CN103308964B - Efficient nanometer focusing device achieved through ladder type micron slits - Google Patents

Efficient nanometer focusing device achieved through ladder type micron slits Download PDF

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CN103308964B
CN103308964B CN201310261469.6A CN201310261469A CN103308964B CN 103308964 B CN103308964 B CN 103308964B CN 201310261469 A CN201310261469 A CN 201310261469A CN 103308964 B CN103308964 B CN 103308964B
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slit
metal film
microns
nanofocusing
width
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CN103308964A (en
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陈建军
肖井华
张茹
吴刚
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北京邮电大学
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Abstract

本发明公开了一种利用阶梯型微米狭缝实现的高效纳米聚焦器件。 The present invention discloses a device utilizing high nanofocusing stepped slit implemented microns. 本发明的阶梯型微米狭缝纳米聚焦器件包括:衬底;在衬底上设置有依次叠放的多层金属膜;在每一层金属膜中开设有微米狭缝;微米狭缝的宽度从下至上依次增大,在纵向方向上成阶梯型微米狭缝;用有限厚度的高折射率的介质膜替代无限厚度的玻璃衬底,聚焦强度会因为高折射率的介质膜中的FP腔效应而有显著提高。 M nanofocusing stepped slit device of the invention comprises: a substrate; is provided with a multilayered metal film are sequentially stacked on a substrate; defines a metal film in each slot there microns; m width of the slit from increasing bottom to top, into a stepped slot in a longitudinal direction microns; with a high refractive index dielectric film instead of glass substrates of finite thickness infinite thickness, the intensity of the focusing effect of the FP cavity will dielectric film having a high refractive index because of the and there is a significant increase. 本发明对子结构进行纵向排列,从而大大减小聚焦器件的横向尺寸,这对于实现表面等离激元器件高密度集成是十分重要的。 The sub-structure of the present invention is arranged longitudinally, thereby greatly reducing the transverse dimensions of the focusing device, for which achieve a surface plasmon Component high density integration is very important. 本发明得到聚焦强度达到最大值是入射光强度的5.2倍,并且光斑大小变成300nm;纵向排列微米狭缝也为设计表面等离激元纳米聚焦器件提供了新的研究方向。 The present invention is focused to obtain maximum intensity is 5.2 times that of the incident light intensity, and spot size becomes 300 nm; slit longitudinally aligned microns provides a new direction for the focusing device is designed like a surface plasmon nm.

Description

一种利用阶梯型微米狭缝实现的高效纳米聚焦器件 Nanofocusing utilizing efficient means to achieve a stepped slit microns

技术领域 FIELD

[0001] 本发明涉及纳米光子学领域,具体涉及一种利用阶梯型微米狭缝实现的高效纳米聚焦器件。 [0001] The present invention relates to the field of nano-photonics, focusing particularly relates to efficient devices utilizing nano stepped slit micrometers achieved.

