CN103439960A - Air path control system of vacuum absorption platform - Google Patents

Air path control system of vacuum absorption platform Download PDF

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Publication number
CN103439960A
CN103439960A CN2013103800979A CN201310380097A CN103439960A CN 103439960 A CN103439960 A CN 103439960A CN 2013103800979 A CN2013103800979 A CN 2013103800979A CN 201310380097 A CN201310380097 A CN 201310380097A CN 103439960 A CN103439960 A CN 103439960A
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China
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vacuum
gas
vortex pump
air
working table
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CN2013103800979A
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CN103439960B (en
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卓劲松
王军
张进
黄锦雄
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GD HAN'S YUEMING LASER GROUP CO., LTD.
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GUANGDONG HAN'S YUEMING LASER TECHNOLOGY Co Ltd
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Abstract

The invention discloses an air path control system of a vacuum absorption platform. The air path control system of the vacuum absorption platform comprises a vacuum absorption workbench, a first air division seat, a direct current valve, a first vortex air pump, a second air division seat, a pressure regulating filter, a flue gas purification cover, a second vortex air pump and an electromagnetic valve. The vacuum absorption workbench, the first air division seat, the direct current valve, the first vortex air pump, the second air division seat, the pressure regulating filter, the flue gas purification cover and the second vortex air pump are sequentially connected in series through a plurality of air pipes. The two ends of the electromagnetic valve are connected with the first air division seat and the pressure regulating filter respectively. In the time of processing, the vacuum absorption workbench is in a negative pressure state. After materials are processed, air blown from the first vortex air pump enters the vacuum absorption workbench from the electromagnetic valve. The problem that after processing by an etching rack is finished, materials are difficult to take out under the influences of negative pressure is solved.

