31).
Next referring to Figure 1B, Fig. 4 and Fig. 5 A to Fig. 5 I, Fig. 4 is according to the system disclosed by another embodiment of the present invention Making the flow chart of the method for flexible substrate, Fig. 5 A to Fig. 5 D is that the structure side of step S201 to S204 regards in corresponding diagram 4 respectively Figure, Fig. 5 E is the top view of Fig. 5 D, and Fig. 5 F to Fig. 5 H is the structural side view of step S205 to S207, figure in difference corresponding diagram 4 5I is the flexible substrate that completes of the flow process according to Fig. 4 and the structural side view of base plate thereof.Due to Fig. 4 and Fig. 5 A to Fig. 5 I Embodiment similar to the embodiment of Fig. 2, Fig. 3 A to Fig. 3 H, the most identical label represents and the reality of Fig. 2, Fig. 3 A to Fig. 3 H Execute the same or similar element of example, therefore explain just for different places.
First, it is provided that a base plate 11, a polymeric layer 20 (S201) (as shown in Figure 5A) and is formed on base plate 11.Its In, the flexibility of polymeric layer 20 is more than the flexibility of base plate 11.
Then, on base plate 11, formation runs through the pass through aperture 111a (S202) of base plate 11.Wherein, through hole 111a runs through Base plate 11 and polymeric layer 20.Through hole 111a have relative to base plate 11 side one first port 1111a and relative to One second port 1112a (as shown in Figure 5 B) of polymeric layer 20 side.It is noted that through hole 111a should avoid polymer Layer 20 makes the viewing area after flexible substrate, after avoiding polymeric layer 20 is made flexible substrate, flexible substrate Zhong You subregion, viewing area cannot perform the function of display.
Then, a laminating layer 40 is configured at (S203) on polymeric layer 20.Specifically, laminating layer 40 is fitted and is covered Live in the through hole 111a the second port 1112a (as shown in Figure 5 C) relative to polymeric layer 20 side.The present embodiment and part its In his embodiment, laminating layer 40 is an adhesive tape or a baffle plate, but is not limited to this.
Then, in the present embodiment and other embodiments of part, a line layer 30 can also be formed on polymeric layer 20 (S204) (as shown in Figure 5 D).Wherein, line layer 30 includes a transparent electrode arrays, using the circuit as flexible substrate, and Outside through hole 111a is positioned at transparent electrode arrays (as shown in fig. 5e).The technique forming line layer 30 is thin such as but not limited to one Film transistor technique.It is noted that form line layer 30 on polymeric layer 20 to be not limited to the present invention.
Then, one first cover body 13 is configured at polymeric layer 20 (S205).Wherein, the first cover body 13 has and runs through first One first perforate 131 (as illustrated in figure 5f) of cover body 13.Whereby, polymeric layer 20 is clipped in the first cover body 13 and base plate 11 it Between, and the second port 1112a of the through hole 111a covered by laminating layer 40 be positioned at first cover body 13 institute around in the range of. It is to say, the first cover body 13 orthographic projection covers the second port 1112a of through hole 111a in the region of base plate 11.By inciting somebody to action First cover body 13 is configured on polymeric layer 20, and makes to define one first space between polymeric layer 20 and the first cover body 13 S1 ', the first space S 1 ' is connected with the first perforate 131.
In the present embodiment and other embodiments of part, also one second cover body 15 can be configured at base plate 11 (S206).Its In, the second cover body 15 has one second perforate 151 (as depicted in fig. 5g) running through the second cover body 15.Whereby, make base plate 11 between Between polymeric layer 20 and the second cover body 15, and the first port 1111a of through hole 111a is positioned at the second cover body 15 and is enclosed In the range of around.It is to say, the second cover body 15 orthographic projection covers first port of through hole 111a in the region of base plate 11 1111a.And define a second space S2 ' between base plate 11 and the second cover body 15, second space S2 ' and through hole 111a and Second perforate 151 is connected.