背景技术 Background technique

[0002] 加强下一代光子电路集成密度的关键在于使光学器件微型化的同时保持甚至增加光学器件的效率。 [0002] strengthen key generation photonic integrated circuit density is to make the optical device miniaturized while maintaining or increasing the efficiency of the optical device. 但是微型化与高效率这两个方面总是相互矛盾的,所以要实现一个能够同时满足这两个方面的器件,是个很大的挑战。 However, miniaturization and high efficiency of these two aspects are always conflicting, so to achieve a device capable of simultaneously satisfying these two aspects, it is a big challenge. 而沿着金属表面传播的表面等离激元(SPPs),由于它能够突破光的衍射极限,所以在光学器件微型化方面有着极大的发展潜力。 While propagating along the other surface of the metal surface plasmon (the SPPs), because it can break the diffraction limit of light, so has great potential for development in the miniaturization of the optical device. 并且在亚波长的金属结构中,SPPs具有超透射现象。 And a subwavelength of the metal structure, SPPs having a super transmission phenomenon. 因此人们设计出了各种各样基于SPPs的金属结构来实现纳米聚焦。 Therefore it has been devised to achieve various metallic structure based SPPs nanofocusing. 这些纳米聚焦器件在纳米光束整形、集成光学、数据储存以及近场成像等领域具有重要应用。 The beam shaping devices nanofocusing nanometer, integrated optics, the field of near-field data storage and imaging have important applications. 例如,用来实现纳米聚焦的缝-栅结构它由一个纳米缝和两侧的纳米槽或者介质条组成。 For example, to achieve a seam nanofocusing - gate structure which nano grooves or a dielectric strip on both sides and Nanostitching composition. 但是由于聚焦的光主要来自于这个单一纳米缝,所以直接透过的光很少,也就是说这些结构的聚焦效率会很低。 However, because the light is focused mainly comes from the single nano-sewn, so little direct light through, which means focusing efficiency of these structures will be low. 后来,有人理论上提出了用多个纳米缝的结构去实现纳米聚焦,它增大了入射光透光率,从而克服了先前低效聚焦的问题。 Later, it was theoretically proposed a plurality of nano-seam construction to achieve nanofocusing, it increases the transmittance of the incident light, thereby overcoming the problem of inefficient previously focused. 但是这种多纳米缝结构中各个纳米缝的宽度或深度都不同,所以在实验上非常难以制备。 However, this arrangement each nano multinanopore seam width or depth of the slit are different, it is very difficult to prepare experimentally. 为了解决上述问题,最近有人提出了一个新的结构,它是由单个T型微米狭缝两侧包围着多个纳米缝所组成,并且他们在实验上制备成功了该结构,同时实现了高效的纳米聚焦。 To solve the above problems, it has recently been proposed a new structure, which is surrounded by a single T-slot on both sides of a plurality of micron Nanostitching composed, and they succeeded in preparing the test structure, while achieving efficient nanofocusing. 但是,所有前期报道过的纳米聚焦器件都包含了多个横向排列的子结构,比如纳米槽、介质条和纳米缝等子结构。 However, all previous reported nano-focusing means include a plurality of lateral sub-structures are arranged, such as nano grooves, joints and other dielectric strip and nano substructure. 在这些结构中,聚焦器件都是通过将多个子结构散射出的光进行相干相长来成功实现纳米聚焦。 In these structures, the devices are focusing coherently with respect to successful long nanofocusing by the light scattered in a plurality of sub-structures. 这样一来,横向排列多个子结构极大地增加了聚焦器件的横向尺寸。 Thus, a plurality of sub-structures are arranged laterally greatly increases the lateral dimension of the focusing device. 这使得缝-栅结构、多纳米缝结构和两侧被多个纳米缝包围着的T型微米狭缝结构的横向尺寸约为5微米、4微米和10微米,而这么大的横向尺寸不利于光学器件的集成。 This makes the seam - the gate structure, and nanoporous sides stitched seam construction surrounded by a plurality of T-shaped transverse dimension of the nano structure is about 5 microns microns slits, 4 and 10 micrometers, and such a large lateral dimension not conducive integrated optical device.

发明内容 SUMMARY

[0003] 针对上述存在的问题,本发明提出了一种利用阶梯型微米狭缝去实现紧凑、高效的纳米聚焦器件。 [0003] For the above problems, the present invention proposes a method of using a stepped slit microns to achieve a compact and efficient device nanofocusing.

[0004] 本发明的目的在于提供一种利用阶梯型微米狭缝实现高效、紧凑的纳米聚焦器件。 [0004] The object of the present invention is to provide a use of a stepped slit microns efficient, compact nanofocusing device.

[0005] 本发明的阶梯型微米狭缝纳米聚焦器件包括:衬底;在衬底上设置有依次叠放的多层金属膜;在每一层金属膜中开设有微米狭缝;微米狭缝纵向叠加在一起,它的宽度从下至上依次增大,在纵向上呈阶梯形状。 [0005] m stepped slits nanofocusing device of the invention comprises: a substrate; is provided with a multilayered metal film are sequentially stacked on a substrate; defines a metal film in each slot there microns; m slit superposed longitudinally, its width gradually increases from bottom to top, a stepped shape in the longitudinal direction.