Description

The air-path control system of vacuum absorbing platform
Technical field
The present invention relates to a kind of air-path control system, be specifically related to a kind of air-path control system of vacuum absorbing platform.
Background technology
Material is cut, during the processing of etching or other form, prevent that material shake or position are offset, and shape is rung crudy, often needs first material is fixed, and remakes the processing processing.
In prior art, when material is done the processing processing, the normal vacuum absorbing platform that adopts is fixed frivolous flaky material, the gas circuit of vacuum absorbing platform is controlled and is usually utilized vacuum generator or vacuum pump directly to produce negative pressure the material on platform is inhaled to flat and absorption, and the employing vortex pump formation negative-pressure adsorption of bleeding is outward also arranged.When the user needs blowing, platform in the raw, can be to the material production absorption affinity, and after the user places material, vortex pump starts to bleed, and the vacuum absorbing platform cavity produces negative pressure material is sucked.
Yet, in the air-path control system of above-mentioned vacuum absorbing platform, while after materials processing completes, carrying out rewinding, now because vacuum is not destroyed, easily cause the phenomenon of feeding difficulty to occur.
Summary of the invention
Based on this, being necessary provides a kind of air-path control system of vacuum absorbing platform for deficiency of the prior art.
The present invention is achieved in the following ways: a kind of air-path control system of vacuum absorbing platform, comprise vacuum-adsorption working table, the first gas separating seat, straight-wavy valve, the first vortex pump, the second gas separating seat, pressure regulation filtrator, gas cleaning cover, the second vortex pump and solenoid valve, described vacuum-adsorption working table, the first gas separating seat, straight-wavy valve, the first vortex pump, the second gas separating seat, pressure regulation filtrator, gas cleaning cover and the second vortex pump are connected in series successively by some tracheaes; The two ends of described solenoid valve are connected on the first gas separating seat and pressure regulation filtrator; Add man-hour, straight-wavy valve outage is communicated with, the energising of described solenoid valve is died, the first vortex pump, the second vortex pump are all worked and bled; Described the first vortex pump is bled to vacuum-adsorption working table by the first gas separating seat, makes vacuum-adsorption working table in negative pressure state, and the gas flow that the first vortex pump is extracted out is extracted out by the second vortex pump after pressure regulation filtrator and gas cleaning cover; After completing materials processing, the straight-wavy valve energising disconnects, the outage of described solenoid valve is ventilated, the first vortex pump work is bled, the second vortex pump quits work, and the gas that the first vortex pump blows out enters vacuum-adsorption working table from solenoid valve.
Further, described vacuum-adsorption working table is provided with four gas ports, and described the first gas separating seat divides four the gas ports corresponding connection of four road tracheaes with vacuum-adsorption working table.
Further, also comprise a pressure sensor, described pressure sensor inserts by a Y type the four road tracheae Zhong mono-road tracheaes connections that three-way plug is connected with vacuum-adsorption working table with the first gas separating seat soon.
Further, described solenoid valve one end is inserted soon three-way plug by a Y type and is connected in the road tracheae between the first gas separating seat and vacuum-adsorption working table, and this solenoid valve other end is inserted soon three-way plug by a Y type and connected with the tracheae that is connected pressure regulation filtrator and gas cleaning cover
Further, in described gas cleaning cover, also be provided with the ion wind rod, described gas cleaning cover employing Y type is inserted soon three-way plug and is connected with the pressure regulation filtrator, and the gas cleaning cover carries out the input of upper and lower side two-way by adopting the Y type to insert soon three-way plug.
Further, described tracheae is the PU pipe.
In sum, the air-path control system of vacuum absorbing platform of the present invention, by changing the state of straight-wavy valve and solenoid valve, adds man-hour, and the first vortex pump is bled to vacuum-adsorption working table, form negative pressure, make on the vacuum suction workbench thereby material to be processed is adsorbed on securely.After completing materials processing, the gas that the first vortex pump blows out enters the vacuum suction workbench from solenoid valve, destroys the negative pressure state of vacuum suction platform, take out easily Material Processing, simple in structure, practical, after preventing that the etching frame from machining, affected by negative pressure, the phenomenon that is difficult to feeding occurs.
The accompanying drawing explanation
The schematic diagram of the air-path control system that Fig. 1 is vacuum absorbing platform of the present invention.
Embodiment
In order to make purpose of the present invention, technical scheme and advantage clearer, below in conjunction with drawings and Examples, the present invention is further elaborated.Should be appreciated that specific embodiment described herein, only in order to explain the present invention, is not intended to limit the present invention.