It is noted that in the present embodiment and other embodiments of part, be first laminating layer 40 to be configured at polymeric layer 20, then the first cover body 13 is configured at polymeric layer 20, then the second cover body 15 is configured at base plate 11.But, by laminating layer 40 It is configured at polymeric layer 20, the second cover body 15 is configured at the sequencing of base plate 11 and the first cover body 13 is configured at polymerization Nitride layer 20, the sequencing that the second cover body 15 is configured at base plate 11 are not limited to the present invention.It is to say, part its In his embodiment, first the second cover body 15 can be configured at base plate 11, then laminating layer 40 is configured at polymeric layer 20, then by One cover body 13 is configured at polymeric layer 20.
Finally, a gas (S207) (as illustrated in fig. 5h) is inputted from the first port 1111a of through hole 111a.Come in detail Say, by such as one blowning installation 12, second perforate 151 can be blown into a gas, make gas flow along a path C.Due to Two cover bodies 151 are configured at base plate 11, and the second cover body 15 is around the first port 1111a of through hole 111a.Whereby, the second cover Body 15 can avoid gas i.e. different via the gap between the second cover body 15 and base plate 11 to shed the entering before through hole 111a Outside two cover bodies 15.
Then, gas can enter second space S2 ' along path C via the second perforate 151, and via the first port 1111a flows into through hole 111a, then flows between polymeric layer 20 and base plate 11 via the second port 1112a.Due to patch Closing layer 40 and cover the second port 1112a, therefore gas will not leave through hole 111a via the second port 1112a, thus There is good airtight effect.Additionally, due to adhesion between laminating layer 40 and polymeric layer 20 more than polymeric layer 20 with Adhesion between base plate 11.Therefore, when gas applies pressure to base plate 11, this pressure can make base plate 11 and polymeric layer 20 It is separated and polymeric layer 20 and the state of laminating layer 40 holding laminating.It is noted that laminating layer 40 also must have enough Structural strength, leaves through hole 111a to avoid gas to break through laminating layer 40.
In order to improve the separative efficiency of polymeric layer 20 with base plate 11, in the present embodiment and other embodiments of part, Again the first space S 1 ' can be applied a negative pressure.Specifically, can be extracted out from the first perforate 131 by such as one air extractor 14 One gas, makes gas be pulled out along a path D from the first space S 1 '.Owing to the first cover body 13 is configured at polymeric layer 20 On, and the second port 1112a of through hole 111a be positioned at first cover body 13 institute around in the range of.Therefore, gas is mainly It is pulled out from the first space S 1 ' via the first perforate 131 along path D, and makes polymeric layer 20 away from the side of base plate 11 Compared to polymeric layer 20 near the side of base plate 11 generation negative pressure.A separation of polymeric nitride layer 20 and base plate 11 can be further added by whereby Active force, and then improve the separative efficiency of polymeric layer 20 with base plate 11.
In the present embodiment, owing to the first cover body 13 is around the second port 1112a of through hole 111a, therefore when gas stream Enter between polymeric layer 20 and base plate 11, cause polymeric layer 20 towards the first cover body 13 heave time, the first cover body 13 can limit poly- The height that compound layer 20 is heaved, with guarantee polymeric layer 20 separate with base plate 11 after quality.Furthermore, can be shortened by Distance D2 (as illustrated in fig. 5h) between first cover body 13 and polymeric layer 20 and reduce the height that polymeric layer 20 is heaved.
Finally, the first cover body 13 and the second cover body 15 are removed, and the laminating layer 40 on removing polymer layer 20, Base plate 11 is separated with polymeric layer 20 and complete flexible substrate prepare (as shown in fig. 5i).
Referring to Fig. 6 A, Fig. 6 B, Fig. 6 A is according to the device making flexible substrate disclosed by one embodiment of the invention Side view, Fig. 6 B is according to the side view of device making flexible substrate disclosed by another embodiment of the present invention.Make The device 50 of flexible substrate, including base plate 51, blowning installation 52,1 first cover body 53, air extractor 54,1 second Cover body 55 and at least one microscope carrier 56.
Base plate 51 has the pass through aperture 513 running through base plate 51.Through hole 513 have one first relative port 5131 with And one second port 5132, lay respectively at the opposite sides of through hole 513.Base plate 51 has a conformable region 514.Second port 5132 are positioned at conformable region 514, and the first port 5131 is positioned at the base plate 51 side relative to conformable region 514.