[0006] 在衬底上设置有一层金属膜,在金属膜中央开设微米狭缝,当TM偏振光从微米狭缝的背面入射时,位于光学厚度的金属膜中的微米狭缝可以支持多阶模式。 [0006] disposed on a substrate having a metal film, a metal opened micron film at the center of the slit, when the TM polarized light incident from the back surface of the slit m, m of the optical thickness of the metallic film slit in order to support multiple mode. 由于在微米狭缝中有着多模干涉,所以当光入射微米狭缝后会发生聚焦行为。 With multiple slits in the micron-mode interference, so that when the slit light is incident microns focusing behavior occurs. 同时微米狭缝还会在金属表面上激发SPPs。 Meanwhile microns will excite SPPs slit on the metal surface. 微米狭缝的宽度决定焦点的位置,随着微米狭缝的宽度的增加,焦点的位置也会随之提高,即微米狭缝的宽度越大,焦距的长度越长。 Micron width of the slit determines the position of the focus, with the increase of the m slit width will increase as the position of the focus, i.e., the larger the width of the slit m, longer focal length.

[0007] 在衬底上设置有依次叠放的两层金属膜,第一金属膜和第二金属膜中分别开设有微米狭缝,形成阶梯型微米狭缝。 [0007] There are provided two metallic film on a substrate sequentially stacked, the first metal film and second metal film each m defines a slit, the slit forming step type microns. 当TM偏振光从微米狭缝的背面入射时,沿着第一金属膜和第二金属膜中的两个微米狭缝的中间透射出两束光,通过有限元数值模拟可以调节第一和第二金属膜的厚度和各层微米狭缝的宽度,使得这两束透射光的焦点位置基本重合。 When the TM polarized light incident from the back surface of the slit m, the transmittance along the middle of the first metal film and a second metal film of the two slits microns two beams of light may be adjusted by the first and second finite element numerical simulation thickness of the titanium metal film layers microns and a width of the slit, such that the focal position of the two beams of transmitted light substantially coincides. 再叠放第三金属膜,由于下面两层的微米狭缝中的多模干涉和最上层的微米狭缝产生的相干相长现象,形成了高效的纳米聚焦效果。 And then stacking the third metal film, the phase coherence length of multimode interference phenomenon caused by the following two layers micron slit and the slit uppermost microns produced, the formation of nano-efficient focusing effect. 基于上面的原理,通过有限元数值模拟可以调节各层金属膜的厚度和各层微米狭缝的宽度,从而得到最佳的聚焦的强度和光斑大小。 Based on the above principle, possible to adjust the thickness of each metal film layers microns and a width of the slit by the finite element numerical simulation, to obtain the best intensity and spot size focused.

[0008] 对于金属-介质结构的纳米器件,透过光的强度不仅可以通过改变微米狭缝的结构参数来改变,而且可以通过变化介质膜的折射率以及厚度来控制。 [0008] For the metal - dielectric nanodevice structure, not only the intensity of the transmitted light may be changed by changing the slit structure parameters m and can be controlled by varying the refractive index and thickness of the dielectric film. 用有限厚度的高折射率的介质膜替代无限厚度的玻璃衬底,聚焦强度会进一步提高。 Alternatively infinite thickness of a glass substrate with a dielectric film having a high refractive index is of finite thickness, the focusing strength is further improved. 这是由于高折射率的介质膜中的法布里-波罗(Fabry-Perot,FP)腔效应造成的。 This is due to the high refractive index dielectric film Fabry - Polo (Fabry-Perot, FP) cavity effect caused. 当介质膜的厚度满足FP腔共振条件的时候,聚焦强度达到最大值。 When the thickness of the dielectric film satisfies the FP cavity resonance condition, the focusing strength reaches a maximum.

[0009] 金属膜的材料采用金或银等贵金属。 [0009] The metal film material using a noble metal such as gold and silver.

