CN103311084B - A kind of electric power system regulating plasma processing chambers Electric Field Distribution - Google Patents
A kind of electric power system regulating plasma processing chambers Electric Field Distribution Download PDFInfo
- Publication number
- CN103311084B CN103311084B CN201210065396.9A CN201210065396A CN103311084B CN 103311084 B CN103311084 B CN 103311084B CN 201210065396 A CN201210065396 A CN 201210065396A CN 103311084 B CN103311084 B CN 103311084B
- Authority
- CN
- China
- Prior art keywords
- power system
- electric
- electrode
- distributing circuit
- electric power
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- Drying Of Semiconductors (AREA)
- Plasma Technology (AREA)
Abstract
The invention discloses a kind of electric power system regulating plasma processing chamber Electric Field Distribution, described electric power system is between radio frequency power source and bottom electrode, comprise the first power distributing circuit and the second power distributing circuit, first power distributing circuit is connected with the difference on bottom electrode with the second power distributing circuit, form two groups of variform standing waves on the bottom electrode, by the phase regulator on adjustment two-way power distributing circuit and tunable capacitor, realize the phase place of two groups of standing waves and the adjustment of voltage magnitude, thus realize adjustable to the Electric Field Distribution uniformity on bottom electrode, the Electric Field Distribution of bottom electrode is made to meet the needs of various plasma treatment, better complete the processing process treating treatment substrate.
Description
Technical field
The Electric Field Distribution that the present invention relates to plasma processing chambers regulates field, particularly relates to and can realize the adjustable electric power system of plasma processing chambers internal electric field uniformity.
Background technology
In plasma processing chambers, generally comprise reaction chamber that is cylindrical or other shapes, the bottom electrode for placing processed substrate is provided with in the bottom of reaction chamber, the top of reaction chamber is provided with top electrode, described top electrode and described bottom electrode be oppositely arranged and between form plasma generating space, by applying radio-frequency voltage between the upper and lower electrodes, make the gas passed in reaction chamber form plasma, and then can the processed substrate placed on the bottom electrode be processed.
The electromagnetic field formed between described top electrode and described bottom electrode makes the reacting gas of low pressure be ionized generation plasma, can electromagnetic field intensity be uniformly distributed and determine that can plasma be uniformly distributed in reaction chamber, thus determine that can pending substrate process evenly; Therefore electromagnetic field being uniformly distributed between upper/lower electrode determines that can the processing of processed substrate key factor uniformly.Radio-frequency voltage conventional at present puts on described bottom electrode usually, and radio frequency power source is connected with the center of bottom electrode by a matching network, square one-tenth electromagnetic field on the bottom electrode.But the frequency adopted due to radio frequency power source is higher, is generally very high frequency(VHF) power source, easily square one-tenth standing wave on the bottom electrode, destroys the uniformity of electromagnetic field.Thus it is uneven to make pending substrate process, and can not meet the needs of production.
Summary of the invention
In order to solve the problems of the technologies described above, the invention provides a kind of electric power system regulating plasma processing chambers internal electric field to distribute.
Summary of the invention part only provides the basic comprehension introduction to aspects more of the present invention and feature, but not entirety of the present invention is summarized, it is not especially for determining the present invention's key or main principle or limiting scope of the present invention, its object only for presenting concepts more of the present invention in simplified form, using the preorder described as hereafter more details.
The invention discloses the uniform electric power system of a kind of adjustment plasma processing chambers internal electric field, a top electrode and a bottom electrode is comprised in described plasma processing chambers, described electric power system is connected between one of described bottom electrode or top electrode and a radio frequency power source, it is characterized in that: described electric power system comprises:
One matching network, the radio frequency power source described in connection;
One phase regulator, for regulating the phase place of input signal;
One tunable capacitor, for distributing input power;
Described matching network output comprises the first power distributing circuit and the second power distributing circuit, on the road that described phase regulator and described tunable capacitor are positioned at the first power distributing circuit and the second power distributing circuit or two-way;
Described first power distributing circuit output is electrically connected with the central area of described electric power system institute connecting electrode, described second power distributing circuit has multiple output, multiple electric connection point is had with described electric power system institute connecting electrode, described multiple electric connection point forms one or more concentric circles identical with described electric power system institute's connecting electrode center of circle, and the distance being arranged in adjacent two electric connection points of multiple electric connection points on same concentric circles is equal.