Blowning installation 52 has a puff prot 521, corresponding to the first port 5131.Specifically, blowning installation 52 can wrap A feeder containing the steel cylinder being such as filled with gas.By puff prot 521 being connected to the first port 5131, supply can be made Gas in device sequentially flowed into for first cover body 53 and the end by puff prot the 521, first port 5131 and the second port 5132 Between plate 51, base plate 51 is made just to produce in the side of the second port 5132 relative to base plate 51 in the side of the first port 5131 Pressure, and make the opposite sides of base plate 51 produce pressure differential.
First cover body 53 is configured at conformable region 514 in a detachable fashion, and the first cover body 53 is around the second port 5132.It is to say, the first cover body 53 orthographic projection covers the second port 5132 of through hole 513 in the region of base plate 51.
Air extractor 54 has a bleeding point 541, corresponding to the second port 5132.Specifically, air extractor 54 is such as An aspiration pump can be comprised.By bleeding point 541 being connected to the second port 5132, can be by between the first cover body 53 and base plate 51 Outside gas is drawn out of the first cover body 53 via bleeding point 541, the side making base plate 51 have the second port 5132 produces negative pressure, And then make the opposite sides of base plate 51 produce pressure differential.
Second cover body 55 is configured at the base plate 51 side relative to the first cover body 53, and the second cover in a detachable fashion Body 55 is around the first port 5131.It is to say, the second cover body 55 orthographic projection covers through hole 513 in the region of base plate 51 First port 5131.Wherein, the second cover body 55 has one second perforate 551 running through the second cover body 55.
Microscope carrier 56 is arranged at base plate 51 times, and microscope carrier 56 has one first thimble 561 and one second thimble 562, point Dui Yingyu through hole 513.Specifically, can be that there is on same microscope carrier the first thimble 561 and the second thimble 562, or It is that two microscope carriers are respectively provided with the first thimble 561 and the second thimble 562.First thimble 561 and the second thimble 562 are respectively from base plate The cone of 51 projections.First thimble 561 or the second thimble 562 can be stretched into through hole from the first port 5131 by user respectively 513 to use.At the present embodiment with other embodiments of part, the height of the first thimble 561 is less than the second thimble 562 Highly (as shown in Figure 6A).Part other embodiments in, the first thimble 561 ' and the second thimble 562 ' also can have identical or Close height, and the cone rate of the first thimble 561 ' is less than the cone rate (as shown in Figure 6B) of the second thimble 562 '.It is to say, the One thimble 561 ' from close to microscope carrier side to away from microscope carrier side change than the second thimble 562 ' oneself close to microscope carrier side to far Change from microscope carrier side is big.
Next referring to Fig. 6 A, Fig. 7 and Fig. 8 A to Fig. 8 L, Fig. 7 is according to the system disclosed by another embodiment of the present invention Making the flow chart of the method for flexible substrate, Fig. 8 A to Fig. 8 K is that the structure side of step S301 to S311 regards in corresponding diagram 7 respectively Figure, Fig. 8 L is the flexible substrate that completes of the flow process according to Fig. 7 and the structural side view of base plate thereof.Due to Fig. 7 and Fig. 8 A Similar to the embodiment of Fig. 2, Fig. 3 A to Fig. 3 I to the embodiment of Fig. 8 L, the most identical label represents with Fig. 2, Fig. 3 A to figure The same or similar element of embodiment of 3I, therefore explains just for difference.
First, it is provided that a plate body 511 (S301), plate body 511 has the first opening 5111 of consistent threading body 511 (such as figure Shown in 8A).
In the present embodiment and other embodiments of part, a laminating layer 80 (S302) can be set on plate body 511.Come in detail Saying, laminating layer 80 covers the plate body 511 side (as shown in Figure 8 B) relative to the first opening 5111, and laminating layer 80 is such as but not It is limited to an adhesive tape or a baffle plate.
Then, plate body 511 is formed a release layer 512 (S303) (as shown in Figure 8 C).