[0010] 本发明的阶梯型微米狭缝纳米聚焦器件的水平尺寸在I〜5 μπι之间。 [0010] Nano stepped slit microns focusing device of the present invention, the horizontal dimension between I~5 μπι. 每一层金属膜的厚度在10nm〜I μ m之间。 The thickness of each layer between the metal film 10nm~I μ m. 微米狭缝的宽度在I μ m_5 μ m之间。 Micron width of the slit between I μ m_5 μ m. 本发明的阶梯型微米狭缝纳米聚焦器件产生高效的纳米聚焦现象原理如下:由于微米狭缝中会有多模干涉,入射光通过一定厚度的微米狭缝后被有效的聚焦;依次叠放的多层金属膜,从下至上微米狭缝的宽度依次增大,由于连续的多模干涉和透射光与被散射的SPPs之间发生的相干相长使得聚焦效果增强;本发明的纳米聚焦器件,由于微米狭缝的存在使入射光的透光率比纳米缝要大很多,从而使得聚焦强度比微米狭缝要大很多;最后,用有限厚度的介质膜替代无限厚度的玻璃衬底,聚焦强度会因为高折射率介质膜中的FP腔效应而进一步提高。 M the present invention stepped slit nanofocusing device generates efficient nanofocusing phenomenon works as follows: since the slits will micron multimode interference, incident light passes through the slit after a certain thickness in the micron effective focus; sequentially stacked multilayered metal film, the width gradually increases from bottom to top microns slit, since coherence between the successive multi-mode interference transmitted light and scattered such that the focal length of SPPs with enhanced effect; nanofocusing device of the present invention, due to the presence of micron slit light transmittance of incident light to be much larger than the nano slit, so that the focusing strength is much larger than the slit microns; Finally, the thickness of the dielectric film instead of glass substrates finite infinite thickness, the intensity of focus FP cavity effect because of the high refractive index dielectric film is further improved.

[0011] 本发明的优点: [0011] The advantages of the present invention:

[0012] 本发明的阶梯型微米狭缝成功的实现了高效的纳米聚焦,前期报道的纳米聚焦器件由各种各样的横向排列的子结构组成,而本发明是对微米狭缝进行纵向排列,这样大大减小了聚焦器件的横向尺寸,从而实现了一个超紧凑的高效纳米聚焦器件,这对于实现表面等离激元器件高密度集成同路是十分重要的。 [0012] The present invention is a stepped slit microns successfully enables efficient nanofocusing, pre nanofocusing device reported by various substructures arranged laterally composition, but the present invention is longitudinally aligned slits microns , which greatly reduces the lateral dimension of the focusing device, thereby realizing an ultra compact high nanofocusing device, which for achieving a surface plasmon same path components high-density integration is important. 本发明中纵向排列子结构这一思路也给设计表面等离激元纳米聚焦器件提供了新的研宄方向。 In the present invention this idea longitudinally aligned substructure but also to design Surface plasmon nano focusing device provided in the study based on a new direction.

附图说明 BRIEF DESCRIPTION

[0013] 图1为在衬底上设置一层金属膜的结构示意图; [0013] FIG. 1 is a schematic view of a metal film disposed on a substrate;

[0014]图2(a)为本发明的阶梯型微米狭缝纳米聚焦器件的实施例一的结构示意图,(b)在第二金属膜在不同的厚度下,聚焦强度随第二金属膜中的微米狭缝的宽度的变化曲线; A stepped configuration diagram of the embodiment of the device micron slit nanofocusing [0014] FIG. 2 (a) of the present invention, one, (b) a second metal film different thickness, with the focusing strength of the second metal film micron width of the slit changes in a curve;

[0015] 图3(a)为本发明的阶梯型微米狭缝纳米聚焦器件的实施例二的结构示意图,(b)为聚焦强度的大小和FWHM随着第三金属膜中的微米狭缝的宽度w/变化的曲线图; Structure [0015] FIG stepped microns Example 3 (a) of the present invention, two slit nanofocusing schematic device, (b) the size of a focused intensity and FWHM of the third metal film with slits m graph width w / change;

[0016]图4(a)为本发明的阶梯型微米狭缝纳米聚焦器件的实施例三的结构示意图; Stepped slits microns [0016] FIG. 4 (a) of the present invention nanofocusing embodiment of the device structural diagram III;

[0017]图4(b)为聚焦强度随着介质膜的厚度的变化曲线图。 [0017] FIG. 4 (b) is a graph showing changes in focusing strength of the film with the thickness of the dielectric.

