CN103246040A - High-accuracy repeated positioning structure capable of achieving rapid changing and used in photoetching projection lens - Google Patents
High-accuracy repeated positioning structure capable of achieving rapid changing and used in photoetching projection lens Download PDFInfo
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- CN103246040A CN103246040A CN2013101463542A CN201310146354A CN103246040A CN 103246040 A CN103246040 A CN 103246040A CN 2013101463542 A CN2013101463542 A CN 2013101463542A CN 201310146354 A CN201310146354 A CN 201310146354A CN 103246040 A CN103246040 A CN 103246040A
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Abstract
The invention discloses a high-accuracy repeated positioning structure capable of achieving rapid changing and used in a photoetching projection lens, and belongs to the field of installation and positioning structures of protection windows under photoetching projection lenses. The structure comprises a protection window lens frame, positioning ball heads, a positioning slot slide rail, magnetic steel pieces and the like; the magnetic steel pieces are mounted inside the lens frame so as to overcome the dead weight of the protection window lens frame and provide an adsorption force; and a protection window lens is bonded in the lens frame, so that the lens frame and a lens can be changed at the same time. During disassembly, in order to reduce the absorption of magnetic steel to the positioning ball heads, a positioning slot is designed into an annular inclined plane, and the disassembly is facilitated. A conical groove on the positioning slot slide rail is used for achieving high-accuracy repeated positioning, and the installation is facilitated. The high-accuracy repeated positioning structure has the advantages the structure is simple, the installation and the disassembly are facilitated, screws are not required to be installed, the adsorption force is adjustable, and the like; and screws are not required for fastening the lens frame, so that potential threats to a lens table when the screws fall accidentally in installation and disassembly processes are avoided.
Description
Technical field
The invention belongs to protection window installation and positioning structure field under the photoetching projection objective lens, be specifically related to a kind of high repetitive positioning accuracy structure for the photoetching projection objective lens fast changeable.
Background technology
The projection lithography technology is guide and the basis of large scale integrated circuit manufacturing technology and micro-optic, micro mechanical technology, has determined the integrated level of integrated circuit.Projection lithography equipment is the key equipment in the large scale integrated circuit manufacturing process, and along with the continuous increase of the market demand, the lithographic equipment overall performance improves year by year, and its productive rate becomes the important indicator that lithographic equipment is estimated already.Because the interval between object lens bottom and the silicon chip to be processed is very little, in photoetching process, because the volatilization effect can cause the object lens bottom mirror to be polluted easily, cause the image quality of total system to be seriously influenced.Yet maintenance processes such as the precision focusing when changing the object lens eyeglass, location and installation are very consuming time, cause inefficiency, have a strong impact on manufacturing schedule, cause economic loss.
Summary of the invention
Be subjected to the volatile matter pollution easily in order to solve existing light projection photoetching objective lens bottom mirror when working, and maintenance processes such as the precision focusing when changing the object lens eyeglass, location and installation are very consuming time, cause the low technical matters of production efficiency, the invention provides a kind of high repetitive positioning accuracy structure for the photoetching projection objective lens fast changeable.
The technical scheme that technical solution problem of the present invention is taked is as follows:
The high repetitive positioning accuracy structure that is used for the photoetching projection objective lens fast changeable comprises: three magnetic links, three location bulbs, protect window picture frame, locating slot slide rail, three trip bolts and be connected picture frame down; The described window of protection down picture frame comprises to be protected window picture frame flange down and is positioned at the annulus sidewall of the band internal groove above the protection window picture frame flange down, and the annulus sidewall is one-body molded with following protection window picture frame flange; Under protect window picture frame flange to be provided with three cylindrical locating slots, three cylindrical locating slots according to 120 ° angle of circumference each other be distributed in the concentric same circumference of protection window picture frame flange down on; The bottom of each cylindrical locating slot has the counterbore for mounting screw; Described location bulb is made up of place kick and the cylindrical columns that is fixed on its lower end, and place kick is ferrimagnet, and the bottom of cylindrical columns has internal thread hole; Cylindrical columns inserts in the cylindrical locating slot, and trip bolt inserts counterbore from the below of protecting window picture frame flange down and is threaded with cylindrical columns; Described connection picture frame is provided with for the mounting interface that the locating slot slide rail is installed, three internal thread holes that are used for that the mounting hole of magnetic links is installed and are used for installing the locating slot slide rail, and mounting hole and internal thread hole all are positioned on the bottom surface of mounting interface; Three mounting holes are distributed on the circumference identical with three cylindrical locating slot place radiuss of a circle according to 120 ° angle of circumference each other, and this circumference is with to be connected picture frame concentric; Described locating slot slide rail is provided with slideway, and slideway place circumference is identical with three cylindrical locating slot place radiuss of a circle.
