CN103205720B - 传动缝隙模块及应用其的连续溅射镀膜设备 - Google Patents
传动缝隙模块及应用其的连续溅射镀膜设备 Download PDFInfo
- Publication number
- CN103205720B CN103205720B CN201210013429.5A CN201210013429A CN103205720B CN 103205720 B CN103205720 B CN 103205720B CN 201210013429 A CN201210013429 A CN 201210013429A CN 103205720 B CN103205720 B CN 103205720B
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- Prior art keywords
- drive cavity
- gap module
- transmission gap
- central dividing
- backing plate
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- 230000005540 biological transmission Effects 0.000 title claims abstract description 47
- 238000004544 sputter deposition Methods 0.000 title claims abstract description 27
- 238000000576 coating method Methods 0.000 title claims abstract description 13
- 239000011248 coating agent Substances 0.000 title claims abstract description 12
- 230000007246 mechanism Effects 0.000 claims abstract description 16
- 239000004411 aluminium Substances 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical group [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 238000002955 isolation Methods 0.000 claims description 2
- 230000004888 barrier function Effects 0.000 abstract description 5
- 239000011521 glass Substances 0.000 description 31
- 239000007789 gas Substances 0.000 description 12
- 238000000034 method Methods 0.000 description 9
- 230000008569 process Effects 0.000 description 5
- 239000012298 atmosphere Substances 0.000 description 4
- 239000007888 film coating Substances 0.000 description 4
- 238000009501 film coating Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000013077 target material Substances 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000005344 low-emissivity glass Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 238000002310 reflectometry Methods 0.000 description 2
- 238000003980 solgel method Methods 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910001200 Ferrotitanium Inorganic materials 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- PWKWDCOTNGQLID-UHFFFAOYSA-N [N].[Ar] Chemical compound [N].[Ar] PWKWDCOTNGQLID-UHFFFAOYSA-N 0.000 description 1
- VVTSZOCINPYFDP-UHFFFAOYSA-N [O].[Ar] Chemical compound [O].[Ar] VVTSZOCINPYFDP-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- GRPQBOKWXNIQMF-UHFFFAOYSA-N indium(3+) oxygen(2-) tin(4+) Chemical class [Sn+4].[O-2].[In+3] GRPQBOKWXNIQMF-UHFFFAOYSA-N 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000010257 thawing Methods 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (5)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201210013429.5A CN103205720B (zh) | 2012-01-17 | 2012-01-17 | 传动缝隙模块及应用其的连续溅射镀膜设备 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201210013429.5A CN103205720B (zh) | 2012-01-17 | 2012-01-17 | 传动缝隙模块及应用其的连续溅射镀膜设备 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN103205720A CN103205720A (zh) | 2013-07-17 |
CN103205720B true CN103205720B (zh) | 2015-12-16 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN201210013429.5A Active CN103205720B (zh) | 2012-01-17 | 2012-01-17 | 传动缝隙模块及应用其的连续溅射镀膜设备 |
Country Status (1)
Country | Link |
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CN (1) | CN103205720B (zh) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5382126A (en) * | 1992-03-30 | 1995-01-17 | Leybold Ag | Multichamber coating apparatus |
CN1681962A (zh) * | 2002-08-01 | 2005-10-12 | 泰克玛西纳股份有限公司 | 对基质进行真空处理的设备 |
WO2010128129A1 (de) * | 2009-05-08 | 2010-11-11 | Von Ardenne Anlagentechnik Gmbh | Durchlauf-vakuumbeschichtungsanlage |
CN202492568U (zh) * | 2012-01-17 | 2012-10-17 | 上海北玻镀膜技术工业有限公司 | 传动缝隙模块及应用其的连续溅射镀膜设备 |
-
2012
- 2012-01-17 CN CN201210013429.5A patent/CN103205720B/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5382126A (en) * | 1992-03-30 | 1995-01-17 | Leybold Ag | Multichamber coating apparatus |
CN1681962A (zh) * | 2002-08-01 | 2005-10-12 | 泰克玛西纳股份有限公司 | 对基质进行真空处理的设备 |
WO2010128129A1 (de) * | 2009-05-08 | 2010-11-11 | Von Ardenne Anlagentechnik Gmbh | Durchlauf-vakuumbeschichtungsanlage |
CN202492568U (zh) * | 2012-01-17 | 2012-10-17 | 上海北玻镀膜技术工业有限公司 | 传动缝隙模块及应用其的连续溅射镀膜设备 |
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Publication number | Publication date |
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CN103205720A (zh) | 2013-07-17 |
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Effective date of registration: 20240116 Address after: Zone C, 4th Floor, Building 1, No. 328 Guanghua Road, Xiaokunshan Town, Songjiang District, Shanghai, 200000 Patentee after: Shanghai Beibo Vacuum Coating Technology Co.,Ltd. Address before: Floor 3, No. 328 Guanghua Road, Songjiang Science and Technology Park, Songjiang District, Shanghai, 2016 Patentee before: SHANGHAI NORTHGLASS COATING TECHNOLOGY INDUSTRIAL Co.,Ltd. Patentee before: SHANGHAI NORTHGLASS TECHNOLOGY INDUSTRIAL Co.,Ltd. Patentee before: LUOYANG NORTHGLASS TECHNOLOGY Co.,Ltd. |
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