CN103361603A - Vacuum evaporation equipment of semiconductor film material and preparation method of OLED (Organic Light Emitting Diode) conductive layer - Google Patents
Vacuum evaporation equipment of semiconductor film material and preparation method of OLED (Organic Light Emitting Diode) conductive layer Download PDFInfo
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- CN103361603A CN103361603A CN2012100869817A CN201210086981A CN103361603A CN 103361603 A CN103361603 A CN 103361603A CN 2012100869817 A CN2012100869817 A CN 2012100869817A CN 201210086981 A CN201210086981 A CN 201210086981A CN 103361603 A CN103361603 A CN 103361603A
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Abstract
The invention discloses vacuum evaporation equipment of a semiconductor film material, which comprises a vacuum chamber and an evaporator, wherein a driving shaft and a driven shaft are arranged below the evaporator; the driving shaft drives a base material to pass through an evaporation area below the evaporator and rolls the base material passing through the evaporation area; the base material passing through the evaporation area only needs to be rolled on the driving shaft without repeatedly opening the vacuum chamber to take out the base material, thereby improving the coating efficiency. The invention also discloses a method for preparing an OLED conductive layer, which comprises the following steps of: (1) rolling an OLED base material on the driven shaft, threading the base material between a carrier roller and a cooling roller, and connecting the base material to the driving shaft; (2) vacuumizing the vacuum chamber, and keeping the vacuum degree at 30-50Pa; (3) starting the evaporator; (4) starting a motor to drive the driving shaft, and keeping the base material walking at a constant speed; (5) rolling the OLED base material when the driving shaft drives the OLED base material to walk; (6) after the evaporation, closing the evaporator and the motor with the driving shaft, opening the vacuum chamber and taking out the base material.
Description
Technical field
The present invention relates to a kind of vacuum-evaporation appts of semiconductor film material and utilize aforesaid device to prepare the method for OLED conductive layer.
Background technology
Evaporating vacuum plating is to make it be deposited on solid surface by certain material of heating evaporation, is called evaporation coating.This method is proposed in 1857 by M. faraday the earliest, and the modern times have become one of coating technique commonly used.Evaporating and coating equipment evaporated material such as metal, compound etc. place in the crucible or hang on the heated filament as evaporation source, and workpiece to be plated places crucible the place ahead such as substrates such as metal, pottery, plastics.
After system was evacuated to high vacuum, heating crucible made material evaporation wherein.Atom or the molecule of evaporated material are deposited on substrate surface with condensing mode.Film thickness can be by hundreds of dusts to several microns.Thickness is decided by vaporator rate and the time (or being decided by charge amount) of evaporation source, and with the distance dependent of source and substrate.For large-area coating film, often adopt the mode of rotary substrate or multi-vaporizing-source to guarantee the homogeneity of thicknesses of layers.
In above-mentioned coating process, plated film need in each coating process, need to repeatedly vacuumize in vacuum process, then opens vacuum chamber, again vacuumizes, plated film, opens vacuum chamber, and is so repeatedly, very inconvenient.
Summary of the invention
Technical problem to be solved by this invention provides the vacuum-evaporation appts of the high semiconductor film material of a kind of plated film efficient and utilizes aforesaid device to prepare the method for OLED conductive layer.
In order to solve above-mentioned technical problem, technical scheme of the present invention is: a kind of vacuum-evaporation appts of semiconductor film material, comprise the vaporizer in vacuum chamber and the vacuum chamber, described vaporizer below is provided with main drive shaft and driven shaft, described main drive shaft drives semiconductor film material base material on the driven shaft by the evaporating area under the vaporizer, and the semiconductor film material base material by evaporating area is batched.
Be provided with cooling roller between described main drive shaft and driven shaft, described cooling roller both sides are provided with carrying roller, and the semiconductor film material base material on the driven shaft passes with main drive shaft between carrying roller and cooling roller and is connected.
Be provided with dividing plate above described cooling roller, described dividing plate is with the evaporating area isolation of vaporizer.
