CN103293770B - 显示基板及制造方法和液晶显示面板 - Google Patents

显示基板及制造方法和液晶显示面板 Download PDF

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CN103293770B
CN103293770B CN201310211853.5A CN201310211853A CN103293770B CN 103293770 B CN103293770 B CN 103293770B CN 201310211853 A CN201310211853 A CN 201310211853A CN 103293770 B CN103293770 B CN 103293770B
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CN103293770A (zh
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谢畅
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BOE Technology Group Co Ltd
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
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    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
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    • G02F1/1333—Constructional arrangements; Manufacturing methods
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    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
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    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
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    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/137—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells characterised by the electro-optical or magneto-optical effect, e.g. field-induced phase transition, orientation effect, guest-host interaction or dynamic scattering
    • G02F1/139—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells characterised by the electro-optical or magneto-optical effect, e.g. field-induced phase transition, orientation effect, guest-host interaction or dynamic scattering based on orientation effects in which the liquid crystal remains transparent
    • G02F1/1393—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells characterised by the electro-optical or magneto-optical effect, e.g. field-induced phase transition, orientation effect, guest-host interaction or dynamic scattering based on orientation effects in which the liquid crystal remains transparent the birefringence of the liquid crystal being electrically controlled, e.g. ECB-, DAP-, HAN-, PI-LC cells
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    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
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Abstract

本发明公开了一种显示基板及制造方法和液晶显示面板，该显示基板的取向层包括：第一取向结构和第二取向结构，所述第一取向结构位于透射区，所述第二取向结构位于反射区，所述第一取向结构为倾斜取向结构，第二取向结构为竖直取向结构。本发明通过对显示基板的取向层的取向结构的设计，从而实现了通过透射区和反射区的光线的相位延迟量的匹配，因此无需改变液晶显示面板的盒厚，从而提高了反射区和透射区的交界处对比度和彩色饱和度，进而提高了液晶显示面板的显示质量，同时，此种单盒厚的结构设计能简化液晶显示面板的制造工艺。

Description

显示基板及制造方法和液晶显示面板
技术领域
本发明涉及液晶显示领域，特别涉及一种显示基板及制造方法和液晶显示面板。
背景技术
液晶显示面板一般由彩膜基板和阵列基板对盒形成，彩膜基板和阵列基板之间的空间中封装有液晶层；由于液晶分子自身不发光，所以显示面板需要光源以便显示图像，根据采用光源类型的不同，液晶显示面板可分为透射式（Transmissive）液晶显示面板、反射式（Reflective）液晶显示面板和透反式（Transflective）液晶显示面板。其中，透反式液晶显示面板也称半透半反式液晶显示面板。
透反式液晶显示面板主要由彩膜基板和阵列基板对盒而成，彩膜基板和阵列基板之间填充液晶而构成液晶盒。透反式液晶显示面板具有多个像素区域，所述每个像素区域包括多个子像素区域，每个子像素区域包括透射区和反射区。当透反式液晶显示面板处于反射工作模式时，进入反射区的光线两次经过反射区，而当透反式液晶显示器处于透射工作模式时，进入透射区的光线只一次经过透射区，这样，就造成不同工作模式下透反式液晶显示面板中不同的光源发出的光线在反射区与透射区的光程不同，使得不同工作模式下透射区与反射区的色差较大，导致透反式液晶显示器中显示的影像出现色彩不协调的情况。
上述问题产生的原因在于反射区与透射区中的光线由于光程不同，进而使得通过透射区和反射区的光线的相位延迟量不匹配。为了改善色彩不协调的现象，目前，透反式液晶显示面板通常采用双盒厚间距设计方式，即反射区的液晶盒的盒厚为对应透射区的液晶盒的盒厚的一半，以保证通过透射区和反射区的光线的相位延迟量能够匹配，从而保证透射区和反射区的色差较小以及色彩协调。但是这种结构的液晶显示面板由于液晶盒存在盒厚差异，导致液晶显示面板的制作工艺复杂，盒厚均匀性不易控制，而且在反射区和透射区的交界处可能因液晶盒盒厚的不同而使液晶分子产生畸形，从而造成交界处的对比度不高,彩色饱和度不好。
发明内容
本发明要解决的技术问题是提供一种显示基板及制造方法和液晶显示面板，该显示基板应用于液晶显示面板中，可使得透射区和反射区的盒厚相等，从而提高反射区和透射区的交界处对比度和彩色饱和度，同时，单盒厚的结构能简化液晶显示面板的制造工艺。
为实现上述目的，本发明提供一种显示基板，该显示基板包括：取向层，所述取向层包括：第一取向结构和第二取向结构，所述第一取向结构位于透射区，所述第二取向结构位于反射区，所述第一取向结构为倾斜取向结构，第二取向结构为竖直取向结构。
可选地，所述显示基板为阵列基板，所述阵列基板包括：第一衬底基板、阵列基板结构和所述取向层，所述阵列基板结构形成于所述第一衬底基板上，所述取向层形成于所述阵列基板结构之上。
可选地，所述显示基板为彩膜基板，所述彩膜基板包括：第二衬底基板、彩膜基板结构和所述取向层，所述彩膜基板结构形成于所述第一衬底基板上，所述取向层形成于所述彩膜基板结构之上。