Above-mentioned locating slot slide rail is the annular positioning groove slide rail, and it comprises that annulus slideway and three are used for the conical recess of location place kick, and three conical recess are distributed on the annulus slideway according to 120 ° angle of circumference each other; The cone tip of described conical recess has through hole, and magnetic links passes through hole and is installed in the magnetic links mounting hole.
Above-mentioned locating slot slide rail is made of three split fix groove slide rail pieces, split fix groove slide rail piece upper surface be provided with an end opening the circular arc slideway, be used for conical recess, slideway slope and the platform of location place kick, platform is positioned at domatic bottom, slideway slope and one-body molded with the slideway slope; The circular arc slideway is opened on slideway slope domatic, and the openend of circular arc slideway is positioned at domatic top; Conical recess is connected in the other end of circular arc slideway, the slope lower end on slideway slope and the upper surface of platform intersect at straight line, circular cone rotation and this intersection of conical recess intersect at a point, the circular cone turning axle is perpendicular to the upper surface of platform, and the sidewall of the circular conical surface of conical recess and circular arc slideway is tangent; Conical recess is distributed on the circumference at circular arc slideway place according to 120 ° angle of circumference each other, and the cone tip of conical recess has through hole, and magnetic links passes through hole and is installed in the magnetic links mounting hole.
The invention has the beneficial effects as follows: this location structure can avoid the pollution of volatile substance for the protection of photoetching projection objective lens; fast changeable after himself is contaminated; and can guarantee the installation of high position precision; precision focusing and location and installation process when having avoided changing object lens; all the time guarantee that thus photoetching projection objective lens has the good optical performance; and saved a large amount of maintenance times, improved the whole work efficiency of etching system.
Description of drawings
Fig. 1 is the semisectional view that the present invention is used for the high repetitive positioning accuracy structure applications synoptic diagram of photoetching projection objective lens fast changeable;
Fig. 2 is the three-dimensional structure diagram of Fig. 1;
Fig. 3 be under the present invention protection window picture frame assembly overlook the assembling synoptic diagram;
Fig. 4 is the side-looking semisectional view of Fig. 3;
Fig. 5 is the perspective view of split fix groove slide rail piece of the present invention;
Fig. 6 is the front elevation of Fig. 5;
Fig. 7 is the vertical view of Fig. 5;
Fig. 8 is the left view of Fig. 5;
Fig. 9 is that the A-A of Fig. 7 is to cut-open view;
Figure 10 is split fix groove slide rail piece mounting structure synoptic diagram of the present invention;
Figure 11 is the side-looking semisectional view of Figure 10;
Figure 12 is the perspective view of annular positioning groove slide rail of the present invention;
Figure 13 is the side-looking semisectional view of Figure 11.
Embodiment
Below in conjunction with accompanying drawing the present invention is described in further details.
As depicted in figs. 1 and 2, the present invention's high repetitive positioning accuracy structure of being used for the photoetching projection objective lens fast changeable comprises: three magnetic links 1, three location bulbs 2, protect window picture frame 3, locating slot slide rail, three trip bolts 4 and be connected picture frame 7 down.
As shown in Figure 3 and Figure 4; protect window picture frame 3 to comprise down and protect window picture frame flange 3-1 down and be positioned at the annulus sidewall 3-2 of the band internal groove above the protection window picture frame flange 3-1 down; annulus sidewall 3-2 is one-body molded with following protection window picture frame flange 3-1, they and the protection windows of the following protection window eyeglass 6 common formation that are installed in down protection window picture frame flange 3-1 center to photoetching projection objective lens.Under protect window picture frame flange 3-1 to be provided with three cylindrical locating slot 3-1-1, three cylindrical locating slot 3-1-1 according to 120 ° angle of circumference each other be distributed in the concentric same circumference of protection window picture frame flange 3-1 down on.The bottom of each cylindrical locating slot 3-1-1 has the counterbore 3-1-1-1 for mounting screw.
