CN103246040B - High-accuracy repeated positioning structure capable of achieving rapid changing and used in photoetching projection lens - Google Patents
High-accuracy repeated positioning structure capable of achieving rapid changing and used in photoetching projection lens Download PDFInfo
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- CN103246040B CN103246040B CN201310146354.2A CN201310146354A CN103246040B CN 103246040 B CN103246040 B CN 103246040B CN 201310146354 A CN201310146354 A CN 201310146354A CN 103246040 B CN103246040 B CN 103246040B
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- slideway
- picture frame
- slide rail
- locating slot
- conical recess
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Abstract
The invention discloses a high-accuracy repeated positioning structure capable of achieving rapid changing and used in a photoetching projection lens, and belongs to the field of installation and positioning structures of protection windows under photoetching projection lenses. The structure comprises a protection window lens frame, positioning ball heads, a positioning slot slide rail, magnetic steel pieces and the like; the magnetic steel pieces are mounted inside the lens frame so as to overcome the dead weight of the protection window lens frame and provide an adsorption force; and a protection window lens is bonded in the lens frame, so that the lens frame and a lens can be changed at the same time. During disassembly, in order to reduce the absorption of magnetic steel to the positioning ball heads, a positioning slot is designed into an annular inclined plane, and the disassembly is facilitated. A conical groove on the positioning slot slide rail is used for achieving high-accuracy repeated positioning, and the installation is facilitated. The high-accuracy repeated positioning structure has the advantages the structure is simple, the installation and the disassembly are facilitated, screws are not required to be installed, the adsorption force is adjustable, and the like; and screws are not required for fastening the lens frame, so that potential threats to a lens table when the screws fall accidentally in installation and disassembly processes are avoided.
Description
Technical field
The invention belongs to protecting window installation and positioning structure field under photoetching projection objective lens, be specifically related to a kind of high repetitive positioning accuracy structure for fast changeable in photoetching projection objective lens.
Background technology
Projection lithography technology is large scale integrated circuit manufacturing technology and micro-optic, the guide of micro mechanical technology and basis, determines the integrated level of integrated circuit.Projection lithography apparatus is the key equipment in large scale integrated circuit manufacturing process, and along with the continuous increase of the market demand, lithographic equipment overall performance improves year by year, and its productive rate becomes the important indicator that lithographic equipment is evaluated already.Because the interval bottom object lens and between silicon chip to be processed is very little, in a photolithographic process because volatilization effect can cause object lens bottom mirror easily to be polluted, cause the image quality of whole system can be subject to serious impact.But the maintenance process such as precision focusing, location and installation when changing objective lenses is very consuming time, causes inefficiency, has a strong impact on manufacturing schedule, cause economic loss.
Summary of the invention
In order to solve existing light projection photoetching objective lens operationally bottom mirror be easily subject to volatile matter pollute, and the maintenance process such as precision focusing, location and installation when changing objective lenses is very consuming time, cause the technical matters that production efficiency is low, the invention provides a kind of high repetitive positioning accuracy structure for fast changeable in photoetching projection objective lens.
The technical scheme that technical solution problem of the present invention is taked is as follows:
High repetitive positioning accuracy structure for fast changeable in photoetching projection objective lens comprises: three magnetic links, three location bulbs, lower protecting window picture frame, locating slot slide rail, three trip bolts and be connected picture frame; Described lower protecting window picture frame comprises lower protecting window picture frame flange and is positioned at the annulus sidewall of the band internal groove above lower protecting window picture frame flange, annulus sidewall and lower protecting window picture frame flange one-body molded; Lower protecting window picture frame flange is provided with three cylindrical locating slots, and three cylindrical locating slots are distributed in concentric circumferentially same with lower protecting window picture frame flange according to the angle of circumference of 120 ° each other; The bottom of each cylindrical locating slot has the counterbore for mounting screw; Described location bulb is made up of place kick and the cylindrical columns that is fixed on its lower end, and place kick is ferrimagnet, and the bottom of cylindrical columns has internal thread hole; Cylindrical columns inserts in cylindrical locating slot, and trip bolt inserts counterbore from the below of lower protecting window picture frame flange and is threaded with cylindrical columns; Described connection picture frame is provided with the mounting interface for installing locating slot slide rail, three mounting holes for mounting magnetic steel sheet and the internal thread hole for installing locating slot slide rail, and mounting hole and internal thread hole are all positioned on the bottom surface of mounting interface; Three mounting holes are distributed in locating slot place cylindrical with three radius of a circle identical circumferentially according to the angle of circumference of 120 ° each other, and this circumference is with to be connected picture frame concentric; Described locating slot slide rail is provided with slideway, and slideway place circumference is identical with three cylindrical locating slot place radiuss of a circle.
