CN103206101B - Clean room for semiconductor plant - Google Patents
Clean room for semiconductor plant Download PDFInfo
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- CN103206101B CN103206101B CN201310069347.7A CN201310069347A CN103206101B CN 103206101 B CN103206101 B CN 103206101B CN 201310069347 A CN201310069347 A CN 201310069347A CN 103206101 B CN103206101 B CN 103206101B
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Abstract
The invention discloses a clean room for semiconductor plant. The clean room comprises a new wind conveying system, an exhausting system and a large clean space. The large clean space has a central aisle and at least a production aisle, wherein a clapboard is arranged around the production aisle, so that at least a part of the frame space, the clean space and the space where a raised floor locates form an independent clean micro-environmental structure. The distance between the bottom of the clapboard and the ceiling is at least 60 cm, and the distance between the bottom of the clapboard and the raised floor is at least 2m. An upper seal plate and a lower sealplate are respectively arranged on the top and the bottom of the clean micro-environment, and the breadth of the lower sealplate is smaller than the breadth of the upper sealplate. According to the clean room, the clapboards are arranged around the production aisle to form an independent clean micro-environmental structure, so that the effects on the storage and the products of the central aisle and the production aisle due to the corrosive gas are avoided.
Description
Technical field
The present invention relates to a kind of clean room for quartz conductor factory building, refer in particular to the production occasion for advanced semiconductor.
Background technology
Quartz conductor factory building is the place being used for preparing semiconductor devices specially, is widely applied at present.Due to the particularity of semiconductor devices, require that quartz conductor factory building must be designed to clean room, to meet the requirement such as constant temperature and humidity and cleanliness.For the factory of some advanced semiconductor, as 32/28nm, even following high-end processing procedure, not only higher to the requirement of cleanliness, and more strict to the suspension chemical molecular gaseous contamination floated in air.
The existing clean room for quartz conductor factory building is see shown in accompanying drawing 1 ~ 3, mainly comprise new wind delivery system, exhaust system and a large-scale clean room, various Fabricating machinery is provided with in this large-scale clean room, a central aisle 1(central area is formed between each Fabricating machinery 15) and many production aisle 2(bay(production area)), described production aisle and central aisle are all blank channel, therebetween by storage warehouse 3(Stocker) transmission realize the conveying (be sometimes also provided with between production aisle and storage warehouse and put district 21(FOUP) of material, be used for temporarily putting pending semiconductor devices), be communicated with between described production aisle and central aisle, other regions of large-scale clean room are referred to as service zone (service area), are used for putting various Fabricating machinery.
In prior art, directly be communicated with between production aisle (bay) and service zone (service area), and owing to having a lot of Fabricating machinery in service zone, these Fabricating machinerys can produce various waste gas or aggressive fume in process of production (as chlorine, hydrogen chloride etc.), once after these aggressive fumes spilling, these gases can be gone in the clean room in production aisle and central aisle, thus direct and storage warehouse (Stocker), put district (FOUP), and the semiconductor product stored in the inner comes in contact, thus have impact on the quality of product.
For the problems referred to above, the method that prior art adopts arranges chemical filter in clean room, but due to the space in clean room comparatively large, be difficult to accomplish to remove completely, and the cost of this method is high; This factory for some advanced semiconductor (processing procedure as high-end in 32/28nm) is very fatal, and reason is that the content requirement of advanced semiconductor product to aggressive fume is higher.
Also have a kind of method to be provided with dividing plate all around in central aisle and all production aisle, make the space of framework at least partially at its place, clean room, and the space at raised floor place forms independently clean microenvironment structure; The top ceiling in described production aisle has at least one breather pipe, and form the return air channel of clean microenvironment structure, dividing plate and putting between district immediately below it have space, forms gas regulation air door; Simultaneously arrange the second new wind delivery system at the top of clean microenvironment, the air pressure described in making independently in clean microenvironment structure is greater than the air pressure in the large-scale clean room of its outside.Thus, though when be corrosive in Fabricating machinery gas overflowing time, also can not enter in above-mentioned clean microenvironment structure, thus avoid the impact of above-mentioned aggressive fume on the storage warehouse in production aisle and product.