As shown in Figure 1, the present embodiment provides a kind of air-path control system of vacuum absorbing platform, for etching machine, lamellar material is added to man-hour, this lamellar material is adsorbed fixing.The air-path control system of described vacuum absorbing platform comprises vacuum-adsorption working table 10, the first gas separating seat 20, straight-wavy valve 30, the first vortex pump 40, the second gas separating seat 50, pressure regulation filtrator 60, gas cleaning cover 70, the second vortex pump 80, solenoid valve 90 and pressure transducer 100.Described vacuum-adsorption working table 10, the first gas separating seat 20, straight-wavy valve 30, the first vortex pump 40, the second gas separating seat 50, pressure regulation filtrator 60, gas cleaning cover 70 and the second vortex pump 80 are connected in series successively by tracheae 110, and the two ends of described solenoid valve 90 are connected on the output terminal of the first gas separating seat 20 and pressure regulation filtrator 60.
Described vacuum-adsorption working table 10 is provided with four gas ports 11, the corresponding connection of four gas ports 11 of described the first gas separating seat 20Fen tetra-road tracheaes 110 and vacuum-adsorption working table 10.Described pressure transducer 100 inserts by a Y type road tracheae 110 connections that three-way plug 120 is connected with vacuum-adsorption working table 10 with the first gas separating seat 20 soon.Described solenoid valve 90 1 ends are inserted soon three-way plug 130 by a Y type and are connected in the road tracheae 110 between the first gas separating seat 20 and vacuum-adsorption working table 10, and these solenoid valve 90 other ends are inserted soon three-way plug 140 by a Y type and connected with the tracheae 110 that is connected pressure regulation filtrator 60 and gas cleaning cover 70; Preferably, also be provided with ion wind rod 71 in described gas cleaning cover 70, the input end employing Y type of described gas cleaning cover 70 is inserted soon three-way plug 150 and is connected with pressure regulation filtrator 60, and gas cleaning cover 70 carries out the input of upper and lower side two-way by adopting the Y type to insert soon three-way plug 150, strengthens smoke discharging effect.In the present invention, described tracheae 110 is PU pipe (Polyurethane Tubing, the polycarbamate pipe), described vacuum-adsorption working table 10, the first gas separating seat 20, solenoid valve 90, gas cleaning cover 70 are installed in etching machine inside, and described straight-wavy valve 30, the first vortex pump 40, the second gas separating seat 50, pressure regulation filtrator 60, the second vortex pump 80 and pressure transducer 100 are installed in the etching machine outside.
Laser etching machine is added man-hour to material, and the air-path control system of vacuum absorbing platform of the present invention is started working.Now, straight-wavy valve 30 outages are communicated with, and solenoid valve 90 energisings disconnect, the first vortex pump 40, the second vortex pump 80 work.During described the first vortex pump 40 work, air-breathing and the second gas separating seat 50 is blown to the first gas separating seat 20 by straight-wavy valve 30; Outwards air blowing air-breathing to gas cleaning cover 70 during described the second vortex pump 80 work; Straight-wavy valve 30 internal pistons after outage are opened, and make the first vortex pump 40 and the first gas separating seat 20 in connected state; Solenoid valve 90 after energising is in closed condition, described the first vortex pump 40 is bled by 20 pairs of vacuum-adsorption working tables 10 of the first gas separating seat, make vacuum-adsorption working table 10 in negative pressure state, make on vacuum-adsorption working table 10 thereby material to be processed is adsorbed on securely.The gas that the first vortex pump 40 is taken out is under the effect of the second vortex pump 80, through pressure regulation filtrator 60 gas cleaning covers 70, carry out pressure regulation and tentatively filter and be discharged to gas cleaning cover 70 by pressure regulation filtrator 60, further carry out the udst separation processing by 70 pairs of these gases of gas cleaning cover again, finally by being discharged to etching machine from the second vortex pump 80, pressure transducer 100 detects the atmospheric pressure value of vacuum-adsorption working table 10, and show by exterior display device, make the staff understand the force value of vacuum suction workbench.
After completing materials processing, now, straight-wavy valve 30 energisings disconnect, and solenoid valve 90 outages are communicated with, and the first vortex pump 40 work, the second vortex pump 80 quit work.Described the first vortex pump 40 work are only blown to the second gas separating seat 50; Straight-wavy valve 30 internal pistons after energising are in closed condition, and the second vortex pump 80 is in closure state, and gas can't flow out from the second vortex pump 80.Solenoid valve 90 after outage is in open mode, the gas that the first vortex pump 40 blows out enters vacuum-adsorption working table 10 from solenoid valve 90 after the second gas separating seat 50 is blown, destroy the negative pressure state of vacuum-adsorption working table 10, and the air mass with electric charge that ion wind rod 71 produces, remove material static.
In sum, the air-path control system of vacuum absorbing platform of the present invention is by changing the state of straight-wavy valve 30 and solenoid valve 90, add man-hour, the first 40 pairs of vortex pumps vacuum suction workbench is bled, form negative pressure, make on vacuum-adsorption working table 10 thereby material to be processed is adsorbed on securely.After completing materials processing, the gas that the first vortex pump 40 blows out enters vacuum-adsorption working table 10 from solenoid valve 90, destroy the negative pressure state of vacuum-adsorption working table 10, take out easily Material Processing, simple in structure, practical, after preventing that the etching frame from machining, affected by negative pressure, cause the phenomenon of feeding to occur.
The foregoing is only preferred embodiment of the present invention, not in order to limit the present invention, all any modifications of doing within the spirit and principles in the present invention, be equal to and replace and improvement etc., within all should being included in protection scope of the present invention.