Described phase regulator can be positioned on the first power distributing circuit, and the central area of the electrode be connected with electric power system is electrically connected, and described tunable capacitor is positioned on the second power distributing circuit, and the electrode be connected with electric power system has multiple electric connection point.
Described tunable capacitor also can be positioned on the first power distributing circuit, and the central area of the electrode be connected with electric power system is electrically connected, and described phase regulator is positioned on the second power distributing circuit, and the electrode be connected with electric power system has multiple electric connection point.
Described tunable capacitor and phase regulator can also be positioned on the first power distributing circuit simultaneously, and the central area of the electrode be connected with electric power system is electrically connected, and the electrode that the second described power distributing circuit is connected with electric power system has multiple electric connection point.
The central area of the electrode that the first described power distributing circuit can also be connected with electric power system is electrically connected, and described tunable capacitor and described phase regulator are positioned on the second power distributing circuit, and the electrode be connected with electric power system has multiple electric connection point.
The electrode that the second described power distributing circuit is connected with electric power system can have three electric connection points, and the distance in the center of circle of the electrode that the concentric circles at described three electric connection point places connects to electric power system is less than or equal to the radius of the electrode that described electric power system connects; The distance of described three adjacent point-to-point transmissions of electric connection point is equal between two.
The electrode that the second described power distributing circuit also can be connected with electric power system has four electric connection points, the distance in the center of circle of the electrode that the concentric circles at described electric connection point place connects to electric power system is less than or equal to the radius of the electrode that electric power system connects, and the distance of described four adjacent point-to-point transmissions of electric connection point is equal between two.
The electrode that the second described power distributing circuit can also be connected with electric power system has six and above electric connection point, described electric connection point can be positioned on one and above concentric circles, the output of the second power distributing circuit is equal to the distance of the electric connection point in same concentric circles, the distance being positioned at the adjacent point-to-point transmission of electric connection point on same concentric circles is equal between two, and the electric connection point on a concentric circles is no less than three.
Described matching network output can also comprise the 3rd power distributing circuit, described 3rd power distributing circuit comprises multiple output, the electrode be connected with described electric power system has the electric connection point of corresponding number, described electric connection point is uniformly distributed on one of described electrode and above concentric circles, and the electric connection point on each concentric circles is no less than three.
Described phase regulator is the wire of an adjustable length, by regulating the phase place of conductor length regulation output electromotive force.The frequency of described radio frequency power source is greater than 60 megahertzes.
The invention has the advantages that: by the output of matching network is divided into the first power distributing circuit and the second power distributing circuit, be connected respectively to central area and the outer peripheral areas of electric power system institute connecting electrode again, make described electric power system institute connecting electrode is formed the superimposed standing wave of multipath due to, by the phase regulator on adjustment two-way power distributing circuit and tunable capacitor, realize the phase place of two groups of standing waves and the adjustment of voltage magnitude, the output solving radio frequency power source in prior art only connects the standing wave a bit the brought impact of described bottom electrode, thus realize adjustable to the Electric Field Distribution uniformity on bottom electrode, the Electric Field Distribution of bottom electrode is made to meet the needs of various plasma treatment, better complete the processing process treating treatment substrate.
Accompanying drawing explanation
The accompanying drawing comprised in this specification, as the part of this specification, schematically illustrates embodiments of the present invention, and is used from specification one and explains and illustrate principle of the present invention.Accompanying drawing is intended to the principal character that described embodiment is diagrammatically described.The object of accompanying drawing does not also lie in the relative size of each characteristic sum institute elements depicted describing actual execution mode, and described element is not drawn in proportion.
Fig. 1 illustrates the structural representation of plasma processing chambers of the present invention;
Fig. 2 illustrates the circuit connection diagram of electric power system of the present invention;
Fig. 3 illustrates that electric power system of the present invention is when phase difference Φ is π, the Electric Field Distribution analogous diagram of two-way power distributing circuit under different capacity ratio;
Fig. 4 illustrates that electric power system of the present invention is when two-way power distributing circuit power is equal, the Electric Field Distribution analogous diagram that phase difference Φ is different.
