CN103329035A - 多孔性电极片及其制造方法以及显示装置 - Google Patents
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Abstract
多孔性电极片(1)具备透明且具有绝缘性的树脂薄膜(2)和层叠在树脂薄膜(2)的一个表面(2a)上的透明电极(3)。树脂薄膜(2)中设置有从一个表面(2a)到另一个表面(2b)呈直线延伸的多个通孔(21)。透明电极(3)在与通孔(21)各自对应的位置处具有开口(31)。树脂薄膜(2)的通孔(21)和透明电极(3)的开口(31)相互连通而形成沿厚度方向贯通多孔性电极片(1)的通路(10)。
Description
技术领域
本发明涉及在透明的绝缘层上层叠有透明电极的多孔性电极片及其制造方法。另外,本发明涉及使用该多孔性电极片的显示装置。
背景技术
以往在各种装置中使用透明电极。透明电极一般层叠在透明的基板或绝缘层上。例如,专利文献1中公开了如图4所示的电致变色方式的多色显示装置100。
该显示装置100中,显示基板11与对置基板12隔着垫片18贴合,由此形成单元。在单元内,在显示基板11侧层叠有第一显示电极13a、第一电致变色层14a、绝缘层15、第二显示电极13b和第二电致变色层14b,在对置基板12侧层叠有对置电极17和白色反射层16。另外,单元内填充有电解质19。
第一显示电极13a和第二显示电极13b为透明电极。通过控制施加在第一显示电极13a与对置电极17之间的电压,使第一电致变色层14a发出第一种颜色或成为无色。通过控制施加在第二显示电极13b与对置电极17之间的电压,使第二电致变色层14b发出与第一种颜色不同的第二种颜色或成为无色。
第一电致变色层14a和第二电致变色层14b一般具有在金属氧化物上负载有电致变色化合物的构成。作为金属氧化物,有时也使用具有导电性的金属氧化物。绝缘层15用于能够分别对第一显示电极13a和第二显示电极13b的电位进行控制。另外,绝缘层15是透明的,并且是多孔的,以使电解质19渗透到内部从而能够使离子伴随氧化还原反应而迁移。
现有技术文献
专利文献
专利文献1:日本特开2010-33016号公报
发明内容
发明所要解决的问题
专利文献1中,作为用于形成多孔的绝缘层15的具体方法,记载了对含有ZnS的无机材料进行溅射的方法。但是,在通过溅射形成绝缘层15的情况下,难以使绝缘层15的厚度在广泛的面积内保持均匀。而且,绝缘层15的厚度不均匀时,在较薄的部分绝缘性受损,在较厚的部分透明性受损。
鉴于这种情况,本发明的目的在于提供能够确保沿透明电极具有均匀厚度的绝缘层的多孔性电极片及其制造方法。另外,本发明的目的在于提供使用该多孔性电极片的显示装置。
用于解决问题的手段
即,本发明提供一种多孔性电极片,其具备:设置有从一个表面到另一个表面呈直线延伸的多个通孔、透明且具有绝缘性的树脂薄膜和层叠在所述树脂薄膜的所述一个表面上且在与所述多个通孔各自对应的位置处具有开口的透明电极。
另外,本发明提供具备上述多孔性电极片的显示装置。
此外,本发明提供一种多孔性电极片制造方法,包括:对透明且无孔的树脂基材照射离子束而形成以沿厚度方向贯通该树脂基材的方式延伸的多条改性径迹的工序,通过以所述改性径迹为基点对所述树脂基材进行化学蚀刻而得到具有多个通孔的树脂薄膜的工序和在所述树脂薄膜的一个表面上形成在与所述多个通孔各自对应的位置处具有开口的透明电极的工序。
发明效果
上述构成中,透明电极层叠在树脂薄膜的一个表面上。能够容易地制作在广泛的面积内具有均匀厚度的树脂薄膜。因此,使用树脂薄膜时,能够确保沿透明电极具有均匀厚度的绝缘层。而且,本发明的多孔性电极片中,由树脂薄膜的通孔与透明电极的开口形成沿厚度方向贯通多孔性电极片的通路,因此,在例如绝缘层以与电致变色层接触的方式配置的情况下,离子也能够通过该通路进行迁移。
与电致变色层接触的以往的绝缘层是孔不具有方向性的多孔绝缘层,因此,离子不能在绝缘层内顺畅地迁移。与此相对,本发明中,通过上述通路使离子以用最短距离通过多孔性电极片的方式迁移,因此,能够提高氧化还原反应的速度。即,在将多孔性电极片用于电致变色方式的显示装置的情况下,显示装置的性能提高。
附图说明
图1A是本发明的一个实施方式的多孔性电极片的立体图,图1B是该多孔性电极片的截面图。
