CN103406314B - Method and device for cleaning silicon powder of workpiece supports - Google Patents
Method and device for cleaning silicon powder of workpiece supports Download PDFInfo
- Publication number
- CN103406314B CN103406314B CN201310377180.0A CN201310377180A CN103406314B CN 103406314 B CN103406314 B CN 103406314B CN 201310377180 A CN201310377180 A CN 201310377180A CN 103406314 B CN103406314 B CN 103406314B
- Authority
- CN
- China
- Prior art keywords
- work rest
- row
- silica flour
- ionic wind
- belt
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title claims abstract description 15
- 238000004140 cleaning Methods 0.000 title abstract description 12
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title abstract description 7
- 239000011863 silicon-based powder Substances 0.000 title abstract 5
- 238000007664 blowing Methods 0.000 claims abstract description 32
- 230000033001 locomotion Effects 0.000 claims abstract description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 88
- 235000013312 flour Nutrition 0.000 claims description 44
- 239000000377 silicon dioxide Substances 0.000 claims description 44
- 239000000428 dust Substances 0.000 claims description 13
- 238000010438 heat treatment Methods 0.000 claims description 6
- 239000010408 film Substances 0.000 abstract description 8
- 229910021417 amorphous silicon Inorganic materials 0.000 abstract description 6
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 abstract description 5
- 239000000853 adhesive Substances 0.000 abstract description 4
- 230000001070 adhesive effect Effects 0.000 abstract description 4
- 230000015572 biosynthetic process Effects 0.000 abstract description 3
- 239000010409 thin film Substances 0.000 abstract description 3
- 238000006243 chemical reaction Methods 0.000 abstract description 2
- 230000001680 brushing effect Effects 0.000 abstract 1
- 230000003749 cleanliness Effects 0.000 abstract 1
- 230000000694 effects Effects 0.000 description 12
- 230000005540 biological transmission Effects 0.000 description 5
- 230000008030 elimination Effects 0.000 description 4
- 238000003379 elimination reaction Methods 0.000 description 4
- 239000012528 membrane Substances 0.000 description 4
- 230000009466 transformation Effects 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 239000013078 crystal Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000006386 neutralization reaction Methods 0.000 description 2
- 238000010926 purge Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- TVEXGJYMHHTVKP-UHFFFAOYSA-N 6-oxabicyclo[3.2.1]oct-3-en-7-one Chemical compound C1C2C(=O)OC1C=CC2 TVEXGJYMHHTVKP-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 1
- 238000003915 air pollution Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 239000005431 greenhouse gas Substances 0.000 description 1
- 230000003434 inspiratory effect Effects 0.000 description 1
- 210000002345 respiratory system Anatomy 0.000 description 1
Landscapes
- Cleaning In General (AREA)
- Nozzles For Electric Vacuum Cleaners (AREA)
- Silicon Compounds (AREA)
Abstract
Description
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201310377180.0A CN103406314B (en) | 2013-08-27 | 2013-08-27 | Method and device for cleaning silicon powder of workpiece supports |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201310377180.0A CN103406314B (en) | 2013-08-27 | 2013-08-27 | Method and device for cleaning silicon powder of workpiece supports |
Publications (2)
Publication Number | Publication Date |
---|---|
CN103406314A CN103406314A (en) | 2013-11-27 |
CN103406314B true CN103406314B (en) | 2015-03-25 |
Family
ID=49599381
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201310377180.0A Expired - Fee Related CN103406314B (en) | 2013-08-27 | 2013-08-27 | Method and device for cleaning silicon powder of workpiece supports |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN103406314B (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106563652B (en) * | 2016-11-04 | 2022-04-19 | 广东技术师范大学 | Controller with cleaning function |
CN112605055A (en) * | 2020-11-09 | 2021-04-06 | 中广核核电运营有限公司 | Component cleaning device |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6260225A (en) * | 1985-09-10 | 1987-03-16 | Toshiba Ceramics Co Ltd | Cleaning silicon wafer |
US8449662B2 (en) * | 2010-07-29 | 2013-05-28 | Pioneer Astronuatics | Dust repellent surface coating |
CN202336453U (en) * | 2011-10-24 | 2012-07-18 | 昆山众汇复合材料有限公司 | Dust absorption device used in silicon coating machine |
CN202610326U (en) * | 2012-05-22 | 2012-12-19 | 中节能太阳能科技有限公司 | On-line blowing device of plate type plasma enhanced chemical vapor deposition (PECVD) coating of crystalline silicon solar cell |
CN203448343U (en) * | 2013-08-27 | 2014-02-26 | 山东禹城汉能光伏有限公司 | Silica powder clearing device for work rest |
-
2013
- 2013-08-27 CN CN201310377180.0A patent/CN103406314B/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CN103406314A (en) | 2013-11-27 |
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Legal Events
Date | Code | Title | Description |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C56 | Change in the name or address of the patentee |
Owner name: SHANDONG YUCHENG HANERGY THIN FILM SOLAR CO., LTD. Free format text: FORMER NAME: SHANDONG YUCHENG HANERGY PHOTOVOLTAIC CO., LTD. |
|
CP01 | Change in the name or title of a patent holder |
Address after: High tech Zone 251200 Shandong city of Dezhou province Yucheng City revitalization Road hina photovoltaic industrial park Patentee after: SHANDONG YUCHENG HANERGY FILM SOLAR ENERGY CO.,LTD. Address before: High tech Zone 251200 Shandong city of Dezhou province Yucheng City revitalization Road hina photovoltaic industrial park Patentee before: SHANDONG YUCHENG HANERGY PHOTOVOLTAIC Co.,Ltd. |
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TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20190212 Address after: Room 103, Building 2, Office District, Olympic Village, Chaoyang District, Beijing Patentee after: HANERGY PHOTOVOLTAIC TECHNOLOGY Co.,Ltd. Address before: 251200 Haneng Photovoltaic Industrial Park, Revitalization Avenue, Yucheng High-tech Zone, Dezhou City, Shandong Province Patentee before: SHANDONG YUCHENG HANERGY FILM SOLAR ENERGY CO.,LTD. |
|
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20190312 Address after: Room 107, Building 2, Olympic Village Street Comprehensive Office District, Chaoyang District, Beijing Patentee after: HANERGY MOBILE ENERGY HOLDING GROUP Co.,Ltd. Address before: Room 103, Building 2, Office District, Olympic Village, Chaoyang District, Beijing Patentee before: HANERGY PHOTOVOLTAIC TECHNOLOGY Co.,Ltd. |
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CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150325 |