为实现上述目的，本发明提供一种显示基板的制造方法，该方法包括：在衬底基板上形成显示基板结构；在所述显示基板结构上形成取向层基层；对所述取向层基层进行取向处理，形成第一取向结构和第二取向结构，所述第一取向结构为倾斜取向结构，第二取向结构为竖直取向结构。
可选地，所述对所述取向层基层进行取向处理，形成所述第一取向结构和所述第二取向结构包括：对所述取向层基层进行摩擦取向处理，使得所述第一取向结构和所述第二取向结构形成倾斜取向结构；对所述第二取向结构进行光取向处理，使得所述第二取向结构形成竖直取向结构。
可选地，所述对所述取向层基层进行取向处理，形成所述第一取向结构和所述第二取向结构包括：对所述取向层基层进行光取向处理，使得所述第一取向结构和所述第二取向结构形成倾斜取向结构；对所述第二取向结构进行光取向处理，使得所述第二取向结构形成竖直取向结构。
可选地，所述在衬底基板上形成显示基板结构具体包括：在衬底基板上形成阵列基板结构，或者在衬底基板上形成彩膜基板结构。
为实现上述目的，本发明提供一种液晶显示面板，该液晶显示面板包括：阵列基板和彩膜基板，所述阵列基板和所述彩膜基板相对设置，所述阵列基板和所述彩膜基板之间填充有液晶层，所述阵列基板的取向层包括：第一取向结构和第二取向结构，所述第一取向结构位于透射区，所述第二取向结构位于反射区，所述第一取向结构为倾斜取向结构，第二取向结构为竖直取向结构，所述彩膜基板的取向层为倾斜取向结构；或者所述彩膜基板的取向层包括：第一取向结构和第二取向结构，所述第一取向结构位于透射区，所述第二取向结构位于反射区，所述第一取向结构为倾斜取向结构，第二取向结构为竖直取向结构，所述阵列基板的取向层为倾斜取向结构。
可选地，所述液晶层为正性液晶层。
本发明具有以下有益效果：
本发明提供的一种显示基板及制造方法和液晶显示面板，通过对显示基板的取向层的取向结构的设计，实现了通过透射区和反射区的光线的相位延迟量的匹配，因此无需改变液晶显示面板的盒厚，从而提高了反射区和透射区的交界处对比度和彩色饱和度，进而提高了液晶显示面板的显示质量，同时，此种单盒厚的结构设计能简化液晶显示面板的制造工艺。
附图说明
图1为本发明实施例二提供的显示基板的结构示意图；
图2为本发明实施例三提供的显示基板的结构示意图；
图3为本发明实施例四提供的显示基板的制造方法；
图4为本发明实施例四提供的液晶显示面板的结构示意图；
图5为对图4中液晶显示面板施加电压时的示意图。
附图标记说明
1-第一衬底基板；2-阵列基板结构；
201-反射层；3-取向层；
4-阵列偏光层；5-第二衬底基板；
6-彩膜基板结构；7-取向层；
8-彩膜偏光层；9-液晶层。
具体实施方式
为使本领域的技术人员更好地理解本发明的技术方案，下面结合附图对本发明提供的显示基板、液晶显示面板及制造方法进行详细描述。
实施例一
本发明实施例一提供一种显示基板，该显示基板包括：取向层，取向层包括：第一取向结构和第二取向结构，第一取向结构位于透射区，第二取向结构位于反射区，第一取向结构为倾斜取向结构，第二取向结构为竖直取向结构。
本发明提供的实施例一通过对显示基板的取向层的取向结构的设计，实现了通过透射区和反射区的光线的相位延迟量的匹配，因此无需改变液晶显示面板的盒厚，从而提高了反射区和透射区的交界处对比度和彩色饱和度，进而提高了液晶显示面板的显示质量，同时，此种单盒厚的结构设计能简化液晶显示面板的制造工艺。
实施例二
图1为本发明实施例二提供的显示基板的结构示意图，如图1所示，该显示基板为阵列基板，该阵列基板包括：第一衬底基板1、阵列基板结构2和取向层3，阵列基板结构2形成于第一衬底基板1上，取向层3形成于阵列基板结构2之上，取向层3包括：第一取向结构和第二取向结构，第一取向结构位于透射区，第二取向结构位于反射区，第一取向结构为倾斜取向结构，第二取向结构为竖直取向结构。其中，阵列基板结构2中形成有反射层201，反射层201位于反射区。具体地，阵列基板结构2可包括：栅线和数据线，栅线和数据线限定像素单元，像素单元内形成有薄膜晶体管（TFT）和与薄膜晶体管电连接的像素电极，像素电极和薄膜晶体管之间形成有钝化层，在反射区且位于钝化层与第一衬底基板1之间形成有反射层201。本实施例中所描述的阵列基板结构2的具体结构仅为一种示例，在实际应用中还可以采用其它具体结构。此外，本实施例中描述的阵列基板中包括的栅线、数据线、像素单元、薄膜晶体管、像素电极和钝化层在图示中没有表示出来。
在实际应用中，第一衬底基板1的背面还形成有阵列偏光层4。