Above-mentioned locating slot slide rail is annular positioning groove slide rail, and it comprises annulus slideway and three for locating the conical recess of place kick, and three conical recess are distributed on annulus slideway according to the angle of circumference of 120 ° each other; The cone tip of described conical recess has through hole, and magnetic links is arranged in magnetic links mounting hole through through hole.
Above-mentioned locating slot slide rail is made up of three split fix groove slide rail blocks, split fix groove slide rail block upper surface be provided with one end open circular arc slideway, for locating the conical recess of place kick, slideway slope and platform, platform is positioned at domatic bottom, slideway slope and one-body molded with slideway slope; Circular arc slideway open slideway slope domatic on, the openend of circular arc slideway is positioned at domatic top; Conical recess is connected to the other end of circular arc slideway, the slope lower end on slideway slope and the upper surface of platform intersect at straight line, circular cone rotation and this intersection of conical recess intersect at a point, circular cone rotational axis vertical in the upper surface of platform, the circular conical surface of conical recess and the sidewall of circular arc slideway tangent; Conical recess is distributed in circular arc slideway place circumferentially according to the angle of circumference of 120 ° each other, and the cone tip of conical recess has through hole, and magnetic links is arranged in magnetic links mounting hole through through hole.
The invention has the beneficial effects as follows: this location structure can avoid the pollution of volatile substance for the protection of photoetching projection objective lens; himself contaminated rear fast changeable; and the installation of high position precision can be guaranteed; avoid precision focusing when changing object lens and location and installation process; all the time ensure that photoetching projection objective lens has good optical property thus; and saved a large amount of maintenance time, improve the whole work efficiency of etching system.
Accompanying drawing explanation
Fig. 1 is the semisectional view of the present invention for the high repetitive positioning accuracy structure application schematic diagram of fast changeable in photoetching projection objective lens;
Fig. 2 is the three-dimensional structure diagram of Fig. 1;
Fig. 3 be under the present invention protecting window picture frame assembly overlook assembling schematic diagram;
Fig. 4 is the side-looking semisectional view of Fig. 3;
Fig. 5 is the perspective view of split fix groove slide rail block of the present invention;
Fig. 6 is the front elevation of Fig. 5;
Fig. 7 is the vertical view of Fig. 5;
Fig. 8 is the left view of Fig. 5;
Fig. 9 is that the A-A of Fig. 7 is to cut-open view;
Figure 10 is split fix groove slide rail block mounting structure schematic diagram of the present invention;
Figure 11 is the side-looking semisectional view of Figure 10;
Figure 12 is the perspective view of annular positioning groove slide rail of the present invention;
Figure 13 is the side-looking semisectional view of Figure 11.
Embodiment
Below in conjunction with accompanying drawing, the present invention is described in further details.
As depicted in figs. 1 and 2, the present invention is used for the high repetitive positioning accuracy structure of fast changeable in photoetching projection objective lens and comprises: three magnetic links, 1, three location bulbs 2, lower protecting window picture frame 3, locating slot slide rail, three trip bolts 4 and be connected picture frame 7.
As shown in Figure 3 and Figure 4; lower protecting window picture frame 3 comprises lower protecting window picture frame flange 3-1 and is positioned at the annulus sidewall 3-2 of the band internal groove above lower protecting window picture frame flange 3-1; annulus sidewall 3-2 and lower protecting window picture frame flange 3-1 is one-body molded, and they form the protecting window to photoetching projection objective lens jointly with the lower protecting window eyeglass 6 being arranged on lower protecting window picture frame flange 3-1 center.Lower protecting window picture frame flange 3-1 is provided with three cylindrical locating slot 3-1-1, and three cylindrical locating slot 3-1-1 are distributed in concentric circumferentially same with lower protecting window picture frame flange 3-1 according to the angle of circumference of 120 ° each other.The bottom of each cylindrical locating slot 3-1-1 has the counterbore 3-1-1-1 for mounting screw.
