CN1032807A - 含光致变色(光漂白性)的离子型染料络合物的光固化组合物 - Google Patents

含光致变色(光漂白性)的离子型染料络合物的光固化组合物 Download PDF

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CN1032807A
CN1032807A CN88106711A CN88106711A CN1032807A CN 1032807 A CN1032807 A CN 1032807A CN 88106711 A CN88106711 A CN 88106711A CN 88106711 A CN88106711 A CN 88106711A CN 1032807 A CN1032807 A CN 1032807A
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photocurable composition
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彼得·戈特肖克
道格拉斯·西·尼科斯
加里·勃·舒斯特
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/72Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/002Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/115Cationic or anionic
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/117Free radical
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/128Radiation-activated cross-linking agent containing

Abstract

一种在基体上涂敷经射线固化基本无色的组合 物的方法,该方法包括用对可见光感光的组合物涂敷 基体,这种组合物由可自由基加成聚合或交联的物质 以及能吸收可见光并产生自由基的光致变色(光漂白 性)的离子型染料-相反离子化合物所组成;将所述 组合物受光照射而固化;并使该离子型染料脱色成基 本无色状态,含有光致变色(光漂白性)的离子型染料 -相反离子化合物作光引发剂的光固化组合物可用 于上述方法。

Description

本申请是美国申请944,305(申请日为1986年12月18日)的部分继续申请。
上述同类的申请相当于欧洲申请公开0233587,涉及含离子型染料络合物作光引发剂的光固化组合物。这些络合物的特征在于当受光化性射线尤其是可见光照射时,它们直接或间接产生游离基。
在人的眼睛看来,对可见光敏感的组合物本身是有颜色的。有一些用途要求使用受可见光照射时能固化又不带色的组合物。例如,在层合玻璃中,如果组合物带色,会使玻璃着色,这是不希望的。同样,在涂敷光学纤维时,如果不是由于涂得的纤维外观带色使用肉眼所看得见的光引发剂就会感到方便。在这些应用中,光致变色(光漂白性)的离子型染料络合物特别有用。在同类的申请中公开的某些组合物中,已注意到这种染料是光致变色的(光漂白性)的。
本发明尤其涉及含光致变色(光漂白性)的离子型染料络合物作引发剂对可见光感光的光固化组合物。它是由可自由基加成聚合或交联的物质和光致变色(光漂白性)的离子型染料-相反离子化合物所组成,所述化合物能吸收可见光并产生引发聚合或交联的自由基。所述离子型染料-相反离子化合物在受光照射之前是稳定的非瞬态化合物,并可溶于可自由基加成或交联的化合物中,而在受光照射之后,电子从染料转移到相反离子或从相反离子转移到染料,电子转移的速率大于受扩散控制的速率。上述可自由基加成聚合或交联的物质含有烯属不饱和化合物。
本发明还公开了一种以可见光固化性组合物涂敷某一基体的方法,该方法的特征在于,该组合物含有光致变色(光漂白性)的离子型染料络合物作光引发剂。
本发明的组合物和方法可用于要求射线固化的涂层基本上为无色(如清亮、透明或白色)的用途。这些应用的典型例子有玻璃层合、光学纤维的涂敷或含有二氧化钛等白色颜料的组合物的涂敷。
在美国申请944,305(申请日1986年12月18日,相当于欧洲申请公开0223587)中综合叙述了用于本发明的离子型染料络合物。在共同受让的美国申请057,544(申请日为1987年6月3日)中则特别提到吨染料络合物。
用于本发明的离子型染料络合物的特征在于它们是光致变色(光漂白性)的。
在上述申请中提到的聚合或交联性物质在本发明中是有效的。在上述申请中提到的光引发剂体系在本发明中也是有效的,但要求该离子型染料-相反离子化合物是光致变色(光漂白性)的。美国申请944,305(相当于欧洲申请公开0233587)里公开的所有染料络合物中,全体花青染料络合物都是效率和速度不同的光致变色(光漂白性)化合物。一些更有效的光致变色(光漂白性)络合物有:
Figure 881067113_IMG4
就光致变色(光漂白性)来说,亚甲蓝和三苯基丁基硼酸酯的吖嗪染料络合物是最有效的一种络合物。其结构为
Figure 881067113_IMG5
玫瑰红-鎓盐的染料络合物也是光致变色(光漂白性)的。这些玫瑰红及其苯甲基酯与二苯基碘鎓离子[包括二(4-叔丁基苯基)碘鎓离子]的络合物都是光致变色(光漂白性)的,效率极高。
在本发明中,组合物受可见光照射固化时,光致变色的染料络合物可随之脱色,或受紫外线等去色射线的后曝光作用而脱色。它们包括阴离子型染料-鎓离子络合物或阴离子型染料-吡喃鎓离子络合物或以下式表示的阳离子型染料-硼酸酯阴离子:
式中D是阳离子染料部分:R1、R2、R3和R4可以相同或不同;选自烷基、芳基、芳烷基、烷芳基、链烯基、炔基、脂环基、杂环基和烯丙基。最好至少一个是烷基。阳离子染料选自阳离子次甲基和多次甲基染料、三芳基甲烷、二氢吲哚、吖嗪、噻嗪、呫吨、恶嗪和吖啶染料以及阳离子花青、羰花青、半花青染料、若丹明和氮杂次甲基染料。阴离子染料选自呫吨染料和Oxonol染料。
经过以上对本发明的详细叙述,以及参考其中推荐的具体实施方案,显而易见,只要不脱离所附权利要求所规定的本发明的范围,可以会有各种改型和变化。

