CN103345010A - Micro-lens array element manufacturing method based on polydimethylsiloxane template - Google Patents
Micro-lens array element manufacturing method based on polydimethylsiloxane template Download PDFInfo
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- CN103345010A CN103345010A CN2013102900486A CN201310290048A CN103345010A CN 103345010 A CN103345010 A CN 103345010A CN 2013102900486 A CN2013102900486 A CN 2013102900486A CN 201310290048 A CN201310290048 A CN 201310290048A CN 103345010 A CN103345010 A CN 103345010A
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Abstract
The invention discloses a micro-lens array element manufacturing method based on a polydimethylsiloxane template. The method includes the following steps of firstly, manufacturing a target structure mask plate; secondly, transferring patterns of the target structure mask plate onto a glass substrate to obtain a photoresist micro-lens array template; thirdly, mixing polydimethylsiloxane and a curing agent, pouring the mixture on the surface of the photoresist micro-lens array template, solidifying and stripping the mixture, and manufacturing the polydimethylsiloxane template with a micro-lens array structure; fourthly, coating ultraviolet solidifying adhesive on the glass substrate; fifthly, enabling the structural face of the polydimethylsiloxane template to be tightly attached to the glass substrate which is coated by the ultraviolet solidifying adhesive, and solidifying the ultraviolet solidifying adhesive through ultraviolet irradiation; sixthly, stripping the polydimethylsiloxane template from the glass substrate to obtain a micro-lens array element with the ultraviolet solidifying adhesive as a structural layer and with glass as a base. According to the micro-lens array element manufacturing method based on the polydimethylsiloxane template, the optical performance of the micro-lens array element is ensured, and rapid volume production can be achieved.
Description
Technical field
The invention belongs to the Micrometer-Nanometer Processing Technology field, be a kind of new method of making microlens array elements, this element adopts photoetching technique to cooperate the soft stamping technique of dimethyl silicone polymer to be made.
Background technology
In recent years, development along with Micrometer-Nanometer Processing Technology and optical material, widening of laser application, optical element has been not only traditional refractor, prism and catoptron, but expand towards large and microminaturization, also more and more be applied in the various photoelectron instruments such as novel optical elements such as microlens array elements, make the miniaturization and integrated more of photoelectron instrument and parts thereof.Microlens array elements is to make the key element of low profile photovoltaic subsystem, and it has advantages such as volume is little, quality is light, and new functions such as small, the array that can realize that the ordinary optical element is difficult to realize, integrated, imaging and corrugated conversion.Can be widely used in fields such as optical-fibre communications, LED illumination, automotive lighting, digital camera, biologic medical.
Aspect making, microlens array elements is that design theory or process technology all are different from macroscopical optics.It is to process by means of modern Micrometer-Nanometer Processing Technology, comprises electron-beam direct writing, laser direct-writing, photoetching technique, lithographic technique, plated film and reproduction technology, thereby produces micro relief profile.
The material that traditional lenticular lens elements is used mainly is quartz glass and silicon, and these materials will make the lens moulding all need to adopt dry etching, dry etching production cost height, the production cycle is long and rejection rate is higher, and is particularly difficult when making the lenticule of big rise.
Summary of the invention
To overcome prior art problems in order solving, to the invention provides a kind of employing conventional lithography process and make low-cost, high-quality lenticular lens elements manufacture method in conjunction with the soft stamping technique of dimethyl silicone polymer.
The invention provides the microlens array elements method for making based on the dimethyl silicone polymer template, its characteristics are to comprise the following steps:
Step S1: make the object construction mask plate;
Step S2: object construction mask plate graph transfer printing to glass substrate, is obtained photoresist microlens array masterplate;
Step S3: dimethyl silicone polymer is mixed with hardening agent, and be cast in photoresist microlens array reticle surface and solidify, the dimethyl silicone polymer film and the photoresist microlens array masterplate that are cured are peeled off, finished and have microlens array structure dimethyl silicone polymer template;
Step S4: spin coating one deck ultraviolet curing glue on glass substrate;
Step S5: the dimethyl silicone polymer formwork structure face of making and spin coating the glass substrate of ultraviolet curing glue fit tightly and use UV-irradiation, treat that ultra-violet curing glue solidifies fully;
Step S6: dimethyl silicone polymer template and glass substrate are peeled off, obtained making structural sheet by ultraviolet curing glue, glass is made the microlens array elements of substrate.