Then, removing laminating layer 80 (S304), release layer 512 has one second opening 5121, and the second opening 5121 exposes First opening 5111 and being connected (as in fig. 8d) with the first opening 5111.Wherein, plate body 511 and release layer 512 i.e. group The base plate 51 of one-tenth Fig. 6 A, and the first opening 5111 and the second opening 5121 i.e. through hole 513 of composition diagram 6A.First opening 5111 Away from the side of release layer 512, and the first opening 5111 is first port 5131 of Fig. 6 A.Second opening 5121 is away from plate body The side of 511, and the second opening 5121 is second port 5132 of Fig. 6 A.
In the present embodiment and other embodiments of part, it is to form release layer at plate body 511 in the way of being such as deposited with 512, and after release layer 512 contacts with another base material, be difficult to stick with another base material and there is good separating effect.In this reality Executing in example, release layer 512 removes bond layer (Debonding Layer, DBL) as such as one.The material of release layer 512 is for example, One polymeric silicon (for example, siloxane polymer), an organic polymer (for example, polyethylene, polyvinyl chloride, polymethyl Acid methyl esters, polyethylene terephthalate), a metal (for example, gold, silver, copper, chromium, alloy) or above-mentioned composite.
Then, base plate 51 is positioned on microscope carrier 56, and makes the first thimble 561 stretch into through hole 513 (S305) (such as figure Shown in 8E).
Then, release layer 512 forms a polymeric layer 60 (S306) (as shown in Figure 8 F), the material of polymeric layer 60 Such as but not limited to polyimides.Owing to the first thimble 561 is matched with through hole 513, thus the first thimble 561 can be sticked in the end Plate 51 and can avoid polymeric layer 60 outside through hole 513 flows out base plate 51.On the other hand, due to the polymer not yet solidified Layer 60 is liquid, thus the polymeric layer 60 of part can flow into through hole 513 and be attached to the sidewall of through hole 513.Such one Coming, in follow-up technique, the polymeric layer 60 flowing into through hole 513 can be as the protective layer of release layer 512, so as to avoiding the end Plate 51 in follow-up technique because contact chemical agent and suffering corrodes the most destroyed.Whereby, flexible substrate is completed Preparation after, base plate 51 is the most reusable.
Then, in the present embodiment and other embodiments of part, a line layer 70 can also be formed on polymeric layer 60 (S307) (as shown in fig. 8g).Wherein, line layer 70 includes a transparent electrode arrays, using the circuit as flexible substrate, and Through hole 513 is positioned at outside transparent electrode arrays.Form the technique of line layer 70 such as but not limited to a thin film transistor (TFT) technique (Thin Film Transistors, TFT).It is not limited to it is noted that form line layer 70 on polymeric layer 60 The present invention.
Then, after liquid polymerization nitride layer 60 solidifies, stretch out the first thimble 561, make the second thimble 562 of microscope carrier 56 stretch into Through hole 513 (S308), owing to the height of the second thimble 562 is more than the height of the first thimble 561, therefore, the second thimble 562 meeting Protrude the second port of through hole 513, and back down the polymeric layer 60 on the second port being positioned at through hole 513, and make portion Segregation compound layer 60 is swelled towards the direction away from base plate 51.Whereby, polymeric layer 60 and base plate 51 is made to be partially separated (such as Fig. 8 H institute Show).Consequently, it is possible to the speed separated with base plate 51 by polymeric layer 60 can be further added by.If additionally, the making of use Fig. 6 B can Scratch the device of formula substrate, owing to the cone rate of the second thimble 562 ' is more than the cone rate of the first thimble 561 ', thus the second thimble 562 ' Can stretch into, compared to the first thimble 561 ', the distance that through hole 513 is deeper, therefore the second thimble 562 ' also can run through in jack-up inflow The partially polymerized nitride layer 60 in hole 513, and partially polymerized nitride layer 60 is swelled towards the direction away from base plate 51.
