CN103226001A - Measuring device and measuring method for tiny surface defect through post-magnification digital holographic microscopy - Google Patents
Measuring device and measuring method for tiny surface defect through post-magnification digital holographic microscopy Download PDFInfo
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- CN103226001A CN103226001A CN201310131080XA CN201310131080A CN103226001A CN 103226001 A CN103226001 A CN 103226001A CN 201310131080X A CN201310131080X A CN 201310131080XA CN 201310131080 A CN201310131080 A CN 201310131080A CN 103226001 A CN103226001 A CN 103226001A
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Abstract
The invention relates to a measuring device and a measuring method for a tiny surface defect through post-magnification digital holographic microscopy. The measuring method comprises the steps that a short coherent light source is adopted; scattered light information of the tiny surface defect of an optical element is obtained in an oblique incidence manner; scattered light interferes with a reference beam; interference image information is magnified in a post-magnification manner and received by a CCD (Charge Coupled Device) camera; and finally a pattern of the tiny surface defect and quantification information of depth distribution are computed and analyzed through a digital holographic principle. The device is mainly used for achieving detection of the tiny surface defect of the smooth optical element. The device can obtain depth and phase information of the surface defect by acquiring a single image and conducting related processing, can distinguish surface dust and indentation of the optical element, and can dynamically and rapidly measure. The device adopts a parallel light irradiation and off-axis holographic technique, and forms a post-magnification digital holographic recording system, so that the device is good in dynamic property and has the characteristics of non-destruction and information quantification.
Description
Technical field
The present invention relates to a kind of back amplifier digital holographic microphotography small defect measurement mechanism in surface and method.
Background technology
To the crudy assessment on precison optical component surface, mainly comprise four main aspects such as the detection of face shape, surfaceness detection, surface waviness detection and beauty defects detection.Surface form deviation is meant the face shape of desire processing and the difference between the actual face shape, and its breadth wise dimension belongs to the deviation of macro-scale in the millimeter magnitude, adopts tested corrugated and the standard corrugated formed interference fringe that superposes to carry out inverting usually, thereby obtains this deviation.Surfaceness is meant the less spacing that finished surface has and the micromechanism of peak-to-valley value, and for the precison optical component surface, breadth wise dimension is generally below sub-micrometer scale.Though on breadth wise dimension, roughness belongs to the deviation of micro-scale, but because its distribution in each zone of whole finished surface is continuous and uniform, so can after the zones of different sampling on tested surface, on average obtain by microscopic appearance detecting instruments such as interference microscope, atomic force microscope, scanning tunnel microscope.Percent ripple and roughness are similar, also are continuous and equally distributed structure at whole element surface, and just its breadth wise dimension is between face type deviation and surfaceness.
So-called beauty defects, the macroscopic view that both had been different from face type error distributes, also be different from the uniform micro Distribution of surfaceness, but on this macro-scale of whole finished surface stochastic distribution, discrete micro-geometry feature.Just because of beauty defects structure breadth wise dimension in micron, sub-micrometer scale, but discrete be randomly dispersed in centimetre in addition the surface range of decimetre magnitude in, so the detection of the defect on precison optical component surface all is a more scabrous problem all the time.
The optical element surface defect is used to improve key subjects of processing technology, has obtained the attention and the research of Chinese scholars in recent years.Present detection mode comprises: 1) visual method is a kind of comparatively tradition, and at present still in a lot of local a kind of methods of being used in a large number, is the basis that all imaging methods detect defect.Because such complex mechanical structure that the powerful back-end processing performance of the optical imagery of the height adaptive of human eye and detection performance, brain and hand, eye and health cooperate makes visual method have very strong dirigibility and operability.But the shortcoming of this method also is conspicuous: people's subjectivity factor, can't quantize to detect the defect size, and detection speed is slower, and higher and observer need train etc. cost of labor; 2) filtering imaging method, with visual ratio juris be on all four, unique difference is to have substituted human eye with optic sensor array, thereby has eliminated the subjectivity that human eye is judged, has improved detection speed, and can quantize testing result.Its shortcoming is not high for the precision that detects, and is subject to the influence of environment such as illumination; 3) diffuse scattering light receiving method.Its advantage is that the defect location is accurate; Shortcoming is accurately to react the defect size; 4) diffraction intensity method.Its advantage is that error is less; Shortcoming is a defect at specific morphology; 5) laser frequency spectrum method.Its advantage is that sensitivity is higher; But only the defect at given shape detects.