具体实施方式 Detailed ways

[0018] 下面结合附图,通过实例对本发明做进一步说明。 [0018] below with the accompanying drawings, by way of example to further illustrate the present invention.

[0019] 如图1所示,在玻璃S12的衬底O上设置一层第一金属膜1,材料为金,厚度t 1 = [0019] As shown in FIG. 1, is provided a layer of a first metal film on a glass substrate S12 O 1, the material is gold, the thickness t 1 =

I μ m,在第一金属膜I的中间开设一个微米狭缝,微米狭缝的宽度为Wp当TM偏振光(磁矢量垂直于缝)从微米狭缝的背面入射时,该微米狭缝可以支持多阶模式。 I μ m, the first metal film in the middle of I m defines a slit, the slit width Wp when m is TM polarized light (perpendicular to the magnetic vector slits) is incident from the rear surface when the slit m, the micro slits may It supports multi-order mode. 由于在微米狭缝中有着多模干涉,所以当光入射微米狭缝后会产生聚焦。 With multiple-mode interference in the micron slit, so when light is incident slit will produce a focused microns. 同时微米狭缝还会在金属表面上激发SPPs。 Meanwhile microns will excite SPPs slit on the metal surface. 用有限元软件Comsol Multiphysics计算透过微米狭缝后的光场分布情况。 Transmitted through the optical field distribution microns slits by finite element software Comsol Multiphysics. 入射的TM偏振光的波长被设为λ = 630nm,金和玻璃所对应的介电常数为别是ε Au=-11.815+1.239i和ε SiQ2= 1.45 2。 TM polarized light incident wavelength is set to λ = 630nm, gold and glass are respectively corresponding to a dielectric constant ε Au = -11.815 + 1.239i and ε SiQ2 = 1.45 2. 当入射光从金属膜的背面入射的时候,计算不同宽度的狭缝透过的光场分布。 When the incident light is incident from the back of the metal film, the optical field is calculated through a slit of different width distribution. 在这些光强分布图中,能够明显看到入射光通过微米狭缝后发生了聚焦行为。 In the light intensity distribution, the incident light can be seen clearly through the slit microns focusing behavior occurred. 这个光的聚焦现象是因为入射光通过微米狭缝后,出现多模干涉所致。 The light-focusing it is because the incident light passes through the slits microns, occurs due to multimode interference. 例如,当微米狭缝的宽度为W1= 1800nm时,聚焦光强为I = 1.8并且聚焦的光斑大小大约是FWHM(半高全宽)= 380nm。 For example, when the width of the slit m is W1 = 1800nm, poly Jiaoguang Jiang is I = 1.8 and focused spot size is approximately FWHM (full width half maximum) = 380nm. 这里,聚焦光强用入射光的光强进行了归一化。 Here, poly Jiaoguang Jiang was normalized by the intensity of the incident light. 随着微米狭缝的宽度的增加焦点的位置也会随之提高,当微米狭缝的宽度W1= 1800nm时,焦点位置刚好在金属膜的表面。 Increases as the position of the focal point of the width of the slit m will also increase, when the width of the slit m W1 = 1800nm, just focus position of the surface of the metal film. 对于其他不同微米狭缝的宽度的情况下也一样能够实现聚焦,只是它们的聚焦长度不同。 For other situations different micron slit width to achieve the same focus, but differ in their focal length.