图2是使用图1的多孔性电极片的多色显示装置的概略构成图。
图3是使用图1的多孔性电极片的单色显示装置的概略构成图。
图4是现有显示装置的概略构成图。
具体实施方式
以下,参考附图对本发明的实施方式进行说明。
<多孔性电极片>
图1A和1B中示出了本发明的一个实施方式的多孔性电极片1。该多孔性电极片1具备透明且具有绝缘性的树脂薄膜2和层叠在树脂薄膜2的一个表面2a上的透明电极3。
树脂薄膜2能够容易地制作成在广泛的面积内具有均匀厚度的树脂薄膜。因此,使用树脂薄膜2的多孔性电极片1中,能够确保沿透明电极3具有均匀厚度的绝缘层。
多孔性电极片1的形状没有特别限定。例如,多孔性电极片1在俯视时(从厚度方向观察时)可以为矩形,也可以为圆形或圆角多边形。
树脂薄膜2中设置有从一个表面2a到另一个表面2b呈直线延伸的多个通孔21。换言之,通孔21为不具有分支的直孔。这种具有通孔21的树脂薄膜2可以通过如下方法制作:对透明且无孔的树脂基材照射离子束而形成以沿厚度方向贯通该树脂基材的方式延伸的多条改性径迹(树脂改性而形成的线状部分),然后,以改性径迹为基点对树脂基材进行化学蚀刻。
通过如上所述的离子束照射与化学蚀刻组合而成的穿孔技术制作的制品正在广泛市售,作为树脂薄膜2,可以使用这些市售品(例如,オキシフェン公司或ミリポア公司销售的膜滤器)。
离子束能够在短时间内对广泛的面积进行照射,并且能够进行高密度的照射。另外,也可以与树脂基材成角度地从斜向照射离子束。离子束的照射优选使用重离子。这是因为,使用重离子时,能够形成长度与孔径之比(所谓的长径比)为1万以上的极细长的通孔21。例如,可以利用回旋加速器使重离子加速后,朝向树脂基材进行发射。
在此,“孔径”是指将通孔21的截面形状看作圆时的圆的直径,换言之,是指面积与通孔21的截面积相同的圆的直径。
将改性径迹的树脂除去的化学蚀刻中,使用碱溶液等蚀刻液。通过该化学蚀刻,可以控制通孔21的孔径和截面形状。
通孔21的截面形状没有特别限定,可以为圆形,也可以为不定形。通孔21的平均孔径优选为0.05μm以上且100μm以下。但是,在多孔性电极片1如后所述与电致变色层接触而配置的情况下,通孔21的最大孔径优选比负载电致变色化合物的金属氧化物的平均粒径小。更优选通孔21的平均孔径为0.1μm以上且10μm以下。
通孔21的密度优选在树脂薄膜2的整个面内落入10~1×108个/cm2的范围中的特定区域(例如,最大密度为最小密度的1.5倍以下)。通孔21的密度可以通过离子束照射时的离子照射数来调节。更优选通孔21的密度在1×103~1×107个/cm2的范围内。
通孔21的长径比优选为5以上。
树脂薄膜2的厚度为例如10~100μm。作为树脂薄膜2的具体例,可以列举作为透明绝缘性薄膜的聚对苯二甲酸乙二醇酯(PET)薄膜、聚萘二甲酸乙二醇酯(PEN)薄膜、聚碳酸酯(PC)薄膜。
透明电极3在与通孔21各自对应的位置处具有开口31。即,树脂薄膜2的通孔21与透明电极3的开口31相互连通而形成沿厚度方向贯通多孔性电极片1的通路10。
形成具有开口31的透明电极3时,通过溅射法、电子束法、离子喷镀法、真空蒸镀法和化学气相沉积法(CVD法)等在树脂薄膜的一个表面2a上直接形成导电膜即可。
透明电极3优选由氧化铟锡膜(ITO膜)构成。但是,透明电极3也可以由例如掺杂氟的氧化锡膜(FTO膜)、掺杂锑、铟或铝的氧化锌膜等构成。
<显示装置>
接着,对本实施方式的多孔性电极片1的使用例进行说明。图2中示出了使用多孔性电极片1的电致变色方式的多色显示装置10A。另外,对于与在背景技术一栏中参考图4说明过的构成相同的部分标注相同的符号,并省略其说明。
该显示装置10A中,配设有第一电致变色层14a操作用的第一透明电极4来代替图4的第一显示电极13a,配设有多孔性绝缘片1来代替图4的第二显示电极13b和绝缘层15。即,多孔性电极片1以使树脂薄膜2夹着第一电致变色层14a与第一透明电极41相对并且透明电极3与第二电致变色层14b接触的方式配置。多孔性绝缘片1的透明电极3为第二电致变色层14b操作用的第二透明电极。
另外,配设有寻址电极5来代替图4的对置电极17。单元内填充有电解质19,因此,寻址电极5夹着由电解质19充满的空间与多孔性电极片1对置。