Summary of the invention
At the defective that prior art exists, the objective of the invention is to propose a kind of back amplifier digital holographic microphotography small defect measurement mechanism in surface and method.Adopt short coherent source, by the mode of oblique incidence, obtain the scattered light information of the small defect of optical element surface, and interfere with reference beam; The mode of amplifying by the back is amplified interference image information and is received by ccd video camera then.Final by the pattern of the small defect in digital hologram principle computational analysis surface and the quantitative information of depth profile.Apparatus of the present invention and method are mainly used in the detection that realizes the smooth small defect of optical element surface.
For achieving the above object, the present invention is achieved through the following technical solutions:
The small defect measurement mechanism in amplifier digital holographic microphotography surface, a kind of back comprises laser instrument, convex lens, first Amici prism, reference mirror, microcobjective and ccd video camera; The central shaft of the light beam that horizontal middle spindle and laser instrument sent of described convex lens, first Amici prism and reference mirror is on same horizontal linear; The position to be detected of workpiece for measurement, first Amici prism, microcobjective and ccd video camera on same vertical curve, and and the central shaft of the light beam that sent of laser instrument intersect at the central point of Amici prism; The vertical central shaft of laser instrument, convex lens and first Amici prism is parallel to each other; The horizontal middle spindle of first Amici prism, microcobjective and ccd video camera is parallel to each other.
As a kind of optimal way, this device also comprises the catoptron and second Amici prism; The central shaft of the light beam that horizontal middle spindle and laser instrument sent of the described convex lens and first Amici prism is on same horizontal linear; The horizontal middle spindle of the position to be detected of catoptron, workpiece for measurement, second Amici prism, microcobjective and ccd video camera and the central shaft of measuring beam are on same horizontal linear; The placement at 45 of catoptron and transverse axis; The vertical central shaft of laser instrument, convex lens, first Amici prism, workpiece for measurement, second Amici prism, microcobjective and ccd video camera is parallel to each other.
The light that above-mentioned laser instrument sends is short coherent source, with the parasitic light in the inhibition system.
The small defect measuring method in amplifier digital holographic microphotography surface, a kind of back comprises the steps:
Regulate workpiece for measurement, make it fully near first Amici prism; Regulate reference mirror, it is equated with the distance of workpiece for measurement with first Amici prism with the distance of first Amici prism, regulate microcobjective, make it fully near first Amici prism; Regulate the position of ccd video camera, make the receiving plane of ccd video camera be positioned on the conjugate plane of microcobjective; The light beam that laser instrument sends becomes parallel beam through convex lens, and this parallel beam is divided into two-beam by first Amici prism again, and a branch of is measuring beam, and a branch of is reference beam, and measuring beam becomes the angle less than 5 ° with reference beam; Measuring beam is by the reflection of workpiece for measurement, once more by first Amici prism; Reference beam is through the reference mirror reflection, once more by first Amici prism; Measuring beam by workpiece for measurement reflection and the reference beam by the plane reflection mirror reflection meet at the first Amici prism place and interfere; Interference light shines on the ccd video camera through behind the microcobjective, obtains the interference pattern of certain light intensity.
As a kind of optimal way, this method also comprises the steps: to regulate workpiece for measurement, makes it fully near second Amici prism; The accommodation reflex mirror makes reference beam become angle less than 5 ° with measuring beam; The light beam that laser instrument sends becomes parallel beam through convex lens, and this parallel beam is divided into two light beams by first Amici prism, and a branch of is measuring beam, and a branch of is reference beam; Measuring beam shines on second Amici prism through behind the workpiece for measurement through mirror reflects; Reference beam shines on second Amici prism through the reference mirror reflection; Measuring beam and reference beam meet at the second Amici prism place and interfere, and this interfering beam shines on the ccd video camera by after the microcobjective, obtains the interference pattern of certain light intensity.
The present invention has following conspicuous progress compared with prior art:
Device of the present invention can suppress the scattered light of optical element inside, guarantees to receive only the scattered light from beauty defects, has improved the signal to noise ratio (S/N ratio) of signal; Adopted short coherent source in the device, the parasitic light in can the inhibition system; Can be by gathering the degree of depth and the phase information of single image through relevant processing acquisition beauty defects; On the signal Processing, adopt the digital hologram algorithm, can obtain the quantitative information of defective in the depth direction topographic profile; Because dust is mutually different with the position that depression in the beauty defects presents, so can distinguish the dust and the depression of optical element surface; For the front and rear surfaces of the optical element that certain angle is arranged, can use the defective of separating front and rear surfaces based on the method for spectrum analysis; Can dynamically measure fast, be suitable for the measurement on the production line; By using the microcobjective of different multiplying, can realize the defect of optical element surface different resolution is measured, can measure the surperficial small defect of optical element.This contrive equipment proposes to adopt directional light irradiation and from the axle holographic technique, and constitutes back amplifier digital holographic recording system, thereby realizes the method that surperficial small defect detects, and dynamic property is good, and has non-destructive and quantity of information voltinism.