[0020] 实施例一 [0020] Example a

[0021] 如图2 (a)所不,在第一金属膜I下面再设置一层第二金属膜2,厚度为t2。 [0021] FIG. 2 (a) are not in the first metal layer disposed below the membrane and then I 2 of the second metal film, having a thickness of t2. 第一金属膜I中的微米缝的宽度W1= 1800nm,第二金属膜2中开设有比在金属膜I中宽度更窄的微米狭缝,微米狭缝的宽度为W2,形成二层阶梯型微米狭缝。 I is the first metal film micron slit width W1 = 1800nm, defines a second metal film 2 has a width narrower than the slit in the metal film I micron, a width W2 of the slit is m, is formed a stepped floor micron slit. 为了得到最优的第二金属膜2中的微米狭缝的宽度,计算了对于不同厚度t2的第二金属膜2,光斑的大小和聚焦强度随着微米狭缝的宽度W2的变化曲线,如图2(b)所示。 For optimum second metal film in the width of the slit m 2, calculated for 2, the focusing spot size and strength of the second metal film with the thickness t2 different curves micron slit width W2, as FIG 2 (b) shown in FIG. 数值计算表明,当W2= 1600nm,t 2 =10nm的时候,聚焦强度达到最大值同时光斑大小也接近于最小值,此时,聚焦强度为I = Numerical calculations show that, when W2 = 1600nm, t 2 = 10nm when the intensity reaches a maximum value while the focusing spot size is also close to the minimum value at this time, the focusing strength of I =

2.9,它是一层金属膜的单一微米狭缝的聚焦强度的1.6倍。 2.9, which is 1.6 times the strength of the focusing layer of a single micron slit metal film. 此外聚焦的光斑大小(FWHM)变为337nm。 Further focused spot size (FWHM) becomes 337nm. 对比于单个的微米狭缝,二层阶梯型微米狭缝的聚焦强度增强了,并且聚焦光斑大小变小了。 M contrast to a single slit, m Layer stepped slits focusing strength is enhanced, and the focused spot size smaller. 沿着第一金属膜I和第二金属膜2中的两个微米狭缝的中间透射出两束光,这两束透射光的焦点位置(强度最大的点)基本重合,而且在焦点处它们的相位也是基本相同。 Microns along the intermediate transmissive slits in the two first metal film 2 and the second metal film I shown two light beams, two beams of transmitted light focal position (the point of maximum intensity) substantially coincide, and at the focus thereof phases are substantially the same. 因此二层阶梯型微米狭缝的两束聚焦光在焦点位置处发生相干相长,使得聚焦光强进一步增强。 Thus stepped slit Layer two microns of coherent light beams focused at the focal position occurring with long that polyethylene Jiaoguang Jiang further enhanced.

[0022] 实施例二 [0022] Second Embodiment

[0023] 如图3(a)所示,在第一金属膜I上再设置一层第三金属膜3,厚度t3= 200nm,中间开设一个比第一金属膜I中宽度更宽的微米狭缝,微米狭缝的宽度为W3,形成三层阶梯型微米狭缝,进一步提高聚焦特性。 [0023] FIG. 3 (a), on the first metal film is further provided a layer of third metal I 3, the film thickness t3 = 200nm, a width of the opening than the first intermediate metal film I in a wider slot microns slit, the slit width W3 of microns, microns formed three stepped slit, to further improve the focusing characteristics. 当TM偏振光从微米狭缝的背面入射时,激发的SPPs沿着第一金属膜I的表面进行传播,它会被第三金属膜3中的微米狭缝的两壁反射然后散射,散射的光与先前已经聚焦的光发生干涉作用,散射光在第一金属膜I和第二金属膜2的焦点处相干相长。 When the TM polarized light incident from the back surface of the slit microns, for excitation of SPPs along the surface of the first metal film I propagation, it will be reflected in the slot 3 microns third metal film walls and scattering, scattering optical-interference function of focusing the light has previously occurred, the phase coherence length of the scattered light at the focal point of the first metal film and second metal film I 2. 图3(b)为聚焦强度和光斑大小(FWHM)随着微米狭缝的宽度W3变化的曲线图。 FIG 3 (b) and the intensity of a focused spot size (FWHM) graph micron slit with varying width W3. 如图所示,聚焦光强和光斑大小(FWHM)都表现出了一个周期性行为,它的振荡周期等于Aspp= 600nm,这与干涉条件相一致的;而且当聚焦强度达到最大值的时候,它的聚焦光斑大小则接近最小值。 As shown, the poly Jiaoguang Jiang and spot size (FWHM) exhibit a periodic behavior, which is equal to the oscillation period Aspp = 600nm, which is consistent with the interference condition; and when the intensity reaches a maximum when the focus, it is close to the minimum focused spot size. 当微米狭缝的宽度W3= 2000nm的时候,由于相干相长的作用聚焦强度达到最大值3.3,并且光斑大小变成FWHM = 300nm( < λ /2)。 When the m slit width W3 = 2000nm, because of the phase coherence length effects focusing strength reaches a maximum 3.3, and becomes a spot size FWHM = 300nm (<λ / 2).