The present invention compared with prior art mainly contains following advantage: adopt high-precision micro-lithography process technology technology and the soft impression of organic material to combine, both guarantee the optical property of the microlens array elements of manufacturing, and can realize the rapid batch production that traditional lenticule process technology can't realize again.
1. the material of traditional lenticular lens elements use mainly is quartz glass and silicon, and these materials will make the lens moulding all need to adopt dry etching, dry etching production cost height, the production cycle is long and rejection rate is higher, and is particularly difficult when making the lenticule of big rise, and the present invention adopts ultra-violet curing glue as the lens moulding material, need not dry etching, only need to use ultraviolet light polymerization, not only with short production cycle, the yield rate height, and also unrestricted to lenticular rise.
2. the present invention adopts the soft impression process technology of dimethyl silicone polymer can realize the face type zero error transmission of lenticule from photoresist to UV glue, and traditional lenticular lens elements process technology can't realize.
Description of drawings
Fig. 1 is the process flow diagram of the inventive method.
Fig. 2 is the photoresist lenticule template that the embodiment of the invention 1 adopts photoetching method to make.
Fig. 3 is the dimethyl silicone polymer template that the embodiment of the invention 1 utilizes photoresist lenticule template to reprint.
Fig. 4 is the ultra-violet curing glue lenticule that the embodiment of the invention 1 utilizes the soft impression of dimethyl silicone polymer template to make.
Fig. 5 is the ultra-violet curing glue lenticule that the embodiment of the invention 2 utilizes the soft impression of dimethyl silicone polymer template to make.
Fig. 6 is the ultra-violet curing glue lenticule that the embodiment of the invention 3 utilizes the soft impression of dimethyl silicone polymer template to make.
Embodiment
For making the purpose, technical solutions and advantages of the present invention clearer, below in conjunction with specific embodiment, and with reference to accompanying drawing, the present invention is described in more detail.
Fig. 1 illustrates the microlens array elements method for making process flow diagram that the invention provides based on the dimethyl silicone polymer template, and its characteristics are to comprise the following steps:
Step S1: adopt laser direct-writing machine or electron-beam direct writing mechanism to make the object construction mask plate; The resolution of laser direct-writing machine is 0.5 micron, and the precision of electron-beam direct writing machine more is better than laser direct-writing, when making greater than micron-sized figure, is precision and the consistance that can guarantee the microcell figure fully;
Step S2: the application photoetching technique to glass substrate, obtains photoresist microlens array masterplate to object construction mask plate graph transfer printing; With the mask plate of making the photoresist resist is exposed, can obtain the micro relief profile of photoresist resist material after the development; Determine the exposure that needs apply according to the degree of depth of target embossment structure, and parameter such as solution level, development time.At first obtain microlens structure on photoresist resist surface by exposure, development;
Step S3: dimethyl silicone polymer is mixed in 1 to 5 ground ratio with hardening agent, be cast in photoresist microlens array reticle surface, the environment of putting into 50 ℃-85 ℃ then solidified 2-3 hour, after treating that dimethyl silicone polymer solidifies fully, the dimethyl silicone polymer film and the photoresist microlens array masterplate that are cured are peeled off, finished and have microlens array structure dimethyl silicone polymer template construct;
Step S4: spin coating one deck ultraviolet curing glue on the glass substrate that cleans up, the thickness of ultraviolet curing glue should be greater than photoresist lenticule rise 50%-100%;
Step S5: the dimethyl silicone polymer formwork structure face of making and spin coating the glass substrate of ultraviolet curing glue fit tightly, be 365nm (I line) with wavelength then, light intensity is 300mw/cm
2UV-irradiation more than 1 hour, treat that ultraviolet curing glue solidifies fully,
Step S6: dimethyl silicone polymer template and completely crued ultraviolet curing glue glass substrate are peeled off, obtained making the microlens array elements that structural sheet, glass are done substrate by ultraviolet curing glue.
Embodiment 1, is directly to be 25 microns microlens array structure for 0.5mm * 0.145mm, rise by the rim of the mouth that method of the present invention is made.