Description of drawings
Fig. 1 is the light channel structure figure of the embodiment of the invention 1 measurement mechanism.
Fig. 2 is the light channel structure figure of the embodiment of the invention 2 measurement mechanisms.
Fig. 3 is the process flow diagram of the embodiment of the invention 1 measuring method.
Fig. 4 is the process flow diagram of the embodiment of the invention 2 measuring methods.
Embodiment
The present invention is further detailed explanation below in conjunction with the drawings and specific embodiments.
As shown in Figure 1, the small defect measurement mechanism in amplifier digital holographic microphotography surface, a kind of back comprises laser instrument 1, convex lens 2, first Amici prism 3, reference mirror 5, microcobjective 6 and ccd video camera 7; The central shaft of described convex lens 2, first Amici prism 3 and the horizontal middle spindle of reference mirror 5 and the light beam that laser instrument 1 is sent is on same horizontal linear; The position to be detected of workpiece for measurement 4, first Amici prism 3, microcobjective 6 and ccd video camera 7 on same vertical curve, and and the central shaft of the light beam that sent of laser instrument intersect at the central point of Amici prism; The vertical central shaft of laser instrument 1, convex lens 2 and first Amici prism 3 is parallel to each other; The horizontal middle spindle of first Amici prism 3, microcobjective 6 and ccd video camera 7 is parallel to each other.
As shown in Figure 3, the small defect measuring method in amplifier digital holographic microphotography surface, a kind of back comprises the steps:
Regulate workpiece for measurement 4, make it fully near first Amici prism 3; Regulate reference mirror 5, it is equated with the distance of workpiece for measurement 4 with first Amici prism 3 with the distance of first Amici prism 3, regulate microcobjective 6, make it fully near first Amici prism 3; Regulate the position of ccd video camera 7, make the receiving plane of ccd video camera 7 be positioned on the conjugate plane of microcobjective 6; The light beam that laser instrument 1 sends becomes parallel beam through convex lens 2, and this parallel beam is divided into two-beam by first Amici prism 3 again, and a branch of is measuring beam, and a branch of is reference beam, and measuring beam becomes the angle less than 5 ° with reference beam; Measuring beam is by the reflection of workpiece for measurement 4, once more by first Amici prism 3; Reference beam is through reference mirror 5 reflections, once more by first Amici prism 3; Measuring beam by workpiece for measurement 4 reflection and the reference beam by reference mirror 5 reflections meet at first Amici prism, 3 places and interfere; Interference light shines on the ccd video camera 7 through behind the microcobjective 6, obtains the interference pattern of certain light intensity.
Present embodiment is substantially the same manner as Example 1, and difference is:
As shown in Figure 2, this device also comprises the catoptron 8 and second Amici prism 9; The central shaft of the light beam that the horizontal middle spindle of the described convex lens 2 and first Amici prism 3 and laser instrument 1 are sent is on same horizontal linear; The horizontal middle spindle of the position to be detected of catoptron 8, workpiece for measurement 4, second Amici prism 9, microcobjective 6 and ccd video camera 7 and the central shaft of measuring beam are on same horizontal linear; Catoptron 8 and transverse axis placement at 45; The vertical central shaft of laser instrument 1, convex lens 2, first Amici prism 3, workpiece for measurement 4, second Amici prism 9, microcobjective 6 and ccd video camera 7 is parallel to each other.
As shown in Figure 4, this method is further comprising the steps of: regulate workpiece for measurement 4, make it fully near second Amici prism 9; Regulate reference mirror 5, make reference beam become angle with measuring beam less than 5 °; The light beam that laser instrument 1 sends becomes parallel beam through convex lens 2, and this parallel beam is divided into two light beams by first Amici prism 3, and a branch of is measuring beam, and a branch of is reference beam; Measuring beam shines on second Amici prism 9 through behind the workpiece for measurement 4 through catoptron 8 reflections; Reference beam shines on second Amici prism 9 through reference mirror 5 reflections; Measuring beam and reference beam meet at second Amici prism, 9 places and interfere, and this interfering beam obtains the interference pattern of certain light intensity by shining on the ccd video camera 7 after the microcobjective 6.