这样,将多孔性电极片1用于显示装置10A时,由于多孔性电极片1中形成有沿厚度方向贯通该多孔性电极片1的通路10(参考图1B),因此,离子能够通过该通路10进行迁移。
图4所示的现有显示装置100中,与第一电致变色层14a接触的绝缘层15是孔不具有方向性的多孔绝缘层,因此,离子不能在绝缘层15内顺畅地迁移。与此相对,图2所示的显示装置10A中,通过通路10使离子以用最短距离通过多孔性电极片1的方式迁移,因此,能够提高氧化还原反应的速度。即,利用多孔性电极片1能够提高显示装置10A的性能。
另外,树脂薄膜2通常在浸渍到液体中时透明度增加,因此,使用液体作为电解质19时,显示装置10A的视认性提高。而且,这种电解液保持在通孔21中,因此,树脂薄膜2在柔性运动下也能够维持透明性。因此,多孔性电极片1特别适合电子纸等要求柔性的用途。
此外,多孔性电极片1中,树脂薄膜2侧的表面是平滑的,因此,与层叠于其上的电致变色层(特别是金属氧化物)的密合性提高。另外,树脂薄膜2的通孔21与形成在由无机材料构成的多孔绝缘层内的空隙相比能够坚固地维持形状,因此还能够有助于提高显示装置的制造成品率。
另外,本实施方式的多孔性电极片1也可以用于电致变色方式的单色显示装置。将这种情况下的构成的一例示于图3中。
图3所示的显示装置10B中,多孔性电极片1以与显示基板11夹持电致变色层14的方式配置。更详细而言,多孔性电极片1的透明电极3在显示基板11侧与电致变色层14接触,树脂薄膜2面向由电解质19充满的空间。
该构成中,不需要在作为外侧阻挡层的显示基板11上形成透明电极,因此可以使用塑料这样的柔性阻挡薄膜作为显示基板11。现有的显示装置中,要在透明电极所在的位置处用垫片将显示基板与对置基板之间进行密封时,由于透明电极与垫片的接合性而存在耐久性的问题。但是,使用多孔性电极片1时,不需要在显示基板11上形成透明电极,因此,能够使相同或类似的材质相互接合,由此能够得到良好的耐久性。
实施例
以下,列举实施例对本发明进行详细说明,但本发明不受这些实施例的任何限制。
作为透明且具有绝缘性的树脂薄膜,准备设置有平均孔径10μm的通孔的厚度13μm的市售品(オキシフェン公司制造的Oxydisk)。使用间歇式溅射装置(ULVAC公司制造的SMH-2306RE)对该树脂薄膜的一个表面溅射ITO,形成透明电极。溅射中,将到达真空度设定为1×10-5托,在处理压力为4.3×10-3托的气氛中,在供给40sccm的Ar、3sccm的O2的同时、在电压为430V、电流为0.88A的条件下进行5分钟的溅射。由此,得到多孔性电极片。
使用电子显微镜将所得到的多孔性电极片的透明电极侧的表面放大至1000倍后进行观察,结果透明电极上在与树脂薄膜的通孔各自对应的位置处形成了开口。
另外,使用具有ASP探针的电阻率计(三菱化学公司制造的ロレスタGP MCP-T610型)测定所得到的多孔性电极片的透明电极侧的表面电阻值,结果在10V的电压下为60Ω/□。
在使用设置有平均孔径1.0μm的通孔的厚度22μm的市售品(オキシフェン公司制造的Oxydisk)作为树脂薄膜的情况下,也得到了同样的结果。
Claims (7)
1.一种多孔性电极片,其具备:
设置有从一个表面到另一个表面呈直线延伸的多个通孔、透明且具有绝缘性的树脂薄膜,和
层叠在所述树脂薄膜的所述一个表面上且在与所述多个通孔各自对应的位置处具有开口的透明电极。
2.如权利要求1所述的多孔性电极片,其中,所述树脂薄膜由聚对苯二甲酸乙二醇酯、聚萘二甲酸乙二醇酯或聚碳酸酯构成。
3.如权利要求1所述的多孔性电极片,其中,所述多个通孔的平均孔径为0.05μm以上且100μm以下。
4.如权利要求1所述的多孔性电极片,其中,所述透明电极由氧化铟锡构成。
5.一种显示装置,其具备权利要求1所述的多孔性电极片。
6.如权利要求5所述的显示装置,其中,还具备:
与所述多孔性电极片的所述透明电极接触而设置的电致变色层,和
夹着由电解质充满的空间与所述多孔性电极片对置的寻址电极。
7.一种多孔性电极片制造方法,包括:
对透明且无孔的树脂基材照射离子束而形成以沿厚度方向贯通该树脂基材的方式延伸的多条改性径迹的工序,
通过以所述改性径迹为基点对所述树脂基材进行化学蚀刻而得到具有多个通孔的树脂薄膜的工序,和
在所述树脂薄膜的一个表面上形成在与所述多个通孔各自对应的位置处具有开口的透明电极的工序。