Embodiment
Fig. 1 shows the structural representation of a kind of plasma processing chambers of the present invention, described plasma processing chambers 100 comprises one for supporting the bottom electrode 3 of pending substrate and the top electrode 10 be positioned at above bottom electrode 3, top electrode 10 is back to the one side coupled reaction gas source 110 of bottom electrode 3, top electrode 10 is provided with the aperture allowing reacting gas to pass through in the face of the one side of bottom electrode 3, and reacting gas to be inputted in the conversion zone 200 that top electrode 10 and bottom electrode 3 formed by by-pass valve control 111 by reacting gas source 110.
Bottom electrode 3 connects a radio frequency power source 5, and radio frequency power source provides radio-frequency power for plasma processing chambers, makes the reacting gas in conversion zone 200 be ionized generation plasma, and plasma is treated treatment substrate and carried out processing process.
Top electrode 10 described in the present embodiment and bottom electrode 3 are circular, and one in top electrode 10 and bottom electrode 3 is connected an electric power system with between radio frequency power source 5, and the present embodiment adopts the scheme connecting electric power system between bottom electrode 3 and radio frequency power source 5.Described electric power system comprises: matching network 4, is connected to the output of radio frequency power source 5; Phase regulator 2, for regulating the phase place inputting and believed; Tunable capacitor 1, for distributing input power.The output of matching network 4 comprises the first power distributing circuit and the second power distributing circuit, on the road that phase regulator 2 and tunable capacitor 1 are positioned at the first power distributing circuit and the second power distributing circuit or two-way; In the present embodiment, phase regulator 2 is positioned on the first power distributing circuit, be electrically connected with the central area of bottom electrode 3, tunable capacitor 1 is positioned at the second power distributing circuit up and down electrode 3 multiple electric connection point, multiple electric connection point determines one or more concentric circles identical with bottom electrode 3 center of circle, and the distance be positioned between adjacent two electric connection points on a concentric circles is equal between two.Second power distributing circuit at tunable capacitor 1 place and bottom electrode 3 have 3 electric connection points in the present embodiment, are respectively A1, A2, A3, are positioned on a concentric circles.The concentric circles at described three electric connection point places equals the radius of bottom electrode 3 to the distance in the center of circle.The output of the second power distributing circuit is equal to the distance of 3 electric connection points of bottom electrode 3, thus realizes A1, and the phase place of A2, A3 point is identical.
In the present embodiment, matching network 4 is divided into the first power distributing circuit A and second to distribute power circuit B two-way at C point, by regulate the size control A of tunable capacitor 1 and B road respectively by power.Phase regulator 2 can regulate the phase place of B point.Because path is equal, the phase place that A1, A2, A3 are 3 necessarily same-phase.
Can suppose A1, the voltage that A2, A3 are 3 is:
A1=A2=A3=f
1c () cos (ω t) wherein ω is frequency, f
1c () is the function relevant with capacitance size.
B point voltage is B=f
2(c) cos (ω t+ Φ), f
2c () is also the function relevant with capacitance size, Φ regulates according to phase regulator 2.
Bottom electrode 3 above any point D (x, y) can regard the Phase Stacking of A1, A2, A3, B 4 as, supposes that the voltage of D point is:
V(D)＝f
1(c)*cos(ωt+fa(D))+f
2(c)*cos(ωt+fb(D)+Φ)
Wherein fa (D) represents A1, and A2, A3 3 is to the function of the distance of D point, and fb (D) represents the function of B point to the distance of D point, f
1(c) * cos (ω t+fa (D)) represent by A1, A2, A3 tri-point electrode produce the function about standing wave, f
2c () * cos (ω t+fb (D)+Φ) represents the function about standing wave produced by B point electrode, voltage magnitude and the phase place of described two groups of standing waves are all adjustable, because two groups of standing wave shapes are different, by being superimposed by these two groups of standing waves, and it is adjustable to regulate the voltage magnitude of two groups of standing waves and phase difference to realize the uniformity of electric field on bottom electrode 3.The voltage magnitude of described two groups of standing waves and phase place can realize by regulating tunable capacitor 1 and phase regulator 2.The wire that phase regulator 2 described in the present embodiment can regulate for length, realizes output potential phase adjusted by regulating the length of wire.