本发明提供的实施例二通过显示基板的取向层的取向结构的设计，实现了通过透射区和反射区的光线的相位延迟量的匹配，因此无需改变液晶显示面板的盒厚，从而提高了反射区和透射区的交界处对比度和彩色饱和度，进而提高了液晶显示面板的显示质量，同时，此种单盒厚的结构设计能简化液晶显示面板的制造工艺。
实施例三
图2为本发明实施例三提供的显示基板的结构示意图，如图2所示，该显示基板为彩膜基板，该彩膜基板包括：第二衬底基板5、彩膜基板结构6和取向层3，彩膜基板结构6形成于第二衬底基板5上，取向层3形成于彩膜基板结构6之上，取向层3包括：第一取向结构和第二取向结构，第一取向结构位于透射区，第二取向结构位于反射区，第一取向结构为倾斜取向结构，第二取向结构为竖直取向结构。其中，彩膜基板结构6可包括：彩色矩阵图形、黑矩阵图形和公共电极层，公共电极层形成于彩色矩阵图形和黑矩阵图形的上方。本实施例中所描述的彩膜基板结构6的具体结构仅为一种示例，在实际应用中还可以采用其它具体结构。此外，本实施例中描述的彩膜基板中包括的彩色矩阵图形、黑矩阵图形和公共电极层在图示中没有表示出来。
在实际应用中，第二衬底基板5的背面还形成有彩膜偏光层8。
本发明提供的实施例三通过对显示基板的取向层的取向结构的设计，实现了通过透射区和反射区的光线的相位延迟量的匹配，因此无需改变液晶显示面板的盒厚，从而提高了反射区和透射区的交界处对比度和彩色饱和度，进而提高了液晶显示面板的显示质量，同时，此种单盒厚的结构设计能简化液晶显示面板的制造工艺。
实施例四
图3为本发明实施例四提供的显示基板的制造方法，该方法包括：
步骤1001：在衬底基板上形成显示基板结构。
步骤1002：在所述显示基板结构上形成取向层基层。
步骤1003：对所述取向层基层进行取向处理，形成第一取向结构和第二取向结构，所述第一取向结构为倾斜取向结构，第二取向结构为竖直取向结构。
可选地，步骤1003包括：
步骤1013：对取向层基层进行摩擦（Rubbing）取向处理，使得第一取向结构和第二取向结构形成倾斜取向结构。
步骤1023：对第二取向结构进行光取向处理，使得第二取向结构形成竖直取向结构。
可选地，步骤1003包括：
步骤1033：对取向层基层进行光取向处理，使得第一取向结构和第二取向结构形成倾斜取向结构。
步骤1043：对第二取向结构进行光取向处理，使得第二取向结构形成竖直取向结构。
可选地，步骤1001包括：
步骤1011：在衬底基板上形成阵列基板结构。
或者，步骤1021：衬底基板上形成彩膜基板结构。
本发明提供的实施例四通过对显示基板的制造方法的设计，实现了通过透射区和反射区的光线的相位延迟量的匹配，因此无需改变液晶显示面板的盒厚，从而提高了反射区和透射区的交界处对比度和彩色饱和度，进而提高了液晶显示面板的显示质量，同时，此种单盒厚的结构设计能简化液晶显示面板的制造工艺。
实施例五
图4为本发明实施例四提供的液晶显示面板的结构示意图，图5为对图4中液晶显示面板施加电压时的示意图，如图4和图5所示，该液晶显示面板包括：阵列基板和彩膜基板，阵列基板和彩膜基板相对设置，阵列基板和彩膜基板之间填充有液晶层9。
阵列基板采用上述实施例二提供的显示基板，彩膜基板为倾斜取向结构，或者彩膜基板采用上述实施例三提供的显示基板，阵列基板为倾斜取向结构。
参照图4对彩膜基板采用上述实施例三提供的显示基板，阵列基板为倾斜取向结构的情况进行详细描述。其中，该彩膜基板包括：第二衬底基板5、彩膜基板结构6和取向层3，其中，彩膜基板的取向层3包括：第一取向结构和第二取向结构，第一取向结构位于透射区，第二取向结构位于反射区，第一取向结构为倾斜取向结构，第二取向结构为竖直取向结构。彩膜基板结构6可包括：彩色矩阵图形、黑矩阵图形和公共电极层，公共电极层形成于彩色矩阵图形和黑矩阵图形的上方。该阵列基板包括：第一衬底基板1、阵列基板结构2和取向层7，阵列基板结构2可包括：栅线和数据线，栅线和数据线限定像素单元，像素单元内形成有薄膜晶体管（TFT）和与薄膜晶体管电连接的像素电极，像素电极和薄膜晶体管之间形成有钝化层，在反射区且位于钝化层和第一衬底基板内部形成有反射层201。阵列基板的取向层7的整体为倾斜取向结构。本实施例中所描述的阵列基板结构2和彩膜基板结构6的具体结构仅为一种示例，在实际应用中还可以采用其它具体结构。
对于阵列基板采用上述实施例二提供的显示基板，彩膜基板的取向层为倾斜取向结构的的情况，其中阵列基板的具体描述可参照实施例二，此处不再赘述，彩膜基板包括该彩膜基板包括：第二衬底基板、彩膜基板结构和取向层，彩膜基板的取向层的整体为倾斜取向结构。此种情况没有给出相应的附图。
可选地，液晶层9为正性液晶层。