Connect picture frame 7 and be lens assembly bottom on original photoetching projection objective lens, as shown in Figure 10 and Figure 11, connect picture frame 7 and be provided with for the mounting interface 7-1 that the locating slot slide rail is installed, three internal thread holes that are used for that the mounting hole 7-2 of magnetic links 1 is installed and are used for installing the locating slot slide rail, mounting hole 7-2 and internal thread hole all are positioned on the bottom surface of mounting interface 7-1.Three mounting hole 7-2 are distributed on the circumference identical with three cylindrical locating slot 3-1-1 place radiuss of a circle according to 120 ° angle of circumference each other, and this circumference is with to be connected picture frame 7 concentric.
The locating slot slide rail is provided with slideway, and slideway place circumference is identical with three cylindrical locating slot 3-1-1 place radiuss of a circle.Set bolt from the top pass connect picture frame 7 and with the locating slot slide rail on corresponding internal thread hole be threaded, in order to the locating slot slide rail is fixed.
As Figure 12 and shown in Figure 13, the locating slot slide rail is annular positioning groove slide rail 8, and it comprises that annulus slideway 8-1 and three are used for the conical recess 8-2 of location place kick 2-1, and three conical recess 8-2 are distributed on the annulus slideway 8-1 according to 120 ° angle of circumference each other.The cone tip of conical recess 8-2 has through hole 8-2-1, and magnetic links 1 passes through hole 8-2-1 and is installed in the magnetic links mounting hole 7-2.
Extremely shown in Figure 9 as Fig. 5, the locating slot slide rail can also be the version that is substituted annular positioning groove slide rail 8 by three split fix groove slide rail pieces 5, split fix groove slide rail piece 5 upper surfaces be provided with an end opening circular arc slideway 5-1, be used for conical recess 5-2, slideway slope 5-3 and the platform 5-4 of location place kick 2-1, platform 5-4 is positioned at the domatic bottom of slideway slope 5-3 and one-body molded with slideway slope 5-3.Circular arc slideway 5-1 opens on slideway slope 5-3 domatic, and the openend of circular arc slideway 5-1 is positioned at domatic top.Conical recess 5-2 is connected in the other end of circular arc slideway 5-1, the slope lower end of slideway slope 5-3 and the upper surface of platform 5-4 intersect at straight line, circular cone rotation and this straight line of conical recess 5-2 intersect at a point, the circular cone turning axle is perpendicular to the upper surface of platform 5-4, and the sidewall of the circular conical surface of conical recess 5-2 and circular arc slideway 5-1 is tangent.Conical recess 5-2 is distributed on the circumference at circular arc slideway 5-1 place according to 120 ° angle of circumference each other, and the cone tip of conical recess 5-2 has through hole 5-2-1, and magnetic links 1 passes through hole 5-2-1 and is installed in the magnetic links mounting hole 7-2.The opening direction of circular arc slideway 5-1 is counterclockwise.
Carry out in the process of lithography process in the concrete high repetitive positioning accuracy structure of using fast changeable of the present invention; by protection window eyeglass 6 and down the photoetching projection objective lens protection windows that form jointly of protection window picture frame 3 block at photoetching projection objective lens bottom, the volatile substance that produces in the photoetching process can be projected object lens protection window to be stopped and can't pollute connection picture frame 7 and optical lens thereof.When protection window eyeglass 6 has influence on the serviceability of lithographic objective because being infected with a large amount of volatile matters, then need to suspend photoetching and carry out system maintenance.
At this moment, only need rotation in the direction of the clock down protection window picture frame 3 in order to make location bulb 2 overcome the magnetic force suction-operated of magnetic links 1, can be like a cork with under protect window to disassemble from connecting picture frame 7.Directly choose one group of brand-new following protection window, perhaps only need change down the protection window eyeglass 6 on the protection window picture frame flange 3-1, can be again with under protect window to ressemble on the photoetching projection objective lens.
When ressembling; earlier the location bulb 2 on the new following protection window is embedded in the slideway of locating slot slide rail; protection window picture frame 3 then turns clockwise down; when location bulb 2 is threaded to conical recess along slideway; the location bulb 2 just with magnetic links 1 adhesive of conical recess vertex of a cone position; at this moment, the sphere meeting while of location bulb 2 forms unique inscribe relation with the sidewall of magnetic links 1 and conical recess, accurately locatees thereby will locate bulb 2.Whole protecting window picture frame 3 is also finished thereupon and is installed and position fixing process.