When the radio frequency power source input wavelength that the present embodiment adopts is 1000mm, tunable capacitor and phase difference Φ are got fixed value respectively and carries out analog simulation, the Electric Field Distribution curve chart drawn as shown in Figure 3 and Figure 4.Fig. 3 illustrates that electric power system of the present invention is when phase difference Φ is π, and two-way power distributing circuit PA:PB is respectively Electric Field Distribution analogous diagram when 0:1,0.5:1,1:1,10:1 and 10000:1; Fig. 4 illustrates that electric power system of the present invention is when two-way power divides PA:PB to be 1:1, phase difference Φ is 0, π/8, π/4, pi/2 and π time Electric Field Simulation figure.
Second power distributing circuit of the present invention can have 4 outputs, corresponding bottom electrode 3 there are 4 electric connection points, 4 electric connection points are distributed on a concentric circles, the output of the second power distributing circuit is equal to the distance between 4 electric connection points, in 4 electric connection points, the distance of adjacent point-to-point transmission is equal between two, the same foregoing description of principle of concrete adjustment electric field.
Second power distributing circuit of the present invention can also have 6 and above output, bottom electrode 3 there is the electric connection point of corresponding number, when on the same concentric circles that all electric connection points are positioned at bottom electrode 3, the output of described second power distributing circuit is equal to the distance of all electric connection points, and the distance between adjacent two electric connection points is equal between two; Described multiple electric connection point also can be positioned on different concentric circles, electric connection point on each concentric circles is no less than 3, the output of described second power distributing circuit is equal to the distance of the electric connection point on same concentric circles, and the distance on same concentric circles between adjacent electric connection point is equal.
Matching network output of the present invention can also comprise the 3rd power distributing circuit, described 3rd power distributing circuit comprises multiple output, the electric connection point of corresponding number is had with bottom electrode 3, described electric connection point is uniformly distributed on one of described electrode and above concentric circles, and the electric connection point on each concentric circles is no less than three.
Electric power system described in the present embodiment also can be connected between radio frequency power source 5 and top electrode 10, the same above-described embodiment of concrete operation principle.
Except the phase regulator 2 described in the present embodiment and tunable capacitor 1 lay respectively at the first power distributing circuit and the second power distributing circuit, the position of tunable capacitor 1 and phase regulator 2 can exchange, also can be positioned on a wherein circuit of the first power distributing circuit and the second power distributing circuit, the same above-described embodiment of operation principle simultaneously.
The present invention describes with reference to embodiment, and its all aspect all should be exemplary but not determinate.In addition, by the specific embodiment of the invention described herein and enforcement, other execution modes of the present invention should be apparent for those skilled in the art.The different aspect of described execution mode and/or element can in plasma processing chambers field separately or use with combination in any.Above-mentioned specific embodiment should be regarded as being only exemplary, and scope and spirit of the present invention are then defined by claims.
Claims (12)
1. one kind regulates the uniform electric power system of plasma processing chambers internal electric field, a top electrode and a bottom electrode is comprised in described plasma processing chambers, described electric power system is connected between one of described bottom electrode or top electrode and a radio frequency power source, it is characterized in that: described electric power system comprises:
One matching network, the radio frequency power source described in connection;
One phase regulator, for regulating the phase place of input signal;
One tunable capacitor, for distributing input power;
Described matching network output comprises the first power distributing circuit and the second power distributing circuit, on the road that described phase regulator and described tunable capacitor are positioned at the first power distributing circuit and the second power distributing circuit or two-way;
Described first power distributing circuit output is electrically connected with the central area of described electric power system institute connecting electrode, described second power distributing circuit has multiple output, multiple electric connection point is had with described electric power system institute connecting electrode, described multiple electric connection point forms one or more concentric circles identical with described electric power system institute's connecting electrode center of circle, and the distance being arranged in adjacent two electric connection points of multiple electric connection points on same concentric circles is equal.
2. one according to claim 1 regulates the uniform electric power system of plasma processing chambers internal electric field, described phase regulator is positioned on the first power distributing circuit, the central area of the electrode be connected with electric power system is electrically connected, described tunable capacitor is positioned on the second power distributing circuit, and the electrode be connected with electric power system has multiple electric connection point.
3. one according to claim 1 regulates the uniform electric power system of plasma processing chambers internal electric field, described tunable capacitor is positioned on the first power distributing circuit, the central area of the electrode be connected with electric power system is electrically connected, described phase regulator is positioned on the second power distributing circuit, and the electrode be connected with electric power system has multiple electric connection point.