Utilize the vacuum-evaporation appts of above-mentioned semiconductor film material to prepare the method for OLED conductive layer, it may further comprise the steps:
(1) with the OLED rolls on driven shaft, the OLED base material passes between carrying roller and the cooling roller, then is connected on the main drive shaft;
(2) vacuum chamber is vacuumized, keep vacuum tightness 30-50Pa;
(3) open vaporizer, the evaporator surface temperature is elevated to 960-1050 ℃, keeps 5-10 minute;
(4) starter motor drives main drive shaft, keeps the at the uniform velocity walking of OLED base material, and the speed of travel is 0.16-1mm/s;
(5) main drive shaft batches the OLED base material when driving the walking of OLED base material;
(6) when the OLED base material on the driven shaft is evaporated, close vaporizer and main drive shaft motor, after 10-15 minute, open vacuum chamber, take out the OLED base material that has been formed with conductive layer.
The present invention in coating process, the base material by evaporating area only need to twist on the main drive shaft just can, do not need the vacuum chamber of opening repeatedly to take out base material, improve the efficient of plated film.
Description of drawings
The present invention is further detailed explanation below in conjunction with the drawings and specific embodiments.
Accompanying drawing is the structural representation of the vacuum-evaporation appts of semiconductor film material of the present invention.
Embodiment
As shown in drawings, a kind of vacuum-evaporation appts of semiconductor film material, comprise the vaporizer 7 in vacuum chamber 1 and the vacuum chamber 1, described vaporizer 7 belows are provided with main drive shaft 2 and driven shaft 3, described main drive shaft 2 drives the evaporating area that the semiconductor film material base material 8 on the driven shaft 3 passes through under the vaporizer 7, and the semiconductor film material base material 8 by evaporating area is batched.
Be provided with cooling roller 4 between described main drive shaft 2 and driven shaft 3, described cooling roller 4 both sides are provided with carrying roller 5, and the semiconductor film material base material 8 on the driven shaft 3 passes with main drive shaft 2 between carrying roller 5 and cooling roller 4 and is connected.
In order to prevent polluting, above described cooling roller 4, be provided with dividing plate 6, described dividing plate 6 is with the evaporating area isolation of vaporizer 7.
In coating process, the base material by evaporating area only need to twist on the main drive shaft 2 just can, do not need the vacuum chamber of opening repeatedly to take out base material, improve the efficient of plated film.
Utilize the vacuum-evaporation appts of above-mentioned semiconductor film material to prepare the method for OLED conductive layer, it may further comprise the steps:
(1) with the OLED rolls on driven shaft 3, the OLED base material passes between carrying roller 5 and the cooling roller 4, then is connected on the main drive shaft 2;
(2) vacuum chamber 1 is vacuumized, keep vacuum tightness 30-50Pa;
(3) open vaporizer 7, the evaporator surface temperature is elevated to 960-1050 ℃, keeps 5-10 minute;
(4) starter motor drives main drive shaft 2, keeps the at the uniform velocity walking of OLED base material, and the speed of travel is 0.16-1mm/s;
(5) main drive shaft 2 batches the OLED base material when driving the walking of OLED base material;
(6) when the OLED base material on the driven shaft 3 is evaporated, close vaporizer 7 power supplys and main drive shaft 2 motors, after 10-15 minute, open vacuum chamber 1, take out the OLED base material that has been formed with conductive layer.
Above-described embodiment does not limit the present invention in any way, and every employing is equal to replaces or technical scheme that the mode of equivalent transformation obtains all drops in protection scope of the present invention.
Claims (4)
1. the vacuum-evaporation appts of a semiconductor film material, comprise the vaporizer (7) in vacuum chamber (1) and the vacuum chamber (1), it is characterized in that: described vaporizer (7) below is provided with main drive shaft (2) and driven shaft (3), semiconductor film material base material (8) on described main drive shaft (2) the drive driven shaft (3) passes through the evaporating area under the vaporizer (7), and the semiconductor film material base material (8) by evaporating area is batched.
2. the vacuum-evaporation appts of semiconductor film material according to claim 1, it is characterized in that: between described main drive shaft (2) and driven shaft (3), be provided with cooling roller (4), described cooling roller (4) both sides are provided with carrying roller (5), and the semiconductor film material base material (8) on the driven shaft (3) passes with main drive shaft (2) between carrying roller (5) and cooling roller (4) and is connected.