The high repetitive positioning accuracy structure that is used for the photoetching projection objective lens fast changeable that the present invention proposes can realize that fast quick-detach and the hi-Fix of object lens protection window changed installation.Outstanding advantages such as that this structure has is simple in structure, be convenient to installation and removal, need not mounting screw, absorption affinity can be adjusted are because characteristic and the portability of this structure can well be applicable in any system top or the terminal structure that requires to change.
Claims (3)
1. be used for the high repetitive positioning accuracy structure of photoetching projection objective lens fast changeable, it is characterized in that: this location structure comprises three magnetic links (1), three location bulbs (2), protects window picture frame (3), locating slot slide rail, three trip bolts (4) and be connected picture frame (7) down;
Described protection window picture frame (3) down comprises to be protected window picture frame flange (3-1) down and is positioned at the annulus sidewall (3-2) of the band internal groove above the protection window picture frame flange (3-1) down, and annulus sidewall (3-2) is one-body molded with following protection window picture frame flange (3-1); Under protect window picture frame flange (3-1) to be provided with three cylindrical locating slots (3-1-1), three cylindrical locating slots (3-1-1) are distributed in according to 120 ° angle of circumference each other and down on the concentric same circumference of protection window picture frame flange (3-1); The bottom of each cylindrical locating slot (3-1-1) has the counterbore (3-1-1-1) for mounting screw;
Described location bulb (2) is made up of place kick (2-1) and the cylindrical columns (2-2) that is fixed on its lower end, and place kick (2-1) is ferrimagnet, and the bottom of cylindrical columns (2-2) has internal thread hole; Cylindrical columns (2-2) inserts in the cylindrical locating slot (3-1-1), and trip bolt (4) inserts counterbore (3-1-1-1) from the below of protecting window picture frame flange (3-1) down and is threaded with cylindrical columns (2-2);
Described connection picture frame (7) is provided with for the mounting interface (7-1) that the locating slot slide rail is installed, three internal thread holes that are used for that the mounting hole (7-2) of magnetic links (1) is installed and are used for installing the locating slot slide rail, and mounting hole (7-2) and internal thread hole all are positioned on the bottom surface of mounting interface (7-1); Three mounting holes (7-2) are distributed on the circumference identical with three cylindrical locating slots (3-1-1) place radius of a circle according to 120 ° angle of circumference each other, and this circumference is with to be connected picture frame (7) concentric;
Described locating slot slide rail is provided with slideway, and slideway place circumference is identical with three cylindrical locating slots (3-1-1) place radius of a circle.
2. the high repetitive positioning accuracy structure for the photoetching projection objective lens fast changeable as claimed in claim 1, it is characterized in that: described locating slot slide rail is annular positioning groove slide rail (8), it comprises that annulus slideway (8-1) and three are used for the conical recess (8-2) of location place kick (2-1), and three conical recess (8-2) are distributed on the annulus slideway (8-1) according to 120 ° angle of circumference each other; The cone tip of described conical recess (8-2) has through hole (8-2-1), and magnetic links (1) passes through hole (8-2-1) and is installed in the magnetic links mounting hole (7-2).
3. the high repetitive positioning accuracy structure for the photoetching projection objective lens fast changeable as claimed in claim 1, it is characterized in that: described locating slot slide rail is made of three split fix groove slide rail pieces (5), split fix groove slide rail piece (5) upper surface be provided with an end opening circular arc slideway (5-1), be used for conical recess (5-2), slideway slope (5-3) and the platform (5-4) of location place kick (2-1), platform (5-4) is positioned at domatic bottom, slideway slope (5-3) and one-body molded with slideway slope (5-3); Circular arc slideway (5-1) is opened on slideway slope (5-3) domatic, and the openend of circular arc slideway (5-1) is positioned at domatic top; Conical recess (5-2) is connected in the other end of circular arc slideway (5-1), the upper surface of the slope lower end on slideway slope (5-3) and platform (5-4) intersects at straight line, circular cone rotation and this intersection of conical recess (5-2) intersect at a point, the circular cone turning axle is perpendicular to the upper surface of platform (5-4), and the sidewall of the circular conical surface of conical recess (5-2) and circular arc slideway (5-1) is tangent; Conical recess (5-2) is distributed on the circumference at circular arc slideway (5-1) place according to 120 ° angle of circumference each other, the cone tip of conical recess (5-2) has through hole (5-2-1), and magnetic links (1) passes through hole (5-2-1) and is installed in the magnetic links mounting hole (7-2).