But, there are the following problems for technique scheme: (1) is owing to being provided with dividing plate all around in production aisle, and dividing plate and putting between district immediately below it have space, form gas regulation air door, namely dividing plate and the spacing of putting between district immediately below it are very little, thus, production aisle and service differentiation are left by dividing plate, hamper the action of personnel; (2) because dividing plate and putting between district immediately below it need to form gas regulation air door, thus the distance of dividing plate distance raised floor is difficult to hold, in practice of construction process, generally first dividing plate is directly extended to raised floor, then wait Fabricating machinery come in after truncated part dividing plate again, make dividing plate and putting between district immediately below it form gas regulation air door, obviously, this mode wastes time and energy, and cost is higher.
Therefore, develop a kind of clean room of low cost, and aggressive fume can be avoided to affect, the factory for some advanced semiconductor has positive realistic meaning.
Summary of the invention
The object of this invention is to provide a kind of clean room for quartz conductor factory building.
To achieve the above object of the invention, the technical solution used in the present invention is: a kind of clean room for quartz conductor factory building, comprise new wind delivery system, exhaust system and a large-scale clean room, there is in described large-scale clean room central aisle and at least one production aisle;
Described large-scale clean room comprises framework space, clean room and the cyclic space from top to bottom, is provided with top ceiling between framework space and clean room, is provided with raised floor and concrete slab between clean room and the cyclic space;
Described production aisle be provided with dividing plate all around, make the space of framework at least partially at its place, clean room, and the space at raised floor place forms independently clean microenvironment structure; Distance bottom described dividing plate and between top ceiling is at least 60cm, and the distance bottom dividing plate and between raised floor is at least 2m;
The top of described clean microenvironment is provided with upper sealing panel, is provided with lower seal plate bottom it, and the width of described lower seal plate is less than the width of upper sealing panel;
The top ceiling in described production aisle has at least one breather pipe, forms the return air channel of clean microenvironment structure; The top of connection pipe to be located on top ceiling and to be communicated with described framework space, and its tail end is positioned at the clean room of clean microenvironment structure;
Chemical filter is provided with in described clean microenvironment structure;
The top of described clean microenvironment is provided with the second new wind delivery system, and the air pressure described in making independently in clean microenvironment structure is greater than the air pressure in the large-scale clean room of its outside.
Above, the top of described clean microenvironment is provided with upper sealing panel, lower seal plate is provided with bottom it, and the width of lower seal plate is less than the width of upper sealing panel, form air intake surface and be greater than the overbalance aeration structure of outlet air surface, add that extra new wind fills into this independently in clean microenvironment, therefore, can not have under enough isolated instances, maintaining this independent clean microenvironment be malleation.
Width due to lower seal plate is less than the width of upper sealing panel, then the return air channel coordinating breather pipe to be formed, even if the distance between dividing plate and raised floor is comparatively large, aggressive fume also can be avoided the impact of the storage warehouse in production aisle and product.
In technique scheme, described lower seal plate is located between raised floor and concrete slab.
In technique scheme, described chemical filter is located at the air intake vent place of the blower fan filter module on top ceiling.Described blower fan filter module (FFU, Fan Filter Units) is prior art.
In technique scheme, described central aisle be provided with dividing plate all around, make the space of framework at least partially at its place, clean room, and the space at raised floor place forms independently clean microenvironment structure;
Be arranged with second partition in described central aisle, second partition is located at the inner side of described dividing plate, the top ceiling hollow out between dividing plate and second partition, makes the framework space between dividing plate and second partition and clean room form return air channel.
In technique scheme, the lower seal plate of the clean microenvironment structure at place, described central aisle is provided with gas regulation air door.
Preferably, the distance bottom described dividing plate and between raised floor is 2 ~ 4m.
Because technique scheme is used, the present invention compared with prior art has following advantages:
1, the present invention's design obtains a kind of clean room for quartz conductor factory building newly, it is provided with dividing plate all around production aisle, form independently clean microenvironment structure, and make the air pressure in this clean microenvironment structure be greater than air pressure in the large-scale clean room of its outside, thus, even if when be corrosive in Fabricating machinery gas overflowing time, also can not enter in above-mentioned clean microenvironment structure, thus avoid the impact of above-mentioned aggressive fume on the storage warehouse in production aisle and product.