[0024] 实施例三 [0024] Example three

[0025] 用有限厚度的介质膜替代无限厚度的玻璃衬底,聚焦强度会因为高折射率介质膜中的FP腔效应而有显著提高。 [0025] Alternatively infinite dielectric film with the thickness of the finite thickness of the glass substrate, because of the high refractive focusing strength FP cavity effect of the dielectric film has improved significantly. 如图4所示,衬底O采用高折射率的介质膜,折射率nd=3.5,厚度为td,入射光从空气4入射到介质膜的背面。 4, O substrate using a high refractive index dielectric film, the refractive index nd = 3.5, thickness td, incident light is incident from the air to the back surface 4 of the dielectric film. 图4(b)为聚焦强度随着介质膜的厚度的变化曲线图。 FIG. 4 (b) is a graph showing changes in focusing strength of the film with the thickness of the dielectric. 如图所示,聚焦强度的曲线呈现出一种周期振荡的现象,这个振荡的周期为90nm= λ/nd/2,与FP腔的效应相一致。 As shown, the focusing strength curve exhibits a phenomenon of periodic oscillation, the oscillation period of 90nm = λ / nd / 2, consistent with the effect of the FP cavity. 当介质膜的厚度td为180nm的时候,聚焦强度有最大值I = 5.2,也就是光波在介质膜内出现了相干相长,此时光斑大小仍为FWHM =300nm(< λ/2)。 When the thickness td of the dielectric film is 180nm when the focus has the maximum value of the intensity I = 5.2, which is the phase coherence length of light waves appeared in the film medium, then the spot size remains FWHM = 300nm (<λ / 2). 该聚焦强度比用缝-栅结构产生光强多9倍,它甚至比拥有65个不同宽度和深度的纳米缝阵列所产生的光强要强,但是这种纳米缝阵列结构在实验上很难制备。 The intensity ratio by focusing slit - gate structure produced nine times more light intensity, it is even more than 65 Nanostitching array has different widths and depths of the generated light intensity stronger, but this array structure Nanostitching experimentally difficult to prepare . 这个阶梯型微米狭缝与两侧包围着多个纳米缝的T型微米狭缝产生的光强大小几乎相同,但是这个T型的微米狭缝的横向尺寸却有10 μ m,远远大于本发明的横向尺寸。 The stepped slits microns sides surrounding light levels of a plurality of T-shaped slits of nano micron slit produced almost the same, but the T-shaped transverse dimension of the slit there microns 10 μ m, far larger than the present the transverse dimension of the invention. 而本发明对微米狭缝进行纵向排列,使得横向尺寸只有2 μπι,这对于实现表面等离激元器件的高密度集成是十分重要的。 And the present inventors microns longitudinal slits are arranged so that the transverse dimension of only 2 μπι, which for achieving a high density surface plasmon excitation integrated components is very important.

[0026] 还可以在第三金属膜上继续叠加金属膜,金属膜中的微米狭缝的宽度从下至上依次增大,通过有限元数值模拟可以调节各层金属膜的厚度和各层微米狭缝的宽度,从而得到最佳的聚焦的强度和光斑大小。 [0026] The metal film may also continue superposed third metal film, a metal film micron width of the slit increases from bottom to top, can adjust the thickness of each layer and the metal film layers microns narrow numerical simulation by the finite element width of the slit, thereby obtaining the intensity and spot size of the best focus.