Step 1: at first design the lenticule photo mask board, determine lenticular size, shape, number of arrays.The design microlens shape is rectangle, size 0.5mm * 0.145mm, number of arrays 200 * 688, the object construction mask plate that utilizes laser direct-writing mechanism to make according to the mask plate data of design again;
Step 2: adopt the object construction mask plate of making that resist is exposed, develop; According to the degree of depth of photoresist, we adopt exposure 10mJ/cm
2, developer solution MF319, concentration 100%, development time 145s.Obtain required microlens array stencil structure by the photoresist surface of exposing, be developed in, see Fig. 2;
Step 3: dimethyl silicone polymer is mixed in 1 to 5 ratio with hardening agent, be cast in photoresist microlens array reticle surface, the baking oven of putting into 60 ℃ then solidified 2.7 hours, after treating that dimethyl silicone polymer solidifies fully, the dimethyl silicone polymer film and the photoresist microlens array masterplate that are cured are peeled off, finish and have microlens array structure dimethyl silicone polymer template construct, see Fig. 3;
Step 4: photoresist figure rise is 25 microns, according to the rise of photoresist figure, and spin coating one deck X31213 ultra-violet curing glue on the glass substrate that cleans up, its thickness is 40 microns;
Step 5: the dimethyl silicone polymer formwork structure face of making and spin coating the glass substrate of X31213 ultraviolet curing glue fit tightly, be that 365nm, light intensity are 300mw/cm with wavelength then
2UV-irradiation 2 hours, treat that the X31213 ultraviolet curing glue solidifies fully;
Step 6: dimethyl silicone polymer template and completely crued X31213 ultraviolet curing glue glass substrate are peeled off, obtained making structural sheet by ultra-violet curing glue, glass is made the microlens array elements of substrate.See Fig. 4.
Embodiment 2:
Step 1: at first design the lenticule photo mask board, determine lenticular size, shape, number of arrays.Design shape is half-cylindrical, unit size 0.5mm * 20mm, again the object construction mask plate that utilizes laser direct-writing mechanism to make according to the mask plate data of design;
Step 2: adopt the object construction mask plate of making that resist is exposed, develop; According to the degree of depth of photoresist, we adopt exposure 8mJ/cm
2, developer solution MF319, concentration 100%, development time 160s.The photoresist surface obtains required microlens structure, 22.15 microns of lenticule rises by exposing, being developed in;
Step 3: dimethyl silicone polymer is mixed in 1 to 5 ground ratio with hardening agent, be cast in photoresist microlens array reticle surface, the environment of putting into 85 ℃ then solidified 2 hours, after treating that dimethyl silicone polymer solidifies fully, the dimethyl silicone polymer film and the photoresist microlens array masterplate that are cured are peeled off, finished and have microlens array structure dimethyl silicone polymer template construct;
Step 4: photoresist figure rise is 22.15 microns, according to the rise of photoresist figure, and spin coating one deck X31213 ultra-violet curing glue on the glass substrate that cleans up, its thickness is 33 microns;
Step 5: the dimethyl silicone polymer formwork structure face of making and spin coating the glass substrate of X31213UV glue fit tightly, be that 365nm, light intensity are 300mw/cm with wavelength then
2UV-irradiation 1.5 hours, treat that X31213UV glue solidifies fully;
Step 6: dimethyl silicone polymer template and completely crued X31213 ultraviolet curing glue glass substrate are peeled off, obtained making structural sheet by ultra-violet curing glue, glass is made the microlens array elements of substrate.See Fig. 5.
Embodiment 3:
Step 1: at first design the lenticule photo mask board, determine lenticular size, shape, number of arrays.The design shape is Fresnel microlens, unit size 0.5mm * 20mm, again the object construction mask plate that utilizes laser direct-writing mechanism to make according to the mask plate data of design;
Step 2: adopt the object construction mask plate of making that resist is exposed, develop; According to the degree of depth of photoresist, we adopt exposure 1mJ/cm
2, developer solution MF319, concentration 100%, development time 60s.The photoresist surface obtains required photoresist microlens structure, 1.5 microns of lenticule rises by exposing, being developed in;
Step 3: dimethyl silicone polymer is mixed in 1 to 5 ground ratio with hardening agent, be cast in photoresist microlens array reticle surface, the environment of putting into 50 ℃ then solidified 3 hours, after treating that dimethyl silicone polymer solidifies fully, the dimethyl silicone polymer film and the photoresist microlens array masterplate that are cured are peeled off, finished and have microlens array structure dimethyl silicone polymer template construct;
Step 4: photoresist figure rise is 1.5 microns, according to the rise of photoresist figure, and on the glass substrate that cleans up, spin coating one deck X31213 ultra-violet curing glue, the thickness of X31213 ultra-violet curing glue is 3 microns;
Step 5: the dimethyl silicone polymer formwork structure face of making and spin coating the glass substrate of X31213UV glue fit tightly, be that 365nm, light intensity are 300mw/cm with wavelength then
2UV-irradiation 1 hour, treat that X31213UV glue solidifies fully;
Step 6: dimethyl silicone polymer template and completely crued X31213 ultraviolet curing glue glass substrate are peeled off, obtained making structural sheet by ultra-violet curing glue, glass is made the microlens array elements of substrate.See Fig. 6.