3. the vacuum-evaporation appts of semiconductor film material according to claim 2 is characterized in that: be provided with dividing plate (6) in the top of described cooling roller (4), described dividing plate (6) is with the evaporating area isolation of vaporizer (7).
4. a vacuum-evaporation appts that utilizes semiconductor film material prepares the method for OLED conductive layer, it is characterized in that may further comprise the steps:
(1) with the OLED rolls on driven shaft, the OLED base material passes between carrying roller and the cooling roller, then is connected on the main drive shaft;
(2) vacuum chamber is vacuumized, keep vacuum tightness 30-50Pa;
(3) open vaporizer, the evaporator surface temperature is elevated to 960-1050 ℃, keeps 5-10 minute;
(4) starter motor drives main drive shaft, keeps the at the uniform velocity walking of OLED base material, and the speed of travel is 0.16-1mm/s;
(5) main drive shaft batches the OLED base material when driving the walking of OLED base material;
(6) after the OLED base material on the driven shaft evaporates, close vaporizer power supply and main drive shaft motor, after 10-15 minute, open again vacuum chamber, take out the OLED base material that has been formed with conductive layer.
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CN2012100869817A CN103361603A (en) | 2012-03-29 | 2012-03-29 | Vacuum evaporation equipment of semiconductor film material and preparation method of OLED (Organic Light Emitting Diode) conductive layer |
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CN2012100869817A CN103361603A (en) | 2012-03-29 | 2012-03-29 | Vacuum evaporation equipment of semiconductor film material and preparation method of OLED (Organic Light Emitting Diode) conductive layer |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2015135781A (en) * | 2014-01-20 | 2015-07-27 | コニカミノルタ株式会社 | Method of manufacturing organic electroluminescent element |
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CN101578707A (en) * | 2006-11-10 | 2009-11-11 | 索罗能源公司 | Reel-to-reel reaction of precursor film to form solar cell absorber |
WO2011031407A1 (en) * | 2009-09-11 | 2011-03-17 | General Electric Company | Apparatus and methods to form a patterned coating on an oled substrate |
CN102113092A (en) * | 2008-08-04 | 2011-06-29 | 美国迅力光能公司 | Roll-to-roll continuous thin film PV manufacturing process and equipment with real time online IV measurement |
CN202090053U (en) * | 2011-05-04 | 2011-12-28 | 金博新能源技术(香港)有限公司 | Reel-to-reel continuous coating film production line for solar spectrum selective-absorbing coatings |
CN102610700A (en) * | 2012-04-05 | 2012-07-25 | 复旦大学 | Method for manufacturing flexible thin film solar cells in coil-to-coil way |
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- 2012-03-29 CN CN2012100869817A patent/CN103361603A/en active Pending
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
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CN101167160A (en) * | 2005-04-22 | 2008-04-23 | Vitex系统公司 | Apparatus for depositing a multilayer coating on discrete sheets |
CN101578707A (en) * | 2006-11-10 | 2009-11-11 | 索罗能源公司 | Reel-to-reel reaction of precursor film to form solar cell absorber |
CN102113092A (en) * | 2008-08-04 | 2011-06-29 | 美国迅力光能公司 | Roll-to-roll continuous thin film PV manufacturing process and equipment with real time online IV measurement |
WO2011031407A1 (en) * | 2009-09-11 | 2011-03-17 | General Electric Company | Apparatus and methods to form a patterned coating on an oled substrate |
CN202090053U (en) * | 2011-05-04 | 2011-12-28 | 金博新能源技术(香港)有限公司 | Reel-to-reel continuous coating film production line for solar spectrum selective-absorbing coatings |
CN102610700A (en) * | 2012-04-05 | 2012-07-25 | 复旦大学 | Method for manufacturing flexible thin film solar cells in coil-to-coil way |
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JP2015135781A (en) * | 2014-01-20 | 2015-07-27 | コニカミノルタ株式会社 | Method of manufacturing organic electroluminescent element |
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Application publication date: 20131023 |