Location bulb 2 is made up of place kick 2-1 and the cylindrical columns 2-2 that is fixed on its lower end, and place kick 2-1 is ferrimagnet, and the bottom of cylindrical columns 2-2 has internal thread hole.Cylindrical columns 2-2 inserts in cylindrical locating slot 3-1-1, and trip bolt 4 inserts counterbore 3-1-1-1 from the below of lower protecting window picture frame flange 3-1 and is threaded with cylindrical columns 2-2, to make location bulb 2 reliably fix straight up.
Connecting picture frame 7 is lens assemblies bottom on original photoetching projection objective lens, as shown in Figure 10 and Figure 11, connect picture frame 7 be provided with mounting interface 7-1 for installing locating slot slide rail, three for the mounting hole 7-2 of mounting magnetic steel sheet 1 and the internal thread hole for installing locating slot slide rail, mounting hole 7-2 and internal thread hole are all positioned on the bottom surface of mounting interface 7-1.Three mounting hole 7-2 are distributed in locating slot 3-1-1 place cylindrical with three radius of a circle identical circumferentially according to the angle of circumference of 120 ° each other, and this circumference is with to be connected picture frame 7 concentric.
Locating slot slide rail is provided with slideway, and slideway place circumference is identical with three cylindrical locating slot 3-1-1 place radiuss of a circle.Set bolt passes connection picture frame 7 from top and the internal thread hole corresponding with locating slot slide rail is threaded, to be fixed by locating slot slide rail.
As shown in Figure 12 and Figure 13, locating slot slide rail is annular positioning groove slide rail 8, and it comprises annulus slideway 8-1 and three for locating the conical recess 8-2 of place kick 2-1, and three conical recess 8-2 are distributed on annulus slideway 8-1 according to the angle of circumference of 120 ° each other.The cone tip of conical recess 8-2 has through hole 8-2-1, and magnetic links 1 is arranged in magnetic links mounting hole 7-2 through through hole 8-2-1.
As shown in Figures 5 to 9, locating slot slide rail can also be the version being substituted annular positioning groove slide rail 8 by three split fix groove slide rail blocks 5, split fix groove slide rail block 5 upper surface be provided with one end open circular arc slideway 5-1, be positioned at the domatic bottom of slideway slope 5-3 for conical recess 5-2, the slideway slope 5-3 and platform 5-4, platform 5-4 locating place kick 2-1 and one-body molded with slideway slope 5-3.Circular arc slideway 5-1 open slideway slope 5-3 domatic on, the openend of circular arc slideway 5-1 is positioned at domatic top.Conical recess 5-2 is connected to the other end of circular arc slideway 5-1, the slope lower end of slideway slope 5-3 and the upper surface of platform 5-4 intersect at straight line, the circular cone rotation of conical recess 5-2 and this straight line intersection are in a bit, circular cone rotational axis vertical in the upper surface of platform 5-4, the circular conical surface of conical recess 5-2 and the sidewall of circular arc slideway 5-1 tangent.Conical recess 5-2 is distributed in circular arc slideway 5-1 place circumferentially according to the angle of circumference of 120 ° each other, and the cone tip of conical recess 5-2 has through hole 5-2-1, and magnetic links 1 is arranged in magnetic links mounting hole 7-2 through through hole 5-2-1.The opening direction of circular arc slideway 5-1 is counterclockwise.
Carry out in the process of lithography process in the high repetitive positioning accuracy structure of embody rule fast changeable of the present invention; the photoetching projection objective lens protecting window jointly formed by protecting window eyeglass 6 and lower protecting window picture frame 3 blocks at photoetching projection objective lens bottom, and the volatile substance produced in photoetching process can be projected object lens protecting window to be stopped and cannot pollute connection picture frame 7 and optical lens thereof.When protecting window eyeglass 6 has influence on the serviceability of lithographic objective because being infected with a large amount of volatile matter, then need to suspend photoetching and carry out system maintenance.