The above; only be the embodiment among the present invention, but protection scope of the present invention is not limited thereto, anyly is familiar with the people of this technology in the disclosed technical scope of the present invention; conversion or the replacement expected can be understood, all of the present invention comprising within the scope should be encompassed in.
Claims (6)
1. the microlens array elements method for making based on the dimethyl silicone polymer template is characterized in that, comprises the following steps:
Step S1: make the object construction mask plate;
Step S2: object construction mask plate graph transfer printing to glass substrate, is obtained photoresist microlens array masterplate;
Step S3: dimethyl silicone polymer is mixed with hardening agent, and be cast in photoresist microlens array reticle surface and solidify, the dimethyl silicone polymer film and the photoresist microlens array masterplate that are cured are peeled off, finished and have microlens array structure dimethyl silicone polymer template construct;
Step S4: spin coating one deck ultraviolet curing glue on glass substrate;
Step S5: the dimethyl silicone polymer formwork structure face of making and spin coating the glass substrate of ultraviolet curing glue fit tightly and use UV-irradiation, treat that ultra-violet curing glue solidifies fully;
Step S6: dimethyl silicone polymer template and glass substrate are peeled off, obtained making structural sheet by ultraviolet curing glue, glass is made the microlens array elements of substrate.
2. according to the described microlens array elements method for making based on the dimethyl silicone polymer template of claim 1, it is characterized in that described object construction mask plate adopts laser direct-writing machine or electron-beam direct writing mechanism to do.
3. according to the described microlens array elements method for making based on the dimethyl silicone polymer template of claim 1, it is characterized in that, adopt to use photoetching technique object construction mask plate graph transfer printing to glass substrate.
4. according to the described microlens array elements method for making based on the dimethyl silicone polymer template of claim 1, it is characterized in that described photoresist microlens array masterplate is curing in 2-3 hour in 50 ℃-85 ℃ environment.
5. according to the described microlens array elements method for making based on the dimethyl silicone polymer template of claim 1, it is characterized in that described ultraviolet curing glue thickness is greater than the 50%-100% of photoresist lenticule rise.
6. according to the described microlens array elements method for making based on the dimethyl silicone polymer template of claim 1, it is characterized in that, to dimethyl silicone polymer formwork structure face and spin coating the glass substrate 300mw/cm of ultraviolet curing glue
2UV-irradiation more than 1 hour.
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| CN104503007A (en) * | 2014-12-12 | 2015-04-08 | 成都纳光科技有限公司 | Manufacturing method of micro-lens array |
| CN105334553A (en) * | 2015-10-30 | 2016-02-17 | 电子科技大学 | Manufacturing method for magnetron micro-lens array based on PDMS-magnetic nanoparticle composite thin film |
| CN108594596A (en) * | 2018-04-28 | 2018-09-28 | 广西民族大学 | A method of making dimpling lens using PDMS |
| WO2020224252A1 (en) * | 2019-05-06 | 2020-11-12 | 苏州苏大维格科技集团股份有限公司 | Preparation method for micro-nano structure for use in glass anti-counterfeiting |
| CN112596134A (en) * | 2020-12-04 | 2021-04-02 | 西安交通大学 | Preparation method and optical performance detection method of optical waveguide micro-lens array |
| CN114296161A (en) * | 2021-12-28 | 2022-04-08 | 华中科技大学 | Large-area-array three-dimensional spherical micro-lens array and preparation method thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN105334553B (en) * | 2015-10-30 | 2017-08-08 | 电子科技大学 | Magnetic control fabricating method of microlens array based on PDMS magnetic nano-particle laminated films |
| CN108594596A (en) * | 2018-04-28 | 2018-09-28 | 广西民族大学 | A method of making dimpling lens using PDMS |
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| CN112596134A (en) * | 2020-12-04 | 2021-04-02 | 西安交通大学 | Preparation method and optical performance detection method of optical waveguide micro-lens array |
| CN112596134B (en) * | 2020-12-04 | 2022-03-22 | 西安交通大学 | Preparation method and optical performance detection method of optical waveguide micro-lens array |
| CN114296161A (en) * | 2021-12-28 | 2022-04-08 | 华中科技大学 | Large-area-array three-dimensional spherical micro-lens array and preparation method thereof |
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Application publication date: 20131009 |