[0027] 最后需要注意的是,公布实施方式的目的在于帮助进一步理解本发明,但是本领域的技术人员可以理解:在不脱离本发明及所附的权利要求的精神和范围内,各种替换和修改都是可能的。 [0027] Finally, it should be noted that the object of the embodiment is released further understanding of the present invention, those skilled in the art will appreciate: within the spirit and scope of the claims without departing from the present invention and the appended claims, various alternatives and modifications are possible. 因此,本发明不应局限于实施例所公开的内容,本发明要求保护的范围以权利要求书界定的范围为准。 Accordingly, the content of the present invention should not be limited to the disclosed embodiment embodiment, the scope of the present invention is required to scope of the claims and their equivalents.

Claims (9)

1.一种利用阶梯型微米狭缝实现的纳米聚焦器件,其特征在于,所述阶梯型微米狭缝纳米聚焦器件包括:衬底;在衬底上设置有依次叠放的多层金属膜;在每一层金属膜中开设有微米狭缝;微米狭缝的宽度从下至上依次增大,在纵向上呈阶梯形状;在衬底上设置有第一和第二金属膜,当TM偏振光从微米狭缝的背面入射时,沿着第一金属膜和第二金属膜中的两个微米狭缝的中间透射出两束光,调节所述第一和第二金属膜的厚度和微米狭缝的宽度,使得这两束透射光的焦点位置基本重合。 A step-type micron slit using nano achieve focusing device, wherein said stepped slit microns nanofocusing device comprising: a substrate; is provided with a multilayered metal film are sequentially stacked on a substrate; each opening in the metal film layer has a slit microns; m width of the slit increases from bottom to top, a stepped shape in a longitudinal direction; is provided with a first and second metal film on the substrate, when the TM polarized light when the back-illuminated from the slit m, the transmittance along the middle of the first metal film and a second metal film of the two slits microns two beams of light, adjusting the thickness of the first and the second metal film and a narrow microns width of the slit, such that the focal position of the two beams of transmitted light substantially coincides.
2.如权利要求1所述的纳米聚焦器件,其特征在于,所述微米狭缝的宽度决定焦点的位置,微米狭缝的宽度的越大,焦点的位置越高。 2. nanofocusing device according to claim 1, characterized in that the width of the slit m determined position of the focus, the larger the higher the position, the focus of the width of the slit m.
3.如权利要求1所述的纳米聚焦器件,其特征在于,调节在第一和第二金属膜上的第三金属膜的厚度和微米狭缝的宽度,使得第三金属膜中的微米狭缝的散射光与已经聚焦的光在焦点处相干相长。 3. nanofocusing device according to claim 1, characterized in that the adjustment microns thickness and the third metal film and second metal film of the first width of the slit, such that the third metal film microns narrow slit light scattering coherent light that has been focused at the focal point phase length.
4.如权利要求1所述的纳米聚焦器件,其特征在于,所述衬底采用高折射率的介质膜。 4. nanofocusing device according to claim 1, wherein said substrate using a high refractive index dielectric film.
5.如权利要求4所述的纳米聚焦器件,其特征在于,所述介质膜的厚度满足法布里-波罗(Fabry-Perot)腔共振条件。 5. nanofocusing device according to claim 4, wherein said dielectric film has a thickness satisfying Fabry - Polo (Fabry-Perot) cavity resonance condition.
6.如权利要求1、4或5所述的纳米聚焦器件,其特征在于,所述金属膜的材料采用贵金属。 6. nanofocusing device 4 or claim 5, wherein the metal material of the noble metal film.
7.如权利要求1所述的纳米聚焦器件,其特征在于,所述纳米聚焦器件的水平尺寸在I〜5 μ m之间。 7. nanofocusing device according to claim 1, characterized in that the focusing means between the horizontal dimension in the nano I~5 μ m.
8.如权利要求1所述的纳米聚焦器件,其特征在于,每一层金属膜的厚度在10nm〜I ym之间。 8. nanofocusing device according to claim 1, characterized in that the thickness of each layer between the metal film 10nm~I ym.
9.如权利要求1所述的纳米聚焦器件,其特征在于,所述微米狭缝的宽度在Ium〜.5 μ m之间。 9. nanofocusing device according to claim 1, characterized in that the width of the slit between micron Ium~.5 μ m.
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