Then, take off base plate 51 from microscope carrier 56, and one first cover body 53 is configured at (S309) on polymeric layer 60.Its In, the first cover body 53 has one first perforate 531 (as shown in fig. 81) running through the first cover body 53.Whereby, polymeric layer 60 is made Be clipped between the first cover body 53 and base plate 51, and the second port 5132 be positioned at first cover body 53 institute around in the range of.Also That is, the first cover body 53 orthographic projection covers the second port 5132 orthographic projection of through hole 513 end of in the region of base plate 51 The region of plate 51.And define one first space S 1 between polymeric layer 60 and the first cover body 53 ", the first space S 1 " with run through Hole 513 is connected.
In the present embodiment and other embodiments of part, also one second cover body 55 can be configured at (S310) on base plate 51. Wherein, the second cover body 55 has one second perforate 551 (as illustrated by figure 8j) running through the second cover body 55.Whereby, base plate 51 between Between polymeric layer 60 and the second cover body 55, and the first port 5131 be positioned at second cover body 55 institute around in the range of.Also That is, the second cover body 55 orthographic projection covers the first port 5131 orthographic projection of through hole 513 end of in the region of base plate 51 The region of plate 51.And define a second space S2 between base plate 51 and the second cover body 55 ", second space S2 " and through hole 513 And second perforate 551 be connected.It is noted that the first cover body 53 is configured at polymeric layer 60 and by the second cover body 55 The sequencing being configured at base plate 51 is not limited to the present invention.
Finally, a gas (S311) (as shown in figure 8k) is inputted from through hole 513.Wherein, gas for example, air, nitrogen Or argon gas, the kind of gas is not limited to the present invention.Specifically, right by such as one blowning installation (not illustrating) Second perforate 551 is blown into gas, makes gas flow along a path E.Owing to the second cover body 55 is configured at base plate 51, and second Cover body 55 is around the first port 5131 of through hole 513, and therefore gas is along entering second via the second perforate 551 by path E Space S 2 ", and the second cover body 55 also can avoid gas loss before polymeric layer 60 separates with base plate 51.And gas can be via First port 5131 is from second space S2 " flow into through hole 513, then flow into poly-via first port the 5131, second port 5132 Between compound layer 60 and base plate 51.The malleation applied base plate 51 by gas, makes the opposite sides of polymeric layer 60 produce Raw pressure differential, and polymeric layer 60 is separated with base plate 51.
In order to improve the separative efficiency of polymeric layer 60 with base plate 51, in the present embodiment and other embodiments of part, Also can be again to the first space S 1 " apply a negative pressure.Specifically, by such as one air extractor 54, first perforate 531 can be taken out Go out a gas, make gas along a path F from the first space S 1 " be pulled out.Owing to the first cover body 53 is configured at polymeric layer On 60, and the second port 5132 of through hole 513 be positioned at first cover body 53 institute around in the range of.Therefore, gas is mainly Along path F via the first perforate 531 from the first space S 1 " it is pulled out, and make polymeric layer 60 away from the side of base plate 51 Produce negative pressure.Can be further added by the active force of a separation of polymeric nitride layer 60 and base plate 51 whereby, so improve by polymeric layer 60 with The separative efficiency of base plate 51.
In the present embodiment, owing to the first cover body 53 is around the second port 5132 of through hole 513, therefore flow into when gas Between polymeric layer 60 and base plate 51, cause polymeric layer 60 towards the first cover body 53 heave time, the first cover body 53 also can limit poly- The height that compound layer 60 is heaved, with guarantee polymeric layer 60 separate with base plate 51 after quality.Furthermore, can be shortened by Distance D3 (as illustrated by figure 8j) between first cover body 53 and polymeric layer 60 and reduce the height that polymeric layer 60 is heaved.
Then, the first cover body 53 and the second cover body 55 are removed, and to polymeric layer 60 in the face of the side of base plate 51 Carry out the process of such as trimming, make polymeric layer 60 the most smooth, consequently, it is possible to i.e. complete bendable in the face of the side of base plate 51 Substrate prepare (as shown in Fig. 8 L).
It is noted that form release layer 512 after arranging laminating layer on plate body on plate body to be not limited to this Invention.Referring to Fig. 6, Fig. 9 A to Fig. 9 C, Fig. 9 A is according to the making flexible substrate disclosed by another embodiment of the present invention The flow chart of method, Fig. 9 B is the structural side view of step S402 in corresponding diagram 9A, and Fig. 9 C is that the flow process according to Fig. 9 A has made The flexible substrate become and the structural side view of base plate thereof.Owing to the present embodiment is similar to Fig. 7, Fig. 8 A to Fig. 8 L, the most only pin Different place is illustrated.