Now, only need rotate lower protecting window picture frame 3 in the direction of the clock to make location bulb 2 overcome the magnetic-adsorption effect of magnetic links 1, can like a cork lower protecting window be disassembled from connection picture frame 7.Directly choose one group of brand-new lower protecting window, or only need to change the protecting window eyeglass 6 on lower protecting window picture frame flange 3-1, can more lower protecting window be ressembled on photoetching projection objective lens.
When ressembling; first the location bulb 2 on new lower protecting window is embedded in the slideway of locating slot slide rail; then turn clockwise lower protecting window picture frame 3; when locating bulb 2 and being threaded to conical recess along slideway; location bulb 2 just with magnetic links 1 adhesive of conical recess vertex of a cone position; now, the sphere of location bulb 2 can form unique inscribe relation with the sidewall of magnetic links 1 and conical recess simultaneously, thus is accurately located by location bulb 2.Whole protecting window picture frame 3 also completes installation and position fixing process thereupon.
The high repetitive positioning accuracy structure for fast changeable in photoetching projection objective lens that the present invention proposes, quick-detachment and the hi-Fix that can realize object lens protecting window change installation.This structure have structure simple, be convenient to installation and removal, without the need to outstanding advantages such as mounting screw, absorption affinity adjustable, due to characteristic and the portability of this structure, can well be applicable in the structure that any system top or end requirement change.
Claims (1)
1. for the high repetitive positioning accuracy structure of fast changeable in photoetching projection objective lens, it is characterized in that: this positioning precision structure comprises three magnetic links (1), three location bulb (2), lower protecting window picture frame (3), locating slot slide rail, three trip bolts (4) and is connected picture frame (7);
Described lower protecting window picture frame (3) comprises lower protecting window picture frame flange (3-1) and is positioned at the annulus sidewall (3-2) of the band internal groove above lower protecting window picture frame flange (3-1), and annulus sidewall (3-2) is one-body molded with lower protecting window picture frame flange (3-1); Lower protecting window picture frame flange (3-1) is provided with three cylindrical locating slots (3-1-1), and three cylindrical locating slots (3-1-1) are distributed in concentric circumferentially same with lower protecting window picture frame flange (3-1) according to the angle of circumference of 120 ° each other; The bottom of each cylindrical locating slot (3-1-1) has the counterbore (3-1-1-1) for mounting screw;
Described location bulb (2) is made up of place kick (2-1) and the cylindrical columns (2-2) that is fixed on its lower end, place kick (2-1) is ferrimagnet, and the bottom of cylindrical columns (2-2) has internal thread hole; Cylindrical columns (2-2) inserts in cylindrical locating slot (3-1-1), and trip bolt (4) inserts counterbore (3-1-1-1) from the below of lower protecting window picture frame flange (3-1) and is threaded with cylindrical columns (2-2);
Described connection picture frame (7) is provided with the mounting interface (7-1) for installing locating slot slide rail, three mounting holes for mounting magnetic steel sheet (1) (7-2) and the internal thread hole for installing locating slot slide rail, and mounting hole (7-2) and internal thread hole are all positioned on the bottom surface of mounting interface (7-1); Three mounting holes (7-2) according to the angle of circumference of 120 ° be each other distributed in identical with three cylindrical locating slot (3-1-1) place radiuss of a circle one circumferentially, this circumference is with to be connected picture frame (7) concentric;
Described locating slot slide rail is provided with slideway, and slideway place circumference is identical with three cylindrical locating slot (3-1-1) place radiuss of a circle;
Described locating slot slide rail is annular positioning groove slide rail (8), it comprises annulus slideway (8-1) and three for locating the conical recess (8-2) of place kick (2-1), and three conical recess (8-2) are distributed on annulus slideway (8-1) according to the angle of circumference of 120 ° each other; The cone tip of described conical recess (8-2) has through hole (8-2-1), and magnetic links (1) is arranged in magnetic links mounting hole (7-2) through through hole (8-2-1);