Claims (19)

1、一种对可见光感光的光固化组合物,它是由可自由基加成聚合或交联的物质和光致变色,光漂白性的离子型染料一相反离子化合物所组成,所述化合物能吸收可见光并产生引发所述物质聚合或交联的自由基。
2、权利要求1的光固化组合物,其中所述离子型染料一相反离子化合物在受光照射之前是稳定的非瞬态化合物。
3、权利要求1的光固化组合物,其中所述离子型染料一相反离子化合物在所述可自由基加成聚合或交联的化合物中是可溶性的。
4、权利要求3的光固化组合物,其中所述离子型染料一相反离子化合物在受光照射之后,电子从该染料转移到该相反离子或从相反离子转移到染料,电子转移速率大于受扩散控制的速率。
5、权利要求1的光固化组合物,其中所述化合物是阴离子型染料化合物。
6、权利要求5的光固化组合物,其中所述阴离子型染料选自呫吨染料和Oxonol染料。
7、权利要求6的光固化组合物,其中所述的离子型染料一相反离子化合物是阴离子型染料-鎓离子络合物或阴离子型染料-吡喃鎓离子络合物。
8、权利要求7的光固化组合物,其中所述染料是呫吨染料。
9、权利要求1的光固化组合物,其中所述离子型染料一相反离子化合物是以下式表示的阳离子型染料-硼酸酯阴离子化合物:
其中D是阳离子染料部分;R1、R2、R3和R4可以相同或不同,并从下面这类基团中选取,它们是:烷基、芳基、芳烷基、烷芳基、链烯基、炔基、脂环基、杂环基和烯丙基。
10、权利要求9的光固化组合物,其中所述阳离子型染料可从下面这类染料中选取,它们是阳离子次甲基和多次甲基染料、三芳基甲烷染料、二氢吲哚、吖嗪、噻嗪、呫吨、恶嗪和吖啶染料。
11、权利要求10的光固化组合物,其中所述阳离子型染料可从阳离子花青、羰花青、半花青染料、若丹明和氮杂次甲基染料中选取。
12、权利要求11的光固化组合物,其中所述可聚合或交联的物质含有烯属不饱和化合物。
13、权利要求12的光固化组合物,其中,R1、R2、R3和R4里至少一个是烷基。
14、权利要求13的光固化组合物,其中所述R1R2和R3是芳基,R4是烷基。
15、权利要求7的光固化组合物,其中所述光致变色(光漂白性)的离子型染料一相反离子化合物是玫瑰红或玫瑰红苯甲基酯与二苯碘鎓离子的络合物。
16、权利要求9的光固化组合物,其中所述阳离子染料是吖嗪染料。
17、权利要求16的光固化组合物,其中所述吖嗪染料是亚甲蓝。
18、权利要求16的光固化组合物,其中所述阳离子型染料选自下式所示的这类化合物
Figure 881067113_IMG3
19、一种在基体上涂敷经射线固化基本无色的组合物的方法,该方法包括用对可见光感光的组合物涂敷基体,这种组合物由可自由基加成聚合或交联的物质以及能吸收可见光并产生自由基的光致变色(光漂白性)的离子型染料一相反离子化合物所组成;将所述组合物受光照射而固化;并使该离子型染料脱色成基本无色状态。
CN88106711A 1987-09-18 1988-09-16 含光致变色(光漂白性)的离子型染料络合物的光固化组合物 Pending CN1032807A (zh)

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US07/098,358 US4895880A (en) 1986-05-06 1987-09-18 Photocurable compositions containing photobleachable ionic dye complexes
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US4895880A (en) 1990-01-23
DE3851191D1 (de) 1994-09-29
KR890005575A (ko) 1989-05-15
EP0308274A2 (en) 1989-03-22
DE3851191T2 (de) 1995-01-19
JPH01152450A (ja) 1989-06-14
EP0308274A3 (en) 1989-07-12

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