In the present embodiment, after a plate body 511 (S401) is provided, can directly plate body 511 be positioned on base station 56, Make the first thimble 561 stretch into through hole 513, and on plate body 511, form release layer 512 (S402), in the present embodiment, can It is not necessary on through hole 513, arrange laminating layer (as shown in Figure 9 B).But, in the present embodiment, due to release layer 512 be polymerized Bond between nitride layer is more weak, causes poly-in order to avoid loosening between release layer 512 and polymeric layer in follow-up technique The flaw of compound layer, so that corresponding to the region irradiation of through hole 513 or irradiate laser (S403) at release layer 512, So as to improving corresponding to the bond ability between release layer 512 and the polymeric layer 60 in the region of through hole 513.Additionally, step (S404) is similar to step (S310) to the step of Fig. 7 (S305) to step (S409), therefore repeats no more.Flow process according to Fig. 9 A The flexible substrate completed and the structural side view of base plate thereof are as shown in Figure 9 C.
Summary, depends on the method making flexible substrate and device thereof provided according to embodiments of the present invention, due to It is to flow through between polymeric layer and base plate, so that polymeric layer is separated with base plate by being passed through gas.Therefore polymer can be avoided When layer separates with base plate, on polymeric layer, fracture or the polymer layer surface of circuit damage.Further, by adjusting polymeric layer Size, the number of through hole and the pressure of gas, the disengaging time needed for polymeric layer and base plate can be regulated and controled.Therefore Relatively simply polymeric layer is separated from base plate, and solve flexible substrate in prior art and be difficult to from asking that base plate is peeled off Topic.
Additionally, in the embodiment of part, polymeric layer can be made to separate with bottom parts by the thimble of microscope carrier again.As This one, the speed separated with base plate by polymeric layer can be promoted again.
Additionally, in the embodiment of part, owing to also arranging a release layer on base plate, and the release layer part of part Flow into through hole and be adhered to the sidewall of through hole.Consequently, it is possible to flow into through hole release layer can as the protective layer of base plate, Corrode the most destroyed so as to avoiding base plate to suffer because of contact chemical agent.Whereby, the preparation of flexible substrate is completed After, base plate is the most reusable.
Additionally, in the embodiment of part, be adhered to the side of through hole owing to the polymeric layer of part flows into through hole Wall.Consequently, it is possible to the polymeric layer flowing into through hole can be as the protective layer of base plate, so as to avoiding base plate because contacting chemical drugs Agent and suffering is corroded the most destroyed.Whereby, after the preparation completing flexible substrate, base plate is the most reusable.
Although the present invention is disclosed above with aforesaid preferred embodiment, so it is not limited to the present invention, any ability Field technique personnel, without departing from the spirit and scope of the present invention, when making a little change and retouching, therefore the present invention's is special Profit protection domain is as the criterion with claims.

Claims (7)

1. the method making flexible substrate, it is characterised in that its step includes:
Thering is provided a base plate with a polymeric layer, wherein this base plate has pass through aperture, and this polymeric layer is positioned on this base plate And cover this through hole;
One first cover body is provided to be covered on this polymeric layer;And
Thering is provided a gas, this gas flows between this polymeric layer and this base plate from this through hole, and then makes this polymeric layer Separate with this base plate;
The step providing this gas includes:
One second cover body is configured on this base plate, so that this base plate is between this polymeric layer and this second cover body, and This through hole is made to be positioned in the range of this second cover body covered;And
This gas is sent between this second cover body and this base plate.
2. the method making flexible substrate as claimed in claim 1, it is characterised in that further include:
Before providing this first cover body to be covered on this polymeric layer, form a line layer on this polymeric layer.
3. the method making flexible substrate as claimed in claim 1, it is characterised in that further include:
Formed this polymeric layer on this base plate after, this polymeric layer of through part, make this through hole run through this base plate with should Polymeric layer.