Or, described locating slot slide rail is made up of three split fix groove slide rails block (5), split fix groove slide rail block (5) upper surface be provided with one end open circular arc slideway (5-1), for locating conical recess (5-2), slideway slope (5-3) and the platform (5-4) of place kick (2-1), platform (5-4) is positioned at domatic bottom, slideway slope (5-3) and one-body molded with slideway slope (5-3); Circular arc slideway (5-1) open slideway slope (5-3) domatic on, the openend of circular arc slideway (5-1) is positioned at domatic top; Conical recess (5-2) is connected to the other end of circular arc slideway (5-1), the slope lower end on slideway slope (5-3) and the upper surface of platform (5-4) intersect at straight line, circular cone rotation and the aforesaid rectilinear of conical recess (5-2) intersect at a point, circular cone rotational axis vertical in the upper surface of platform (5-4), the circular conical surface of conical recess (5-2) and the sidewall of circular arc slideway (5-1) tangent; Conical recess (5-2) is distributed in circular arc slideway (5-1) place circumferentially according to the angle of circumference of 120 ° each other, the cone tip of conical recess (5-2) has through hole (5-2-1), and magnetic links (1) is arranged in magnetic links mounting hole (7-2) through through hole (5-2-1).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310146354.2A CN103246040B (en) | 2013-04-25 | 2013-04-25 | High-accuracy repeated positioning structure capable of achieving rapid changing and used in photoetching projection lens |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310146354.2A CN103246040B (en) | 2013-04-25 | 2013-04-25 | High-accuracy repeated positioning structure capable of achieving rapid changing and used in photoetching projection lens |
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| Publication Number | Publication Date |
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| CN103246040A CN103246040A (en) | 2013-08-14 |
| CN103246040B true CN103246040B (en) | 2015-04-22 |
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| CN201310146354.2A Expired - Fee Related CN103246040B (en) | 2013-04-25 | 2013-04-25 | High-accuracy repeated positioning structure capable of achieving rapid changing and used in photoetching projection lens |
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Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104049473B (en) * | 2014-07-01 | 2016-01-20 | 中国科学院长春光学精密机械与物理研究所 | A kind of object lens protecting window of radial axle pulling structure |
| CN104238065B (en) * | 2014-08-27 | 2016-06-15 | 中国科学院长春光学精密机械与物理研究所 | A kind of locking latches for movable agency in photoetching projection objective lens |
| CN104777587B (en) * | 2015-04-20 | 2017-07-14 | 中国科学院长春光学精密机械与物理研究所 | A kind of primary mirror location and installation mechanism |
| CN105301915B (en) * | 2015-10-29 | 2017-09-12 | 中国科学院长春光学精密机械与物理研究所 | It is a kind of to be used for the object lens protecting window of sealing and resetting |
| CN105467548B (en) * | 2015-12-04 | 2018-05-01 | 中国科学院长春光学精密机械与物理研究所 | The replaceable lithographic objective frame of the eyeglass of high position precision |
| CN107165358A (en) * | 2017-04-11 | 2017-09-15 | 浙江长兴博塔建材有限公司 | Elastic buffer decorative panel |
| CN108089409B (en) * | 2017-12-15 | 2019-10-08 | 中国科学院光电技术研究所 | A kind of large area super resolution lithography device |
| CN109531263B (en) * | 2018-11-27 | 2021-03-16 | 深圳大学 | Intelligent tool setting gauge of ultra-precision machine tool, intelligent tool setting machine tool and intelligent tool setting method |
| CN112032156B (en) * | 2020-07-21 | 2021-06-15 | 中国科学院长春光学精密机械与物理研究所 | High-precision resetting mechanism and method |
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| CN102854596A (en) * | 2012-08-29 | 2013-01-02 | 中国科学院长春光学精密机械与物理研究所 | High-precision supporting structure of optical lens |
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| JP2004093663A (en) * | 2002-08-29 | 2004-03-25 | Canon Inc | Supporting means of optical element, optical apparatus such as optical system by supporting means of optical element and aligner, and device manufacturing method |
| JP2006100315A (en) * | 2004-09-28 | 2006-04-13 | Canon Inc | Holding mechanism, optical apparatus, and process for fabricating device |
| WO2009024192A1 (en) * | 2007-08-23 | 2009-02-26 | Carl Zeiss Smt Ag | Optical element module with minimized parasitic loads |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1668419B1 (en) * | 2003-10-02 | 2010-07-28 | Carl Zeiss SMT AG | Projection objective for semiconductor lithography |
| CN102854596A (en) * | 2012-08-29 | 2013-01-02 | 中国科学院长春光学精密机械与物理研究所 | High-precision supporting structure of optical lens |
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