2, the distance bottom dividing plate and between raised floor is arranged at least 2m by the present invention, and thus dividing plate can not hamper the action of personnel between production aisle and service zone; In addition, because the distance bottom dividing plate and between raised floor is larger, far beyond the height of Fabricating machinery, thus in practice of construction process, directly neat for dividing plate can be set, also without the need to clipping dividing plate after coming in Deng Fabricating machinery, greatly facilitating practice of construction, and reducing cost.
3, the present invention has at least one breather pipe at the top ceiling in each production aisle, forms the return air channel of clean microenvironment structure, thus takes full advantage of the space in it; And the return air channel formed can form microcirculation in clean microenvironment structure, not only takes full advantage of the pure air in it, and reduces consumption.
4, the present invention is provided with the second new wind delivery system at the top of clean microenvironment, and the air pressure described in making independently in clean microenvironment structure is greater than the air pressure in the large-scale clean room of its outside, this not only prevents aggressive fume to enter among clean microenvironment further, new wind can also be utilized and carry out premix by return air channel pure air out, realize the preset adjustment of temperature.
5, the present invention is provided with the second new wind delivery system at the top of clean microenvironment, this second new wind delivery system is independent of outside original new wind delivery system, thus can strengthen the air intake quality of this second new wind delivery system, ensure the cleanliness in clean microenvironment structure further.
6, structure of the present invention is simple, is easy to preparation, is suitable for applying.
Accompanying drawing explanation
Fig. 1 is the birds-eye view of the clean room in background technology;
Fig. 2 is the A-A amplification view of Fig. 1;
Fig. 3 is the C-C enlarged partial sectional view of Fig. 1;
Fig. 4 is the birds-eye view of the embodiment of the present invention one;
Fig. 5 is the local D-D enlarged partial sectional view of Fig. 4;
Fig. 6 is the air-flow schematic diagram of Fig. 5.
Wherein: 1, central aisle; 2, production aisle; 3, storage warehouse; 4, framework space; 5, clean room; 6, the cyclic space; 7, top ceiling; 8, dividing plate; 9, blower fan filter module; 10, raised floor; 11, concrete slab; 12, lower seal plate; 13, upper sealing panel; 15, Fabricating machinery; 16, chemical filter; 17, the second new wind delivery system; 18, return air channel; 20, breather pipe; 21, district is put.
Detailed description of the invention
Below in conjunction with drawings and Examples, the invention will be further described:
Embodiment one
Shown in Fig. 4 ~ 6, a kind of clean room for quartz conductor factory building, comprises new wind delivery system, exhaust system and a large-scale clean room, has central aisle 1 and 5 production aisle 2 in described large-scale clean room;
Described large-scale clean room comprises framework space 4, clean room 5 and the cyclic space 6 from top to bottom, is provided with top ceiling 7 between framework space and clean room, is provided with raised floor 10 and concrete slab 11 between clean room and the cyclic space;
Described production aisle be provided with dividing plate 8 all around, make the space of framework at least partially at its place, clean room, and the space at raised floor place forms independently clean microenvironment structure; Distance bottom described dividing plate and between top ceiling is 60cm, and the distance bottom dividing plate and between raised floor is 2m;
The top of described clean microenvironment is provided with upper sealing panel 13, is provided with lower seal plate 12 bottom it, and the width of described lower seal plate is less than the width of upper sealing panel;
All be provided with 2 breather pipes 20 under the top ceiling in each production aisle described, form the return air channel of clean microenvironment structure; The top of connection pipe to be located on top ceiling and to be communicated with described framework space, and its tail end is positioned at the clean room of clean microenvironment structure;
Chemical filter 16 is provided with in described clean microenvironment structure;
The top of described clean microenvironment is provided with the second new wind delivery system 17, and the air pressure described in making independently in clean microenvironment structure is greater than the air pressure in the large-scale clean room of its outside.
Described lower seal plate is located between raised floor and concrete slab.
Described chemical filter is located at the air intake vent place of the blower fan filter module 9 on top ceiling.