4. the method making flexible substrate as claimed in claim 3, it is characterised in that further include:
After this polymeric layer of through part, it is provided that a laminating layer fits on this polymeric layer, and cover this through hole.
5. the method making flexible substrate as claimed in claim 1, it is characterised in that in forming this polymeric layer in this end Step on plate, partly this polymeric layer inserts this through hole.
6. the method making flexible substrate as claimed in claim 5, it is characterised in that further include:
Before this gas is provided, it is provided that a microscope carrier is arranged under this base plate, and this microscope carrier has a thimble;
This thimble stretched into this through hole and withstands this polymeric layer, making this polymeric layer separate with this bottom parts;And
Remove this thimble.
7. the method making flexible substrate as claimed in claim 6, it is characterised in that further include in forming this polymeric layer Close this through hole before.
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Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104793357A (en) * 2014-01-17 2015-07-22 鸿富锦精密工业(深圳)有限公司 Carrier, thin film transistor array substrate manufacturing method and liquid crystal display panel manufacturing method
CN106154609A (en) * 2015-04-09 2016-11-23 鸿富锦精密工业(深圳)有限公司 Liquid crystal display panel preparation method
CN106057707A (en) * 2016-06-01 2016-10-26 上海天马微电子有限公司 Method for separating substrate and bearing panel of electronic device and bearing panel
CN106379034B (en) * 2016-10-31 2018-11-20 东莞市五株电子科技有限公司 A kind of device of protective film layer that removing electromagnetic membrane
CN107742618B (en) * 2017-10-24 2020-07-03 京东方科技集团股份有限公司 Preparation method of flexible panel, flexible panel and display device

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1980847A (en) * 2004-07-02 2007-06-13 夏普股份有限公司 Film peeling method and apparatus
CN102414785A (en) * 2009-05-01 2012-04-11 信越化学工业株式会社 Method for manufacturing bonded wafer
CN202384307U (en) * 2011-11-11 2012-08-15 苏州均华精密机械有限公司 Dyestripping apparatus

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62128139A (en) * 1985-11-29 1987-06-10 Toshiba Corp Peeling device
TWI230570B (en) * 2001-07-16 2005-04-01 Au Optronics Corp Assembly method of flat panel display
JP4440005B2 (en) * 2004-06-15 2010-03-24 信越ポリマー株式会社 Parts holder
JP2006319150A (en) * 2005-05-13 2006-11-24 Nec Corp Semiconductor chip pick-up device and method therefor
JP4524241B2 (en) * 2005-10-12 2010-08-11 日本メクトロン株式会社 Thin plate film sticking apparatus and sticking method
JP2008053260A (en) * 2006-08-22 2008-03-06 Nidec Tosok Corp Pick-up device
CN101609786B (en) * 2008-06-17 2011-01-05 旺硅科技股份有限公司 Crystal grain access system and ejecting pin device
CN101752204B (en) * 2008-12-19 2011-06-29 均豪精密工业股份有限公司 Method for separating chip and rubber film and chip removal method
JP2011054648A (en) * 2009-08-31 2011-03-17 Elpida Memory Inc Method of manufacturing semiconductor device
CN102194829B (en) * 2010-03-11 2013-07-10 财团法人工业技术研究院 Substrate structure and manufacturing method thereof
TWM420151U (en) * 2011-09-05 2012-01-01 Young Fast Optoelectronics Co Structure improvement of panel laminating device
TWI539414B (en) * 2011-09-21 2016-06-21 友達光電股份有限公司 Fabricating method of flexible display
CN102636898B (en) * 2012-03-14 2014-03-12 京东方科技集团股份有限公司 Manufacturing method of flexible display devices
TWI492373B (en) * 2012-08-09 2015-07-11 Au Optronics Corp Method for fabricating flexible display module

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1980847A (en) * 2004-07-02 2007-06-13 夏普股份有限公司 Film peeling method and apparatus
CN102414785A (en) * 2009-05-01 2012-04-11 信越化学工业株式会社 Method for manufacturing bonded wafer
CN202384307U (en) * 2011-11-11 2012-08-15 苏州均华精密机械有限公司 Dyestripping apparatus

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