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CN110695533A (zh) * | 2013-12-17 | 2020-01-17 | 康宁股份有限公司 | 在玻璃中进行快速激光钻孔的方法和由其制备的产品 |
US11186060B2 (en) | 2015-07-10 | 2021-11-30 | Corning Incorporated | Methods of continuous fabrication of holes in flexible substrate sheets and products relating to the same |
US11542190B2 (en) | 2016-10-24 | 2023-01-03 | Corning Incorporated | Substrate processing station for laser-based machining of sheet-like glass substrates |
US11556039B2 (en) | 2013-12-17 | 2023-01-17 | Corning Incorporated | Electrochromic coated glass articles and methods for laser processing the same |
US11648623B2 (en) | 2014-07-14 | 2023-05-16 | Corning Incorporated | Systems and methods for processing transparent materials using adjustable laser beam focal lines |
US11697178B2 (en) | 2014-07-08 | 2023-07-11 | Corning Incorporated | Methods and apparatuses for laser processing materials |
US11713271B2 (en) | 2013-03-21 | 2023-08-01 | Corning Laser Technologies GmbH | Device and method for cutting out contours from planar substrates by means of laser |
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US9341911B2 (en) * | 2013-09-16 | 2016-05-17 | Sage Electrochromics, Inc. | Color rendering in optical glazings |
EP3391135B1 (de) | 2015-12-16 | 2022-05-11 | Saint-Gobain Glass France | Elektrisch schaltbare verglasung umfassend flächenelektroden mit anisotroper leitfähigkeit |
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US8941908B2 (en) | 2015-01-27 |
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WO2012090414A1 (ja) | 2012-07-05 |
JP2012150451A (ja) | 2012-08-09 |
EP2660652A4 (en) | 2014-08-06 |
TW201301470A (zh) | 2013-01-01 |
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EP2660652B1 (en) | 2019-05-01 |
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