4. one according to claim 1 regulates the uniform electric power system of plasma processing chambers internal electric field, described tunable capacitor and phase regulator are positioned on the first power distributing circuit, the central area of the electrode be connected with electric power system is electrically connected, and the electrode that the second described power distributing circuit is connected with electric power system has multiple electric connection point.
5. one according to claim 1 regulates the uniform electric power system of plasma processing chambers internal electric field, the central area of the electrode that the first described power distributing circuit is connected with electric power system is electrically connected, described tunable capacitor and described phase regulator are positioned on the second power distributing circuit, and the electrode be connected with electric power system has multiple electric connection point.
6. the uniform electric power system of adjustment plasma processing chambers internal electric field according to claim arbitrary in claim 1-5, it is characterized in that, the electrode that the second described power distributing circuit is connected with electric power system has three electric connection points, and the distance in the center of circle of the electrode that the concentric circles at described three electric connection point places connects to electric power system is less than or equal to the radius of the electrode that described electric power system connects; The distance of described three adjacent point-to-point transmissions of electric connection point is equal between two.
7. the uniform electric power system of adjustment plasma processing chambers internal electric field according to claim arbitrary in claim 1-5, it is characterized in that, the electrode that the second described power distributing circuit is connected with electric power system has four electric connection points, the distance in the center of circle of the electrode that the concentric circles at described electric connection point place connects to electric power system is less than or equal to the radius of the electrode that electric power system connects, and the distance of described four adjacent point-to-point transmissions of electric connection point is equal between two.
8. the uniform electric power system of adjustment plasma processing chambers internal electric field according to claim arbitrary in claim 1-5, it is characterized in that, the electrode that the second described power distributing circuit is connected with electric power system has six and above electric connection point, described electric connection point is positioned on a concentric circles, the output of the second power distributing circuit is equal to the distance of the electric connection point in concentric circles, and the distance on the electric connection point on concentric circles between adjacent electric connection point is equal between two.
9. the uniform electric power system of adjustment plasma processing chambers internal electric field according to claim arbitrary in claim 1-5, it is characterized in that, the electrode that the second described power distributing circuit is connected with electric power system has six and above electric connection point, described six and above electric connection point are positioned on different concentric circles, electric connection point on each concentric circles is no less than 3, the output of described second power distributing circuit is equal to the distance of the electric connection point on same concentric circles, and the distance on same concentric circles between adjacent electric connection point is equal between two.
10. one according to claim 1 regulates the uniform electric power system of plasma processing chambers internal electric field, it is characterized in that, described matching network output also comprises the 3rd power distributing circuit, described 3rd power distributing circuit comprises multiple output, multiple output and the electrode that described electric power system connects of described 3rd power distributing circuit have the electric connection point identical with multiple output numbers of described 3rd power distributing circuit, described electric connection point is uniformly distributed on one of described electrode and above concentric circles, electric connection point on each concentric circles is no less than three.
11. one according to claim 1 regulate the uniform electric power system of plasma processing chambers internal electric field, and it is characterized in that, the frequency of described radio frequency power source is greater than 60 megahertzes.
12. one according to claim 1 regulate the uniform electric power system of plasma processing chambers internal electric field, and it is characterized in that, described phase regulator is the wire of an adjustable length, by regulating the phase place of conductor length regulation output electromotive force.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210065396.9A CN103311084B (en) | 2012-03-13 | 2012-03-13 | A kind of electric power system regulating plasma processing chambers Electric Field Distribution |