Claims (6)

1. the air-path control system of a vacuum absorbing platform; it is characterized in that: comprise vacuum-adsorption working table, the first gas separating seat, straight-wavy valve, the first vortex pump, the second gas separating seat, pressure regulation filtrator, gas cleaning cover, the second vortex pump and solenoid valve, described vacuum-adsorption working table, the first gas separating seat, straight-wavy valve, the first vortex pump, the second gas separating seat, pressure regulation filtrator, gas cleaning cover and the second vortex pump are connected in series successively by some tracheaes; The two ends of described solenoid valve are connected on the first gas separating seat and pressure regulation filtrator; Add man-hour, straight-wavy valve outage is communicated with, the energising of described solenoid valve is died, the first vortex pump, the second vortex pump are all worked and bled; Described the first vortex pump is bled to vacuum-adsorption working table by the first gas separating seat, makes vacuum-adsorption working table in negative pressure state, and the gas flow that the first vortex pump is extracted out is extracted out by the second vortex pump after pressure regulation filtrator and gas cleaning cover; After completing materials processing, the straight-wavy valve energising disconnects, the outage of described solenoid valve is ventilated, the first vortex pump work is bled, the second vortex pump quits work, and the gas that the first vortex pump blows out enters vacuum-adsorption working table from solenoid valve.
2. the air-path control system of vacuum absorbing platform according to claim 1, it is characterized in that: described vacuum-adsorption working table is provided with four gas ports, and described the first gas separating seat divides four the gas ports corresponding connection of four road tracheaes with vacuum-adsorption working table.
3. the air-path control system of vacuum absorbing platform according to claim 2, it is characterized in that: also comprise a pressure sensor, described pressure sensor inserts by a Y type the four road tracheae Zhong mono-road tracheaes connections that three-way plug is connected with vacuum-adsorption working table with the first gas separating seat soon.
4. the air-path control system of vacuum absorbing platform according to claim 2, it is characterized in that: described solenoid valve one end is inserted soon three-way plug by a Y type and is connected in the road tracheae between the first gas separating seat and vacuum-adsorption working table, and this solenoid valve other end is inserted soon three-way plug by a Y type and connected with the tracheae that is connected pressure regulation filtrator and gas cleaning cover.
5. the air-path control system of vacuum absorbing platform according to claim 2, it is characterized in that: in described gas cleaning cover, also be provided with the ion wind rod, described gas cleaning cover employing Y type is inserted soon three-way plug and is connected with the pressure regulation filtrator, and the gas cleaning cover carries out the input of upper and lower side two-way by adopting the Y type to insert soon three-way plug.
6. the air-path control system of vacuum absorbing platform according to claim 1 is characterized in that: described tracheae is the PU pipe.
CN201310380097.9A 2013-08-27 2013-08-27 The air-path control system of vacuum absorbing platform Active CN103439960B (en)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109696437A (en) * 2017-10-23 2019-04-30 由田新技股份有限公司 A kind of apparatus for leveling and its method of semiconductor tablet
CN116460766A (en) * 2023-03-22 2023-07-21 深圳市大族数控科技股份有限公司 Vacuum air pressure method, vacuum air pressure system, adsorption platform, PCB processing equipment and medium
CN116715021A (en) * 2023-07-26 2023-09-08 上海果栗自动化科技有限公司 Vacuum adsorption active cell
CN116460766B (en) * 2023-03-22 2024-05-17 深圳市大族数控科技股份有限公司 Vacuum air pressure method, vacuum air pressure system, adsorption platform, PCB processing equipment and medium

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101256363A (en) * 2007-12-28 2008-09-03 上海微电子装备有限公司 Pneumatic vacuum control system for silicon slice bench
CN101671122A (en) * 2009-08-18 2010-03-17 济南德佳玻璃机器有限公司 Vacuum control system of hollow glass roller pressing machine
CN203414815U (en) * 2013-08-27 2014-01-29 广东大族粤铭激光科技股份有限公司 Gas channel control system of vacuum adsorption platform

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101256363A (en) * 2007-12-28 2008-09-03 上海微电子装备有限公司 Pneumatic vacuum control system for silicon slice bench
CN101671122A (en) * 2009-08-18 2010-03-17 济南德佳玻璃机器有限公司 Vacuum control system of hollow glass roller pressing machine
CN203414815U (en) * 2013-08-27 2014-01-29 广东大族粤铭激光科技股份有限公司 Gas channel control system of vacuum adsorption platform

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109696437A (en) * 2017-10-23 2019-04-30 由田新技股份有限公司 A kind of apparatus for leveling and its method of semiconductor tablet
CN109696437B (en) * 2017-10-23 2021-07-20 由田新技股份有限公司 Leveling device and method for semiconductor material sheet
CN116460766A (en) * 2023-03-22 2023-07-21 深圳市大族数控科技股份有限公司 Vacuum air pressure method, vacuum air pressure system, adsorption platform, PCB processing equipment and medium
CN116460766B (en) * 2023-03-22 2024-05-17 深圳市大族数控科技股份有限公司 Vacuum air pressure method, vacuum air pressure system, adsorption platform, PCB processing equipment and medium
CN116715021A (en) * 2023-07-26 2023-09-08 上海果栗自动化科技有限公司 Vacuum adsorption active cell
CN116715021B (en) * 2023-07-26 2024-03-15 果栗智造(上海)技术股份有限公司 Vacuum adsorption active cell

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Address after: 523808 Guangdong, Dongguan Songshan Lake high tech Industrial Development Zone Industrial Road, No. 28

Patentee after: GD HAN'S YUEMING LASER GROUP CO., LTD.

Address before: 523000 Guangdong, Dongguan Songshan Lake high tech Industrial Development Zone Industrial Road, No. 28

Patentee before: Guangdong Han's Yueming Laser Technology Co., Ltd.