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310146354.2A CN103246040B (en) | 2013-04-25 | 2013-04-25 | High-accuracy repeated positioning structure capable of achieving rapid changing and used in photoetching projection lens |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310146354.2A CN103246040B (en) | 2013-04-25 | 2013-04-25 | High-accuracy repeated positioning structure capable of achieving rapid changing and used in photoetching projection lens |
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| Publication Number | Publication Date |
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| CN103246040A true CN103246040A (en) | 2013-08-14 |
| CN103246040B CN103246040B (en) | 2015-04-22 |
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Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN104049473A (en) * | 2014-07-01 | 2014-09-17 | 中国科学院长春光学精密机械与物理研究所 | Objective lens protection window of radial drawing type structure |
| CN104238065A (en) * | 2014-08-27 | 2014-12-24 | 中国科学院长春光学精密机械与物理研究所 | Locking device for movable mechanism in photoetching projection object lens |
| CN104777587A (en) * | 2015-04-20 | 2015-07-15 | 中国科学院长春光学精密机械与物理研究所 | Primary mirror positioning and mounting mechanism |
| CN105301915A (en) * | 2015-10-29 | 2016-02-03 | 中国科学院长春光学精密机械与物理研究所 | Objective lens protecting window for sealing and repeat positioning |
| CN105467548A (en) * | 2015-12-04 | 2016-04-06 | 中国科学院长春光学精密机械与物理研究所 | High-positioning-precision photoetching object lens frame with replaceable lens |
| CN107165358A (en) * | 2017-04-11 | 2017-09-15 | 浙江长兴博塔建材有限公司 | Elastic buffer decorative panel |
| CN108089409A (en) * | 2017-12-15 | 2018-05-29 | 中国科学院光电技术研究所 | Large-area super-resolution photoetching device |
| CN109531263A (en) * | 2018-11-27 | 2019-03-29 | 深圳大学 | Ultra-precision machine tool intelligence tool setting gauge, intelligence are to knife lathe and intelligent presetting cutter method |
| CN112032156A (en) * | 2020-07-21 | 2020-12-04 | 中国科学院长春光学精密机械与物理研究所 | High-precision resetting mechanism and method |
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Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN104049473B (en) * | 2014-07-01 | 2016-01-20 | 中国科学院长春光学精密机械与物理研究所 | A kind of object lens protecting window of radial axle pulling structure |
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| CN104238065A (en) * | 2014-08-27 | 2014-12-24 | 中国科学院长春光学精密机械与物理研究所 | Locking device for movable mechanism in photoetching projection object lens |
| CN104777587B (en) * | 2015-04-20 | 2017-07-14 | 中国科学院长春光学精密机械与物理研究所 | A kind of primary mirror location and installation mechanism |
| CN104777587A (en) * | 2015-04-20 | 2015-07-15 | 中国科学院长春光学精密机械与物理研究所 | Primary mirror positioning and mounting mechanism |
| CN105301915A (en) * | 2015-10-29 | 2016-02-03 | 中国科学院长春光学精密机械与物理研究所 | Objective lens protecting window for sealing and repeat positioning |
| CN105467548A (en) * | 2015-12-04 | 2016-04-06 | 中国科学院长春光学精密机械与物理研究所 | High-positioning-precision photoetching object lens frame with replaceable lens |
| CN105467548B (en) * | 2015-12-04 | 2018-05-01 | 中国科学院长春光学精密机械与物理研究所 | The replaceable lithographic objective frame of the eyeglass of high position precision |
| CN107165358A (en) * | 2017-04-11 | 2017-09-15 | 浙江长兴博塔建材有限公司 | Elastic buffer decorative panel |
| CN108089409A (en) * | 2017-12-15 | 2018-05-29 | 中国科学院光电技术研究所 | Large-area super-resolution photoetching device |
| CN108089409B (en) * | 2017-12-15 | 2019-10-08 | 中国科学院光电技术研究所 | Large-area super-resolution photoetching device |
| CN109531263A (en) * | 2018-11-27 | 2019-03-29 | 深圳大学 | Ultra-precision machine tool intelligence tool setting gauge, intelligence are to knife lathe and intelligent presetting cutter method |
| CN112032156A (en) * | 2020-07-21 | 2020-12-04 | 中国科学院长春光学精密机械与物理研究所 | High-precision resetting mechanism and method |
| CN112032156B (en) * | 2020-07-21 | 2021-06-15 | 中国科学院长春光学精密机械与物理研究所 | High-precision resetting mechanism and method |
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