| TW101110033A TW201338005A (en) | 2012-03-13 | 2012-03-23 | Power supply system for regulating electric field distribution of plasma processing chamber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210065396.9A CN103311084B (en) | 2012-03-13 | 2012-03-13 | A kind of electric power system regulating plasma processing chambers Electric Field Distribution |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103311084A CN103311084A (en) | 2013-09-18 |
| CN103311084B true CN103311084B (en) | 2016-03-30 |
Family
ID=49136169
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210065396.9A Active CN103311084B (en) | 2012-03-13 | 2012-03-13 | A kind of electric power system regulating plasma processing chambers Electric Field Distribution |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN103311084B (en) |
| TW (1) | TW201338005A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103792842B (en) * | 2014-01-22 | 2016-08-17 | 清华大学 | A kind of base station that can be used for power field spatial distribution precise controlling and control method |
| CN111020533B (en) * | 2018-10-09 | 2022-02-18 | 上海理想万里晖薄膜设备有限公司 | Method for changing electromagnetic field distribution in PECVD (plasma enhanced chemical vapor deposition) discharge cavity by phase modulation |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3582287B2 (en) * | 1997-03-26 | 2004-10-27 | 株式会社日立製作所 | Etching equipment |
| US6459066B1 (en) * | 2000-08-25 | 2002-10-01 | Board Of Regents, The University Of Texas System | Transmission line based inductively coupled plasma source with stable impedance |
| US6527912B2 (en) * | 2001-03-30 | 2003-03-04 | Lam Research Corporation | Stacked RF excitation coil for inductive plasma processor |
| US6583572B2 (en) * | 2001-03-30 | 2003-06-24 | Lam Research Corporation | Inductive plasma processor including current sensor for plasma excitation coil |
| AU2002236273A1 (en) * | 2002-03-08 | 2003-09-22 | Tokyo Electron Limited | Plasma device |
| JP5231308B2 (en) * | 2009-03-31 | 2013-07-10 | 東京エレクトロン株式会社 | Plasma processing equipment |
| TWM370181U (en) * | 2009-07-03 | 2009-12-01 | Advanced Micro Fab Equip Inc | A plasma processing apparatus |
-
2012
- 2012-03-13 CN CN201210065396.9A patent/CN103311084B/en active Active
- 2012-03-23 TW TW101110033A patent/TW201338005A/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| CN103311084A (en) | 2013-09-18 |
| TW201338005A (en) | 2013-09-16 |
| TWI460762B (en) | 2014-11-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101754564B (en) | Plasma processing device | |
| KR100736218B1 (en) | The plasma source with structure of multi-electrode from one side to the other | |
| CN102301833A (en) | Passive power distribution for multiple electrode inductive plasma source | |
| CN101897005A (en) | High frequency plasma CVD apparatus, high frequency plasma CVD method and semiconductor thin film manufacturing method | |
| CN101754568B (en) | Plasma treatment device and radio frequency device thereof | |
| US9396900B2 (en) | Radio frequency (RF) power coupling system utilizing multiple RF power coupling elements for control of plasma properties | |
| CN103311084B (en) | A kind of electric power system regulating plasma processing chambers Electric Field Distribution | |
| CN110855015B (en) | Uniform magnetic field compensation structure for array transmitting coil and design method thereof | |
| CN109038861B (en) | A kind of wireless power transfer method and system of wireless common source | |
| US9355821B2 (en) | Large-area plasma generating apparatus | |
| CN108400657A (en) | A kind of omnibearing selective radio energy transmission system | |
| CN103247510A (en) | Inductively coupled plasma processing method and inductively coupled plasma processing apparatus | |
| CN109950895B (en) | RF power distribution device and RF power distribution method | |
| CN105720376B (en) | Leaky-wave antenna and beam form-endowing method based on leaky-wave antenna | |
| CN205141143U (en) | Voltage -controlled beam scanning array antenna | |
| CN101903971B (en) | Method for manufacturing large-area vacuum plasma treated substrates and vacuum plasma treatment apparatus | |
| CN104409309B (en) | Large area plasma processing means generates method with homogeneous plasma | |
| KR101682877B1 (en) | The power distributor for plasma process apparatus and the plasma process apparatus having same | |
| KR20230133339A (en) | How to control the source frequency of the plasma processing device and source high-frequency power | |
| KR101972783B1 (en) | Icp antenna and plasma processing apparatus including the same | |
| TWI594505B (en) | Coil antenna with plural radial lobes | |
| CN102098864B (en) | Plasma generating device | |
| CN102686004B (en) | Harmonic-wave-controllable frequency system for plasma generator | |
| CN113133175B (en) | Plasma inductance coil structure, plasma processing equipment and processing method | |
| Zhang et al. | Increasing power level of resonant wireless power transfer with relay resonators by considering resonator current amplitudes |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CP01 | Change in the name or title of a patent holder | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 201201 No. 188 Taihua Road, Jinqiao Export Processing Zone, Pudong New Area, Shanghai Patentee after: Medium and Micro Semiconductor Equipment (Shanghai) Co., Ltd. Address before: 201201 No. 188 Taihua Road, Jinqiao Export Processing Zone, Pudong New Area, Shanghai Patentee before: Advanced Micro-Fabrication Equipment (Shanghai) Inc. |