在实际应用中，第一衬底基板1的背面还形成有阵列偏光层4，第二衬底基板5的背面还形成有彩膜偏光层8。
结合图4和图5对本发明的原理进行详细的说明。如图4所示，当该液晶显示面板没有被施加电压时，在透射区内，阵列基板上的取向层7位于透射区的部分设有一定的倾斜角，彩膜基板上的取向层3位于透射区的部分设有一定的倾斜角，则靠近阵列基板上的取向层7和彩膜基板上的取向层3的液晶会产生一定的偏转，而且会带动相邻的液晶产生偏转，当有光线经过透射区时，经过透射区的光线会产生较大的相位延迟量。较优地，透射区采用光学补偿弯曲排列（OpticallyCompensatedBirefringence，简称OCB）模式。在反射区内，阵列基板上的取向层7位于反射区的部分设有一定的倾斜角，彩膜基板上的取向层3位于反射区的部分没有设定倾斜角，则靠近彩膜基板上的取向层3的液晶不会偏转，靠近阵列基板上的取向层7的液晶会产生一定的偏转，当有光线经过透射区时，经过透射区的光线会产生较小的相位延迟量。通过设定倾斜角，使得经过透射区的光线会产生比反射区更大的有效折射率，也就是有效折射率Δn透=2×Δn反，即透射区中液晶的有效折射率为反射区中液晶的有效折射率的2倍；而反射区的光线因为被反射层201反射的缘故相当于两次经过液晶层9，也就是实际路程d反=2×d透，即反射区的光线的实际路程为透射区的光线的实际路程的2倍。由于相位延迟量（光程）=有效折射率×实际路程，即Δn透×d透=Δn反×d反，因此使得透射区和反射区的液晶的相位延迟量相等，也就实现了透射区和反射区的相位延迟量的匹配，并最终达到半透半反的显示效果。
如图5所示，当该液晶显示面板被施加电压时，位于透射区和反射区内的液晶层9在竖直电场的作用下，液晶分子呈竖直排列，此时透射区和反射区竖直入射的经过竖直排列的液晶层9均不会产生相位延迟量，由于出射光线的偏振方向没有发生变化，所以出射光线会被彩膜偏光层8完全挡住，实现暗态的显示。
本发明提供的实施例五通过对阵列基板的取向层和彩膜基板的取向层取向结构的设计，实现了通过透射区和反射区的光线的相位延迟量的匹配，因此无需改变液晶显示面板的盒厚，从而提高了反射区和透射区的交界处对比度和彩色饱和度，进而提高了液晶显示面板的显示质量，同时，此种单盒厚的结构设计能简化液晶显示面板的制造工艺。
可以理解的是，以上实施方式仅仅是为了说明本发明的原理而采用的示例性实施方式，然而本发明并不局限于此。对于本领域内的普通技术人员而言，在不脱离本发明的精神和实质的情况下，可以做出各种变型和改进，这些变型和改进也视为本发明的保护范围。

Claims (4)

1.一种显示基板的制造方法，其特征在于，包括:
在衬底基板上形成显示基板结构；
在所述显示基板结构上形成取向层基层；
对所述取向层基层进行取向处理，形成第一取向结构和第二取向结构，所述第一取向结构为倾斜取向结构，第二取向结构为竖直取向结构；
其中，所述对所述取向层基层进行取向处理，形成所述第一取向结构和所述第二取向结构包括：
对所述取向层基层进行摩擦取向处理或光取向处理，使得所述第一取向结构和所述第二取向结构形成倾斜取向结构；
对所述第二取向结构进行光取向处理，使得所述第二取向结构形成竖直取向结构。
2.如权利要求1所述的显示基板的制造方法，其特征在于，所述在衬底基板上形成显示基板结构包括：在衬底基板上形成阵列基板结构；
或在衬底基板上形成彩膜基板结构。
3.一种液晶显示面板，其特征在于，包括：阵列基板和彩膜基板，所述阵列基板和所述彩膜基板相对设置，所述阵列基板和所述彩膜基板之间填充有液晶层；
所述阵列基板包括：第一衬底基板、阵列基板结构和取向层，所述阵列基板结构形成于所述第一衬底基板上，所述取向层形成于所述阵列基板结构之上，所述取向层包括：第一取向结构和第二取向结构，所述第一取向结构位于透射区，所述第二取向结构位于反射区，所述第一取向结构为倾斜取向结构，第二取向结构为竖直取向结构；
所述彩膜基板的取向层为倾斜取向结构；或
所述彩膜基板包括：第二衬底基板、彩膜基板结构和取向层，所述彩膜基板结构形成于所述第二衬底基板上，所述取向层形成于所述彩膜基板结构之上，所述取向层包括：第一取向结构和第二取向结构，所述第一取向结构位于透射区，所述第二取向结构位于反射区，所述第一取向结构为倾斜取向结构，第二取向结构为竖直取向结构；
所述阵列基板的取向层为倾斜取向结构。
4.如权利要求3所述的液晶显示面板，其特征在于，所述液晶层为正性液晶层。
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