Claims (5)
1. the small defect measurement mechanism in amplifier digital holographic microphotography surface after a kind is characterized in that, comprises laser instrument (1), convex lens (2), first Amici prism (3), reference mirror (5), microcobjective (6) and ccd video camera (7); The central shaft of the light beam that the horizontal middle spindle of described convex lens (2), first Amici prism (3) and reference mirror (5) and laser instrument (1) are sent is on same horizontal linear; The position to be detected of workpiece for measurement (4), first Amici prism (3), microcobjective (6) and ccd video camera (7) on same vertical curve, and and the central shaft of the light beam that sent of laser instrument intersect at the central point of Amici prism; The vertical central shaft of laser instrument (1), convex lens (2) and first Amici prism (3) is parallel to each other; The horizontal middle spindle of first Amici prism (3), microcobjective (6) and ccd video camera (7) is parallel to each other.
2. the small defect measurement mechanism in amplifier digital holographic microphotography surface, back according to claim 1 is characterized in that, also comprises catoptron (8) and second Amici prism (9); The central shaft of the light beam that the horizontal middle spindle of described convex lens (2) and first Amici prism (3) and laser instrument (1) are sent is on same horizontal linear; The horizontal middle spindle of the position to be detected of catoptron (8), workpiece for measurement (4), second Amici prism (9), microcobjective (6) and ccd video camera (7) and the central shaft of measuring beam are on same horizontal linear; Catoptron (8) is at 45 with transverse axis; The vertical central shaft of laser instrument (1), convex lens (2), first Amici prism (3), workpiece for measurement (4), second Amici prism (9), microcobjective (6) and ccd video camera (7) is parallel to each other.
3. the small defect measurement mechanism in amplifier digital holographic microphotography surface, back according to claim 1 and 2 is characterized in that the light that described laser instrument (1) sends is short coherent source, with the parasitic light in the inhibition system.
4. the small defect measuring method in amplifier digital holographic microphotography surface after a kind is characterized in that, comprises the steps:
Regulate workpiece for measurement (4), make it fully near first Amici prism (3); Regulate reference mirror (5), it is equated with the distance of workpiece for measurement (4) with first Amici prism (3) with the distance of first Amici prism (3), regulate microcobjective (6), make it fully near first Amici prism (3); Regulate the position of ccd video camera (7), make the receiving plane of ccd video camera (7) be positioned on the conjugate plane of microcobjective (6); The light beam that laser instrument (1) sends becomes parallel beam through convex lens (2), and this parallel beam is divided into two-beam by first Amici prism (3) again, and a branch of is measuring beam, and a branch of is reference beam, and measuring beam becomes the angle less than 5 ° with reference beam; Measuring beam is by the reflection of workpiece for measurement (4), once more by first Amici prism (3); Reference beam is through reference mirror (5) reflection, once more by first Amici prism (3); Locate to meet at first Amici prism (3) by the measuring beam of workpiece for measurement (4) reflection with by the reference beam that reference mirror (5) reflects and interfere; Shine on the ccd video camera (7) behind the interference light process microcobjective (6), obtain the interference pattern of certain light intensity.
5. the small defect measuring method in amplifier digital holographic microphotography surface, back according to claim 4 is characterized in that, also comprises the steps: to regulate workpiece for measurement (4), makes it fully near second Amici prism (9); Regulate reference mirror (5), make reference beam become angle with measuring beam less than 5 °; The light beam that laser instrument (1) sends becomes parallel beam through convex lens (2), and this parallel beam is divided into two light beams by first Amici prism (3), and a branch of is measuring beam, and a branch of is reference beam; Measuring beam shines on second Amici prism (9) through behind the workpiece for measurement (4) through catoptron (8) reflection; Reference beam shines on second Amici prism (9) through reference mirror (5) reflection; Measuring beam and reference beam are located to meet at second Amici prism (9) and are interfered, and this interfering beam shines on the ccd video camera (7) afterwards by microcobjective (6), obtain the interference pattern of certain light intensity.
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| CN106482933A (en) * | 2016-11-28 | 2017-03-08 | 上海大学 | Non- telecentric beam path real-time light intensity transmission equation non-interfering measuring system |
| CN109425621A (en) * | 2017-09-05 | 2019-03-05 | 南京航空航天大学 | Steel ball surface defect detection method based on digital hologram |
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Application publication date: 20130731 |