Described central aisle be provided with dividing plate all around, make the space of framework at least partially at its place, clean room, and the space at raised floor place forms independently clean microenvironment structure;
Be arranged with second partition in described central aisle, second partition is located at the inner side of described dividing plate, the top ceiling hollow out between dividing plate and second partition, makes the framework space between dividing plate and second partition and clean room form return air channel.
The lower seal plate of the clean microenvironment structure at place, described central aisle is provided with gas regulation air door.
Claims (6)
1. for a clean room for quartz conductor factory building, comprise new wind delivery system, exhaust system and a large-scale clean room, there is in described large-scale clean room central aisle (1) and at least one production aisle (2);
Described large-scale clean room comprises framework space (4), clean room (5) and the cyclic space (6) from top to bottom, be provided with top ceiling (7) between framework space and clean room, between clean room and the cyclic space, be provided with raised floor (10) and concrete slab (11); It is characterized in that:
Described production aisle be provided with dividing plate (8) all around, make the space of framework at least partially at its place, clean room, and the space at raised floor place forms independently clean microenvironment structure; Distance bottom described dividing plate and between top ceiling is at least 60cm, and the distance bottom dividing plate and between raised floor is at least 2m;
The top of described clean microenvironment is provided with upper sealing panel (13), is provided with lower seal plate (12) bottom it, and the width of described lower seal plate is less than the width of upper sealing panel;
The top ceiling in described production aisle has at least one breather pipe (20), forms the return air channel (18) of clean microenvironment structure; The top of connection pipe to be located on top ceiling and to be communicated with described framework space, and its tail end is positioned at the clean room of clean microenvironment structure;
Chemical filter (16) is provided with in described clean microenvironment structure;
The top of described clean microenvironment is provided with the second new wind delivery system (17), and the air pressure described in making independently in clean microenvironment structure is greater than the air pressure in the large-scale clean room of its outside.
2. the clean room for quartz conductor factory building according to claim 1, is characterized in that: described lower seal plate is located between raised floor and concrete slab.
3. the clean room for quartz conductor factory building according to claim 1, is characterized in that: described chemical filter is located at the air intake vent place of the blower fan filter module (9) on top ceiling.
4. the clean room for quartz conductor factory building according to claim 1, it is characterized in that: described central aisle be provided with dividing plate all around, make the space of framework at least partially at its place, clean room, and the space at raised floor place forms independently clean microenvironment structure;
Be arranged with second partition in described central aisle, second partition is located at the inner side of described dividing plate, the top ceiling hollow out between dividing plate and second partition, makes the framework space between dividing plate and second partition and clean room form return air channel.
5. the clean room for quartz conductor factory building according to claim 4, is characterized in that: the lower seal plate of the clean microenvironment structure at place, described central aisle is provided with gas regulation air door.
6. the clean room for quartz conductor factory building according to claim 1, is characterized in that: the distance bottom described dividing plate and between raised floor is 2 ~ 4m.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310069347.7A CN103206101B (en) | 2013-03-05 | 2013-03-05 | Clean room for semiconductor plant |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310069347.7A CN103206101B (en) | 2013-03-05 | 2013-03-05 | Clean room for semiconductor plant |
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| Publication Number | Publication Date |
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| CN103206101A CN103206101A (en) | 2013-07-17 |
| CN103206101B true CN103206101B (en) | 2015-04-15 |
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| CN201310069347.7A Active CN103206101B (en) | 2013-03-05 | 2013-03-05 | Clean room for semiconductor plant |
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Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN106703446A (en) * | 2016-12-22 | 2017-05-24 | 亚翔系统集成科技（苏州）股份有限公司 | Clean room system |
| CN112097349B (en) * | 2020-11-11 | 2021-04-27 | 晶芯成(北京)科技有限公司 | Filter device for clean room |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JPS625031A (en) * | 1985-06-28 | 1987-01-12 | Kajima Corp | Clean room partially having different cleaning degrees |
| JPH1130436A (en) * | 1997-07-11 | 1999-02-02 | Nittetsu Semiconductor Kk | Clean room and refiting method for the same |
| JP2002147811A (en) * | 2000-11-08 | 2002-05-22 | Sharp Corp | Cleanroom |
| CN102874597B (en) * | 2012-09-27 | 2015-09-30 | 亚翔系统集成科技（苏州）股份有限公司 | A kind of automated material handling system |
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